Light Interference Patents (Class 359/577)
  • Patent number: 8531527
    Abstract: An acoustic-wave sensor (10) is constructed by a membrane (11) adapted to be displaced by an acoustic wave, a first waveguide (16a) for transmitting light therein, an optical coupling part (15) to which the light transmitted through the first waveguide (16a) is adapted to be optically coupled, and a second waveguide (16b) through which the light coupled from the optical coupling part (15) transmits. When the membrane (11) is displaced by its reception of the acoustic wave, at least one of an optical coupling coefficient between the first waveguide (16a) and the optical resonator (15) and an optical coupling coefficient between the second waveguide (16b) and the optical resonator (15) is changed to output a corresponding optical signal.
    Type: Grant
    Filed: August 25, 2008
    Date of Patent: September 10, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventors: Chienliu Chang, Kenichi Nagae
  • Patent number: 8462436
    Abstract: This invention relates to a solar photon filter, hereafter known as the SPF, which is a combination band-pass filtering system consisting of a multiple set of cold or hot mirrors and infra-red absorbers set in a 360-degree or linear arrangement. The system removes almost all of the photons carried by waves having lengths longer than 1000 nm (nanometers)+/?100 nm, while passing almost all of the incoming photons carried by waves having lengths shorter than 1000 nm+/?100 nm and/or variations thereof. This is accomplished by positioning a set of cold or hot mirrors in constant optical track with the sun. Such an assembly of cold or hot mirrors allows solar photons carried by light to be split into two distinct bands of frequencies for use requiring such filtering separation.
    Type: Grant
    Filed: June 2, 2009
    Date of Patent: June 11, 2013
    Inventors: Arthur Robert Tilford, Philip Frank Zimmermann
  • Patent number: 8445097
    Abstract: The present invention discloses a multi-layer fluoropolymeric film that is useful as a light capture front sheet in solar modules, and more broadly as an antireflection layer. The present invention further discloses a glass shaped article having a multi-layer fluoropolymeric film disposed upon the surface thereof. The shaped article is useful in applications where it is desirable to reduce reflection of incident light.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: May 21, 2013
    Assignee: E I du Pont de Nemours and Company
    Inventors: Kostantinos Kourtakis, Mark E. Lewittes, Jose Manuel Rodriguez-Parada
  • Publication number: 20130119270
    Abstract: A multi-wavelength light generator includes a broadband light source and a wavelength division device. The multi-wavelength light generator is configured to generate a first output light having a first line width. The wavelength division device is configured to divide a wavelength of the first output light to provide a plurality of second output lights. Each of the second output lights has a second line width narrower than the first line width, and each of the second output lights is used as a light source of each channel of an optical sensor.
    Type: Application
    Filed: November 6, 2012
    Publication date: May 16, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Samsung Electronics Co., Ltd.
  • Publication number: 20130107369
    Abstract: In a hearth liner wherein an evaporation material is adhered to a substrate to form an optical thin film thereon, the present invention is directed to prevent bumping (splashing) when the evaporation material is irradiated by an electron beam from an electron gun to melt and vaporize thereof. A hearth liner of a vacuum evaporation apparatus wherein the electron beam from the electron gun is irradiated on the evaporation material to form an optical thin film on a substrate, wherein the cross-section shape of an evaporation material storage part of the hearth liner is a shallow semicircular (spherical) shape (bowl shape).
    Type: Application
    Filed: April 23, 2012
    Publication date: May 2, 2013
    Applicant: NIHON DEMPA KOGYO CO., LTD.
    Inventors: KEN SEKI, TOSHIMASA NISHI, HIROTO ISHIKAWA
  • Patent number: 8404335
    Abstract: A laminated film includes a structure where each 200 layers or more of a layer composed of a resin A (A layer) and a layer composed of a resin B (B layer) are alternately laminated, wherein a relative reflectance in a wavelength range of 400 nm to 1000 nm is 30% or more, tensile stresses at 100% elongation in a longitudinal direction and a width direction of the film are 3 MPa or more and 90 MPa or less in a tensile test at 150° C., and the number of layers with a layer pair-thickness of 120 nm or more and less than 220 nm is 1.05 times or more to 2.5 times or less the number of layers with a layer-thickness of 220 nm or more and 320 nm or less.
    Type: Grant
    Filed: January 3, 2012
    Date of Patent: March 26, 2013
    Assignee: Toray Industries, Inc.
    Inventors: Syunichi Osada, Wataru Gouda
  • Patent number: 8400616
    Abstract: A laser interference lithography apparatus capable of stitching small exposed areas into a large exposed area includes a body, a laser beam supplying unit, a reflecting mechanism, an L-shaped fixing mechanism and a substrate stage. The laser beam supplying unit fixed onto the body provides a laser beam. The reflecting mechanism is movably and rotatably mounted on the body. The L-shaped fixing mechanism mounted on the body includes a first mounting seat and a second mounting seat. An upright first reflecting mirror is fixed to the first mounting seat. The second mounting seat connected to the first mounting seat fixes a horizontal mask, and is substantially perpendicular to the first mounting seat. The substrate stage, movably mounted on the body and disposed below the second mounting seat, supports a substrate. Thus, a large-area pattern formed by stitching small-area patterns may be obtained.
    Type: Grant
    Filed: July 20, 2010
    Date of Patent: March 19, 2013
    Assignee: National Tsing Hua University
    Inventor: Chien-Chung Fu
  • Publication number: 20130046381
    Abstract: An imaging lens structure and method of imaging are presented. The imaging lens structure comprising a lens region defining an effective aperture of the lens structure. The lens region comprises an arrangement of lens zones distributed within the lens region and comprising zones of at least two different optical functions differently affecting light passing therethrough. The zones of at least two different optical functions are arranged in an interlaced fashion along said lens region corresponding to a surface relief of the lens region such that adjacent lens zones of different optical functions are spaced apart from one another along an optical axis of the lens structure a distance larger than a coherence length of light at least one spectral range for which said lens structure is designed.
    Type: Application
    Filed: February 9, 2011
    Publication date: February 21, 2013
    Inventors: Zeev Zalevsky, Alex Zlotnik, Shai Ben-Yaish, Ofer Limon, Ido Raveh
  • Publication number: 20130017498
    Abstract: A two-beam interference lithography system offers large-area nanopatterning with tunability of pattern periodicities. The tunable feature is achieved by placing two rotatable mirrors in the two expanded beam paths which can conveniently be regulated for the designed pattern periodicities. While the effective interference pattern coverage is mainly determined by the optical coherence length and mirror size, the minimum pattern coverage area is as large as the effective coherence length of the laser and the selected mirror size over a wide range of periodicities.
    Type: Application
    Filed: July 12, 2012
    Publication date: January 17, 2013
    Inventors: Weidong Mao, Ishan Wathuthanthri, Chang-Hwan Choi
  • Publication number: 20120314293
    Abstract: An article includes a light-transmittable substrate having opposite first and second surfaces spaced in a height direction. A first pattern is provided on the first surface of the light-transmittable substrate. A plurality of spaced first lines is provided on a face of the first pattern. A second pattern is provided on the second surface of the light-transmittable substrate. A plurality of spaced second lines is provided on a face of the second pattern. The first lines intersect the second lines when viewed from the face of the first pattern, forming a Moire pattern and creating Moire effect. Light beams passing through the light-transmittable substrate via the first pattern or the second pattern according to a viewing angle of a viewer are refracted to represent a 3D lively figure.
    Type: Application
    Filed: June 10, 2011
    Publication date: December 13, 2012
    Inventor: Chien-Fu Chang
  • Patent number: 8264667
    Abstract: A lithographic apparatus including an exposure unit that exposes parallel lines on a target area of a substrate by projecting two beams of radiation onto the substrate. The two beams of radiation are projected such that they interfere with each other to form the parallel lines. An actuator continuously moves the substrate relative to the exposure unit, while the exposure unit exposes the parallel lines on the target areas on the substrate.
    Type: Grant
    Filed: May 4, 2006
    Date of Patent: September 11, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Kars Zeger Troost, Johannes Jacobus Matheus Baselmans, James Sherwood Greeneich
  • Publication number: 20120194821
    Abstract: A colorimetric sensor includes an etalon including a first substrate, a second substrate facing the first substrate, a fixed mirror formed on a surface of the first substrate facing the second substrate, and a movable mirror formed on the second substrate so as to face the fixed mirror with a prescribed gap therebetween, a light receiving element that receives a test subject light having passed through the etalon, and a holding member holding the etalon. The etalon includes a light interference area facing the first and second substrates in a plan view as seen in a thickness direction of the substrate, and a protruding area protruding from the light interference area. The holding member holds the etalon at one end side of the protruding area opposite to the light interference area.
    Type: Application
    Filed: January 25, 2012
    Publication date: August 2, 2012
    Applicant: SEIKO EPSON CORPORATION
    Inventor: Takeshi NOZAWA
  • Patent number: 8233220
    Abstract: The invention relates to an optical system for providing on-axis destructive interference of light received from an object along a predetermined system optical axis. The system comprises a receiving and guiding optical structure and a combining optical structure. The receiving and guiding optical structure is for receiving and guiding at least three beams of light received from said object, the receiving and guiding optical structure arranged to provide a relative optical path difference between the at least three beams; the combining optical structure is for combining the at least three beams. According to the invention, a polarization varying optical structure is arranged between the receiving and guiding optical structure and the combining optical structure, for varying a polarization state of the beams relative to each other in order to provide on-axis destructive interference.
    Type: Grant
    Filed: March 26, 2007
    Date of Patent: July 31, 2012
    Assignee: Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek TNO
    Inventor: Julien Felix Paul Spronck
  • Patent number: 8213084
    Abstract: A fundamental limit to the sensitivity of optical interferometry is thermal noise that drives fluctuations in the positions of the surfaces of the interferometer's mirrors, and thereby in the phase of the intracavity field. A scheme for substantially reducing this thermally driven phase noise is provided in which the strain-induced phase shift from a mirror's optical coating cancels that due to the concomitant motion of the substrate's surface. As such, although the position of the physical surface may fluctuate, the optical phase upon reflection can be largely insensitive to this motion.
    Type: Grant
    Filed: April 1, 2008
    Date of Patent: July 3, 2012
    Assignee: California Institute of Technology
    Inventor: H. Jeff Kimble
  • Publication number: 20120154883
    Abstract: There are provided a lens, a method of fabricating the lens, and a light scanning unit. The lens includes a lens portion having an effective optical surface, and a gate-side flange portion between the lens portion and a gate-side end of the lens. If the lens is disposed between two polarizers configured to polarize light linearly in perpendicular directions and is illuminated in an optical axis direction, interference fringes are generated on the lens, and peripheral interference fringes of the interference fringes extend continuously from the gate-side end and are longer than the gate-side flange portion.
    Type: Application
    Filed: October 6, 2011
    Publication date: June 21, 2012
    Applicant: Samsung Electronics Co., Ltd
    Inventor: Won-young CHO
  • Publication number: 20120154914
    Abstract: An interference filter assembly includes a condenser lens, a collimating lens, an interference filter, and an imaging device, which are arranged in a direction of light travel. The collimating lens is spaced from the condenser lens by a predetermined distance that corresponds to one of a focal length of the condenser lens and a focal length of the collimating lens. The collimating lens is provided by a single lens and applies a collimated light toward the imaging device through the interference filter in the direction of light travel. The collimating lens has a first surface adjacent to the condenser lens and a second surface adjacent to the interference filter. The first surface is a curved surface that is convex toward the condenser lens and a circular hyperboloid. The second surface is a plane surface and outputs the collimated light to the interference filter.
    Type: Application
    Filed: December 14, 2011
    Publication date: June 21, 2012
    Applicant: DENSO CORPORATION
    Inventors: Chihiro Moriguchi, Hiroshi Ando, Katsuhiro Morikawa
  • Patent number: 8199333
    Abstract: Optical scattering disk, use and wavefront measuring apparatus. The optical scattering disk includes a transparent substrate (1) and a light scattering layer (2) adjoining a surface of the substrate and having light-scattering-active particles (3). The light scattering layer has an embedding medium (4) which is optically denser than air and directly adjoins the facing surface of the substrate without intervening air gaps and by which the light-scattering-active particles are surrounded. Such optical scattering disks may be used, e.g., in apparatuses for wavefront measurement of high-aperture microlithography projection objectives employing lateral shearing interferometry.
    Type: Grant
    Filed: May 23, 2006
    Date of Patent: June 12, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Ulrich Wegmann
  • Patent number: 8194322
    Abstract: Multilayer-film reflective mirrors are disclosed. An exemplary such mirror has a base and a multilayer film formed on the base. The multilayer film includes multiple layer pairs. Each layer pair includes a respective first layer and a respective second layer, wherein the first and second layers are laminated together in an alternating manner. The multilayer film has first and second regions that reflect extreme ultraviolet light. A first group of layers is disposed in the first and second regions and has a first periodic length. A second group disposed in the first region has a second periodic length different from the first periodic length, and a third group disposed in the second region has a substantially same periodic length as the first periodic length.
    Type: Grant
    Filed: March 7, 2008
    Date of Patent: June 5, 2012
    Assignee: Nikon Corporation
    Inventor: Masayuki Shiraishi
  • Publication number: 20120134002
    Abstract: Described is a method of controlling the absorption of light in a cavity, a system in which absorption is so controlled, and an interferometer embodying the underlying physical concept. Materials can be made to completely absorb incident light when the light is imposed in a specific pattern of illumination. Coherent perfect absorption, as the process is referred to, is achieved when a cavity is illuminated coherently and monochromatically by the time-reverse of the output of a lasing mode. Varying the parameters of the incident light and/or of the cavity allows the absorption of the incident light by the cavity to be controlled; enhanced or even reduced.
    Type: Application
    Filed: June 29, 2010
    Publication date: May 31, 2012
    Inventor: A. Douglas Stone
  • Patent number: 8169446
    Abstract: A display device includes: a reflection property control layer which is disposed in the front face of a display screen, whereby reflection properties are switched for each predetermined region; and a control unit configured to switch the reflection properties of the reflection property control layer depending on an input image, with the control means detecting a gloss region from the input image, and switching the reflection properties of a predetermined region according to the relevant detection result.
    Type: Grant
    Filed: December 9, 2008
    Date of Patent: May 1, 2012
    Assignee: Sony Corporation
    Inventors: Takao Inoue, Masashi Uchida, Tetsujiro Kondo
  • Publication number: 20120099090
    Abstract: Systems and methods related to the generation of interference patterns using electromagnetic radiation are generally described. Some embodiments are directed to the use of such systems and methods to perform interference lithography.
    Type: Application
    Filed: December 2, 2010
    Publication date: April 26, 2012
    Applicant: Massachusetts Institute of Technology
    Inventors: Karl K. Berggren, Hasan Korre, Corey P. Fucetola
  • Publication number: 20120081687
    Abstract: An exemplary embodiment of the present invention provides an interference projection exposure system comprising a beam-providing subsystem and an objective lens subsystem that can provide a plurality of light beams which intersect and interfere at an image plane to produce a high spatial frequency periodic optical-intensity distribution. The interference projection system can further comprise a pattern mask that can alter the periodic optical-intensity distribution so as to incorporate functional elements within the periodic optical-intensity distribution. The beam providing subsystem can comprise a beam generating subsystem, a beam conditioning subsystem and a beam directing subsystem. Another exemplary embodiment of the present invention provides for a method of producing a high spatial frequency periodic optical-intensity distribution using a interference projection exposure system.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 5, 2012
    Applicant: Georgia Tech Research Corporation
    Inventors: Guy Matthew Burrow, Thomas K. Gaylord
  • Patent number: 8110278
    Abstract: The subject invention relates to a scratch-resistant optical film, which comprises: (a) a transparent substrate having a first surface and a second surface; (b) a diffusion layer on the first surface of the substrate, which has a convex-concave structure and is comprised of a first hard coat layer comprising organic particles; (c) a scratch-resistant layer on the second surface of the substrate, which is comprised of a second hard coat layer; wherein the organic particles in the first hard coat layer are formed from a polyacrylate resin which comprises at least one multi-functional acrylate monomer as polymerization units, said multi-functional acrylate monomer being in an amount from 30 to 70 wt % based on the total weight of the monomer used, and wherein the organic particles have a single mean particle size and have a particle size distribution in the range within about ±5% of the mean particle size.
    Type: Grant
    Filed: June 12, 2008
    Date of Patent: February 7, 2012
    Assignee: Eternal Chemical Co., Ltd.
    Inventors: Lung-Lin Hsu, Shu-Hong Liu, Chun-Hung Chou
  • Patent number: 8110282
    Abstract: An object of the present invention is to provide a film having a high brightness and a natural metal-effect, and also having excellent formability, causing no delamination and maintaining the metal-effect after forming. Another object is to provide a molded body having less environmental burden, excellent in recycling efficiency and giving no electromagnetic interference. A laminated film including a structure where each 30 layers or more of a layer composed of a resin A (A layer) and a layer composed of a resin B (B layer) are alternately laminated, wherein a relative reflectance in a wavelength range of 400 nm to 1000 nm is 30% or more, tensile stresses at 100% elongation in a longitudinal direction and a width direction of the film are 3 MPa or more and 90 MPa or less in a tensile test at 150° C., and the number of layers with a layer-pair thickness of 10 nm or more and less than 220 nm is more than the number of layers with a layer-pair thickness of 220 nm or more and 320 nm or less.
    Type: Grant
    Filed: August 10, 2006
    Date of Patent: February 7, 2012
    Assignee: Toray Industries, Inc.
    Inventors: Syunichi Osada, Wataru Gouda
  • Publication number: 20120013878
    Abstract: A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width ?lat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width ?lat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width ?b corresponding to plural lateral laser modes, and wherein ?m<?lat<?b, and wherein an optical delay apparatus disposed in the beam provides an optical path difference ?l, wherein 0.8 · ? 0 2 ( 2 · ? ? ? ? l ) < ? ? ? l < 1.8 · ? 0 2 ( 2 · ?? l ) , wherein ?0 is an average wavelength of the light of the first beam of laser light, and ??lat represents the second line width.
    Type: Application
    Filed: June 30, 2011
    Publication date: January 19, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Matthias Kuss, Damian Fiolka, Gerd Reisinger, Manfred Maul, Vladimir Davydenko
  • Patent number: 8081383
    Abstract: A generator of duality modulated radiation, of which the irradiance, the wave intensity, or both, are varied from ordinarily equivalent levels, either for purposes of providing energy depleted or energy enriched radiation or for purpose of encoding an information signal. Various techniques are disclosed for restoring irradiance levels to “ordinary” levels, or for amplifying irradiance without affecting wave intensity. A communication system also employs duality modulated radiation.
    Type: Grant
    Filed: February 8, 2011
    Date of Patent: December 20, 2011
    Inventors: Stuart G. Mirell, Daniel J. Mirell
  • Patent number: 8078027
    Abstract: A focus enhancing electromagnetic wave propagating device includes a main body formed with a main wave-propagating structure (MS) for focusing an electromagnetic wave into a focusing light spot, and an auxiliary wave-propagating channel (AC) for allowing the wave to propagate toward the focusing light spot. A phase difference is present between the wave after traveling through the MS at its exit end and the wave after traveling through the AC at its exit opening, such that constructive interference is generated at the focusing light spot therebetween. The required phase difference is a function of a distance between the focusing light spot and the exit end of the MS, a distance between the focusing light spot and the exit opening of the AC, velocities of the wave after traveling through each of the MS and the AC, and angular frequencies of the wave after traveling through each of the MS and the AC.
    Type: Grant
    Filed: December 2, 2009
    Date of Patent: December 13, 2011
    Assignee: National Cheng Kung University
    Inventor: Kuan-Ren Chen
  • Publication number: 20110255166
    Abstract: An optical filter device includes a first electrode that is provided on a first substrate, a second electrode that is provided on a second substrate to face the first electrode, a pair of first lead-out electrodes that connects to the first electrode, and a pair of second lead-out electrodes that is provided on the second substrate to connect to the second electrode.
    Type: Application
    Filed: April 12, 2011
    Publication date: October 20, 2011
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Susumu SHINTO, Akira SANO
  • Patent number: 8031407
    Abstract: An imaging assembly for an image sensor may include a lens, a transparent substrate and two aspherical optical coatings on each side of the substrate. The imaging assembly can also incorporate an opaque coating with an opening in-line with the lens to form an aperture, an anti-reflection coating, and an infrared filter coating.
    Type: Grant
    Filed: August 11, 2005
    Date of Patent: October 4, 2011
    Assignee: STMicroelectronics Ltd.
    Inventors: Jonathan Ephriam David Hurwitz, Ewan Findlay
  • Publication number: 20110235181
    Abstract: An optical element includes a base and a large number of structures arranged on the surface of the base, the structures being projections or depressions. The structures are arranged at a pitch shorter than or equal to a wavelength of light in a use environment. An effective refractive index in the depth direction of the structures gradually increases toward the base and has two or more inflection points.
    Type: Application
    Filed: September 18, 2009
    Publication date: September 29, 2011
    Applicant: SONY CORPORATION
    Inventors: Kazuya Hayashibe, Sohmei Endoh, Makiko Oikawa, Shunichi Kajiya
  • Patent number: 8027100
    Abstract: An imaging lens includes a first lens group having a positive refractive power, an aperture stop, and a second lens group having a positive refractive power, which are disposed in order from an object. The first lens group has a first lens component having a negative refractive power and a second lens component having a positive refractive power, which are disposed in order from the object, and conditions expressed by the expressions 0.12<f/f1<0.47 and 0.016<D12/f<0.079 are satisfied, when f1 is a focal length of the first lens group, f is a focal length of the imaging lens, and D12 is an air distance between the first lens component and the second lens component of the first lens group.
    Type: Grant
    Filed: February 17, 2011
    Date of Patent: September 27, 2011
    Assignee: Nikon Corporation
    Inventor: Toshinori Take
  • Publication number: 20110228073
    Abstract: A synthetic aperture optics (SAO) imaging method minimizes the number of selective excitation patterns used to illuminate the imaging target, based on the objects' physical characteristics corresponding to spatial frequency content from the illuminated target and/or one or more parameters of the optical imaging system used for SAO. With the minimized number of selective excitation patterns, the time required to perform SAO is reduced dramatically, thereby allowing SAO to be used with DNA sequencing applications that require massive parallelization for cost reduction and high throughput. In addition, an SAO apparatus optimized to perform the SAO method is provided. The SAO apparatus includes a plurality of interference pattern generation modules that can be arranged in a half-ring shape.
    Type: Application
    Filed: March 19, 2010
    Publication date: September 22, 2011
    Applicant: LIGHTSPEED GENOMICS, INC.
    Inventors: Chun-Sheu Lee, Jong Buhm Park
  • Patent number: 8023190
    Abstract: A diffusing plate has a surface including a plurality of fine concave/convex portions regularly arranged within a cycle equal to or smaller than a predetermined wavelength. The surface has a larger surface roughness than the predetermined wavelength. An average value for an angle between a normal vector of the tangent plane of a roughness shape of the surface and a normal vector of a reference plane of the surface is 5 degrees or more.
    Type: Grant
    Filed: May 15, 2007
    Date of Patent: September 20, 2011
    Assignee: Panasonic Corporation
    Inventors: Kazuhiro Yamada, Takamasa Tamura, Motonobu Yoshikawa, Hiroshi Yamaguchi, Kazuhiko Ishimaru
  • Patent number: 8017217
    Abstract: A material of variable emissivity includes a first metallic layer having a first aperture, a second metallic layer having a second aperture, and a variable dielectric layer interposed between the first metallic layer and the second metallic layer.
    Type: Grant
    Filed: May 9, 2008
    Date of Patent: September 13, 2011
    Assignee: HRL Laboratories, LLC
    Inventors: Daniel J. Gregoire, Deborah J. Kirby
  • Patent number: 7990611
    Abstract: A microscope includes a source of electromagnetic radiation, having a wavelength, ?1 and dividing optical elements configured for dividing the radiation from the source into multiple excitation beams. The microscope also includes a detector and directing optical elements, which are configured for directing each excitation beam in unique directions, such that the beams intersect in an excitation region within a sample to create a two-dimensional or three-dimensional interference pattern of multiple excitation maxima within the sample. The detector has individual detector elements, where the detector elements are configured for detecting light resulting from an interaction of an individual excitation maximum and the sample.
    Type: Grant
    Filed: May 22, 2007
    Date of Patent: August 2, 2011
    Inventor: Robert Eric Betzig
  • Patent number: 7978201
    Abstract: A method for compensating an image produced by image means for implementing image information takes account of ambient illumination. Luminance of external background illumination around the image means is measured. The measured luminance of the background illumination is compared with preset tristimulus values and a reflectance factor of the image means, a comparison result is computed, and a control signal is generated to compensate luminance and chroma of an image. Luminance and chroma of the image means are compensated in response to the control signal.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: July 12, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Dae Cho, Seok-Jin Won, Jung-Hoon Park, Young-Min Jeong, Jae-Won Moon, Yun-Je Oh, Young-Ho Ha, Jong-Man Kim, Cheol-Hee Lee, Chang-Hwan Son
  • Patent number: 7972004
    Abstract: A system and method for uniform light generation in projection display systems. An illumination source comprises a light source to produce colored light, and a scrolling optics unit optically coupled to the light source, the scrolling optics unit configured to create lines of colored light from the colored light, and to scroll the lines of colored light along a direction orthogonal to a light path of the illumination source. The scrolling optics unit comprises a single light shaping diffuser to transform the colored light into the lines of colored light, an optical filter positioned in the light path after the light shaping diffuser, and a scrolling optics element positioned in the light path after the optical filter. The single light shaping diffuser is capable of simultaneously transforming colored light into lines of colored light having substantially uniform intensity to provide uniform illumination.
    Type: Grant
    Filed: April 18, 2008
    Date of Patent: July 5, 2011
    Assignee: Texas Instruments Incorporated
    Inventors: Terry Alan Bartlett, Paul L. Rancuret
  • Patent number: 7969638
    Abstract: A thin black mask is created using a single mask process. A dielectric layer is deposited over a substrate. An absorber layer is deposited over the dielectric layer and a reflector layer is deposited over the absorber layer. The absorber layer and the reflector layer are patterned using a single mask process.
    Type: Grant
    Filed: April 10, 2008
    Date of Patent: June 28, 2011
    Assignee: QUALCOMM MEMS Technologies, Inc.
    Inventors: Gang Xu, Chun-Ming Wang, Fan Zhong, Qi Luo
  • Publication number: 20110149398
    Abstract: Described is a means for communication, enabling message transmission faster than the speed of light between two separated locations. A photon source feeds a splitter, which allows a single photon to split between flowing down the left input side and the right output side. On the left, the photon enters a phase splitter, which produces an in-phase and inverted phase signal. With the delay switch at zero delay, both signals arrive together at the combiner with opposite phase, canceling each other out. With the delay switch set to half a wavelength, no cancellation results and the signal passes unabated through the combiner. In this mode, approximately, fifty percent of the photons register at each detector, which are equidistant from the photon source. In the former mode, (delay switch set to zero) much more of the photons appear at the output detector, and no signal appears at the input detector. Consider the simplified schematic that follows.
    Type: Application
    Filed: September 13, 2010
    Publication date: June 23, 2011
    Inventor: Donald Wortzman
  • Patent number: 7965435
    Abstract: A system and method for locking the relative phase of multiple coherent optical signals, which compensates for optical phase changes induced by vibration or thermal changes in the environment.
    Type: Grant
    Filed: September 28, 2010
    Date of Patent: June 21, 2011
    Assignee: Phase Sensitive Innovations, Inc.
    Inventors: Christopher A. Schuetz, Richard D. Martin, Dennis W. Prather, Thomas E. Dillon
  • Publication number: 20110134532
    Abstract: In an optical etalon with a fixed FSR determined by the cavity length, the time delay is adjusted by an etalon surface coating. The proper cavity length is chosen to achieve a desired FSR, and the coating is independently selected to obtain a desired time delay.
    Type: Application
    Filed: December 6, 2010
    Publication date: June 9, 2011
    Applicant: OPTOPLEX CORPORATION
    Inventor: Yung-Chieh Hsieh
  • Patent number: 7957064
    Abstract: A diffusing plate is formed so as to have a surface having a larger surface roughness than a predetermined wavelength and having an aperiodic roughness shape. A plurality of fine concave/convex portions are formed on the surface so as to be regularly arranged within a cycle equal to and smaller than a predetermined wavelength.
    Type: Grant
    Filed: May 15, 2007
    Date of Patent: June 7, 2011
    Assignee: Panasonic Corporation
    Inventors: Kazuhiro Yamada, Takamasa Tamura, Motonobu Yoshikawa, Hiroshi Yamaguchi, Kazuhiko Ishimaru
  • Patent number: 7952810
    Abstract: An object is to provide: a zoom lens system that has a reduced overall length, a high resolution, and a variable magnification ratio as high as 9 or greater and that is satisfactorily adaptable for wide-angle image taking where the view angle at a wide-angle limit is 70° or greater; an imaging device employing this zoom lens system; and a thin and compact camera. The zoom lens system has a plurality of lens units each consisting of at least one lens element, and, in order from the object side to the image side, comprises a first lens unit having positive optical power, a second lens unit having negative optical power, a third lens unit having positive optical power, a fourth lens unit and a fifth lens unit. In zooming from a wide-angle limit to a telephoto limit at the time of image taking, at least the first lens unit and the second lens unit move in an optical axis direction, while the fourth lens unit and the fifth lens unit are each consists of one lens element.
    Type: Grant
    Filed: December 16, 2009
    Date of Patent: May 31, 2011
    Assignee: Panasonic Corporation
    Inventors: Takakazu Bito, Keiki Yoshitsugu, Shinji Yamaguchi
  • Patent number: 7929813
    Abstract: An exemplary optical modulator includes an interferometer. The interferometer includes an input optical coupler, an output optical coupler, and two or more controllable optical waveguides. Each controllable optical waveguide connects the input optical coupler to the output optical coupler and has an electro-absorption modulator along a segment thereof. Two of the controllable optical waveguides are connected to transmit to an output of the output optical coupler light of substantially different maximum amplitude.
    Type: Grant
    Filed: September 25, 2009
    Date of Patent: April 19, 2011
    Assignee: Alcatel-Lucent USA Inc.
    Inventors: Christopher Richard Doerr, Peter J. Winzer
  • Patent number: 7894136
    Abstract: A method for creating a periodic interference pattern of coherent waves in two or three dimensions, D, includes generating at least D+2 waves, where each wave has substantially the same wavelength, ?, and travels substantially in a unique direction, kn. The waves are directed such that at least a portion of each wave intersects in a common excitation region to create the interface pattern. The directions, kn, of the waves are selected such that the interference pattern within the excitation region forms a Bravais lattice, and at least one wave travels substantially in a direction, ki, such that one or more symmetry operations characteristic of the Bravais lattice map the direction of the wave, ki, onto a direction of a different wave, kj. The directions of the waves, kn, do not all lie on a D-dimensional set of mutually orthogonal axes.
    Type: Grant
    Filed: May 22, 2007
    Date of Patent: February 22, 2011
    Inventor: Robert Eric Betzig
  • Patent number: 7859646
    Abstract: According to one exemplary embodiment of the present invention, a method for writing an arbitrary, two-dimensional pattern using interferometric lithography and classical techniques includes the steps of: (1) creating a pixel array defined by a number of pixels having specific coordinates; (2) mapping pixel information based on the desired pattern, the pixel information including a list of which pixels are activated to define the desired two-dimensional pattern; (3) controlling a relative strength of each pixel for indicating a feature height of a portion of the desired two-dimensional pattern; and (4) controlling a degree that one pixel is shifted in an x-direction and a y-direction relative to original coordinates of the pixel in order to define the desired two-dimensional pattern pixel by pixel.
    Type: Grant
    Filed: June 15, 2007
    Date of Patent: December 28, 2010
    Assignee: Adelphi University
    Inventor: Sean J. Bentley
  • Patent number: 7843410
    Abstract: One embodiment includes a display of interferometric modulators having a configurable resolution characteristic. Selected rows and/or columns are interconnected via a switch. The switch can include a fuse, antifuse, transistor, and the like. Depending on a desired resolution for a display, the switches can be placed in an “open” or “closed” state. Advantageously, using the switches, a display can readily be configured for differing modes of resolution. Furthermore, using the switches, a display can be configured to electrically connect certain rows or columns in the display such that the connected rows or columns can be driven simultaneously by a common voltage source.
    Type: Grant
    Filed: May 20, 2005
    Date of Patent: November 30, 2010
    Assignee: QUALCOMM MEMS Technologies, Inc.
    Inventor: Philip D. Floyd
  • Patent number: RE43702
    Abstract: Microscope with heightened resolution and linear scanning wherein the sample is illuminated with a first and a second illuminating light, whereby the first illuminating light excites the sample, and the second illuminating light is generated through the refraction of coherent light at a periodic structure and displays a periodic structure in a lateral beam direction and in axial beam direction.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: October 2, 2012
    Assignee: Carl Zeiss MicroImaging GmbH
    Inventor: Ralf Wolleschensky
  • Patent number: RE43759
    Abstract: A multiple wavelength light emitting device is provided wherewith the resonance strength and directivity between colors can be easily adjusted for balance. This light emitting device comprises a light emission means 4 for emitting light containing wavelength components to be output, and a semi-reflecting layer group 2 wherein semi-reflecting layers 2R, 2G, and 2B that transmit some light having specific wavelengths emitted from the light emission means and reflect the remainder are stacked up in order in the direction of light advance in association with wavelengths of light to be output. Light emission regions AR, AG, and AB are determined in association with the wavelengths of light to be output.
    Type: Grant
    Filed: June 2, 2000
    Date of Patent: October 23, 2012
    Assignees: Seiko Epson Corporation, Cambridge Display Technology Ltd
    Inventors: Tatsuya Shimoda, Tomoko Koyama, Takeo Kaneko, Jeremy Henley Burroughes
  • Patent number: RE44164
    Abstract: A multiple wavelength light emitting device is provided wherewith the resonance strength and directivity between colors can be easily adjusted for balance. This light emitting device comprises a light emission means 4 for emitting light containing wavelength components to be output, and a semi-reflecting layer group 2 wherein semi-reflecting layers 2R, 2G, and 2B that transmit some light having specific wavelengths emitted from the light emission means and reflect the remainder are stacked up in order in the direction of light advance in association with wavelengths of light to be output. Light emission regions AR, AG, and AB are determined in association with the wavelengths of light to be output.
    Type: Grant
    Filed: June 2, 2000
    Date of Patent: April 23, 2013
    Assignees: Seiko Epson Corporation, Cambridge Display Technology Ltd
    Inventors: Tatsuya Shimoda, Tomoko Koyama, Takeo Kaneko, Jeremy Henley Burroughes