Abstract: A system for managing the entry of a wafer carrier into a stocker in a semiconductor manufacturing operation is disclosed. The system comprises a stocker that accepts wafer carriers via one or more input ports. The present invention provides a means for detecting the presence of a wafer carrier at the input port, means for identifying the type of the wafer carrier, and means for executing an action sequence if the stocker is not compatible with those wafer carriers. Upon detecting an erroneous condition, an action sequence is executed which may include prevention entry of the wafer carrier, and notifying an operator.

Abstract: A transport system having multilayer tracks is presented. The system has a bottom track and at least one top track disposed above on the bottom track. Shuttle carriages are moving along the top and bottom tracks. The shuttle body of each shuttle carriage has a first locking portion on the top end thereof, and has a second locking portion on the bottom end thereof. The second locking portion of the shuttle carriage on the top track can be locked with the first locking portion of the shuttle carriage on the bottom track. Therefore, the two transports on different tracks are locked so that the object can be transported between the top and bottom tracks.

Abstract: After a cassette is mounted on a cassette mounting part, a control unit instructs a substrate treatment apparatus to start treatment on substrates in the cassette. Thereafter, the control unit indicates, to the substrate treatment apparatus, a cassette on the cassette mounting part to which a substrate is transferred at completion of the treatment. If the transfer destination cassette for the substrate at the completion of treatment has not been indicated when a number of remaining treatment steps for the substrate reaches a predetermined set number, an alarm is given from the substrate treatment apparatus. This alarm is sent from the substrate treatment apparatus to the control unit, and the control unit indicates a transfer destination cassette for the substrate.

Abstract: A substrate transfer method for transferring target substrates proceeds in a substrate processing system for performing processes including a photolithography sequence on the target substrates. The system includes a first automated substrate transfer line configured to transfer the target substrates among a plurality of process sections for respectively performing processes on the target substrates, and a second automated substrate transfer line of a cyclical type dedicated to a plurality of process apparatuses of a photolithography process section, which are configured to perform a series of processes in the photolithography sequence, the second automated substrate transfer line being located relative to the first automated substrate transfer line so as for the target substrates to be transferred therebetween.

Abstract: A substrate processing apparatus includes a main load unit, a buffer load unit, and a transfer unit. Containers each accommodating substrates are placed on the main load unit and the buffer load unit. The buffer load unit is disposed above the main load unit and movable into and outward from a process module. Therefore, more containers can be placed in the substrate processing apparatus without increasing the footprint of the substrate processing apparatus, and thus it is possible to reduce equipment idle time during which standby substrates wait before being processed, thereby improving productivity.

Abstract: An article storage facility includes a storage rack that includes a plurality of storage units that store articles; a first article transport that includes a first vertically movable body guided by a first vertical guide and a first transit body configured to move along a path defined along the storage rack, the first vertical guide being provided in the first article transport so as to be positioned on one side of a lateral direction of the path; and a second article transport that includes a second vertically movable body guided by a second vertical guide and a second transit body configured to move along the path, the second vertical guide being provided in the second article transport so as to be positioned on the other lateral side of the path. The first transit body and the second transit body are configured so as to be able to pass each other.

Abstract: A substrate processing apparatus is provided. The apparatus has a casing, a low port interface and a carrier holding station. The casing has processing devices within for processing substrates. The load port interface is connected to the casing for loading substrates into the processing device. The carrier holding station is connected to the casing. The carrier holding station is adapted for holding at least one substrate transport carrier so the at least one substrate transport carrier is capable of being coupled to the load port interface without lifting the at least one substrate transport carrier off the carrier holding station. The carrier holding station is arranged to provide a substantially simultaneous swap section for substantially simultaneous replacement of the substrate transport carrier from the carrier holding station.

Abstract: A method for replacing plural substrates to be processed by a substrate processing apparatus which includes a substrate processing chamber, a load lock chamber, and a conveying apparatus including first and second conveying members for conveying the plural substrates into and out from the substrate processing chamber and the load lock chamber. The method includes the steps of a) conveying a first substrate out from the substrate processing chamber with the first conveying member, b) conveying a second substrate into the substrate processing chamber with the second conveying member, c) conveying the second substrate out from the load lock chamber with the second conveying member, and d) conveying the first substrate into the load lock chamber with the first conveying member. The steps c) and d) are performed between step a) and step b).

Abstract: A system and method for the safe storage of items wherein a storage structure is provided having a first section in which storage units are stored in vertically oriented cells with each storage unit being stacked one upon another and wherein at least one transfer vehicle is provided for selectively engaging and conveying the storage units along an overhead grid track system between the first section and a second section wherein the at least one transfer vehicle may be used to either lift or lower a storage unit and move the storage unit to and from a storage position in one of the vertical storage cells of the first section of the storage structure.

Abstract: A storage (10) unloads and loads a load (3) with a transporting carriage (2). The storage is provided with a port capable of transferring said load from or to said transporting carriage; a plurality of rack portions (15) capable of accommodating or putting said load thereon; a driving device (19) capable of moving said load between said port and said plurality of rack portions, and mutually between said plurality of rack portions; and a controlling device (20) for controlling said driving device to (i) firstly move said load to an temporary rack portion for unloading, which is one of said plurality of rack portions, and (ii), after once accommodating or putting said load on said temporary rack portion, move said load to said port from said temporary rack portion, in case of moving said load from said plurality of rack portions to said port.

Abstract: To ensure that an abnormality in a closed state of a FOUP door serving as a lid of a FOUP can be detected quickly and reliably, a FOUP opener includes a port door attached detachably to an opening window in a port plate for separating the interior and exterior of a semiconductor processing device, and a dock unit for positioning the FOUP in a FOUP door attachment/detachment position. A suction disc mechanism and a lock mechanism for fixing the FOUP door to a FOUP main body and releasing the FOUP door are disposed on the port door. A FOUP door detection sensor for determining whether or not the FOUP door fixed to the FOUP main body, which is positioned in the FOUP door attachment/detachment position on the dock unit, is attached correctly to an opening portion of the FOUP main body is disposed on the port plate.

Abstract: The invention relates to a device for storing platelike substrates, particularly wafers or test wafers, like those, in particular, used for manufacturing electronic components. The aim of the invention is to make a reliable access to the substrates possible even when storage elements, which can be separated from one another, of the device are affected by manufacturing mistakes. For such a device that, for each substrate, has a number of storage elements, which follow one another in a direction of stacking and which can move relative to one another, in which the storage elements have a stacking area, which is provided for placing the respective storage element inside a stack of storage elements, compensating means are therefore provided in order to compensate for stacking errors in the direction of stacking.

Abstract: A substrate processing apparatus includes a processing chamber configured to process a substrate, a substrate support member provided within the processing chamber to support the substrate, a microwave generator provided outside the processing chamber, a waveguide launch port configured to supply a microwave generated by the microwave generator into the processing chamber, wherein the central position of the waveguide launch port is deviated from the central position of the substrate supported on the substrate support member and the waveguide launch port faces a portion of a front surface of the substrate supported on the substrate support member, and a control unit configured to change a relative position of the substrate support member in a horizontal direction with respect to the waveguide launch port.

Abstract: A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.

Abstract: A substrate processing apparatus having a station for loading and unloading substrates from the apparatus, includes an aperture closure for sealing a loading and unloading aperture of the station, a fluidic magazine door drive for removing a door of a substrate magazine and thus opening the substrate magazine and for operating the aperture closure to open the aperture, and sensor for mapping vertical locations of substrates mounted to the magazine door of the drive. The fluidic magazine door drive may include an encoder different from the sensor, the encoder being configured for determining the vertical location of the sensor.

Abstract: A coating/developing device includes a processing block having a plurality of coating unit blocks stacked and a developing unit block stacked on the coating unit blocks. Each of the unit blocks is provided with a liquid processing unit for coating a liquid chemical on a substrate, a heating unit for heating the substrate, a cooling unit for cooling the substrate and a transfer unit for transferring the substrate between the units. The liquid processing unit is provided with a coating unit for coating a resist liquid on the substrate, a first bottom antireflection coating (BARC) forming unit for coating a liquid chemical for a BARC on the substrate before the resist liquid is coated thereon, and a second BARC forming unit for coating a liquid chemical for the BARC on the substrate after the resist liquid is coated thereon.

Abstract: An inner wall surrounding an inner space for vertically circulating a rack, and an outer wall surrounding the inner wall are provided. Then, a rack is disposed in the inner space. A pair of extensions are provided at diagonal positions of the rack. The extensions are attached to an endless drive member in a manner that the extensions protrude toward an outer space between the inner wall and the outer wall through slits of the inner wall, and, a drive mechanism for a drive member is provided in the outer space. Further, a tunnel passing through the outer space to connect the inner space and an area outside of the vertical carousel is provided for transportation of an article into, and out of the tunnel.

Abstract: Methods and systems are provided. The invention includes performing a handshake directly between a load port associated with process equipment and material handling equipment; and transferring a carrier between the material handling equipment and the load port based on the handshake. Numerous other aspects are provided.

Abstract: An article transport facility includes an article transporting mobile body configured to move along a path and having an article holder; an article support for storing an article, the article support is configured to be moved between an article transfer position and an article storage position; a lock device provided on the article support to be switchable between a locking state for locking the article support in the article storage position, and an unlocking position for releasing the locking state; and an operating device provided on the mobile body for moving the article support and switching the lock device.

Abstract: An OHT conveyer vehicle places a FOUP on first and second on platforms. A third platform can move to a position overlapping with the first and second platform by a moving device, and then to a position at which an upper surface of the third platform is above upper surfaces of the first and second platforms by an elevation device. Therefore, the FOUP is placed on the third platform. Subsequently, the third platform can move to a position overlapping with fourth and fifth platforms by the moving device, and then to a position at which the third platform is lower than the fourth and fifth platforms by the elevation device. Therefore, the FOUP is placed on the fourth and fifth platforms.

Abstract: A loader is provided, which is disposed in a low cleanliness room along a border between the low cleanliness room and a high cleanliness room, for transporting a dust free article between an inside of a container receiving the dust free article and the high cleanliness room, comprising a movable stage for mounting the container; an opening portion through which the dust free article is transported between the container and the high cleanliness room; a door for opening and closing the opening portion; a unifying means for unifying a cover of the container and the door when the container approaches the door; and a driving apparatus for moving the cover and the door unified within the loader to open and close the opening portion and the container.

Abstract: A high-efficiency buffer stocker is disclosed. The buffer stocker includes an overhead transport track for supporting overhead transport vehicles carrying wafer containers and at least one conveyor system or conveyor belt provided beneath the overhead transport track for receiving the wafer containers from the overhead transport vehicles on the overhead transport track. The buffer stocker is capable of absorbing the excessive flow of wafer containers between a processing tool and a stocker, for example, to facilitate the orderly and efficient flow of wafers between sequential process tools in a semiconductor fabrication facility, for example.

Abstract: An apparatus for semiconductor wafer transfer comprises a first region for placement of a pod, a second region for placement of a cassette, an unloading mechanism, and a transferring mechanism for transferring wafers in the unloaded pod to the cassette horizontally. In an embodiment, the pod is unloaded by lifting the housing of the pod, and preferably the apparatus for movement of semiconductor wafers further comprises a carrying mechanism for moving the cassette toward the pod, so that the cassette can be closer to the pod for smoothing wafer transfer.

Abstract: A method for pressurizing a substrate carrier including pressurizing a chamber that is of unitary construction with the carrier and/or a substrate cassette within the carrier and maintaining a pressure within the carrier by releasing gas from the chamber into the carrier.

Abstract: A sorter for handling and sorting semiconductor wafers is provided. The sorter has a housing, a handling and transport device and at least one nonproduction wafer buffer module. The housing has at least one holding area for interfacing one or more semiconductor wafer carriers to the housing. The housing defines an access path along which semiconductor wafers are transported between the housing and the one or more semiconductor wafer carriers. The handling and transport device is connected to the housing for transporting semiconductor wafers along the access path. The at least one nonproduction wafer buffer module is connected to the housing. The at least one nonproduction wafer buffer module buffers nonproduction wafers sorted by the sorter to one or more semiconductor wafer carriers.

Abstract: The invention relates to methods and apparatus in which a plurality of ALD reactors are placed in a pattern in relation to each other, each ALD reactor being configured to receive a batch of substrates for ALD processing, and each ALD reactor comprising a reaction chamber accessible from the top. A plurality of loading sequences is performed with a loading robot. Each loading sequence comprises picking up a substrate holder carrying a batch of substrates in a storage area or shelf, and moving said substrate holder with said batch of substrates into the reaction chamber of the ALD reactor in question.

Abstract: A substrate processing apparatus is equipped with a processing furnace for processing wafers, a loading port which is used for carrying a pod containing substrates into and out of a case, a pod transport mechanism for transporting the container at least from the entrance and exit place, and a top storage which is disposed above the processing furnace in such a manner that at least part of the top storage overlaps with the processing furnace in the direction of gravity.

Abstract: In accordance with an exemplary embodiment a semiconductor workpiece processing system having at least one processing tool for processing semiconductor workpieces, a container for holding at least one semiconductor workpiece therein for transport to and from the at least one processing tool and a first transport section elongated and defining a travel direction. The first transport section has parts, that interface the container, supporting and transporting the container along the travel direction to and from the at least one processing tool. The container is in substantially continuous transport at a substantially constant rate in the travel direction, when supported by the first transport section. A second transport section is connected to the at least one process tool for transporting the container to and from the at least one processing tool.

Abstract: A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.

Abstract: A method and system for aligning robotic wafer transfer systems provides a wafer cassette having one or more wafer slots having portions covered with an electrically conductive material and a sensor that is in electrical communication with the electrically conductive material. When a wafer is loaded into a wafer cassette such as may be contained within a wafer transfer module such as a FOUP, an indication of position is delivered to the sensor which detects the alignment and indicates if the loaded wafer undesirably contacts either or both of the opposed grooves that form the wafer slot of the wafer cassette. An indication of the wafer's position may be provided from the sensor to a controller that delivers a signal for aligning the wafer transfer blade of the wafer transfer robot responsive to the signal indicative of position.

Abstract: The invention controls a carrier moving and mounting device such that at normal time, the device moves and mounts carriers in sequence to a delivery mounting units according to a carry-in order, and when a priority carrier is carried into the carry-in mounting unit and if all of the delivery mounting units are occupied by the carriers, the device moves and mounts one of the carriers on the retreat mounting unit, and mounts the priority carrier on the delivery mounting unit which has become vacant by the movement; and controls a delivery device such that at normal time, the delivery device carries the substrates out of the carriers according to the carry-in order of the carriers mounted on the delivery mounting units, and when the priority carrier is mounted, the delivery device carries out the substrates in the priority carrier before the substrates in the other carriers.

Abstract: An overhead shuttle is controlled to support a bottom of an article while traveling. A transfer apparatus is controlled to hold the article from above the article, move the article between a position above the overhead shuttle and a position above stations provided on a side of a travel rail, and elevate and lower the article to transfer the article between the transfer apparatus and the station.

Abstract: Systems, tools, and methods are provided in which a first signal is transmitted from a tool to a Fab indicating that all substrates to be processed have been removed from a specific carrier and that the specific carrier may be temporarily unloaded from a loadport of the tool. A second signal is transmitted from the tool to the Fab indicating that the specific carrier may be returned to the tool. While the carrier is unloaded from the tool, other carriers may be loaded on the vacated loadport. Numerous other features and aspects of the invention are disclosed.

Abstract: A vertical heat treatment apparatus includes: at least one loading and unloading part 3 and 4 for loading and unloading a carrying container 2 containing a plurality of process objects W into and from said vertical heat treatment apparatus; a first storage part 5 that stores a plurality of carrying containers loaded into said vertical heat treatment apparatus via the loading and unloading part; a heat treatment furnace 7 that accommodates a holder 6 holding a plurality of process objects at multiple levels to perform a predetermined heat treatment to the process objects; and a transfer 8 part that supports thereon a carrying container for transferring process objects between the holder and the carrying container, wherein an upper loading and unloading part 3 and a lower loading and unloading part 4 are provided as said at least one loading and unloading part, and a second storage part 20 that stores a carrying container is disposed between the upper and lower loading and unloading parts.

Abstract: An article storage facility includes a storage rack that includes a plurality of storage units that store articles; a first article transport that includes a first vertically movable body guided by a first vertical guide and a first transit body configured to move along a path defined along the storage rack, the first vertical guide being provided in the first article transport so as to be positioned on one side of a lateral direction of the path; and a second article transport that includes a second vertically movable body guided by a second vertical guide and a second transit body configured to move along the path, the second vertical guide being provided in the second article transport so as to be positioned on the other lateral side of the path. The first transit body and the second transit body are configured so as to be able to pass each other.

Abstract: An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.

Abstract: A purging station with a substrate container receiving zone having at least one upwardly extending purging nozzle. The nozzle has a circular engaging lip. The substrate container has support means for at least one substrate and a purge port assembly that includes an externally facing sealing flange facing downward from the container. The sealing flange has a central aperture and a cantilevered flange portion that engages with the circular engaging lip of the nozzle. The weight of the substrate container on the nozzle carried by the canilevered portion of the flange causes bending of the flange for a resilient soft seal.

Abstract: A substrate-treating apparatus includes: a plurality of modules disposed along a first direction, each of the plurality of modules having an inner space for containing a substrate; a transfer unit transferring the substrate among the plurality of modules, the transfer unit including at least one track disposed along the first direction and at least one movable transfer chamber moving along the at least one track; and a gate valve fixed to each of the plurality of modules and combined with the at least one movable transfer chamber. The at least one movable transfer chamber is isolated from an exterior atmosphere while moving.

Abstract: A container changing system able to prevent deterioration in the working rate of substrate processing apparatuses and deterioration in the amount of production of semiconductor devices. A second mounting portion is arranged between a carrier of a container conveying unit and a first mounting portion of a substrate processing apparatus with respect to a lifting direction of a container. The second mounting portion is configured to freely advance and withdraw to/from a lifting path of the container. A container lifting unit is arranged between the carrier and the second mounting portion with respect to the lifting direction.

Abstract: Methods, systems and apparatus for swapping pods within a semiconductor processing tool during a substrate processing cycle. A dirty pod carrying a substrate in need of processing is provided within the processing tool, and the substrate is transferred into a processing chamber thereof. At least one clean pod is also provided within the processing tool. Upon substrate processing completion, the processed substrate is transferred from the chamber directly into a clean pod within the processing tool. Wherein a plurality of substrates are processed within the chamber, a plurality of clean pods may be provided within the tool whereby the plurality of substrates are transferred into a single clean pod or split into subsets that are transferred into different clean pods within the processing tool. The clean pod(s) carrying the processed substrate(s) are then transferred to other tool(s) for continued semiconductor fabrication processing.

Abstract: An article transport facility includes an article carrier movable along a track, and an article rack arranged along the track. Each article rack has a fixed frame, and a movable frame supported to be movable relative to said fixed frame between an extended position projecting toward the track and a retracted position retracted away from the track. A movable guide shiftably supports and guides the movable frame to be movable relative thereto in a shifting direction. A fixed guide is mounted on the fixed frame for supporting and guiding the movable guide to be movable in the shifting direction.

Abstract: Scalable storage can be achieved with linear array storage of wafers, comprising two linear arrays of storage compartments on opposite walls, with a middle transfer mechanism. Together with a buffer station for automatic material handling system, a scalable bare wafer stocker can provide flexible and uninterrupted services to a fabrication facility.

Abstract: By providing an overhead buffer system between an automatic transport system and a load port assembly of a process tool, the efficiency of the respective load ports may be significantly enhanced, for instance, by reducing the idle time of empty carriers, thereby providing the potential for covering a wider range of operational scenarios compared to conventional strategies. For instance, for the same number of load ports, the overhead buffer system may provide a continuous operation, even if small lot sizes are used. The buffer system may comprise a dedicated transport mechanism for directly serving the load ports and respective buffer places, while respective transfer places may provide direct interaction with the automated transport system.

Abstract: A substrate treatment apparatus is disclosed. The substrate treatment apparatus includes: a cassette loading portion on which a cassette for containing a substrate is loaded when the cassette is carried to/from outside of the substrate treatment apparatus; a substrate treatment portion for performing a treatment on the substrate; a substrate carrying portion for carrying the substrate in the cassette loaded on the cassette loading portion to the substrate treatment portion, and carrying the substrate that has been subjected to the treatment by the substrate treatment portion to the cassette on the cassette loading portion; a vacant cassette loading portion on which the cassette caused to be vacant by carrying the substrate to the substrate treatment portion is temporarily loaded; and a vacant cassette transfer mechanism for transferring the vacant cassette between the vacant cassette loading portion and the cassette loading portion.

Abstract: An apparatus for manufacturing a liquid crystal display device is disclosed. A first robot arm at a loading side of the thru-conveyor receives a substrate coated with photoresist and conveys the substrate to a thru-conveyor. A softbake hot plate (SHP) at the unloading side of the thru-conveyor removes solvent from the substrate. A cool plate lowers the substrate temperature from which the solvent is removed. A buffer temporarily stores the substrate having the lowered temperature. A second robot arm between the thru-conveyor, the SHP, the cool plate and a loading side of the buffer, loads/unloads the substrate. A temperature control unit adjusts the substrate temperature unloaded from the buffer. A third robot arm between the unloading side of the buffer, the temperature control unit and an exposure unit that exposes the substrate, loads/unloads the substrate.

Abstract: A system for reading substrate carriers that includes at least one overhead transport vehicle (OHT) utilizing at least one device for at least one of sensing and/or reading a substrate carrier, and/or wafers arranged therein, when the substrate carrier is proximate the at least one overhead transport vehicle. A method of sensing or reading a substrate carrier includes sensing and/or reading a substrate carrier and/or wafers arranged therein with the overhead transport vehicle.

Abstract: A work handling apparatus includes a pair of traveling guides (20, 20?) provided so as to extend in a front-and-rear direction X at right and left sides, and a pair of direct-acting arms (30, 30?) provided so as to travel independently on the pair of traveling guides. The direct-acting arms are extendable from contracted positions, at which the arms oppose each other and avoid mutual interference in a right-and-left direction Y, to extended positions at which the arms overlap with each other. An operation spot (41) is arranged in an operation area (40) sandwiched between the pair of traveling guides for performing a predetermined operation to a work. Also, work tools (60, 60?) are attached to the pair of direct-acting arms (30, 30?), respectively, for transferring the work between a work storage area (50) and the operation spot (41) or performing an operation after transfer.

Abstract: A waffle pack device including a member having recesses in a surface of the member to accommodate die from at least one semiconductor wafer. The member is compatible with semiconductor wafer handling equipment and/or semiconductor wafer processing. Preferably, the member accommodates at least a majority of die from a semiconductor wafer. Further, one semiconductor device assembly method is provided which removes die from a singular waffle pack device, places die from the single waffle pack device on a semiconductor package to assemble from the placed die all die components required for an integrated circuit, and electrically interconnects the placed die in the semiconductor package to form the integrated circuit.

Abstract: Disclosed herein is a coating and developing apparatus 1 whose decreases in substrate-conveying accuracy can be suppressed. A processing block S2 of the coating and developing apparatus 1 includes multiple resist-film forming blocks G2, G3, and a developing block G1. A conveyance element 12 for substrate loading into the processing block S2 is provided to convey substrates W from a carrier C to the resist-film forming blocks G2, G3. Also, a conveyance element I for substrate loading into an exposure apparatus S4 is provided in an interface block S3 to load the substrates W into the exposure apparatus S4 and after unloading the substrates W from the exposure apparatus S4, convey the substrates W to the developing block G1.

Abstract: A substrate processing equipment comprises two pod supporting stages and two independently operable pod door openers. Each pod supporting stage is capable of placing thereon a pod for containing substrates therein. Each pod door openers having means for permitting access to the substrates inside the pod placed on a corresponding pod supporting stage.