Light Interference Patents (Class 359/577)
- By transmissive coating on lens (Class 359/581)
- Layer having specified nonoptical property (Class 359/582)
- Beam splitter or combiner (Class 359/583)
- Reflector (Class 359/584)
- Including metal or conductive layer (Class 359/585)
- Layers having specified index of refraction (Class 359/586)
- Selective wavelength transmission or reflection (Class 359/589)
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Patent number: 8531527Abstract: An acoustic-wave sensor (10) is constructed by a membrane (11) adapted to be displaced by an acoustic wave, a first waveguide (16a) for transmitting light therein, an optical coupling part (15) to which the light transmitted through the first waveguide (16a) is adapted to be optically coupled, and a second waveguide (16b) through which the light coupled from the optical coupling part (15) transmits. When the membrane (11) is displaced by its reception of the acoustic wave, at least one of an optical coupling coefficient between the first waveguide (16a) and the optical resonator (15) and an optical coupling coefficient between the second waveguide (16b) and the optical resonator (15) is changed to output a corresponding optical signal.Type: GrantFiled: August 25, 2008Date of Patent: September 10, 2013Assignee: Canon Kabushiki KaishaInventors: Chienliu Chang, Kenichi Nagae
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Patent number: 8462436Abstract: This invention relates to a solar photon filter, hereafter known as the SPF, which is a combination band-pass filtering system consisting of a multiple set of cold or hot mirrors and infra-red absorbers set in a 360-degree or linear arrangement. The system removes almost all of the photons carried by waves having lengths longer than 1000 nm (nanometers)+/?100 nm, while passing almost all of the incoming photons carried by waves having lengths shorter than 1000 nm+/?100 nm and/or variations thereof. This is accomplished by positioning a set of cold or hot mirrors in constant optical track with the sun. Such an assembly of cold or hot mirrors allows solar photons carried by light to be split into two distinct bands of frequencies for use requiring such filtering separation.Type: GrantFiled: June 2, 2009Date of Patent: June 11, 2013Inventors: Arthur Robert Tilford, Philip Frank Zimmermann
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Patent number: 8445097Abstract: The present invention discloses a multi-layer fluoropolymeric film that is useful as a light capture front sheet in solar modules, and more broadly as an antireflection layer. The present invention further discloses a glass shaped article having a multi-layer fluoropolymeric film disposed upon the surface thereof. The shaped article is useful in applications where it is desirable to reduce reflection of incident light.Type: GrantFiled: December 17, 2009Date of Patent: May 21, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Kostantinos Kourtakis, Mark E. Lewittes, Jose Manuel Rodriguez-Parada
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Publication number: 20130119270Abstract: A multi-wavelength light generator includes a broadband light source and a wavelength division device. The multi-wavelength light generator is configured to generate a first output light having a first line width. The wavelength division device is configured to divide a wavelength of the first output light to provide a plurality of second output lights. Each of the second output lights has a second line width narrower than the first line width, and each of the second output lights is used as a light source of each channel of an optical sensor.Type: ApplicationFiled: November 6, 2012Publication date: May 16, 2013Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventor: Samsung Electronics Co., Ltd.
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Publication number: 20130107369Abstract: In a hearth liner wherein an evaporation material is adhered to a substrate to form an optical thin film thereon, the present invention is directed to prevent bumping (splashing) when the evaporation material is irradiated by an electron beam from an electron gun to melt and vaporize thereof. A hearth liner of a vacuum evaporation apparatus wherein the electron beam from the electron gun is irradiated on the evaporation material to form an optical thin film on a substrate, wherein the cross-section shape of an evaporation material storage part of the hearth liner is a shallow semicircular (spherical) shape (bowl shape).Type: ApplicationFiled: April 23, 2012Publication date: May 2, 2013Applicant: NIHON DEMPA KOGYO CO., LTD.Inventors: KEN SEKI, TOSHIMASA NISHI, HIROTO ISHIKAWA
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Patent number: 8404335Abstract: A laminated film includes a structure where each 200 layers or more of a layer composed of a resin A (A layer) and a layer composed of a resin B (B layer) are alternately laminated, wherein a relative reflectance in a wavelength range of 400 nm to 1000 nm is 30% or more, tensile stresses at 100% elongation in a longitudinal direction and a width direction of the film are 3 MPa or more and 90 MPa or less in a tensile test at 150° C., and the number of layers with a layer pair-thickness of 120 nm or more and less than 220 nm is 1.05 times or more to 2.5 times or less the number of layers with a layer-thickness of 220 nm or more and 320 nm or less.Type: GrantFiled: January 3, 2012Date of Patent: March 26, 2013Assignee: Toray Industries, Inc.Inventors: Syunichi Osada, Wataru Gouda
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Patent number: 8400616Abstract: A laser interference lithography apparatus capable of stitching small exposed areas into a large exposed area includes a body, a laser beam supplying unit, a reflecting mechanism, an L-shaped fixing mechanism and a substrate stage. The laser beam supplying unit fixed onto the body provides a laser beam. The reflecting mechanism is movably and rotatably mounted on the body. The L-shaped fixing mechanism mounted on the body includes a first mounting seat and a second mounting seat. An upright first reflecting mirror is fixed to the first mounting seat. The second mounting seat connected to the first mounting seat fixes a horizontal mask, and is substantially perpendicular to the first mounting seat. The substrate stage, movably mounted on the body and disposed below the second mounting seat, supports a substrate. Thus, a large-area pattern formed by stitching small-area patterns may be obtained.Type: GrantFiled: July 20, 2010Date of Patent: March 19, 2013Assignee: National Tsing Hua UniversityInventor: Chien-Chung Fu
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Publication number: 20130046381Abstract: An imaging lens structure and method of imaging are presented. The imaging lens structure comprising a lens region defining an effective aperture of the lens structure. The lens region comprises an arrangement of lens zones distributed within the lens region and comprising zones of at least two different optical functions differently affecting light passing therethrough. The zones of at least two different optical functions are arranged in an interlaced fashion along said lens region corresponding to a surface relief of the lens region such that adjacent lens zones of different optical functions are spaced apart from one another along an optical axis of the lens structure a distance larger than a coherence length of light at least one spectral range for which said lens structure is designed.Type: ApplicationFiled: February 9, 2011Publication date: February 21, 2013Inventors: Zeev Zalevsky, Alex Zlotnik, Shai Ben-Yaish, Ofer Limon, Ido Raveh
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Publication number: 20130017498Abstract: A two-beam interference lithography system offers large-area nanopatterning with tunability of pattern periodicities. The tunable feature is achieved by placing two rotatable mirrors in the two expanded beam paths which can conveniently be regulated for the designed pattern periodicities. While the effective interference pattern coverage is mainly determined by the optical coherence length and mirror size, the minimum pattern coverage area is as large as the effective coherence length of the laser and the selected mirror size over a wide range of periodicities.Type: ApplicationFiled: July 12, 2012Publication date: January 17, 2013Inventors: Weidong Mao, Ishan Wathuthanthri, Chang-Hwan Choi
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Publication number: 20120314293Abstract: An article includes a light-transmittable substrate having opposite first and second surfaces spaced in a height direction. A first pattern is provided on the first surface of the light-transmittable substrate. A plurality of spaced first lines is provided on a face of the first pattern. A second pattern is provided on the second surface of the light-transmittable substrate. A plurality of spaced second lines is provided on a face of the second pattern. The first lines intersect the second lines when viewed from the face of the first pattern, forming a Moire pattern and creating Moire effect. Light beams passing through the light-transmittable substrate via the first pattern or the second pattern according to a viewing angle of a viewer are refracted to represent a 3D lively figure.Type: ApplicationFiled: June 10, 2011Publication date: December 13, 2012Inventor: Chien-Fu Chang
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Patent number: 8264667Abstract: A lithographic apparatus including an exposure unit that exposes parallel lines on a target area of a substrate by projecting two beams of radiation onto the substrate. The two beams of radiation are projected such that they interfere with each other to form the parallel lines. An actuator continuously moves the substrate relative to the exposure unit, while the exposure unit exposes the parallel lines on the target areas on the substrate.Type: GrantFiled: May 4, 2006Date of Patent: September 11, 2012Assignee: ASML Netherlands B.V.Inventors: Kars Zeger Troost, Johannes Jacobus Matheus Baselmans, James Sherwood Greeneich
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Publication number: 20120194821Abstract: A colorimetric sensor includes an etalon including a first substrate, a second substrate facing the first substrate, a fixed mirror formed on a surface of the first substrate facing the second substrate, and a movable mirror formed on the second substrate so as to face the fixed mirror with a prescribed gap therebetween, a light receiving element that receives a test subject light having passed through the etalon, and a holding member holding the etalon. The etalon includes a light interference area facing the first and second substrates in a plan view as seen in a thickness direction of the substrate, and a protruding area protruding from the light interference area. The holding member holds the etalon at one end side of the protruding area opposite to the light interference area.Type: ApplicationFiled: January 25, 2012Publication date: August 2, 2012Applicant: SEIKO EPSON CORPORATIONInventor: Takeshi NOZAWA
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Patent number: 8233220Abstract: The invention relates to an optical system for providing on-axis destructive interference of light received from an object along a predetermined system optical axis. The system comprises a receiving and guiding optical structure and a combining optical structure. The receiving and guiding optical structure is for receiving and guiding at least three beams of light received from said object, the receiving and guiding optical structure arranged to provide a relative optical path difference between the at least three beams; the combining optical structure is for combining the at least three beams. According to the invention, a polarization varying optical structure is arranged between the receiving and guiding optical structure and the combining optical structure, for varying a polarization state of the beams relative to each other in order to provide on-axis destructive interference.Type: GrantFiled: March 26, 2007Date of Patent: July 31, 2012Assignee: Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek TNOInventor: Julien Felix Paul Spronck
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Patent number: 8213084Abstract: A fundamental limit to the sensitivity of optical interferometry is thermal noise that drives fluctuations in the positions of the surfaces of the interferometer's mirrors, and thereby in the phase of the intracavity field. A scheme for substantially reducing this thermally driven phase noise is provided in which the strain-induced phase shift from a mirror's optical coating cancels that due to the concomitant motion of the substrate's surface. As such, although the position of the physical surface may fluctuate, the optical phase upon reflection can be largely insensitive to this motion.Type: GrantFiled: April 1, 2008Date of Patent: July 3, 2012Assignee: California Institute of TechnologyInventor: H. Jeff Kimble
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Publication number: 20120154883Abstract: There are provided a lens, a method of fabricating the lens, and a light scanning unit. The lens includes a lens portion having an effective optical surface, and a gate-side flange portion between the lens portion and a gate-side end of the lens. If the lens is disposed between two polarizers configured to polarize light linearly in perpendicular directions and is illuminated in an optical axis direction, interference fringes are generated on the lens, and peripheral interference fringes of the interference fringes extend continuously from the gate-side end and are longer than the gate-side flange portion.Type: ApplicationFiled: October 6, 2011Publication date: June 21, 2012Applicant: Samsung Electronics Co., LtdInventor: Won-young CHO
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Publication number: 20120154914Abstract: An interference filter assembly includes a condenser lens, a collimating lens, an interference filter, and an imaging device, which are arranged in a direction of light travel. The collimating lens is spaced from the condenser lens by a predetermined distance that corresponds to one of a focal length of the condenser lens and a focal length of the collimating lens. The collimating lens is provided by a single lens and applies a collimated light toward the imaging device through the interference filter in the direction of light travel. The collimating lens has a first surface adjacent to the condenser lens and a second surface adjacent to the interference filter. The first surface is a curved surface that is convex toward the condenser lens and a circular hyperboloid. The second surface is a plane surface and outputs the collimated light to the interference filter.Type: ApplicationFiled: December 14, 2011Publication date: June 21, 2012Applicant: DENSO CORPORATIONInventors: Chihiro Moriguchi, Hiroshi Ando, Katsuhiro Morikawa
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Patent number: 8199333Abstract: Optical scattering disk, use and wavefront measuring apparatus. The optical scattering disk includes a transparent substrate (1) and a light scattering layer (2) adjoining a surface of the substrate and having light-scattering-active particles (3). The light scattering layer has an embedding medium (4) which is optically denser than air and directly adjoins the facing surface of the substrate without intervening air gaps and by which the light-scattering-active particles are surrounded. Such optical scattering disks may be used, e.g., in apparatuses for wavefront measurement of high-aperture microlithography projection objectives employing lateral shearing interferometry.Type: GrantFiled: May 23, 2006Date of Patent: June 12, 2012Assignee: Carl Zeiss SMT GmbHInventor: Ulrich Wegmann
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Patent number: 8194322Abstract: Multilayer-film reflective mirrors are disclosed. An exemplary such mirror has a base and a multilayer film formed on the base. The multilayer film includes multiple layer pairs. Each layer pair includes a respective first layer and a respective second layer, wherein the first and second layers are laminated together in an alternating manner. The multilayer film has first and second regions that reflect extreme ultraviolet light. A first group of layers is disposed in the first and second regions and has a first periodic length. A second group disposed in the first region has a second periodic length different from the first periodic length, and a third group disposed in the second region has a substantially same periodic length as the first periodic length.Type: GrantFiled: March 7, 2008Date of Patent: June 5, 2012Assignee: Nikon CorporationInventor: Masayuki Shiraishi
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Publication number: 20120134002Abstract: Described is a method of controlling the absorption of light in a cavity, a system in which absorption is so controlled, and an interferometer embodying the underlying physical concept. Materials can be made to completely absorb incident light when the light is imposed in a specific pattern of illumination. Coherent perfect absorption, as the process is referred to, is achieved when a cavity is illuminated coherently and monochromatically by the time-reverse of the output of a lasing mode. Varying the parameters of the incident light and/or of the cavity allows the absorption of the incident light by the cavity to be controlled; enhanced or even reduced.Type: ApplicationFiled: June 29, 2010Publication date: May 31, 2012Inventor: A. Douglas Stone
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Patent number: 8169446Abstract: A display device includes: a reflection property control layer which is disposed in the front face of a display screen, whereby reflection properties are switched for each predetermined region; and a control unit configured to switch the reflection properties of the reflection property control layer depending on an input image, with the control means detecting a gloss region from the input image, and switching the reflection properties of a predetermined region according to the relevant detection result.Type: GrantFiled: December 9, 2008Date of Patent: May 1, 2012Assignee: Sony CorporationInventors: Takao Inoue, Masashi Uchida, Tetsujiro Kondo
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Publication number: 20120099090Abstract: Systems and methods related to the generation of interference patterns using electromagnetic radiation are generally described. Some embodiments are directed to the use of such systems and methods to perform interference lithography.Type: ApplicationFiled: December 2, 2010Publication date: April 26, 2012Applicant: Massachusetts Institute of TechnologyInventors: Karl K. Berggren, Hasan Korre, Corey P. Fucetola
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Publication number: 20120081687Abstract: An exemplary embodiment of the present invention provides an interference projection exposure system comprising a beam-providing subsystem and an objective lens subsystem that can provide a plurality of light beams which intersect and interfere at an image plane to produce a high spatial frequency periodic optical-intensity distribution. The interference projection system can further comprise a pattern mask that can alter the periodic optical-intensity distribution so as to incorporate functional elements within the periodic optical-intensity distribution. The beam providing subsystem can comprise a beam generating subsystem, a beam conditioning subsystem and a beam directing subsystem. Another exemplary embodiment of the present invention provides for a method of producing a high spatial frequency periodic optical-intensity distribution using a interference projection exposure system.Type: ApplicationFiled: September 30, 2011Publication date: April 5, 2012Applicant: Georgia Tech Research CorporationInventors: Guy Matthew Burrow, Thomas K. Gaylord
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Patent number: 8110278Abstract: The subject invention relates to a scratch-resistant optical film, which comprises: (a) a transparent substrate having a first surface and a second surface; (b) a diffusion layer on the first surface of the substrate, which has a convex-concave structure and is comprised of a first hard coat layer comprising organic particles; (c) a scratch-resistant layer on the second surface of the substrate, which is comprised of a second hard coat layer; wherein the organic particles in the first hard coat layer are formed from a polyacrylate resin which comprises at least one multi-functional acrylate monomer as polymerization units, said multi-functional acrylate monomer being in an amount from 30 to 70 wt % based on the total weight of the monomer used, and wherein the organic particles have a single mean particle size and have a particle size distribution in the range within about ±5% of the mean particle size.Type: GrantFiled: June 12, 2008Date of Patent: February 7, 2012Assignee: Eternal Chemical Co., Ltd.Inventors: Lung-Lin Hsu, Shu-Hong Liu, Chun-Hung Chou
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Patent number: 8110282Abstract: An object of the present invention is to provide a film having a high brightness and a natural metal-effect, and also having excellent formability, causing no delamination and maintaining the metal-effect after forming. Another object is to provide a molded body having less environmental burden, excellent in recycling efficiency and giving no electromagnetic interference. A laminated film including a structure where each 30 layers or more of a layer composed of a resin A (A layer) and a layer composed of a resin B (B layer) are alternately laminated, wherein a relative reflectance in a wavelength range of 400 nm to 1000 nm is 30% or more, tensile stresses at 100% elongation in a longitudinal direction and a width direction of the film are 3 MPa or more and 90 MPa or less in a tensile test at 150° C., and the number of layers with a layer-pair thickness of 10 nm or more and less than 220 nm is more than the number of layers with a layer-pair thickness of 220 nm or more and 320 nm or less.Type: GrantFiled: August 10, 2006Date of Patent: February 7, 2012Assignee: Toray Industries, Inc.Inventors: Syunichi Osada, Wataru Gouda
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Publication number: 20120013878Abstract: A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width ?lat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width ?lat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width ?b corresponding to plural lateral laser modes, and wherein ?m<?lat<?b, and wherein an optical delay apparatus disposed in the beam provides an optical path difference ?l, wherein 0.8 · ? 0 2 ( 2 · ? ? ? ? l ) < ? ? ? l < 1.8 · ? 0 2 ( 2 · ?? l ) , wherein ?0 is an average wavelength of the light of the first beam of laser light, and ??lat represents the second line width.Type: ApplicationFiled: June 30, 2011Publication date: January 19, 2012Applicant: CARL ZEISS SMT GMBHInventors: Matthias Kuss, Damian Fiolka, Gerd Reisinger, Manfred Maul, Vladimir Davydenko
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Patent number: 8081383Abstract: A generator of duality modulated radiation, of which the irradiance, the wave intensity, or both, are varied from ordinarily equivalent levels, either for purposes of providing energy depleted or energy enriched radiation or for purpose of encoding an information signal. Various techniques are disclosed for restoring irradiance levels to “ordinary” levels, or for amplifying irradiance without affecting wave intensity. A communication system also employs duality modulated radiation.Type: GrantFiled: February 8, 2011Date of Patent: December 20, 2011Inventors: Stuart G. Mirell, Daniel J. Mirell
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Patent number: 8078027Abstract: A focus enhancing electromagnetic wave propagating device includes a main body formed with a main wave-propagating structure (MS) for focusing an electromagnetic wave into a focusing light spot, and an auxiliary wave-propagating channel (AC) for allowing the wave to propagate toward the focusing light spot. A phase difference is present between the wave after traveling through the MS at its exit end and the wave after traveling through the AC at its exit opening, such that constructive interference is generated at the focusing light spot therebetween. The required phase difference is a function of a distance between the focusing light spot and the exit end of the MS, a distance between the focusing light spot and the exit opening of the AC, velocities of the wave after traveling through each of the MS and the AC, and angular frequencies of the wave after traveling through each of the MS and the AC.Type: GrantFiled: December 2, 2009Date of Patent: December 13, 2011Assignee: National Cheng Kung UniversityInventor: Kuan-Ren Chen
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Publication number: 20110255166Abstract: An optical filter device includes a first electrode that is provided on a first substrate, a second electrode that is provided on a second substrate to face the first electrode, a pair of first lead-out electrodes that connects to the first electrode, and a pair of second lead-out electrodes that is provided on the second substrate to connect to the second electrode.Type: ApplicationFiled: April 12, 2011Publication date: October 20, 2011Applicant: SEIKO EPSON CORPORATIONInventors: Susumu SHINTO, Akira SANO
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Patent number: 8031407Abstract: An imaging assembly for an image sensor may include a lens, a transparent substrate and two aspherical optical coatings on each side of the substrate. The imaging assembly can also incorporate an opaque coating with an opening in-line with the lens to form an aperture, an anti-reflection coating, and an infrared filter coating.Type: GrantFiled: August 11, 2005Date of Patent: October 4, 2011Assignee: STMicroelectronics Ltd.Inventors: Jonathan Ephriam David Hurwitz, Ewan Findlay
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Publication number: 20110235181Abstract: An optical element includes a base and a large number of structures arranged on the surface of the base, the structures being projections or depressions. The structures are arranged at a pitch shorter than or equal to a wavelength of light in a use environment. An effective refractive index in the depth direction of the structures gradually increases toward the base and has two or more inflection points.Type: ApplicationFiled: September 18, 2009Publication date: September 29, 2011Applicant: SONY CORPORATIONInventors: Kazuya Hayashibe, Sohmei Endoh, Makiko Oikawa, Shunichi Kajiya
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Patent number: 8027100Abstract: An imaging lens includes a first lens group having a positive refractive power, an aperture stop, and a second lens group having a positive refractive power, which are disposed in order from an object. The first lens group has a first lens component having a negative refractive power and a second lens component having a positive refractive power, which are disposed in order from the object, and conditions expressed by the expressions 0.12<f/f1<0.47 and 0.016<D12/f<0.079 are satisfied, when f1 is a focal length of the first lens group, f is a focal length of the imaging lens, and D12 is an air distance between the first lens component and the second lens component of the first lens group.Type: GrantFiled: February 17, 2011Date of Patent: September 27, 2011Assignee: Nikon CorporationInventor: Toshinori Take
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Publication number: 20110228073Abstract: A synthetic aperture optics (SAO) imaging method minimizes the number of selective excitation patterns used to illuminate the imaging target, based on the objects' physical characteristics corresponding to spatial frequency content from the illuminated target and/or one or more parameters of the optical imaging system used for SAO. With the minimized number of selective excitation patterns, the time required to perform SAO is reduced dramatically, thereby allowing SAO to be used with DNA sequencing applications that require massive parallelization for cost reduction and high throughput. In addition, an SAO apparatus optimized to perform the SAO method is provided. The SAO apparatus includes a plurality of interference pattern generation modules that can be arranged in a half-ring shape.Type: ApplicationFiled: March 19, 2010Publication date: September 22, 2011Applicant: LIGHTSPEED GENOMICS, INC.Inventors: Chun-Sheu Lee, Jong Buhm Park
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Patent number: 8023190Abstract: A diffusing plate has a surface including a plurality of fine concave/convex portions regularly arranged within a cycle equal to or smaller than a predetermined wavelength. The surface has a larger surface roughness than the predetermined wavelength. An average value for an angle between a normal vector of the tangent plane of a roughness shape of the surface and a normal vector of a reference plane of the surface is 5 degrees or more.Type: GrantFiled: May 15, 2007Date of Patent: September 20, 2011Assignee: Panasonic CorporationInventors: Kazuhiro Yamada, Takamasa Tamura, Motonobu Yoshikawa, Hiroshi Yamaguchi, Kazuhiko Ishimaru
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Patent number: 8017217Abstract: A material of variable emissivity includes a first metallic layer having a first aperture, a second metallic layer having a second aperture, and a variable dielectric layer interposed between the first metallic layer and the second metallic layer.Type: GrantFiled: May 9, 2008Date of Patent: September 13, 2011Assignee: HRL Laboratories, LLCInventors: Daniel J. Gregoire, Deborah J. Kirby
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Patent number: 7990611Abstract: A microscope includes a source of electromagnetic radiation, having a wavelength, ?1 and dividing optical elements configured for dividing the radiation from the source into multiple excitation beams. The microscope also includes a detector and directing optical elements, which are configured for directing each excitation beam in unique directions, such that the beams intersect in an excitation region within a sample to create a two-dimensional or three-dimensional interference pattern of multiple excitation maxima within the sample. The detector has individual detector elements, where the detector elements are configured for detecting light resulting from an interaction of an individual excitation maximum and the sample.Type: GrantFiled: May 22, 2007Date of Patent: August 2, 2011Inventor: Robert Eric Betzig
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Patent number: 7978201Abstract: A method for compensating an image produced by image means for implementing image information takes account of ambient illumination. Luminance of external background illumination around the image means is measured. The measured luminance of the background illumination is compared with preset tristimulus values and a reflectance factor of the image means, a comparison result is computed, and a control signal is generated to compensate luminance and chroma of an image. Luminance and chroma of the image means are compensated in response to the control signal.Type: GrantFiled: September 12, 2006Date of Patent: July 12, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Sung-Dae Cho, Seok-Jin Won, Jung-Hoon Park, Young-Min Jeong, Jae-Won Moon, Yun-Je Oh, Young-Ho Ha, Jong-Man Kim, Cheol-Hee Lee, Chang-Hwan Son
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Patent number: 7972004Abstract: A system and method for uniform light generation in projection display systems. An illumination source comprises a light source to produce colored light, and a scrolling optics unit optically coupled to the light source, the scrolling optics unit configured to create lines of colored light from the colored light, and to scroll the lines of colored light along a direction orthogonal to a light path of the illumination source. The scrolling optics unit comprises a single light shaping diffuser to transform the colored light into the lines of colored light, an optical filter positioned in the light path after the light shaping diffuser, and a scrolling optics element positioned in the light path after the optical filter. The single light shaping diffuser is capable of simultaneously transforming colored light into lines of colored light having substantially uniform intensity to provide uniform illumination.Type: GrantFiled: April 18, 2008Date of Patent: July 5, 2011Assignee: Texas Instruments IncorporatedInventors: Terry Alan Bartlett, Paul L. Rancuret
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Patent number: 7969638Abstract: A thin black mask is created using a single mask process. A dielectric layer is deposited over a substrate. An absorber layer is deposited over the dielectric layer and a reflector layer is deposited over the absorber layer. The absorber layer and the reflector layer are patterned using a single mask process.Type: GrantFiled: April 10, 2008Date of Patent: June 28, 2011Assignee: QUALCOMM MEMS Technologies, Inc.Inventors: Gang Xu, Chun-Ming Wang, Fan Zhong, Qi Luo
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Publication number: 20110149398Abstract: Described is a means for communication, enabling message transmission faster than the speed of light between two separated locations. A photon source feeds a splitter, which allows a single photon to split between flowing down the left input side and the right output side. On the left, the photon enters a phase splitter, which produces an in-phase and inverted phase signal. With the delay switch at zero delay, both signals arrive together at the combiner with opposite phase, canceling each other out. With the delay switch set to half a wavelength, no cancellation results and the signal passes unabated through the combiner. In this mode, approximately, fifty percent of the photons register at each detector, which are equidistant from the photon source. In the former mode, (delay switch set to zero) much more of the photons appear at the output detector, and no signal appears at the input detector. Consider the simplified schematic that follows.Type: ApplicationFiled: September 13, 2010Publication date: June 23, 2011Inventor: Donald Wortzman
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Patent number: 7965435Abstract: A system and method for locking the relative phase of multiple coherent optical signals, which compensates for optical phase changes induced by vibration or thermal changes in the environment.Type: GrantFiled: September 28, 2010Date of Patent: June 21, 2011Assignee: Phase Sensitive Innovations, Inc.Inventors: Christopher A. Schuetz, Richard D. Martin, Dennis W. Prather, Thomas E. Dillon
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Publication number: 20110134532Abstract: In an optical etalon with a fixed FSR determined by the cavity length, the time delay is adjusted by an etalon surface coating. The proper cavity length is chosen to achieve a desired FSR, and the coating is independently selected to obtain a desired time delay.Type: ApplicationFiled: December 6, 2010Publication date: June 9, 2011Applicant: OPTOPLEX CORPORATIONInventor: Yung-Chieh Hsieh
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Patent number: 7957064Abstract: A diffusing plate is formed so as to have a surface having a larger surface roughness than a predetermined wavelength and having an aperiodic roughness shape. A plurality of fine concave/convex portions are formed on the surface so as to be regularly arranged within a cycle equal to and smaller than a predetermined wavelength.Type: GrantFiled: May 15, 2007Date of Patent: June 7, 2011Assignee: Panasonic CorporationInventors: Kazuhiro Yamada, Takamasa Tamura, Motonobu Yoshikawa, Hiroshi Yamaguchi, Kazuhiko Ishimaru
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Patent number: 7952810Abstract: An object is to provide: a zoom lens system that has a reduced overall length, a high resolution, and a variable magnification ratio as high as 9 or greater and that is satisfactorily adaptable for wide-angle image taking where the view angle at a wide-angle limit is 70° or greater; an imaging device employing this zoom lens system; and a thin and compact camera. The zoom lens system has a plurality of lens units each consisting of at least one lens element, and, in order from the object side to the image side, comprises a first lens unit having positive optical power, a second lens unit having negative optical power, a third lens unit having positive optical power, a fourth lens unit and a fifth lens unit. In zooming from a wide-angle limit to a telephoto limit at the time of image taking, at least the first lens unit and the second lens unit move in an optical axis direction, while the fourth lens unit and the fifth lens unit are each consists of one lens element.Type: GrantFiled: December 16, 2009Date of Patent: May 31, 2011Assignee: Panasonic CorporationInventors: Takakazu Bito, Keiki Yoshitsugu, Shinji Yamaguchi
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Patent number: 7929813Abstract: An exemplary optical modulator includes an interferometer. The interferometer includes an input optical coupler, an output optical coupler, and two or more controllable optical waveguides. Each controllable optical waveguide connects the input optical coupler to the output optical coupler and has an electro-absorption modulator along a segment thereof. Two of the controllable optical waveguides are connected to transmit to an output of the output optical coupler light of substantially different maximum amplitude.Type: GrantFiled: September 25, 2009Date of Patent: April 19, 2011Assignee: Alcatel-Lucent USA Inc.Inventors: Christopher Richard Doerr, Peter J. Winzer
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Patent number: 7894136Abstract: A method for creating a periodic interference pattern of coherent waves in two or three dimensions, D, includes generating at least D+2 waves, where each wave has substantially the same wavelength, ?, and travels substantially in a unique direction, kn. The waves are directed such that at least a portion of each wave intersects in a common excitation region to create the interface pattern. The directions, kn, of the waves are selected such that the interference pattern within the excitation region forms a Bravais lattice, and at least one wave travels substantially in a direction, ki, such that one or more symmetry operations characteristic of the Bravais lattice map the direction of the wave, ki, onto a direction of a different wave, kj. The directions of the waves, kn, do not all lie on a D-dimensional set of mutually orthogonal axes.Type: GrantFiled: May 22, 2007Date of Patent: February 22, 2011Inventor: Robert Eric Betzig
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Patent number: 7859646Abstract: According to one exemplary embodiment of the present invention, a method for writing an arbitrary, two-dimensional pattern using interferometric lithography and classical techniques includes the steps of: (1) creating a pixel array defined by a number of pixels having specific coordinates; (2) mapping pixel information based on the desired pattern, the pixel information including a list of which pixels are activated to define the desired two-dimensional pattern; (3) controlling a relative strength of each pixel for indicating a feature height of a portion of the desired two-dimensional pattern; and (4) controlling a degree that one pixel is shifted in an x-direction and a y-direction relative to original coordinates of the pixel in order to define the desired two-dimensional pattern pixel by pixel.Type: GrantFiled: June 15, 2007Date of Patent: December 28, 2010Assignee: Adelphi UniversityInventor: Sean J. Bentley
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Patent number: 7843410Abstract: One embodiment includes a display of interferometric modulators having a configurable resolution characteristic. Selected rows and/or columns are interconnected via a switch. The switch can include a fuse, antifuse, transistor, and the like. Depending on a desired resolution for a display, the switches can be placed in an “open” or “closed” state. Advantageously, using the switches, a display can readily be configured for differing modes of resolution. Furthermore, using the switches, a display can be configured to electrically connect certain rows or columns in the display such that the connected rows or columns can be driven simultaneously by a common voltage source.Type: GrantFiled: May 20, 2005Date of Patent: November 30, 2010Assignee: QUALCOMM MEMS Technologies, Inc.Inventor: Philip D. Floyd
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Patent number: RE43702Abstract: Microscope with heightened resolution and linear scanning wherein the sample is illuminated with a first and a second illuminating light, whereby the first illuminating light excites the sample, and the second illuminating light is generated through the refraction of coherent light at a periodic structure and displays a periodic structure in a lateral beam direction and in axial beam direction.Type: GrantFiled: December 20, 2010Date of Patent: October 2, 2012Assignee: Carl Zeiss MicroImaging GmbHInventor: Ralf Wolleschensky
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Patent number: RE43759Abstract: A multiple wavelength light emitting device is provided wherewith the resonance strength and directivity between colors can be easily adjusted for balance. This light emitting device comprises a light emission means 4 for emitting light containing wavelength components to be output, and a semi-reflecting layer group 2 wherein semi-reflecting layers 2R, 2G, and 2B that transmit some light having specific wavelengths emitted from the light emission means and reflect the remainder are stacked up in order in the direction of light advance in association with wavelengths of light to be output. Light emission regions AR, AG, and AB are determined in association with the wavelengths of light to be output.Type: GrantFiled: June 2, 2000Date of Patent: October 23, 2012Assignees: Seiko Epson Corporation, Cambridge Display Technology LtdInventors: Tatsuya Shimoda, Tomoko Koyama, Takeo Kaneko, Jeremy Henley Burroughes
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Patent number: RE44164Abstract: A multiple wavelength light emitting device is provided wherewith the resonance strength and directivity between colors can be easily adjusted for balance. This light emitting device comprises a light emission means 4 for emitting light containing wavelength components to be output, and a semi-reflecting layer group 2 wherein semi-reflecting layers 2R, 2G, and 2B that transmit some light having specific wavelengths emitted from the light emission means and reflect the remainder are stacked up in order in the direction of light advance in association with wavelengths of light to be output. Light emission regions AR, AG, and AB are determined in association with the wavelengths of light to be output.Type: GrantFiled: June 2, 2000Date of Patent: April 23, 2013Assignees: Seiko Epson Corporation, Cambridge Display Technology LtdInventors: Tatsuya Shimoda, Tomoko Koyama, Takeo Kaneko, Jeremy Henley Burroughes