Abstract: A method includes, traversing a laser line scanning sensor over a workpiece to generate a series of scan data according to a first set of scan parameters; assembling the series of scan data into a virtual model; detecting a first hole, defining absence of scan data, in a first region of the virtual model; responsive to the first hole defining a dimension less than a threshold dimension, assigning the first set of scan parameters to the first region; detecting a second hole, in a second region of the virtual model; responsive to the second hole defining a dimension greater than the threshold dimension, defining a second set of scan parameters associated with an increased resolution and assigning the second set of scan parameters to the second workpiece region; and compiling the first and second set of scan parameters into a scan protocol defining a minimum scan cycle duration.

Abstract: An apparatus, system and method for measuring straightness of components of rotating assemblies are described. A digital mapping system for measuring the straightness of a shaft of an electric submersible pump comprises a light emitting micrometer. A method for measuring the straightness of components of rotating assemblies comprises providing a controller with acceptable deviation parameters for a component to be measured, surface mapping the component using a light emitting micrometer, electronically identifying bent locations on the component that exceed the acceptable deviation parameters, and measuring circumferentially at the bent locations with the light emitting micrometer to determine the magnitude of the bend. An apparatus for measuring a component of a rotating assembly comprises a light emitting micrometer configured to map the surface of a component and a range finder coupled to the micrometer for determining the location of the micrometer during measurement.

Abstract: A beam reformatter to receive and split a beam into a plurality of beam portions, and further distribute and propagate two or more of the plurality of beam portions in substantially the same direction to create a reformatted composite beam, wherein the plurality of beam portions each contain the same spatial and spectral information as the received beam.

Abstract: An apparatus is operated to determine the location of at least one object on a touch surface of a light transmissive panel. In the apparatus, an illumination arrangement introduces radiation into the panel for propagation by internal reflection between the touch surface and the opposite surface, so as to generate a grid of intersecting radiation paths in a sensing area, and a detection arrangement measures the transmitted energy in the radiation paths. A data processor then determines, based on the transmitted energy, the location based on an attenuation of two or more radiation paths caused by the object touching the touch surface within the sensing area. In the apparatus, the illumination arrangement generates at least a subset of the radiation paths by sweeping at least one beam of radiation along the touch surface.

Abstract: A method and apparatus that linearly scans at least one plane of radiation having a width wider than the diameter of the part onto an exterior side surface of the supported part so that the part occludes the at least one plane of radiation at a plurality of spaced apart locations. The invention includes forming a virtual representation of an outer profile of the part in a reference frame based on the input data and providing a virtual representation of an inner bore of a physical gauge in the reference frame. Then determining an interference position between the part and the gauge using the virtual representations wherein the interference position is a position along the axis where the bore diameter is substantially equal to the part diameter. Finally calculating a distance along the axis based on the interference position and storing the distance.

Abstract: An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NAzoneplate=NAscanner/n and NAdetector=NAscanner/n*?, where NAzoneplate denotes a NA of the zoneplate lens, NAdetector denotes a NA of the detector, and NAscanner denotes a NA of the scanner, ? denotes an off-axis degree of the scanner, and n denotes a reduction magnification of the scanner.

Abstract: An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NAzoneplate=NAscanner/n and NAdetector=NAscanner/n*?, where NAzoneplate denotes a NA of the zoneplate lens, NAdetector denotes a NA of the detector, and NAscanner denotes a NA of the scanner, ? denotes an off-axis degree of the scanner, and n denotes a reduction magnification of the scanner.

Abstract: A method and system for automatically inspecting parts and for automatically generating calibration data for use in inspecting parts are provided. The system includes a support for supporting a part to be inspected and/or a calibration device along a measurement axis. The system further includes a head apparatus including a plurality of radiation plane generators for directing an array of planes of radiation at the part and/or device so that the part and/or device occludes each of the planes of radiation to create a corresponding array of unobstructed planar portions of the planes of radiation. Each of the unobstructed planar portions contains an amount of radiation which is representative of a respective geometric dimension of the part and/or device. The head apparatus further includes a plurality of radiation plane receivers or cameras such as line scan cameras.

Abstract: An apparatus for quickly retaining and releasing parts having a wide range of sizes and designs at an optical measurement station is provided. The apparatus includes a rod having proximal and distal ends. The apparatus further includes a part-engaging first tip attached to the distal end of the rod to move therewith. The apparatus still further includes a part-engaging second tip. The apparatus includes a support structure for supporting the second tip and the rod. The apparatus further includes a quick-release, clamping mechanism for adjustably and releasably clamping the rod to the support structure so that the rod can move the first tip between a part-release position in which a part held between the tips is released for removal from the station and a part-retaining position in which a part is firmly held between the tips. Held parts having a wide range of sizes and designs can be optically measured at the station.

Abstract: A method for absolute position measuring that includes scanning a code having code elements arranged one behind the other in a measuring direction, wherein the code elements include sequential first and second code elements which define a code word containing absolute position information. The method including generating scanning signals within the first code elements and the second code elements. The method further including forming information regarding the sequential first and second code elements from the scanning signals via a reference value and determining the reference value as a function of at least one of the scanning signals within the first code elements and the scanning signals within the second code elements.

Abstract: An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NAzoneplate=NAscanner/n and NAdetector=NAscanner/n*?, where NAzoneplate denotes a NA of the zoneplate lens, NAdetector denotes a NA of the detector, and NAscanner denotes a NA of the scanner, ? denotes an off-axis degree of the scanner, and n denotes a reduction magnification of the scanner.

Abstract: A method for precisely measuring position of a part to be inspected at a part inspection station is provided. The method includes positioning a part having a part axis relative to a measurement axis at the part inspection station and scanning the positioned part with an array of planes of radiation so that the part occludes each of the planes of radiation over a measurement interval of the part to create a corresponding array of unobstructed planar portions of the planes of radiation. Each of the unobstructed planar portions contains an amount of radiation which is representative of a respective geometric dimension of the part. The method also includes measuring the amount of radiation present in each of the unobstructed planar portions to obtain measurement signals and processing the measurement signals to obtain a geometric measurement between the axes at the measurement interval. The geometric measurement may be a distance between the axes or angle between the axes.

Abstract: Disclosed is the use of a focused electromagnetic beam which is caused to impinge on the top surface of a tube shaped sample, to investigate a film coating on its inner surface during fabrication thereof and/or thereafter.

Abstract: A method and inspection head apparatus for optically measuring geometric dimensions of a part are provided. The method optically measures the geometric dimensions of a part having a part axis at an inspection station. The method includes directing an array of spaced planes of radiation at the part so that the part occludes each of the planes of radiation at spaced locations along the part axis to create a corresponding array of unobstructed planar portions of the planes of radiation. Each of the unobstructed planar portions contains an amount of radiation which is representative of a respective geometric dimension of the part. The method further includes measuring the amount of radiation present in each of the unobstructed planar portions.

Abstract: To generate a simulated diffraction signal, one or more values of one or more photoresist parameters, which characterize behavior of photoresist when the photoresist undergoes processing steps in a wafer application, are obtained. One or more values of one or more profile parameters are derived using the one or more values of the one or more photoresist parameters. The one or more profile parameters characterize one or more geometric features of the structure. A simulated diffraction signal is generated using the one or more values of the one or more profile parameters. The simulated diffraction signal characterizes behavior of light diffracted from the structure. The generated simulated diffraction signal is associated with the one or more values of the one or more photoresist parameters.

Abstract: This present invention relates to an apparatus for measuring structural parts which includes a measuring system having at least two sensors for optoelectronic scanning of such a structural part wherein said part and said sensors are movable relatively to each other along a shifting path and wherein said sensors are provided with a radiation source directed to a surface of the structural part and with a receiver, characterized by the fact that at least one sensor is an area sensor adapted to scan one surface section of the structural part (2) in each measuring time interval and/or that at least one sensor is a line sensor adapted to detect one profile line of said structural part in each measuring interval.

Abstract: A method and apparatus for efficiently executing two types of measurements with an optical measuring device and a scanning electron microscope are provided. For example, the method and apparatus may execute the following steps: calculating an average of the dimensional values of a plurality of scanned feature objects; and calculating an offset of a dimensional value on the basis of a difference between the calculated average value and the dimensional value of the feature object obtained when the light is irradiated. The offset between measurement values between the optical measuring device and the scanning electron microscope can be determined precisely.

Abstract: Systems for acquiring an approximation of the surface geometry of a 3-dimensional object include a self-powered wireless, non-contact optical scanner, the location and orientation of which may be tracked with respect to an object coordinate system, and a processor configured for projecting a pattern of structured light on the object, moving the pattern with respect to the object, acquiring images of the intersection of the light on the object over time, determining local coordinates of points on the intersection with respect to the pattern, tracking the position of the pattern, transforming the local coordinates to object coordinates, and accumulating the points as a model of the surface of the object. The systems may wirelessly and possibly compactly transmit geometrical data which characterizes an intersection for a given position of the scanner with respect to the object.

Abstract: An apparatus for the photoelectric measurement of an essentially planar measurement original includes a photoelectric scanner and a positioning arrangement for the two dimensional movement of the scanner over the measurement original positioned on a supporting surface and the positioning at defined measurement locations on the measurement original. The positioning arrangement is constructed as a type of SCARA robot and includes a stationary base, a first and a second movable robot arm and a positioning control. The first robot arm is mounted on the stationary base for rotation by a motor about a first axis of rotation perpendicular to the supporting surface. The second robot arm is mounted at the free end of the first robot arm for rotation by a motor about a second axis of rotation perpendicular to the supporting surface and carries the scanner, and the positioning control is constructed for rotation of the two robot arms according to externally supplied positioning commands.

Abstract: Methods for acquiring an approximation of the surface geometry of a 3-dimensional object include projecting pattern of structured light on the object, moving the pattern with respect to the object, acquiring images of the intersection of the light on the object over time, determining local coordinates of points on the intersection with respect to the pattern, tracking the position of the pattern, transforming the local coordinates to object coordinates, and accumulating the points as a model of the surface of the object. The methods include a step for wirelessly and possibly compactly transmitting geometrical data which characterizes an intersection for a given position of the scanner with respect to the object. Systems for embodying the method include a self-powered wireless, non-contact optical scanner, the location and orientation of which may be tracked with respect to an object coordinate system.

Abstract: An optical measuring device capable of improving the precision of detection of contamination on a protective glass is disclosed. With threshold values as large as 90%, 50%, 10% of a peak value of a scan signal, measured values Q90, Q50, Q10 of a dimension of a work to be measured are derived, respectively. It is determined whether a difference between the measured value Q90 and the measured value Q50 (or a variation of the measured value) is equal to or larger than a predetermined reference value. (B)-(D) show the presence of contamination on the protective glass, equal to or larger than the reference value. (A) shows the absence of contamination, lower than the reference value. It is then determined whether a difference between the measured value Q50 and the measured value Q10 is equal to or larger than a predetermined reference value. (D) shows the presence of thick contamination on the protective glass, equal to or larger than this reference value.

Abstract: An apparatus for measuring sizes of articles including a light projecting device for projecting light toward an article placed on a stationary transparent plate from one side of the plate, a photo-sensor device arranged on the other side of the plate and having plural photo-detectors arranged in array in Y direction to receive light projected from the light projecting device and impinging upon the photo-sensor device without being interrupted by the article, a driving device for reciprocally moving the light projecting device and photo-sensor device relative to the article in X direction perpendicular to the Y direction, and a shifting device for shifting the photo-sensor device in the Y direction between first and second positions which are mutually separated by a half of a photo-detector array.

Abstract: Device measures external and internal dimensions of measurement objects using a light source for illuminating a slit diaphragm, in front of or behind which a spirally slotted disc is arranged, slit diaphragm and disc being rotatable in relation to each other and the disc having a spiral slot intersecting the slit of the slit diaphragm, the interaction of which with the slit creates a hole aperture. Evaluation device measures the time in which the light beams scan the measurement object and determines dimensions from the measured times. To scan the measurement object simultaneously in different spacial planes or in one plane in different axes, several slits are provided in the slit diaphragm. Slits may be disposed radially around axis of rotation. Light source(s) may emit light of one or more wavelengths or different frequency modulated light amplitudes.

Abstract: Systems and techniques for providing an improved coin acceptor are described. In one aspect, an electronic coin acceptor exaggerates relatively small differences in coin diameters. A coin deposited into the coin acceptor passes along a coin path through two sensing beams, with at least one of the beams positioned at a nonperpendicular angle to the coin path. Timing information relating to the coin's passage through the beams is recorded and utilized to identify the coin. In another aspect, the thickness of the coin is determined as the coin passes through the sensing beams.

Abstract: A method and device for fluorimetric determination of a biological, chemical or physical parameter of a sample utilize at least two different luminescent materials, the first of which is sensitive to the parameter, at least with respect to luminescence intensity, and the second of which is insensitive to the parameter, at least with respect to luminescence intensity and decay time. The luminescent materials have different decay times. The time- or phase behaviour of the resulting luminescence response is used to form a reference value for determination of a parameter.

Abstract: The present invention is directed to an apparatus and method for efficiently and accurately sorting spherical objects based on their diameters. The apparatus of the present invention comprises a support frame, an inclined measurement chute having a measurement channel through which a laser beam can be transmitted, a feeder for feeding spherical objects into the measurement chute, a laser micrometer, a plurality of receptacles for receiving the sorted objects, a sorter for directing the objects into one of the plurality of receptacles, and a computer for directing the sorter to place the objects into the appropriate receptacles.