Electron Beam Causes Surface Alteration Patents (Class 359/293)
  • Patent number: 6362807
    Abstract: An image forming sheet is constituted by a sheet-shaped image forming layer for forming thereon a visible image by being applied by any one of an electric field and a magnetic field, and a pair of flexible films for supporting the image forming layer from both surface sides thereof without having an electrode, one of an electric resistance and a magnetic resistance of one flexible file is smaller than that of the other flexible film. As a result, the image formed on this image forming sheet can be confirmed without using a transparent electrode.
    Type: Grant
    Filed: May 28, 1999
    Date of Patent: March 26, 2002
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Tomo Baba, Daisuke Tsuda
  • Publication number: 20010055145
    Abstract: A variable focus position spatial modulator, which has a satisfactory image forming pareformance. The modulator includes: a variable refractive index part that is able to deflect an incident light; element pairs arranged at intervals in a concentric shape or the like generally oppositely to each other with interposition of the variable refractive index part; and a voltage applier for applying a voltage across the elements, wherein width of an element non-opposition region located between element opposition regions is wider than that of each inter-element element opposition region where the elements of each element pair face each other, and wherein the refractive index distribution of the variable refractive index part in the element non-opposition region is varied by the voltage applied to the adjacent element pairs, so that the focal position is varied.
    Type: Application
    Filed: January 11, 2001
    Publication date: December 27, 2001
    Inventor: Masataka Hamada
  • Publication number: 20010055147
    Abstract: A cost-effective tunable optical component uses entropic, rather than enthalpic, materials to provide a compliant member that supports the optical element and is driven by an electrostatic actuator. Entropic materials exhibit an entropic plateau region over a wide frequency range with a Young's modulus much lower than enthalpic materials, linear elastic behavior over a wide deformation range, and, in certain geometries, energy and stress behavior that tend to stabilize the optical element during deformation. The compliant member can be configured in a variety of geometries including compression, tension, tensile/compressive and shear and of a variety of materials including elastomers, aerogels or other long chained polymers.
    Type: Application
    Filed: March 20, 2001
    Publication date: December 27, 2001
    Applicant: Solus Micro Technologies, Inc.
    Inventors: Michael J. Little, Ravi J. Verma
  • Publication number: 20010046080
    Abstract: A retainer is constructed of a retainer top section, a retainer body section and a retainer bottom section. Connecting portions of the sections are screwed by screws provided for the connecting portions with interposition of an O-ring. A mirror having a surface of revolution is mounted on the top portion of the body section. The bottom section is assembled with a mounting base for movably mounting an image pickup device and with a fixture for fixing the image pickup device to the mounting base. There is thus obtained a compact omnidirectional visual angle system, which has a waterproof function and does not interrupt the visual angle and in which the retainer structure of the mirror and the image pickup device, the distance therebetween can be varied, is integrated with an exterior casing for sealing use. The retainer can easy replace the components.
    Type: Application
    Filed: April 30, 2001
    Publication date: November 29, 2001
    Inventor: Kiyoshi Kumata
  • Patent number: 6271957
    Abstract: An improved optical photolithography system and method provides predetemined light patterns generated by a direct write system without the use of photomasks. The Direct Write System provides predetermined light patterns projected on the surface of a substrate (e.g., a wafer) by using a computer controlled component for dynamically generating the predetermined light pattern, e.g., a spatial light modulator. Image patterns are store in computer and through electronic control of the spatial light modulator directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask. Thus, in the Direct Write System each pixel is illuminated with an optical beam of suitable intensity and the imaging (printing) of an individual feature is determined by computer control of the spatial light modulator at each photolithographic step without the use of a photomask.
    Type: Grant
    Filed: May 26, 1999
    Date of Patent: August 7, 2001
    Assignee: Affymetrix, Inc.
    Inventors: Calvin F. Quate, David Stern
  • Patent number: 6134044
    Abstract: A lightweight and low cost replacement display for a conventional cathode-ray tube (CRT) display is provided that projects distortion free digital images directly without conversion to analog signals. The display does not exhibit cross-talk interference when a plurality of displays are placed adjacent one another, and does not present large gaps between adjacent displays. The display utilizes a digital micromirror device that projects a 1:1 bit mapped digital signal to a plurality of micromirrors that are switchable between an on and an off state and projects the image of light reflected from the "on" mirrors onto a direct view screen.
    Type: Grant
    Filed: February 8, 1999
    Date of Patent: October 17, 2000
    Assignee: Diamond Visionics Company
    Inventors: David P. Gdovin, David L. Peters
  • Patent number: 6130770
    Abstract: A grating light valve is configured to either reflect or diffract an incident beam of light from a light source. Each grating light valve includes a plurality of deformable reflective ribbon structures. Preferably, the grating light valve is located within a vacuum chamber. A directable low power electron gun is also positioned within the chamber. To form an image the gun is scanned across an array of grating light valves and selectably irradiates predetermined ones of the ribbons to charge each such ribbon to a predetermined level. Depending upon the amount of charge so deposited onto the ribbon, it will deflect a predetermined distance toward an underlying substrate. The ribbons are preferably erased in one of two ways. According to the preferred embodiment, each ribbon includes a path of impedance to allow the charge to bleed into the substrate. The impedance is selected to discharge a fully charged ribbon in a period of a single frame.
    Type: Grant
    Filed: June 23, 1998
    Date of Patent: October 10, 2000
    Assignee: Silicon Light Machines
    Inventor: David M. Bloom
  • Patent number: 6123985
    Abstract: A membrane-actuated charge controlled mirror (CCM) that exhibits increased deflection range, reduced beam current and improved electrostatic stability is fabricated using a combination of flat panel manufacturing along with traditional MEMS techniques. More specifically, a unique combination of five masking layers is used to fabricate a number of CCMs on a large glass panel. At the completion of the MEMS processing, the glass panel is diced into individual CCMs. Thereafter, the polymer mirror and membrane release layers are simultaneously released through vent holes in the membrane to leave the free-standing CCM.
    Type: Grant
    Filed: October 28, 1998
    Date of Patent: September 26, 2000
    Assignee: Solus Micro Technologies, Inc.
    Inventors: William P. Robinson, LeRoy H. Hackett, Philip G. Reif
  • Patent number: 6038058
    Abstract: A micromirror light valve target configuration that overcomes the problems of limited deflection range, electrostatic and resolution by forming the secondary electron collector grid of a fine conductive mesh and placing it in close proximity to the micromirror array. The source, preferably a fixed beam array, addresses the micromirror array such that it exhibits a secondary emission coefficient less than one to write a negative charge pattern onto the mirrors so that they are attracted to the collector grid. If the anode is also in close proximity to the array, the mirrors can be addressed so that they deflect up toward the grid and down toward the anode thereby increasing the deflection range.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: March 14, 2000
    Assignee: MEMSolutions, Inc.
    Inventors: William P. Robinson, Michael J. Little, Eric A. Gifford
  • Patent number: 6034810
    Abstract: A bright, high contrast, compact, large area, high-resolution light modulator uses a field emitter array (FEA) to address a charge controlled mirror (CCM). The FEA deposits a charge pattern onto the CCM, which in turn produces electrostatic forces that deflect the micromirrors in accordance with the amount of accumulated charge. The CCM that is used in combination with the FEA can be configured in many different ways to implement different actuation modes, e.g. attractive, repulsive, grid-actuated or membrane-actuated and different charge control modes, e.g. RC decay, RC sustain and charge control.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: March 7, 2000
    Assignee: MEMSolutions, Inc.
    Inventors: William P. Robinson, Michael J. Little, Eric A. Gifford
  • Patent number: 6031656
    Abstract: A flat-panel direct view display positions an array of electrostatically-actuated cantilevered micromirrors in front of a contrasting background and opposite a flat-panel electron beam source. Depending upon the display configuration, the electron beam source addresses either the array of micromirrors or a reference surface a row at a time while the other is held at a reference potential. The electron beams modulate the potential difference between each micromirror and the reference surface thereby adjusting the magnitude of the attractive electrostatic force between the two. This in turn modulates the deflection of the micromirrors between their quiescent and fully actuated states to selectively cover and uncover the background thereby producing a grey scale direct-view image.
    Type: Grant
    Filed: October 28, 1998
    Date of Patent: February 29, 2000
    Assignee: MEMSolutions, Inc.
    Inventors: Michael J. Little, William P. Robinson
  • Patent number: 6031657
    Abstract: The present invention provides a Schlieren projection system with a large aperture reflective imager. The combination of a beam-addressed CCM design with flat-panel manufacturing techniques configuration produces a large aperture imager that overcomes the problems of limited deflection range, high beam current, electrostatic instability and limited resolution associated with known electrostatically-actuated micromirror targets. The CCM imager includes a thin insulating membrane that decouples the electron beam from the micromirror array. Decoupling also allows the mirror to be designed to optimize reflectivity, exhibit a higher resonant frequency for better video performance, and be fabricated simultaneously with the hinges. The CCM imager is fabricated using flat-panel manufacturing techniques that are ideally suited to producing large aperture devices at low cost.
    Type: Grant
    Filed: December 9, 1998
    Date of Patent: February 29, 2000
    Assignee: MEMSolutions, Inc.
    Inventors: William P. Robinson, Michael J. Little, Eric A. Gifford
  • Patent number: 6028696
    Abstract: A beam addressed electrostatically-actuated charge controlled mirror (CCM) with frame time utilization approaching 100% is provided by partially coating the CCM's pixelized beam addressing surface with a material having the opposite electron affinity. Each pixel of the pixelized beam addressing surface has first and second portions that exhibit secondary emission coefficients that are respectively less than and greater than one for the same beam energy. A beam or beams that are capable of subpixel resolution selectively address each pixel's first and second portions to control the amount of charge on the pixelized beam addressing surface and its localized potentials.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: February 22, 2000
    Assignee: MEMSolutions, Inc.
    Inventors: William P. Robinson, Michael J. Little
  • Patent number: 5991066
    Abstract: An electrostatically actuated micromirror light modulator that exhibits increased deflection range, better charge efficiency and improved electrostatic stability. A thin insulating membrane decouples the electron beam from the micromirror array inside the vacuum cell. The membrane is just thick enough to stop the incident electrons from penetrating through to the mirrors but is thin enough to maintain resolution of the deposited charge pattern. An equipotential layer beneath the mirror array prevents any attractive force from being developed due to the accumulation of static charge on the surface of the light modulator that may otherwise cause the mirror to snap-over and become stuck to the substrate.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: November 23, 1999
    Assignee: MEMSolutions, Inc.
    Inventors: William P. Robinson, Michael J. Little, Eric A. Gifford
  • Patent number: 5926309
    Abstract: A high intensity light modulator includes a micro-mirror light valve target with electrostatically-repelled micro-mirror elements. Each micro-mirror of the target array comprises a base electrode and an overlying micro-mirror element. In operation, charge is deposited upon the micro-mirrors to produce repulsive electrostatic forces that outwardly deflect the micro-mirror elements by an amount proportional to the deposited charge. In one embodiment, an array of micro-mirror light valves is formed directly upon the face plate of a vidicon tube and is addressed using a scanning electron gun.
    Type: Grant
    Filed: April 29, 1998
    Date of Patent: July 20, 1999
    Assignee: MEMSolutions, Inc.
    Inventor: Michael J. Little
  • Patent number: 5822110
    Abstract: A light valve modulator of reflective operation which includes a multi-layer structure which is controlled electrostatically, comprises a transparent substrate supporting a first transparent deformable layer and a second insulating dielectric deformable layer, with a mirror layer sandwiched between, and a third, dielectric insulating layer on the outside of the second layer, at least one of the layers between the second layer and the substrate being electrically conductive, and the third dielectric layer being capable of receiving an electric charge pattern by means of one or more electron beams, whereby the mirror layer is locally deformed by electrostatic forces occurring between the third layer and the conductive layer.The twin deformably layers allow good sensitivity, while the outside dielectric layer which receives charge from an electron beam protects the deformable layers from electron bombardment and the cathode from outgassing.
    Type: Grant
    Filed: May 13, 1997
    Date of Patent: October 13, 1998
    Inventor: Rad Hassan Dabbaj
  • Patent number: 5784212
    Abstract: A support pillar 426 for use with a micromechanical device, particularly a digital micromirror device, comprising a pillar material 422 supported by a substrate 400 and covered with a metal layer 406. The support pillar 426 is fabricated by depositing a layer of pillar material on a substrate 400, patterning the pillar layer to define a support pillar 426, and depositing a metal layer 406 over the support pillar 426 enclosing the support pillar. A planar surface even with the top of the pillar may be created by applying a spacer layer 432 over the pillars 426. After applying the spacer layer 432, holes 434 are patterned into the spacer layer to remove any spacer material that is covering the pillars. The spacer layer is then reflowed to fill the holes and lower the surface of the spacer layer such that the surface is coplanar with the tops of the support pillars 426.
    Type: Grant
    Filed: July 25, 1996
    Date of Patent: July 21, 1998
    Assignee: Texas Instruments Incorporated
    Inventor: Larry J. Hornbeck
  • Patent number: 5768009
    Abstract: A high intensity image projection system includes a micro-mirror light valve target with micro-mirror elements repulsively pivotally-actuable. Each micro-mirror of the target array comprises a fixed base electrode joined to an overlying micro-mirror element by means of a hinge with each element formed of conductive material. As such, in operation, charge deposited upon either the base electrode or the micro-mirror element is free to migrate, in response to repulsive forces between deposited charges, to the element spaced therefrom. The resulting presence of like charge distributions upon the base electrode and micro-mirror element of a micro-mirror produces a repulsive electrostatic force for pivotally deflecting the micro-mirror element by an amount proportional to the charge deposited thereon. Capacitive charge storage elements and resistive paths are provided for storing and draining the deposited charge between applications of video frame information.
    Type: Grant
    Filed: April 18, 1997
    Date of Patent: June 16, 1998
    Assignee: E-Beam
    Inventor: Michael J. Little
  • Patent number: 5706123
    Abstract: A method of providing control signals for resetting mirror elements (10,20) of a digital micro-mirror device (DMD) having reset groups (FIG. 4), or for resetting moveable elements of other micro-mechanical devices that operate with similar principles. A bias voltage is applied to the mirrors and their landing sites, and an address voltage is applied under the mirrors. (FIG. 3). The address voltage is held at an intermediate level except during a reset period. During this reset period, the address voltage is increased. Also, during reset, the bias applied to mirrors to be reset is pulsed and offset, and the bias applied to mirrors not to be reset is increased. (FIGS. 5 and 6).
    Type: Grant
    Filed: September 27, 1996
    Date of Patent: January 6, 1998
    Assignee: Texas Instruments Incorporated
    Inventors: Rodney D. Miller, Richard O. Gale, Henry Chung-Hsin Chu, Harlan Paul Cleveland, Rabah Mezenner
  • Patent number: 5650881
    Abstract: A support pillar 426 for use with a micromechanical device, particularly a digital micromirror device, comprising a pillar material 422 supported by a substrate 400 and covered with a metal layer 406. The support pillar 426 is fabricated by depositing a layer of pillar material on a substrate 400, patterning the pillar layer to define a support pillar 426, and depositing a metal layer 406 over the support pillar 426 enclosing the support pillar. A planar surface even with the top of the pillar may be created by applying a spacer layer 432 over the pillars 426. After applying the spacer layer 432, holes 434 are patterned into the spacer layer to remove any spacer material that is covering the pillars. The spacer layer is then reflowed to fill the holes and lower the surface of the spacer layer such that the surface is coplanar with the tops of the support pillars 426.
    Type: Grant
    Filed: November 2, 1994
    Date of Patent: July 22, 1997
    Assignee: Texas Instruments Incorporated
    Inventor: Larry J. Hornbeck
  • Patent number: 5557177
    Abstract: A electron beam row at a time addressed storage target includes substrate with a plurality of column electrodes affixed to the substrate by a suitable means. Adjacent column electrodes are displaced by a first period.The target includes a grid for collecting secondary electrons generated by bombarding the secondary electron emission means affixed to the substrate with a plurality of electron beams. Each beam strikes the target at a beam landing area. The beam landing areas of adjacent electron beams are displaced by the first period.The beam landing areas are positioned so each beam landing area is overlapped by a respective column electrode. A respective potential difference is applied between each electrode and the grid. Charge acquired by the target at each beam landing area is dependent upon the respective potential difference applied between the electrode which overlaps the beam landing area and the grid. Charge transfer is an equilibrium process involving secondary emissions.
    Type: Grant
    Filed: January 18, 1994
    Date of Patent: September 17, 1996
    Inventor: Craig D. Engle
  • Patent number: 5471341
    Abstract: A membrane light modulator comprising a charge transfer plate, and having a multiplicity of conductors extending from the rear surface to the front surface of the plate. The conductors are supported in an insulating matrix. The front side of the transfer plate has a plurality of potential wells defined by insulating walls, each potential well constituting a pixel. A plurality of conductors is provided for each pixel. A deformable reflecting membrane comprising a metal layer spans the potential wells. An electric potential is provided on the metal layer, and a source of electrons is provided for impacting the rear surface of the charge transfer plate.
    Type: Grant
    Filed: December 16, 1993
    Date of Patent: November 28, 1995
    Assignee: Optron Systems, Inc.
    Inventors: Cardinal Warde, Thomas N. Horsky, Craig M. Schiller, George J. Genetti
  • Patent number: 5404025
    Abstract: A semiconductor vacuum device including a semiconductor substrate 3, an insulator film 2 formed on the substrate 3, and a single crystal semiconductor film 1 formed on the insulator film 2. The single crystal semiconductor film 1 has a first and a second tapered edge opposite to one another but spaced apart over a gap formed in the insulator film 2. The first tapered edge acts 6 as a cathode and the second tapered edge acts as a gate 7, the substrate 1 acting as an anode into which said electrons emitted from the cathode above.
    Type: Grant
    Filed: April 23, 1993
    Date of Patent: April 4, 1995
    Assignee: NEC Corporation
    Inventor: Keizo Yamada
  • Patent number: 5287215
    Abstract: A membrane light modulator comprising a charge transfer plate, and having a multiplicity of conductors extending from the rear surface to the front surface of the plate. The conductors are supported in an insulating matrix. The front side of the transfer plate has a plurality of potential wells defined by insulating walls, each potential well constituting a pixel. A plurality of conductors is provided for each pixel. A deformable reflecting membrane comprising a metal layer spans the potential wells. An electric potential is provided on the metal layer, and a source of electrons is provided for impacting the rear surface of the charge transfer plate.
    Type: Grant
    Filed: July 17, 1991
    Date of Patent: February 15, 1994
    Assignee: Optron Systems, Inc.
    Inventors: Cardinal Warde, Thomas N. Horsky, Craig M. Schiller, George J. Genetti