Amplitude Modulation Patents (Class 359/286)
  • Patent number: 5130843
    Abstract: This device comprises a photoelastic interaction medium between an incident light beam (28) and at least one acoustic or sound wave, as well as means (4, 6) for producing the acoustic or sound wave. The interaction medium is a superlattice (18), which is transparent to the light beam and whose period is close to an integral multiple of half the wavelength of the light beam in the superlattice.Application to the production of acousto-optical deflectors and modulators.
    Type: Grant
    Filed: June 14, 1990
    Date of Patent: July 14, 1992
    Assignee: French State represented by the Minister of Post, Telecommunications and Space
    Inventors: Jianjun He, Jacques Sapriel
  • Patent number: 5122897
    Abstract: An optical beam modulating device used for recording halftone plate duplicate images on a recording material including two multi-channel optical beam modulators, each including a rectangular parallelepiped modulator crystal which has a prescribed number of acoustic electrodes installed on one side surface. The electrodes are installed at equal pitch intervals so that Gauss beams can be directed across the electrodes separately from each other, and the positions at which the electrodes of one modulator are installed are shifted by one-half pitch with respect to the positions at which the acoustic electrodes of the other modulator are installed.
    Type: Grant
    Filed: December 16, 1988
    Date of Patent: June 16, 1992
    Assignee: Think Laboratory Co., Ltd.
    Inventor: Hiroshi Taniura
  • Patent number: 5067798
    Abstract: A laser beam scanning system is used as a laser probing apparatus. The apparatus includes an acousto-optic modulator provided on an optical path for intensity-modulating a laser beam in accordance with an input signal, a beam intensity control device for measuring a beam intensity distribution of the laser beam incident on a wafer surface, for correcting the input signal to the modulator as a result of measurement, and for making uniform the laser beam illumination distribution over the wafer surface, and a device for measuring an electrical variation in that wafer pattern portion illuminated with the laser beam.
    Type: Grant
    Filed: February 27, 1989
    Date of Patent: November 26, 1991
    Assignee: Tokyo Electron Limited
    Inventor: Masayuki Tomoyasu