Organic Coating Applied By Vapor, Gas, Or Smoke Patents (Class 427/255.6)
  • Patent number: 10695794
    Abstract: Methods and apparatus for vapor deposition of an organic film are configured to vaporize an organic reactant at a first temperature, transport the vapor to a reaction chamber housing a substrate, and maintain the substrate at a lower temperature than the vaporization temperature. Alternating contact of the substrate with the organic reactant and a second reactant in a sequential deposition sequence can result in bottom-up filling of voids and trenches with organic film in a manner otherwise difficult to achieve.
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: June 30, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Viljami J. Pore, Marko Tuominen, Hannu Huotari
  • Patent number: 10553432
    Abstract: An etch process that includes removing an oxide containing surface layer from a semiconductor surface to be etched by applying a hydrofluoric (HF) based chemistry, wherein the hydrofluoric (HF) based chemistry terminates the semiconductor surface to be etched with silicon-hydrogen bonds, and applying a vapor priming agent bearing chemical functionality based on the group consisting of alkynes, alcohols and a combination thereof to convert the silane terminated surface to a hydrophobic organic surface. The method continues with forming a photoresist layer on the hydrophobic organic surface; and patterning the photoresist layer. Thereafter, the patterned portions of the photoresist are developed to provide an etch mask. The portions of the semiconductor surface exposed by the etch mask are then etched.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: February 4, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Martin Glodde, Dario L. Goldfarb
  • Patent number: 10343186
    Abstract: Methods and apparatus for vapor deposition of an organic film are configured to vaporize an organic reactant at a first temperature, transport the vapor to a reaction chamber housing a substrate, and maintain the substrate at a lower temperature than the vaporization temperature. Alternating contact of the substrate with the organic reactant and a second reactant in a sequential deposition sequence can result in bottom-up filling of voids and trenches with organic film in a manner otherwise difficult to achieve. Deposition reactors conducive to depositing organic films are provided.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: July 9, 2019
    Assignee: ASM IP HOLDING B.V.
    Inventors: Viljami J. Pore, Marko Tuominen, Hannu Huotari
  • Patent number: 10315177
    Abstract: Embodiments of the present disclosure provide for substrates having an oxide shell layer (e.g., a silica shell layer), methods of making an oxide shell layer, and the like.
    Type: Grant
    Filed: October 8, 2015
    Date of Patent: June 11, 2019
    Assignee: KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Pierre M. Beaujuge, Yangqin Gao
  • Patent number: 10312087
    Abstract: An etch process that includes removing an oxide containing surface layer from a semiconductor surface to be etched by applying a hydrofluoric (HF) based chemistry, wherein the hydrofluoric (HF) based chemistry terminates the semiconductor surface to be etched with silicon-hydrogen bonds, and applying a vapor priming agent bearing chemical functionality based on the group consisting of alkynes, alcohols and a combination thereof to convert the silane terminated surface to a hydrophobic organic surface. The method continues with forming a photoresist layer on the hydrophobic organic surface; and patterning the photoresist layer. Thereafter, the patterned portions of the photoresist are developed to provide an etch mask. The portions of the semiconductor surface exposed by the etch mask are then etched.
    Type: Grant
    Filed: November 6, 2017
    Date of Patent: June 4, 2019
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Martin Glodde, Dario L. Goldfarb
  • Patent number: 9840638
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: December 12, 2017
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J. Dressick, Melik C. Demirel
  • Patent number: 9701865
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: July 11, 2017
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J. Dressick, Melik C. Demirel
  • Patent number: 9591771
    Abstract: A printed wiring board includes resin insulation layers, conductive layers formed on the resin insulation layers respectively such that each of the conductive layers is formed on a surface of each of the resin insulation layers, and via conductors penetrating through the resin insulation layers respectively such that the via conductors are connecting the conductive layers through the resin insulation layers. The conductive layers and the via conductors are formed such that each of the conductive layers and each of the via conductors includes an electroless copper-plated film, an intermediate compound layer having Cu3N+Cu(NH)x and formed on the electroless copper-plated film, and an electrolytic copper-plated film formed on the intermediate compound layer.
    Type: Grant
    Filed: December 9, 2014
    Date of Patent: March 7, 2017
    Assignee: IBIDEN Co., Ltd.
    Inventors: Hiroyuki Nishioka, Shinsuke Ishikawa
  • Patent number: 9578756
    Abstract: A printed wiring board includes resin insulation layers, conductive layers formed on the resin insulation layers respectively such that each of the conductive layers is formed on a surface of each of the resin insulation layers, and via conductors penetrating through the resin insulation layers respectively such that the via conductors are connecting the conductive layers through the resin insulation layers. Each of the resin insulation layers includes a modified resin layer formed by plasma treatment such that the modified resin layer is forming the surface of each of the resin insulation layers, each of the conducive layers includes a modified conductive layer formed by the plasma treatment such that the modified conductive layer is forming the surface of each of the conductive layers, and the modified resin layer has a surface modification different from a surface modification of the modified conductive layer.
    Type: Grant
    Filed: December 9, 2014
    Date of Patent: February 21, 2017
    Assignee: IBIDEN Co., Ltd.
    Inventors: Hiroyuki Nishioka, Shinsuke Ishikawa
  • Patent number: 9519366
    Abstract: A touch sensor includes a transparent substrate, and an electrode pattern formed on the transparent substrate. The electrode pattern is formed by stacking at least two or more electrode layers, thereby enhancing the anti-corrosion and visibility of electrode patterns and ensuring the adhesive reliability of the transparent substrate and the electrode patterns.
    Type: Grant
    Filed: May 8, 2014
    Date of Patent: December 13, 2016
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Jang Ho Park, Woon Chun Kim, Jin Uk Lee, Nam Keun Oh
  • Patent number: 9469778
    Abstract: Coating porous material, such as PDMS, with parylene N, C, D, and AF-4 by vapor deposition polymerization is described in which a temperature of the porous material's surface being coated is heated to between 60° C. and 120° C., or 80° C. and 85° C., during deposition. The parylene forms nano roots within the porous material that connect with a conformal surface coating of parylene. In some embodiments, a watertight separation chamber in an integrated microfluidic liquid chromatography device is fabricated by heating tunnels in micro-fabricated PDMS and depositing parylene within the heated tunnels.
    Type: Grant
    Filed: October 8, 2014
    Date of Patent: October 18, 2016
    Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGY
    Inventors: Yu-Chong Tai, Dongyang Kang
  • Patent number: 9349584
    Abstract: A method for depositing a film is provided. In the method, an object to be processed is accommodated in a process chamber, and an insulating film made of a polymer thin film is deposited on a surface of the object to be processed by supplying a first source gas composed of an acid anhydride and a second source gas composed of a diamine into the process chamber that is evacuated. Next, the insulating film is modified so as to have a barrier function by stopping the supply of the second source gas into the process chamber and continuously supplying the first source gas into the process chamber.
    Type: Grant
    Filed: April 22, 2013
    Date of Patent: May 24, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kippei Sugita, Hiroyuki Hashimoto, Muneo Harada
  • Patent number: 9343296
    Abstract: Disclosed herein are methods of forming SiC/SiCN film layers on surfaces of semiconductor substrates. The methods may include introducing a silicon-containing film-precursor and an organometallic ligand transfer reagent into a processing chamber, adsorbing the silicon-containing film-precursor, the organometallic ligand transfer reagent, or both onto a surface of a semiconductor substrate under conditions whereby either or both form an adsorption-limited layer, and reacting the silicon-containing film-precursor with the organometallic ligand transfer reagent, after either or both have formed the adsorption-limited layer. The reaction results in the forming of the film layer. In some embodiments, a byproduct is also formed which contains substantially all of the metal of the organometallic ligand transfer reagent, and the methods may further include removing the byproduct from the processing chamber. Also disclosed herein are semiconductor processing apparatuses for forming SiC/SiCN film layers.
    Type: Grant
    Filed: February 25, 2015
    Date of Patent: May 17, 2016
    Assignee: Novellus Systems, Inc.
    Inventor: Adrien LaVoie
  • Patent number: 9324731
    Abstract: A method for fabricating a memory device is provided: A multi-layer stack is formed on a substrate. The multi-layer stack is then patterned to form plural trenches extending along a first direction to define plural ridge-shaped stacks each of which comprises at least one conductive strip. Next, a memory layer and a channel layer are formed in sequence on bottoms and sidewalls of the trenches. A sacrifice layer is formed to fulfill the trenches. Subsequently, portions of the sacrifice layer, the memory layer and the channel layer formed in the trenches are removed to form plural openings exposing a portion of the substrate therefrom. After removing the remaining sacrifice layer, portions of the memory layer and the channel layer formed on the ridge-shaped stacks are patterned to form an interconnection between two adjacent trenches through two of the openings formed in the two adjacent trenches.
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: April 26, 2016
    Assignee: MACRONIX INTERNATIONAL CO., LTD.
    Inventor: Erh-Kun Lai
  • Patent number: 9186631
    Abstract: The present disclosure provides a porous material having a surface that is concurrently both superhydrophilic (having a first apparent advancing dynamic contact angle of less than or equal to about 5° for water) and oleophobic (having a second apparent advancing dynamic contact angle of greater than or equal to about 90°) or superoleophobic (a second apparent advancing dynamic contact angle of greater than or equal to about 150° for oil). Such materials can be used in a separator device to separate a liquid-liquid mixture of immiscible components (e.g., oil and water) or miscible components (e.g., alcohols). Separation apparatus incorporating such materials and methods of making and using these materials are also provided.
    Type: Grant
    Filed: June 14, 2011
    Date of Patent: November 17, 2015
    Assignees: The Regents Of The University Of Michigan, The United States of America, as represented by the Secretary of the Air Force
    Inventors: Anish Tuteja, Arun Kumar Kota, Gibum Kwon, Joseph M. Mabry
  • Patent number: 9040121
    Abstract: Vacuum deposited thin films of material are described to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.
    Type: Grant
    Filed: February 7, 2013
    Date of Patent: May 26, 2015
    Assignee: Board of Regents The University of Texas System
    Inventors: C. Grant Willson, William Durand, Christopher John Ellison, Christopher Bates, Takehiro Seshimo, Julia Cushen, Logan Santos, Leon Dean, Erica Rausch
  • Publication number: 20150140660
    Abstract: The present invention provides a process of coating at least a portion of a substrate surface comprising contacting the surface with hydrogen cyanide monomeric units under conditions permitting polymerisation of the hydrogen cyanide monomeric units to form a polymer that coats the surface. Also provided is a substrate coated by a polymer according to the claimed process. Also provided is a method of forming a hydrocyanic acid-based hydrogel, the method comprising co-polymerisation in a solution, the solution comprising hydrogen cyanide monomer units and co-monomers.
    Type: Application
    Filed: May 17, 2013
    Publication date: May 21, 2015
    Inventors: Helmut Thissen, Richard Evans, Aylin Koegler
  • Publication number: 20150140214
    Abstract: A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle.
    Type: Application
    Filed: December 12, 2014
    Publication date: May 21, 2015
    Applicant: THE REGENTS OF THE UNIVERSITY OF MICHIGAN
    Inventors: Stephen R. Forrest, Gregory McGraw
  • Publication number: 20150132504
    Abstract: This invention is about a method for fabricating carbon molecular sieve membrane. The above method comprises a step of deposition, and a step of carbonization to obtain a high performance and high selectivity carbon molecular sieve membrane. According to this invention, an ultra-thin and defects free carbon molecular sieve membrane can be obtained. More preferably, the method for fabricating carbon molecular sieve membrane of this invention is easy operating, economic, and environmental friendly.
    Type: Application
    Filed: November 13, 2013
    Publication date: May 14, 2015
    Applicant: CHUNG-YUAN CHRISTIAN UNIVERSITY
    Inventors: Jung-Tsai Chen, Chien-Chieh Hu, Kueir-Rarn Lee, Juin-Yih Lai
  • Patent number: 9029471
    Abstract: Various fluoropolymers have been proposed for imparting oil and water repellency to leather. Commonly, these fluoropolymers are amphiphilic; i.e., they are made from at least one monomer which is hydrophobic and at least one monomer which is hydrophilic. The present invention identifies and remedies disadvantages associated with the ability of amphiphilic fluoropolymers to impart oil and water repellency to leather. Contrary to conventional thinking, it has now been discovered that the incorporation of hydrophilic groups in a fluoropolymer undesirably reduces its ability to impart water resistance to leather. Correspondingly, it has also been discovered that a fluoropolymer incorporating fewer or no hydrophilic groups imparts superior oil and water repellency to leather when compared to fluoropolymers incorporating more hydrophilic groups. Therefore, this invention provides fluoropolymers which incorporate reduced levels of hydrophilic groups.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: May 12, 2015
    Assignee: E I du Pont du Nemours and Company
    Inventors: Romain Severac, Agnes Ibos, Lamia Heuze, Renaud Laloux-Walther
  • Patent number: 9029189
    Abstract: Bicyclic guanidine compounds are described. Metal bicyclic guanidinate and its use in vapor deposition processes to deposit a metal-containing thin film are also described. Methods of making alkaline earth metal N,N?dialkylacetamidinates or bicyclic guanidinates including dissolution of alkaline earth metal into liquid ammonia followed by addition of a solution of an amidine or guanidine ligand in the free base from are provided.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: May 12, 2015
    Assignee: President and Fellows of Harvard College
    Inventors: Roy Gerald Gordon, Leonard Neil Jacques Rodriguez
  • Publication number: 20150123012
    Abstract: A sample plate in use with a MALDI-TOF (matrix-assisted laser desorption ionization time-of-flight) mass spectrometer. The sample plate is usable for the mass spectrometry of a polymeric material on the order of several hundreds of Da and a method of manufacturing the same sample plate. The sample plate including a target plate, an organic matrix formed on one surface of the target plate, and a Parylene thin film formed on the target plate on which the organic matrix is formed, the Parylene thin film entirely covering the organic matrix.
    Type: Application
    Filed: November 6, 2014
    Publication date: May 7, 2015
    Inventors: Jaechul Pyun, Jo ll Kim
  • Publication number: 20150118504
    Abstract: A surface-treating composition including a fluorine-containing polymer which is able to form a layer having both high surface slip property and high friction durability. The surface-treating composition includes a first compound (a reactive fluorine-containing polymer which is a fluorine-containing silane polymer) and a second compound (a non-reactive fluorine-containing polymer which is a fluorine-containing oil), and the proportion of the first compound is 15 to 70% by mass with respect to the total mass of the first compound and the second compound.
    Type: Application
    Filed: March 4, 2013
    Publication date: April 30, 2015
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinsuke Ohshita, Tomohiro Yoshida, Kaori Ozawa, Akinari Sugiyama
  • Publication number: 20150111023
    Abstract: Coating porous material, such as PDMS, with parylene N, C, D, and AF-4 by vapor deposition polymerization is described in which a temperature of the porous material's surface being coated is heated to between 60° C. and 120° C., or 80° C. and 85° C., during deposition. The parylene forms nano roots within the porous material that connect with a conformal surface coating of parylene. In some embodiments, a watertight separation chamber in an integrated microfluidic liquid chromatography device is fabricated by heating tunnels in micro-fabricated PDMS and depositing parylene within the heated tunnels.
    Type: Application
    Filed: October 8, 2014
    Publication date: April 23, 2015
    Applicant: California Institute of Technology
    Inventors: Yu-Chong Tai, Dongyang Kang
  • Publication number: 20150104586
    Abstract: A method for making a single molecule receptor in a nanopore structure includes depositing a material by a physical vapor deposition (PVD) technique onto a selected interior surface of a nanochannel and functionalizing a surface of the material with a chemical compound having at least two functional groups. The material forms a patch having a diameter of about 3 to about 10,000 nanometers (nm). Also disclosed are embodiments of a nanopore structure including a single molecule receptor.
    Type: Application
    Filed: November 4, 2013
    Publication date: April 16, 2015
    Applicant: International Business Machines Corporation
    Inventors: Julia Baldauf, Stefan Harrer, Christine Schieber
  • Patent number: 8999443
    Abstract: A method for fabricating a microarray of plural soft materials includes: vapor-depositing a first layer poly(para-xylylene) resin on a substrate, forming a first micro pattern in the poly(para-xylylene) resin; obtaining a substrate including a first microarray formed by pouring a first soft material solution, freeze-drying the first soft material to obtain a micro-arrayed substrate of the freeze-dried first soft material; vapor-depositing a second layer poly(para-xylylene) resin on the micro-arrayed substrate of the freeze-dried first soft material, forming a second micro pattern placed differently from the first micro pattern by penetrating the poly(para-xylylene) resin of the first and second layers, forming a second microarray on the substrate by pouring a second soft material solution; and forming a microarray of the first and second soft materials on the substrate by peeling off the poly(para-xylylene) resin of the first and second layers.
    Type: Grant
    Filed: March 27, 2012
    Date of Patent: April 7, 2015
    Assignees: NTT DOCOMO, INC., The University of Tokyo
    Inventors: Satoshi Hiyama, Kaori Kuribayashi, Hiroaki Onoe, Shoji Takeuchi
  • Patent number: 8986780
    Abstract: The disclosure relates to a method for depositing an organic film layer on a substrate. In one implementation a method to deposit organic film by generating vaporized organic particles; streaming a carrier fluid proximal to a source to carry the vaporized organic particles and solid organic particles from the source towards the substrate; transporting the vaporized and solid organic particles through a discharge nozzle with a plurality of micro-pore openings, placed between the source and the substrate, that permits the passage of at least a portion of the vaporized or solid organic particles through the micro-pores; depositing the vaporized organic particles and the solid organic particles that are transported through the discharge nozzle onto the substrate.
    Type: Grant
    Filed: April 15, 2011
    Date of Patent: March 24, 2015
    Assignee: Massachusetts Institute of Technology
    Inventors: Vladimir Bulovic, Marc A. Baldo, Martin A. Schmidt, Valerie Gassend, Jianglong Chen
  • Patent number: 8969234
    Abstract: A method of preparing a fuel cell electrode catalyst by preparing a platinum-carbon core-shell composite, which has a platinum nanoparticle core and a graphene carbon shell, using a simultaneous evaporation process, a method for preparing a fuel cell electrode comprising the catalyst prepared thereby, and a fuel cell comprising the same. A fuel cell comprising an electrode catalyst consisting of the core-shell composite prepared by simultaneously evaporating the platinum precursor and the organic precursor can have high performance and high durability, because the platinum particles are not agglomerated or detached and corroded even under severe conditions, including high-temperature, long use term, acidic and alkaline conditions.
    Type: Grant
    Filed: June 7, 2013
    Date of Patent: March 3, 2015
    Assignee: Korea Institute of Energy Research
    Inventors: Hee-Yeon Kim, Seok-yong Hong
  • Patent number: 8945684
    Abstract: The invention relates to a process for depositing an anti-fouling top coat onto the outermost coating layer of a coated optical article, comprising the following steps: a) providing an optical article having two main faces, at least one of which being coated with an outermost layer; b) treating said outermost layer with energetic species resulting in surface physical attack and/or chemical modification; and c) vacuum evaporating a liquid coating material for an anti-fouling top coat by means of an evaporation device, resulting in the deposition of the evaporated coating material onto the treated outermost layer of the optical article, wherein prior to the vacuum evaporation step of the liquid coating material, said liquid coating material has been treated with energetic species.
    Type: Grant
    Filed: November 4, 2005
    Date of Patent: February 3, 2015
    Assignee: Essilor International (Compagnie Generale d'Optique)
    Inventor: Gérald Fournand
  • Publication number: 20150017399
    Abstract: A method of photopatterning rewritable reactive groups onto surfaces using typically a plasmachemical deposition of functionalized materials, followed by molecular printing of inks. Subsequent treatment of the reactive groups allows for surface rewriting and also the method allows for the creation of either positive or negative image multifunctional rewritable patterned surfaces.
    Type: Application
    Filed: September 24, 2014
    Publication date: January 15, 2015
    Inventors: Jas Pal Singh BADYAL, Vincent ROUCOULES, Wayne Christopher Edward SCHOFIELD
  • Patent number: 8932933
    Abstract: A method of forming a hydrophobic surface on a semiconductor device structure. The method comprises forming at least one structure having at least one exposed surface comprising titanium atoms. The at least one exposed surface of at least one structure is contacted with at least one of an organo-phosphonic acid and an organo-phosphoric acid to form a material having a hydrophobic surface on the at least one exposed surface of the least one structure. A method of forming a semiconductor device structure and a semiconductor device structure are also described.
    Type: Grant
    Filed: May 4, 2012
    Date of Patent: January 13, 2015
    Assignee: Micron Technology, Inc.
    Inventors: Ian C. Laboriante, Prashant Raghu
  • Publication number: 20150004317
    Abstract: Disclosed are Si-containing thin film forming precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes for manufacturing semiconductors, photovoltaics, LCD-TFT, flat panel-type devices, refractory materials, or aeronautics.
    Type: Application
    Filed: July 19, 2013
    Publication date: January 1, 2015
    Inventors: Christian Dussarrat, Glenn Kuchenbeiser, Venkateswara R. Pallem
  • Publication number: 20140370306
    Abstract: Disclosed is an anti-bacterial and anti-fingerprint coating composition for forming a multi-functional coating layer having both anti-bacterial functions and anti-fingerprint functions on surfaces of touchscreens provided in portable terminals such as cellular phones, of panels or the like, provided in display devices such as liquid crystal displays (LCDs) or plasma display panels (PDPs), by a dry deposition method.
    Type: Application
    Filed: May 20, 2014
    Publication date: December 18, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Byung Ha PARK, Soo Jin PARK, Jun Sung CHUNG, In Oh HWANG
  • Publication number: 20140370192
    Abstract: Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I) and Formula (II), wherein R1, R3, R5, R7, R8 and R10 are independently and at each occurrence alkyl; R2, R6 and R9 are independently alkyl; R4 and R11 are independently and at each occurrence selected from the group consisting of alkyl, alkenyl, and alkynyl; x, z, a, c, d and f are independently zero, 1, or 2; y, b and e are independently zero or 1; and n and m are independently zero to 5.
    Type: Application
    Filed: January 18, 2013
    Publication date: December 18, 2014
    Inventors: Rajesh Odedra, Shaun Garratt, Mark Saly, Ravi Kanjolia
  • Patent number: 8911060
    Abstract: A printhead assembly comprising the printhead and filters intended for use with the printhead is passivated by passing a gaseous coating such as Parylene through the assembly. In this way dirt particles created during manufacture of the printhead are encapsulated and thus prevented from blocking the nozzles. The printhead assembly is also prevented from interacting physically or chemically with ink flowing through the printhead.
    Type: Grant
    Filed: May 30, 2006
    Date of Patent: December 16, 2014
    Assignee: Xaar Technology Limited
    Inventor: Paul R. Drury
  • Patent number: 8900663
    Abstract: Methods and systems for coating articles are described herein. The methods and systems described herein include, but are not limited to, steps for actively or passively controlling the temperature during the coating process, steps for providing intimate contact between the substrate and the support holding the substrate in order to maximize energy transfer, and/or steps for preparing gradient coatings. Methods for depositing high molecular weight polymeric coatings, end-capped polymer coatings, coatings covalently bonded to the substrate or one another, metallic coatings, and/or multilayer coatings are also disclosed. Deposition of coatings can be accelerated and/or improved by applying an electrical potential and/or through the use of inert gases.
    Type: Grant
    Filed: December 28, 2010
    Date of Patent: December 2, 2014
    Assignee: GVD Corporation
    Inventors: Erik S. Handy, Aleksander J. White, W. Shannan O'Shaughnessy, Hilton G. Pryce Lewis, Neeta P. Bansal, Karen K. Gleason
  • Publication number: 20140346141
    Abstract: A method of forming a self-assembled block polymer layer, oriented to form an ordered array of alternating domains, is disclosed. The method involves providing a layer of the self-assemblable block copolymer on the substrate and depositing a first surfactant onto the external surface of the layer prior to inducing self-assembly of the layer to form the ordered array of domains. The first surfactant has a hydrophobic tail and a hydrophilic head group and acts to reduce the interfacial energy at the external surface of the block copolymer layer in order to promote formation of assembly of the block copolymer polymer into an ordered array having the alternating domains.
    Type: Application
    Filed: December 18, 2012
    Publication date: November 27, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Aurelie Marie Andree Brizard, Roelof Koole, Emiel Peeters
  • Publication number: 20140349032
    Abstract: A film deposition method, in which a film of a reaction product of a first reaction gas, which tends to be adsorbed onto hydroxyl radicals, and a second reaction gas capable of reacting with the first reaction gas is formed on a substrate provided with a concave portion, includes a step of controlling an adsorption distribution of the hydroxyl radicals in a depth direction in the concave portion of the substrate; a step of supplying the first reaction gas on the substrate onto which the hydroxyl radicals are adsorbed; and a step of supplying the second reaction gas on the substrate onto which the first reaction gas is adsorbed.
    Type: Application
    Filed: August 13, 2014
    Publication date: November 27, 2014
    Inventors: Hitoshi KATO, Tatsuya TAMURA, Takeshi KUMAGAI
  • Patent number: 8889225
    Abstract: Provided is a method for forming a fluorocarbon polymer on a surface of a structure. A feedstock gas is directed through a porous heat member having a temperature sufficient to crack the feedstock gas and produce a reactive species that includes (CF2)n wherein n=1 or 2 radicals in the vicinity of a structure surface on which the fluorocarbon polymer is to be formed. The structure surface is maintained at a temperature lower than that of the porous heat member to induce deposition and polymerization of the (CF2)n wherein n=1 or 2 radicals on the structure surface.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: November 18, 2014
    Assignee: The Gillette Company
    Inventors: Andrew Vladimirovich Zhuk, Neville Sonnenberg
  • Patent number: 8883268
    Abstract: A method of producing a parylene coating on at least one surface of at least one component includes providing a first gas containing parylene monomers and depositing the parylene monomers on the at least one surface of the component by supplying the first gas containing the parylene monomers by a first nozzle to the at least one surface, wherein the component is disposed in an environment at atmospheric pressure.
    Type: Grant
    Filed: March 8, 2011
    Date of Patent: November 11, 2014
    Assignee: OSRAM Opto Semiconductors GmbH
    Inventors: Bert Braune, Christina Keith, Ivan Galesic
  • Publication number: 20140322527
    Abstract: A multilayer encapsulation thin-film and a method and apparatus for preparing a multilayer encapsulation thin-film are provided. The multilayer encapsulation thin-film includes an inorganic thin film that includes a metal oxide, and an organic thin film that includes a polymer and is formed on the inorganic thin film, where the inorganic thin film and the organic thin film are alternately stacked in multiple layers.
    Type: Application
    Filed: April 24, 2014
    Publication date: October 30, 2014
    Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Sungmin Cho, Ho Kyoon Chung, Heeyeop Chae, Sang Joon Seo, Seung Woo Seo
  • Patent number: 8859093
    Abstract: Embodiments of the present invention include low emissivity (low-E) coatings and methods for forming the coatings. The low-E coating comprises a self-assembled monolayer (SAM) on a glass substrate, where one surface of the SAM is disposed in contact with and covalently bonded to the glass substrate, and one surface of the monolayer is disposed in contact with and covalently bonded to a metal layer. In some embodiments, the low-E coating comprises an assembly of one or more monomeric subunits of the following structure: Si—(CnHy)-(LM)m where n is from 1 to 20, y is from 2n?2 to 2n, m is 1 to 3, L is a Group VI element, and M is a metal, such as silver. In some embodiments, (CnHy) can be branched, crosslinked, or cyclic. The coating can further comprise an antireflection coating on the metal layer.
    Type: Grant
    Filed: December 27, 2012
    Date of Patent: October 14, 2014
    Assignee: Intermolecular, Inc.
    Inventors: Xuena Zhang, Dipankar Pramanik
  • Patent number: 8815343
    Abstract: The invention relates to a process for the synthesis of conducting polymer films by vapor phase polymerization. The invention relates particularly to the synthesis of polymerized thiophene films, for example poly(3,4-ethylenedioxythiophene) (PEDOT) films.
    Type: Grant
    Filed: January 7, 2010
    Date of Patent: August 26, 2014
    Assignee: Imperial Innovation Limited
    Inventors: Lichun Chen, Donal Donat Conor Bradley
  • Patent number: 8808793
    Abstract: A method comprising introducing a workpiece support into a chamber of an apparatus. The workpiece support is for supporting thereon a plurality of workpieces. The apparatus comprising: the chamber having an interior space configured to be maintained at a pressure below atmospheric pressure; a vapor source for supplying the interior space of the chamber with a linearly extending stream of lubricant vapor; the workpiece support for supporting thereon a plurality of workpieces with surfaces facing the vapor source; and a conveyor for continuously moving the workpiece support transversely past the linearly extending stream of lubricant vapor from the vapor source. The method also comprising continuously moving the workpiece support with the plurality of workpieces supported thereon transversely past the linearly extending stream of lubricant vapor from the vapor source and depositing a uniform thickness film of the lubricant on at least one surface of each of the plurality of workpieces.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: August 19, 2014
    Assignee: Seagate Technology LLC
    Inventor: Paul Stephen McLeod
  • Patent number: 8808799
    Abstract: In one embodiment, the disclosure relates to providing a first gas stream carrying vaporized material and depositing the vaporized material onto a substrate by directing a plurality of gas streams containing the vaporized material to a substrate, forming an gas curtain around the streams to prevent its dissemination beyond a target print area, and allowing the vaporized material to condense on the target print area. In another embodiment, heat is used to regulate the flow of the material and the thickness of the deposited layer.
    Type: Grant
    Filed: May 1, 2010
    Date of Patent: August 19, 2014
    Assignee: Kateeva, Inc.
    Inventors: Conor F. Madigan, Alexander Sou-Kang Ko, Jianglong Chen
  • Patent number: 8796067
    Abstract: A method for forming an organic material layer on a substrate in an in-line deposition system is disclosed. In one aspect, the organic material is deposited with a predetermined non-constant deposition rate profile, which includes a first predetermined deposition rate range provided to deposit at least a first monolayer of the organic material layer with a first predetermined average deposition rate and a second predetermined deposition rate range provided to deposit at least a second monolayer of the organic material layer with a second predetermined average deposition rate. The injection of organic material through the openings of the injector is controlled for realizing the predetermined deposition rate profile.
    Type: Grant
    Filed: November 22, 2011
    Date of Patent: August 5, 2014
    Assignees: IMEC, Nederlandse Organisatie voor Toegepast-Natuurwe tenschappelijk Onderzoek (TNO), UniversitéCatholique de Louvain (UCL)
    Inventors: Cedric Rolin, Jan Genoe
  • Publication number: 20140212974
    Abstract: Provided is: a cell culture membrane, which is free from materials derived from living organisms, can easily be industrially mass-produced, exhibits superior long-term storage properties and chemical resistance, has excellent cell adhesion properties and long-term culture properties and is capable of replicating a cell adhesion morphology that is similar to that of collagen derived from living organisms and being used for conventional cell cultivation. Also provided are a cell culture substrate, and a method for manufacturing the cell culture substrate. In the present invention, as a cell adhesion layer, a polymer membrane represented by formula (I) is formed on the base of a cell culture substrate so as to have a membrane thickness equal to or greater than 0.2 ?m (in the formula, R1 and R2 represent a —(CH2)n—NH2 moiety (n is an integer of 1-10 inclusive.) or H, with at least one of R1 and R2 being a —(CH2)n—NH2 moiety. Moreover, l and m are positive integers expressing polymerization degree).
    Type: Application
    Filed: June 22, 2012
    Publication date: July 31, 2014
    Applicants: KISCO LTD., THE UNIVERSITY OF TOKYO, DAISANKASEI CO., LTD.
    Inventors: Yasuo Yoshimoto, Kentaro Kamimae, Yuki Tanabe, Taku Oguni, Takashi Inoue, Tsutomu Mochizuki, Makoto Hirama, Teruo Fujii, Hiroshi Kimura, Hideto Tozawa
  • Patent number: 8790785
    Abstract: A method of forming a porous insulation film uses an organic silica material gas having a 3-membered SiO cyclic structure and a 4-membered SiO cyclic structure, or an organic silica material gas having a 3-membered SiO cyclic structure and a straight-chain organic silica structure, and uses a plasma reaction in the filming process. A porous interlevel dielectric film having a higher strength and a higher adhesive property can be obtained.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: July 29, 2014
    Assignee: Renesas Electronics Corporation
    Inventors: Hironori Yamamoto, Fuminori Ito, Munehiro Tada, Yoshihiro Hayashi
  • Publication number: 20140186619
    Abstract: A coated article includes a substrate and an anti-fingerprint film formed on the substrate. The anti-fingerprint film is a mixture layer of tin and polyformaldehyde, a mixture layer of indium and polyformaldehyde, or a polyformaldehyde layer. The anti-fingerprint film has an excellent abrasion resistance. A method for making the coated article is also described.
    Type: Application
    Filed: April 19, 2013
    Publication date: July 3, 2014
    Applicants: FIH (HONG KONG) LIMITED, SHENZHEN FUTAIHONG PRECISION INDUSTRY CO., LTD.
    Inventors: CHUN-JIE ZHANG, XU LIU
  • Publication number: 20140178584
    Abstract: Provided is a method for forming a fluorocarbon polymer on a surface of a structure. A feedstock gas is directed through a porous heat member having a temperature sufficient to crack the feedstock gas and produce a reactive species that includes (CF2)n wherein n=1 or 2 radicals in the vicinity of a structure surface on which the fluorocarbon polymer is to be formed. The structure surface is maintained at a temperature lower than that of the porous heat member to induce deposition and polymerization of the (CF2)n wherein n=1 or 2 radicals on the structure surface.
    Type: Application
    Filed: December 21, 2012
    Publication date: June 26, 2014
    Inventors: Andrew Vladimirovich Zhuk, Neville Sonnenberg