Abstract: Acoustic wave devices and methods of coating a protective film of alumina (Al2O3) on the acoustic wave devices are disclosed herein. The protective film is applied through an atomic layer deposition (ALD) process. The ALD process can deposit very thin layers of alumina on the surface of the acoustic wave devices in a precisely controlled manner. Thus, the uniform film does not significantly distort the operation of the acoustic wave device.

Abstract: The invention pertains to a reinforced covering material, comprising a reinforcement layer with apertures therein, and a polyurethane-based layer comprising 20-100% of thermosetting polyurethane, based on the weight of that layer, which polyurethane-based layer is arranged at least one side of the reinforcement layer and extends through the apertures. It may be used to provide weather- and water-proofing in construction materials, e.g. as lead flashings or in/on roofs, bridges and tunnels.

Abstract: A polymer having at least one urea linkage prepared by: (i) reacting (a) at least one diisocyanate, polyisocyanate, or mixture thereof, having isocyanate groups, and (b) at least one fluorinated compound selected from the formula (I): Rf(CH2CF2)p(CH2CH2)qR1)r—XH??Formula (I) wherein p and q are each independently an integer of 1 to 3; r is 0 or 1; X is —O—, —NH— or —S—; R1 is a divalent radical selected from the group consisting of —S(CH2)n—, n is an integer of 2 to 4; s is an integer of 1 to 50; R2, R3, and R4 are each independently hydrogen or an alkyl group containing 1 to 6 carbon atoms; and Rf is a perfluoroalkyl group having 1 to 6 carbon atoms; and (i) reacting with (c) water, a linking agent, or a mixture thereof and methods for treating substrates therewith.

Abstract: The method for producing a functional film includes a step of forming an organic film on a surface of a substrate and a step of forming an inorganic film by vacuum deposition on a surface of the organic film to produce the functional film. Prior to forming the inorganic film, a member contacts the surface of the organic film in a vacuum chamber at portions where the organic film does not exhibit its functions.

Abstract: In an embodiment, the invention is a single ply paper product comprising a paper substrate having a first surface and a second surface and comprising a web of fibers sufficiently refined to have a Canadian Standard Freeness value of greater than about 100 cm3 according to TAPPI standard test T 227, and having a weight of between about 20 lbs./3,000 ft.2 and about 45 lbs./3,000 ft.2; and a fluorochemical in an amount of at least 800 parts per million. In another embodiment, the invention is a method for processing a single ply paper product comprising the steps of folding a single ply paper product into a container. Processing of the single ply paper product includes at least one of folding, creasing, applying adhesive, applying a susceptor patch, and heat sealing. In another embodiment, the invention is an article comprising a single ply paper product and a charge of oil and popcorn.

Abstract: A process for the preparation of thin films of an organic-inorganic nature comprising growing with a gas phase deposition technique preferable the ALCVD (atomic layer chemical vapour deposition) technique. As an example, trimethylaluminium (TMA), hydroquinone (Hq) and phloroglucinol (PhI) have been used as precursors to fabricate thin films of aluminium benzene oxides constructing a hybrid type film. Further thin films with a hybrid nature are described. These films can be used as an optical material, a pressure sensor, a gas sensor, temperature sensor, magnetic field sensor, electric field sensor, a piezoelectric material, a magnetic material, a semiconductor material and as an electric insulating material.

Abstract: A methodology and system for applying coatings onto the interior surfaces of components, includes a vapor creation device, a vacuum chamber having a moderate gas pressure and an inert gas jet having controlled velocity and flow fields. The gas jet is created by a rarefied, inert gas supersonic expansion through a nozzle. By controlling the carrier gas flow into a region upstream of the nozzle an upstream pressure is achieved. The carrier gas flow and chamber pumping rate control the downstream pressure. The ratio of the upstream to downstream pressure along with the size and shape of the nozzle opening controls the speed of the gas entering the chamber. Vapor created from a source is transported into the interior regions of a component using binary collisions between the vapor and gas jet atoms. These collisions enable the vapor atoms to scatter onto the interior surfaces of the component and deposit.

Abstract: A process to produce a silane coating includes charging one or several silanes, which are not or only minimally pre-condensed, with a reactant and the thus created coating material is applied onto a substrate and then hardened. Surprisingly it has been shown that, through the reaction involving higher-molecular and only slightly pre-cross-linked silanes with a suitable reactant, a new class of coating materials can be created. The approach is advantageous insofar as restrictions with respect to pot time no longer exist and, in addition, better features of the coating material are obtained, especially a high scratch-resistance.

Abstract: [Problem] Provided is a novel lubricant composition that is useful as a material of a lubricating layer of a magnetic recording medium. [Means for Resolution] The lubricant composition contains at least one kind of compound represented by the following Formula (1). In the formula, X represents a cyclic group that may be substituted, and Y represents a single bond or a linking group having a valency of 2 or more. Here, at least one of X and Y includes 1 or more polar groups such as a hydroxyl group; Z represents a linking group having a valency of 2 or more and constituted with a carbon atom (C), a fluorine atom (F), and 1 or 2 kinds of arbitrary atoms (here, a hydrogen atom is excluded); n represents a real number of 1 to 10; m represents a real number of 0 to 1; and s and t independently represent a real number of 1 or greater.

Abstract: The present invention relates to a composition comprising an organofunctional silane system, in which fluorinated alkyl groups of the general formula F3C(CF2)r(CH2)s— (Ib) are attached to some of the silicon atoms, and a thickener, to a process for preparing such a composition, and to the use of the composition for preventing surface soiling.

Abstract: A barrier film having a substrate, a base polymer layer applied to the substrate, an oxide layer applied to the base polymer layer, and a top coat polymer layer applied to the oxide layer. An optional inorganic layer can be applied over the top coat polymer layer. The top coat polymer includes a silane and an acrylate co-deposited to form the top coat layer. The use of a silane co-deposited with an acrylate to form the top coat layer of the barrier films provide for enhanced resistance to moisture and improved peel strength adhesion of the top coat layer to the underlying barrier stack layers.

Abstract: Coated articles and methods and systems for coating the articles are described herein. The methods and systems described herein include, but are not limited to, steps for actively or passively controlling the temperature during the coating process, steps for providing intimate contact between the substrate and the support holding the substrate in order to maximize energy transfer, and/or steps for preparing gradient coatings. Methods for depositing high molecular weight polymeric coatings, end-capped polymer coatings, coatings covalently bonded to the substrate or one another, metallic coatings, and/or multilayer coatings are also disclosed. Deposition of coatings can be accelerated and/or improved by applying an electrical potential and/or through the use of inert gases.

Abstract: Methods for supplying one or more vapors, under reduced pressure, to an environment are provided. The vapor may comprise at least one polymerizable component. In some cases, at least two components may be combined to form the vapor. The components may be provided as separate vapor streams, which may be combined and homogenized. Methods of the invention may also be useful in the deposition of materials on the surface of a substrate. In some cases, the material may form a layer, such as a polymer layer, on the surface of a substrate. The present invention may be useful in applications that require the formation of homogeneous films on the surface of a substrate.

Abstract: The present invention discloses novel halogenated flame retardant formulations that effectively flame retard textiles at low binder and/or the flame retardant synergist contents, novel modes of application thereof on textiles, and flame-retarded textile fibers and fabrics which are treated by these formulations.

Abstract: Compositions including an amido-group-containing vapor deposition precursor and a stabilizing additive are provided. Such compositions have improved thermal stability and increased volatility as compared to the amido-group-containing vapor deposition precursor itself. These compositions are useful in the deposition of thin films, such as by atomic layer deposition.

Abstract: There is provided a method for modifying a polyimide membrane comprising the step of exposing the polyimide membrane to a surface modification compound in a vapour phase, said surface modification compound having at least one amine group, to thereby modify the polyimide membrane.

Abstract: A metal implant, in particular a dental implant, with a hydrophilic surface for at least partial insertion into a bone, and a method for the production of said implant are described. A particularly advantageous hydrophilic surface for improved osteointegration properties is made available if it is briefly treated, at least in some areas, in a weakly alkaline solution. These excellent osteointegration properties can be achieved in a method in which, optionally after a preceding mechanical surface modification by material removal and/or chemical surface modification, at least the areas exposed of this surface exposed to bone and/or soft tissue are chemically modified in an alkaline solution.

Abstract: Disclosed are titanium-containing precursors and methods of synthesizing the same. The compounds may be used to deposit titanium, titanium oxide, strontium-titanium oxide, and barium strontium titanate containing layers using vapor deposition methods such as chemical vapor deposition or atomic layer deposition.

Abstract: Methods for removing hydrogen from molecules are disclosed. In one embodiment, hydrogen-containing molecules are deposited on a solid substrate and are bombarded with hydrogen projectile particles. The particles may have energies of 5-100 eV, or more preferably 10-50 eV. The hydrogen projectile particles remove hydrogen atoms from the deposited molecules while they are on the substrate, without removing other atoms from the molecules. Dangling bonds are created by the loss of hydrogen and can be used to cross-link the molecules. The resulting product can be a nanometer-thick dense film.

Abstract: Bactericidal substrates and methods of functionalizing the surface of substrates with quaternary ammonium and quaternary phosphonium groups using non-equilibrium RF plasmas are provided. The methods include the step of treating the surface of a substrate with a plasma to create surface active sites. Some methods include the step of reacting the surface active sites with linker molecules, which are then reacted with quaternary ammonium precursor molecules to provide a substrate surface functionalized with quaternary ammonium precursor groups. Other methods react the surface active sites with polymer precursor molecules under plasma conditions to form a covalently-bound polymer layer having reactive sites. The polymer reactive sites are reacted with quaternary phosphonium precursor molecules to provide a substrate surface functionalized with quaternary phosphonium groups. Also provided are bactericidal substrates having immobilized, covalently-bound quaternary ammonium or quaternary phosphonium groups.

Abstract: The present invention is directed to an electrostatic chuck (ESC) with a compliant layer formed from TT-Kote® and a method of forming a clamping plate for an ESC. The ESC comprises a compliant layer having a low friction surface for reducing or eliminating particulates generated from thermal expansion. The method comprises forming a clamping member for a substrate comprising a ceramic material and a ceramic surface, and coating the ceramic surface with a compliant layer comprising an organic silicide or TT-Kote®.

Abstract: A silicon resin is applied to the outer wall of the transition piece of a gas turbine subjected to the thermal barrier coating by caulking the cooling holes provided in the inner wall by a resin. Then, the transition piece is heated in an atmosphere furnace in order to burn or decompose the resin. A part of the silicon resin applied to the outer wall of the transition piece is decomposed or evaporated by the heating to be discharged to the atmosphere in the furnace, but a part of the silicon resin remains and protects the outer wall.

Abstract: A method of producing a film coated onto a substrate by dissolving a metal or metalloid containing compound having hydrolysable groups in a solvent to form a precursor solution. The precursor solution is coated onto the substrate as a continuous liquid phase. The precursor solution is then cured to produce a continuous, interconnected, nano-porous network.

Abstract: A polymer having at least one carbamate linkage prepared by: (i) reacting (a) at least one diisocyanate, polyisocyanate, or mixture thereof, and (b) at least one fluorinated compound selected from the formula (I): Rf(CH2)x[(CF2CF2)y(CH2CH2)z]m(R1)r—XH??(I) wherein Rf is a perfluoroalkyl group having 1 to about 6 carbon atoms; subscript x is 1 to about 6; subscripts y, z and m are each independently 1, 2 or 3, or a mixture thereof; subscript r is 0 or 1; the total number of carbons in said formula (I) excluding (R1)r—XH ranges from about 8 to about 22; X is —O—, —NR—, —S—, —S(CH2)tO—, or —S(CH2)tNR—; subscript t is from 1 to about 10; R is H or C1-4 alkyl; R1 is certain divalent radicals; n is 2 to 4; s is 1 to about 50; R2, R3, and R4 are each independently hydrogen or a C1-C6 alkyl group; and (ii) optionally reacting with (c) water, a linking agent, or a mixture thereof.

Abstract: A method for controlling the deposition of vaporized organic material onto a substrate surface, includes providing a manifold having at least one aperture through which vaporized organic material passes for deposition onto the substrate surface; and providing a volume of organic material and maintaining the temperature of such organic material in a first condition so that its vapor pressure is below that needed to effectively form a layer on the substrate, and in a second condition heating a volume percentage of the initial volume of such organic material so that the vapor pressure of the heated organic material is sufficient to effectively form a layer.

Abstract: Methods and structures relating to the formation of mixed SAMs for preventing undesirable growth or nucleation on exposed surfaces inside a reactor are described. A mixed SAM can be formed on surfaces for which nucleation is not desired by introducing a first SAM precursor having molecules of a first length and a second SAM precursor having molecules of a second length shorter than the first. Examples of exposed surfaces for which a mixed SAM can be provided over include reactor surfaces and select surfaces of integrated circuit structures, such as insulator and dielectric layers.

Abstract: A composition which provides surface effects to substrates comprising a polymer containing at least one urea linkage prepared by (i) reacting (1) at least one organic diioscyanate, polyisocyanate, or mixture thereof, and (2) at least one fluorochemical compound of Formula I Rf—O(CF2CF2)r(CH2CH2)q(R1)sXH??Formula (I) wherein Rf is a linear or branched C1 to C7 perfluoroalkyl optionally interrupted by one to three oxygen atoms, r is 1 to 3, q is 1 to 3, s is 0 or 1, X is O, S, or NR2 wherein R2 is H, or C1 to C6 alkyl, and R1 is a divalent radical selected from —S(CH2)n—, p is 1 to 50, and R3, R4 and R5 are each independently H or C1 to C6 alkyl; (ii) and then reacting with (3) water, a linking agent, or a mixture thereof.

Abstract: The invention relates to a process for the preparation of a composite material, said composite material comprising a substrate and a layer on the substrate, comprising a vapor-depositing step in which a compound comprising a triazine compound is deposited on the substrate at a pressure below 1000 Pa, whereby the layer is formed, wherein during the vapor-depositing step the temperature of the substrate lies between ?15° C. and +125° C. The invention further relates to a composite material, obtainable by the process as disclosed.

Abstract: This disclosure relates to compositions that include (a) at least one substituted or unsubstituted cyclic alkene, and (b) an antioxidant composition including at least one compound of Formula (I): R1 through R4 in Formula (I) are described in the specification.

Abstract: The invention relates to the use of melam deposited on a substrate, in applications requiring high humidity resistance, such as further processing comprising retort or metal deposition, or applications such as solar or display. Melam to melamine ratio (w/w) in the barrier layer is in the range from 3:1 to 50:1.

Abstract: A metalorganic complex composition comprising a metalorganic complex selected from the group consisting of: metalorganic complexes comprising one or more metal central atoms coordinated to one or more monodentate or multidentate organic ligands, and complexed with one or more complexing monodentate or multidentate ligands containing one or more atoms independently selected from the group consisting of atoms of the elements C, N, H, S, O and F; wherein when the number of metal atoms is one and concurrently the number of complexing monodentate or multidentate ligands is one, then the complexing monodentate or multidentate ligand of the metalorganic complex is selected from the group consisting of beta-ketoiminates, beta-diiminates, C2-C10 alkenyl, C2-C15 cycloalkenyl and C6-C10 aryl.

Abstract: A chemical vapor deposition apparatus and a method for forming a parylene film are provided. The chemical vapor deposition apparatus includes a buffer chamber, a deposition chamber, a pyrolysis chamber and an evaporator. The buffer chamber has a first valve and a second valve. The evaporator is connected with the second valve. The pyrolysis chamber is connected with the evaporator through a first pipe, wherein the first pipe has a third valve. The deposition chamber is connected with the pyrolysis chamber.

Abstract: A multilayer system where intermediate well bonded and cross-linked layers provide attachment for a finishing layer with desired reactive sites.

Abstract: Bicyclic guanidine compounds are described. Metal bicyclic guanidinate and its use in vapor deposition processes to deposit a metal-containing thin film are also described. Methods of making alkaline earth metal N,N?dialkylacetamidinates or bicyclic guanidinates including dissolution of alkaline earth metal into liquid ammonia followed by addition of a solution of an amidine or guanidine ligand in the free base from are provided.

Abstract: A method of forming a lyophobic coating on a surface having oxidized groups is disclosed. The method includes bringing into contact with the surface a silane or siloxane having the formula SiX4 wherein each X is the same or different, wherein at least one X is a leaving group and at least one X is a lyophobic group.

Abstract: An organic glass for automobile is provided which has excellent weatherability, wear-resistance and abrasion-resistance, and which can be mass-produced by a simple and inexpensive process. The organic glass comprises a transparent resin base plate 12 and a hard coat layer 14 formed on at least one surface of the resin base plate. The hard coat layer includes an organic thin film 16 formed by vacuum deposition polymerization.

Abstract: A method of depositing a layer onto a substrate, comprising heating an evaporator to a temperature capable of completely evaporating the evaporant to be deposited, dispensing into the evaporator one or more quantized units of the evaporant where the evaporant is completely vaporized, providing an area vapor dispenser having a plurality of apertures, and directing the vaporized evaporant from the evaporator to the area vapor dispenser so that the evaporant is dispensed through the apertures to deposit the layer on the substrate.

Abstract: The present invention relates to process for the production of plane-parallel platelets, comprising the steps of: a) vapor-deposition of a separating agent onto a carrier to produce a separating agent 5 layer, b) vapor-deposition of at least one product layer onto the separating agent layer, and c) dissolution of the separating agent layer in a solvent and production of a suspension in which the at least one product layer is present in the form of plane-parallel platelets, wherein the separating agent is selected from the group consisting of anthracene, anthraquinone, acetamidophenol, acetylsalicylic acid, camphoric anhydride, benzimidazole, benzene-1,2,4-tricarboxylic acid, biphenyl-2,2-dicarboxylic acid, bis(4-hydroxyphenyl)sulfone, dihydroxyanthraquinone, hydantoin, 3-hydroxybenzoic acid, 8-hydroxyquinoline-5-sulfonic acid monohydrate, 4-hydroxycoumarin, 7-hydroxycoumarin, 3-hydroxynaphthalene-2-carboxylic acid, isophthalic acid, 4,4-methylene-bis-3-hydroxynaphthalene-2-carboxylic acid, naphthalene-1,8-dic

Abstract: The invention discloses a composition comprising a hybrid composite organic-inorganic membrane. The hybrid organic-inorganic membrane according to the present invention may comprise an amorphous porous layer incorporating organic functionalities. The amorphous porous layer may be deposited on a porous alumina substrate by chemical vapor deposition (CVD). The amorphous porous layer may comprise a single top-layer (STL), multiple top-layers (MTL) or mixed top-layers (XTL). The substrate may comprise a single layer or multiple graded layers of alumina.

Abstract: A layered structure including graphene, wherein a basal plane of the graphene is a (0001) plane; and a layer including an organic material having a conjugated system disposed on the graphene, wherein the layer comprising the organic material layer having the conjugated system is bound to the (0001) plane of the graphene by a ?-? interaction, and a method of preparing the same.

Abstract: A device is provided. The device includes a nozzle, a source of carrier gas and a source of organic molecules in fluid communication with the nozzle. The device also includes an active cooling system disposed adjacent to the nozzle. Preferably, the device also includes a chamber, wherein the nozzle, and the active cooling system are disposed within the chamber. A substrate holder may also be disposed within the chamber, adapted to support a substrate beneath the nozzle, movable relative to the nozzle. Preferably, a substrate is held by the substrate holder, the substrate disposed at a distance of 0.1 to 10 mm from the active cooling system. Preferably, the device also includes a heating system attached to the nozzle. The points at which the heating system are attached to the nozzle preferably includes at least one point that is zero to 5 mm from the tip of the nozzle.

Abstract: A stabilized cyclic alkene composition comprising one or more cyclic alkenes, and at least one antioxidant compound having the formula (I), wherein R1 through R5 can each independently be H, OH, C1-C8 linear, branched, or cyclic alkyl, C1-C8 linear, branched, or cyclic alkoxy or substituted or unsubstituted aryl, and wherein the antioxidant compound is present in an amount between 1 ppm and 200 ppm and has a boiling point lower than 265° C. A method for forming a layer of carbon-doped silicon oxide on a substrate, which uses the stabilized alkene composition and a silicon containing compound.

Abstract: Methods of depositing a single or mixed metal oxide layer or film are described herein. The methods use a rare earth metal precursor are described herein. The rare earth metal precursors have a general formula M[OCR1(R2)(CH2)X]3, wherein M is a rare earth metal, R1 is H or an alkyl group, R2 is an optionally substituted alkyl group and X is selected from OR and NR, wherein R is an alkyl group or a substituted alkyl group.

Abstract: A three dimensional woven preform, a fiber reinforced composite incorporating the preform, and methods of making thereof are disclosed. The woven preform includes two or more warp steered fabrics. The warp steered fabrics include a darted portion and an un-darted portion. The darted portions of the warp steered fabrics are joined to un-darted portions of one another so as to provide continuous fiber in the circumferential and radial directions of all portions of the preform. An un-darted portion in one steered fabric reinforces a darted portion in the other. The warp steered fabrics can be woven on a loom equipped with a differential take-up mechanism. The warp steered fabrics can be single or multilayer fabrics. The final preform can be a portion of an aircraft window frame.

Abstract: A thermal barrier coating and deposition process for a component intended for use in a hostile thermal environment, such as the turbine, combustor and augmentor components of a gas turbine engine. The TBC has a first coating portion on at least a first surface portion of the component. The first coating portion is formed of a ceramic material to have at least an inner region, at least an outer region overlying the inner region, and a columnar microstructure whereby the inner and outer regions comprise columns of the ceramic material. The columns of the inner region are more closely spaced than the columns of the outer region so that the inner region of the first coating portion is denser than the outer region of the first coating portion, wherein the higher density of the inner region promotes the impact resistance of the first coating portion.

Abstract: An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and a SAM organic-based layer is directly deposited over the oxide-based layer. Typically a series of alternating layers of oxide-based layer and organic-based layer are applied.

Abstract: A device and a method for facilitating the deposition and patterning of organic materials onto substrates utilizing the vapor transport mechanisms of organic vapor phase deposition is provided. The device includes one or more nozzles, and an apparatus integrally connected to the one or more nozzles, wherein the apparatus includes one or more source cells, a carrier gas inlet, a carrier gas outlet, and a first valve capable of controlling the flow of a carrier gas through the one or more source cells. The method includes moving a substrate relative to an apparatus, and controlling the composition of the organic material and/or the rate of the organic material ejected by the one or more nozzles while moving the substrate relative to the apparatus, such that a patterned organic layer is deposited over the substrate.

Abstract: The invention relates to a laminate comprising two plastic films and in between a metal or metaloxide layer and a crystalline triazine layer, the laminate having a lamination strength of about 2 N/inch or more as measured in a 90 degree tensile testing at 30 mm/min. The invention further relates to a composite layer, comprising a metal or metal oxide, and a triazine layer comprising a triazine compound suitable for said laminate. The invention further relates to a process for the preparation of a composite layer, comprising the step of applying a triazine layer on a substrate with a metal or metal oxide layer by vapour deposition of the triazine compound, wherein the process comprises (a) applying to the metal or metal oxide layer a compound other than a triazine compound, (b) vapour depositing the triazine compound on the metal or metal oxide layer while the compound is at least in part in a liquid state.

Abstract: Improved methods for preparing a low-k dielectric material on a substrate using microwave radiation are provided. The use of microwave radiation allows the preparation of low-k films to be accomplished at low temperatures. According to various embodiments, microwave radiation is used to remove porogen from a precursor film and/or to increase the strength of the resulting porous dielectric layer. In a preferred embodiment, methods involve (a) forming a precursor film that contains a porogen and a structure former on a substrate, (b) exposing the precursor film to microwave radiation to remove the porogen from the precursor film to thereby create voids within the dielectric material and form the porous low-k dielectric layer and (c) exposing the dielectric material to microwave radiation in a manner that increases the mechanical strength of the porous low-k dielectric layer.

Abstract: A wall surface of a film forming container is heated to or above a vaporization temperature of a material monomer, which is used to form an organic film, by using an external heater formed along the wall surface of the film forming container, substrates are heated to a thermal polymerization reaction temperature by using an internal heater that is disposed apart from the external heater and near a substrate-supporting container in which the substrates are received, and the organic film is formed through thermal polymerization occurring on the substrates by supplying the material monomer into the film forming container.