Coating By Vapor, Gas, Mist, Or Smoke Patents (Class 427/237)
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Patent number: 12117427Abstract: The present disclosure discusses a method of separating a sample (e.g., small organic acid metabolite) including coating a flow path of a chromatographic system. The coating along the flow path is vapor deposited and prevents or severely decreases metal interactions between the metallic chromatographic system and the sample.Type: GrantFiled: June 29, 2023Date of Patent: October 15, 2024Assignee: Waters Technologies CorporationInventors: Kerri M. Smith, Paul Rainville
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Patent number: 12072527Abstract: A sensing cable includes a first optical fiber, a second optical fiber that extends along the first optical fiber and that is spaced from the first optical fiber, and a transmitting material that includes an intervention portion present between the first optical fiber and the second optical fiber, the transmitting material being configured to transmit light from the first optical fiber to the second optical fiber through the intervention portion.Type: GrantFiled: October 19, 2022Date of Patent: August 27, 2024Assignee: FURUKAWA ELECTRIC CO., LTD.Inventor: Hideaki Hasegawa
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Patent number: 12049695Abstract: Compositions for forming a silicon-containing film such as without limitation a silicon oxide, silicon nitride, silicon oxynitride, a carbon-doped silicon nitride, or a carbon-doped silicon oxide film on at least a surface of a substrate having a surface feature. In one aspect, the composition comprises at least one compound is selected from the group consisting of a siloxane, a trisilylamine-based compound, and a cyclic trisilazane compound.Type: GrantFiled: September 18, 2018Date of Patent: July 30, 2024Assignee: Versum Materials US, LLCInventors: Raymond Nicholas Vrtis, William Robert Entley, Robert Gordon Ridgeway, Xinjian Lei, John Francis Lehmann, Manchao Xiao
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Patent number: 11697873Abstract: Methods of depositing an inorganic material on an extrusion die including positioning an extrusion die within a vapor deposition chamber, positioning an impedance disk over a face of the extrusion die, the impedance disk having a plurality of through holes and the face of the extrusion die having a plurality of slots defined by a plurality of extrusion die pins, and flowing one or more deposition gases through the plurality of through holes and into the plurality of slots to deposit inorganic particles on side walls of the plurality of pins. The total impedance to the flow of the deposition gases across the impedance disk and the extrusion die may be equal to a disk impedance of the impedance disk plus a die impedance of the extrusion die, and the disk impedance may be at least 40% of the total impedance to the flow of the deposition gases.Type: GrantFiled: December 13, 2019Date of Patent: July 11, 2023Assignee: Corning IncorporatedInventors: Thomas William Brew, Yuehao Li, Min Shen
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Patent number: 11638956Abstract: A method of forming a metal component from metal powder which includes exposing the metal powder to an inert gas; consolidating the metal powder into a solid metal; followed by exposing the solid metal to a hot isostatic pressing process to form a metal component, wherein the hot isostatic pressing process has one initial compression cycle followed by at least one decompression and recompression cycle.Type: GrantFiled: August 7, 2019Date of Patent: May 2, 2023Assignee: BAE Systems plcInventor: Howard James Price
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Patent number: 11292035Abstract: A method includes forming a film of a compound on an inner wall of a gas supply line by polymerization of a first compound and a second compound by controlling a temperature of the gas supply line to a first temperature at which the first compound and the second compound are polymerized in a state where a first gas containing the first compound and a second gas containing the second compound are supplied to the gas supply line, and removing the film by controlling the temperature of the gas supply line to a second temperature at which the film is depolymerized after predetermined processing is performed on a target object in a processing chamber by a processing gas supplied into the processing chamber through the gas supply line having the film. The first compound is isocyanate. The second compound is amine or a compound having a hydroxyl group.Type: GrantFiled: April 24, 2019Date of Patent: April 5, 2022Assignee: TOKYO ELECTRON LIMITEDInventor: Risako Matsuda
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Patent number: 11049714Abstract: Described herein are novel silyl-substituted hydrazine and silyl-substituted diamine precursor compounds and compositions and methods comprising same to deposit a silicon-containing film such as, without limitation, silicon oxide, silicon nitride, silicon oxynitride, silicon carbonitride, silicon oxycarbonitride, or carbon-doped silicon oxide via a thermal atomic layer deposition (ALD) or plasma enhanced atomic layer deposition (PEALD) process, or a combination thereof.Type: GrantFiled: September 19, 2018Date of Patent: June 29, 2021Assignee: Versum Materials US, LLCInventors: Matthew R. MacDonald, Manchao Xiao
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Patent number: 11047276Abstract: The present invention provides a particulate filter for use in an emission treatment system of a gasoline engine, the filter having an inlet side and an outlet side, wherein at least the inlet side is loaded with a synthetic ash.Type: GrantFiled: December 22, 2017Date of Patent: June 29, 2021Inventors: Lucy Clowes, Michael Anthony Howard
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Patent number: 10916407Abstract: Embodiments of the present disclosure generally relate to methods for conditioning an interior wall surface of a remote plasma generator. In one embodiment, a method for processing a substrate is provided. The method includes exposing an interior wall surface of a remote plasma source to a conditioning gas that is in excited state to passivate the interior wall surface of the remote plasma source, wherein the remote plasma source is coupled through a conduit to a processing chamber in which a substrate is disposed, and the conditioning gas comprises an oxygen-containing gas, a nitrogen-containing gas, or a combination thereof. The method has been observed to be able to improve dissociation/recombination rate and plasma coupling efficiency in the processing chamber, and therefore provides repeatable and stable plasma source performance from wafer to wafer.Type: GrantFiled: November 5, 2018Date of Patent: February 9, 2021Assignee: Applied Materials, Inc.Inventors: Abdul Aziz Khaja, Mohamad Ayoub, Jay D. Pinson, II, Juan Carlos Rocha-Alvarez
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Patent number: 10676819Abstract: Described herein is a method of depositing a plasma resistant ceramic coating onto a surface of a chamber component using a non-line-of-sight (NLOS) deposition process, such as atomic layer deposition (ALD) and chemical vapor deposition (CVD). The plasma resistant ceramic coating consists of an erbium containing oxide, an erbium containing oxy-fluoride, or an erbium containing fluoride. Also described are chamber components having a plasma resistant ceramic coating of an erbium containing oxide, an erbium containing oxy-fluoride, or an erbium containing fluoride.Type: GrantFiled: November 22, 2017Date of Patent: June 9, 2020Assignee: Applied Materials, Inc.Inventor: Jennifer Y Sun
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Patent number: 10612138Abstract: A nanoscale plate structure includes base plates and rib plates with nanoscale thickness and macroscopic lateral dimensions. The base plate resides in the first plane, the ribs can reside out-of-plane and form at least one strengthening rib, and additional base plates can reside in planes parallel to the first plane. The strengthening rib can be patterned such that there is no straight line path extending through a lateral dimension of the plate structure that does not intersect the at least one base plate and the at least one strengthening rib. The plates and ribs used in the structure have a thickness between about 1 nm and about 100 nm. The plate structures can be fabricated using a conformal deposition method including atomic layer deposition.Type: GrantFiled: March 13, 2017Date of Patent: April 7, 2020Assignee: THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIAInventors: Igor Bargatin, Keivan Davami
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Patent number: 10584411Abstract: A method of applying a protective coating to an article comprises the steps of a) depositing aluminum in a surface region of an article, and b) depositing chromium is the surface region of the article subsequent to step a), whereby at least a portion of the chromium replaces at least a portion of the aluminum. Another method and an article are also disclosed.Type: GrantFiled: July 7, 2015Date of Patent: March 10, 2020Assignee: United Technologies CorporationInventors: Mark A. Livings, Chelsea Brown
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Patent number: 10471695Abstract: The present disclosure generally relates to methods for additive manufacturing (AM) that utilize thermal dissipation support structures in the process of building objects, as well as novel thermal dissipation support structures to be used within these AM processes. The thermal dissipation support structures include at least one sacrificial structure that is separated from the object by a portion of unfused powder. The sacrificial structure increases a thermal dissipation rate of at least a portion of the object such that such that thermal gradients in the object remain below a specified threshold that prevents deformation of the object.Type: GrantFiled: October 26, 2016Date of Patent: November 12, 2019Assignee: General Electric CompanyInventors: Scott Alan Gold, Zachary David Fieldman, Daniel Joerger
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Patent number: 10290476Abstract: A plasma processing method including: a film formation step of forming a silicon-containing film on a surface of a member inside a chamber by plasma of a silicon-containing gas and a reducing gas; a plasma processing step of plasma-processing a workpiece carried into the chamber by plasma of a processing gas after the silicon-containing film is formed on the surface of the member; and a removal step of removing the silicon-containing film from the surface of the member by plasma of a fluorine-containing gas after the plasma-processed workpiece is carried out of the chamber.Type: GrantFiled: September 25, 2015Date of Patent: May 14, 2019Assignee: TOKYO ELECTRON LIMITEDInventors: Yusuke Hirayama, Masaaki Miyagawa
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Patent number: 10208390Abstract: A method for fabricating nanostructures and nanostructures are disclosed, which can include forming a multi-segmented nanowire; and performing a galvanic displacement reaction on the multi-segmented nanowire. The method utilizes template directed electrodeposition to fabricate nanowires with alternating layers of sacrificial/noble metal, enabling a new level of control over particle spacing, aspect ratio, and composition. Moreover, by exploiting the redox potential dependent reaction of galvanic displacement, nanopeapod materials can be extended (semiconductor/metal, p-type/n-type, metal/metal, ferromagnetic/nonmagnetic, etc.) beyond the fundamental metal/metal-oxide nanopeapods synthesized by high temperature techniques. Co/Au and Ni/Au multisegmented nanowires are disclosed, which can be create Te/Au nanopeapods by galvanic displacement, producing Te nanotubes and nanowires with embedded Au particles, respectively.Type: GrantFiled: November 2, 2015Date of Patent: February 19, 2019Assignee: THE REGENTS OF THE UNIVERSITY OF CALIFORNIAInventors: Nosang Vincent Myung, Carlos Maldonado Hangarter
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Patent number: 10030298Abstract: A surface of an article is modified by first disposing a nickel-enriched region at the surface of a substrate, then enriching the nickel-enriched region with aluminum to form an aluminized region, and finally removing at least a portion of the aluminized region to form a processed surface of the substrate. Upon removal of this material, the roughness of the surface is reduced from a comparatively high initial roughness value to a comparatively low processed roughness value. In some embodiments, the processed roughness is less than about 95% of the initial roughness. Moreover, the sequence of steps described herein may be iterated one or more times to achieve further reduction in substrate surface roughness.Type: GrantFiled: August 21, 2015Date of Patent: July 24, 2018Assignee: GENERAL ELECTRIC COMPANYInventors: Laura Cerully Dial, William Thomas Carter, Michael Francis Xavier Gigliotti, Jr.
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Patent number: 9873940Abstract: A coating system for forming an atomic layer deposition (ALD) or a molecular layer deposition (MLD) barrier coating on interior fluid wetted surfaces of a fluid handling component for a vacuum chamber of a semiconductor substrate processing apparatus. The coating system includes the fluid handling component, wherein the interior fluid wetted surfaces define a process region of the coating system, a gas supply system in fluid communication with the process region of the component wherein the gas supply system supplies process gases to the process region of the component through the inlet port thereof such that an ALD or MLD barrier coating can be formed on the fluid wetted surfaces of the fluid handling component, and an exhaust system in fluid communication with the process region of the component wherein the exhaust system exhausts the process gases from the process region of the component through the outlet port thereof.Type: GrantFiled: December 16, 2014Date of Patent: January 23, 2018Assignee: Lam Research CorporationInventors: Lin Xu, Hong Shih, Nash Anderson, Tom Stevenson, John Daugherty, John Michael Kerns, Robert Griffith O'Neill
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Patent number: 9862059Abstract: The present invention relates to a method for manufacturing components, in particular components of turbomachines, such as aircraft engines, wherein an additive method is used at least partially for the manufacture of the component (1), wherein at least one surface region (3) of the additively manufactured portion of the component (1) is provided with a smoothing layer (2), which is deposited by vapor deposition. In addition, the invention relates to a correspondingly manufactured component of a turbomachine.Type: GrantFiled: September 1, 2015Date of Patent: January 9, 2018Assignee: MTU Aero Engines AGInventors: Christian Liebl, Karl Blumenschein, Steffen Schlothauer, Thomas Hess
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Patent number: 9816178Abstract: The present invention relates to a method of removing a substrate tube from the deposited layer inside of said substrate tube.Type: GrantFiled: June 5, 2014Date of Patent: November 14, 2017Assignee: Draka Comteq, B.V.Inventors: Igor Milicevic, Johannes Antoon Hartsuiker, Mattheus Jacobus Nicolaas van Stralen, Gertjan Krabshuis
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Patent number: 9633841Abstract: Methods for depositing an amorphous silicon layer on wafers are disclosed. A process wafer, a control wafer, and a dummy wafer may be loaded into a chamber where an amorphous silicon layer may be deposited on the process wafer. Afterwards, the process wafer and the control wafer may be removed from the chamber. The chamber and the dummy wafers are dry cleaned together. The dry cleaned dummy wafers are used in the next run for depositing amorphous silicon layer. The process may be controlled by a computer system issuing a control job comprising a first process job and a second process job, wherein the first process job is to deposit an amorphous silicon layer on the process wafer, and the second process job is to dry clean the chamber and the dummy wafer.Type: GrantFiled: July 18, 2014Date of Patent: April 25, 2017Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventor: Chi-Min Liao
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Patent number: 9382617Abstract: Rod-type, polycrystalline silicon having a rod diameter of >100 mm are obtained by deposition of silicon-containing gas according to the Siemens method, wherein the Si rods are brought into contact with hydrogen at the end of the deposition process during cooling in the reactor, and the cooled Si rods obtained have in perpendicular cross section cracks and/or radial stresses having a defined size.Type: GrantFiled: September 9, 2010Date of Patent: July 5, 2016Assignee: Wacker Chemie AGInventor: Mikhail Sofin
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Patent number: 9206039Abstract: A method for fabricating nanostructures, which includes the steps of forming a multi-segmented nanowire; and performing a galvanic displacement reaction on the multi-segmented nanowire. The method utilizes template directed electrodeposition to fabricate nanowires with alternating layers of sacrificial/noble metal, enabling a new level of control over particle spacing, aspect ratio, and composition. Moreover, by exploiting the redox potential dependent reaction of galvanic displacement, nanopeapod materials can be extended (semiconductor/metal, p-type/n-type, metal/metal, ferromagnetic/nonmagnetic, etc.) beyond the fundamental metal/metal-oxide nanopeapods synthesized by high temperature techniques. In accordance with an exemplary embodiment. Co/Au and Ni/Au multisegmented nanowires were used to create Te/Au nanopeapods by galvanic displacement, producing Te nanotubes and nanowires with embedded Au particles, respectively.Type: GrantFiled: May 23, 2011Date of Patent: December 8, 2015Assignee: THE REGENTS OF THE UNIVERSITY OF CALIFORNIAInventors: Nosang Vincent Myung, Carlos Maldonado Hangarter
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Publication number: 20150132485Abstract: Unique and improved methods and coating apparatuses for applying diffusion aluminide materials onto internal sections of various parts are disclosed. The source material is coated onto an elongated member, such as a wire or rod, which is subsequently inserted at a specific location into a hollow cavity of the component to be coated. Improvements in the coating process and resultant coating include the ability to coat complex geometries and coat components with uniform thicknesses that do not require post-coating steps for removal of oxides and/or residual bisque.Type: ApplicationFiled: November 6, 2014Publication date: May 14, 2015Inventors: KEVIN E. GARING, JEFFREY J. McCONNELL, CARL HUGO HUTZLER, III
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Publication number: 20150122365Abstract: Liquid chromatography and gas chromatography components with a conformal protective coating on internal surfaces thereof and methods for producing the same are provided. The conformal protective coating is formed via an atomic layer deposition (ALD) process. The components and methods of the present disclosure find use in providing protective coatings for liquid chromatography and gas chromatography components that are compatible with bioanalytical separations and sensitive trace analyses.Type: ApplicationFiled: January 14, 2015Publication date: May 7, 2015Inventors: Elizabeth Carr, Kevin P. Killeen
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Publication number: 20150111023Abstract: Coating porous material, such as PDMS, with parylene N, C, D, and AF-4 by vapor deposition polymerization is described in which a temperature of the porous material's surface being coated is heated to between 60° C. and 120° C., or 80° C. and 85° C., during deposition. The parylene forms nano roots within the porous material that connect with a conformal surface coating of parylene. In some embodiments, a watertight separation chamber in an integrated microfluidic liquid chromatography device is fabricated by heating tunnels in micro-fabricated PDMS and depositing parylene within the heated tunnels.Type: ApplicationFiled: October 8, 2014Publication date: April 23, 2015Applicant: California Institute of TechnologyInventors: Yu-Chong Tai, Dongyang Kang
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Patent number: 8968837Abstract: The present invention relates to the treatment of internal surfaces of a hollow body, on the inner surfaces of which areas having different surface properties, for example, having hydrophilic and hydrophobic properties, are produced. The invention further relates to fluid separators that are based on said hollow bodies and that have areas having different surface properties. Such fluid separators are used in medical technology and analysis, in particular biochemical analysis.Type: GrantFiled: November 1, 2012Date of Patent: March 3, 2015Assignee: Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V.Inventors: Marko Eichler, Krees Nagel, Claus-Peter Klages
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Publication number: 20150024152Abstract: The invention provides metal liquid chromatography components with uniformly coated internal surfaces and methods for achieving the same. The invention addresses the problem of corrosion or interference of metal components in the flow path for LC analyses in which the sample interacts with metal ions or surfaces. The invention also alleviates the difficulties in coating very long metal tubes and very small metal channels with an inert, continuous coating that adheres well to metal surfaces. The metal flow path is rendered inert by the coating, and thus compatible with bioanalytical separations, for example, by using a vapor phase deposition process to coat the inner surfaces with a coating that continuously covers all metal surfaces in the flow path.Type: ApplicationFiled: July 19, 2013Publication date: January 22, 2015Inventors: Elizabeth Carr, Karen L Seaward, Kevin P Killeen
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Patent number: 8932676Abstract: Provided is a method for producing a gas barrier plastic molded body by forming a gas barrier thin film which is substantially colorless and has gas barrier properties, on the surface of a plastic molded body by a heating element CVD method using only raw material gases that are highly safe.Type: GrantFiled: December 28, 2011Date of Patent: January 13, 2015Assignee: Kirin Beer Kabushiki KaishaInventors: Masaki Nakaya, Midori Takiguchi, Mari Shimizu, Aiko Sato, Hiroyasu Tabuchi, Eitaro Matsui
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Patent number: 8920871Abstract: Porous nuclear fuel elements for use in advanced high temperature gas-cooled nuclear reactors (HTGR's), and to processes for fabricating them. Advanced uranium bi-carbide, uranium tri-carbide and uranium carbonitride nuclear fuels can be used. These fuels have high melting temperatures, high thermal conductivity, and high resistance to erosion by hot hydrogen gas. Tri-carbide fuels, such as (U,Zr,Nb)C, can be fabricated using chemical vapor infiltration (CVI) to simultaneously deposit each of the three separate carbides, e.g., UC, ZrC, and NbC in a single CVI step. By using CVI, the nuclear fuel may be deposited inside of a highly porous skeletal structure made of, for example, reticulated vitreous carbon foam.Type: GrantFiled: August 27, 2013Date of Patent: December 30, 2014Assignee: Sandia CorporationInventors: Dennis L. Youchison, Brian E. Williams, Robert E. Benander
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Patent number: 8893643Abstract: Provided is a coating apparatus in which a liquid substance is less likely to splash around and a chemical solution can be coated on a specific region of the inside surface of a tubular container. The coating apparatus 10 includes a spraying direction changing member 12, fixed to a tip portion of a spray nozzle 4 with an inner tube 6 and an outer tube 7, for changing the direction of spray of a sol oriented outward to a direction intersecting a direction of discharge of the liquid substance from the inner tube 6.Type: GrantFiled: August 10, 2010Date of Patent: November 25, 2014Assignee: Sekisui Medical Co., Ltd.Inventors: Yuuji Setoguchi, Tomonori Inoue
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Patent number: 8889221Abstract: Methods for generating and applying coatings to filters with porous material in order to reduce large pressure drop increases as material accumulates in a filter, as well as the filter exhibiting reduced and/or more uniform pressure drop. The filter can be a diesel particulate trap for removing particulate matter such as soot from the exhaust of a diesel engine. Porous material such as ash is loaded on the surface of the substrate or filter walls, such as by coating, depositing, distributing or layering the porous material along the channel walls of the filter in an amount effective for minimizing or preventing depth filtration during use of the filter. Efficient filtration at acceptable flow rates is achieved.Type: GrantFiled: June 11, 2013Date of Patent: November 18, 2014Assignee: Massachusetts Institute of TechnologyInventors: Alexander Sappok, Victor Wong
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Patent number: 8883256Abstract: A coating method for the internal coating of a hollow body which includes producing a plasma jet from a working gas, supplying at least one precursor material to the working gas and/or to the plasma jet, introducing the plasma jet through a first opening into an interior of the hollow body and depositing at least one reaction product of at least one precursor on an inner surface of the hollow body and/or on at least one layer arranged on the inner surface. The method is carried out at atmospheric pressure. Furthermore, the first internal coating takes place without an activation process directly after a production process of the hollow body, in which the hollow body is formed with the supply of heat.Type: GrantFiled: July 7, 2009Date of Patent: November 11, 2014Assignee: Innovent E.V.Inventors: Andreas Pfuch, Michael Droessler, Kerstin Horn, Andreas Heft
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Patent number: 8883257Abstract: Disclosed herein is a method for producing a plastic container coated with a thin film that is excellent in gas barrier properties, film coloration and film adhesiveness without using an external electrode having a special shape while suppressing deposition of foreign matters such as carbon powders.Type: GrantFiled: June 25, 2009Date of Patent: November 11, 2014Assignee: Kirin Beer Kabushiki KaishaInventors: Masaki Nakaya, Mari Shimizu
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Publication number: 20140311756Abstract: A centralizer for a tubular body in a wellbore is provided herein. The centralizer includes an elongated body having a bore there through. The bore is dimensioned to receive a tubular body. The elongated body has an inner surface and an outer surface. The centralizer also has a coating deposited on at least the inner surface. The coating is designed to provide a reduced coefficient of friction on the surface. A method of fabricating a centralizer is also provided herein.Type: ApplicationFiled: April 10, 2014Publication date: October 23, 2014Inventor: Rock Dicke
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Patent number: 8857372Abstract: An isothermal, low pressure-based process of depositing material within a substrate has been developed and results in creating an extremely narrow reaction zone within which a more uniform and efficient deposition will occur. Sets of isothermal plasma operating conditions have been found that create a narrow deposition zone, assuring that the deposited material is clear glass rather than soot particles. The chemical delivery system, in one arrangement, utilizes rods of solid phase source material (which may otherwise be difficult to obtain in gaseous form). The operating conditions are selected such that the hot plasma does not transfer a substantial amount of heat to the substrate tube, where the presence of such heat has been found to result in vaporizing the reactant material (creating soot) and developing hot spots.Type: GrantFiled: September 27, 2010Date of Patent: October 14, 2014Inventors: James Fleming, George Zydzik
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Patent number: 8846537Abstract: A mold having an open interior volume is used to define patterns. The mold has a ceiling, floor and sidewalls that define the interior volume and inhibit deposition. One end of the mold is open and an opposite end has a sidewall that acts as a seed sidewall. A first material is deposited on the seed sidewall. A second material is deposited on the deposited first material. The deposition of the first and second materials is alternated, thereby forming alternating rows of the first and second materials in the interior volume. The mold and seed layer are subsequently selectively removed. In addition, one of the first or second materials is selectively removed, thereby forming a pattern including free-standing rows of the remaining material. The free-standing rows can be utilized as structures in a final product, e.g., an integrated circuit, or can be used as hard mask structures to pattern an underlying substrate. The mold and rows of material can be formed on multiple levels.Type: GrantFiled: March 11, 2013Date of Patent: September 30, 2014Assignee: Micron Technology, Inc.Inventor: Gurtej S. Sandhu
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Patent number: 8840850Abstract: A flow channel structure includes a substrate having a flow channel formed therein, and plural fibrous bristles extending from the inner wall of the flow channel. The flow channel is configured to allow a solution to flow through the flow channel. The inner wall of the flow channel is made of silicon. The flow channel is configured to allow a solution to flow through the flow channel. This flow channel structure can homogenize the solution inside the flow channel.Type: GrantFiled: December 22, 2009Date of Patent: September 23, 2014Assignee: Panasonic CorporationInventors: Masaya Nakatani, Makoto Takahashi, Hiroshi Ushio, Takeki Yamamoto
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Patent number: 8808797Abstract: Methods of manufacturing a gas barrier plastic container include a method in which the inside of a vacuum chamber which houses a plastic container is exhausted to form a pre-set pressure, and while maintaining a state where electricity is supplied to a thermal catalyst arranged inside the vacuum chamber to generate heat above a pre-set temperature, a source gas is blown on the thermal catalyst to decompose the source gas and create chemical species, whereby a gas barrier thin film is formed by the chemical species reaching at least one of either the inner surface or the outer surface of the plastic container.Type: GrantFiled: April 27, 2012Date of Patent: August 19, 2014Assignee: Kirin Beer Kabushiki KaishaInventors: Akio Mishima, Masaki Nakaya, Akira Shirakura
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Patent number: 8800224Abstract: A volatile corrosion inhibiting agent is provided for dispersion of a vapor phase corrosion inhibitor in a vapor stream that is passed into a sheath or other casing enclosing a metal bar, cable, or other tension member to protect said tension member from corrosion.Type: GrantFiled: August 30, 2010Date of Patent: August 12, 2014Assignee: Cortec CorporationInventors: Margarita Kharshan, Alla Furman, Jessi Jackson Meyer
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Patent number: 8790849Abstract: A manufacturing method for an electrode catalyst layer includes: containing a conductive carrier on which a catalyst is supported, a substrate, an electrolyte resin and a supercritical fluid inside a closed container (S102 to S106); and cooling the substrate to form an electrode catalyst layer, having the conductive carrier on which the catalyst is supported and the electrolyte resin, on the substrate (S 108).Type: GrantFiled: April 8, 2010Date of Patent: July 29, 2014Assignee: Toyota Jidosha Kabushiki KaishaInventors: Yuichiro Hama, Takayoshi Doi
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Publication number: 20140151284Abstract: A water pitcher system that includes a water receiving aperture configured to allow water to be delivered into an interior water storage volume defined by a base and at least one upwardly extending wall extending upward from the base. The at least one upwardly extending wall includes an inner fluid facing wall section having an inner fluid facing surface and an outer user facing wall section having an exterior, user facing surface where the inner fluid facing wall section and the outer user facing wall section are each composites of a plastic substrate and a glass layer, typically deposited by vapor deposition or blow-molding, onto the plastic substrate. The inner fluid facing surface and the outer user facing surface are the glass layers.Type: ApplicationFiled: December 3, 2013Publication date: June 5, 2014Applicant: WHIRLPOOL CORPORATIONInventors: NIHAT O. CUR, JAMES W. KENDALL, GINGER ELAYNE PATERA, MARK M. SENNINGER
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Patent number: 8715789Abstract: A method and apparatus for plasma enhanced chemical vapor deposition to an interior region of a hollow, tubular, high aspect ratio workpiece are disclosed. A plurality of anodes are disposed in axially spaced apart arrangement, to the interior of the workpiece. A process gas is introduced into the region. A respective individualized DC or pulsed DC bias is applied to each of the anodes. The bias excites the process gas into a plasma. The workpiece is biased in a hollow cathode arrangement. Pressure is controlled in the interior region to maintain the plasma. An elongated support tube arranges the anodes, and receives a process gas tube. A current splitter provides a respective selected proportion of a total current to each anode. One or more notch diffusers or chamber diffusers may diffuse the process gas or a plasma moderating gas. Plasma impedance and distribution may be controlled using various means.Type: GrantFiled: December 16, 2010Date of Patent: May 6, 2014Assignee: Sub-One Technology, Inc.Inventors: Deepak Upadhyaya, Karthik Boinapally, William J. Boardman, Matthew MaMoody, Thomas B. Casserly, Pankaj Jyoti Hazarika, Duc Doan
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Publication number: 20140099441Abstract: The present invention relates to a method for synthesizing carbon nanowires directly on the internal surface of a three-dimensional structure including a carbon structure and, more particularly, to a method for synthesizing carbon nanowires at high density on the surface of pores or gaps present in a structure, and a hierarchical structure synthesized by the method. According to the present invention, it is possible to fill fine pores or gaps in a structure, which cause a reduction in mechanical properties or conductivity, with high-density carbon nanowires, thus significantly improving mechanical or electrical performance of a final product.Type: ApplicationFiled: September 24, 2013Publication date: April 10, 2014Applicant: Korea Institute of Energy ReasearchInventors: Nam Jo Jeong, Se Young Kim, In Sub Han, Sang Kuk Woo, Doo Won Seo
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Publication number: 20140030165Abstract: A method of coating a substrate, such as a microfluidic device having an interior surface, includes heating a gas including a perfluoroacrylate, a crosslinker and an initiator at a first temperature, maintaining the substrate at a second temperature lower than the first temperature in a reaction chamber, exposing the heated gas to the substrate in the reaction chamber, and reacting the perfluoroacrylate with the initiator and crosslinker to form a polymer coating on the surface of the substrate.Type: ApplicationFiled: July 26, 2013Publication date: January 30, 2014Applicant: UNIVERSITY OF SOUTHERN CALIFORNIAInventors: Carson Riche, Noah Malmstadt, Brandon Marin, Malancha Gupta
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Patent number: 8617658Abstract: This invention relates to a method for conducting film coating on the surface of spinning circular workpiece under action of gas pressure, and nozzle utilized in the same. Circular workpiece to be coated is held on a rotating mechanism, and a feedstock loading machine having a nozzle, which is capable of guiding redundant feedstock and overflowing in a specific direction, is set to have a 100 ?m gap with the circular workpiece. When the rotating mechanism is rotated, the polymer solution is precoated on the surface of the circular workpiece, and when gas valve is opened, the polymer solution is squeezed to a predetermined thickness by an annular high pressure gas-stream formed on the periphery of a cylinder, produced from the high pressure gas released.Type: GrantFiled: March 26, 2010Date of Patent: December 31, 2013Assignee: National Cheng Kung UniversityInventors: Yung-Chun Lee, Chuan-Hsiang Lee, Shou-Chi Cho
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Publication number: 20130305984Abstract: A graphite crucible (2) for retaining a quartz crucible (1) has a graphite crucible substrate (3) as a graphite crucible forming material, and a coating film (4) made of a carbonized phenolic resin and formed over the entire surface of the graphite crucible substrate (3). The phenolic resin is impregnated inside open pores (5) existing in a surface of the graphite crucible substrate (3). The coating film (4) may be formed only within a portion of the graphite crucible in which SiC formation can occur easily, not over the entirety of the surface of the graphite crucible. For example, it is possible to deposit the film only on the entire inner surface of the crucible. It is also possible to deposit the film only on a curved portion (sharply curved portion) of the inner surface, or only on a curved portion and a straight trunk portion.Type: ApplicationFiled: January 30, 2010Publication date: November 21, 2013Applicant: TOYO TANSO CO., LTD.Inventors: Osamu Okada, Yoshiaki Hirose, Tomomitsu Yokoi, Yasuhisa Ogita
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Patent number: 8574671Abstract: A method for adjusting the coolant consumption within actively cooled components is produced. The components include an interior with at least one duct with different regions which have different cross sections of flow. A greater increase in the wall thickness is produced in the region having the smaller cross section of flow by a first diffusion process and a lesser increase in the wall thickness is produced in the region having the larger cross section of flow by a second diffusion process which is different from the first. By using different diffusion coatings in a component, it is possible to adjust the flow of coolant through a component in a controlled way.Type: GrantFiled: January 17, 2012Date of Patent: November 5, 2013Assignee: Siemens AktiengesellschaftInventors: Fathi Ahmad, Knut Haberstadt, Christian Lerner
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Publication number: 20130273248Abstract: Methods and devices for the production of glass fiber preforms are disclosed. The methods and devices are based on a modified chemical vapour deposition process wherein the reacting gases are reacted in a hot zone within a substrate tube. Glass layers are deposited by a first heating instrument moving with respect to the substrate tube. The reaction gases are subjected to a temperature treatment before entering the hot zone of the main burner to encourage an evenly distributed chemical reaction, deposition and doping concentration over the length of the substrate tube. This is based on the position of the substrate tube with respect to the heating instrument and the resulting different heating of the reaction gases.Type: ApplicationFiled: March 14, 2013Publication date: October 17, 2013Inventors: Wolfgang Haemmerle, Elke Poppitz, Klaus Westhauser, Lothar Brehm
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Publication number: 20130247818Abstract: A silica crucible and a fabricating method thereof are provided. The silica crucible includes a vitreous silica body having an inner surface and an outer surface, the inner surface of the vitreous silica body defining a cavity adapted for containing a molten material or a powder material; and a first coating layer formed on the inner surface of the vitreous silica body. The first coating layer is formed by pyrolysing a composite of aluminum, magnesium, calcium, titanium, zirconium, radium, chromium, selenium, barium, yttrium, cerium, hafnium, tantalum, tin or silicon under a predetermined temperature. The first coating layer substantially includes of a nonhomogeneous material, and an interface is defined by the homogeneous material and the nonhomogeneous material between the vitreous silica body and the coating layer. The first coating layer has strong adhesion capability and guarantees the coating layer will not be easily peeled off or removed.Type: ApplicationFiled: May 25, 2011Publication date: September 26, 2013Applicant: SAINT-GOBAIN RESEARCH (SHANGHAI) CO., LTD.Inventors: Lu Wang, Leilei Sun, Laurent Molins, Paul Sargood
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Publication number: 20130239882Abstract: A crucible for forming a boule in a portion of an interior volume of the crucible. The crucible has a crucible base material forming the interior volume. The crucible base material is separated from the boule by a barrier coat disposed between the boule and the crucible base material. The barrier coat has a pin free conformal thickness conforming to a surface of the crucible base material regardless of a shape of a surface feature on the surface, the barrier coat having a melting point higher than that of the boule.Type: ApplicationFiled: September 10, 2012Publication date: September 19, 2013Inventors: Robert Billings Bramhall, JR., Dane Fawkes, Van Den Hock