Abstract: A luminance measuring device for a LCD includes a photometric unit having a contact type luminance meter, a light shielding cushion member surrounding a vicinity of a light receiving portion of the contact type luminance meter and a holding unit for fixing the contact type luminance meter to the LCD a converting unit for converting a first luminance measurement result by the contact type luminance meter into a second luminance measurement result corresponding to a telescopic luminance meter and a processing unit for conducting conversion processing using the converting unit to a luminance measurement result of the LCD by the photometric unit.

Abstract: Methods are disclosed for quantifying blur, of a beam of an optical medium, exhibited by an optical system through which the beam of the optical medium passes. An embodiment of the method includes the step of determining, in an image plane of the optical system, respective destination positions of a number (N) of rays of the optical medium originating according to a probability distribution from respective points in an object plane of the optical system. The destination positions are projected onto an axis in a direction, in the image plane, in which blur is to be quantified. Respective coordinates of each of the destination positions on the axis are determined and the determined coordinates are ranked. Blur is calculated from a profile of the ranked coordinates.

Abstract: A method and device for measuring optical wavefront shape parameters based on line-by-line analysis of the wavefront are disclosed. The method comprises at least one step (ACQi) consisting of acquiring a wavefront line. The acquisition comprises detecting (DETi) the line for delivering an electric signal characterizing it, for example, by means of a detection module including, in particular, an array of microlenses and a sensor, the module capable of being mobile in rotation and/or in translation. The acquisition comprises a step (Tsi) for processing the signal for determining a set Ki of parameters, for example, values proportional to the wavefront phase values measured on the line. In an embodiment, the method further comprises a step (RECi) for reconstructing each wave line consisting, for example, in expressing the line phase on a base of orthogonal polynomials, then a step (RECs) for reconstructing the wavefront on the basis of the reconstructed lines.

Abstract: A method of evaluating free-space optical propagation characteristics includes emitting a plurality of laser beams from a corresponding plurality of laser sources, receiving laser beams at different target points, and measuring the time-based spatial fluctuations between the laser beams thus received. The respective distances from the laser sources to each target point are used to normalize the time-based spatial fluctuations. The difference between the normalized spatial positions of the laser beams at the target points is derived and used to obtain the frequency spectrum of time-based fluctuations of the spatial positions.

Abstract: A dispersed Hartmann sensor includes a Hartmann lenslet in combination with a dispersive element, whereby a Hartmann spot formed by light passing through the Hartman lenslet is dispersed parallel to the phase step of the light. The shape of the blur spot can then be examined at many wavelengths. Measuring the size of a discontinuity in the wavefront of light is then performed by forming a single image of the wavefront, dispersing the image in wavelength using a combination of a Hartman lenslet and a dispersive element, and analyzing the dispersed image along a dispersion direction of the dispersed image to measure the size of the discontinuity.

Abstract: Disclosed is a method of measuring a wavefront aberration of a predetermined optical system being serviceable for imaging a pattern, wherein the method includes storing information related to a light intensity distribution on a pupil plane of the predetermined optical system in a reference state, and detecting a wavefront of the predetermined optical system in an arbitrary state, on the basis of the stored information.

Abstract: The invention relates in general to calibrating a focused beam of energy in a solid freeform fabrication apparatus, and, in particular, to a method of measuring the propagation characteristics of the beam to produce beam propagation data. The beam propagation data can be used to verify that the beam is operating within tolerance, and/or produce a response that can be used to further calibrate the beam. The invention is particularly useful in determining asymmetric conditions in the beam. The beam propagation data is produced in accord with the “M2” standard for characterizing a beam. In one embodiment, the response indicates the beam is unacceptable for use in the apparatus. In another embodiment, the response is provided to calibrate the focal position of the beam. In still another embodiment, the response is provided to an adjustable beam that eliminates the asymmetric condition.

Abstract: The objective of the present invention is providing a method and a simple instrument that can be used on a routine basis to accurately and quickly measure the focus position, waist radius, divergence, quality, power and power density of a laser beam. The measurement is performed by scanning a thin film of a nonlinear optical material in the focal region along the propagation direction of the beam and registering the variation of the on-axis intensity of the laser beam by a photodetector.

Abstract: A device and method for detecting the relative position of reference light includes a plurality of photodetector arrays arranged in a generally vertical row. Each array includes a plurality of photodetector elements arranged in a generally vertical array row. The photodetector elements in the arrays are arranged in a generally vertically oriented, extended row. Each of the photodetector elements provides an electrical output when illuminated with the light. A plurality of weighting circuits is provided, each weighting circuit being associated with a respective one of the plurality of photodetector arrays.

Abstract: A system is disclosed for analyzing an illumination field of a line of laser illumination. The system includes a first movable unit, a second movable unit, and a sensor unit. The first movable unit includes a first opening through which at least a portion of the illumination field may pass. The first movable unit is adapted for movement in a first direction. The sensor unit is adapted to receive illumination and to produce a sensor output signal representative a characteristic of the illumination field. The second movable unit includes a second opening through which at least a portion of the illumination field may pass. The second movable unit is positioned between the first movable unit and the sensor unit and is adapted for movement between at least a first position in which very little or no light from the illumination field may reach the sensor unit, and a second position in which a relatively high amount of light from the illumination field may reach the sensor unit.

Abstract: An improved wavefront sensor for characterizing phase distortions in incident light including optical elements that spatially sample the incident light and form a dispersed spot with a fringe pattern corresponding to samples of the incident light. An imaging device captures an image of the dispersed spot with said fringe pattern formed by said optical elements. And an image processor that analyzes the spectral components of the fringe pattern of a given dispersed spot to derive a measure of the local phase distortion without ambiguity in the corresponding sample of incident light. The optical elements may comprise refractive elements, diffractive elements or a combination thereof (such as a grism). The wavefront sensor may be part of an adaptive optic system (such as a large-aperture space telescope) to enable the measurement and correction of large phase steps across adjacent mirror segments of a deformable mirror.

Abstract: A metrology system and method uses pulsed light to allow continuous movement of a target relative to the sensor. A metrology system and method uses dynamic adjustment of tilt in a system. A metrology system and method calibrates the system to remove inherent optical aberrations in the system. Filtering may also be used in the system to increase accuracy.

Abstract: An optical beam profiler using a spatial light modulator and photodetector. In an embodiment, the spatial light modulator is a two-dimensional (2-D) small tilt digital micromirror device. The profiler features fast speed, digital controls, low polarization sensitivity, and high measurement repeatability. The 2-D multi-pixel device-based profiler allows the use of several beam profile measurement concepts including moving knife edge, scanning slit, moving pinhole, variable aperture, and 2-D photodiode array. The proposed digital optical beam profiler can be implemented with any type of digitally operated 2-D spatial light modulator device such as using liquid crystals, magneto-optics, multiple quantum wells, electro-optic polymers, and photonic crystals.

Abstract: A system is disclosed for analyzing an illumination field of a line of laser illumination. The system includes a first movable unit, a second movable unit, and a sensor unit. The first movable unit includes a first opening through which at least a portion of the illumination field may pass. The first movable unit is adapted for movement in a first direction. The sensor unit is adapted to receive illumination and to produce a sensor output signal representative a characteristic of the illumination field. The second movable unit includes a second opening through which at least a portion of the illumination field may pass. The second movable unit is positioned between the first movable unit and the sensor unit and is adapted for movement between at least a first position in which very little or no light from the illumination field may reach the sensor unit, and a second position in which a relatively high amount of light from the illumination field may reach the sensor unit.

Abstract: An vehicle lamp assembling apparatus including a jig which supports a lamp component, an apparatus main body having disposed thereon positioning and fastening mechanisms (plungers and engagement holes) for positioning and fastening the jig to the apparatus main body. Some equipment (contact units) is disposed on the apparatus main body, and/or on the jig, for carrying out a predetermined processing, such as working or inspection, on the lamp component supported by the jig. Further, a control part is disposed on the apparatus main body, for drive control of the equipment. An ID plate that stores processing information, such as driving procedures and driving amount of the equipment, is disposed on the jig, whereas a non-contact memory reader is disposed on the apparatus main body so as to oppose the ID plate when the jig is fastened to the apparatus main body. The control part drives the equipment based on the processing information read from the ID plate via the memory reader.

Abstract: A method for adjusting an optical system of an energy beam apparatus by using a mark signal that is obtained by one-dimensionally or two-dimensionally scanning a mark on a sample with an energy beam. The mark has a one-dimensional or two-dimensional periodic structure. A first mark signal is detected by scanning the mark with a beam. The mark is set on the optical axis of the optical system. A second mark signal is detected by scanning the mark with a beam. The mark is located at a position that is deviated from the optical axis. A deviation of a deflection position is determined based on a phase difference between the first and second mark signals.

Abstract: Before measuring a wavefront aberration of a projection optical system, an image formation position of an image of a pattern of a test reticle which is formed on a predetermined surface is detected by an AF sensor. Based on a result of this detection, the position of an incident surface of a wavefront aberration measurement unit is adjusted, and a position of an image of the pattern with respect to the incident surface is adjusted. After this adjustment, the image of the pattern formed through the projection optical system is detected by the wavefront aberration measurement unit, and a wavefront aberration detection section is used to obtain wavefront aberration information of the projection optical system based on a result of this detection.

Abstract: A method of measuring a wavefront aberration of a predetermined optical system being serviceable for imaging a pattern. The method includes storing information related to a light intensity distribution on a pupil plane of the predetermined optical system in a reference state, and detecting a wavefront of the predetermined optical system in an arbitrary state, on the basis of the stored information.

Abstract: A device for detecting the direction of a light source. The device has a pin-hole lens that allows a collimated light beam to excite a light sensing surface behind the lens. The output from the light sensing surface is passed to a processor that determines the position of the surface that has been excited and the direction of the light source. When the position of one or more light sources is known, the device may further determine its own position. The devices may be used in a location system to provide known reference points to a network of other devices. The light sources may be modulated, in which the device can select or identify a particular light source based upon its modulation pattern.

Abstract: An apparatus is provided for measuring viewing angle characteristic of luminance and positional characteristic of a radiant object under measurement, by moving a condensing device and an imaging device relative to the object. The apparatus includes a first mechanism for moving the light receiving elements of the condensing device while keeping constant the solid angle subtended by the light receiving element at the radiant area. A second mechanism is provided for moving the imaging device in association with the condensing device, while maintaining thereon the image of the radiant area. A memory is provide. A circuit is provided for calculating viewing angle dependent and position dependent characteristics. A display device is provided for displaying radiance characteristic and distribution characteristic of the object and the result of evaluation of the calculated characteristic of luminance.

Abstract: An adaptive optics system configured as an optical phase front measurement system which provides for relatively high resolution sampling as in holographic techniques but without the need for a reference beam. The optical phase front measurement system includes one or more lenses and a spatial light modulator positioned at the focal plane of the lenses and a camera which enables the phase front to be determined from intensity snapshots. The phase front measurement system allows for relatively long range applications with relatively relaxed criteria for the coherence length of the laser beam and the Doppler shift. As such, the system is suitable for a wide variety of applications including astronomy, long range imaging, imaging through a turbulent medium, space communications, distant target illumination and laser pointing stabilization.

Abstract: The invention provides an apparatus and a method for measuring the geometrical structure of an optical component (2) in transmission, comprising the steps:

Abstract: The wavefront sensing device consists of a light source, a binary phase mask (10), a fixed focus lens (11) and at least two finite sized spatially separated detectors (12) positioned in the plane of focus of the wavefront sensing device. The binary phase mask (10) simultaneously applies a positive bias and a negative bias to the wavefront of the incident light such that a pair of spatially separated light points are generated in the plane of focus and detected by the detectors (12). The difference in intensity between the pair of light points is representative of the aberration of the wavefront of the incident light from the ideal.

Abstract: A photomask for aberration measurement of the present invention comprises a substrate that allows exposure light to pass through, a plurality of aperture patterns for measurement that are formed on the top surface of substrate in a plurality of measurement pattern formation regions, a light blocking film that is formed in the measurement pattern formation regions on the rear surface of substrate and that has a rear surface aperture pattern for substantially differentiating the respective incident angles of the exposure light to plurality of aperture patterns for measurement and a plurality of reference patterns that is formed in a single, or in a plurality, of reference pattern formation region(s) on the top surface of substrate, wherein the rear surface of substrate in the reference pattern formation region(s) is formed so that the respective incident angles of the exposure light to plurality of reference patterns becomes the substantially the same.

Abstract: A Correlating Shack-Hartmann wavefront sensor developed for the solar adaptive optics systems. The correlation tracker as an image stabilization technique compares a real time image with a stored reference image using a fast cross-correlation calculation. Trackers of this sort are gradually coming into widespread use at solar observatories. On of their most useful features is their ability to track an extended, low contrast, temporally evolving scene.

Abstract: An optical axis adjusting system for a vehicle head lamp detects the inclination of the front part of a vehicle with respect to a road surface and controls an optical axis adjusting system by an ECU according to the detected inclination to adjust the optical axis of the head lamp. Therefore, the optical axis adjusting system is capable of finding the accurate inclination of the entire vehicle and properly adjusting the optical axis.

Abstract: A method of determining the dimensions of a laser beam spot, comprising: scanning the laser beam in a path across a reference-edge having a photodetector positioned therebehind; and measuring an output signal from the photodetector during the scanning, the output signal corresponding to an area of the laser beam spot incident on the photodetector during the scanning. A method of aligning a laser beam delivery system, the method comprising: positioning a measurement/alignment tool at a target location; firing the laser beam on the tool; observing the laser beam using the tool; and adjusting the system in response to the sensed laser beam.

Abstract: An inspection tool or inspection system can be utilized to determine whether the appropriate pattern is on a reticle. The reticle can be associated with EUV lithographic tools. The system utilizes an at least two wavelengths of light. The light is directed to the reticle at the at least two wavelengths of light.

Abstract: A system for measuring the luminance characteristics of objects, particularly objects with luminance dependent on the emission direction. This system includes an image sensor (8) and optical means (16, 18, 26, 28) provided to form the image of the totality of an object (6) on the sensor and to select, for each point of the object, with a view to forming the corresponding image-point, those of the light rays coming from this point of the object which propagate in a way approximately parallel to the optical axis (X) of the optical means.

Abstract: Methods and apparatus are provided for detection and control of multiple-axis active alignment for a free-space-coupled single-mode fiber-optic transmission system that automatically optimizes the coupling through the system. In a specific embodiment, a measurement of coupled power is made and error signals are used to control actuation via four axes of beam steering elements to null four generally orthogonal alignment errors (combinations of two lateral errors and two angular errors) of the beam between the input and output fibers. The four alignment errors are detected using a synchronous-detection approach. A feedback control system nulls the four errors.

Abstract: A wavefront sensor is provided to determine characteristics of an incoming distorted energy beam, such as a tilt angle and/or a degree of focus. The sensor includes a multi-lens array, a screen, and a beam detector. The multi-lens array focuses the energy beam to a multiple focal points. The screen, positioned adjacent to the multi-lens array, has at least one aperture to allow a portion of the energy beam to pass, while blocking the remainder of the energy beam from arriving at the multi-lens array. Each aperture is aligned with a lens of the multi-lens array. The beam detector detects the resulted focal point(s) of the energy beam passing through the corresponding aperture(s) and determines the characteristics of the passing energy beam. The screen may include a central aperture to measure a local tilt angle of a segment of incoming wavefront entering a lens of the lens array.

Abstract: An optical sampling waveform measuring apparatus can measure waveform of a high-speed signal light P8 sensitively, accurately, and in high time resolution, Raman shift light which is generated from a light pulse having a narrower pulse width than the signal light to be measured is used as a sampling light pulse.

Abstract: A process of measuring the radiant intensity profile of an effective source of a projection image system that has an effective source, an object plane, an imaging objective, an exit pupil, and an image plane. The improved process consists of selecting at least one field point and a corresponding aperture plane aperture and projecting a plurality of images of the selected field point through the corresponding selected aperture plane aperture at a plurality of various intensities of the effective source. By analyzing the recorded images of the effective source at various intensities it is possible to determine a radiant intensity profile of the image source at the selected field point.

Abstract: An optical configuration and related analysis techniques are presented that provide a practical method for determining the Rytov parameter based on the difference of variances for the differential image motion (average wavefront gradient or wavefront tilt) between two receiving apertures. The Rytov parameter is the log-amplitude variance predicted by an approximate solution to Maxwell's equations for propagation through media with random index of refraction (Rytov theory). It is a useful metric of the optical effects for extended turbulence propagation and is a leading indicator of the performance limitations of adaptive optical compensation devices not related to the transverse coherence diameter. A time-duplex alternative apparatus and a single source alternative apparatus are also disclosed.

Abstract: In a shape determining method of a reflective surface 10a of a reflector 1 in a vehicle lamp in such structure that a basic shape thereof is a free-formed surface 20 satisfying shape constraints etc. and that reflective surface elements are assigned to segments obtained by dividing the free-formed surface 20 into an array pattern, a reference plane is defined as a plane opposite to the free-formed surface 20 and normal to the optical axis Ax, and the free-formed surface 20 is projected onto the reference plane to determine the reflective surface. This permits uniform handling independent of the shape of the free-formed surface 20 and thus can simplify design steps and make the resultant shape of the reflective surface suitable. Thus, the reflective surface determining method of the reflector in the vehicle lamp permitting efficient creation of the segments on the free-formed surface and efficient creation of the reflective surface elements assigned to the respective segments can be realized.

Abstract: An image registration detection system in a multicolor marking platform determines registration of non-black colors using either the reflectance or the density of a test pattern as a measurement parameter. A method is also provided to determine the degree of registration error of each non-black color using the density of the test pattern. The present invention encompasses any marking platform that develops multicolor images in color separation layers that are in superimposed registration with one another, including electrophotographic and ink marking platforms. The apparatus and method disclosed require less measurement precision than prior color registration methods. Registration measurements can be performed on images formed on a photoreceptor, images transferred to an intermediate substrate, images transferred to a target substrate, or images fused to a target substrate.

Abstract: The present invention relates to a novel methods and system for measuring multi-segment LED module. The present method utilizes a camera to photograph an image of the multi-segment LED modules, and proceeds an image vector location algorithm in a computer to ensure the bright part of the photographed image could be captured stably and to overcome rotating and shifting problems of the conventional multi-segment LED modules. By the image-processing steps of the present invention, the problems of low throughput and errors occurred in the prior art could be efficiently resolved.

Abstract: Apparatus and method are provided for distance measurement to a remote surface using high frequency modulated transmitted and reflected laser beams and phase-shift calculations. To improve phase-shift resolution, the reflected bean is further modulated, before detection, at a high frequency similar yet different from that of the transmitted beam so as create a resulting detector signal having at least a lower frequency signal which is easily detected by a response limited detector. The lower frequency signal retains the phase-shift information and thus enables determination of the phase-shift information with stable, inexpensive low-frequency optical detectors. Three-dimensional mapping can performed wherein one or more apparatus employ a plurality of detectors or a scanner producing a plurality of sequential reflected beams, each of which results in a plurality of phase-shift information for an area on the surface.

Abstract: Scattered light is detected radiometrically in a photolithography system. A photodetector makes direct measurements of scatter at points in the line or plane of illumination, and a generalized scatter function is derived from these measured data.

Abstract: An apparatus and technique for sensor signal to noise ratio enhancement obtained by co-adding multiple identical images on an electro-optical sensor focal plane. An apparatus and technique for multiple laser source projection onto a target by use of laser diode arrays which are collimated and then diverted to simultaneously illuminate a target.

Abstract: This invention provides a radiation directing device, consisting of a screen having a mirrored surface interrupted by one or more pin holes that pass through the screen, the pin holes having an elliptical shape. The invention further provides an apparatus for determining radiation beam alignment. The apparatus includes (a) a screen having a mirrored surface interrupted by one or more pin holes passing through the screen; and (b) a means for detecting radiation reflected by the mirrored surface, wherein the detecting means determines a position of a radiation beam relative to the pin hole.

Abstract: A method for the determination of the lighting quality of vehicle headlights, particularly automobile headlights, comprising the steps of directing the light of each headlight onto a screen, measuring the distribution of illumination on the screen or the luminous intensity distribution in a solid angle of the emitted light beam, transforming the obtained results by known geometric methods using a computer program to the real distribution of vertical illumination on the road surface, using these transformed results to calculate light quality values such as Mk for the illumination of the road, Nl for the glare experienced by the drivers, k for sector Sk established for the road surface and its surroundings, and l for the sector Sl established for the surface at the eye-level of the glare exposed drivers, and thereafter comparing the calculated light quality values to the required values for headlamps to determine the lighting quality of the vehicle headlights.

Abstract: A wavefront sensor includes a plurality of lenses disposed in the same plane, and an area sensor that receives a bundle of rays of light collected through each of the lenses as a luminous point. Each of the lenses comprises a plurality of concentric areas with different focal lengths, and the area sensor is located substantially halfway between a first position in which a plane wave forms an image after passing through one of the concentric areas with a minimum focal length, and a second position in which the plane wave fronts an image after passing through another area with a medium focal length. With the wavefront sensor thus arranged, the measurement can be always achieved with high accuracy without involving noticeable blurring of luminous points on the area sensor regardless of the wavefront shape of a light beam indent to the lenses.

Abstract: First, the wave-front aberration in an optical system PL subject to measurement is measured using a measuring system 70 according to a usual method. After that, by using calculated correction information for aberration components of a second set of order terms based on a model for the measuring system 70 and aberration components of a first set of order terms measured before, the result of measuring aberration components of the second set of order terms is corrected. As a result, aberration components of the second set of order terms can be accurately obtained, so that the wave-front aberration in the optical system subject to measurement is accurately obtained.

Abstract: There is disclosed a measuring method of illuminance unevenness of an exposure apparatus in which the illuminance unevenness resulting from a projection optical system, to project the light passed through the photomask onto the finite area on the photosensitive substrate via the projection optical system and to expose the photomask to the light, the method comprising calculating an average value of transmittance of the projection optical system of each path of the light emitted from one point of the photomask and reaching an imaging point for each of a plurality of imaging points in the finite area on the photosensitive substrate, and calculating the illuminance unevenness in the finite area on the photosensitive substrate from the average value of the transmittance obtained for each imaging point.

Abstract: An optical system used in an optical measuring apparatus for measuring optical characteristics of, for example, a liquid crystal display panel (LCD panel) guides rays emitted from the LCD panel and having exit angles equal to or smaller than a predetermined maximum exit angle &agr;. A lens of the optical system satisfies the following two equations. f=|2·h/tan &agr;| L=(H−h)·f/H Hereupon, the symbol “f” designates a focal length of the lens; the symbol “h” designates the maximum height of the photosensitive plane of the photosensor from an optical axis of the lens on the photosensing plane; the symbol “L” designates a distance from a principal point of the lens in the image side to the photosensing plane; and the symbol “H” designates the maximum height of the object from the optical axis of the lens.

Abstract: A wavefront sensor for detecting the wavefront produced by light waves from a light source comprises optically refractory or reflective means for receiving the light waves from the light source and producing two defocused pupil images at two different locations along an optical axis. A detector is positioned at a location spaced from the two locations of the two focused pupil images for the detector means to receive and detect two equally and oppositely defocused pupil images. A computer with appropriate software processes the characteristics of the two defocused pupil images from the detector to determine the curvature of the wavefront based on the light intensities with Dirichlet's boundary conditions for the light waves received by the wavefront sensor.

Abstract: An area CCD scanner (image reader) comprises an LED unit (light source), an area CCD and an image-forming lens. The LED unit includes a large number of light emitting elements of each color of blue, green, red and infrared. Light emitted from the LED unit and having passed through a photographic film is received by the area CCD and is converted into an electric signal, which is outputted as photographic image data. When the light source is inspected, a focal point of the image-forming lens is adjusted to a light emitting surface of the LED unit. Then, the LED unit is turned on without setting the photographic film to receive the light thereof with the area CCD. On the basis of the obtained electric signal, a light-emission state of the LED unit is shown on a display.

Abstract: A light or laser beam analyzer, using an imaging formation device such as a CCD video camera is equipped with an attenuating controllable filter or electronic shutter. The incoming beam is imaged several consecutive images each with a different attenuation and the spatial power level distribution on the detector's surface is digitized and transmitted to a host computer for further processing. The host computer will present the power distribution and calculate the beam's profile and the beam's shape.

Abstract: An arrangement for determining the position of a light source includes a light-sensitive detector device and an arrangement for casting a shadow onto part of the light of the light source shining onto the detector device. The shadowing arrangement is formed by at least one rotationally symmetrical body.