Abstract: An imaging optical system includes a set of mirrors including at least three mirrors on a beam path. Only a last mirror on the beam path has a positive optical power and all other mirrors have negative optical power. The sum of the optical powers of the mirrors is zero. An external posterior aperture stop is on the beam path between the last mirror and the image plane. A back focal length of the optical system is equal to or greater than an effective focal length of the optical system. The field of view is large, and typically at least 30-40 degrees in one plane.

Abstract: Disclosed is a light collimating system for mounting at the primary focus of a Schmidt-Cassegrain telescope (SCT) in place of the secondary mirror. The system comprises a housing containing a plurality of lens elements optimized to reduce optical aberrations. The resulting system has a focal ratio of approximately f/2, a short exposure time for optical imaging, and a wide field of view with very little distortion. The housing is attached to the corrector plate of the SCT by a pair of rings held together by a plurality of screws that further facilitate the alignment and rotation of the light collimating system.

Abstract: A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.

Abstract: An apparatus for the focusing of incident light includes a base assembly that is adapted to support a primary mirror. The primary mirror includes an outside circumference and an inside aperture. An upright member is attached to the base assembly at a first end thereof at a first location that is disposed inside the aperture and at a second location that is disposed outside the primary mirror. The upright member includes a second end that is distally disposed with respect to the first end. The second end is adapted to receive a turret that includes a secondary mirror and is adapted to pivot between two positions. An IMU is attached to the base assembly proximate the primary mirror.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: A wide-angle imaging optical system includes a refractive optical system (3), a reflective optical system, and an image-forming optical system (5). The reflective optical system includes a first reflection surface (1) that directly reflects rays of light from an object, and a second reflection surface (2) that reflects rays of light from the first reflection surface (1). An open portion is provided between the first reflection surface (1) and the second reflection surface (2), and rays of light from the object enter the open portion. A light-transmitting portion (2a) is provided in the second reflection surface (2) and transmits rays of light that have entered the refractive optical system (3). An aperture (1a) is provided in the first reflection surface (1) and allows rays of light from the second reflection surface (2) and the refractive optical system (3) to enter the image-forming optical system (5).

Abstract: An optical imaging apparatus comprising an aspheric objective configured to receive optical radiation from an object and an optical sensing device. The aspheric objective comprises a first reflective aspheric mirror and a second reflective aspheric mirror optically coupled to the first reflective aspheric mirror such that optical radiation received from the object is reflected by the first reflective aspheric mirror to the second reflective aspheric mirror. The optical sensing device disposed adjacent to a non-reflective side of the first aspheric mirror and configured to render digitized images of reflected optical radiation representative of the object.

Abstract: A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light path is provided via the eight mirrors, and in the light path exactly one intermediate image of the object field is provided.

Abstract: An adjustable mirror includes first and second fluids in contact over a meniscus extending transverse an optical axis. The fluids are substantially immiscible and have different indices of refraction. A reflective surface extends transverse the optical axis. A meniscus adjuster is arranged to controllably alter at least one of the shape and the position of the meniscus.

Abstract: An optical projection system which creates pincushion distortion of an image and then creates a barrel distortion of the pincushion-distorted image to compensate for the pincushion distortion and then projects an enlarged image without substantial distortion onto an image display surface. An embodiment includes a polynomial reflector to compensate for the pincushion distortion, to enlarge an image, and to project the enlarged image toward a screen.

Abstract: An optical sheet includes a substrate onto which light is incident, and a convex part protruded from the substrate by a predetermined thickness. A thickness of the convex part increases from an edge to a center thereof.

Abstract: A correct image reflecting telescope with zoom capability comprised of a flat mirror, a parabolic primary mirror, and an image correcting system. The flat mirror reflects the incoming light from the telescope aperture into the parabolic primary mirror. The reflected light from the primary mirror passes back through a small centrally located opening in the flat aperture mirror and into an image correcting lens system. The image correcting system repositions the focal point of the primary mirror from a point in front of the flat aperture mirror to a point behind this mirror for observation with and eyepiece. The image correcting system makes the telescope useful in terrestrial as well as celestial applications and it can be moved with respect to the primary mirror such that a zoom feature results.

Abstract: A projection optical system is provided for projecting a pattern on an object plane onto an image plane in a reduced size. The projection optical system has six reflective surfaces that include, in order of reflecting light from the object plane, a first reflective surface, a second convex reflective surface, a third convex reflective surface, a fourth reflective surface, a fifth reflective surface and a sixth reflective surface. An aperture stop is provided along an optical path between the first and second reflective surfaces. The following condition is met by the system, where L1 is an interval between the object plane and the surface apex that is the closest to the object plane, and L2 is an interval between the surface apex of the first reflective surface and the surface apex that is the closest to the object plane: 0.75 < L ? ? 1 L ? ? 2 < 1.25 .

Abstract: A wide field of view telescope having two concave and two convex reflective surfaces, each with an aspheric surface contour, has a flat focal plane array. Each of the primary, secondary, tertiary, and quaternary reflective surfaces are rotationally symmetric about the optical axis. The combination of the reflective surfaces results in a wide field of view in the range of approximately 3.8° to approximately 6.5°. The length of the telescope along the optical axis is approximately equal to or less than the diameter of the largest of the reflective surfaces.

Abstract: A cylindrical body of a Newton reflective telescope includes a first cylindrical body and a second cylindrical body combined together. The first cylindrical body has an eyepiece fixed on an outer surface, and a reflective mirror fixed in its interior. A joint member is connected between the first and the second cylindrical body to enable the first cylindrical body to rotate relative to the second cylindrical body as a pivot in such a way that the first and the second cylindrical body have coincident center axes. Therefore, a person other than a first user can also look in the eyepieces by rotating the first cylindrical body without need for the first user to leave the location of the eyepiece.

Abstract: A solution for directing electromagnetic radiation, such as visible light, from multiple fields of view in differing directions to a single view point is provided. The radiation received from one or more fields of view is directed onto a first reflective surface, the radiation reflected off of the first reflective surface is then directed to a view point that comprises a transparent portion of the first reflective surface. In this manner, the invention enables the viewing and/or imaging of the radiation from any location in the full panorama at a single location.

Abstract: A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.

Abstract: The present invention discloses a tunable optical integrated element using liquid crystal as an active layer, which is applied to filters, couplers or optical add/drop multiplexer. The present invention includes a layer of liquid crystal as an active layer, a first waveguide with grating and a second waveguide, an isolation layer, a pair of electrodes. By applying the external voltage to control the direction of the liquid crystal, the refractive index of the waveguide changes in accordance with the modulation of the electric field. Thus invention has the features of simple structure, easy assembling, lower cost and integrating ability.

Abstract: A three mirror anastigmatic optic (and corresponding method of making) comprising a primary mirror, a secondary mirror, a tertiary mirror, and a vertex common to the primary and tertiary mirrors.

Abstract: In accordance with the present invention, a projection exposure apparatus includes an illuminating system to illuminate a drivable micromirror array and an objective which projects the drivable micromirror array onto the photosensitive substrate. The objective includes mirrors which are arranged coaxial with respect to a common optical axis. The objective can be a catoptric objective and can have a numerical aperture at the substrate greater than 0.1 and can have an imaging scale ratio of greater than 20:1. The objective can also include at least two partial objectives with an intermediate image plane between the at least two partial objectives and can consist of mirrors that are coated with reflecting layers which are adapted to reflect two mutually separated operating wavelengths.

Abstract: A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.

Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

Abstract: The invention is directed to multispectral multifield optical combinations that are intended to be integrated into an optical device. A Cassegrain-type multifield optical combination has an image focal plane, comprising a first holed concave primary mirror that is fixed relative to the image focal plane and a convex secondary mirror.

Abstract: There is provided a microlithographic projector lens for EUV-lithography with a wavelegth in a range of 10–30 nm, an incident aperture diaphragm and an emergent aperture diaphragm for the transformation of an object field in an object plane into an image field in an image plane. The invention has a microlithographic projector lens that includes a first, second, third, fourth, fifth, sixth, seventh and eighth mirror, and a beam path from the object plane to the image plane that is free from obscuration.

Abstract: A projection optical system is provided for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system has six reflective surfaces that include, in order of reflecting light from the object surface, a first reflective surface, a second convex reflective surface, a third convex reflective surface, a fourth reflective surface, a fifth reflective surface and a sixth reflective surface. An aperture stop is provided along an optical path between the first and second reflective surfaces. The following condition is met by the system, where L1 is an interval between the object surface and the surface apex that is the closest to the object surface, and L2 is an interval between the surface apex of the first reflective surface and the surface apex that is the closest to the object surface: 0.75 < L1 L2 < 1.25 .

Abstract: An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.

Abstract: Provided is a wide field of view head mounted display device capable of presenting 120 degree field of view per one eye and 180 or more by both eyes horizontally while keeping resolution at least to the same extent of the conventional art. The wide field of view head mounted display device includes: a LCD 1 for displaying an image; a lens 2 for projecting an image displayed on the LCD 1; and a catoptric system with a concave mirror 4 and a convex mirror 3. The LCD 1 and the lens 2, the concave mirror 4 and convex mirror 3 are positioned in a relative relationship to observe by an observing pupil 5 at a predetermined position a virtual image of a beam of reflected light as an incident light on the concave mirror 4 when the light of displayed image on the LCD 1 is projected to the convex mirror 3 through the lens 2 and a reflected light of the projected light at the convex mirror 3 arrives as the incident light at the concave mirror 4.

Abstract: Collector optics (70) for an EUV radiation source (10) for collecting EUV radiation (78). The collector optics (70) includes an elliptical dish reflector (72) where light generated at a focal point (76) of the reflector (72) is collected by the reflector (72) and is directed to a collection location (82). A frustal annular reflector (90) is positioned around an outer edge (84) of the dish reflector (72) to collect more of the EUV radiation (78) that may otherwise be lost. The radiation (78) reflected by the annular reflector (90) is directed to a center axicon reflector (94) positioned between the focal point (76) of the dish reflector (72) and the collection location (82) to redirect the radiation (78) reflected by the annular reflector (90) to be within a predetermined collection angle.

Abstract: The invention concerns a device for acquiring stereoscopic images comprising a primary mirror (1) or a near-parabolic mirror, a secondary mirror (2) located on the primary mirror optical axis between said primary mirror and its focal point, tertiary reflecting means (4a, 4b, 5a, 5b, 7a, 7b, 8) arranged relative to the primary mirror on the side opposite the secondary mirror reflecting along two directions different from that of the primary mirror optical axis the optical beams received by the primary mirror along two specific directions of incidence, the primary mirror being capable of being traversed by the tertiary beams, said tertiary reflecting means comprising means for focusing the optical beams which they receive along said two directions onto image acquisition means.

Abstract: A reflective afocal telescope is described herein that has multiple field of views and can be packaged in a compact arrangement. In one embodiment, the reflective telescope includes two entrance pupils, a primary mirror, a secondary mirror, a tertiary mirror, a quaternary mirror, a moveable fold mirror and an exit pupil. The fold mirror can be moved into a non-bypass position and out of the way such that the incident beams transverse the primary, secondary, tertiary and quaternary mirrors and form a collimated region and a real external exit pupil. Or, the fold mirror can be moved into a bypass position where the incident beams bypass the primary, secondary, tertiary and quaternary mirrors and instead reflect off the fold mirror directly to the exit pupil. In an alternative embodiment, the tertiary mirror instead of the fold mirror can be moved into either the bypass position or the non-bypass position.

Abstract: An all-reflective telescope has, in order, a positive-optical-power primary mirror, a negative-optical-power secondary mirror, a positive-optical-power tertiary mirror, a negative-optical-power quaternary mirror, and a positive-optical-power field lens. The mirrors and lens are axisymmetric about a beam axis. The light beam is incident upon an infrared detector after reflecting from the quaternary mirror. A cooling housing encloses the detector and the field lens, but does not enclose any of the mirrors. An uncooled warm-stop structure outside of the cooling housing but in a field of view of the detector is formed as a plurality of facets with reflective surfaces oriented to reflect a view of an interior of the cooling housing back to the interior of the cooling housing.

Abstract: A system of reflectors is used to form beam-expanding and collimating electro-optic transducer devices, including radiation sources and/or detectors. Preferably, the reflector system is of the Cassegrainian or Ritchey-Chretien type. Radiation such as light signals can be conducted to or from the transducers by fiber-optic cables. Alignment of optical conductors or “cores” of the fiber-optic cables or the reflector system with a transducer is provided by coupling a magnetic member to the conductor or reflector system and applying a controllable magnetic field from outside of the device to provide alignment, and then fixing the components in place by the use of means such as light-curable epoxy resin.

Abstract: A catoptric projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image includes first, second, third and fourth mirrors serving substantially as a coaxial system so as to sequentially reflect light from an object side to an image side, and being arranged so that light from the object surface to the first mirror may intersect light from the second mirror to the third mirror.

Abstract: A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.

Abstract: There is provided a projection objective for wavelengths of ?193 nm for imaging an object field in an object plane into an image field, in an image plane. The projection objective includes a first reflective optical element, a second reflective optical element, a third reflective optical element, a fourth reflective optical element, a fifth reflective optical element, and a sixth reflective optical element, and at least one refractive optical element. The refractive optical elements has a used area with a diameter. The projection objective has an image-side numerical aperture ?0.65, and the used area of the refractive optical element has a diameter that is less than ?rd of the distance from the object plane to the image plane.

Abstract: A thin viewfinder device includes, in order an object side to a viewing eye side, a first prism, and a second prism disposed separately from the first prim across an air gap. The first prism, the air gap and the second prism are arranged in such a manner that an object light flux obtained within a viewing field passes through the first prism, the air gap and the second prism so as to reach the viewing eye, while an object light flux obtained outside the viewing field is totally reflected by surfaces of the first prism so as to be prevented from reaching the viewing eye.

Abstract: An objective is configured with a first partial objective and a second partial objective. The first partial objective, which projects a first field plane onto an intermediate image, has a first, convex mirror and a second, concave mirror. The second partial objective, which projects the intermediate image onto a second field plane, has a third and a fourth mirror, both concave. All of the four mirrors have central mirror apertures. The axial distance between the first and second mirrors is in a ratio between 0.95 and 1.05 relative to the distance between the second mirror and the intermediate image. The axial distance ZM3-IM between the third mirror and the second field plane conforms to the relationship 0.03 · Du M3 + 5.0 ? ? ? mm < Z M3 - IM < 0.25 · Du M3 tan ? ( arcsin ? ( NA ) ) . NA represents the numerical aperture NA in the second field plane, and DuM3 represents the diameter of the third mirror.

Abstract: The suede-like fabric according to the invention is produced by the process which comprises the steps of supplying aqueous chemical composed of acrylic resin, emulsifying agent and water to treating rollers through chemical coating means; passing the raw fabric cloths between the treating rollers having the chemical supplied and supporting rollers to produce a uniform chemical coating of 70˜200 g/m2, the rollers pressing and fixing the passing raw fabric cloths; de-watering and drying the raw fabric cloths having the chemical coating fixed under pressing in a thermal chamber maintained at a temperature between 80 and 200° C.; and heating and pressing the dried raw fabric cloths by means of heating rollers at a temperature between 130 and 150° C. to finish the acrylic coating through this ironing step; and a further step of rubbing-off the coated surfaces of the raw fabric cloths for abrasion by rotating a striker drum made of wood for a predetermined period.

Abstract: An optical imaging system especially for microlithography includes a first imaging system forming an intermediate image of an object, and a second imaging system forming, on a surface, an image of the intermediate image. A reflective surface directs light from the first imaging system to the second imaging system. An aspherical corrective optical surface is located at or near the location of the intermediate image for correcting aberrations such as high-order distortion, aberrations due to accumulation of manufacturing tolerances, and spherical aberration. The first imaging system comprises a positive power refractive element and a concave mirror. The second imaging system comprises refractive elements and no concave mirror.

Abstract: There is provided a microlithography projection objective for short wavelengths, with an entrance pupil and an exit pupil for imaging an object field in an image field, which represents a segment of a ring field, in which the segment has an axis of symmetry and an extension perpendicular to the axis of symmetry and the extension is at least 20 mm. The objective comprises a first (S1), a second (S2), a third (S3), a fourth (S4), a fifth (S5) and a sixth mirror (S6) in centered arrangement relative to an optical axis. Each of these mirrors have an off-axis segment, in which the light beams traveling through the projection objective impinge. The diameter of the off-axis segment of the first, second, third, fourth, fifth and sixth mirrors as a function of the numerical aperture NA of the objective at the exit pupil is ?1200 mm * NA.

Abstract: Techniques for generating partially coherent radiation and particularly for converting effectively coherent radiation from a synchrotron to partially coherent EUV radiation suitable for projection lithography.

Abstract: A projection exposure apparatus for microlithography using a wavelength?193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.

Abstract: An optical system (in FIGS. 1A and 1B) wherein a rectilinear laser beam of homogeneous energy distribution is defined for annealing a non-single crystalline semiconductor film (a surface to-be-irradiated 1108), is constructed of reflectors (1106, 1107 etc.) easily and inexpensively without including lenses of transmission type. The rectilinear laser beam can be defined having a length of at least 600 (mm) which corresponds to the shorter latus of a large-sized substrate for mass production.

Abstract: A bright wide-angle catoptric system is provided which will not deteriorate the picture quality of images. The wide-angle catoptric system includes, successively from an object, a secondary reflecting mirror having a concave surface, a primary reflecting mirror having a convex surface and a tertiary reflecting mirror having a concave surface, and produces images by reflecting the luminous flux from the object at the primary reflecting mirror, the secondary reflecting mirror and the tertiary reflecting mirror successively. The system also includes a diaphragm arranged in close proximity to the primary reflecting mirror so as to have an optical axis pass through the center of the diaphragm; the optical axis is a straight line connecting the curvature center of the primary reflecting mirror to the curvature center of the secondary reflecting mirror. The tertiary reflecting mirror has its curvature center decentered from the optical axis in the direction of lesser astigmatism.

Abstract: A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane, preferably while creating a real intermediate image, including a catadioptric first lens section having a concave mirror and a physical beamsplitter having a beamsplitting surface, as well as a second lens section that is preferably refractive and follows the beamsplitter, between its object plane and image plane. Positive refractive power is arranged in an optical near-field of the object plane, which is arranged at a working distance from the first optical surface of the projection lens. The beamsplitter lies in the vicinity of low marginal-ray heights, which allows configuring projection lenses that are fully corrected for longitudinal chromatic aberration, while employing small quantities of materials, particularly those materials needed for fabricating their beamsplitters.

Abstract: A system and method for inspection is disclosed. The design includes an objective employed for use with light energy having a wavelength in various ranges, including approximately 266 to 1000 nm, 157 nm through infrared, and other ranges. The objective comprises a focusing lens group comprising at least one focusing lens configured to receive light, a field lens oriented to receive focused light energy from said focusing lens group and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy from the field lens and form controlled light energy. Each focusing lens has a reduced diameter, such as a diameter of less than approximately 100 mm, and a maximum corrected field size of approximately 0.15 mm. An immersion substance, such as oil, water, or silicone gel, may be employed prior to passing controlled light energy to the specimen inspected.

Abstract: A system for use with a reduced size catadioptric objective is disclosed. The system including the reduced size objective includes various subsystems to allow enhanced imaging, the subsystems including illumination, imaging, autofocus, positioning, sensor, data acquisition, and data analysis. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and elements of the objective are less than 100 mm in diameter. The objective comprises a focusing lens group and at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy. The objective also includes a Mangin mirror arrangement. The design imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90 to a specimen for imaging purposes, and the design may be employed in various environments.

Abstract: An apparatus for the conduction of light. The apparatus includes two concave refracting elements, such as spherical mirrors or concave gratings, such that a connecting line segment between centers of the elements forms with a main axis of a first element an angle of incidence in excess of zero, and with a main axis of a second element an angle of incidence equal in size but in a plane perpendicular to the plane defined by the connecting line segment and the main axis of the first element. Thus, astigmatism error can be corrected. The apparatus is applicable in optical analyzers for conduction of measuring light to or from a sample.

Abstract: There is provided an electronic component-recognizing device for taking an image of an electronic component brought to a component-sensing station, for recognition thereof. The component-sensing camera takes the image of the electronic component by utilizing reflected light from the electronic component. A lighting mechanism lights the electronic component. The lighting mechanism comprises a light-guiding element, a ring light guide, and a light source. The light-guiding element is arranged annularly such that the light-guiding element can diffuse illumination light and emit the diffused illumination light toward the electronic component obliquely from below. The ring light guide holds the light-guiding element. A light source supplies the illumination light to the light-guiding element.

Abstract: A reduced size catadioptric objective and system is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range. Elements are less than 100 mm in diameter. The objective comprises a focusing lens group configured to receive the light energy and comprising at least one focusing lens. The objective further comprises at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy. The objective also includes a Mangin mirror arrangement positioned to receive the intermediate light energy from the field lens and form controlled light energy for transmission to a specimen. The Mangin mirror arrangement imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90, and the design may be employed in various environments.