Abstract: An optical member is provided for used by a photolithography projection system that has a sub-200 nm wavelength vacuum ultraviolet light source. The optical member includes silica glass that has an ArF excimer laser-induced bulk attenuation coefficient &Dgr;&ggr; that substantially satisfies the equation, &Dgr;&ggr;=ks·&egr;2·P1 when an ArF excimer laser with an energy density less than or equal to about 200 mJ/cm2 per pulse is used for illumination, where ks is less than about 9.1×10−13 cm−1, &egr; is per pulse energy density, P is pulse count, and ks is a proportionality constant.

Abstract: The present invention is directed to a transparent medium incorporating the oxidative polymerization product of 3-hydroxykynurenine, a synthetic version of the yellow-to-brown pigment that occurs in the ocular crystalline lens with age. Because this coloration in the ocular lens is believed to offer photoprotection to the retina, it may represent an ideal sun lens filter with an optical transmission spectrum that is compatible with the psychophysical and neuro-physiological characteristics of the vision system.

Abstract: A multi-layer anti-reflection coating for simultaneously coupling electromagnetic radiation of two different wavelengths, &lgr;1 and &lgr;2, where &lgr;1 is greater than &lgr;2, from a first region into a second region is provided. The first region has an index of refraction that is smaller than that of the second region. The anti-reflection coating comprises three layers: (a) a first layer and a third layer that are essentially invisible to &lgr;1 and serve to reduce Fresnel losses for &lgr;2 and (b) a second layer sandwiched between the first and third layers that serves to reduce Fresnel losses for &lgr;1. The thickness and the index of refraction are calculated for each layer.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: Antireflection multilayer coatings with only three or four layers are proposed for the production of laser resistant optical components with minimal residual reflection and high transparency for UV light in a wavelength range approx. 150 nm to approx. 250 nm at large angles of incidence in the range of approx. 70° to approx. 80°, particularly in the range between approx. 72° and approx. 76°. For incident p-polarized UV light three-layer systems can be used, in which a layer of low refractive material, in particular magnesium fluoride is arranged between two layers of high refractive material and, in the case of the specified wavelength, of minimally absorbent material, in particular of hafnium oxide or aluminum oxide. For example, this allows a residual reflection of perceptibly less than 1% to be achieved in the case of a wavelength of 248 nm at angles of incidence in the range between approx. 72° and approx. 76°.

Abstract: An optical filter including at least one substrate and first and second thin-film interference filters disposed directly on the substrate. The interference filters include a plurality of hard coating thin film layers of alternating high and low index of refraction. A fluorescence spectroscopy system and method of selecting a band of wavelengths from light in a fluorescence spectroscopy system are also provided.

Abstract: The invention provides a radiation sensor including a housing, an attenuator with at least one cavity for attenuating optical radiation, and a detector, as well as an optical attenuator including an attenuator body an entrance with one multi-stage input opening or plural input openings, and means for transferring radiation inside of the attenuator body and then to an detector. The invention further provides methods for using the radiation sensor or the optical attenuator.

Abstract: A method for producing a halftone phase shift mask blank having a semi-transmission film on a transparent substrate includes alternately laminating, on a transparent substrate, thin layers substantially made of nitrogen and titanium and thin layers substantially made of nitrogen and silicon to thereby form thereon a multi-layered semi-transmission film, followed by heating the semi-transmission film at 300° C. or higher.

Abstract: A microscopic image apparatus for converting infrared light into visible light. The microscopic image apparatus includes a sample stage, an infrared source, an object lens for converting infrared light into visible light, a visible light source, a dichroic mirror, a visible light imaging lens and a visible light image capturing device. The object lens further includes an optical crystal and an infrared object lens. After the infrared source outputs infrared light to a sample placed on the sample stage, the object lens converts infrared light spectrum image into visible light spectrum image. Then, the visible light spectrum image is obtained by the visible light imaging lens and the visible light image capturing device.

Abstract: A resonance decoupling device for protecting a human or animal body including a support adapted to be placed in contact with a portion of a body under conditions of use, the support comprising at least one complex of colloidal systems in dispersant phase, the colloidal systems includsing treated and modulated polymers.

Abstract: An amorphous diamond coating applied onto mirrored optics in an infrared motion sensor to block specific wavelengths of energy from a “white light” source like a halogen lamp, without reducing the reflectivity of the mirror surface in the Mid-infrared wavelengths. A specific thickness of diamond-like-coating is applied on top of the reflective metal surface of a mirrored part, thereby reducing the mirror's reflectivity at visible and near-Infrared wavelengths known to be problematic for IR motion sensors, such as those emitted from halogen lamps. The coating has no significant detrimental effect on mid-infrared reflectivity, so the IR motion sensor's performance is otherwise unaffected.

Abstract: The present invention relates to a method of deposition of an absorbing material upon a plastic/glass substrate by vacuum coating at an angle of inclination between 5° to 30° and using a mask on the evaporation source to produce a graded film material and a method for the preparation of graded density absorbing film useful as an antiglare optical device for protecting the eyes by reducing the glare by absorbing the light intensity falling upon it in a non-uniform fashion.

Abstract: An embodiment of the present invention includes an outer capping layer, a multilayer (ML) stack, and an inner capping layer. The outer capping layer is made of an outer material and has an outer thickness. The multilayer (ML) stack is below the outer capping layer. The inner capping layer is made of an inner material and has an inner thickness and is located between the ML stack and a ML reflector. The inner thickness is selected to enable constructive interference between the ML stack and the ML reflector.

Abstract: A reflector assembly for a UV energy exposure system includes a funnel adapted to be connected to a UV energy source to funnel UV energy from the UV energy source longitudinally and a reflector connected to the funnel to redirect the UV energy from the funnel laterally to an object.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: The present invention relates to a method for designing an achromatic lens and a lens according to the design. The invention provides a lens that makes use of the differences in the index of refraction of ZnSe and ZnS in the mm-wave and IR wavebands to minimize the differences in focal position between the two wavebands. This lens train can be used in conjunction with a dual-band focal plane array to simultaneously focus two wavebands on a common focal plane and thus provide for simultaneous imaging in both wavebands.

Abstract: A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or “capping” layer which in combination with incident radiation and gaseous molecular species such as O2, H2, H2O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.

Abstract: The present invention discloses an EUV mask having an improved absorber layer with a certain thickness that is formed from a metal and a nonmetal in which the ratio of the metal to the nonmetal changes through the thickness of the improved absorber layer and a method of forming such an EUV mask.

Abstract: A structured polarizer (linear polarizing filter) with side-by-side in a plane (lateral) regions having different polarization directions, complete extinction and complete transparency, is presented with two superpositioned planes (polarizers) with a polarizer whose surface can be structured. The polarization properties of a plane is structured in such a way and the planes are mutually oriented in such a way that polarizing regions with different polarization directions and/or polarization properties, such as contrast, polarization-direction-dependent absorption properties as a function of the wavelength, and/or non-polarizing regions, such as transparent or opaque and/or regions having a predefined absorption for specified wavelengths are obtained.

Abstract: Multilayer-film mirrors are disclosed that exhibit high reflectivity to incident X-radiation independently of the angle of incidence and without significantly compromising optical performance. Also disclosed are X-ray optical systems and microlithography apparatus comprising such mirrors. In an embodiment a multilayer-film mirror is formed by alternately laminating Mo layers (a material in which the difference between its refractive index in the weak X-ray band and its refractive index in a vacuum is great) and Si layers (a material in which said difference is small) on a substrate. The ratio (&Ggr;) of the thickness of the Mo layer to the total of the thickness of the Mo layer and the thickness of the Si layer has a distribution based on the distribution of angles of incidence of X-radiation on the mirror surface.

Abstract: An optical array containing a system of absorptive filters and a system of interference filters. For the sun light the spectral characteristics of transmission of the optical array is close to the world-wide accepted Diffey Standard. That standard models human skin sensitivity to UV burning. The invention allows making inexpensive, miniature UV sensors that can be applied in miniature devices measuring burning power of UV contained in the sun light.

Abstract: An antireflection film includes alternately deposited high-refractive-index layers and low-refractive-index layers. The refractive indexes and extinction coefficients of the layers are such that the antireflection film exhibits sufficient antireflection characteristics even if the geometrical thickness thereof is small. An optical element having the antireflection film on a substrate exhibits high transmittance and has excellent optical characteristics.

Abstract: One embodiment of the invention provides a system that uses pupil filtering to mitigate optical proximity effects that arise during an optical lithography process for manufacturing an integrated circuit. During operation, the system applies a photoresist layer to a wafer and then exposes the photoresist layer through a mask. During this exposure process, the system performs pupil filtering, wherein the pupil filtering corrects for optical proximity effects caused by an optical system used to expose the photoresist layer.

Abstract: An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength &lgr;0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate

Abstract: The invention provides a UV below 200 nm lithography method. The invention includes providing a below 200 nm radiation source for producing <200-nm light, providing a plurality of mixed cubic fluoride crystal optical elements, with the fluoride crystals comprised of a combination of alkaline earth cations having different optical polarizabilities such as to produce an overall isotropic polarizability which minimizes the fluoride crystal spatial dispersion below 200 nm, transmitting <200-nm light through the cubic fluoride crystal optical elements, forming a lithography pattern with the light, reducing the lithography pattern and projecting the lithography pattern with the cubic fluoride crystal optical elements onto a UV radiation sensitive lithography printing medium to form a printed lithographic pattern. The invention includes making the mixed fluoride crystals and forming optical element therefrom.

Abstract: An exposure apparatus (PE1) and exposure method for use in photolithographically manufacturing devices such as semiconductor devices, image pickup devices, liquid crystal display devices and thin film magnetic heads. The apparatus is capable of transferring onto a substrate (W) the image of a pattern on a reticle (R) and includes a light source (2) capable of supplying an exposure energy beam (IL) with a wavelength under 200 nm, and an illumination optical system arranged to receive the exposure energy beam from said light source. The illumination optical system is designed to guide the exposure energy beam to the reticle. The apparatus also includes a projection optical system (PL) arranged between the. reticle and the substrate. The projection optical system is capable of forming an image of the reticle pattern onto the substrate based on the exposure energy beam passing through the reticle.

Abstract: The present invention provides the use of impact resistant, stress cracking resistant copolycarbonates with particularly good low temperature properties for applications in which particularly good low temperature properties are required, e.g., for automobile construction or external applications, and new copolycarbonates themselves.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: A reflector assembly for a UV energy exposure system includes a funnel adapted to be connected to a UV energy source to funnel UV energy from the UV energy source longitudinally and a reflector connected to the funnel to redirect the UV energy from the funnel laterally to an object.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: An ultraviolet microscope comprises an observation device which observes a specimen with ultraviolet light; a gas supply device which, during the observation with ultraviolet light, supplies an inert gas to surroundings of the specimen; and a timing control device which controls supply timing of the inert gas by the gas supply device, and the timing control device controls the gas supply device so as to cause preliminary supply of the inert gas before the observation of the specimen with ultraviolet light, and also so as to cause regular supply of the inert gas at least during the observation of the specimen with ultraviolet light.

Abstract: A telescope apparatus for celestial observations by a reflecting telescope which is provided with: a first reflecting mirror 3 having its surface 3a coated over the entire area thereof with a grid-like metallic film 10 that reflects radio waves 1 but permits the passage therethrough of infrared and visible rays 2 and having its back 3b coated over the entire area thereof with a full-face metallic film that reflects both of the radio waves 1 and the infrared and visible rays 2; and a second reflecting mirror 4 having its surface 4a coated over the entire area thereof with the grid-like metallic film 10 that reflects the radio waves 1 but permits the passage therethrough of the infrared and visible rays 2 and having its back 4b coated over the entire area thereof with the full-face metallic film 11 that reflects both of the radio waves 1 and the infrared and visible rays.

Abstract: Disclosed is a blank for a halftone phase shift photomask comprising a transparent substrate and a halftone phase shift layer formed thereon, the halftone phase shift layer being provided with a layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen and being formed of a multilayer film with two or more layers, wherein the multilayer film contains a layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy and the layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy is laminated on the side closer to the transparent substrate than the layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen.

Abstract: An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength &lgr;0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate

Abstract: A halftone type phase shift mask blank including, on a transparent substrate, at least a phase shifter film having a predetermined transmittance for an exposed light and a predetermined phase difference for the transparent substrate, wherein the phase shifter film is formed by a multilayer film in which films including at least two layers having an upper layer formed on the most surface side and a lower layer formed thereunder are provided, and a thickness of the upper layer is adjusted in such a manner that a refractive index of the film to be the upper layer is smaller than that of the film to be the lower layer and a surface reflectance for the inspecting light of the phase shifter film is maximized and approximates to a maximum.

Abstract: A night vision system, suitable for vehicular use, including an infra-red detector mounted on a vehicle, a display mounted on the vehicle, a single-element lens mounted upstream of the infra-red detector so as to direct light from a scene onto the infra-red detector, and circuitry operative to receive a detector output from the infra-red detector and to provide an image output based on the detector output to the display. The system is suitable for applications other than vehicular use, where a comparatively narrow field of view is to be imaged.

Abstract: A novel, cost effective optical filter is employed for photosensors used in ultraviolet-based water purification systems. Optically tuned to specifically eliminate the non-germicidal wavelength polychromatic emissions from mercury lamps, this unique optical filter approach significantly reduces the cost in manufacturing reliable water purification systems employing ultraviolet light.

Abstract: The present invention provides an infrared laser optical element, in which a dense optical thin film with a low laser absorption and high moisture resistance is formed on the surface thereof, and a manufacturing method for the same. In this infrared laser optical element, the main surface of the optical substrate is smoothed, a BaF2 film formed on said main surface thereof and then a ZnSe film formed on said BaF2 film. The smoothing treatment for the main surface of the optical substrate is carried out by irradiating Xe gas ion beams. The BaF2 and the ZnSe films formed on said BaF2 film are formed on the main surface of the optical substrate, which has been smoothed, by Xe gas ion assisted vapor deposition. Superior performance can be achieved if the series of treatments are carried out under the specified conditions.

Abstract: Windows for infrared Mid-IR optical systems include thin film materials stretched over a rigid frame. The windows form a barrier between sensitive optics in an optic head and damaging elements of weather and environment. Windows and methods for making windows for free space optics communications systems include use of specialized materials and structural components to form durable inexpensive barriers in agreement with these inventions. Barriers can be used to provide protection of optics contained in an optical transceiver from an atmosphere composed of matter hostile to optics elements. The barrier can operate in conjunction with an enclosure housing to form a complete barrier between those optics and that atmosphere. These windows may be removable from the housing for replacement or maintenance. Advanced versions of these windows may also include specialized condensation prevention means.

Abstract: The present disclosure is directed to an optical filter that advantageously approximates sunlight that is both durable and stable for long periods of time when subject to harsh light intensity, thermal and moisture loads of accelerating weathering devices. The optical filter includes a glass having a lead content of between 0.5% and 50% by weight. In some examples, the filter can be constructed to have a thickness of 0.7 mm to 10 mm. In another aspect of the disclosure, the optical filter is part of an optical filter assembly suitable for manipulating spectral power distribution. The optical filter assembly includes a lead glass optical filter having a lead content of between 0.5% and 50% by weight and an ultraviolet transmissive optical filter. In one example, the ultraviolet transmissive optical filter is constructed from quartz glass. The ultraviolet transmissive optical filter can further include an infrared absorbing coating.

Abstract: A novel, cost effective optical filter is employed for photosensors used in ultraviolet-based water purification systems. Optically tuned to specifically eliminate the non-germicidal wavelength polychromatic emissions from mercury lamps, this unique optical filter approach significantly reduces the cost in manufacturing reliable water purification systems employing ultraviolet light.

Abstract: An optical element suitable for separating and converting directions of polarization, comprising polarization-separating members arranged in a row which extends transversely to an optical principal axis of the optical element for separating incident light from a light source into transmitted light having a first linear direction of polarization and reflected light having a second linear direction of polarization which, on a side facing the light source, is orthogonal to the first direction of polarization, which polarization-separating members have faces extending at an angle to the optical principal axis, while each polarization-separating member has a thickness in the direction of the optical principal axis and a width in a direction transverse to the optical principal axis.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: The invention provides a UV below 200 nm lithography method utilizing mixed calcium strontium fluoride crystals. The invention includes providing a below 200 nm radiation source for producing <200-nm light, providing a plurality of mixed calcium strontium cubic fluoride crystal optical elements, with the fluoride crystals comprised of a combination of calcium strontium cations having different optical polarizabilities such as to produce an overall isotropic polarizability which minimizes the fluoride crystal spatial dispersion below 200 nm, transmitting <200-nm light through the cubic fluoride crystal optical elements, forming a lithography pattern with the light, reducing the lithography pattern and projecting the lithography pattern with the fluoride crystal optical elements onto a UV radiation sensitive lithography printing medium to form a printed lithographic pattern. The invention includes making the mixed fluoride crystals, optical element blanks thereof and optical lithography elements.

Abstract: A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.

Abstract: An exposure apparatus (PE1) and exposure method for use in photolithographically manufacturing devices such as semiconductor devices, image pickup devices, liquid crystal display devices and thin film magnetic heads. The apparatus is capable of transferring onto a substrate (W) the image of a pattern on a reticle (R) and includes a light source (2) capable of supplying an exposure energy beam (IL) with a wavelength under 200 nm, and an illumination optical system arranged to receive the exposure energy beam from said light source. The illumination optical system is designed to guide the exposure energy beam to the reticle. The apparatus also includes a projection optical system (PL) arranged between the reticle and the substrate. The projection optical system is capable of forming an image of the reticle pattern onto the substrate based on the exposure energy beam passing through the reticle.

Abstract: An optical assembly is provided that allows a user to view objects with normal perspective and scale under conditions of total darkness, in daylight, or other conditions limiting normal vision, or adverse weather conditions. The optical assembly includes a white light flashlight, with a filter cap mounted to the illuminating end of the flashlight. The filter cap permits infrared light in the appropriate range of 900 to 1200 nanometers to pass through. The optical assembly further includes a camera pack including a camera, and preferably including a transmitter. Said camera pack attached to the flashlight and in communication with a display mounted to a head gear worn by the user so that the screen of the display is directly in front of an eye of the user. The camera lens of the camera pack and the illuminating end of the flashlight are aligned along a single linear optical axis. The camera pack communicates with the display via a communication means when wireless communication is not preferred.

Abstract: A novel, cost effective optical filter is employed for photosensors used in ultraviolet-based water purification systems. Optically tuned to specifically eliminate the non-germicidal wavelength polychromatic emissions from mercury lamps, this unique optical filter approach significantly reduces the cost in manufacturing reliable water purification systems employing ultraviolet light.

Abstract: An optical film which comprises a transparent resin layer (1) made of a photo-curable resin having a self-healing property, an antireflection layer (2) present on one side of the transparent resin layer (1), and a color tone correcting layer (3) containing a colorant which has a color tone correcting property, present on the other side of the transparent resin layer (1) opposite from the antireflection layer (2).