Abstract: Apparatus and method for treating a surface of a substrate for electrolytic or electroless plating of metals in integrated circuit manufacturing. In one embodiment the method includes forming a barrier layer on a substrate. A metal-seed layer is then formed on the barrier layer. The method continues by performing in situ surface treatment of the metal-seed layer to form a passivation layer on the metal-seed layer. In another embodiment of a method of this invention, a substrate is provided into an electroplating tool chamber. The substrate has a barrier layer formed thereon, a metal seed layer formed on the barrier layer and a passivation layer formed over the metal seed layer. The method continues by annealing the substrate in forming gas to reduce the passivation layer. A conductive material is deposited on the substrate using an electrolytic plating or electroless plating process.

Abstract: A method is disclosed for substantially uniformly coating an interior surface of a ferromagnetic tubular structure such as a ferromagnetic tube having a high aspect ratio. The method entails inducing a magnetic field of a given magnitude within the tubular structure. Further, a bias is applied at a given voltage to the tubular structure. Then, the interior surface of the tubular structure is exposed to a gaseous precursor material under conditions effective to convert a quantity of the gaseous precursor material to ionize gaseous precursor material. The given magnitude and voltage is such that it is effective to deposit the ionized the gaseous precursor material onto the interior surface and converts the ionized gaseous precursor material to a substantially uniform protective coating in the interior surface.

Abstract: An aluminide coating is produced on a hollow article by furnishing an article having a hollow interior and an access opening to the hollow interior, placing an aluminide coating tape into the hollow interior through the access opening, and vapor phase aluminiding the hollow article using an external aluminum vapor source in addition to the aluminide coating tape.

Abstract: Integrated circuits are built layer by layer on a substrate. One technique for forming layers is chemical vapor deposition (CVD.). This technique injects gases through a gas-dispersion fixture into a chamber. The gases react and blanket a substrate in the chamber with a material layer. One way to promote uniform layer thickness is to coat the gas-dispersion fixture with a uniform layer of the material before using it for deposition on the substrate. However, known fixture-coating techniques yield uneven or poorly adherent coatings. Accordingly, the inventor devised new methods for coating these fixtures. One exemplary method heats a fixture to a temperature greater than its temperature during normal deposition and then passes one or more gases through the fixture to form a coating on it. The greater conditioning temperature improves evenness and adhesion of the fixture coating, which, in turn, produces higher quality layers in integrated circuits.

Abstract: The present invention provides a method for efficiently and completely removing a film deposited inside a film forming chamber. In addition, the invention provides a CVD apparatus using heating element which an in-situ cleaning method can be applied and its in-situ leaning method. The removal method of this invention comprises a method for removing a film deposited inside a chamber which can be exhausted and/or on a member placed in the chamber, wherein after the chamber is exhausted, a heating element, at least the surface of which is composed of platinum, disposed in said vacuum chamber, is heated at a prescribed temperature and a cleaning gas which is decomposed and/or activated by the heating element to generate an activated species that converts the deposited film into gaseous substance is introduced into the chamber.

Abstract: A porous substrate having a concave inside face and an outside face is disposed in an enclosure, and reactive gas is introduced into the enclosure to densify the substrate. At least a portion of the gas is divided into two non-zero fractions. The first fraction of the gas is fed to the inside face of the substrate. The second fraction of the gas is fed to only the outside face of the substrate. Alternatively, the first fraction of the gas is fed via a tooling extending into an inside volume defined by the concave inside face of the substrate.

Abstract: A method and device for layer thickness determination allows for the layer thickness to be determined in situ during the coating process. This is achieved using a sensor which has an electrical property which, as a result of the coating process, changes in a manner which is representative of the layer thickness which has been reached. As such, this property can be measured.

Abstract: A method for applying an aluminide coating on a gas turbine engine blade having an external surface and an internal cooling cavity having an internal surface that is connected to the external surface by cooling holes. The method is conducted in a vapor coating container having a hollow interior coating chamber, and includes the steps of loading the coating chamber with the blade to be coated; providing an aluminide coating gas in the loaded coating chamber; flowing an inert carrier gas into the loaded coating chamber comprising the aluminide coating gas at a specified gas flow rate and time to move the aluminide coating gas through the cooling holes and internal cooling cavity and deposit an aluminide coating on the internal surface of the blade; and then flowing an inert carrier gas into the loaded coating chamber comprising the aluminide coating gas at a specified higher temperature and time to deposit an aluminide coating on the external surface of the blade.

Abstract: A production device for a DLC film-coated plastic container and a production method therefor, capable of forming DLC (diamond-like carbon) films simultaneously on the inner surfaces of a plurality of plastic containers, and reducing variations in film thickness. A production device for DLC film-coated plastic containers, for forming a plurality DLC films simultaneously, characterized by comprising a columnar external electrode (3) having housing spaces in which a plurality of plastic containers (7a-7d) can be disposed in parallel and independently, internal electrodes (9a-9d) respectively disposed in the housed containers (7a-7d), a matching box (14) connected to the external electrode (3) and impedance-matching a high-frequency load, and a high-frequency power supply (15) connected to the matching box.

Abstract: A process for chroming an inner surface of a component, in which the inner surface which is to be coated is not brought into contact with a powder which forms the coating gas, includes: providing a mixture of chromium granules and an activator; heating the mixture to a temperature at which a coating gas which substantially comprises gaseous CrCl is formed; dissipating the coating gas; and exposing the inner surface of the component to the coating gas thereby forming a chromium-containing diffusion layer.

Abstract: A thin film deposition method using plasma enhanced chemical vapor deposition is described. In a plasma enhanced chemical vapor deposition chamber, plasma is used to enhance the chemical reaction to form a thin film on a substrate. The substrate is then removed, followed by passing a cleaning gas into the chamber to remove residues in the chamber. Before loading another batch of substrate in the chamber, a pre-deposition process is performed to isolate contaminants generated from the cleaning process. A discharge plasma treatment is then conducted to lower the amount of accumulated electrical charges.

Abstract: A deposition method includes positioning a substrate within a deposition chamber defined at least in part by chamber walls. At least one of the chamber walls comprises a chamber surface having a plurality of purge gas inlets to the chamber therein. A process gas is provided over the substrate effective to deposit a layer onto the substrate. During such providing, a material adheres to the chamber surface. Reactive purge gas is emitted to the deposition chamber from the purge gas inlets effective to form a reactive gas curtain over the chamber surface and away from the substrate, with such reactive gas reacting with such adhering material. Further implementations are contemplated.

Abstract: A process for coating hollow bodies, in which a powder mixture including a metal donor powder, an inert filler powder and an activator powder including a metal halide is provided, the powder mixture is brought into contact with an inner surface, which is to be coated, of the hollow body and is heated, in which process, in order to increase the internal layer thicknesses, the inert filler powder is provided with a mean particle size which is approximately the same as the mean particle size of the metal donor powder.

Abstract: Reactor wall coatings for polymerization reactors and processes for forming such coatings are disclosed. The reactor wall coatings can have a thickness of at least 100 ?m and a molecular weight distribution including a major peak having one or more of an Mw/Mn ratio of less than 10; an Mz/Mw ratio of less than 7; and a maximum value of d(wt %)/d(log MW) at less than 25,000 daltons in a plot of d(wt %)/d(log MW), where MW is the molecular weight in daltons. The reactor wall coatings can be formed in-situ during polymerization, on reactor walls initially free of a reactor wall coating, or having a pre-existing reactor wall coating.

Abstract: A method for filling a container involves supplying a barrier layer to the inside of a container and irradiating the inside with a high energy ray to form a barrier layer on the inner surface of the container and simultaneously sterilizing the inside and discharging a residual barrier material precursor gas and a by-product gas from the container before or during the filling of liquid food into the container. The method allows the formation of a continuous barrier layer covering edges, gloves, clearances and gaps inside the container. Automatic and effective discharge of a residual barrier material precursor gas and a by-product gas from the container through the filling of liquid food is allowed. The method avoids the necessity of chemical disinfectants through sterilization of the inside of a container by irradiation with a high energy ray and thereafter filling a liquid food in an aseptic state.

Abstract: The invention encompasses a method for sequentially processing separate sets of wafers within a chamber. Each set is subjected to plasma-enhanced deposition of material within the chamber utilizing a plasma that is primarily inductively coupled. After the plasma-enhanced deposition, and while the set remains within the chamber, the plasma is changed to a primarily capacitively coupled plasma. The cycling of the plasma from primarily inductively coupled to primarily capacitively coupled can increase the ratio of processed wafers to plasma reaction chamber internal sidewall cleanings that can be obtained while maintaining low particle counts on the processed wafers.

Abstract: A method for forming a diffusion coating on the interior of surface of a hollow object wherein a filament, extending through a hollow object and adjacent to the interior surface of the object, is provided, with a coating material, in a vacuum. An electrical current is then applied to the filament to resistively heat the filament to a temperature sufficient to transfer the coating material from the filament to the interior surface of the object. The filament is electrically isolated from the object while the filament is being resistively heated. Preferably, the filament is provided as a tungsten filament or molybdenum filament. Preferably, the coating materials are selected from the group consisting of Ag, Al, As, Au, Ba, Be, Bi, Ca, Cd, Co, Cr, Cu, Dy, Er, Eu, Fe, Ga, Ge, Hg, In, K, Li, Mg, Mn, Na, Ni P, Pb, Pd, Pr, S, Sb, Sc, Se, Si, Sn, Sr, Te, Tl, Y, Yb, Zn, and combinations thereof.

Abstract: Method and apparatus for improving the reproducibility of chucking forces of an electrostatic chuck used in plasma enhanced CVD processing of substrates provides for precoating of the electrostatic chuck with a dielectric layer, such as SiO2, after every chamber cleaning process. The uniform and tightly bonded dielectric layer deposited on the electrostatic chuck eliminates the need for a cover wafer over the chuck surface during the chamber cleaning and provides for more reliable gripping of wafers.

Abstract: A gas barrier synthetic resin container 10 has an opening portion 12 defined by a flange 12A, a body portion 14 having the opening portion 12, and a bottom portion 16 for closing the end of the body portion 14. The container 10 is a wide mouth container having the minimum inside diameter Dmin of the opening portion 12 larger than the maximum inside diameter Dmax of the body portion. Alternatively, the container 10 may be a wide mouth container having the minimum inside diameter Dmin of the opening portion 12 smaller than the maximum inside diameter Dmax of the body portion, the difference between the diameters being equal to or less than 20 mm. A diamond-like carbon film 18 is formed on an outer wall of the body portion 14 and bottom portion 16 of the container 10. After the container 10 has been filled with contents, a metal cover 20 and the flange 12A are double-seamed onto the container to provide improved gas barrier properties to the entire container.

Abstract: A method for surface treatment of at least one electrically conducting substrate or a substrate that has been coated so as to be conducting (1) by means of a gas placed in the region of an electric discharge (2). The discharge region is restricted by at least two essentially opposite sides of the substrate surface to be treated (7). This process is especially suitable for treating band-shaped and continuously supplied substrates.

Abstract: A method of manufacturing an optical fiber and related devices using an apparatus having an elongated microwave guide coupled to a resonant cavity formed of an outer cylindrical wall and inner cylindrical wall having a slit with a width W and configured to deliver microwave energy having a vacuum wavelength ? to a resonant cavity thereof to satisfy the relationship: W??/10 where a substrate tube is located within the resonant cavity and plasma chemical vapor deposition deposits layers of doped silica thereon followed by thermal collapsing the substrate and drawing an optical fiber therefrom.

Abstract: A method and system of applying a corrosion inhibitor to the interior component parts of a turbine to provide corrosion protection to the components is disclosed. A blower connected to the turbine introduces air into the turbine's interior. A fog of corrosion inhibitor is added to the air and introduced into the turbine through at least one inlet vent in the turbine for introducing the air from the blower into the turbine's interior, and introducing the corrosion inhibitor into the inlet vent while the blower is operating so that the corrosion inhibitor is caused to be drawn into and through the interior of the turbine to coat the interior component parts of the turbine. The step of introducing the corrosion inhibitor into the inlet vent is performed until the corrosion inhibitor appears at the outlet vent at the opposite end of the turbine from where the inlet vent is located or until the corrosion inhibitor coats all exposed surfaces of the components inside turbine.

Abstract: The method of manufacturing a superconducting quantum interference type magnetic fluxmeter including forming an input coil and a pickup coil integrated with the input coil by electrophoretically depositing high-temperature superconducting fine particles on a surface of the first cylindrical ceramic substrate, and sintering the fine particles, forming a high-temperature superconductor magnetic shield tube by electrophoretically depositing high-temperature superconducting fine particles on an entire surface of the second cylindrical ceramic substrate, and sintering the fine particles, magnetically coupling the input coil and the high-temperature superconducting quantum interference type element by placing the pickup coil such that a distal end portion thereof is inserted within a lower end portion of the magnetic shield tube and inserting the high-temperature superconducting quantum interference type element from an upper end portion of the magnetic shield tube.

Abstract: The invention provides a container such as a bottle or flask, made heterogeneously from a material with a barrier effect and a polymer material, characterized in that the material with a barrier effect is an amorphous carbon material with a polymer tendency which is applied as a coating on a substrate of polymer material.

Abstract: Boride thin films of conducting and superconducting materials are formed on silicon by a process which combines physical vapor deposition with chemical vapor deposition. Embodiments include forming boride films, such as magnesium diboride, on silicon substrates by physically generating magnesium vapor in a deposition chamber and introducing a boron containing precursor into the chamber which combines with the magnesium vapor to form a thin boride film on the silicon substrates.

Abstract: Integrated circuits are built layer by layer on a substrate. One technique for forming layers is chemical vapor deposition (CVD.). This technique injects gases through a gas-dispersion fixture into a chamber. The gases react and blanket a substrate in the chamber with a material layer. One way to promote uniform layer thickness is to coat the gas-dispersion fixture with a uniform layer of the material before using it for deposition on the substrate. However, known fixture-coating techniques yield uneven or poorly adherent coatings. Accordingly, the inventor devised new methods for coating these fixtures. One exemplary method heats a fixture to a temperature greater than its temperature during normal deposition and then passes one or more gases through the fixture to form a coating on it. The greater conditioning temperature improves evenness and adhesion of the fixture coating, which, in turn, produces higher quality layers in integrated circuits.

Abstract: Protective layers are formed on a surface of an atomic layer deposition (ALD) or chemical vapor deposition (CVD) reactor. Parts defining a reaction space for an ALD or CVD reactor can be treated, in situ or ex situ, with chemicals that deactivate reactive sites on the reaction space surface(s). A pre-treatment step can maximize the available reactive sites prior to the treatment step. With reactive sites deactivated by adsorbed treatment reactant, during subsequent processing the reactant gases have reduced reactivity or deposition upon these treated surfaces. Accordingly, purge steps can be greatly shortened and a greater number of runs can be conducted between cleaning steps to remove built-up deposition on the reactor walls.

Abstract: A protective coating and a method for applying the protective coating to a wall of a freezer enclosure includes applying a screen to the wall wherein the screen includes a plurality of intersecting elements forming a plurality of openings. One or more coatings of a polymer are then applied to the screen in a sufficient quantity to coat the screen and permeate the plurality of openings through to the wall. The polymer is then allowed to solidify or cure thereby creating a temperature, abrasion and chemical resistant protective coating on or within the freezer enclosure.

Abstract: An organic compound having an affinity for a resin of a molded resin article and sublimation properties is allowed to penetrate/disperse into the surface of the molded resin article, thereby modifying and/or coloring a resin surface layer. The molded resin article and the organic compound having the affinity for the resin and the sublimation properties are put into a tightly closable container, and the pressure and the temperature in the container are adjusted to place them in a saturated sublimation pressure state of the organic compound, whereby a vapor of the organic compound is uniformly deposited on the surface of the molded resin article and it further penetrates/disperses into the resin surface layer, and in consequence, the resin surface layer can be modified and/or colored. In addition, the modification of the resin surface layer permits imparting a function thereto.

Abstract: A method for forming a diffusion coating on the interior surface of a hollow object wherein a filament extending through a hollow object and adjacent to the interior surface of the object is provided with a coating material in a vacuum. An electrical current is the applied to the filament, to resistively heat the filament to a temperature sufficient to transfer the coating material from the filament to the interior surface of the object. Preferably, the filament is provided as a tungsten filament or molybdenum filament. Preferably, the coating materials are selected from the group consisting of Ag, Al, As, Au, Ba. Be, Bi, Ca, Cd, Co, Cr, Cu, Dy, Er, Eu, Fe, Ga, Ge, Hg, In, K, Li, Mg, Mn, Na, Ni, P, Pb, Pd, Pr, S, Sb, Sc, Se, Si, Sn, Sr, Te, Tl, Y, Yb, Zn, and combinations thereof.

Abstract: A method is disclosed for substantially uniformly coating an interior surface of a ferromagnetic tubular structure such as a ferromagnetic tube having a high aspect ratio. The method entails inducing a magnetic field of a given magnitude within the tubular structure. Further, a bias is applied at a given voltage to the tubular structure. Then, the interior surface of the tubular structure is exposed to a gaseous precursor material under conditions effective to convert a quantity of the gaseous precursor material to ionize gaseous precursor material. The given magnitude and voltage is such that it is effective to deposit the ionized the gaseous precursor material onto the interior surface and converts the ionized gaseous precursor material to a substantially uniform protective coating in the interior surface.

Abstract: The apparatus for plasma treatment of a non-conductive hollow substrate (1), comprises a plurality of ionisation energy sources (7-10) disposed adjacent to each other all along the part of the substrate to be treated. The apparatus further comprises a processing means (11) for sequentially powering the plurality of ionisation energy sources from a radio frequency power source (6). Each ionisation energy source (7) is comprised of two parts (7a, 7b) sandwiching the substrate. The ionisation energy sources can be capacitively or inductively coupled plasma sources.

Abstract: A method of manufacturing a molded container coated with a carbon coating, desirably blow molded or extrusion molded, said container having barrier properties and including an upper wall portion having an opening, an intermediate sidewall portion positioned beneath the upper wall portion, and a base portion positioned beneath the intermediate sidewall portion to support the container. The container includes a molded first layer having an inner surface and an outer surface formed from high density polyethylene, and a carbon coating is formed on the inner surface of the first layer and adhered thereto and substantially coextensive with the first layer, wherein said carbon coating has a thickness of less than about 10 microns.

Abstract: The present invention describes a method and an apparatus for plasma coating the inside surface of a container to provide an effective barrier against gas transmission. The method provides a way to deposit rapidly and uniformly very thin and nearly defect-free layers of polyorganosiloxane and silicon oxide on the inner surface of a container to achieve more than an order of magnitude increase in barrier properties.

Abstract: A method for applying an aluminide coating on a gas turbine engine blade having an external surface and an internal cooling cavity having an internal surface that is connected to the external surface by cooling holes. The method is conducted in a vapor coating container having a hollow interior coating chamber, and includes the steps of loading the coating chamber with the blade to be coated; providing an aluminide coating gas in the loaded coating chamber; maintaining the loaded coating chamber comprising the aluminide coating gas at a specified temperature and time to deposit an aluminide coating on the external surface of the blade; and then flowing an inert carrier gas into the loaded coating chamber comprising the aluminide coating gas at a specified gas flow rate and time to move the aluminide coating gas through the cooling holes and internal cooling cavity and deposit an aluminide coating on the internal surface of the blade.

Abstract: Methods for coating the interior surface of tubular structures having high aspect ratios and tubular structures produced by such methods. The interior surface of the tubular structure is coated by inducing a magnetic field having a given magnitude around a circumference along a length of the tubular structure, applying a bias at a given voltage to the tubular structure, and exposing the interior surface to a precursor material to deposit the precursor material onto the interior surface of the tubular structure.

Abstract: In general, in one aspect, the invention features a method that includes exposing a surface to a first gas composition under conditions sufficient to deposit a layer of a first chalcogenide glass on the surface, and exposing the layer of the first chalcogenide glass to a second gas composition under conditions sufficient to deposit a layer of a second glass on the layer of the first chalcogenide glass, wherein the second glass is different from the first chalcogenide glass.

Abstract: Integrated circuits are generally built layer by layer on a substrate. One technique for forming layers is chemical vapor deposition (CVD.) This technique injects gases through a gas-dispersion fixture, such as a showerhead, into a chamber. The gases react and blanket a substrate in the chamber with a layer of material. One method of promoting uniform layer thickness is to coat the gas-dispersion fixture with a uniform layer of the material before using the fixture for deposition on the substrate. However, conventional fixture-coating techniques yield uneven or poorly adherent coatings. Accordingly, the inventor devised new methods for coating these fixtures. One exemplary method heats a fixture to a temperature greater than its temperature during normal deposition and then passes one or more gases through the fixture to form a coating on it. The greater conditioning temperature improves evenness and adhesion of the fixture coating, which, in turn, produces higher quality layers in integrated circuits.

Abstract: A method and system of applying a corrosion inhibitor to the interior component parts of a turbine to provide corrosion protection to the components is disclosed. A blower connected to the turbine introduces air into the turbine's interior. A fog of corrosion inhibitor is added to the air and introduced into the turbine through at least one inlet vent in the turbine for introducing the air from the blower into the turbine's interior, and introducing the corrosion inhibitor into the inlet vent while the blower is operating so that the corrosion inhibitor is caused to be drawn into and through the interior of the turbine to coat the interior component parts of the turbine.

Abstract: Method for localized aluminide coating applied for the first time or as repair includes creating a contained space by disposing coating material comprising an aluminum source and a halide activator at least partially over and in an out-of-contact relation with a target surface of a metal substrate. Heating the substrate to a temperature to cause the aluminum source to react with the halide activator and the substrate results in diffusion aluminide coating of the targeted surface. An article comprising a target surface of a metal substrate, said surface bounding a contained space, and a coating tape comprising an aluminum source and a halide activator and disposed in an out-of-contact relation at least partially over the contained space whereby, when the substrate is heated to a temperature to cause the halide activator to react with the aluminum source, a diffusion aluminide coating is formed on the target surface.

Abstract: A method for protecting a SiO2 coating on defining surfaces of a combustion chamber and a combustion device containing the protection. Accordingly, an additive is introduced into the combustion chamber, which increases the SiO content of the exhaust gas, arising from a combustion process. The SiO content helps protect walls of the combustion chamber formed with the SiO2 coating.

Abstract: A heat-resistant resin film having a metallic thin film accumulated thereon or an endless belt having a metallic thin film accumulated thereon having good mechanical characteristics is produced in a simple process. A metallic thin film is formed on an inner surface of a cylindrical substrate, and a layer of a heat-resistant resin is formed thereon. An accumulated body of the heat-resistant resin and the metallic thin film is peeled off from the substrate. The metallic thin film may be formed by electroplating, electroless plating or vapor deposition, or may also be formed by attaching a metallic foil having been prepared on an inner surface of the substrate. The heat-resistant resin layer is formed by injecting a polyamide acid solution in a rotational drum, and then formed by centrifugal forming by rotating the rotational drum on rollers under heating. After forming, imidization is conducted by heating and baking to form a film member of a thermosetting polyimide.

Abstract: A thin film deposition method using plasma enhanced chemical vapor deposition is described. In a plasma enhanced chemical vapor deposition chamber, plasma is used to enhance the chemical reaction to form a thin film on a substrate. The substrate is then removed, followed by passing a cleaning gas into the chamber to remove residues in the chamber. Before loading another batch of substrate in the chamber, a pre-deposition process is performed to isolate contaminants generated from the cleaning process. A discharge plasma treatment is then conducted to lower the amount of accumulated electrical charges.

Abstract: A process for internally coating gas turbine blades or vanes with protective diffusion layers by way of a CVD process in a coating space at elevated temperature uses a process gas, a halide as activator, and a metallic material as donor for generating coating gas in the coating space. At a coating temperature, the pressure in the coating space is reduced by gas being sucked out. This is followed by refilling, at increasing pressure, with halide gas in order to immediately reform coating gas with the donor material.

Abstract: The apparatus for plasma treatment of a non-conductive hollow substrate (5), comprises a plasma chamber (12) provided with two oppositely facing field admission windows (8, 9), and first and second opposite coil arrangements (20, 30) located on an outer surface (8a; 9a) of the first and second windows respectively. The first and second coil arrangements being connected to power supply means (4) such that a current (I) of a same direction flows simultaneously in the first and second coil arrangements. The two coil arrangements (20, 30) induce through the substrate a magnetic flux (7) transversal and perpendicular to a substrate depth (L) for generating an electrical field in the substrate plan.

Abstract: An article such as a hollow gas turbine blade has an internal cavity therein with an inlet and outlet. The outlet has an outlet minimum transverse dimension of from about 0.009 inch to about 0.012 inch. An aluminiding source powder has a minimum particle size of greater than about 0.0015 inch and not greater than about 0.005 inch. The aluminiding source powder is a mixture of from about 5 to about 15 percent by weight of a metallic aluminum-containing powder and from about 85 to about 95 percent by weight of a ceramic powder. The aluminiding source powder is flowed into the internal cavity through the inlet, and the article is heated with the aluminiding source powder in the internal cavity to a temperature of from about 1750° F. to about 2000° F., and for a time of from about 2 hours to about 12 hours, to deposit an aluminum-containing coating on the internal surface of the internal cavity. The aluminiding source powder is thereafter removed from the internal cavity through the inlet.

Abstract: A method is provided for making a blow molded multi-layer container having an upper wall portion, including an opening; an intermediate sidewall portion positioned beneath the upper wall portion; and a base portion positioned beneath the intermediate sidewall portion. The container includes (i) a molded inner layer formed from a plastic material, the inner layer having a vertical length and a carbon-treated inner surface; and (ii) a molded outer layer formed from recycled plastic that is substantially coextensive with the inner layer. The recycled outer layer comprises at least 40% by weight of the overall weight of the container, but can comprise more than 90% by weight. In a preferred embodiment, the thickness of the inner and/or outer layers is controllably adjusted along their respective vertical lengths. If functionally desirable, the inner layer and/or outer layer may also include additional barrier materials and/or oxygen scavenging/reacting materials.

Abstract: A polymer vapor deposition process is used to form a flexible thin-walled endoluminal graft membrane. The endoluminal graft membrane is easily radially compressed in an organized manner in combination with a stent. The endoluminal graft membrane is formed with a plurality of semi-collapsed legs and each semi-collapsed leg includes a plurality of preformed folds.

Abstract: In a substrate processing apparatus, a substrate processing chamber has a substrate support to support a substrate, a gas delivery system to provide an energized cleaning gas to the chamber to clean process residues formed on surfaces in the chamber during processing of the substrate, and an exhaust to exhaust the cleaning gas. A detector monitors a chemiluminescent radiation emitted from about a surface during cleaning of the process residues by the energized cleaning gas and generates a signal in relation to the monitored chemiluminescent radiation. A controller receives the signal and evaluates the signal to determine an endpoint of the cleaning process.

Abstract: A manufacturing system capable of enhancing reliability and luminance of a light emitting element is provided which uses an EL material of very high purity in evaporation. The system is also capable of using an EL material efficiently. Instead of a glass jar, a container (first container 11a) to be set in an evaporation apparatus is employed and a material maker (18) stores an EL material (12), or refines it by sublimation and stores, directly in the container. The container is then transferred to a light emitting device maker (19) for evaporation. With a manufacturing system as such, impurities are prevented from contaminating a highly pure EL material. This system also eliminates the trouble of transferring an EL material from a glass jar to a container. The container may be recovered by the material maker and the EL material remaining in the container may be collected for reuse by the manufacturing system.