Abstract: A semiconductor device manufacturing method includes forming circuit devices and a plurality of electrode pads within a semiconductor chip formation region. The method also includes forming, on the main surface of the semiconductor wafer, an insulating film which exposes a portion of each of the electrode pads. The method also includes forming a conducting film covering the electrode pads, on the insulating film, and forming a wiring layer on the conducting film. The method also includes forming a negative resist layer in the semiconductor chip formation region and a peripheral region. The method also includes covering protruding electrode formation regions in the semiconductor chip formation region and covering electrode portion formation regions in the peripheral region, and performing optical exposure of the negative resist layer. The method also includes forming aperture portions in the protruding electrode formation regions and a plurality of electrode portions.

Abstract: An exposure apparatus includes a mask-moving section movable in a first direction while holding a mask formed with a pattern; an illumination system which forms first and second illumination areas separated each other by a spacing distance in the first direction; a substrate-moving section movable in a second direction while holding a photosensitive substrate; a projection optical system which forms first and second projected images of the patterns of the first and second illumination areas; and a restricting section which restricts the first and second projected images to be within first and second projection areas respectively. A spacing distance between a first conjugate area with the first projection area and a second conjugate area with the second projection area is set to be such a spacing distance that scanning exposures are successively performed for first and second transfer areas provided adjacently in the second direction.

Abstract: A chuck 10 which supports a substrate 1 is moved by using an X-direction stage 5, and a position of the chuck 10 is detected at the same time. A traveling error of the X-direction stage 5 is detected according to a detecting result of position of the chuck 10. Then, a coordinate of drawing data supplied to a driving circuit 27 of a light beam irradiation device 20 is modified according to a detecting result of the traveling error of the X-direction stage 5, and the patterned data having the modified coordinate is supplied to the driving circuit 27 of the light beam irradiation device 20. Even if the traveling error such as shifting or yawing occurs in the X-direction stage 5, patterns can still be precisely drawn.

Abstract: A method is disclosed for adjusting an arrangement of coordinates in an imaging area of an imaging component in a substrate imaging plane in a substrate position detection apparatus that detects a position of a substrate in accordance with an image taken of a circumferential portion of the substrate by the imaging component, the apparatus being arranged near a rotatable susceptor on which the substrate is placed and a substrate transferring apparatus prepared separately from the susceptor and configured to horizontally drive a supporting pin for transferring the substrate to and/or from the susceptor.

Abstract: An optical lithography exposure apparatus which may be a stepper or a scanner, provides a wafer chuck that retains a wafer and at least one opaque exposure shield that extends over a discrete peripheral edge portion of the wafer thereby preventing illumination from exposing the portion of the wafer beneath the exposure shield. In a positive photoresist system, the portions of the wafer blocked from exposure by the shields, include alignment marks and the unexposed photoresist remains over the alignment marks thereby protecting the alignment marks from destruction or damage during subsequent patterning operations used to form patterns in the film being patterned.

Abstract: An exposure apparatus (10) for transferring a mask pattern (452) from a mask (12) to a substrate (14) includes an illumination system (18), a mask stage assembly (22), a substrate stage assembly (24), and a control system (28). The substrate (14) includes a first site (1) and a second site (2) that are adjacent to each other and that are aligned with each other along a first axis. The illumination system (18) generates an illumination beam (35) that is directed at the mask (12). The mask stage assembly (22) retains and positions the mask (12) relative to the illumination beam (35). The substrate stage assembly (24) retains and positions the substrate (14). The control system (28) controls the illumination system (18) and the substrate stage assembly (24) so that the mask pattern (452) is sequentially transferred to the first site (1) and then the second site (2) while the substrate stage assembly (24) is moving the substrate (24) in a first mask direction along the first axis.

Abstract: The present invention discloses a precise positioning system for dual stage switching exposure, which comprises at least a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafer stage positioning units comprises at least a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The pre-processing workstation and the exposure workstation of the system both have two X-direction guide bars positioned on and movable along the Y-direction guide bars. The X-direction guide bars of adjacent workstations can be connected to each other. The advantage of the present invention is that the switching paths of the wafer stages are short; the guide bars are equally forced; the size of the wafer stages are hardly restricted, thereby greatly improving the switching speed, operation accuracy and flexibility of the system.

Abstract: A sheet includes a plurality of incisions that define a plurality of frames. The frames are arranged in a geometric pattern to facilitate selection of an appropriate frame for cropping an image displayed on photographic media. The frames are connected to each other by an adhesive layer and substrate. Alternatively, the frames are connected by tags or micro-perfs. A transparent crop selector is used to facilitate selection of an appropriately sized frame.

Abstract: A method and system for particle beam lithography, such as electron beam (EB) lithography, is disclosed. The method and system include selecting one of a plurality of cell patterns from a stencil mask and partially exposing the cell pattern to a particle beam, such as an electron beam, so as to selectively project a portion of the cell pattern on a substrate.

Abstract: A method is provided for performing photolithography on a substrate which has a first region on a lower level and a second region on an upper level, wherein a first pattern area exists within said first region, a second pattern area exists within said second region, and at least said first and second regions are coated with a photoresist, the method comprising: a) exposing the photoresist through a first mask so as to expose said first region including said first pattern area, and thus create a first pattern in said first pattern area, but not expose said second pattern area; and b) exposing the photoresist through a second mask so as to expose said second pattern area, and thus create a second pattern in said second pattern area, but not expose said first pattern area, and also to expose an area of said first region which lies adjacent said second region.

Abstract: Stator position feedback controller. A first position monitoring device responds to the position of a stator supported for relative motion by a machine base. A second position monitoring device responds to the position of a carriage with respect to the machine base. An actuator is provided to move the carriage through interaction with the stator. A servo controller responds to the difference in the output of the first and second position monitoring devices to control the position of the carriage with respect to the machine base.

Abstract: A method and system of processing stamps comprising providing a template containing openings, each opening corresponding with an image to be imprinted on a material, whereby the openings are sized to align such material with the images.

Abstract: A system for disposing of medical waste is generally configured to sort waste items into a plurality of disposable containers according to applicable rules and regulations governing the handling and/or disposal of such items. In some embodiments, a system comprises sorting stations, each of which houses a number of disposable containers. Each station can identify an item of waste, determine the most appropriate container for the item, and facilitate disposal of the item in the appropriate container.

Abstract: A system for disposing of medical waste is generally configured to sort waste items into a plurality of disposable containers according to applicable rules and regulations governing the handling and/or disposal of such items. In some embodiments, a system comprises sorting stations, each of which houses a number of disposable containers. Each station can identify an item of waste, determine the most appropriate container for the item, and facilitate disposal of the item in the appropriate container.

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20).

Abstract: A method and apparatus are described for removing an initial gas from a gas-filled enclosure between the mask-protective device, such as a pellicle, and the patterned mask, such as a reticle, and adding a purge gas with a different composition. The gas-filled enclosure includes a vent for adding the purge gas to the chamber and removing the initial gas from the chamber. Adding and removing may be accomplished by using pressure, diffusion, vacuum, or other means.

Abstract: A method and system of processing stamps comprising providing a template containing openings, each opening corresponding with an image to be imprinted on a material, whereby the openings are sized to align such material with the images.

Abstract: A film handling apparatus having a carrier, wherein the carrier is provided with a film size sensor disposed near a film entrance opening, a transport path capable of changing a transport width while maintaining a constant center position, a mask provided with opening opposite a film and designed for use with various sizes of film and a controller for changing the transport path width and selecting the mask opening in accordance with the film size detected by the film size sensor.

Abstract: The invention features an apparatus for mounting a pellicle to a reticle. The apparatus includes: a base; a first holder coupled to the base and including two edges positioned to support a first object below its center of gravity and secure the first object in substantially vertical alignment with the base, the first object including one of the pellicle and the reticle; a second holder slidably coupled to the base and including two edges positioned to support a second object below its center of gravity and secure the second object in substantially vertical alignment with the base, the second object including the other of the pellicle and the reticle; and a pressure applicator assembly slidably coupled to the base to adjustably apply pressure to a periphery of the second object held in the second holder and drive it against a corresponding periphery of the first object held in the first holder. In additional embodiments, the apparatus provides automated mounted of the pellicle and reticle.

Abstract: An intermediate substrate holder for use in a lithographic projection apparatus, which holder can itself be held by a standard substrate holder in the lithographic projection apparatus and in turn can hold a non-standard substrate. The intermediate substrate holder includes at least one of a vacuum holder and a mechanical clamp. The vacuum holder includes a vacuum space on which the non-standard substrate is placed; a barrier around the edge of the vacuum space that closes off the vacuum space and that makes a sealing contact with the non-standard substrate; and a vacuum generator. The mechanical clamp may include two or more stationary positioning pins opposed by a slidable mechanism which is provided with at least one sliding positioning pin mounted thereon and which is biased to move the sliding positioning pin towards the stationary pins.

Abstract: A flexible chuck for supporting a substrate during lithographic processing is described. This flexible chuck includes an electrode layer, a piezoelectric layer disposed on the electrode layer, and a substrate support layer disposed above the piezoelectric layer. By providing electrical signals to the piezoelectric layer through the electrode layer, the support layer can be flexed, thereby changing surface topography on a substrate disposed on the flexible chuck. The contact layer can include projections, each of the projections corresponding to a respective electrode within the electrode layer. Furthermore, the substrate support layer can be formed of a conductive material and thus serve as the ground layer. Alternatively, separate substrate support and ground layers can be provided. The flexible chuck in accordance with the instant invention can be a vacuum chuck. Also described is a method of monitoring topographic changes in a flexible chuck in accordance with the instant invention.

Abstract: The invention concerns an adjustment table for aligning a body in a horizontal plane.

Abstract: A reticle carrier used in semiconductor manufacture. The carrier includes a bottom cover and a top cover having a transparent window. A protective lid may also be included. The box includes ports to allow nitrogen gas to enter and purge the inside. The transparent window is used for inspection and photochemical clean. However, since no material is available which can suitably handle smaller wavelength radiation, the reticle is removed from the carrier when exposure at these wavelengths is required.

Abstract: A lithographic apparatus according to one embodiment of the invention includes a movement detector configured to detect movement of the projection system and to generate a movement signal; a controller responsive to the movement signal and configured to generate a control signal; and an actuator assembly responsive to the control signal and configured to reduce movement of the projection system.

Abstract: An air bearing stage device which is suitable for use with a vacuum environment is disclosed. According to one aspect of the present invention, a stage apparatus includes a table that is positioned in a system vacuum chamber, a first rod that carries the table, and first and second plates that support the first rod. The first plate includes an air bearing surface that is held against the first side of a first wall by a first vacuum force. A first drive mechanism drives the first plate to move the first rod in a first direction, and also drives the second plate to move the first rod in the first direction, while a second drive mechanism which includes a second rod and a first linear motor causes the second rod to move the first rod in a second direction.

Abstract: A stage device includes a first stationary member, a second stationary member, a moving member and positioning devices. The first stationary member extends in a first direction. The second stationary member extends in the first direction and is spaced apart from the first stationary member in a second direction perpendicular to the first direction. The moving member can cooperate with the first stationary member and with the second stationary member. The positioning devices selectively position the moving member into cooperation with one of the first and second stationary members without physically contacting the moving member with the first and second stationary members. In addition, a stage device provided with a moving member that can move within a two-dimensional plane having a first direction and a second direction perpendicular to the first direction includes a first stationary member and a second stationary member.

Abstract: An apparatus for supporting a mask comprises a pair of members. The mask held against each member by a vacuum arrangement which prevents relative motion between the mask and members. The members are compliant such that they accommodate flatness variations in the mask but without deforming the mask.

Abstract: A support assembly (12) for an exposure apparatus (10) includes a frame assembly (34), an elevator assembly (36) and a pivot assembly (38) for supporting at least one subassembly above an isolation base (32). The elevator assembly (36) selectively lifts the frame assembly (34) and the subassembly relative to the isolation base (32). Further, the pivot assembly (38) allows a portion of the frame assembly (34) and the subassembly to be rotated relative to the isolation base (32). As a result of this design, the subassemblies of the exposure apparatus (10) can be removed relatively easily for service and adjustment.

Abstract: A base assembly is provided to support a wafer stage chamber assembly of a wafer manufacturing system. The wafer stage chamber assembly isolates semiconductor substrates from the atmosphere so that the resulted wafers have an improved quality and meet certain wafer manufacturing specifications. The base assembly includes a stage base to support the stage device, a base frame to support the stage base, and a plurality of support members to attach the base frame to an apparatus frame of the semiconductor substrate manufacturing apparatus. The base assembly also includes at least one mover base positioned adjacent the stage base to support at least one mover assembly. In addition, the base assembly is provided with an accessory channel to store accessories, such as cables, hoses, and wires, away from various moving parts in the wafer stage chamber assembly.

Abstract: A positioning device for positioning a wafer table and an exposure apparatus including the positioning device are disclosed. The positioning device comprises a housing, a piezoelectric actuator, and a structure for moving the wafer table in a second direction. The piezoelectric actuator has a first and second end. The first end is fixedly mounted to the housing and the second end is movable in a first direction in response to a change in voltage applied to the piezoelectric actuator. The structure comprises a first joint, a second joint, a diagonal member, and a flexure. The first joint is movable in the first direction in response to the second end of the piezoelectric actuator moving in the first direction. The second joint is movable in the second direction to move the wafer in the second direction. The diagonal member is connected to the first and second joints at an angle with respect to the first direction.

Abstract: A substrate conveying system wherein, at a substrate transfer position of a conveyance robot, a robot arm is moved upwardly at a normal speed from its lowermost position, and wherein the movement speed is changed to a lower speed at a predetermined position. During upward motion at the lower speed, the substrate is received and, while continuing the upward motion, the movement speed is changed back to the normal speed, at a second predetermined position. The robot arm continues its upward motion to its topmost position, with this normal speed.

Abstract: A stage device includes a reaction-force-discharging structure in which a stationary member of a driving mechanism configured with a linear motor and the like disposed in a wafer chamber is connected to an external frame while maintaining the wafer chamber in a hermetic state. When a wafer stage is driven by the linear motor, a reaction force generated by driving the stage is applied to the stationary member. The reaction force is discharged to, e.g., a floor by the reaction-force-discharging structure via an external frame. For example, when the wafer chamber is set to a predetermined atmosphere of gas (including air from which organic substances and the like have been removed), the reaction force caused by driving the wafer stage can be discharged to the outside while maintaining the predetermined atmosphere. In an exposure apparatus using the stage device, accurate exposure is possible by reducing effects of vibration to the greatest extent possible.

Abstract: A pre-aligner receives wafers from a wafer carrier or process track and performs preparatory steps such as centering of the wafer. The prepared wafer is transferred to the wafer table using a robot arm that is isolated from the pre-aligner and the wafer table. The robot arm couples to the pre-aligner to pick up the wafer, decouples, couples to the wafer table and deposits the wafer. Positional accuracy of the wafer is thereby maintained during the transfer.

Abstract: A balanced positioning system for use in lithographic apparatus comprises a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.

Abstract: A method and apparatus for document imaging is disclosed. The apparatus uses a flatbed scanner with a selectively opaque/transparent liquid crystal platen. The platen is divided into controllable segments defined by an electrode pattern formed within the platen itself. These segments can each be selectively made transmissive or opaque by applying appropriate voltages to the segment electrodes. An advantage of the invention is that it can operate without a platen cover, since the area of the platen not covered by the original can be made opaque. The opaque part of the platen directs imaging light back into the system, shielding a user's eyes and helping to create a white background if the platen is imaged.

Abstract: A vertical alignment table mechanism 21 for a board 25 to form a printed wiring board has a vertical support wall 43, and an alignment table 33 disposed in vertical attitude opposite to the front surface of the support wall 43, having an opening in which an exposure mask 23 is disposed. The alignment table 33 is supported for movement in a vertical plane on the vertical support wall 43 by a means of plurality of table support devices 35. Each of the table support devices 35 includes a ball caster 51 fixed to the support wall 43 having a ball 51a therein and a contact block 53 fixed to the alignment table 33. A tension spring 55 urges the surface of the contact block 53 against the ball. Table moving devices 37 are also provided between the support wall 43 and the alignment table 33. Each table moving device 37 includes a contact block 85 on the alignment table, and a follower roller 83 on the support wall 43. A spring 37 urges the follower roller 83 against the contact block 85.

Abstract: An exposure apparatus for photoengraving stamps includes a light-proof cabinet having a flash light therein and a drawer adapted to be drawn out therefrom. A clamp is carried on the drawer for holding the stamp. The clamp includes a base fixed to the drawer and formed with a pair of parallel rails, a pair of opposed holders movable on the base along the parallel rails, and means for moving the holders along the parallel rails in opposite directions synchronously. Each of the holders is also provided with a lifter for lifting up the middle plank between the bars and a handle for operating the lifter. Therefore the stamp may be held between the planks just under the flash light when the holders are moved closer together and the middle planks are lifted by turning the handles.

Abstract: A method and apparatus for capturing an image. The apparatus includes a support platen for receiving a document having a front image bearing side and a back side co-extensive with the front side. An image capture element is disposed below the platen for capturing an image on the front image side. A reticle forming device is provided for providing a reticle on the platen for assisting in positioning of the document when a positioning cover is placed over the document. A second cover is also provided for placement over the positioning cover. The second cover is substantially opaque and is used for when the image on the front image side is illuminating for capture of the image.

Abstract: A mask pellicle removal apparatus for separating a mask pellicle from a glass reticle to which it is bonded by prying against its releasable bond. The apparatus includes a table support for nesting the glass reticle and for supporting a manually operated prying mechanism having only the necessary degrees of freedom for prying free the mask pellicle without damaging the glass reticle.

Abstract: A stage device includes a movable body, movable along a guide surface, for moving an element mounted on the movable body, a static pressure bearing, having at least one pad, for guiding the movable body along the guide surface, the at least one pad being attached to the movable body at a first position, and a linear motor, having a movable part and a relatively stationary part, for moving the movable body, the movable part of the linear motor being attached to the movable body at a second position. The movable body has a hollow structure at at least one of the first position and the second position. The hollow structure has an enclosure structure or a rib structure.

Abstract: A film carrier is provided with markers for encoding information relating to the film, such that this information may be read by a printer.

Abstract: A scanning exposure apparatus of the scan-and-stitch type for stitching and forming a plurality of pattern images while partially superimposing them on a photosensitive substrate along a direction perpendicular to a scanning direction. The apparatus includes a fixed field diaphragm for setting a width of an illumination area in the scanning direction on the mask, and a variable field diaphragm comprising third and fourth shielding plates for restricting the width of the illumination area in the scanning direction, and first and second shielding plates which are rotationally movable in a plane perpendicular to an optical axis of an illumination optical system for setting a width of the illumination area in the direction perpendicular to the scanning direction. Scanning exposure is performed while each of the first and second shielding plates maintains an identical rotational angle over a connecting area of an image-plane stitching section.

Abstract: A conventional imagesetting system includes an imagesetter for transferring an image onto media, a wet chemical processor for processing the imaged media, an enclosed dryer section for drying the media by circulating air thereabout, and extraction rollers for extracting the media from the enclosed dryer section.

Abstract: An optical element (1) of an optical system has at least one chamber (5) that is sealed against atmospheric pressure and is enclosed by boundary surfaces and that has a fluid filling. At least one of the boundary surfaces of the chamber (5) is exposed at least partially to illumination light. It is configured so that a change in the fluid pressure inside the chamber (5) results in a change in non-rotational-symmetric imaging properties of the optical element (1) having n-fold symmetry. For this purpose, a fluid source has a fluid connection to the chamber via a fluid supply line (17). Furthermore, a control device is provided for the pressure in the fluid filling.

Abstract: Spoke shaped (petal shaped) through holes or cavities are provided at the center or a substrate holder which attaches and holds a substrate over substantially the entire surface, to allow vertical movement of a center-up member having a plurality of radially extended spoke shaped mounting portions. As a result, degradation in the flatness of a substrate at the time of attaching the substrate to the mounting surface of the substrate holder is minimized.

Abstract: The present invention allows formation of an image having an excellent finish quality by using an extremely simple and low-cost structure. Linearly polarized light transmitted through each of liquid crystal cells of a liquid crystal panel is made into circularly polarized light by a quarter-wave phase plate, and thereafter, the circularly polarized light is used to expose a photographic printing paper via lithium-niobate prisms serving as a birefringent filter. As a result, light transmitted through a light transmitted area of each of the liquid crystal cells is irradiated on a region on the photographic printing paper corresponding to a light non-transmitted area so as to prevent formation of a pattern caused by the light non-transmitted area.

Abstract: Printer throughput is increased in a printer that prints sequential images on a film strip onto a matching strip of photosensitive printing paper. A film gate supports two or more images on the film strip. An illuminator provides light to the images in the film gate. An optics system focuses the film images onto separable areas of the printing paper and a shutter over each printing area individually exposes the printing areas.

Abstract: In order to reduce mask pattern transfer error caused by expansion of the mask substrate during transferring the circuit pattern onto the photosensitive substrate, a mask substrate is loosely supported on a plurality of mounts on the mask stage so that the mask substrate can freely expand in response to changes in its temperature. A measuring instrument (such as a temperature sensor or an interferometer) is used to measure a value representing the expansion amount of the mask substrate. Alignment and positioning of the mask substrate and the photosensitive substrate is adjusted in response to the expansion amount of the reticle, based on the measured value.

Abstract: A paper mask device can alternatively hold a first paper mask or a second paper mask. The first paper mask has a mask aperture to which a lith film with appropriate lettering is attached. The second paper mask has a mask aperture for making an index print composed of a plurality of index frames. The paper mask device can hold a lamp box for illuminating the lith film when the first paper mask is held in the paper mask device. The paper mask device holds the paper mask so as to be pivotal about an axis that is disposed in a center of a leading end of the paper mask in the mask inserting direction, so that inclination of the mask aperture is adjustable through a positioning device which holds opposite side edges of a trailing end portion of the paper mask in the masking position.

Abstract: A mask pellicle removal methods for separating a mask pellicle from a glass reticle to which it is bonded by prying against its releasable bond. The methods includes a table support for nesting the glass reticle and for supporting a manually operated prying mechanism having only the necessary degrees of freedom for prying free the mask pellicle without damaging the glass reticle.