Abstract: A near-infrared (NIR) optical shutter comprises a multiple-bandpass filter that is characterized by a bandstop filter region located between first and second bandpass filter regions. The first bandpass filter region passes visible light; the bandstop filter region blocks NIR light of wavelengths within a NIR light sensor band region; and the second bandpass filter region passes NIR light of longer wavelengths than a longer wavelength boundary of the NIR light sensor band region. A polarization state changer positioned between NIR polarizing filters and optically associated with the multiple-bandpass filter causes visible light transmission selectively in first and second light states. The polarization state changer in the first light state causes substantially reduced optical shutter transmission of NIR light in the second bandpass filter region and in the second light state causes substantially increased optical shutter transmission of NIR light in the second bandpass filter region.
Type:
Grant
Filed:
February 14, 2013
Date of Patent:
January 14, 2014
Assignees:
L-C TEC Displays AB, HT, Inc.
Inventors:
Jesper Osterman, Se Jin Kang, Terry J. Scheffer
Abstract: A heat reflector for temporarily covering of a window or a door to reflect sunlight and reduce heat transfer therethrough includes a metallized, biaxially-oriented polyethylene terephthalate sheet. The heat reflector can be sold in kit form comprising the sheet of metallized polyethylene foil; a cutting element for cutting the sheet of metallized polyethylene foil to fit the window or door; a mounting element for temporarily mounting the polyethylene foil layer onto a window or door; and a squeegee for smoothing out the metallized polyethylene foil on the window or door.
Abstract: A low emissivity and EMI shielding transparent composite film typically for use in association with window glazing and comprising a transparent film substrate having on one side thereof an underlayer of abrasion resistant hardcoat material with at least one infrared reflective layer covering the underlayer, typically a metallic layer which may be encased in metal oxide layers, which is then covered with a thin external protective top coat of a cured fluorinated resin.
Type:
Application
Filed:
August 6, 2013
Publication date:
December 26, 2013
Inventors:
Charles Nicholas Van Nutt, James Peyton Enniss, Jaime Antonio Li, Anthony Brian Port, Scott E. Pickett, Jeremy B. Stegall, Coby Lee Hubbard, Rita Maxine Phillips, Steven Allen Barth
Abstract: Conductive nanoshells are oriented so as to redirect incident radiation as a function of wavelength. Nanoshells can be formed on templates such as nanospheres or gratings and embedded in an elastomeric layer. In some examples, conductive nanoshells are coupled to a layer that is configured to unbuckle and buckle as a function of temperature, so that radiation in one or more wavelength ranges is directed differently at different temperatures. Building windows can include such layers to that infrared radiation is reflected on warm days and directed into a building on cool days. Such layers can also direct incident visible radiation to a room ceiling so as to enhance interior lighting.
Abstract: Embodiments disclosed herein relate to a filter (100). In one embodiment, the filter includes a pattern (120). The pattern may reflect or fluoresce non-visible light.
Type:
Application
Filed:
January 28, 2011
Publication date:
December 19, 2013
Inventors:
Daniel I. Croft, Bany T. Phillips, Brad Benson, Cary G. Addington, Angus Wu, Stephan R. Clark, Guy Adams
Abstract: A projection optical apparatus projects an image generated by an image generator onto a projection face by passing the image through a plurality of optical elements and an exit window. The projection optical apparatus includes an invisible-light reduction device to cut invisible light. The invisible-light reduction device prevents intrusion of the invisible light into the projection optical apparatus.
Abstract: Light-reflective structures comprising a binding material configured as an inverse opal having reflections of at least two wavelengths and methods of producing the light-reflective structures are described herein. The wavelengths reflected by the light-reflective structures may be tuned by external stimuli. In an example, silk-fibroin inverse opals have two reflection wavelengths that may be shifted based on changes in humidity.
Abstract: A fluorescence measurement system comprising a broadband light source and acousto-optical turnable filter (AOTF) controlled by a control unit using an acoustic RF signal provided by a Voltage Controlled Oscillator (VCO).
Type:
Application
Filed:
December 12, 2011
Publication date:
December 12, 2013
Applicant:
NKT PHOTONICS A/S
Inventors:
Frederik D. Nielsen, Carsten L. Thomsen, Weidong Sheng, Erik B. Thomsen
Abstract: A UV stable optical element and an LED lamp using such an element are disclosed. Embodiments of the invention include an optical element made at least in part from an inherently UV stable polyester, so that consumable UV-stabilizing additives are not needed. Thus, the substrate of the optical element can maintain transparency and other desirable characteristics over longer periods of time in the face of high ultraviolet light exposure. In some embodiments, the optical element includes the inherently UV stable polyester and a phosphor for remote wavelength conversion. In some embodiments, the UV stable polyester is an aromatic polyester such as polyarylate. The optical element according to example embodiments of the invention can be used in an LED lamp.
Abstract: Methods of forming a sheet glass product comprising a plurality of growth-limited glass bump spacers. According to the methods, a glass pane of the sheet glass product is irradiated with laser radiation to locally heat the glass pane at a plurality of spacer localities and induce growth of a plurality of glass bump spacers in the glass pane. The growth of the plurality of glass bump spacers is limited by utilizing a growth-limiting plate comprising a scattering surface portion. The scattering surface portion of the growth-limiting plate mitigates damage to the growth-limiting plate and may also mitigate damage to the glass pane. Vacuum insulated glass products and systems for forming a growth-limited sheet glass product are also provided.
Type:
Application
Filed:
May 29, 2012
Publication date:
December 5, 2013
Inventors:
Richard Robert Grzybowski, Daniel Ralph Harvey, Alexander Mikhailovich Streltsov
Abstract: Glass formulations and methods of setting the characteristics and formulations are described. The method includes determining climate characteristics of an area in which the glasses to be used, using the climate characteristics to determine heating and cooling costs for the geographical area, using the heating costs as part of a model to select an optimum glass assembly comprising a dual pane glass assembly, using an optimization model by providing higher weighting on low emissivity in a northern climates, and high or waiting of solar control in a more southern climate.
Abstract: There is provided a method for producing a polarizing film having far superior water resistance to conventional polarizing films by contacting a liquid containing cationic polymers with a surface of a polarizing film.
Abstract: A laser scanning microscope has an illumination beam path and a detection beam path. A beamsplitter is provided which reflects the illumination light in direction of the sample and transmits the detection light in direction of the detection arrangement. An additional beamsplitter is provided for reflecting the illumination light and for transmitting the detection light, this additional beamsplitter being arranged in the illumination beam path downstream of the first beamsplitter in the illumination direction, and this additional beamsplitter substantially transmits the illumination light reflected at the first beamsplitter and the detection light, but acquires a wavelength range substantially different from the first beamsplitter with respect to its reflectivity.
Type:
Grant
Filed:
January 21, 2010
Date of Patent:
December 3, 2013
Assignee:
Carl Zeiss Microscopy GmbH
Inventors:
Matthias Danckwerts, Ralf Wolleschensky, Joerg Steinert, Robert Hauschild, Stefan Wilhelm
Abstract: An IR-cut filter includes a substrate and an infrared filtering film. The substrate is made of sapphire, and includes a first surface and a second surface opposite to the first surface. The infrared filtering film covers the first surface of the substrate and increases the reflectivity in relation to infrared light, thus filtering out the infrared light. The infrared filtering film includes a number of first high refraction index layers and a number of first low refraction index layers alternately stacked on the first surface of the substrate.
Abstract: A light splitting and detecting system including at least one light splitting and detecting apparatus is provided. The light splitting and detecting apparatus is capable of receiving a first wavelength optical signal and a second wavelength optical signal. The light splitting and detecting apparatus includes a filter, light detecting unit, a first wavelength filtering unit and a slit. The filter is disposed on the transmission path of the first wavelength optical signal and the second wavelength optical signal. The first wavelength filtering unit is disposed between the filter and the light detecting unit. The slit is disposed between the first wavelength filtering unit and the light detecting unit and expose the light detecting unit.
Type:
Application
Filed:
February 28, 2013
Publication date:
November 28, 2013
Applicants:
ASIA OPTICAL INTERNATIONAL LTD., SINTAI OPTICAL (SHENZHEN) CO., LTD.
Inventors:
Chia-Tse Sun, Kuo-Shun Huang, Chia-Jen Lee
Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising at least one actuator which exerts a controllable force on the optical element; wherein between the actuator and the optical element a mechanical coupling in the form of a pin is embodied in such a way that, relative to the drive axis of the actuator, the ratio of the stiffness of the mechanical coupling in an axial direction to the stiffness in a lateral direction is at least 100; and at least one damping element which brings about a damping of a natural vibration form of the pin in a lateral direction.
Type:
Application
Filed:
July 12, 2013
Publication date:
November 28, 2013
Inventors:
Bernhard Geuppert, Rodolfo Rabe, Ulrich Schoenhoff
Abstract: An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.
Type:
Grant
Filed:
April 2, 2012
Date of Patent:
November 26, 2013
Assignee:
Gigaphoton Inc.
Inventors:
Masato Moriya, Osamu Wakabayashi, Georg Soumagne
Abstract: The present invention relates to a window glass for a vehicle, attached to a body flange of the vehicle at a circumferential edge portion thereof, including: an infrared ray shielding portion which reflects or absorbs infrared rays on a large part of the window; and electromagnetic wave transmitting portions having a substantially rectangular shape, which transmit at least a predetermined electromagnetic wave, at each of lower end portions on both sides in a width direction of the vehicle.
Abstract: An optical element includes a substrate and a film on the substrate. The substrate made of sapphire. The film is configured for increasing transmission of ultraviolet lights. The film is stacked by a plurality of high refractive index layers and a plurality of low refractive index layers alternately stacked on the substrate.
Abstract: An optical element that includes a substrate having two surfaces, each of the surfaces having a micro-relief structure that includes numerous fine protrusions, and a film that includes one or more layers including a metal layer and that is formed on one of the micro-relief structures.
Type:
Grant
Filed:
October 6, 2010
Date of Patent:
November 5, 2013
Assignee:
Nikon Corporation
Inventors:
Yutaka Hamamura, Kiyoshi Kadomatsu, Yasutoshi Takada, Yoshiro Tani
Abstract: A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction.
Abstract: A far infrared reflecting laminate wherein layers [A] to [C] are sequentially arranged in this order: [A] a substrate; [B] a far-infrared reflecting layer having structure [B1] or [B2], [B1] a single layer of a metal containing 95 to 100% by mass of silver; or [B2] a multilayer structure composed of a metal layer containing 95 to 100% by mass of silver and a layer containing a metal oxide and/or a metal nitride and having a refractive index of 1.5 to 3; and [C] a surface hard-coat layer containing a crosslinking resin having one or more polar groups selected from a phosphoric acid group, a sulfonic acid group, and an amide group and having a thickness of 0.4 to 2.0 ?m.
Abstract: A composite infrared target simulation display system for field testing of infrared (IR) search and track, guidance and general sensory systems. The system includes one or more tileable emitter arrays scalable without systemic size limitation. The emitter arrays are square faced tiles housing power and control electronics to autonomously display a stored infrared test image according to parameters distributed by a control host and a timing signal. A face of the emitter array is divided into regularly spaced pixel positions, each made up of multiple IR emitters operating in differing regions of the IR band to display an image. Multiple emitter array tiles are joined to form a complete system. Each emitter of each pixel position is individually addressable to be individually controllable with respect to emittance state for displaying an image. Multiple images may be sequentially displayed to replicate a simulated target signature in motion.
Type:
Grant
Filed:
March 26, 2010
Date of Patent:
October 22, 2013
Assignee:
The United States of America as Represented by the Secretary of the Navy
Inventors:
Deran S. Eaton, Robert M. Daily, Yolanda Torres, Joseph J. Dulcey
Abstract: A method for reducing damage and contamination to an optical element in an extreme ultra-violet (EUV) reticle inspection system, including, presenting an illumination source to a reticle inspection system, and displacing the optical element in the path of the illumination source from a first portion to a second portion, wherein the first portion is damaged and the second portion is not damaged, and the optical element has a plurality of portions.
Abstract: The invention relates to a polycrystalline IR transparent material produced by sintering chalcogenide powder, e.g., ZnS powder, using hot uniaxial pressing followed by hot isostatic pressing. The microstructure of the material described in this disclosure is much finer than that found in material produced using the state of the art process. By using a powder with a particle size fine enough to improve sintering behavior but coarse enough to prevent a lowering of the wurtzite-sphalerite transition temperature, a highly transparent material with improved strength is created without degrading the optical properties. A high degree of transparency is achieved during hot pressing by applying pressure after the part has reached a desired temperature. This allows some degree of plastic deformation and prevents rapid grain growth which can entrap porosity. The crystallographic twins created during this process further inhibit grain growth during hot isostatic pressing.
Type:
Application
Filed:
April 16, 2012
Publication date:
October 17, 2013
Inventors:
Keith Gregory ROZENBURG, Eric Hector URRUTI
Abstract: This invention provides an optical sheet for use in for example a liquid crystal display, which prevents scratching and wet-out due to contact between films and minimizes the drop in performance of the optical sheet due to adhesive stains when an additional protective film is adhered and then peeled off.
Type:
Application
Filed:
December 29, 2011
Publication date:
October 17, 2013
Applicant:
KOLON INDUSTRIES, INC.
Inventors:
Kyung Jong Kim, Chang Won Park, Eui Young Shin, Chang Pyo Hong, Hong Gu Hwang
Abstract: A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees.
Abstract: A glass wafer is provided that is made of a copper ions containing phosphate or fluorophosphate glass. The glass wafer has a diameter greater than 15 centimeters and a thickness of less than 0.4 millimeters. The glass wafer has two plane-parallel surfaces at least one of which is polished.
Type:
Application
Filed:
March 18, 2013
Publication date:
October 10, 2013
Applicant:
Schott AG
Inventors:
Bianca SCHREDER, Jochen FREUND, Ute WOELFEL, Claude MARTIN, Christophe BAUR, Steffen REICHESL, Marc CLEMENT
Abstract: A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
Type:
Grant
Filed:
August 11, 2011
Date of Patent:
October 8, 2013
Assignee:
Intel Corporation
Inventors:
Florence Eschbach, Paul Zimmerman, Alexander Tregub, Fu-Chang Lo
Abstract: A robot navigation system includes a robot, a navigation beacon, and a cover structure. The robot includes a chassis, an omni-directional receiver, and at least one directional receiver. The navigation beacon includes an omni-directional infrared emitter and at least one directional infrared emitter. The cover structure is configured to block infrared transmissions between the at least one directional infrared emitter and the directional receiver while simultaneously permitting transmissions between the omni-directional infrared emitter and the omni-directional receiver. The cover structure may be made of a black silicone material.
Type:
Application
Filed:
March 30, 2012
Publication date:
October 3, 2013
Inventors:
Scott Thomas BURNETT, Jared Randall MAROON
Abstract: An optical element includes a transparent substrate and an infrared absorbing layer on an object-side surface of the transparent substrate. The infrared absorbing layer is a thermo sensitive ink printed or deposited on the transparent substrate. The thermo sensitive ink is cured to blue color.
Abstract: An optical transmission window includes a dielectric substrate that is transparent at an infrared wavelength. A titanium dioxide coating is disposed on an external surface of the dielectric substrate. The titanium dioxide coating has an optical thickness of m plus one-half of the infrared wavelength, where m is a whole number greater than or equal to zero.
Abstract: Methods of measuring a sample characteristic and accessories for infrared (IR) spectrometers are provided. An accessory includes an input port and an output port having an optical path therebetween, a surface plasmon resonance (SPR) structure for contacting a sample, a mirror system, and an optical element for producing collimated light. The SPR structure produces internally reflected light responsive to broadband IR light, modified by a SPR between the SPR structure and the sample. The mirror system directs the broadband IR light from the input port to the SPR structure and directs the internally reflected light from the SPR structure to the output port, producing output light indicative of a characteristic of the sample associated with the SPR. The optical element is disposed along the optical path between the input port and the output port.
Type:
Application
Filed:
July 28, 2011
Publication date:
September 19, 2013
Applicant:
University of Delaware
Inventors:
Karl Booksh, Nicola Menegazzo, Yoon-Chang Kim, Laurel Kegel, Derrick Allen
Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.
Abstract: The present invention relates to a sensor substrate for surface-enhanced spectroscopy, which is transparent in the infrared and/or visible spectral range and is penetrated by a plurality of continuous channels. In the channels, a plurality of metallic nanotubes spaced from one another in the longitudinal direction of the channels are formed as antenna elements by portions of metallic coating. The proposed sensor substrate can be produced with a large area in a simple manner and enables selective adjustment of the plasmon resonance via the length of the antenna elements.
Type:
Application
Filed:
March 7, 2013
Publication date:
September 12, 2013
Applicant:
Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.
Inventor:
Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.
Abstract: A device for collecting EUV light from a plasma generation region includes first and second EUV collector mirrors. The first EUV collector mirror has a first spheroidal reflective surface and arranged such that a first focus of the first spheroidal reflective surface lies in the plasma generation region and a second focus of the first spheroidal reflective surface lies in a predetermined intermediate focus region. The second EUV collector mirror has a second spheroidal reflective surface and arranged such that a third focus of the second spheroidal reflective surface lies in the plasma generation region and a fourth focus of the second spheroidal reflective surface lies in the predetermined intermediate focus region.
Abstract: A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.
Abstract: A screen protector is revealed. The screen protector includes a first microstructure layer, a transparent protective layer, a second microstructure layer, a plurality of ink layer, and a silicone layer. The transparent protective layer is disposed over the first microstructure layer and the second microstructure layer is arranged over the transparent protective layer. The ink layers are stacked in a frame form and disposed over the second microstructure layer. The silicone layer is also a frame arranged over the ink layers. The screen protector provides high anti-glare and anti-reflective effect by the arrangement of the first microstructure layer and the second microstructure layer. Moreover, the screen protector is applied conveniently due to disposition of the ink layers and the silicone layer.
Abstract: Patterning effects on a substrate are reduced during radiation-based heating by filtering the radiation source or configuring the radiation source to produce radiation having different spectral characteristics. For the filtering, an optical filter may be used to truncate specific wavelengths of the radiation. The different configurations of the radiation source include a combination of one or more continuum radiation sources with one or more discrete spectrum sources, a combination of multiple discrete spectrum sources, or a combination of multiple continuum radiation sources. Furthermore, one or more of the radiation sources may be configured to have a substantially non-normal angle of incidence or polarized to reduce patterning effects on a substrate during radiation-based heating.
Type:
Grant
Filed:
January 12, 2007
Date of Patent:
August 20, 2013
Assignee:
Applied Materials, Inc.
Inventors:
Balasubramanian Ramachandran, Joseph Michael Ranish, Aaron Muir Hunter
Abstract: An inspection port, and a housing with an inspection port, for use in inspecting an interior volume are provided. The inspection port has a viewing assembly for rotatable securement about an axis of rotation at an inspection opening of a panel defining a side of an interior volume. The viewing assembly has an inspection enclosure for extending into the interior volume. The inspection enclosure has a region with a window opening having a window axis angled relative to the axis of rotation. The housing has an inspection opening at or over which the inspection port is mounted.
Abstract: Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.
Abstract: An image combiner for a viewing device, such as a night vision device, is disclosed for combining a first image, such as generated symbology, with a second image, such as a view of an outside scene in reduced lighting conditions. A waveguide is provided for capturing the first image from a first viewing direction, and for directing the first image in a second viewing direction, the second viewing direction being substantially coincident with a viewing direction of the second image, such that the first image can combine with the second image. At least a portion of the waveguide is arranged to substantially transmit the second image, such that the second image can pass substantially through the waveguide.
Type:
Application
Filed:
October 13, 2011
Publication date:
August 15, 2013
Inventors:
Michael David Simmonds, Alexander Angus Cameron, Colin Richard Mills
Abstract: The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.
Type:
Grant
Filed:
June 12, 2012
Date of Patent:
August 13, 2013
Assignee:
Gigaphoton Inc.
Inventors:
Masato Moriya, Osamu Wakabayashi, Georg Soumagne
Abstract: Nanostructured photonic materials and associated components for use in devices and systems operating at ultraviolet (UV), extreme ultraviolet (EUV), and/or soft Xray wavelengths are described. Such a material may be fabricated with nanoscale features tailored for a selected wavelength range, such as at particular UV, EUV, or soft Xray wavelengths or wavelength ranges. Such a material may be used to make components such as mirrors, lenses or other optics, panels, lightsources, masks, photoresists, or other components for use in applications such as lithography, wafer patterning, biomedical applications, or other applications.
Abstract: A mirror for EUV radiation includes a mirror body, which has at least one EUV radiation-reflecting region and at least two EUV radiation-permeable regions. A spatial separation of the illumination and imaging beam paths is possible with small angles of incidence and a large object-side numerical aperture.
Abstract: To obtain a water-resistant polarizing film free from deterioration in dichroic ratio caused by water-resistant treatment, it is critical that adjacent sulfonic acid groups or sulfonate groups in the organic dyes to be used for the polarizing film are spaced at moderate intervals.
Abstract: A mirror comprises a doubly curved surface and is formed by pressing or casting. Additionally, a casing comprises a mirror including a doubly curved surface and formed by pressing or casting. An infrared device includes an infrared sensor or an infrared source and a mirror having a doubly curved surface formed by pressing or casting.
Type:
Application
Filed:
May 8, 2007
Publication date:
July 18, 2013
Inventors:
Juergen Huppertz, Bedrich Hosticka, Daniel Wuerfel
Abstract: Various embodiments provide a Cassegrain-like telescope. The Cassegrain-like telescope includes a primary mirror; a secondary mirror spaced apart from the primary mirror, the primary mirror and the second mirror configured to form a focal surface; and an optical aberrations corrector having a plurality of lenses, the optical aberrations corrector being disposed between the secondary mirror and the focal surface, the optical aberration corrector being configured to correct optical aberrations of the primary mirror and the secondary mirror. A material of the plurality of lenses is selected to transmit radiation in a wavelength range between approximately 0.4 ?m and approximately 12 ?m, and is selected to have variations in refractive index below about 0.05 so as to reduce chromatic aberration to a level such that an average root mean square of wave front error (RMS WFE) is less than approximately 0.08.
Abstract: An EUV collector mirror shell of an EUV collector for EUV lithography includes a body which has a light incidence-side front part having a reflective optically active area, a rear part, and a cavity between the front and rear parts. The cavity extends essentially along the entire optically active area, and the cavity serves to receive a cooling medium. The body also has at least one inlet and at least one outlet for the cooling medium. A plurality of flow-influencing elements are in the cavity, extending from the front part to the rear part, and connecting the front part to the rear part and monolithically formed with the front and rear parts.
Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.