Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.

Abstract: Provided is a heat generating component of which volume resistivity hardly varies even if used repeatedly at a high temperature for a long period of time. Since a thin coating heater part (13) formed on a substrate part (12) is composed of a thermal sprayed coating containing TixOy (wherein, 0<y/x<2.0 is satisfied), obtained is a heat generating component (11) having volume resistivity which is suitable for a heater and hardly varies even if prescribed temperature change and temperature keeping are repeated.

Abstract: The present disclosure provides a glass assembly, a manufacturing method thereof and a glass window. The glass assembly includes: a first glass plate and a second glass plate disposed opposite to each other, wherein inert gas is filled between the first glass plate and the second glass plate; a first electrode and a second electrode disposed between the first glass plate and the second glass plate, the inert gas is transformed into plasma in the case where an electric field is generated using the first electrode and the second electrode.

Abstract: The present invention relates to a metal-doped tin oxide which has a BET surface area of at least 30 m 2/g, and comprises at least one metal dopant which is Sb, Nb, Ta, Bi, W, or In, or any mixture thereof, wherein the metal dopant is present in an amount of from 2.5 at % to 25 at %, based on the total amount of tin and metal dopant atoms, and is in a mixed valence state containing atoms of oxidation state OS1 and atoms of oxidation state OS2, wherein the oxidation state OS1 is >0 and the oxidation state OS2 is >OS1 and the atomic ratio of the atoms of OS2 to the atoms of OS1 is from 1.5 to 12.0.

Abstract: A solid-state thermochromic device and method for producing the device, the device including: a stack successively including, from a rear face to a front face exposed to solar radiation: a) a solid substrate of an inorganic material resistant up to a temperature of 550° C.; b) an infrared-reflective layer of an electronically conductive material; c) electronically insulating interface layers; d) an electronically insulating inorganic dielectric layer transparent to infrared radiation, of cerium oxide CeO2, with a thickness between 400 and 900 nm; e) electronically insulating interface layers; f) a layer of an infrared-active thermochromic material, an n-doped VO2 vanadium oxide, and crystallized in a monoclinic or rutile phase, with a thickness between 30 and 50 nm; and g) a solar-protective coating, transparent to infrared radiation.

Abstract: A method for treating a silicon substrate, and a silicon substrate, provide a surface treated with an accelerated neutral beam.

Abstract: The invention relates in an embodiment to a glass substrate with increased weathering and chemical resistance where a surface bears a SiOxCy coating wherein the O/Si atomic ratio is comprised between 1.75 and 1.95 and the SiOxCy coating thickness is comprised between 10 nm and 80 nm. Other embodiments relate to glazings having a glass substrate where a surface bears a SiOxCy coating wherein the O/Si atomic ratio is comprised between 1.2 and 1.95 and the SiOxCy coating thickness is comprised between 10 nm and 80 nm.

Abstract: Systems and techniques for depositing organic material on a substrate are provided, in which one or more shield gas flows prevents contamination of the substrate by the chamber ambient. Thus, multiple layers of the same or different materials may be deposited in a single deposition chamber, without the need for movement between different deposition chambers, and with reduced chance of cross-contamination between layers.

Abstract: A method of preparing light transmitting conducting metal oxide (TCO) films using atomic layer deposition (ALD) of a metal precursor multiple oxidizing reactants. The multiple metal oxidizing reactants may be selected to enhance growth of the TCO film. In a particular embodiment, an indium oxide TCO film is prepared using a cyclopentadienyl indium precursor and a combination of water and oxygen.

Abstract: A single layered smart window may include a substrate; and a single layered coating formed on the substrate, wherein the coating includes a composite of a vanadium oxide and a low reflective material. The single layered smart window has high visible light transmittance and is capable of blocking infrared ray as a temperature is increased.

Abstract: Apparatus for coating a substrate with a material in a chamber subject, during use, to substantial evacuation, which includes a coating station within the chamber for coating a substrate by sputtering and/or by evaporation; at least one treating station disposed in serial with the coating station and equipped with a plasma treater incorporating a plasma generator in sufficient proximity to the substrate to treat the substrate; a magnetic device for generating a magnetic field; at least one cylindrical electrode surrounding the magnetic device, the plasma treater incorporates a device for rotating the electrode about its longitudinal axis.

Abstract: Methods of fabricating solar cells with tunnel dielectric layers are described. Solar cells with tunnel dielectric layers are also described.

Abstract: A method for the production of a transparent conductor deposit on a substrate, the method comprising: providing a substrate formed from a first material; depositing a film of a second material on the substrate; causing the film to crack so as to provide a plurality of recesses; depositing a conductive material in the recesses; and removing the film from the substrate so as to yield a transparent conductive deposit on the substrate.

Abstract: A hybrid transparent conductive film, and methods for fabricating such hybrid transparent conductive films, involving the assembly of two-dimensional graphene-based materials with one-dimensional silver and/or copper nanowires with high optical transmittance and good electrical conductivity. The hybrid films are characterized by a good degree of control of the architecture at the nanoscale level, where the weakness(es) of each component are offset by the strengths of the other components. By rational design of the structure and using simple and locate-cost fabrication methods, hybrid films with sheet resistance of 26 ohm/sq and optical transmittance (at ?=550 nm) of 83% for reduced graphene oxide/silver nanowire films, and 64 ohm/sq and optical transmittance of 93.6% for monolayer graphene/silver nanowire films have been fabricated. These values are comparable to transparent conductive films based on indium tin oxide but are now able to be used in flexible electronics due to their good mechanical properties.

Abstract: The invention provides a transparent conducting film which comprises a compound of formula (I): Zn1-x[M]xO1-y[X]y(I) wherein: x is greater than 0 and less than or equal to 0.25; y is from 0 to 0.1; [X] is at least one dopant element which is a halogen; and [M] is: (a) a dopant element which is selected from: a group 14 element other than carbon; a lanthanide element which has an oxidation state of +4; and a transition metal which has an oxidation state of +4 and which is other than Ti or Zr; or (b) a combination of two or more different dopant elements, at least one of which is selected from: a group 14 element other than carbon; a lanthanide element which has an oxidation state of +4; and a transition metal which has an oxidation state of +4 and which is other than Ti or Zr. The invention further provides coatings comprising the films of the invention, processes for producing such films and coatings, and various uses of the films and coatings.

Abstract: Embodiments of the invention generally provide electrochromic devices and materials and processes for forming such electrochromic devices and materials. In one embodiment, an electrochromic device contains a lower transparent conductor layer disposed on a substrate, wherein an upper surface of the lower transparent conductor layer has a surface roughness of greater than 50 nm and a primary electrochromic layer having planarizing properties is disposed on the lower transparent conductor layer. The upper surface of the primary electrochromic layer has a surface roughness less than the surface roughness of upper surface of the lower transparent conductor layer, such as about 50 nm or less.

Abstract: A method is provided for improving metallic nanostructure stability. The method provides a substrate, and using a physical vapor deposition (PVD) process for example, deposits metallic nanostructures having a first diameter overlying the substrate. Some examples of metallic nanostructures include Ag, Au, and Al. The metallic nanostructures are annealed in an atmosphere including an inert gas and H2. The annealing temperature is less than the melting temperature the metal material in bulk form. In response to the annealing, stabilized metallic nanostructures are formed. If the stabilized metallic nanostructures are exposed to an ambient air environment the stabilized metallic nanostructure maintain the first diameter. Typically, the metallic nanostructures are initially formed having a rectangular shape with corners. After annealing, the stabilized metallic nanostructures have a dome shape.

Abstract: An ophthalmic lens including an electro-active optical element including a substrate; a liquid crystalline material; and at least one first layer. The at least one first layer can include a layer of silicon oxide (SiOx) disposed between the liquid crystalline material and the substrate, and deposited onto a surface of the substrate at an oblique angle in reference to a plane normal to the mean surface of the substrate facing the liquid crystalline material.

Abstract: A transparent glass substrate, associated with a transparent electrically conductive layer capable of constituting an electrode of a photovoltaic module, and composed of a doped oxide, characterized by the interposition, between the glass substrate and the transparent electrically conductive layer, of a layer of one or more first nitride(s) or oxynitride(s), or oxide(s) or oxycarbide(s) having good adhesive properties with the glass, then of a mixed layer of one or more second nitride(s) or oxynitride(s), or oxide(s) or oxycarbide(s) having good adhesive properties with the glass, and of one or more third nitride(s) or oxynitride(s), or oxide(s) or oxycarbide(s) capable of constituting, optionally in the doped state, a transparent electrically conductive layer.

Abstract: The present invention discloses a color filter by copper and silver film, comprising: a lower copper layer; a lower silver layer formed on the lower copper layer; a medium formed on the lower silver layer; an upper copper layer formed on the medium; and an upper silver layer formed on the upper copper layer.

Abstract: A manufacturing method of a conductive laminated film suppressing a wrinkle has a metal layer forming step in which a conductive metal layer is continuously formed on a surface of a long transparent conductive film where a transparent conductive layer is formed while the transparent conductive film, including a long transparent film base containing a polyester resin as a constituting material and the transparent conductive layer formed thereon, is transported. The metal layer forming step is performed under a reduced pressure atmosphere of 1 Pa or less. The long transparent conductive film is continuously transported by application of a transport tensile force, and the conductive metal layer is continuously deposited on the surface where the transparent conductive layer is formed in a state in which a surface where the transparent conductive layer is not formed contacts the surface of a film-forming roll.

Abstract: Disclosed is a light emitting device manufacturing apparatus including a plurality of processing chambers for performing a substrate processing for forming, on a target substrate, a light emitting device having multiple layers including an organic layer, wherein each of the plurality of processing chambers is configured to perform a substrate process on the target substrate while maintaining the target substrate such that its device forming surface, on which the light emitting device is to be formed, is oriented toward a direction opposite to a direction of gravity.

Abstract: Creating an electrically conductive transparent structure. Liquid droplets comprising electrically conductive nanomaterial are deposited randomly onto a surface of a supporting substrate at a desired density to form an electrically conductive transparent network wherein the droplets are released from an applicator. A rate of drying of the liquid is controlled such that the liquid is able to evaporate without substantially damaging the supporting substrate.

Abstract: The present invention discloses plasma enhanced chemical vapor deposition (PECVD) process for depositing n-type and p-type zinc oxide-based transparent conducting oxides (TCOs) at low temperatures with excellent optical and electrical properties on glass and temperature sensitive materials such as plastics and polymers. Specifically, it discloses PECVD process for depositing n-type ZnO by doping it with B or F and p-type ZnO by doping it with nitrogen excellent optical and electrical properties on glass and temperature sensitive materials such as plastics and polymers for TCO application. The process utilizes a mixture of volatile zinc compound, argon and/or helium as a diluent gas, carbon dioxide as an oxidant, and a dopant or reactant to deposit the desired ZnO-based TCOs.

Abstract: Antireflective transparent EMI shielding optical filters are provided that can be laminated to optical display devices using optically clear adhesives. The provided filters include electrically-conductive metal or metal alloy layers that can be continuous and patterned or unpatterned. Also included are methods of making the provided filters and touch sensors made using the provided filters.

Abstract: Thin films containing a transparent conducting oxide and a high permittivity material are disclosed. Exemplary thin films may exhibit increased transmission in the visible-to-near infrared (vis-NIR) spectrum without a decrease in electrical conductivity compared to the thin film without the high permittivity material. Methods for making thin films having enhanced optical properties without substantially decreased electrical quality are also disclosed.

Abstract: The production process of an electromagnetic wave shielding material of the present invention comprises screen printing a conductive paste containing conductive particles, binder and solvent in a geometrical pattern on the surface of a transparent porous layer of a transparent resin substrate provided with the transparent porous layer, the porous layer containing as a main component thereof at least one type selected from the group consisting of an oxide ceramic, a non-oxide ceramic and a metal, followed by forming a conductive portion in a geometrical pattern on the surface of the transparent porous layer by heat treatment. An electromagnetic wave shielding material produced according to this production process has high electromagnetic wave shielding effects and superior transparency and visibility.

Abstract: To reduce brightness variation by wiring resistance of an upper part transparent electrode in an organic luminescence element, a stripe-shape first auxiliary wiring 11 extending in a direction parallel to a signal line is formed on the upper part transparent electrode, by a precise mask vapor deposition method. Then, a stripe-shape second auxiliary wiring 12 extending in a direction parallel to a scanning line is formed by a precise mask vapor deposition method.

Abstract: Disclosed are an inline chemical vapor deposition method and system for fabricating a device. The method includes transporting a web or discrete substrate through a deposition chamber having a plurality of deposition modules. A buffer layer, a window layer and a transparent conductive layer are deposited onto the substrate during passage through a first deposition module, a second deposition module and a third deposition module, respectively. Advantageously, the steps for generating the buffer layer, window layer and transparent conductive layer are performed sequentially in a common vacuum environment of a single deposition chamber and the use of a conventional chemical bath deposition process to deposit the buffer layer is eliminated. The method is suitable for the manufacture of different types of devices including various types of solar cells such as copper indium gallium diselenide solar cells.

Abstract: A ZnO-based transparent conductive film is produced by growing ZnO doped with a group III element oxide on a substrate and has a region with a crystal structure in which a c-axis grows along a plurality of different directions. The transparent conductive film produced by growing ZnO doped with a group III element oxide on a substrate has a ZnO (002) rocking curve full width at half maximum of about 13.5° or more. ZnO is doped with a group III element oxide so that the ratio of the group III element oxide in the transparent conductive film is about 7% to about 40% by weight. The transparent conductive film is formed on the substrate with a SiNx thin film provided therebetween. The transparent conductive film is formed on the substrate by a thin film formation method with a bias voltage applied to the substrate.

Abstract: A process for producing an optical article having an antireflection layer formed directly or via another layer on an optical base material, includes: forming a primary layer contained in the antireflection layer; and forming a light transmissive conductive layer containing a metal containing germanium as a main component and/or a compound of germanium and a transition metal on a surface of the primary layer.

Abstract: The present invention aims to provide a transparent electromagnetic wave shield member, which is free from a moirè phenomenon which could not be solved by the prior art, and in which an excellent electromagnetic wave shielding properties and a sufficient total light transmittance based on an appropriate network structure are compatible, and a method for manufacturing the same. The transparent electromagnetic wave shield member of the present invention is a transparent electromagnetic wave shield member in which a metal layer of an electroconductive metal network structure having a geometrical shape is formed on a transparent substrate, and which is characterized in that a spacing of said network structure is 200 ?m or less, an opening ratio of the network structure is 84% or more, and in addition, a thickness of the electroconductive metal layer is 2 ?m or less.

Abstract: A continuous process whereby carbon nanotubes, usually in the form of an aerogel are harvested from a high temperature reactor by means of an adhesive substrate that is passed across an outlet port at a predetermined rate whereby the carbon nanotube aerogel is fixed and transported away from the reactor and associated apparatus for suitable storage.

Abstract: An atmospheric chemical vapor deposition method of making a zinc oxide coated glass article, made by directing one or more streams of gaseous reactants, specifically a zinc containing compound, and an oxygen containing compound, onto a surface of a transparent substrate material heated to a temperature of 400° C. or less.

Abstract: A transparent conductive film comprised of a carbon nanotube network and indium tin oxide composite and a method for manufacturing the transparent conductive film are provided.

Abstract: The production process of an electromagnetic wave shielding material of the present invention comprises screen printing a conductive paste containing conductive particles, binder and solvent in a geometrical pattern on the surface of a transparent porous layer of a transparent resin substrate provided with the transparent porous layer, the porous layer containing as a main component thereof at least one type selected from the group consisting of an oxide ceramic, a non-oxide ceramic and a metal, followed by forming a conductive portion in a geometrical pattern on the surface of the transparent porous layer by heat treatment. An electromagnetic wave shielding material produced according to this production process has high electromagnetic wave shielding effects and superior transparency and visibility.

Abstract: An electrically controllable/electrochemical device, having variable optical and/or energy properties, including at least one carrier substrate including a first electronically conductive layer, a first electrochemically active layer capable of reversibly inserting ions such as cations, H+, or Li+, or anions, OH?, or anions made of an anodic (or respectively cathodic) electrochromic material, an electrolyte layer, a second electrochemically active layer capable of reversibly inserting the ions, or made of a cathodic (or respectively anodic) electrochromic material, and a second electronically conductive layer. At least one of the electrochemically active layers capable of reversibly inserting the ions, or made of an anodic or cathodic electrochromic material, has a sufficient thickness to allow all the ions to be inserted without electrochemically disfunctioning the active layers.

Abstract: The present invention provides a transparent substrate with a transparent conductive film that is thin but has a surface with concavities and convexities of increased height. A manufacturing method of the present invention includes a process of forming a transparent conductive film containing crystalline metal oxide as its main component on a transparent substrate by a pyrolytic oxidation method. In the method, a gaseous material containing a metal compound, an oxidizing material, and hydrogen chloride is supplied onto the transparent substrate. The process includes sequentially: a first step in which a mole ratio of the hydrogen chloride to the metal compound in the gaseous material is 0.5 to 5; and a second step in which the mole ratio is 2 to 10 and is higher than the mole ratio to be employed in the first step.

Abstract: A translucent solar cell has a transparent substrate and a first translucent electrode that is in anode. A transparent active layer, that is a substantially organic material layer, is formed on top of the anode. On top of the active layer, a second translucent electrode is formed. The second translucent electrode is the cathode. In a variation, the first translucent electrode is the cathode and the second translucent electrode the anode. The flexibility in choosing the order of the anode and cathode relative to the transparent substrate allows for an increase in processing techniques and, thus, the amount of utilizable materials to increase the power conversion efficiency of translucent solar cells.

Abstract: A method and product produced by the method for forming an interactive information device with a conductively coated panel includes forming a reduced contrast, increased light transmitting, conductively coated panel by providing a transparent substrate and applying a transparent, conductive layer on at least one surface of the substrate in a predetermined pattern with at least one area having a conductive layer thereon and a second area without a conductive layer. The method further includes applying a transparent layer of a metal oxide such that the metal oxide layer, such as silicon dioxide, overlies both areas whereby visible contrast between the areas is reduced and light transmission through the coated panel is increased. The coated panel is then attached to an electro-optic display for displaying information when electricity is applied thereto.

Abstract: A method and system for preparing a light transmitting and electrically conductive oxide film. The method and system includes providing an atomic layer deposition system, providing a first precursor selected from the group of cyclopentadienyl indium, tetrakis (dimethylamino) tin and mixtures thereof, inputting to the deposition system the first precursor for reaction for a first selected time, providing a purge gas for a selected time, providing a second precursor comprised of an oxidizer, and optionally inputting a second precursor into the deposition system for reaction and alternating for a predetermined number of cycles each of the first precursor, the purge gas and the second precursor to produce the oxide film.

Abstract: An atmospheric chemical vapor deposition method of making a zinc oxide coated glass article, made by directing one or more streams of gaseous reactants, specifically a zinc containing compound, and an oxygen containing compound, onto a surface of a transparent substrate material heated to a temperature of 400° C. or less.

Abstract: A ZnO-based transparent conductive film has practicable moisture resistance, desired characteristics of a transparent conductive film, and excellent economy. The transparent conductive film is produced by growing ZnO doped with a group III element oxide on a substrate and has a region with a crystal structure in which a c-axis grows along a plurality of different directions. The transparent conductive film produced by growing ZnO doped with a group III element oxide on a substrate has a ZnO (002) rocking curve full width at half maximum of about 13.5° or more. ZnO is doped with a group III element oxide so that the ratio of the group III element oxide in the transparent conductive film is about 7% to about 40% by weight. The transparent conductive film is formed on the substrate with a SiNx thin film provided therebetween. The transparent conductive film is formed on the substrate by a thin film formation method with a bias voltage applied to the substrate.

Abstract: Conducting polymers having improved optical properties, and a method of manufacturing the conducting polymers, are disclosed. The conducting polymers are prepared by a process wherein organic ions and neutral oligomers are deposited simultaneously on a substrate surface to provide a conducting polymer film.

Abstract: In order to allow application of any coating under a vacuum over a volatile gelatinous layer, such as polymer dispersed liquid crystal (PDLC) on an optical glass substrate with a transparent electrode, such as indium tin oxide (ITO) on its surface, a layer of an intermediate stress absorbing polymeric material is first applied to cover the volatile gelatinous layer to prevent evaporation and escape of volatiles, thereafter the coating is applied under a very high vacuum using for example a technique called Physical Vapor Deposition (PVD) or sputtering.

Abstract: Using a hydraulic transfer film wherein a transfer layer is composed of a decorative layer made of a printing ink coating film or a paint coating film, the transfer layer is hydraulically transferred onto a target body for transfer made of a metal substrate having a cured coating film layer in which a xylene absorption amount is within a range from 3.5 to 100 g/m2. Alternatively, using a hydraulic transfer film wherein a transfer layer has a protective layer made of a radiation-curable resin or a thermosetting resin, the transfer layer is hydraulically transferred onto a target body for transfer made of a metal substrate having a cured coating film layer in which a xylene absorption amount is within a range from 10 to 100 g/m2.

Abstract: In a transparent laminate, n thin-film units (n=3 or 4) are laminated unit by unit successively on a surface of a substrate, and a high-refractive-index transparent thin film is deposited on a surface of the laminate of the n thin-film units, each of the n thin-film units consisting of a high-refractive-index thin film and a silver transparent conductive thin film. When the silver transparent conductive thin films are deposited by a vacuum dry process, the temperature T(K) of the transparent substrate at the time of film deposition is set to be in a range 340?T?410, whereby the transparent laminate having a standard deviation of visible light transmittance which is not larger than 5% in a wave range of from 450 to 650 nm can be produced.

Abstract: Metal oxide films such as lithium niobate are formed in an amorphous state on a substrate such as lithium niobate and can be readily etched by conventional liquid or dry etchants. The amorphous film may then be converted by annealing to a crystalline form well suited to formation of electro-optical devices.

Abstract: Conducting polymers having improved optical properties, and a method of manufacturing the conducting polymers, are disclosed. The conducting polymers are prepared by a process wherein organic ions and neutral oligomers are deposited simultaneously on a substrate surface to provide a conducting polymer film.

Abstract: A composition for coating glass by chemical-vapor deposition comprises a mixture of a tin oxide precursor monobutyltin trichloride, a silicon dioxide precursor tetraethylorthosilicate, and an accelerant such as triethyl phosphite; the composition is gaseous below 200° C., and permits coating glass having a temperature from 450° to 650° C. at deposition rates higher than 350 ?/sec. The layer of material deposited can be combined with other layers to produce an article with specific properties such as controlled emissivity, refractive index, abrasion resistance, or appearance.