Organic Coating Applied By Vapor, Gas, Or Smoke Patents (Class 427/255.6)
-
Patent number: 11976357Abstract: Embodiments of the disclosure provide methods for fabricating or otherwise forming a protective coating containing cerium oxide on processing chamber surfaces and/or components, such as surfaces which are exposed to a plasma within a processing chamber. In one or more embodiments, a method of forming a protective coating within a processing chamber includes depositing a cerium oxide layer on a chamber surface or a chamber component during an atomic layer deposition (ALD) process. The ALD process includes sequentially exposing the chamber surface or the chamber component to a cerium precursor, a purge gas, an oxidizing agent, and the purge gas during an ALD cycle, and repeating the ALD cycle to deposit the cerium oxide layer.Type: GrantFiled: November 27, 2019Date of Patent: May 7, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Geetika Bajaj, Yogita Pareek, Prerna Sonthalia Goradia, Ankur Kadam
-
Patent number: 11905664Abstract: The present invention relates to a press-heating gas grafting hydrophobization apparatus, and a hot water-resistant paper and an oil-absorbing paper manufactured using the press-heating gas grafting hydrophobization apparatus. In the press-heating gas grafting hydrophobization apparatus according to the present invention, since a non-air-permeable dryer belt is provided surrounding and pressing a drying roller to prevent dissipation from a base material of a fatty acid chloride vaporized by the drying roller, the press-heating gas grafting hydrophobization apparatus has an advantage of improving efficiency of a gas grafting reaction. Therefore, by using the press-heating gas grafting hydrophobization apparatus according to the present invention, the reaction amount of fatty acid chloride per unit area can be remarkably improved.Type: GrantFiled: September 17, 2019Date of Patent: February 20, 2024Assignees: KNU-Industry Cooperation Foundation, Daehan Paper Co., Ltd., Taekyung Polymer Co., Ltd.Inventors: Myoung Ku Lee, Jeong Yong Ryu, Kwang Seob Lee, Jae Hoon Lee, Han Je Cho, Hyeok Jun Kwon, David Guerin, Philippe Martinez, Kyung Wha Choi
-
Patent number: 11849601Abstract: A display apparatus includes a substrate, a display portion that includes a plurality of pixels disposed on the substrate, and an encapsulation portion that covers the display portion and includes a hybrid encapsulation layer that includes a plurality of inorganic layers and at least one organic layer that includes a plasma polymer. An end of the hybrid encapsulation layer includes a tip portion that includes an inorganic material and a multi-layered portion which extends from the tip portion toward a central portion of the substrate and in which the plurality of inorganic layers and the at least one organic layer are sequentially and alternately stacked, and a thickness of each of the inorganic layers and the organic layer decreases toward the tip portion.Type: GrantFiled: December 18, 2019Date of Patent: December 19, 2023Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Choelmin Jang, Myungsoo Huh, Sunghun Key, Junggon Kim, Eun Jung
-
Patent number: 11807937Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.Type: GrantFiled: February 26, 2019Date of Patent: November 7, 2023Assignee: ASML Netherlands B.V.Inventors: Sonia Castellanos Ortega, Jan Verhoeven, Joost Wilhelmus Maria Frenken, Pavlo Antonov, Nicolaas Ten Kate, Olivier Christian Maurice Lugier
-
Patent number: 11800741Abstract: A display unit including a first substrate and a second substrate that are disposed to face each other, a first organic insulating layer on the first substrate, a plurality of light-emitting elements arrayed in a display region, the display region on the first organic insulating layer and facing the second substrate and a first moisture-proof film covering the first organic insulating layer in a peripheral region, in which the peripheral region is provided on the first substrate and surrounds the display region.Type: GrantFiled: July 19, 2021Date of Patent: October 24, 2023Assignee: JOLED, INC.Inventors: Takatoshi Saito, Kenichi Izumi, Shinichi Teraguchi, Tadakatsu Nakadaira, Mikihiro Yokozeki, Shota Nishi, Manabu Kodate
-
Patent number: 11686683Abstract: A thin-film deposition system deposits a thin-film on a wafer. A radiation source irradiates the wafer with excitation light. An emissions sensor detects an emission spectrum from the wafer responsive to the excitation light. A machine learning based analysis model analyzes the spectrum and detects contamination of the thin-film based on the spectrum.Type: GrantFiled: February 5, 2021Date of Patent: June 27, 2023Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventor: Chung-Liang Cheng
-
Patent number: 11661672Abstract: A method of forming crystalline sheets using a Horizontal Ribbon Growth process, where the sheet of material formed in the process is withdrawn from a crucible in a specified manner to reduce instabilities in the process and to regulate crystal growth dynamics.Type: GrantFiled: August 6, 2019Date of Patent: May 30, 2023Assignee: CARNEGIE MELLON UNIVERSITYInventors: B. Erik Ydstie, Eyan Peter Noronha
-
Patent number: 11643570Abstract: A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH-POSS) nanoparticles.Type: GrantFiled: October 21, 2019Date of Patent: May 9, 2023Assignee: NBD NANOTECHNOLOGIES, INC.Inventors: Miguel Galvez, Bong June Zhang, Esra Altinok
-
Patent number: 11623239Abstract: Systems having one or more features that are advantageous for depositing fluorinated polymeric coatings on substrates, and methods of employing such systems to deposit such coatings, are generally provided.Type: GrantFiled: April 24, 2020Date of Patent: April 11, 2023Assignee: GVD CorporationInventors: W. Shannan O'Shaughnessy, Andrew Grant, Kelli J. Byrne, Michael E. Stazinski, Hilton Pryce Lewis
-
Patent number: 11569090Abstract: A method of depositing a material on one of two, but not both, sidewalls of a raised structure formed on a substrate includes tilting a normal of the substrate away from a source of the deposition material or tilting the source of the deposition material away from the normal of the substrate. The method may be implemented by a plasma-enhanced chemical vapor deposition (PECVD) technique.Type: GrantFiled: July 26, 2021Date of Patent: January 31, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Shih-Chun Huang, Ya-Wen Yeh, Chien-Wen Lai, Wei-Liang Lin, Ya Hui Chang, Yung-Sung Yen, Ru-Gun Liu, Chin-Hsiang Lin, Yu-Tien Shen
-
Patent number: 11527699Abstract: A piezoelectric element includes: a first electrode and a second electrode; and a piezoelectric layer provided between the first electrode and the second electrode and having a perovskite structure, in which 0<P1/P2?0.5 and 0<P1 where, when a positive predetermined voltage is applied to the piezoelectric layer, then a voltage applied to the piezoelectric layer is set to 0 V for 0.1 seconds, and then a triangular wave voltage waveform having a maximum voltage of the predetermined voltage is applied to the piezoelectric layer to obtain a hysteresis curve drawn counterclockwise, P1 is a residual polarization amount at a start point of the hysteresis curve and P2 is a residual polarization amount at an end point of the hysteresis curve.Type: GrantFiled: June 29, 2021Date of Patent: December 13, 2022Inventors: Yasuaki Hamada, Tomohiro Sakai
-
Patent number: 11499246Abstract: A crystal raw material loading device and a crystal growth device includes a plurality of bearing units which are arranged adjacent to each other horizontally in turn, and the multiple bearing units include a first bearing unit arranged at one end of a small plane far away from the seed crystal bearing device. Along the direction from one end of the small plane far away from the seed crystal to one end of the small plane close to the seed crystal, from the first bearing unit to the bearing unit on the side of the small plane close to the seed crystal, the height of the raw material that can be carried by each bearing unit is reduced in turn.Type: GrantFiled: March 25, 2021Date of Patent: November 15, 2022Assignee: HUNAN SANAN SEMICONDUCTOR CO., LTD.Inventors: Zebin Chen, Minfeng Wang, Hongji Liao, Huarong Chen
-
Patent number: 11497293Abstract: The present invention relates to a system (1) for applying at least two kinds of liquid onto respective targeted areas of a substrate (S). The system (1) includes first and second storage unit (10a, 10b) that accommodate first and second liquids (F1, F2); a pressured gas supply unit (20) that is fluidly connected to the first and second storage unit (10a, 10b); first and second applicator (30a, 30b) that are fluidly connected to the first and second storage unit (10a, 10b); and a controller (40) that is operatively connected to the applicator (30a, 30b). The pressured gas supply unit (20) causes pressure of a pressured gas to act on the liquids (F1, F2) within the storage unit (10a, 10b). The first and second applicator (30a, 30b) each include at least one nozzle (300a, 300b) disposed so as to face the substrate (S).Type: GrantFiled: January 31, 2018Date of Patent: November 15, 2022Assignee: L'OrealInventors: Gaurav Agarwal, Hiroyuki Ogata
-
Patent number: 11479854Abstract: A method of depositing a layer includes measuring a physical property that is related to an air pressure in a reactor chamber of a deposition apparatus. A main gas mixture including a source gas and an auxiliary gas is introduced into the reactor chamber at atmospheric pressure, the source gas including a precursor material and a carrier gas. A gas flow of at least one of the source gas and the auxiliary gas into the reactor chamber is controlled in response to a change of the air pressure in the reactor chamber.Type: GrantFiled: August 20, 2019Date of Patent: October 25, 2022Assignee: Infineon Technologies AGInventors: Olaf Fiedler, Ullrich Hannemann, Andre Horn, Daniel Kai Simon, Sigurd Volker Zehner
-
Patent number: 11472821Abstract: The present invention relates to precursor compounds, and more particularly to nonpyrophoric precursor compounds suitable for use in thin film deposition through atomic layer deposition (ALD) or chemical vapor deposition (CVD), and to an ALD/CVD process using the same.Type: GrantFiled: October 25, 2018Date of Patent: October 18, 2022Assignee: HANSOL CHEMICAL. CO., LTD.Inventors: Jung-Wun Hwang, Ki-Yeung Mun, Jun-Won Lee, Kyu-Hyun Yeom, Jang-Hyeon Seok, Jung-Woo Park
-
Patent number: 11426678Abstract: A sublimation purification apparatus that includes a vacuum chamber; a tube housing positioned in the vacuum chamber; a boat in close contact with the tube housing; and heating units positioned adjacent to an outer surface of the boat and an outer surface of the tube housing, respectively, wherein a sublimation purification target material is contained in the boat, and at least one of the boat and the tube housing is formed of a metal.Type: GrantFiled: August 6, 2019Date of Patent: August 30, 2022Assignee: LG CHEM, LTD.Inventors: Seok Kwang Hong, Hyoung Seok Kim, Hun Young Lee, Kwang Jin Jeong, Young Hwan Shin
-
Patent number: 11270896Abstract: Provided are methods and apparatus for ultraviolet (UV) assisted capillary condensation to form dielectric materials. In some embodiments, a UV driven reaction facilitates photo-polymerization of a liquid phase flowable material. Applications include high quality gap fill in high aspect ratio structures and pore sealing of a porous solid dielectric film. According to various embodiments, single station and multi-station chambers configured for capillary condensation and UV exposure are provided.Type: GrantFiled: July 11, 2019Date of Patent: March 8, 2022Assignee: Lam Research CorporationInventors: Jonathan D. Mohn, Nicholas Muga Ndiege, Patrick A. van Cleemput, David Fang Wei Chen, Wenbo Liang, Shawn M. Hamilton
-
Patent number: 10964541Abstract: An etch process that includes removing an oxide containing surface layer from a semiconductor surface to be etched by applying a hydrofluoric (HF) based chemistry, wherein the hydrofluoric (HF) based chemistry terminates the semiconductor surface to be etched with silicon-hydrogen bonds, and applying a vapor priming agent bearing chemical functionality based on the group consisting of alkynes, alcohols and a combination thereof to convert the silane terminated surface to a hydrophobic organic surface. The method continues with forming a photoresist layer on the hydrophobic organic surface; and patterning the photoresist layer. Thereafter, the patterned portions of the photoresist are developed to provide an etch mask. The portions of the semiconductor surface exposed by the etch mask are then etched.Type: GrantFiled: November 19, 2019Date of Patent: March 30, 2021Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Martin Glodde, Dario L. Goldfarb
-
Patent number: 10854815Abstract: An apparatus for manufacturing a display apparatus includes: a chamber; a plurality of source units outside the chamber, wherein the plurality of source units which accommodate a deposition material and transform the deposition material into gas; a nozzle unit in the chamber, wherein the nozzle unit is connected to the plurality of source units and injects, into the chamber, the deposition material supplied from one of the plurality of source units; and a regulating unit between each of the plurality of source units and the nozzle unit, wherein the regulating unit interrupts the deposition material supplied from each of the plurality of source units to the nozzle unit and selectively connects the plurality of source units with the nozzle unit.Type: GrantFiled: May 30, 2019Date of Patent: December 1, 2020Assignee: Samsung Display Co., Ltd.Inventors: Sangjin Han, Junha Park, Eugene Kang, Dongwook Kim, Cheollae Roh, Jaewan Seol, Seongho Jeong, Myungsoo Huh, Mingyu Seo
-
Patent number: 10743421Abstract: A coating apparatus includes a first vaporizer configured to vaporize a first precursor material, a second vaporizer configured to vaporize a second precursor material in series with the first vaporizer, at least one pyrolysis chamber configured to further process vaporized precursor material from one of the first vaporizer or second vaporizer, and a deposition chamber configured to receive the processed precursor materials.Type: GrantFiled: June 19, 2017Date of Patent: August 11, 2020Inventors: Yang Yun, Tining Su
-
Patent number: 10725209Abstract: A method for generating antireflective coatings for polymeric substrates using a deposition process and/or a dissolving process can provide a coating onto the outer surface of the substrate. Some embodiments can include a GLAD generated fluoropolymer coating or a co-evaporated fluoropolymer coating on a substrate that may achieve ultralow refractive index as well as improved adhesion and durability properties on polymeric substrates. In some embodiments, the deposition process is performed such that a fluoropolymer can be evaporated to form chain fragments of the fluoropolymer. The chain fragments diffused into the substrate can subsequently re-polymerize, interlocking with the polymer chains of the substrate. In some embodiments, the co-evaporation process can form a nanoporous polymer chain scaffold of the fluoropolymer, from which a sacrificial material can be dissolved out. The formed coating can be a multilayer or continuously-graded antireflective coating that has strong adhesion with the substrate.Type: GrantFiled: January 9, 2018Date of Patent: July 28, 2020Assignee: The Penn State Research FoundationInventors: Baomin Wang, Noel C. Giebink
-
Patent number: 10695794Abstract: Methods and apparatus for vapor deposition of an organic film are configured to vaporize an organic reactant at a first temperature, transport the vapor to a reaction chamber housing a substrate, and maintain the substrate at a lower temperature than the vaporization temperature. Alternating contact of the substrate with the organic reactant and a second reactant in a sequential deposition sequence can result in bottom-up filling of voids and trenches with organic film in a manner otherwise difficult to achieve.Type: GrantFiled: October 9, 2015Date of Patent: June 30, 2020Assignee: ASM IP Holding B.V.Inventors: Viljami J. Pore, Marko Tuominen, Hannu Huotari
-
Patent number: 10553432Abstract: An etch process that includes removing an oxide containing surface layer from a semiconductor surface to be etched by applying a hydrofluoric (HF) based chemistry, wherein the hydrofluoric (HF) based chemistry terminates the semiconductor surface to be etched with silicon-hydrogen bonds, and applying a vapor priming agent bearing chemical functionality based on the group consisting of alkynes, alcohols and a combination thereof to convert the silane terminated surface to a hydrophobic organic surface. The method continues with forming a photoresist layer on the hydrophobic organic surface; and patterning the photoresist layer. Thereafter, the patterned portions of the photoresist are developed to provide an etch mask. The portions of the semiconductor surface exposed by the etch mask are then etched.Type: GrantFiled: July 31, 2018Date of Patent: February 4, 2020Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Martin Glodde, Dario L. Goldfarb
-
Patent number: 10343186Abstract: Methods and apparatus for vapor deposition of an organic film are configured to vaporize an organic reactant at a first temperature, transport the vapor to a reaction chamber housing a substrate, and maintain the substrate at a lower temperature than the vaporization temperature. Alternating contact of the substrate with the organic reactant and a second reactant in a sequential deposition sequence can result in bottom-up filling of voids and trenches with organic film in a manner otherwise difficult to achieve. Deposition reactors conducive to depositing organic films are provided.Type: GrantFiled: March 15, 2016Date of Patent: July 9, 2019Assignee: ASM IP HOLDING B.V.Inventors: Viljami J. Pore, Marko Tuominen, Hannu Huotari
-
Patent number: 10315177Abstract: Embodiments of the present disclosure provide for substrates having an oxide shell layer (e.g., a silica shell layer), methods of making an oxide shell layer, and the like.Type: GrantFiled: October 8, 2015Date of Patent: June 11, 2019Assignee: KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGYInventors: Pierre M. Beaujuge, Yangqin Gao
-
Patent number: 10312087Abstract: An etch process that includes removing an oxide containing surface layer from a semiconductor surface to be etched by applying a hydrofluoric (HF) based chemistry, wherein the hydrofluoric (HF) based chemistry terminates the semiconductor surface to be etched with silicon-hydrogen bonds, and applying a vapor priming agent bearing chemical functionality based on the group consisting of alkynes, alcohols and a combination thereof to convert the silane terminated surface to a hydrophobic organic surface. The method continues with forming a photoresist layer on the hydrophobic organic surface; and patterning the photoresist layer. Thereafter, the patterned portions of the photoresist are developed to provide an etch mask. The portions of the semiconductor surface exposed by the etch mask are then etched.Type: GrantFiled: November 6, 2017Date of Patent: June 4, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Martin Glodde, Dario L. Goldfarb
-
Patent number: 9840638Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: GrantFiled: July 26, 2016Date of Patent: December 12, 2017Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Walter J. Dressick, Melik C. Demirel
-
Patent number: 9701865Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: GrantFiled: July 26, 2016Date of Patent: July 11, 2017Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Walter J. Dressick, Melik C. Demirel
-
Patent number: 9591771Abstract: A printed wiring board includes resin insulation layers, conductive layers formed on the resin insulation layers respectively such that each of the conductive layers is formed on a surface of each of the resin insulation layers, and via conductors penetrating through the resin insulation layers respectively such that the via conductors are connecting the conductive layers through the resin insulation layers. The conductive layers and the via conductors are formed such that each of the conductive layers and each of the via conductors includes an electroless copper-plated film, an intermediate compound layer having Cu3N+Cu(NH)x and formed on the electroless copper-plated film, and an electrolytic copper-plated film formed on the intermediate compound layer.Type: GrantFiled: December 9, 2014Date of Patent: March 7, 2017Assignee: IBIDEN Co., Ltd.Inventors: Hiroyuki Nishioka, Shinsuke Ishikawa
-
Patent number: 9578756Abstract: A printed wiring board includes resin insulation layers, conductive layers formed on the resin insulation layers respectively such that each of the conductive layers is formed on a surface of each of the resin insulation layers, and via conductors penetrating through the resin insulation layers respectively such that the via conductors are connecting the conductive layers through the resin insulation layers. Each of the resin insulation layers includes a modified resin layer formed by plasma treatment such that the modified resin layer is forming the surface of each of the resin insulation layers, each of the conducive layers includes a modified conductive layer formed by the plasma treatment such that the modified conductive layer is forming the surface of each of the conductive layers, and the modified resin layer has a surface modification different from a surface modification of the modified conductive layer.Type: GrantFiled: December 9, 2014Date of Patent: February 21, 2017Assignee: IBIDEN Co., Ltd.Inventors: Hiroyuki Nishioka, Shinsuke Ishikawa
-
Patent number: 9519366Abstract: A touch sensor includes a transparent substrate, and an electrode pattern formed on the transparent substrate. The electrode pattern is formed by stacking at least two or more electrode layers, thereby enhancing the anti-corrosion and visibility of electrode patterns and ensuring the adhesive reliability of the transparent substrate and the electrode patterns.Type: GrantFiled: May 8, 2014Date of Patent: December 13, 2016Assignee: Samsung Electro-Mechanics Co., Ltd.Inventors: Jang Ho Park, Woon Chun Kim, Jin Uk Lee, Nam Keun Oh
-
Patent number: 9469778Abstract: Coating porous material, such as PDMS, with parylene N, C, D, and AF-4 by vapor deposition polymerization is described in which a temperature of the porous material's surface being coated is heated to between 60° C. and 120° C., or 80° C. and 85° C., during deposition. The parylene forms nano roots within the porous material that connect with a conformal surface coating of parylene. In some embodiments, a watertight separation chamber in an integrated microfluidic liquid chromatography device is fabricated by heating tunnels in micro-fabricated PDMS and depositing parylene within the heated tunnels.Type: GrantFiled: October 8, 2014Date of Patent: October 18, 2016Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGYInventors: Yu-Chong Tai, Dongyang Kang
-
Patent number: 9349584Abstract: A method for depositing a film is provided. In the method, an object to be processed is accommodated in a process chamber, and an insulating film made of a polymer thin film is deposited on a surface of the object to be processed by supplying a first source gas composed of an acid anhydride and a second source gas composed of a diamine into the process chamber that is evacuated. Next, the insulating film is modified so as to have a barrier function by stopping the supply of the second source gas into the process chamber and continuously supplying the first source gas into the process chamber.Type: GrantFiled: April 22, 2013Date of Patent: May 24, 2016Assignee: TOKYO ELECTRON LIMITEDInventors: Kippei Sugita, Hiroyuki Hashimoto, Muneo Harada
-
Patent number: 9343296Abstract: Disclosed herein are methods of forming SiC/SiCN film layers on surfaces of semiconductor substrates. The methods may include introducing a silicon-containing film-precursor and an organometallic ligand transfer reagent into a processing chamber, adsorbing the silicon-containing film-precursor, the organometallic ligand transfer reagent, or both onto a surface of a semiconductor substrate under conditions whereby either or both form an adsorption-limited layer, and reacting the silicon-containing film-precursor with the organometallic ligand transfer reagent, after either or both have formed the adsorption-limited layer. The reaction results in the forming of the film layer. In some embodiments, a byproduct is also formed which contains substantially all of the metal of the organometallic ligand transfer reagent, and the methods may further include removing the byproduct from the processing chamber. Also disclosed herein are semiconductor processing apparatuses for forming SiC/SiCN film layers.Type: GrantFiled: February 25, 2015Date of Patent: May 17, 2016Assignee: Novellus Systems, Inc.Inventor: Adrien LaVoie
-
Patent number: 9324731Abstract: A method for fabricating a memory device is provided: A multi-layer stack is formed on a substrate. The multi-layer stack is then patterned to form plural trenches extending along a first direction to define plural ridge-shaped stacks each of which comprises at least one conductive strip. Next, a memory layer and a channel layer are formed in sequence on bottoms and sidewalls of the trenches. A sacrifice layer is formed to fulfill the trenches. Subsequently, portions of the sacrifice layer, the memory layer and the channel layer formed in the trenches are removed to form plural openings exposing a portion of the substrate therefrom. After removing the remaining sacrifice layer, portions of the memory layer and the channel layer formed on the ridge-shaped stacks are patterned to form an interconnection between two adjacent trenches through two of the openings formed in the two adjacent trenches.Type: GrantFiled: January 30, 2015Date of Patent: April 26, 2016Assignee: MACRONIX INTERNATIONAL CO., LTD.Inventor: Erh-Kun Lai
-
Patent number: 9186631Abstract: The present disclosure provides a porous material having a surface that is concurrently both superhydrophilic (having a first apparent advancing dynamic contact angle of less than or equal to about 5° for water) and oleophobic (having a second apparent advancing dynamic contact angle of greater than or equal to about 90°) or superoleophobic (a second apparent advancing dynamic contact angle of greater than or equal to about 150° for oil). Such materials can be used in a separator device to separate a liquid-liquid mixture of immiscible components (e.g., oil and water) or miscible components (e.g., alcohols). Separation apparatus incorporating such materials and methods of making and using these materials are also provided.Type: GrantFiled: June 14, 2011Date of Patent: November 17, 2015Assignees: The Regents Of The University Of Michigan, The United States of America, as represented by the Secretary of the Air ForceInventors: Anish Tuteja, Arun Kumar Kota, Gibum Kwon, Joseph M. Mabry
-
Patent number: 9040121Abstract: Vacuum deposited thin films of material are described to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.Type: GrantFiled: February 7, 2013Date of Patent: May 26, 2015Assignee: Board of Regents The University of Texas SystemInventors: C. Grant Willson, William Durand, Christopher John Ellison, Christopher Bates, Takehiro Seshimo, Julia Cushen, Logan Santos, Leon Dean, Erica Rausch
-
Publication number: 20150140214Abstract: A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle.Type: ApplicationFiled: December 12, 2014Publication date: May 21, 2015Applicant: THE REGENTS OF THE UNIVERSITY OF MICHIGANInventors: Stephen R. Forrest, Gregory McGraw
-
Publication number: 20150140660Abstract: The present invention provides a process of coating at least a portion of a substrate surface comprising contacting the surface with hydrogen cyanide monomeric units under conditions permitting polymerisation of the hydrogen cyanide monomeric units to form a polymer that coats the surface. Also provided is a substrate coated by a polymer according to the claimed process. Also provided is a method of forming a hydrocyanic acid-based hydrogel, the method comprising co-polymerisation in a solution, the solution comprising hydrogen cyanide monomer units and co-monomers.Type: ApplicationFiled: May 17, 2013Publication date: May 21, 2015Inventors: Helmut Thissen, Richard Evans, Aylin Koegler
-
Publication number: 20150132504Abstract: This invention is about a method for fabricating carbon molecular sieve membrane. The above method comprises a step of deposition, and a step of carbonization to obtain a high performance and high selectivity carbon molecular sieve membrane. According to this invention, an ultra-thin and defects free carbon molecular sieve membrane can be obtained. More preferably, the method for fabricating carbon molecular sieve membrane of this invention is easy operating, economic, and environmental friendly.Type: ApplicationFiled: November 13, 2013Publication date: May 14, 2015Applicant: CHUNG-YUAN CHRISTIAN UNIVERSITYInventors: Jung-Tsai Chen, Chien-Chieh Hu, Kueir-Rarn Lee, Juin-Yih Lai
-
Patent number: 9029471Abstract: Various fluoropolymers have been proposed for imparting oil and water repellency to leather. Commonly, these fluoropolymers are amphiphilic; i.e., they are made from at least one monomer which is hydrophobic and at least one monomer which is hydrophilic. The present invention identifies and remedies disadvantages associated with the ability of amphiphilic fluoropolymers to impart oil and water repellency to leather. Contrary to conventional thinking, it has now been discovered that the incorporation of hydrophilic groups in a fluoropolymer undesirably reduces its ability to impart water resistance to leather. Correspondingly, it has also been discovered that a fluoropolymer incorporating fewer or no hydrophilic groups imparts superior oil and water repellency to leather when compared to fluoropolymers incorporating more hydrophilic groups. Therefore, this invention provides fluoropolymers which incorporate reduced levels of hydrophilic groups.Type: GrantFiled: September 30, 2008Date of Patent: May 12, 2015Assignee: E I du Pont du Nemours and CompanyInventors: Romain Severac, Agnes Ibos, Lamia Heuze, Renaud Laloux-Walther
-
Patent number: 9029189Abstract: Bicyclic guanidine compounds are described. Metal bicyclic guanidinate and its use in vapor deposition processes to deposit a metal-containing thin film are also described. Methods of making alkaline earth metal N,N?dialkylacetamidinates or bicyclic guanidinates including dissolution of alkaline earth metal into liquid ammonia followed by addition of a solution of an amidine or guanidine ligand in the free base from are provided.Type: GrantFiled: February 20, 2009Date of Patent: May 12, 2015Assignee: President and Fellows of Harvard CollegeInventors: Roy Gerald Gordon, Leonard Neil Jacques Rodriguez
-
Publication number: 20150123012Abstract: A sample plate in use with a MALDI-TOF (matrix-assisted laser desorption ionization time-of-flight) mass spectrometer. The sample plate is usable for the mass spectrometry of a polymeric material on the order of several hundreds of Da and a method of manufacturing the same sample plate. The sample plate including a target plate, an organic matrix formed on one surface of the target plate, and a Parylene thin film formed on the target plate on which the organic matrix is formed, the Parylene thin film entirely covering the organic matrix.Type: ApplicationFiled: November 6, 2014Publication date: May 7, 2015Inventors: Jaechul Pyun, Jo ll Kim
-
Publication number: 20150118504Abstract: A surface-treating composition including a fluorine-containing polymer which is able to form a layer having both high surface slip property and high friction durability. The surface-treating composition includes a first compound (a reactive fluorine-containing polymer which is a fluorine-containing silane polymer) and a second compound (a non-reactive fluorine-containing polymer which is a fluorine-containing oil), and the proportion of the first compound is 15 to 70% by mass with respect to the total mass of the first compound and the second compound.Type: ApplicationFiled: March 4, 2013Publication date: April 30, 2015Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shinsuke Ohshita, Tomohiro Yoshida, Kaori Ozawa, Akinari Sugiyama
-
Publication number: 20150111023Abstract: Coating porous material, such as PDMS, with parylene N, C, D, and AF-4 by vapor deposition polymerization is described in which a temperature of the porous material's surface being coated is heated to between 60° C. and 120° C., or 80° C. and 85° C., during deposition. The parylene forms nano roots within the porous material that connect with a conformal surface coating of parylene. In some embodiments, a watertight separation chamber in an integrated microfluidic liquid chromatography device is fabricated by heating tunnels in micro-fabricated PDMS and depositing parylene within the heated tunnels.Type: ApplicationFiled: October 8, 2014Publication date: April 23, 2015Applicant: California Institute of TechnologyInventors: Yu-Chong Tai, Dongyang Kang
-
Publication number: 20150104586Abstract: A method for making a single molecule receptor in a nanopore structure includes depositing a material by a physical vapor deposition (PVD) technique onto a selected interior surface of a nanochannel and functionalizing a surface of the material with a chemical compound having at least two functional groups. The material forms a patch having a diameter of about 3 to about 10,000 nanometers (nm). Also disclosed are embodiments of a nanopore structure including a single molecule receptor.Type: ApplicationFiled: November 4, 2013Publication date: April 16, 2015Applicant: International Business Machines CorporationInventors: Julia Baldauf, Stefan Harrer, Christine Schieber
-
Patent number: 8999443Abstract: A method for fabricating a microarray of plural soft materials includes: vapor-depositing a first layer poly(para-xylylene) resin on a substrate, forming a first micro pattern in the poly(para-xylylene) resin; obtaining a substrate including a first microarray formed by pouring a first soft material solution, freeze-drying the first soft material to obtain a micro-arrayed substrate of the freeze-dried first soft material; vapor-depositing a second layer poly(para-xylylene) resin on the micro-arrayed substrate of the freeze-dried first soft material, forming a second micro pattern placed differently from the first micro pattern by penetrating the poly(para-xylylene) resin of the first and second layers, forming a second microarray on the substrate by pouring a second soft material solution; and forming a microarray of the first and second soft materials on the substrate by peeling off the poly(para-xylylene) resin of the first and second layers.Type: GrantFiled: March 27, 2012Date of Patent: April 7, 2015Assignees: NTT DOCOMO, INC., The University of TokyoInventors: Satoshi Hiyama, Kaori Kuribayashi, Hiroaki Onoe, Shoji Takeuchi
-
Patent number: 8986780Abstract: The disclosure relates to a method for depositing an organic film layer on a substrate. In one implementation a method to deposit organic film by generating vaporized organic particles; streaming a carrier fluid proximal to a source to carry the vaporized organic particles and solid organic particles from the source towards the substrate; transporting the vaporized and solid organic particles through a discharge nozzle with a plurality of micro-pore openings, placed between the source and the substrate, that permits the passage of at least a portion of the vaporized or solid organic particles through the micro-pores; depositing the vaporized organic particles and the solid organic particles that are transported through the discharge nozzle onto the substrate.Type: GrantFiled: April 15, 2011Date of Patent: March 24, 2015Assignee: Massachusetts Institute of TechnologyInventors: Vladimir Bulovic, Marc A. Baldo, Martin A. Schmidt, Valerie Gassend, Jianglong Chen
-
Patent number: 8969234Abstract: A method of preparing a fuel cell electrode catalyst by preparing a platinum-carbon core-shell composite, which has a platinum nanoparticle core and a graphene carbon shell, using a simultaneous evaporation process, a method for preparing a fuel cell electrode comprising the catalyst prepared thereby, and a fuel cell comprising the same. A fuel cell comprising an electrode catalyst consisting of the core-shell composite prepared by simultaneously evaporating the platinum precursor and the organic precursor can have high performance and high durability, because the platinum particles are not agglomerated or detached and corroded even under severe conditions, including high-temperature, long use term, acidic and alkaline conditions.Type: GrantFiled: June 7, 2013Date of Patent: March 3, 2015Assignee: Korea Institute of Energy ResearchInventors: Hee-Yeon Kim, Seok-yong Hong
-
Patent number: 8945684Abstract: The invention relates to a process for depositing an anti-fouling top coat onto the outermost coating layer of a coated optical article, comprising the following steps: a) providing an optical article having two main faces, at least one of which being coated with an outermost layer; b) treating said outermost layer with energetic species resulting in surface physical attack and/or chemical modification; and c) vacuum evaporating a liquid coating material for an anti-fouling top coat by means of an evaporation device, resulting in the deposition of the evaporated coating material onto the treated outermost layer of the optical article, wherein prior to the vacuum evaporation step of the liquid coating material, said liquid coating material has been treated with energetic species.Type: GrantFiled: November 4, 2005Date of Patent: February 3, 2015Assignee: Essilor International (Compagnie Generale d'Optique)Inventor: Gérald Fournand