Abstract: A catadioptric projection lens configured for imaging a pattern arranged in an object plane (2) onto an image plane (4) while creating a single, real, intermediate image (3) has a catadioptric imaging group (5) having a concave mirror (6) and a beam-deflector (7), and a dioptric imaging lens group (20) that commences after the beam-deflector. The system is configured such that the intermediate image follows the first lens (17) of a dioptric section (8) and is preferably readily accessible. Arranging the intermediate image both between a pair of lenses (17, 21) of the dioptric section and at a large distance behind the final reflective surface of the beam-deflector helps to avoid imaging aberrations.

Abstract: Disclosed herein is an optical apparatus including: a variable configuration mirror unit having a reflecting surface for reflecting incident light and capable of causing change in the configuration of the reflecting surface upon turning on electricity; and a lens for bringing the incident light into an internal part, a mirror holding section for holding the variable configuration mirror unit being formed on the lens.

Abstract: An optical system for projection photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a large field over both a narrow and a broad spectral range. The optical system includes a positive lens group having a positive subgroup of elements that includes at least a plano-convex element and a negative subgroup that includes at least a negative meniscus element. The lens subgroups are separated by a small air space. The positive and negative subgroups constitute a main lens group arranged adjacent to but spaced apart from a concave mirror along the mirror axis. The system also includes a variable aperture stop so that the system has a variable NA. A projection photolithography system that employs the optical system is also disclosed.

Abstract: The invention is to provide a synthetic resin-made concave cone lens for radiating a standard laser line in a low cost in that accuracy of irradiation of a standard laser line can be assured, occurrence of defective products can be prevented, and advantages in production cost owing to mass production can be sufficiently enjoyed.

Abstract: An optical apparatus has a look-up table provided with control information for controlling an optimum variable optical-property optical element in accordance with a distance to an object, a zoom state, or a combination of the distance to the object with the zoom state. A drive of the variable optical-property optical element is controlled on the control information obtained from the look-up table or a predetermined calculation process is executed on the control information obtained from the look-up table, and information obtained from the calculation process is used to control the drive of the variable optical-property optical element.

Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

Abstract: A lens for an optical recording and reproducing system includes: a plane of incidence on which a light generated from a light source is made incident; a first reflection side for reflecting a light passing through a plane of incidence; and a second reflection side for reflecting again the light that has been reflected on the first reflection side, the second reflection side being coated with a reflection material and being formed to be parabolic. The lens for an optical recording and reproducing system is very small in its size and weight, compared to the conventional lens for an optical recording system. In addition, the lens has a large numerical aperture and a less light loss by using one focussing lens without an objective lens, so that an information recording and reproducing efficiency can be heightened.

Abstract: An optical apparatus includes a variable optical-property element to change its optical properties by applying an electric or magnetic field or temperature to a liquid crystal. In this way, the optical apparatus is reduced in thickness, and can be used in a camera, a microscope, etc.

Abstract: To provide an imaging optical system composed of off-axial reflective surfaces, which has a small size, which is less occurrence of asymmetrical aberration, and which has a high optical performance, and to provide an image reading apparatus using the imaging optical system. The imaging optical system according to the present invention, in which image information on a surface of an object is imaged onto a line sensor, includes an imaging optical element including a plurality of off-axial reflective surfaces, in which the imaging optical element includes at least one of the plurality of off-axial reflective surfaces, whose length in a pixel arrangement direction of the line sensor is longer than a length thereof in a direction perpendicular to the pixel arrangement direction of the line sensor.

Abstract: A scanning display optical system is disclosed that can optically correct the distortion of images formed by two-dimensional scanning of a light beam. The scanning display optical system comprises a deflection device deflecting a light beam from a light source two-dimensionally and an image-forming optical system forming an image with the light beam deflected by the deflection device. A direction from which the light beam coming from the light source is incident on the deflection device is oblique with respect to at least one of the two deflection axes of the deflection device. The image-forming optical system includes an optical element which is tilted and/or shifted with respect to a center axis of a two-dimensional deflection range over which the light beam is deflected by the deflection device.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.

Abstract: A passenger compartment monitoring apparatus that guarantees the required monitoring area and can be installed in both right-hand and left-hand drive vehicles. The monitoring apparatus has a room mirror arranged in the passenger compartment and a plurality of imaging devices arranged in the room mirror. Each of the imaging devices is arranged in the room mirror at a predetermined angle so as to monitor a predetermined area in the passenger compartment regardless of whether the monitoring apparatus is installed in a right-hand or left-hand drive vehicle.

Abstract: A laser beam incident on a rod lens has a greater cross-sectional diameter than that of a rod lens main body, and mirrors are provided near the rod lens main body to reflect incident light toward the same. Since light of a strong beam intensity reflected onto the rod lens main body by the mirrors produces a greater angle than light of weak beam intensity, this configuration has an effect of increasing the light intensity on the ends of a resulting line beam and, thus, expands the spreading angle of visible light in the line beam.

Abstract: An exposure apparatus includes a projection optical system of a catadioptric type and an optical element disposed on a reciprocating light path of the projection optical system. The optical element is movable along an optical axis direction.

Abstract: A projection exposure apparatus has an illumination optical system 3 for illuminating a mask formed with a pattern with beams of radiation, and a projection optical system for forming an image of the pattern on a workpiece on the basis of radiation from the mask. The illumination optical system supplies an illumination radiation having a center wavelength of 180 nm or smaller, and the projection optical system includes at least one concave mirror, fifteen or less pieces of refracting lenses, and four or more aspherical surfaces.

Abstract: A projection display system that can diminish ghost images is disclosed. The projection display system includes an illumination system and an image system. The projection display system has a light source for emitting at least one light beam, and a field lens having a first surface and a second surface opposite to the first surface, the first surface having at least one reflection area. The image system utilizes the field lens and a light valve mounted adjacent to the second surface of the field lens for reflecting the light beam emitted by the light source. The light beam reflected from the light valve to the interface reflecting area is further reflected to a region outside of the light valve by the reflection area.

Abstract: A retainer is constructed of a retainer top section, a retainer body section and a retainer bottom section. Connecting portions of the sections are screwed by screws provided for the connecting portions with interposition of an O-ring. A mirror having a surface of revolution is mounted on the top portion of the body section. The bottom section is assembled with a mounting base for movably mounting an image pickup device and with a fixture for fixing the image pickup device to the mounting base. There is thus obtained a compact omnidirectional visual angle system, which has a waterproof function and does not interrupt the visual angle and in which the retainer structure of the mirror and the image pickup device, the distance therebetween can be varied, is integrated with an exterior casing for sealing use. The retainer can easy replace the components.

Abstract: A solar collection system and method having means for receiving solar radiation through a main refractive interface and means for internally reflecting at least once, at least a portion of the received solar radiation. The refractive medium may be liquid, gel or solid. The device may be integrated with a photovoltaic device, photohydrolytic device, a heat engine, a light pipe or a photothermal receptor.

Abstract: A one-dimensional image is formed by reflecting the light from a one-dimensional display device having a plurality of light emitting sections or light emitting sections disposed in one direction by a projection optical system three times or more. Then, a two-dimensional image is obtained by optically scanning the one-dimensional image by a light deflection means in a surface including a direction perpendicular to the disposing direction of the light emitting sections or the light emitting sections in the one-dimensional display device. A magnification projecting system is provided to project the two-dimensional image by magnifying it as it is as an intermediate image. A requirement for high resolution can be coped with by employing the one-dimensional display device as well as a small and less expensive light scanning apparatus and two-dimensional image forming apparatus can be realized thereby.

Abstract: A wide-angle imaging device suitable for a monitor area of about 180 degrees. A first reflection mirror (1) is provided that has, around the rotation center axis (6) of a rotary symmetrical body, a reflection surface having an approximately ±90-degree convex shape with respect to a reference optical axis direction, an image forming lens (2) that has a principal point (7) on the rotation center axis of the first reflection mirror (1) and forms the image of a reflection beam from the first reflection mirror (1) and an imaging element (3) are disposed, and an object within approximately ±90 degrees around the rotation center axis of the first reflection mirror (1) is imaged.

Abstract: A dispersion compensator is formed by an angular dispersion element, a diffracting optical element, and a reflecting mirror. By forming a reflecting surface in free-formed surfaces which are different between Y-Z plane and X-Z plane and shifting a reflecting position on a reflecting surface per wavelengths, dispersion and dispersion slope are compensated by having an optical path length difference per wavelengths.

Abstract: Techniques for utilizing a microscope inspection system capable of inspecting specimens at high throughput rates are described. The inspection system achieves the higher throughput rates by utilizing more than one detector array and a large field of view to scan the surface of the semiconductor wafers. The microscope inspection system also has high magnification capabilities, a high numerical aperture, and a large field of view. By using more than one detector array, more surface area of a wafer can be inspected during each scanning swath across the semiconductor wafers. The microscope inspection system is configured to have a larger field of view so that the multiple detector arrays can be properly utilized. Additionally, special arrangements of reflective and/or refractive surfaces are used in order to fit the detector arrays within the physical constraints of the inspection system.

Abstract: A tilt projection optical system, that performs enlarged projection from the primary image plane on the reduction side to the second image plane on the enlargement side without forming an intermediate real image while being located at an angled position, has, sequentially from the primary image plane side: a refractive lens group including an aperture; a bending mirror that rotates the optical axis for the optical system after said bending mirror by approximately 90 degrees; and an optical group including at least one reflective surface that has a negative power; wherein the construction is such that the radius of the circle that encompasses all the light rays involved in the image formation on the second image plane and that is parallel to the surfaces of each lens of the refracting lens group enlarges once and then converges in terms of its radius on the enlargement side from the aperture of the refracting lens group, and wherein a predetermined condition is met.

Abstract: A reading optical system for projecting a document image on a CCD in an image reading device, providing, sequentially from the document side, a symmetrical lens group rotatable about the optical axis, and a free curved mirror. Reflective surface shape of the free curved mirror is symmetrical in a plane perpendicular to the linear layout direction of the line CCD and includes the intersection of the optical axis of the lens group and the reflective surface of the free curved mirror. The reflective surface shape of the free curved mirror is asymmetrical in a plane parallel to the linear layout direction of the line CCD and includes the normal line (NL) at the intersection. The number of lenses of the lens group structure can be reduced to three lenses while maintaining a high optical performance by using such a free curved mirror.

Abstract: In a wide-angle optical system for a solid image pickup element, an image pickup lens 2 is a biconvex lens, and its surface closer to an image surface is being formed into such an aspherical shape that the positive refractive power is weaker at a location more spaced in a diametrical direction apart from an optical axis.

Abstract: An optical arrangement is disclosed for obtaining information from a sample or an observed object which comprises a light source for illuminating the sample or observed object and a reception device for the light proceeding from the sample or observed object. At least one beam splitter is included having a splitter surface with a transmittive area and a reflective area. Light from the source is directed to the splitter surface, reflected by the reflective area of the splitter surface to a concave mirror, focused by the concave mirror onto the transmittive area and passes through the latter, or the light is focused onto the transmittive area, passes through the latter to a concave mirror, is directed from the concave mirror to the splitter surface and is deflected by the reflective area of the latter. The focusing is influenced by the geometry of the mirror surface of the concave mirror and the distance between the concave mirror and the splitter surface.

Abstract: In an apparatus for positioning an optical element in a structure, particularly in an objective housing of a projection objective for microlithography, the optical element is connected to the structure via fastening elements. The position of the optical element is set by means of adjusting fasteners.

Abstract: A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.

Abstract: A projection optical system, which is telecentric with respect to an object side and an image side, projects a pattern onto an image plane, which is substantially parallel with the pattern, at a substantial equi-magnification. The projecting optical system is provided with first and second condenser lenses having a common (first) optical axis which is perpendicular to the pattern and the image plane. The projection optical system further includes an imaging lens having a second optical axis that intersects with the first optical axis at an intermediate position between the first and second condenser lenses. A first mirror reflects a beam from the pattern and passed through the first condenser lens toward the imaging lens. A second mirror reflects the beam passed through the imaging lens to the imaging lens, and a third mirror reflects the beam passed through the imaging lens toward the second condenser lens.

Abstract: An optical reduction system for use in the photolithographic manufacture of semiconductor devices having one or more quarter-wave plates operating near the long conjugate end. A quarter-wave plate after the reticle provides linearly polarized light at or near the beamsplitter. A quarter-wave plate before the reticle provides circularly polarized or generally unpolarized light at or near the reticle. Additional quarter-wave plates are used to further reduce transmission loss and asymmetries from feature orientation. The optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.25 microns over a 26 mm×5 mm field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine elements of different refracting power to widen the spectral bandwidth which can be achieved.

Abstract: The present invention relates to a lithography apparatus using catadioptric exposure optics that projects high quality images without image flip. The lithography apparatus includes a reticle stage, a wafer stage, and a catadioptric exposure optics located between the reticle stage and the wafer stage. The catadioptric exposure optics projects an image from the reticle stage onto the wafer stage. The projected image has the same image orientation as the image from the reticle stage. In other words, the catadioptric exposure optics does not perform image flip. The reticle stage lies on a first plane and the wafer stage lies on a second plane, where the first plane is orthogonal to the second plane. In another embodiment of the present invention, the catadioptric exposure optics projects an even number of reflections. The projected image is of high precision and lacks aberrations such as perspective warping and obscured areas.

Abstract: A focal-length adjusting unit for photographing apparatuses includes a distance-measuring means for detecting the amount of defocus to an object by using a light beam of the object passing through a photographing optical system; at least two optical elements located in an optical path for distance measurement, deflecting incident light from the object to introduce the light into an image sensor or a distance-measuring sensor; a variable optical-property element constituting at least one of the optical elements, capable of changing the deflection of light in accordance with an applied voltage or an applied current; and a voltage applying means or a current applying means for applying a voltage or a current in accordance with the distance-measuring output of the distance-measuring means. In this case, before a distance measurement is made by the distance-measuring means, the function of light deflection of the variable optical-property element is set to a predetermined value.

Abstract: A subject for the invention is to provide a lens which is lightweight and inexpensive and, despite this, which is large and has a high-precision aspherical reflecting surface reduced in distortion.

Abstract: An oblique projection optical system is compact as compared with the size of the image it presents, offers high imaging performance, produces satisfactorily small distortion, and has a small f-number. The oblique projection optical system is composed of a plurality of powered reflection surfaces, of which the one closest to the projection surface is positively powered and the one second closest thereto is negatively powered. At least one of these two reflection surfaces is a free-form surface, and the one closest to the projection surface has a size larger than half the size of the projection surface.

Abstract: Lengths of both sides of each end plane of a light-intensity distribution uniformizing element receiving a light flux of an F-number of 1 are set to ½ of those of a reflecting surface of a reflection type optical-spatial modulator element, position information of uniformed light fluxes output from the light-intensity distribution uniformizing element is Fourier-transformed into diverging angle information indicated by incident light fluxes output from a first group of lenses, a relay deformed diaphragm intercepts an interference component of each incident light flux, which is expected to interfere with an outgoing light flux, to produce asymmetric light fluxes, the asymmetric light fluxes are incident on the reflection type optical-spatial modulator element, a projection lens deformed diaphragm removes stray light from outgoing light fluxes output from the reflection type optical-spatial modulator element, and an image is displayed according to the outgoing light fluxes.

Abstract: The object of the present invention is to provide a catadioptric imaging system, or the like, which is capable of obtaining a desired image-side NA and an image circle without increasing the size of a reflecting mirror with a smaller number of lenses. This catadioptric imaging system comprises a first imaging optical system and a second imaging optical system, wherein the first imaging optical system is provided with a positive first lens group, an aperture stop, and a positive second lens group in the order from the object side, and the second imaging optical system is provided with a primary mirror comprising a concave first reflecting surface having a first radiation transmitting portion at the center thereof, and a secondary mirror comprising a second reflecting surface having a second radiation transmitting portion at the center thereof.

Abstract: A highly efficient optical device comprises two opposing active non-spherical optical surfaces defined by a two-dimensional representation that is symmetrically extended to provide a three-dimensional device. A focal area, spaced apart from the optical surface and non-contiguous therewith, is defined by the two opposing active optical surfaces. The active optical surfaces each have a continuous second derivative, and the optical surfaces are defined by a polynomial with an order of at least about twenty. The optical device may comprise a transparent dielectric core, and the optical surfaces may be formed on the core. A receiver may be situated at the focal area to provide a concentrator. An extended light source such as an LED may be situated at the focal area, to provide a collimator. Faceted embodiments can provide a low aspect optical device. In some embodiments a diffuser may be used to transform incident radiation into a predetermined shape.

Abstract: Disclosed is a projection optical system capable of ensuring good optical performance virtually without effects of birefringence of fluorite by for example, controlling an angle difference between an optical axis and a predetermined axis of a fluorite lens to a predetermined allowable amount. The projection optical system for forming an image of a first surface (R: reticle) on a second surface (W: wafer) includes at least two light-transmissive crystal members formed of a crystal material belonging to a cubic system. In at least the two light-transmissive crystal members, an angle difference is set at 1° between the optical axis and any one of crystal axes [111], [100] and [110].

Abstract: A photolithographic reduction projection catadioptric objective includes a first optical group G1 including an even number of at least four mirrors M1-M6; and a second at least substantially dioptric optical group G2 imageward than the first optical group G1 including a number of lenses E4-E13. The first optical group G1 provides compensative axial aberrative correction for the second optical group G2 which forms an image with a numerical aperture of at least substantially 0.65, and preferably at least 0.70 or 0.75. Six mirror examples are shown.

Abstract: A projection type image display apparatus having an image display element outputting an image ray, a projection lens apparatus for performing overhead projection of the image ray from the image display element, the projection lens apparatus having a plurality of lens elements, a reflection mirror reflecting the image ray from the projection lens apparatus, and a screen on which the image ray reflected by the reflection mirror is projected. An optical axis of the projection lens apparatus is decentered from a center of the screen.

Abstract: An optical system comprises, in succession from the object side, a first optical element of negative optical power, a second optical element of positive optical power, and a third optical element of negative optical power, at least one of the first to third optical elements being a refracting optical element having a reflecting curved surface.

Abstract: The invention relates to an optical system or apparatus such as a lens system capable of focus control and a variable-focus lens, which has reduced power consumptions, ensures noiseless operation and fast response and contributes to cost reductions for the reason of simplified structure. Specifically, the invention provides an optical apparatus comprising an element 409 having variable optical properties and an image plane 612. To correct the optical apparatus for movement of the image-formation surface of an optical system 614 in association with a change in the element 409 having variable optical properties, the image plane 612 is placed in the range of movement of the image-formation surface in association with the change in the element having variable optical properties.

Abstract: An aspheric reduction objective has a catadioptric partial objective (L1), an intermediate image (IMI) and a refractive partial objective (L2). The catadioptric partial objective has an assembly centered to the optical axis and this assembly includes two mutually facing concave mirrors (M1, M2). The cutouts in the mirrors (B1, B2) lead to an aperture obscuration which can be held to be very small by utilizing lenses close to the mirrors and having a high negative refractive power and aspheric lens surfaces (27, 33). The position of the entry and exit pupils can be corrected with aspherical lens surfaces (12, 48, 53) in the field lens groups. The number of spherical lenses in the refractive partial objective can be reduced with aspherical lens surfaces (66, 78) arranged symmetrically to the diaphragm plane. Neighboring aspheric lens surfaces (172, 173) form additional correction possibilities.

Abstract: A projection optical system projects an enlarged image of a light valve image onto a screen. The system has, from the conjugate enlargement side: a negative front lens unit, optical path turning means (including a reflecting surface), a positive rear lens unit, and projection light preparing means, which can separate illumination and projection light, or can integrate light of different colors, or can do both. Each of the front and rear lens units includes at least one aspherical surface. The front lens unit has a negative first lens element at its conjugate-enlargement end and a negative second lens element at the conjugate reduction side of the first lens element. The rear lens unit includes a positive third lens element made of an anomalous dispersion material. The center of the light valve is not located on the optical axis of the rear lens unit.

Abstract: Light from a pattern of a mask 3 travels through a first imaging optical system K1 to form a primary image I of the mask pattern. Light from the primary image I travels through a center aperture of a main mirror M1 and a lens component L2 to be reflected by a sub-mirror M2, and the light reflected by the sub-mirror M2 travels through the lens component L2 to be reflected by the main mirror M1. The light reflected by the main mirror M1 travels through the lens component L2 and a center aperture of the sub-mirror M2 to form a secondary image of the mask pattern at a reduction ratio on a surface of wafer 9.

Abstract: The invention relates to an optical system that can be operated with low power consumptions, reduced noises and fast responses, is simplified in mechanical structure and of reduced outer diameter and compact size, and is capable of focusing and zooming. This optical system comprises a rotationally symmetric lens group and an optical element having variable optical properties, whereby focusing or zooming can be performed. Focusing or zooming can be performed by use of a plurality of optical elements having variable optical properties, wherein at least one of the optical elements is configured to a free-form surface shape.

Abstract: Disclosed is a diffuse reflector comprising a reflective layer and a transparent polymeric film comprising a plurality of complex lenses on a surface thereof.

Abstract: The invention provides an optical apparatus enabling diopter adjustment, etc. to be achieved using, for instance, a reflection type variable-optical property optical element or a variable-optical property mirror but without recourse to any mechanical moving part. The variable-optical property mirror 9 comprises an aluminum-coated thin film 9a and a plurality of electrodes 9b. Via variable resistors 11 and a power source switch 13 a power source 12 is connected between the thin film 9a and the electrodes 9b, so that the resistance values of the variable resistors 11 can be controlled by an operating unit 14. The shape of the thin film 9a as a reflecting surface is controlled by changing the resistance value of each variable resistor 11 in response to a signal from the operating unit 14 in such a manner that the imaging capability of the variable mirror is optimized.

Abstract: The invention concerns a system for achieving an optical image of an object (136), and/or for achieving optical collimation (137) of light from a light source (130), comprising a concave mirror (131, 134), the surface normal of which forms an angle with the incident light in a beam. A negative lens (132, 133) that co-operates with the concave mirror is arranged in the incident and/or exit beam paths such that an image with eliminated or reduced imaging aberrations is achieved in a focal plane (135), and/or that the exit light from a light source (130) is collimated (137).

Abstract: To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plane. A light beam from an object surface travels through a first converging group to enter a beam splitter, and a light beam reflected by the beam splitter is reflected by a concave, reflective mirror to form an image of patterns on the object surface inside the concave, reflective mirror. A light beam from the image of the patterns passes through the beam splitter and thereafter forms an image of the patterns through a third converging group on an image plane.