Inorganic Silicon-containing Coating Patents (Class 427/397.7)
  • Publication number: 20020110644
    Abstract: Wood cellulose is treated with a reactive silicate. The reaction is done to cellulose within the wood and may be catalyzed with acid or base catalysts or a carbon silicon halogen combination which produces in situ acid catalysts or a different combination to produce an in situ base catalyst which replaces some of the molecules or atoms within the cellulose structure with silicon, boron or other hydrophobic or anti-degrading agents. Preferably an organic solvent, such as alcohol is used to accelerate the reaction with the water in the wood. Here, the hydroxyl (OH) group on some or all of the cellulose molecules is partially replaced with silicon or an alternative atom or molecule to changes the character of the wood. The process may be modified to insert a preliminary step of adding a reactive agent to be locked into the wood. Manufacturing techniques to enhance the process using ultrasound or other wave generating techniques are also taught.
    Type: Application
    Filed: June 20, 2001
    Publication date: August 15, 2002
    Inventor: Darrell W. Kelsoe
  • Publication number: 20020078856
    Abstract: The disclosure relates to temporary corrosion resistant coatings and films upon metal substrates, e.g., metal tools and dies. The temporary coatings and films will not adversely chemically alter the surface of the underlying substrate. The coatings/films comprise a mixture of at least one of an acrylic, water, an oil, silica, at least one silicate, surfactants and optionally one or more buffering materials and waxes.
    Type: Application
    Filed: December 10, 2001
    Publication date: June 27, 2002
    Inventors: John Hahn, Robert L. Heimann, Daniel I. Crosby
  • Patent number: 6407011
    Abstract: A stacked insulating film having an organic insulating film, and a carbon-containing silicon oxide film formed on the organic insulating film is disclosed. The carbon-containing silicon oxide film has a carbon content of 8 atom % to 25 atom %.
    Type: Grant
    Filed: July 26, 2000
    Date of Patent: June 18, 2002
    Assignee: Sony Corporation
    Inventors: Koichi Ikeda, Masanaga Fukasawa, Hideyuki Kito, Toshiaki Hasegawa
  • Patent number: 6406789
    Abstract: Composite particles made of a resin and filler material are provided for use in subterranean formations. The filler is finely divided mineral and optional fiber. The particles are proppants useful to prop open subterranean formation fractures. The particles are also useful for water filtration. Methods of making the composite particles are also disclosed.
    Type: Grant
    Filed: May 22, 2000
    Date of Patent: June 18, 2002
    Assignee: Borden Chemical, Inc.
    Inventors: Robert R. McDaniel, Johannes A. Geraedts
  • Patent number: 6406758
    Abstract: A method of applying a protective coating to a touch screen panel. A coating material which cures at an elevated temperature is applied to a touch screen panel on at least one surface thereof. The panel is then heated to a temperature which does not adversely affect the panel by irradiating the panel imparting energy to the coating material to more fully cure the coating material in a shorter time period without damaging the panel.
    Type: Grant
    Filed: July 25, 2000
    Date of Patent: June 18, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Frank J. Bottari, Paul J. Richter, Chia-Yen Li
  • Patent number: 6398826
    Abstract: Provided are an abrasive tape suitable for finishing of surfaces or the like of precision components such as optical connector ferrules and semiconductor wafers, and a process for producing it. A coating agent in which abrasive particles having an average particle size in the range of 1 to 200 m&mgr; are dispersed in a binder resin solution. The coating agent is applied, with intervention of a primer layer if necessary, onto a base for abrasive tape to form an abrasive layer, thus obtaining an abrasive tape.
    Type: Grant
    Filed: October 13, 2000
    Date of Patent: June 4, 2002
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Kazuhito Fujii, Masahisa Yamaguchi, Takaki Miyachi, Kojiro Okawa, Yasuki Suzuura
  • Patent number: 6395338
    Abstract: Process for the continuous coating of a strip of paper or of a textile support using a silicone composition, comprising at least one POS A containing SiVi or SiOR groups, a POS B containing SiH groups and a catalyst C (for hydrosilylation or for dehydrogeno-condensation) and not corresponding to an LTC/FC silicone system, the said process comprising the following steps: step 1 in which conditions for homogeneously mixing the constituents A, B and C are used such that the homogeneity obtained is reflected by a DSC signature comprising a Gaussian peak for which the peak end temperature T3 is in the range from a value above 110° C. to 200° C.
    Type: Grant
    Filed: March 19, 1999
    Date of Patent: May 28, 2002
    Assignee: Rhodia Chimie
    Inventors: Jean-Paul Benayoun, Christophe Guyot, Andre Lievre, Christian Mirou, Francois Desne, Bernard Mirabel, Alain Pouchelon
  • Patent number: 6391383
    Abstract: A high emittance glass coating material which is applied to a surface of a specific structural body and fired on the surface, for providing on the surface a glass coating having a glass structure in which pigment particles having a predetermined degree of emissivity are dispersed, the high emittance glass coating material being characterized by including: a pigment covering film having a predetermined thickness, which is provided to cover each of the pigment particles, and which includes silicon dioxide (SiO2) such that a content of the silicon dioxide in the pigment covering film is higher than a content of the silicon dioxide in each portion of the glass structure which is adjacent to a corresponding one of the pigment particles.
    Type: Grant
    Filed: November 27, 1998
    Date of Patent: May 21, 2002
    Assignee: Noritake Co., Ltd.
    Inventors: Hirokazu Matsunaga, Misao Iwata, Shinji Kato, Kenji Yano, Kazuhiro Horimi, Yoshitsugu Kato, Takamitsu Isogai, Masakazu Hiyoshi, Takamitsu Fukui
  • Patent number: 6391395
    Abstract: The present invention is directed to a method of forming a polysilicon layer. A light shield layer having a super-resolution near-field structure is arranged on an amorphous silicon layer. The super-resolution near-field structure includes a first dielectric layer, a second dielectric layer, and an active layer between the first dielectric layer and the second dielectric layer. The light shield layer is irradiated by a laser beam having a first intensity to generate a transmitted laser beam having a second intensity. The second intensity is greater than the first intensity. An annealing process is performed to irradiate the amorphous silicon layer with the transmitted laser beam having a second intensity thereby converting the amorphous silicon layer into a polysilicon layer.
    Type: Grant
    Filed: October 23, 2000
    Date of Patent: May 21, 2002
    Assignee: Ritek Corporation
    Inventors: Tzu-Feng Tseng, Yi-Ming Chen, Wen-Rei Guo
  • Patent number: 6391388
    Abstract: A process for producing a multicolored print by employing a color scanner that is capable of being profiled and an electronic image processor. Color data pertaining to color fields are taken as the basis for determining an algorithm for the printable color range and the separation, the color data being generated by employing ceramic colors of a multicolor set that are compatible with one another. With a view to producing four-color prints and also, in particular, seven-color prints that are truer to the original, four-color and seven-color sets as claimed are employed such as were taken as the basis for the color fields for determination of the algorithm. By means of seven-color printing, the color space is extended.
    Type: Grant
    Filed: October 9, 1998
    Date of Patent: May 21, 2002
    Assignee: dmc
    Inventors: Hans Hilgenfeld, Fritz Diefenbach, Karl Koch
  • Patent number: 6387453
    Abstract: An evaporation-induced self-assembly method to prepare a porous, surfactant-templated, thin film by mixing a silica sol, a solvent, a surfactant, and an interstitial compound, evaporating a portion of the solvent to form a liquid, crystalline thin film mesophase material, and then removal of the surfactant template. Coating onto a substrate produces a thin film with the interstitial compound either covalently bonded to the internal surfaces of the ordered or disordered mesostructure framework or physically entrapped within the ordered or disordered mesostructured framework. Particles can be formed by aerosol processing or spray drying rather than coating onto a substrate. The selection of the interstitial compound provides a means for developing thin films for applications including membranes, sensors, low dielectric constant films, photonic materials and optical hosts.
    Type: Grant
    Filed: March 2, 2000
    Date of Patent: May 14, 2002
    Assignee: Sandia Corporation
    Inventors: C. Jeffrey Brinker, Yunfeng Lu, Hongyou Fan
  • Patent number: 6387452
    Abstract: The present invention relates to an anti-adhesion treatment process by continuous coating of a strip of paper, this coating comprising a silicone composition based on polyorganosiloxanes (POSs) of FC/LTC type. According to this process, a POS A, a crosslinking agent B (hydrosilylation and/or dehydrogenopolycondensation), a catalyst C and, optionally, an inhibitor D, an adhesion modifier E and other compounds F are used. These constituents A to F are mixed continuously and in metered amounts, selecting mixing conditions such that the bath lifetime BLT is <10 h, such that the bath homogeneity is such that its DSC signature comprises a Gaussian peak (FIG. 2), and such that the flow rate of production of the homogeneous mixture A to F is such that the duration d separating the placing together of the components A, B and C and the time of application of the composition to the traveling support strip is less than or equal to the BLT.
    Type: Grant
    Filed: February 2, 1999
    Date of Patent: May 14, 2002
    Assignee: Rhodia Chimie
    Inventors: Jean-Paul Benayoun, Christophe Guyot, André Lievre, Christian Mirou
  • Patent number: 6383563
    Abstract: A process for treating zeolite membranes to improve their performance and to improve their coherence consists of forming a film of zeolite material on a porous support to form a zeolite membrane, contacting the membrane with tetraethylorthosilicate (TEOS), and reacting said TEOS with said zeolite membrane to form a supported membrane with open pores without defective pin holes. The process may further comprise pre-treatment of the porous support with a zeolite initiating agent, or post-treatment of the treated membrane with a silicic or polysilicic acid.
    Type: Grant
    Filed: September 25, 1998
    Date of Patent: May 7, 2002
    Assignee: Smart (Isle of Man) Limited
    Inventors: Graham John Bratton, Karon Doreen Buck, Timothy De Villiers Naylor
  • Patent number: 6376089
    Abstract: The present invention provides a process for producing a rare earth metal-based permanent magnet having, on its surface, a corrosion-resistant film containing inorganic fine particles having a specific average particle size and dispersed in a film phase formed from a silicon compound. In a heat treatment for forming a film by a hydrolyzing reaction and a thermally decomposing reaction of the silicon compound, followed by a polymerizing reaction, a stress is generated within the film by the shrinkage of the film. In the corrosion-resistant film formed by the producing process according to the present invention, however, such stress is dispersed by the presence of the inorganic fine particles and hence, the generation of physical defects such as cracks is inhibited. In addition, voids between the adjacent inorganic fine particles are filled with the film phase formed from the silicon compound and hence, the formed film is dense.
    Type: Grant
    Filed: August 29, 2000
    Date of Patent: April 23, 2002
    Assignee: Sumitomo Special Metals Co., Ltd.
    Inventors: Takeshi Nishiuchi, Atsushi Kikugawa, Fumiaki Kikui
  • Patent number: 6364993
    Abstract: A laminate and a method for making a laminate having a hidden or shielded image. The laminate includes a substrate having an first surface containing an image thereon and a polymeric film laminated to the first substrate surface overlying the image. The film contains an exposed water activatable opaque layer having a thickness ranging from about 0.60 mil to about 2.0 mil, the opaque layer including aluminum silicate and a binder. Upon wetting the opaque layer, the hidden or shielded image is revealed. The method includes a means for producing the laminate in high volumes for minimizing the production costs thereof. Upon drying the opaque layer, the image is again hidden or shielded from view. The laminate may be used multiple times without adversely affecting its ability to reveal and hide images.
    Type: Grant
    Filed: September 1, 1999
    Date of Patent: April 2, 2002
    Inventors: Bryan A. Netsch, Mark H. Bailey
  • Patent number: 6365228
    Abstract: A process for spin-on coating with an organic material having a low dielectric constant, which is suitable for a substrate. A dielectric base layer capable of protecting metal is formed on the substrate, an adhesive promoter layer is formed on the dielectric base layer, and the adhesive promoter layer is baked. A solvent is then used to clean the substrate and simultaneously to dissolve a part of the adhesive promoter layer in order to flatten the adhesive promoter layer. Afterwards, a layer of an organic material with a low dielectric constant is spin-on coated on the adhesive promoter layer, and the layer of an organic material with a low dielectric constant is baked and cured.
    Type: Grant
    Filed: October 10, 2000
    Date of Patent: April 2, 2002
    Assignee: United Microelectronics Corp.
    Inventors: Cheng-Yuan Tsai, Ming-Sheng Yang, Chin-Hsiang Lin
  • Patent number: 6358565
    Abstract: The present invention relates to a method for making a protective coating containing silicon carbide on at least a portion of the surface of a substrate made from a material with a softening temperature that is above the temperature applied to make the protective coating, where silicon is deposited on the portion of the surface of the substrate and where, under vacuum or in an inert atmosphere, the substrate is heated to a temperature above the melting point of silicon, and the silicon is brought to reaction with carbon that is contained in a porous coating. The surface of the object to be coated is initially provided with a porous carbon coating with an open porosity in a range between 40 and 95%, where said porous carbon coating is covered with a uniform coating of silicon, where the ratio in percent of mass (Ma-%) of the applied silicon to that of the carbon in the porous carbon coating is greater than 2.
    Type: Grant
    Filed: July 16, 1999
    Date of Patent: March 19, 2002
    Assignee: Deutsches Zentrum fuer Luft-und Raumfahrt E.V.
    Inventors: Walter Krenkel, Thilo Henke
  • Patent number: 6350648
    Abstract: The present invention provides methods of forming in situ doped rugged silicon and semiconductor devices incorporating conductive rugged silicon. In one aspect, the methods involve forming a layer of doped amorphous silicon on a substrate at a substantially constant deposition temperature; and converting the amorphous silicon layer into hemispherical grain silicon by annealing the amorphous silicon layer at substantially the deposition temperature while varying pressure. In another aspect, the methods involve forming a discontinuous first layer of doped silicon on a substrate; forming a second layer of amorphous silicon on the first layer of doped silicon and the substrate not covered by the first layer of doped silicon; and annealing the first and second layers. In yet another aspect, the methods involve forming a discontinuous first layer of silicon on a substrate and forming a second conformal layer of doped amorphous silicon on the first layer of doped silicon.
    Type: Grant
    Filed: February 14, 2000
    Date of Patent: February 26, 2002
    Assignee: Micron Technology, Inc.
    Inventors: Er-Xuan Ping, Randhir Thakur
  • Patent number: 6344242
    Abstract: A sol-gel catalyst composition for electroless plating includes a metal alkoxide in a polar organic solvent, an acid, a chloride salt or acid chloride, and a catalytic metallic salt. The sol-gel catalyst adheres to smooth surfaces without the preconditioning normally associated with other sol-gel smooth surface catalyst, as well as a method for coating a substrate with the sol-gel catalyst composition, and then a metallic platting solution.
    Type: Grant
    Filed: September 10, 1999
    Date of Patent: February 5, 2002
    Assignee: McDonnell Douglas Corporation
    Inventors: Richard D. Stolk, Mark R. Rahe
  • Publication number: 20020006518
    Abstract: The present invention relates to coated thermoplastic polymeric compositions and methods of making and using such compositions. The coating comprises at least one mineral, and clays in particular, and renders the composition less permeable to gases, such as oxygen and carbon dioxide.
    Type: Application
    Filed: December 20, 2000
    Publication date: January 17, 2002
    Inventors: Steven Raymond Lustig, Eric M. Smith
  • Patent number: 6329017
    Abstract: The present invention is a mesoporous silica film having a low dielectric constant and method of making having the steps of combining a surfactant in a silica precursor solution, spin-coating a film from this solution mixture, forming a partially hydroxylated mesoporous film, and dehydroxylating the hydroxylated film to obtain the mesoporous film. It is advantageous that the small polyoxyethylene ether surfactants used in spin-coated films as described in the present invention will result in fine pores smaller on average than about 20 nm. The resulting mesoporous film has a dielectric constant less than 3, which is stable in moist air with a specific humidity. The present invention provides a method for superior control of film thickness and thickness uniformity over a coated wafer, and films with low dielectric constant.
    Type: Grant
    Filed: October 4, 1999
    Date of Patent: December 11, 2001
    Assignee: Battelle Memorial Institute
    Inventors: Jun Liu, Karel Domansky, Xiaohong Li, Glen E. Fryxell, Suresh Baskaran, Nathan J. Kohler, Suntharampillai Thevuthasan, Christopher A. Coyle, Jerome C. Birnbaum
  • Patent number: 6329062
    Abstract: A two-component porous material including small silicalite crystals in a porous binder provides a low dielectric constant material useful as an insulating layer in microelectronic devices. The silicalite/binder porous material uses silicalite nanocrystals smaller than the characteristic dimensions of the features on the integrated circuit device. The binder is an amorphous porous material that links the silicalite nanocrystals together, formed from a precursor which polymerizes on heating. The silicalite nanocrystals are supplied as a colloidal suspension or slurry. The slurry and binder precursor are spincoated onto a substrate and thermally treated to polymerize the binder precursor and drive off solvent in the slurry, forming the porous silicalite/binder material. The silicalite/binder porous material is readily integrated into standard damascene fabrication processes.
    Type: Grant
    Filed: February 29, 2000
    Date of Patent: December 11, 2001
    Assignee: Novellus Systems, Inc.
    Inventor: Justin F. Gaynor
  • Patent number: 6322850
    Abstract: The reaction product is derived from a composition containing one of seven silanes; dimethyldiethoxysilane, methyldiethoxysilane, dimethyldimethoxysilane, diphenyldimethoxysilane, trimethylmethoxysilane, trimethylethoxysilane, or aminopropyltriethoxysilane, a multi-functional polydimethyl siloxane emulsified polymer, a compatible surfactant, ethanol and a majority component of water. In the method, the reaction product is applied to a heated surface of a mold core to create a semi-permanent coating to facilitate multiple releases of molded parts. If not heated, the mold core must be dried to remove water.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: November 27, 2001
    Assignee: TSE Industries, Inc.
    Inventors: William D. Stephens, Patricia R. Bertolucci
  • Patent number: 6319854
    Abstract: An organic acid containing solution obtained by adding an organic acid having an alkyl group to a solution including silanol condensate particles is applied on a substrate so as to form a coating film. The coating film is heat treated so as to form a porous film.
    Type: Grant
    Filed: September 28, 2000
    Date of Patent: November 20, 2001
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Nobuo Aoi
  • Patent number: 6316048
    Abstract: A method for enhancing the cooling capability of a turbine component made from a ceramic matrix composite. The method improves the thermal performance of the component by producing a surface having increased cooling capacity, thereby allowing the component to operate at a higher temperature. The method tailors the available surface area on the cooling surface of the composite component by depositing a particulate layer of coarse grained ceramic powders of preselected size onto the surface of the ceramic matrix composite component. The size of the particulate is selectively tailored to match the desired surface finish or surface roughness of the article. The article may be designed to have different surface finishes for different locations, so that the application of different sized powders can provide different cooling capabilities at different locations, if desired.
    Type: Grant
    Filed: July 11, 2000
    Date of Patent: November 13, 2001
    Assignee: General Electric Company
    Inventors: James Dale Steibel, David Alan Utah
  • Patent number: 6316051
    Abstract: Silicon carbide fibers having an excellent mechanical strength and a superior heat resistance can be produced by the process in which activated carbon fibers having a thickness of 1 to 30 &mgr;m and a BET specific surface area of 700 to 1500 m2/g are reacted with a silicon and/or silicon oxide gas at 1200 to 1500° C. under a reduced pressure or in an inert gas atmosphere; and the resultant SiC fibers are heat treated in the presence of a boron-containing substance and optionally a carbon-containing substance at 1700 to 2300° C. in an inert gas atmosphere, wherein the fibers may be in the form of a shaped article, for example, a sheet or honeycomb structure.
    Type: Grant
    Filed: December 21, 1998
    Date of Patent: November 13, 2001
    Assignee: Oji Paper Co., Ltd.
    Inventor: Kaoru Okada
  • Patent number: 6316111
    Abstract: A heat-resistant transparent glass article is formed with an inner sandwich structure comprising a metallic infrared-reflective metal film sandwiched between thin protective silicon films, the inner sandwich structure in turn being sandwiched between transparent dielectric films and the film stack being deposited upon a glass substrate. One or both of the transparent dielectric films may also contain silicon.
    Type: Grant
    Filed: March 1, 1996
    Date of Patent: November 13, 2001
    Assignee: Cardinal CG Company
    Inventor: Annette J. Krisko
  • Patent number: 6309705
    Abstract: A high reflectance-low stress Mo—Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R≧65%) and low residual stress (≦100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall “relaxation” effect without reducing the reflectance significantly.
    Type: Grant
    Filed: January 13, 2000
    Date of Patent: October 30, 2001
    Assignee: The Regents of the University of California
    Inventors: Claude Montcalm, Paul B. Mirkarimi
  • Patent number: 6294218
    Abstract: In a process for coating a substrate, a texture (4) is created in a portion of its surface. A first layer (5) to be applied on the surface of the substrate adheres better to the texture (4) than it does to a surface area located outside of the texture (4). Then, the layer (5) is applied to the surface of the substrate and after that, areas of the layer projecting laterally beyond the texture (4) are mechanically removed. The material of the texture (4) contains at least one chemical element or a compound, which the layer (5) does not have or has only in a smaller concentration than the material of the texture (4). On the first layer (5), at least one second layer (7) is then applied which does not have the chemical element or compound contained in the material of the texture (4), or it has it only in a smaller concentration than the material of the texture (4).
    Type: Grant
    Filed: June 25, 1999
    Date of Patent: September 25, 2001
    Assignee: Micronas GmbH
    Inventors: GĂ¼nter Igel, Joachim Krumrey
  • Patent number: 6291022
    Abstract: A water-repellent glass having a durable and abrasion-resistant silica layer is prepared by a process containing the following steps: (a) preparing a silica solution by subjecting a metal alkoxide-based silane compound to a two step aging process wherein the two step aging process is proceeded either by conducting a first aging step under a basic condition and a second aging step under an acidic condition or vice versa, (b) applying the resulting silica composition onto the surface of a glass substrate, (c) subjecting the glass substrate coated with the silica composition to a thermal treatment, and (d) coating the resulting coarse silica layer with a water-repellent layer.
    Type: Grant
    Filed: January 18, 2000
    Date of Patent: September 18, 2001
    Assignee: Samsung Corning Co., Ltd.
    Inventors: Byung Sun Hong, Joo Hun Han
  • Patent number: 6291020
    Abstract: A method of forming a hydrophilic coating on a metal surface which includes contacting the metal surface with a substantially silane-free aqueous solution containing a cationic polymer and an alkaline aqueous silicate.
    Type: Grant
    Filed: August 8, 1996
    Date of Patent: September 18, 2001
    Assignee: Betzdearborn Inc.
    Inventors: Jeffrey I. Melzer, Richard J. Sujdak
  • Patent number: 6280700
    Abstract: A film containing TiO2 and SiO2. It is formed by depositing TiO2 and SiO2 onto a substrate by sputtering method, or depositing their vapors thereon. The film is heat treated at a temperature of 200-1200° C. to form a film of anatase type TiO2 containing SiO2.
    Type: Grant
    Filed: June 8, 1999
    Date of Patent: August 28, 2001
    Assignee: Agency of Industrial Science & Technology
    Inventors: Junji Nishii, Adilson Oliveira da Silva, Derek A. H. Cunningham, Takahiro Inoue
  • Patent number: 6281152
    Abstract: A conventional black oxide colorant used for the shielding coat membrane of the D2R type discharge lamps for automobiles has a problem that its wettablity with the granulated glass is not good so that a strong membrane is difficult to be obtained. A paint for the shielding coat membrane comprises polycrystalline silica and Mn-doped ferric oxide as a black colorant, which has a good wettability with the granulated glass and a shielding characteristics so as to improve the membrane strength, thereby providing a lamp with the shielding coat membrane that passes all evaluation test in the view point of the membrane strength, the light transmissivity, the discoloration, the suppression of pealing-off and cracking.
    Type: Grant
    Filed: June 15, 1999
    Date of Patent: August 28, 2001
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tatsuo Mifune, Masaru Ikeda
  • Patent number: 6264907
    Abstract: The present invention relates to a process for easily and efficiently producing silica particles having a narrow particle size distribution and a high porosity from inexpensive starting materials such as sodium silicate. The silica particles of the present invention can be obtained in the form of a slurry containing them by (1) forming a slurry by mixing first particles difficultly soluble in an alkali and soluble in an acid, with an aqueous alkali silicate solution to form a first slurry containing the first particles, (2) neutralizing the first slurry with a mineral acid to prepare a second slurry containing second particles wherein silica is deposited on the first particles, and (3) adding a mineral acid to the second slurry to dissolve the first particles from the second particles, to prepare a third slurry containing silica particles.
    Type: Grant
    Filed: March 11, 1999
    Date of Patent: July 24, 2001
    Assignee: OJI Paper Co., Ltd.
    Inventors: Masashi Matsuda, Masasuke Watanabe, Hitoshi Okada, Motohide Wada, Osamu Kitao
  • Patent number: 6254935
    Abstract: A method for applying a barrier layer which comprises a barium-strontium aluminosilicate to a silicon containing substrate which inhibits the formation of cracks.
    Type: Grant
    Filed: April 15, 1999
    Date of Patent: July 3, 2001
    Assignee: United Technologies Corporation
    Inventors: Harry E. Eaton, Thomas H. Lawton
  • Patent number: 6248403
    Abstract: A non-chrome process for the pretreatment of substrate surfaces to simultaneously clean them and improve their bonding strength for organic coatings such as adhesives, protective primers, sealants, paints, composites and similar materials conventionally bonded to such substrates, including non-chromated or chromated curable organic resin protective coatings applied directly to bare aluminum substrates. The invention involves the use of novel wipe solvent compositions containing a major volume of an environmentally-safe volatile organic solvent which has a low composite vapor pressure or is otherwise exempt from federal, state or local regulations, and a minor volume of a polyfunctional coupling agent, preferably of the silane type.
    Type: Grant
    Filed: January 3, 2000
    Date of Patent: June 19, 2001
    Assignee: Northrop Grumman Corporation
    Inventors: John Douglas Weir, Joanne Swiderski McLaughlin
  • Patent number: 6241859
    Abstract: The present invention provides a method of forming a silicide layer on a silicon region. The method comprises the following steps. A first refractory metal layer is formed on the silicon region. The first refractory metal layer is made of a first refractory metal. A second refractory metal layer is formed on the first refractory metal layer. The second refractory metal layer is made of a second refractory metal and containing nitrogen. The second refractory metal layer has a film stress of not higher than 1×1010 dyne/cm2. A heat treatment is carried out in a first atmosphere substantially free of nitrogen so as to cause a silicidation of a lower region of the first refractory metal layer, whereby a C49-structured refractory metal silicide layer is formed on the silicon region.
    Type: Grant
    Filed: August 24, 1998
    Date of Patent: June 5, 2001
    Assignee: NEC Corporation
    Inventors: Yoshiaki Yamada, Yoshihisa Matsubara, Takashi Ishigami
  • Patent number: 6239243
    Abstract: A method for the preparation of hydrophilic silica gels with high pore volume. In the preferred method a hydrophilic silica hydrogel treated with an organosilicon compound to effect hydrophobing of the silica hydrogel is heated in the presence of an oxidizing atmosphere to a temperature sufficient to reduce the hydrophobicity imparted by the surface treatment thereby producing a hydrophilic silica gel having high pore volume.
    Type: Grant
    Filed: June 10, 1999
    Date of Patent: May 29, 2001
    Assignee: Dow Corning Corporation
    Inventors: Qin Deng, James Richard Hahn, Kiersten Lynn Shephard
  • Patent number: 6235348
    Abstract: A rust preventive composition including (a) a silicic acid compound and (b) an aromatic amine-based condensation product is provided, which is effective in preventing a Zn-based metallic coating from rusting. Rusting is prevented by forming a coating film contaning the components (a) and (b) on the surface of the Zn-based metallic coating formed on a base such as a metal plate. The resulting coating film exhibits an excellent corrosion resistance, gives no fear of a health problem such as carcinogensis and provides a desirable black or blackish appearance to a metal surface. In an embodiment wherein a second coating film containing a silicic acid compound is formed on the first coating film, the corrosion resistance is further improved.
    Type: Grant
    Filed: May 12, 1999
    Date of Patent: May 22, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihide Shimizu, Mikio Watanabe, Tamaki Iida
  • Patent number: 6228437
    Abstract: The present invention is a process for modifying the properties of a porous freeform fabricated part by increasing its density and reducing its porosity. The porosity and density of a freeform fabricated part are altered by packing the pores in a freeform part with an infiltrant, such as a preceramic polymer. The process includes drawing a vacuum on or pressurizing the freeform part while it is in an infiltrant bath, thereby forcing the infiltrant into the pores of the freeform part. After removing the densified freeform part from the infiltrant bath, the freeform part is subjected to a treating process, such that the infiltrant within the pores transforms to a ceramic or ceramic-containing phase to thereby increasing the density of the freeform part.
    Type: Grant
    Filed: May 13, 1999
    Date of Patent: May 8, 2001
    Assignee: United Technologies Corporation
    Inventor: Wayde R. Schmidt
  • Patent number: 6224944
    Abstract: The invention concerns a method of protecting a surface of a carbonatic material from corrosion, the method comprising treatment of the material surface with an acidic cationic silica sol, the pH of the sol preferably being from about 4 to about 7. The invention also concerns a new silica sol useful for performing the method and a method of preparing the new silica sol. Further, the invention concerns carbonatic material comprising a surface layer of silica, the surface of the silica particles comprising a polyvalent metal oxide/hydroxide.
    Type: Grant
    Filed: October 27, 1994
    Date of Patent: May 1, 2001
    Assignee: EKA Nobel AB
    Inventors: Marek Tokarz, Michael Persson, Roman Kozlowski
  • Patent number: 6220055
    Abstract: A composite glass article having a chemically modified ceramic surface whose coefficient of thermal expansion is lower than that of the glass substrate is produced by exposing the glass article maintained at a temperature above its annealing point (typically 500° C.) and below its softening point (soda-lime about 725° C.; borosilicate about 800° C.) to an atmosphere containing prescribed metalorganic compounds. The chemically modified ceramic surface in maintained in compression and is a ceramic consisting of members from a specific group of oxides dependent upon the type of glass comprising the substrate. The method for forming the glass composite article includes applying the metalorganic mixture while the glass substrate is maintained at a temperature above its annealing point (typically 500° C.) and below its softening point (soda-lime about 725° C.; borosilicate about 800° C.) to an atmosphere containing prescribed metalorganic compounds.
    Type: Grant
    Filed: November 20, 1998
    Date of Patent: April 24, 2001
    Inventors: Josef Francel, Charles P. Duck
  • Patent number: 6210749
    Abstract: This invention pertains to a method for producing thermally stable multi-layer coatings and the coatings produced therefrom. The multi-layer coating is comprised of a first coating produced from hydrogen silsesquioxane having a thickness of 1.25 to 2.25 &mgr;m and a second coating comprising silicon dioxide having a thickness of at least 100 nm. The method for producing the first coating comprises applying a fillerless hydrogen silsesquioxane resin composition onto a substrate and thereafter heating the hydrogen silsesquioxane resin at a temperature of 150° C. to 500° C. for a sufficient period of time to produce a crack-free coating having a thickness of 1.25 &mgr;m to 2.25 &mgr;m. The second coating is produced by depositing, preferably by PECVD, silicon dioxide over the first coating at a thickness of at least 100 nm.
    Type: Grant
    Filed: March 1, 2000
    Date of Patent: April 3, 2001
    Assignee: Dow Corning, Corporation
    Inventors: Jeffrey Nicholas Bremmer, Kyuha Chung, Chandan Kumar Saha, Michael John Spaulding
  • Patent number: 6194029
    Abstract: An organic acid containing solution obtained by adding an organic acid having an alkyl group to a solution including silanol condensate particles is applied on a substrate so as to form a coating film. The coating film is heat treated so as to form a porous film.
    Type: Grant
    Filed: February 3, 1999
    Date of Patent: February 27, 2001
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Nobuo Aoi
  • Patent number: 6177186
    Abstract: An air sprayable, fluid, non-metallic coating mixture to provide an article coating having the ability to reflect at least 75% of heat energy in the frequency range of up to 2.6 microns comprises the combination of two different alpha alumina powders. A first powder predominantly is in a particle size range of less than about 1 micron; a second powder is of a particle size greater than 7 times the particle size of the first powder. The mixture includes a glass powder having a melting point of at least about 1400° F. and of a particle size less than about 45 microns. The mixture includes a binder that will form up to about 80% of its weight in silica when heated to a temperature of at least the melting point of the glass powder. In the article coating, provided by air spraying the mixture onto an article and heating to a temperature sufficient to melt the glass powder and to form the silica from the binder, the glass and silica form a matrix about and binding together the alumina powder.
    Type: Grant
    Filed: April 30, 1999
    Date of Patent: January 23, 2001
    Assignee: General Electric Company
    Inventors: Andrew J. Skoog, Norbert O. Maurer, Jane A. Murphy
  • Patent number: 6177127
    Abstract: A method for reliably forming polysilicon of a desired surface roughness includes providing a layer of doped or undoped amorphous silicon on a substrate and heating said substrate while monitoring the emission of said substrate and comparing the monitored emission with an expected emission attributable to the heating regime employed. An increase in the monitored emission not attributable to the heating regime signals a transition of the layer of amorphous silicon to rough polysilicon. A decrease in the monitored emission not attributable to the heating regime signals a transition to smooth polysilicon. The increases and decreases in the monitored emission can be used to end the heating regime at the time at which the desired surface roughness of polysilicon is formed, or merely to passively monitor the process. The power supplied to heat the substrate to a desired temperature can also be monitored, in that a drop in required power is indicative of the formation of polysilicon.
    Type: Grant
    Filed: November 13, 1998
    Date of Patent: January 23, 2001
    Assignee: Micron Technology, Inc.
    Inventors: Ronald A. Weimer, Avishai Kepten, Michael Sendler
  • Patent number: 6171655
    Abstract: A constructional finished wallboard is formed of a mixture including 50 to 65 wt. % of dried shirasu, 30 to 40 wt. % of a plaster component, 3 to 10 wt. % of a clay component, 5 to 10 wt. % of shirasu balloons, 0.8 to 2 wt. % of a bond reinforcing component, 0.01 to 3 wt. % of a color pigment, and 1 to 5 wt. % of fibers for plaster. In preparing the wallboard, after preparing the mixture, an appropriate amount of water is added to the mixture to mix together, which is applied onto a substrate. Then, the surface of the mixture on the substrate is finished, followed by drying to thereby form the constructional finished board.
    Type: Grant
    Filed: July 16, 1999
    Date of Patent: January 9, 2001
    Assignee: Takachiho Corp.
    Inventor: Masahiro Shintome
  • Patent number: 6171651
    Abstract: A process for the coating of glass microspheres with an aluminium hydroxide, which involves the hydrothermal treatment of a suspension of complexed Al3+-ions with glass microspheres. The aluminium hydroxide coated glass microspheres can be applied in the production of light weight glass-reinforced plastic materials, e.g., for use in mass transportation.
    Type: Grant
    Filed: July 22, 1999
    Date of Patent: January 9, 2001
    Assignee: Martinswerk GmbH fur Chemische und Metallurgische Produktion
    Inventor: Neil Brown
  • Patent number: H2014
    Abstract: Excellent adhesion of vitreous enamel to steel can be achieved via an intermediate layer formed on the steel by bringing it into contact with a liquid composition that contains water and a component of solute selected from the group consisting of dissolved silicates and dissolved borates and, optionally, surfactant. The modification of the steel surface achieved by treating it with silicates and/or borates is also effective for improving the adhesion of steel to other protective type coatings such as paint.
    Type: Grant
    Filed: April 20, 2000
    Date of Patent: February 5, 2002
    Assignee: Henkel Corporation
    Inventors: Mervet S. Boulos, Bruce F. Caswell
  • Patent number: RE37779
    Abstract: In an adsorbing body for humidity and odorous gas exchange such as an adsorbing sheet for dehumidification, an adsorbing element for dehumidification or an adsorbing element for total heat energy exchange, a sheet or a honeycomb laminate is impregnated or coated with silica sol containing, as solid content, not more than 30% of the silica sol weight of minute silica particles not larger than 120 Å in diameter which contain many stable silanol radicals on the surface and 0.01-1% of alkali metal ion Na2O. It is then dried to rigidly fix silica gel. Other humidity adsorbing or absorbing agents such as zeolite, organic high-polymer electrolyte, etc. may be mixed in said silica sol. Silica gel with excellent humidity adsorbing ability can be strongly adhered to a sheet or a honeycomb laminate in an extremely simple method.
    Type: Grant
    Filed: November 3, 1999
    Date of Patent: July 2, 2002
    Assignee: Seibu Giken Co., Ltd.
    Inventors: Toshimi Kuma, Noriaki Shirahama, Hiroaki Izumi