Abstract: A head-up display (HUD) system is provided. The HUD system comprises a microdisplay-based projection system, a diffuser, a relay optical system, and a combiner. The microdisplay-based HUD system includes aberration correction capabilities and may easily and effectively replace a CRT-based HUD system in aircrafts while providing light-weight, multi-color, superior imaging capabilities with a large field-of-view.

Abstract: A projection objective has an object surface and an image surface. The projection objective includes a plurality of optical elements arranged along an optical axis and configured so that during operation the projection objective images a pattern arranged in the object surface onto the image surface. The optical elements include a concave mirror a first deflecting mirror and a second deflecting mirror. The first deflecting mirror is tilted relative to the optical axis by a first tilt angle, t1, about a first tilt axis so that during operation the first deflecting mirror deflects light at a wavelength ? from the object surface towards the concave mirror or deflects light at ? from the concave mirror towards the image surface. The second deflecting mirror is tilted relative to the optical axis by a second tilt angle, t2, about a second tilt axis.

Abstract: Disclosed is a projection optical system including a first optical system configured to form a first image conjugate to an object and have an optical axis and a second optical system configured to project a second image conjugate to the first image onto a surface to be projected on, wherein the first image satisfies a condition of: Im×Tr?1.70 wherein Im denotes a length of the first image in a direction of an optical axis of the first optical system, normalized by a focal length of the first optical system, and Tr denotes a throw ratio for the projection optical system.

Abstract: A projection optical system for use in an image display apparatus having an illumination optical system applying light from a light source, and an image display device receiving the light from the illumination optical system to form a projection image includes a projector lens composed of plural lenses, a first mirror, and a second mirror formed of a concave mirror. The projection optical system is configured to project the projection image onto a projection surface. A projection luminous flux passing through the projector lens to be incident on the first mirror is a luminous flux exhibiting divergence. The projection luminous flux reflected off the second mirror after having reflected off the first mirror is converged once, and the once converged projection luminous flux is projected onto the projection surface. A lens surface of a lens located closest to the first mirror among the lenses of the projector lens is convex.

Abstract: The catadioptric system includes a first imaging optical system collecting light from an object and a second imaging optical system causing the light from the first imaging optical system to form an intermediate image and to cause the light from the intermediate image to form an optical image. The first imaging optical system includes a first optical element including a first light transmissive portion and a first back reflective portion, and a second optical element including a second light transmissive portion and a second back reflective portion. The first light transmissive portion, the second back reflective portion, the first back reflective portion and the second light transmissive portion introduce the light from the object to the second imaging optical system. The second imaging optical system includes an aspheric lens having a negative refractive power on and around the optical axis and a positive refractive index in its peripheral portion.

Abstract: A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit.

Abstract: An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength ? includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion ?ni=ni(?0)?ni(?0+1 pm) for a wavelength variation of 1 pm from a wavelength ?0. The objective satisfies the relation ? ? i = 1 N ? ? ? ? n i ? ( s i - d i ) ? ? 0 ? NA 4 ? A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.

Abstract: The invention proposes a short-distance front projection system, that is to say with a wide angle, occupying a small volume and offering a possibility of focusing as well a zoom function. It makes it possible to obtain images with a diagonal greater than 2 metres, the whole of the optical system being at least 50 cm from the plane of the image. This projector is constructed on the basis of three optical elements: an ocular, an afocal lens system and a final group forming an objective intended to form the intermediate image in front of the mirror.

Abstract: A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a linear polarization.

Abstract: An optical instrument that includes: an objective lens having an outer convex surface, an inner concave surface, a center, a first optical axis, and a bore cut substantially though the center; a set of objective lenses positioned within the bore and along the first optical axis; a first reflective element disposed along the first optical axis, within a first distance from the convex surface and tilted at a first tilt angle, the first reflective element configured to reflect rays incident along the first optical axis onto a second optical axis; and a second reflective element disposed along the second optical axis and within a second distance from the concave surface, wherein the first tilt angle is selected such that the first and the second distances are minimized.

Abstract: The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

Abstract: An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength ?0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.

Abstract: A wide angle catoptric telescope comprises five successive off-axis mirrors. The first mirror or entrance mirror of the five mirrors is concave. The entrance pupil of the telescope is real and situated in front of this said first mirror. The second and the fourth mirror are convex. The third and the fifth mirror are concave. The optical combination is telecentric, and the image field is plane.

Abstract: A viewing device includes an interior assembly includes an interior frame having an exterior surface, an exterior assembly coupled to the interior assembly including an exterior lens, the exterior lens having an interior surface, wherein the interior surface of the exterior lens faces the exterior surface of the interior frame. The viewing device includes a reflective surface on the exterior lens, and an object located on the interior assembly adapted to project an image onto the reflective surface. The reflective surface is configured to reflect the projected image toward the interior assembly.

Abstract: An optical assembly for a system for inspecting or measuring of an object is provided that is configured to move as a unit with a system, as the system is pointed at a target, and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the system. The optical assembly comprises catadioptric optics configured to fold the optical path of the pointing beam and measurement beam that are being directed through the outlet of the system, to compress the size of the optical assembly.

Abstract: A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.

Abstract: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.

Abstract: A projection optical system for projecting an image on a surface is provided. The image is an enlarged image of an image which is formed on an image forming element. The projection optical system includes a coaxial optical system having an optical axis; and a non-coaxial optical system including a rotationally asymmetric curved-surface mirror. The non-coaxial optical system does not share the optical axis with the coaxial optical system. The coaxial optical system includes a first lens having a positive refractive power and being an aspheric plastic lens; and a second lens having a negative refractive power and being an aspheric plastic lens. The first lens has a first refractive index distribution, and the second lens has a second refractive index distribution.

Abstract: The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

Abstract: Provided is a projection optical system for an ultra-short focus image projection device. The disclosed projection optical system includes a first optical system for zooming an image formed by an image display device to form a first intermediate image, a second optical system for enlarging the first intermediate image to form a second intermediate image, and a reflection optical system for reflecting light which forms the second intermediate image. An optical axis of the first optical system translates parallel with respect to an optical axis of the second optical system in a direction perpendicular to the optical axis of the first optical system.

Abstract: An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.

Abstract: An imaging optics has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. A pupil plane is arranged in the imaging beam path between the object field and the image field. A stop is arranged in the pupil plane. The pupil plane is tilted at an angle (?) with respect to the object plane, where ? is greater than 0.1°. The imaging optics results allows for a manageable combination of small imaging errors, manageable production and good throughput.

Abstract: A telescope imaging system includes a first lens group for receiving a spot light and generating a first refracted beam, a second lens group for receiving the first refracted beam and generating a second refracted beam, a third lens group having a convex lens disposed at a side of the third lens group distant from the spot light for receiving the second refracted beam and generating a parallel beam by an effective focus formed by the first lens group, the second lens group and the third lens group, a first reflective mirror having an opening, receiving the parallel beam and generating a reflected beam, and a second reflective mirror adjacent to the third group lens and reflecting the reflected beam for allowing the reflected beam passing through the opening and focused as an image.

Abstract: A catadioptric optical system having a high numerical aperture operates in a wide spectral range. The catadioptric system includes a correcting plate and an optical system. The correcting plate conditions electromagnetic radiation to correct at least one aberration. The optical system reflects a first portion of the conditioned electromagnetic radiation, refracts a second portion of the conditioned electromagnetic radiation, and focuses the reflected first portion of the conditioned electromagnetic radiation onto a target portion of a substrate. The first portion of the electromagnetic radiation is not refracted by an optical element, allowing the catadioptric optical system to operate in a broad spectral range.

Abstract: A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror. A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided.

Abstract: A projection optical system for magnifying an image on a primary imaging plane onto a secondary imaging plane includes a first optical system for forming an intermediate image and a second optical system including a concave reflecting surface disposed between the intermediate image and the secondary plane. The first optical system includes first and second groups respectively having negative and positive power, an aperture, and a third group having positive power from the intermediate image. The surfaces of the first and second optical systems have rotational symmetry about a light axis. A ray traveling from the center of the primary plane to the center of the secondary plane intersects the light axis, is reflected off the reflecting surface, intersects the light axis again, and reaches the secondary plane. The following conditions are satisfied: 0.5<?1/?2<3, 1<AST/ASS<5,|AST|/L12<1, and ?3<K_rel.

Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.

Abstract: A luminous flux optically modulated by an image display device is projected to be magnified on a screen by a projection optical system includes: a first optical system having a positive first lens group including eight lenses, a negative second lens group including three lenses, and a third lens group including an aspheric single lens; and a second optical system including an aspheric reflecting mirror. The projection optical system is an off-axial optical system, and forms the intermediate image between the first optical system and the second optical system. Moreover, the expressions T1/Y<12.5 and T12/f1<6.0 are satisfied where T1 is the overall length of the first optical system, Y is the maximum light ray height on an image display device, T12 is the distance between the first optical system and the second optical system, and f1 is the focal length of the first optical system.

Abstract: A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the optical elements at prescribable positions along an imaging beam path of the projection objective. Each of the optical elements has an optical useful region lying in the imaging beam path and an edge region lying outside the optical useful region. At least one holding element of the holding device assigned to the optical element acts at the edge region in the region of a contact zone. At least one of the optical elements is assigned a diaphragm arrangement with a false light diaphragm arranged directly upstream of the optical element and a second false light diaphragm arranged directly downstream of the optical element.

Abstract: A luminous flux optically modulated by an image display device is projected to be magnified on a screen by a projection optical system includes: a first optical system having a positive first lens group including eight lenses, a negative second lens group including three lenses, and a third lens group including an aspheric single lens; and a second optical system including an aspheric reflecting mirror. The projection optical system is an off-axial optical system, and forms the intermediate image between the first optical system and the second optical system. Moreover, the expressions T1/Y<12.5 and T12/f1<6.0 are satisfied where T1 is the overall length of the first optical system, Y is the maximum light ray height on an image display device, T12 is the distance between the first optical system and the second optical system, and f1 is the focal length of the first optical system.

Abstract: A fixed-focus lens adapted to be disposed between a primary image side and a second image side is provided. The fixed-focus lens includes a second lens group, a first lens group, and a curved reflector arranged in sequence from the primary image side to the second image side. The second lens group includes a first lens, a second lens, and a third lens arranged in sequence from the primary image side to the second image side. The first lens and the third lens have positive refractive powers and each of the first lens, the second lens, and the third lens is a spherical lens.

Abstract: The optical system includes: a first optical group which performs a zoom function using a first movable lens, a second optical group which performs a focus function using a second movable lens, and a third optical group which performs a wide angle function by reflecting light passing through the first optical group and the second optical group, wherein a first intermediate image is formed between the first optical group and the second optical group.

Abstract: In general, in one aspect, the invention features a catadioptric projection objective having a plurality of optical elements arranged along an optical axis to image a pattern arranged in an object surface of the projection objective onto an image surface of the projection objective. The optical elements include a concave mirror, a first deflecting mirror tilted relative to the optical axis and a second deflecting mirror. The catadioptric projection objective can image patterns including sub-patterns oriented in various directions such that line width variations due to differences of orientation of sub-patterns are largely avoided.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax (Y??NA2) and wherein the condition COMP1<10 holds.

Abstract: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

Abstract: The present invention relates to an image generating apparatus (1) which comprises an illumination unit (20) having an intermediate face (21, S), as well as an image modulator (30) for generating an image (I). In addition a deflecting means (10) for deflecting a received light beam (L) of primary illumination light (L1) to said illumination unit (20) is provided in order to irradiate said intermediate face (21, S). Said deflecting means (10) is adapted to have—during the process of irradiating said intermediate face (21, S)—said light beam (L) subsequently in time irradiate different portions of said intermediate face (21, S) in order to thereby reduce the speckle effect.

Abstract: Projection objectives, projection exposure apparatuses and related systems and components are disclosed.

Abstract: A projection system includes: a relay system that focuses light having exited through a first image plane on a second image plane; and an enlarging system that enlarges and projects an image focused on the second image plane on a third image plane, wherein the relay system includes a first lens element on which the light having exited through the first image plane is incident, the first lens element having positive refracting power, a reflective member that reflects a light having passed through the first lens element, the reflective member having positive refracting power, and a second lens element on which a light reflected off the reflective member is incident and which focuses the light reflected off the reflective member on the second image plane, the second lens element having positive refracting power.

Abstract: A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |?|<1. The optical elements form a dry objective adapted with regard to aberrations to a gaseous medium with refractive index n?<1.01 filling an image space of finite thickness between an exit surface of the projection objective and the image surface. The optical elements include a largest lens having a maximum lens diameter Dmax and are configured to provide an image-side numerical aperture NA<1 in an effective image field having a maximum image field height Y?. With COMP=Dmax/(Y?·(NA/n?)2) the condition COMP<15.8 holds.

Abstract: There is provided a type judgment device capable of rapidly and safely identifying the type of an optical disc while preventing unexpected information recording or information erase. An optical beam as parallel light is applied in a circular polarized state to an optical disc having recording tracks and the polarization characteristic in the reflected light is detected. According to the detected polarization characteristic, the type of the disc is judged in accordance with the interval of the adjacent recording tracks.

Abstract: Various embodiments provide a flat field Schmidt-type telescope including a spherical primary mirror, an aspheric correcting plate spaced apart from the primary mirror, a detector disposed between the primary mirror and the corrector plate, and a field lens disposed between the primary mirror and the detector. The field lens is configured to reshape a curved field plane formed by the primary mirror into a flat field plane. A material of the field lens is selected to transmit in the infrared wavelength range (e.g., SWIR and/or MWIR) and is selected to have a desired refractive index so as to achieve a field of view (FOV) of the telescope greater than approximately 10 degrees.

Abstract: A reduction projection objective for projection lithography has a plurality of optical elements arranged along an optical axis and designed for imaging an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio. The optical elements include at least one concave mirror. The optical elements are designed to provide an image-side numerical aperture NA>0.6 in a large effective image field having a maximum image field height Y?>25 mm. A compact, low mass projection objective enabling high throughput of exposed substrates is thereby obtained.

Abstract: A projection optical system for use in an image projection apparatus illuminating a lightbulb forming an image in accordance with a modulating signal with illumination light from a light source is disclosed. The projection optical system includes first and second optical systems arranged along an optical path defining an upstream-downstream direction in the order described from upstream to downstream on the downstream side of the lightbulb. The first optical system includes at least one dioptric system and has positive power. The second optical system includes at least one reflecting surface having power and has positive power. The image formed by the lightbulb is formed as an intermediate image in the optical path, and the intermediate image is magnified and projected.

Abstract: System and method for thin projection display systems. An embodiment comprises a light source, an array of light modulators optically coupled to the light source, a lensed mirror optically coupled to the array, and a controller electronically coupled to the array and to the light source. The array produces images on a display plane by modulating light from the light source based on image data and the controller provides light commands to the light source and load image data into the array. The lensed mirror reflects modulated light from the array onto the display plane, the lensed mirror comprising a refractive portion and a reflective portion. The refractive portion of the lensed mirror helps to increase the light bending capability to help reduce the overall thickness of a projection display system.

Abstract: Disclosed are a projection optical system that has a sufficiently small size to be provided in a front-projection-type projector and can effectively correct various aberrations and a projection display device using the same. An original image on an image display surface is enlarged and projected onto a screen by a first optical system that includes a plurality of lenses and a second optical system that includes a reflecting mirror having a concave surface with an aspheric shape. All of the optical surfaces of the first optical system and the second optical system are rotationally symmetric surfaces each having the optical axis common to all of the optical surfaces as its center. A first lens surface, which is a reduction-side surface, and a second lens surface, which is a magnification-side surface, of a lens (fourteenth lens) closest to a magnification side in the first optical system satisfy predetermined conditional expressions.

Abstract: An observation optical system includes, in order from a sample side, an infinity-corrected objective, a first lens group having a positive power, a second lens group having a positive power, and a tube lens having a positive power. An intermediate image is formed between the first lens group and the second lens group, and at a front side focal position of the second lens group. A space along an optical axis between the objective and the first lens group is configured to be changeable, and a space along an optical axis between the second lens group and the tube lens is configured to be changeable.

Abstract: A relatively high NA objective employed for use in imaging a specimen is provided. The objective includes a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. One or more elements may employ an aspheric surface. The objective may provide an uncorrected spectral bandwidth up to approximately 193 to 266 nanometers and numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may include more than one lens and may be formed of a material different from at least one other lens in the objective.

Abstract: A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1.

Abstract: An imaging system. An array of light sources and an array of lenses corresponding to the light sources and having optical axes substantially parallel to one another are provided. The lenses produce collimated output beams. An afocal optical relay having an optical axis substantially parallel to the optical axes of the lenses is also included, the array of lenses being positioned relative to the afocal optical relay so as to form an optical system that produces an image of each collimated output beam on an image plane, each image having a prescribed depth of focus and spot size. The light sources preferably are lasers producing an array of respective laser beams having high intensity and a long waist. A system for writing information on a light-sensitive label includes the imaging system. Methods of imaging and of writing information on a light-sensitive label are also provided.

Abstract: An aspheric reduction objective has a catadioptric partial objective (L1), an intermediate image (IMI) and a refractive partial objective (L2). The catadioptric partial objective has an assembly centered to the optical axis and this assembly includes two mutually facing concave mirrors (M1, M2). The cutouts in the mirrors (B1, B2) lead to an aperture obscuration which can be held to be very small by utilizing lenses close to the mirrors and having a high negative refractive power and aspheric lens surfaces (27, 33). The position of the entry and exit pupils can be corrected with aspherical lens surfaces (12, 48, 53) in the field lens groups. The number of spherical lenses in the refractive partial objective can be reduced with aspherical lens surfaces (66, 78) arranged symmetrically to the diaphragm plane. Neighboring aspheric lens surfaces (172, 173) form additional correction possibilities.