Abstract: A mounting device for mounting one or more conductor terminals on an object, wherein the mounting device has one or more mounting points, with at least one securing element being arranged at each mounting point for mechanically securing one or more conductor terminals to said mounting point, the mounting device having at least one sensor device which has at least one sensor for acquiring a physical value of at least one conductor terminal secured to a mounting point.

Abstract: A fluid heating system may be installed for residential and commercial use, and may deliver fluid at consistent high temperatures for cooking, sterilizing tools or utensils, hot beverages and the like, without a limit on the number of consecutive discharges of fluid. The fluid heating system is installed with a tankless fluid heating device that includes an inlet port, an outlet port, at least one heat source connected with the inlet port, and a valve connecting the at least one heat source to the outlet port. A temperature sensor is downstream of the at least one heat source and connected to the valve. Another temperature sensor is on the heat source to enable it to be kept at an elevated temperature. The valve is operated so that an entire volume of a fluid discharge from the fluid heating system is delivered at a user-specified temperature on demand, for every demand.

Abstract: A device for heating a bearing race mounted on a shaft including a quartz halogen lamp for heating the bearing race and a reflector for reflecting heat from the quartz halogen lamp towards the bearing race.

Abstract: Embodiments of the invention generally relate to a support ring to support a substrate in a process chamber. In one embodiment, the support ring comprises an inner ring, an outer ring connecting to an outer perimeter of the inner ring through a flat portion, an edge lip extending radially inwardly from an inner perimeter of the inner ring to form a supporting ledge to support the substrate, and a substrate support formed on a top surface of the edge lip. The substrate support may include multiple projections extending upwardly and perpendicularly from a top surface of the edge lip, or multiple U-shaped clips securable to an edge portion of the edge lip. The substrate support thermally disconnects the substrate from the edge lip to prevent heat loss through the edge lip, resulting in an improved temperature profile across the substrate with a minimum edge temperature gradient.

Abstract: Embodiments of heating lamps and heating lamp assemblies are disclosed herein. In some embodiments, a heating lamp may include a bulb; a reflector circumscribing the bulb proximate a first end of the bulb; a base coupled to the reflector on a side opposite the bulb; a handle coupled to the base on a side opposite the reflector, wherein the handle comprises a body having a first end coupled to the base and an opposing second end; a first conductor extending from the bulb and through the base and the handle in a direction opposite the bulb; and a second conductor extending from the bulb and through the base and the handle in a direction opposite the bulb.

Abstract: Heater covers and methods of using the same are disclosed. The covers can be used on stand-type movable or fixed patio heaters or table top heaters. The covers can be removably attached to the heaters. The covers can have body covers separate or attached to head covers. The covers can be resilient or rigid. The rigid covers can have hinges and can clamshell or telescope around the heaters.

Abstract: A device for heating a bearing race mounted on a shaft including a quartz halogen lamp for heating the bearing race and a reflector for reflecting heat from the quartz halogen lamp towards the bearing race.

Abstract: A heating device for tempering preforms before processing in a stretch blow device. The heating device includes a heating alley with a plurality of infra red emitters, arranged parallel to the longitudinal axis of the tempered preforms. At least one back reflector and/or one filter is assigned to the infra red emitters, whereby the at least one back reflector and/or the at least one filter is segmented.

Abstract: The invention concerns a device for heating an object (6) in an intense magnetic field, comprising:—a light source (1), an optic fibre (2) for transporting the light emitted by said light source (1) and emitting a beam of light in the direction of the object (6) to be heated, a converging optical system (3), a diaphragm (4) positioned at the focusing point of the optical system (3),—a reflector (5), whereof the inner wall is defined by the revolution of a semi-parabola around an axis perpendicular to the optical axis of the parabola and passing through the focal point of said parabola, the optical axis of said reflector (5) coinciding with the optical axis (A) of the optical system (3) and the focal point (F?) of said reflector coinciding with the focusing point of said optical system (3).

Abstract: The invention relates to a vacuum processing system for processing a substrate (2), with an enclosure (1) for carrying the substrate (2) to be treated in a substrate plane (4), whereby the enclosure (1) comprises a first reflecting means (6) and a heating means (5) having a first plane surface (10) and an opposed second plane surface (11), the heating means (5) is configured for irradiating heating energy only via the first surface (10) and/or via the second surface (11), the first reflecting means (6) is configured for reflecting the heating energy irradiated by the heating means (5) onto the substrate plane (4), and the heating means (5) is arranged such that the first surface (10) faces towards the first reflecting means (6) and the second surface (11) faces towards the substrate plane (4).

Abstract: Provided is a bidirectional heating cooker that supplements and improves a function of a conventional infrared radiation cooker, in which the bidirectional heating cooker further includes a lower heating unit that is placed at the lower end of a cooking pan that is heated by radiant heat irradiated by an infrared lamp and that directly heats the cooking pan, to thereby heat the cooking pan quickly by the lower heating unit to thus make the upper and lower portions of food such as meat put on the cooking pan more quickly roasted than the conventional infrared radiation cooker and reduce a burden of electric charges based on a shortened heating time of the cooking pan, and to thereby make it possible to cook food rapidly by an upper heating unit with the infrared lamp and the lower heating unit that is placed on the cooking pan.

Abstract: Apparatus for providing heat energy to a process chamber are provided herein. The apparatus may include a process chamber body of the process chamber, a solid state source array having a plurality of solid state sources, disposed on a first substrate, to provide heat energy to the process chamber to heat a target component disposed in the process chamber body, and at least one reflector disposed on the first substrate proximate to one or more of the plurality of solid state sources to direct heat energy provided by the one or more of the plurality of solid state sources towards the target component.

Abstract: The invention is directed to a liquid heater for rapidly heating a liquid without overheating the liquid. The liquid heater comprises a liquid flow channel having a passage through which liquid flows, a heating part disposed outside the liquid flow channel, a heat reflecting part facing a heat radiating side of the heating part, and a cooling part through which a cooling medium flows adjacent a reverse side of a reflecting surface of the heat reflecting part for cooling the heat reflecting part. Radiant heat not absorbed in the liquid is reflected by the heat reflecting part. The heat reflecting part reflects radiant heat cooled by the cooling part so that the body of the liquid heater and peripheral members are maintained at a temperature not higher than a predetermined temperature to prevent overheating the liquid.

Abstract: A system for heating a patio, the system comprising: a head unit comprising a heating unit configured for heating a patio; an offset assembly, wherein the offset assembly is coupled to the head unit; a mounting pole comprising a plurality of sections, the mounting pole being coupled to the offset assembly; and a base unit the base unit supporting the mounting pole.

Abstract: Methods and apparatus for measuring the melt depth of a substrate during pulsed laser melting are provided. The apparatus can include a heat source, a substrate support with an opening formed therein, and an interferometer positioned to direct coherent radiation toward the toward the substrate support. The method can include positioning the substrate with a first surface in a thermal processing chamber, heating a portion of the first surface with a heat source, directing infrared spectrum radiation at a partially reflective mirror creating control radiation and interference radiation, directing the interference radiation to a melted surface and directing the control radiation to a control surface, and measuring the interference between the reflected radiation. The interference fringe pattern can be used to determine the precise melt depth during the melt process.

Abstract: Apparatus and methods for detecting substrate warping during RTP processing are provided. In one embodiment, one or more beams of light are provided above and across the substrate being processed. In this embodiment, the amount of beam blockage correlates to the amount of substrate warping. In another embodiment, a beam of light is reflected off of a substrate during processing. In this embodiment, the amount of movement of the beam correlates to the amount of substrate warping. In yet another embodiment, a region of a substrate is illuminated during processing. In this embodiment, images of the illuminated region are analyzed to determine the amount of substrate warping.

Abstract: A thermal processing chamber with a dielectric barrier discharge (DBD) lamp assembly and a method for using the same are provided. In one embodiment, a thermal processing chamber includes a chamber body and a dielectric barrier discharge lamp assembly. The dielectric barrier discharge lamp assembly further comprises a first electrode, a second electrode and a dielectric barrier. The dielectric barrier discharge lamp assembly is positioned between the first electrode and the second electrode. The dielectric barrier defines a discharge space between the dielectric barrier and the second electrode. A circuit arrangement is coupled to the first and second electrodes, and is adapted to operate the dielectric barrier discharge lamp assembly.

Abstract: A device and method for locally heat treating at least one airfoil in an integrally bladed rotor device. A pair of IR heat sources are positioned to direct IR heat rays in the direction where local heat treatment is required. A pair of parabolic mirrors are positioned to direct the IR heat rays on to the metal component. The heat treating is useful after welding the airfoil on to the rotor device.

Abstract: A broiler assembly for a cooking appliance, the cooking appliance having an oven cavity and the broiler assembly is disposed within the oven cavity. The broiler assembly includes a reflector having first and second sides, side retainers coupled to a respective one of the first and second sides, and at least one carbon emitter heating element mounted to the side retainers. The at least one carbon emitter heating element includes a carbon filament disposed within a lamp.

Abstract: An infrared, room heater system for installation in a wall or on a floor. An electric fan assembly draws room air into a housing, then through three parallel, air transit channels where the air is heated by infrared radiation within and about a heat exchanger assembly, and then back out into the room. One or more ceramic heating elements attached to a first copper plate emit infrared radiation when electrically energized. The first copper plate lies adjacent to, but spaced away from, a second copper plate such that radiation emitted from the heating elements reflects back and forth between the plates. Room air passed between the copper plates is heated by heat radiation concentrated between the plates, thereby achieving both energy and space efficiency.

Abstract: An apparatus for thermally treating semiconductor substrates has a processing space which is defined by first walls substantially parallel to the semiconductor substrate and a second side wall connected to the first walls; a substrate holding device disposed in the processing space which defines a substrate retaining region for a semiconductor substrate in the processing space; and heating elements which are disposed in the processing space between at least one of the first walls and the substrate retaining region. The thermal gradient between the edge of the semiconductor substrate and the center of the semiconductor substrate can be effectively compensated by providing a shutter between the substrate retaining region and the heating elements which limits the radiation emitted in the processing space by the heating elements in the direction of the substrate retaining region.

Abstract: A reaction chamber including a substrate supporting member positioned within the reaction chamber, the reaction chamber having a first region and a second region, a shield positioned within the second chamber and movable with the substrate supporting member, and wherein the shield is adjacent at least a bottom surface of the substrate supporting member.

Abstract: The present invention provides improved apparatus for ultraviolet (UV) cure of thin films. A central external reflector (CER) reflects UV light at different angles to compensate for non-uniformity of the deposited film on the substrate. The CER is positioned between the UV light source and the substrate and includes an actuator that can change the angle of reflection before and during UV cure.

Abstract: A heater comprising a radiative heating element disposed beneath a housing, in a recess formed therein; the recess having a heat reflective surface for reflecting heat radiation from the radiative heating element in a downwards direction. A heat deflecting member is located between the heating element and the reflective surface of the housing to prevent heat emitted from heating element from directly reaching the reflective surface.

Abstract: A heating device and a heating method for a blow molding machine comprise a heating element for radiating heat radiation for heating of preforms. A bottom reflector is movable relative to a counter reflector and is arranged opposite to the heating element for reflection of heat radiation radiated by the heating element in the direction of the preforms. A setting device is used for setting a position (LA+BM, LB+BM) of the bottom reflector relative to the counter reflector.

Abstract: A device and method for locally heat treating at least one airfoil in an integrally bladed rotor device. A pair of IR heat sources are positioned to direct IR heat rays in the direction where local heat treatment is required. A pair of parabolic mirrors are positioned to direct the IR heat rays on to the metal component. The heat treating is useful after welding the airfoil on to the rotor device.

Abstract: A curing system comprising an oven which may be usefully employed in the fabrication of long polymer columns of various morphologies and formats is described. In accordance with an exemplary arrangement the invention relates to a curing system comprising an oven that allows for the formation of very long capillary columns.

Abstract: An electrical heating apparatus includes a stationary housing having a lower base portion, an upper control portion, and a column portion extending from and rigidly connecting the base and control portions. The base and control portions define first and second parallel and horizontally spaced-apart vertical housing axes, and the control portion includes control circuitry and first and second direction controllers. First and second heating units each include a radiant heating element and a reflector, the heating elements adapted upon energization to radiate heat, and the reflector disposed and adapted to reflect the radiated heat from the heating unit. The heating units each engage the base and control portions of the housing, is engaged by one of the direction controller, and has a pivot axis disposed coaxial with and pivotable about one of the housing axes.

Abstract: A silver reflector for reflecting radiation from a lamp in a semiconductor processing chamber is disclosed. The reflector may be a sleeve to be disposed in a lightpipe or part of a lamphead. The silver may be in the form of a coating on the sleeve or the lamphead.

Abstract: The present invention relates to a lamp assembly comprising a lamp (10) having a lamp vessel (101) with a longitudinal axis (CC). The lamp assembly comprises a support member (11) comprising a bottom surface (111) extending substantially along the longitudinal axis. Between the bottom surface and the lamp vessel, a reflective member (12) is supported by the support member and has a surface comprising a material with a melting temperature higher than 600° C.

Abstract: Annular reflecting rings are removably mounted on the upper and lower sides of a chamber side portion of a chamber. An annular recessed portion is formed sandwiched between the lower end face of the upper reflecting ring and the upper end face of the lower reflecting ring to surround a holding part for holding a semiconductor wafer. The outer peripheral surface of the recessed portion communicates with a transport opening. The formation of the recessed portion prevents the light emitted from halogen lamps and flash lamps from being non-uniformly reflected around the holding part to enter a semiconductor wafer, thus improving the uniformity of the in-plane temperature distribution in the semiconductor wafer during heat treatment.

Abstract: A heating device for tempering preforms before processing in a stretch blow device. The heating device includes a heating alley with a plurality of infra red emitters, arranged parallel to the longitudinal axis of the tempered preforms. At least one back reflector and/or one filter is assigned to the infra red emitters, whereby the at least one back reflector and/or the at least one filter is segmented.

Abstract: The present invention generally relates to methods and apparatus for processing substrates. Embodiments of the invention include apparatuses for processing a substrate comprising a ceramic reflector plate, which may be optically transparent. The reflector plate may include a reflective coating and be part of a reflector plate assembly in which the reflector plate is assembled to a baseplate.

Abstract: The present invention provides a novel high-efficiency infrared ray heating apparatus enabling concentrated heating of infrared rays to achieve high efficiency and seeking to reduce the size and weight to be usable on a desk, thereby achieving power saving. An infrared condensing side rotation reflector is connected to an infrared emission side rotation elliptic reflector. An infrared ray lamp is arranged in a focal position of the infrared emission side rotation elliptic reflector. The infrared emission side rotation elliptic reflector and the infrared condensing side rotation reflector are configured in such a shape that infrared rays reflected by the infrared emission side rotation elliptic reflector and the infrared condensing side rotation reflector are condensed with concentration on a tip small-diameter portion of the infrared condensing side rotation reflector. In some embodiments, a quartz rod focuses this infrared energy from the loop onto a specimen mounting stand.

Abstract: The number of piglets dying at birth is reduced by providing a temperature sensor in a farrowing crate at the piglet area thereof on a movable cover so that, when the sow is expected to give birth, the sensor is located in the crate at a location to detect the presence of one or more piglets after birth. On detection by a control unit using the sensor signal of the one or more piglets, the sensor communicates a signal to a pager carried by an operator indicating to the operator that birth of piglets is in progress and activates a heating lamp for the piglets in the pen to attract them away from the area of the sow to reduce crushing. The control unit and the sensor also control the heat output. The cover can slide along the piglet area and can lift to expose the piglet area.

Abstract: A portable, collapsible radiant heater includes a base and a support mounted to the base. The support has a collapsed position wherein the base is configured to at least partially receive the support, and an extended position wherein the support extends upwardly from the base. A heater-head for generating radiant heat is connected to the support. A reflector is mounted to one of the heater-head and the support. The reflector at least partially surrounds the heater-head for downwardly reflecting radiant heat generated by the heater-head. The reflector and heater-head are reciprocally movable between the collapsed position wherein the reflector and heater-head are in close proximity to the base and the extended position wherein the reflector and heater-head are distant from the base.

Abstract: This invention of process encompasses the use of infrared reflecting materials or coatings, lining any or all surfaces of an enclosure, to reflect and or redirect infrared emitter radiations toward the heating process target(s) and thereby increase rapidity of heat-rise in said process target(s) and/or reduce energy use to obtain or maintain a specified heat-rise in said target(s) of process.

Abstract: A thermal processing chamber with a dielectric barrier discharge (DBD) lamp assembly and a method for using the same are provided. In one embodiment, a thermal processing chamber includes a chamber body and a dielectric barrier discharge lamp assembly. The dielectric barrier discharge lamp assembly further comprises a first electrode, a second electrode and a dielectric barrier. The dielectric barrier discharge lamp assembly is positioned between the first electrode and the second electrode. The dielectric barrier defines a discharge space between the dielectric barrier and the second electrode. A circuit arrangement is coupled to the first and second electrodes, and is adapted to operate the dielectric barrier discharge lamp assembly.

Abstract: A broiler assembly for a cooking appliance, the cooking appliance having an oven cavity and the broiler assembly is disposed within the oven cavity. The broiler assembly includes a reflector having first and second sides, side retainers coupled to a respective one of the first and second sides, and at least one carbon emitter heating element mounted to the side retainers. The at least one carbon emitter heating element includes a carbon filament disposed within a lamp.

Abstract: High reflectance element IR lamp module and method of firing multi-zone IR furnaces for solar cell processing comprising lamps disposed backed by a flat or configured plate of ultra-high reflectance ceramic material. Optionally, the high reflectance plate can be configured with ripples or grooves to isolate each lamp from adjacent lamps in the process zone. Furnace cooling air is exhausted and recycled upstream for energy conservation. Lamp spacing can be varied and power to each lamp individually controlled to provide infinite control of temperature profile in each heating zone. The high reflectance element may be constructed of dense ceramic fiber board, and then coated with high reflectance ceramic composition, and baked or fired to form the finished element.

Abstract: A cooker and a controlling method for the same are provided. A carbon heater has a wavelength bandwidth of 1.5˜2.5 ?m where a radiant energy is maximum, and the carbon heater provides the radiant energy into a cavity in order to heat food disposed therein.

Abstract: The present invention relates to a cooker. In the present invention, a carbon heater is used to cook foods in a cooking chamber and electric current applied to the carbon heater is controlled by a switching element, such that an effective wavelength range and an available temperature range of energy generated from the carbon heater is adjusted. Therefore, according to the present invention, it is possible more efficiently cook foods, using the carbon heater.

Abstract: In a substrate annealing apparatus, a substrate holder unit including a substrate stage made of carbon with a high emissivity or a material coated with carbon is accommodated in a vacuum chamber to be liftable. Also, a heating unit having a heat radiating surface facing the substrate stage is disposed above the substrate holder unit within the vacuum chamber. The substrate annealing apparatus brings the substrate stage close to the heat radiating surface so that a substrate mounted on the substrate stage can be heated by radiant heat from the heat radiating surface while the heat radiating surface is not in contact with the substrate. The substrate holder unit includes a radiating plate and a reflecting plate made of one of a metal carbide, a metal nitride, and a nickel alloy.

Abstract: A substrate processing apparatus includes a process chamber including upper and lower quartz walls, a substrate support disposed in the process chamber, radiant heaters respectively provided above and below the quartz walls of the chamber, and heat reflectors disposed outside the process chamber for reflecting heat towards the substrate support. Each of the heat reflectors has heating has a first thermally reflective section oriented to reflect the heat towards an outer peripheral region of the substrate support and a second thermally reflective section oriented to reflect the heat towards a central region of the substrate support. Each heat reflector also has a reflection angle adjusting mechanism by which an angle at which the second thermally reflective section reflects heat can be adjusted. The angle is adjusted depending on the temperature distribution across the substrate so that the substrate can be processed uniformly.

Abstract: The invention thus relates to a radiation module incorporating a support, at least one heating and/or heat conducting element and a temperature exchanging element made by extrusion and constituted by a single-piece base with an internal face incorporating at least one means to integrate the heating and/or heat conducting element and an external face incorporating radiation fins wherein the module incorporate a diffuser receiving infrared radiation from the temperature exchanging element, said diffuser enabling infrared radiation to be emitted of a wavelength that is less than that of the radiation received.

Abstract: An apparatus for decorating includes a kiln provided with a heating chamber for receiving the objects and a carriage for transferring the objects from a more distant position from the chamber to a position nearer to the chamber. The carriage includes a resting arrangement for restingly receiving the objects and configured to serve as a bottom of the heating chamber in the nearer position.

Abstract: An auxiliary heater for motor vehicles includes an open housing accommodating a layered structure which includes at least one radiator element and at least one heat-emitting element having at least one PTC heating element, and further accommodating at least one spring element pretensioning the layered structure, a plurality of contacts being held in said housing in an insulating manner and electrically connected to the at least one PTC heating element. The layered structure is pretensioned by a displacer which is inserted into a lower housing component when the elements of the layered structure have been inserted in the lower housing component in a tension-free manner. The displacer is inserted into the lower housing component in a direction approximately perpendicular to the plane of the layered structure and, in the mounted position, it is secured in position relative to said lower housing component.

Abstract: Apparatus and methods for thermally processing a substrate are provided. A chamber containing a levitating support assembly configured to position the substrate at different distances from a plate during the heating and cooling of a substrate. In one embodiment a plurality of openings on the surface of the plate are configured to evenly distribute gas across a radial surface of the substrate. The distribution of gas may couple radiant energy not reflected back to the substrate during thermal processing with an absorptive region of the plate to begin the cooling of the substrate. The method and apparatus provided within allows for a controllable and effective means for thermally processing a substrate rapidly.

Abstract: A heater comprising a radiative heating element disposed beneath a housing, in a recess formed therein; the recess having a heat reflective surface for reflecting heat radiation from the radiative heating element in a downwards direction. A heat deflecting member is located between the heating element and the reflective surface of the housing to prevent heat emitted from heating element from directly reaching the reflective surface.

Abstract: Annular reflecting rings are removably mounted on the upper and lower sides of a chamber side portion of a chamber. An annular recessed portion is formed sandwiched between the lower end face of the upper reflecting ring and the upper end face of the lower reflecting ring to surround a holding part for holding a semiconductor wafer. The outer peripheral surface of the recessed portion communicates with a transport opening. The formation of the recessed portion prevents the light emitted from halogen lamps and flash lamps from being non-uniformly reflected around the holding part to enter a semiconductor wafer, thus improving the uniformity of the in-plane temperature distribution in the semiconductor wafer during heat treatment.