Nonuniform Or Patterned Coating (e.g., Mask, Printing, Textured, Etc.) Patents (Class 427/510)
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Patent number: 6004617Abstract: Methods and apparatus for the preparation and use of a substrate having an array of diverse materials in predefined regions thereon. A substrate having an array of diverse materials thereon is generally prepared by delivering components of materials to predefined regions on a substrate, and simultaneously reacting the components to form at least two materials. Materials which can be prepared using the methods and apparatus of the present invention include, for example, covalent network solids, ionic solids and molecular solids. More particularly, materials which can be prepared using the methods and apparatus of the present invention include, for example, inorganic materials, intermetallic materials, metal alloys, ceramic materials, organic materials, organometallic materials, non-biological organic polymers, composite materials (e.g., inorganic composites, organic composites, or combinations thereof), etc.Type: GrantFiled: June 7, 1995Date of Patent: December 21, 1999Assignees: The Regents of the University of California, Symyx TechnologiesInventors: Peter G. Schultz, Xiaodong Xiang, Isy Goldwasser
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Patent number: 6001414Abstract: A dual damascene processing method comprising the steps depositing sequentially a first oxide layer, a SRO layer and a second oxide layer over a substrate. Then, photolithographic and etching operations are conducted to form a via that links up with a desired wire-connecting region above the substrate. Next, another photolithographic and etching operations are conducted to form interconnect trench lines followed by the deposition of metal into the via and trench. Finally, the surface is polished with a chemical-mechanical polishing operation to remove the unwanted metal on the surface. The invention is capable of controlling the depth of trench and obtaining a smoother trench bottom for the metal lines. Furthermore, the separation of via and trench etching steps makes the control of the final etch profile much easier, thereby able to get an optimal result.Type: GrantFiled: December 16, 1997Date of Patent: December 14, 1999Assignee: United Microelectronics Corp.Inventors: Yimin Huang, Hsiao-Pang Chou, Tri-Rung Yew
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Patent number: 5993702Abstract: An embossed substrate comprising a substrate of a plastic material and having a surface and an embossed surface carried by the surface of the substrate. The embossed surface is characterized by having a pattern with an average roughness of between 100 nanometers and 300 nanometers with the roughness being distributed substantially uniformly over the surface, the pattern has ridges and valleys with the horizontal distance between adjacent ridges and/or valleys being greater than the depth between the ridges and the valleys. The peaks and the valleys are randomly disposed without periodicity to cause diffusion of light impinging thereon to minimize or eliminate interference effects when the embossed surface overcoated with thin planar organic layers is exposed to light.Type: GrantFiled: June 4, 1997Date of Patent: November 30, 1999Assignee: Flex Products, Inc.Inventor: Gregory F. Davis
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Patent number: 5994110Abstract: Compounds which possess a complementary structure to a desired molecule, such as a biomolecule, in particular polymeric or oligomeric compounds, which are useful as in vivo or in vitro diagnostic and therapeutic agents are provided. Also, various methods for producing such compounds are provided. These polymeric or oligomeric compounds are useful in particular as antimicrobial agents, receptor, hormone or enzyme agonists and antagonists.Type: GrantFiled: September 2, 1998Date of Patent: November 30, 1999Inventors: Klaus Mosbach, Peter A. G. Cormack, Olof Ramstrom, Karsten Haupt
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Patent number: 5989628Abstract: A plastic lens comprising the first acrylic hard coated layer formed on the outside surface of a plastic lens base and, on the inside surface, an antifogging coated layer while interposing of the second acrylic hard coated layer is obtained by coating both sides of a plastic lens base with an acrylic hard coating agent, masking the outside surface with a peelable masking agent (e.g., a coating composition containing poly(vinyl chloride) or a vinyl chloride-vinyl acetate copolymer), coating at least the inside surface with an antifogging agent, and removing the masking layer. As the hard coating agent or antifogging agent, use can be made of an ultraviolet-curable resin composition, and as the masking agent, a coating composition containing a poly-(vinyl chloride) or vinyl chloride-vinyl acetate copolymer may be employed.Type: GrantFiled: March 21, 1997Date of Patent: November 23, 1999Assignee: Daicel Abosisangyo Co., Ltd.Inventors: Mitsunobu Haga, Yoshio Onisawa, Kohei Shimizu
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Patent number: 5985377Abstract: A laser marking apparatus and method for marking the surface of a semiconductor chip are described herein. A laser beam is directed to a location on the surface of the chip where a laser reactive material, such as a pigment containing epoxy, is present. The heat associated with the laser beam causes the laser reactive material to fuse to the surface of the chip, creating a visibly distinct mark in contrast to the rest of the surface of the chip. Only reactive material contacted by the laser fuses to the chip surface, and the remaining residue on the non-irradiated portion can be readily removed.Type: GrantFiled: September 30, 1997Date of Patent: November 16, 1999Assignee: Micron Technology, Inc.Inventor: Tim J. Corbett
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Patent number: 5985420Abstract: A plastic lens comprising the first acrylic hard coated layer formed on the outside surface of a plastic lens base and, in the inside surface, an antifogging coated layer with interposing of the second acrylic hard coated layer is obtained by coating the both sides of a plastic lens base with an acrylic hard coating agent, masking the outside surface with a peelable masking agent (e.g. a coating composition containing poly(vinyl chloride) or vinyl chloride-vinyl acetate copolymer), coating at least the inside surface with an antifogging agent, and removing the masking layer. As the hard coating agent or antifogging agent, use can be made of an ultraviolet-curable resin composition, and as the masking agent, a coating composition containing a poly(vinyl chloride) or vinyl chloride-vinyl acetate copolymer may be employed.Type: GrantFiled: December 10, 1996Date of Patent: November 16, 1999Assignee: Daicel Abosisangyo Co., Ltd.Inventors: Mitsunobu Haga, Yoshio Onisawa, Kohei Shimizu
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Patent number: 5985376Abstract: An apparatus and method enables screen printing various articles such as glassware with a radiation curable composition using, for example, UV radiation and the like in pre-existing screen printing decorating equipment having a plurality of screen printing workstations. Particularly suitable compositions are those which are environmentally safe by virtue of being free of toxic heavy metals and volatile organic compounds. The applied inked image is at least partially cured at each screen printing workstation to form a skin on the surface of the transferred image of sufficient strength to support the next layer to be applied. The UV radiation may emanate opposing and underlying each of the screen printing workstations were brought thereto from a remotely positioned laser via a fiber optic bundle or light pipe.Type: GrantFiled: May 1, 1995Date of Patent: November 16, 1999Assignee: Revlon Consumer Products CorporationInventor: Melvin Edwin Kamen
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Patent number: 5980995Abstract: An insulated metallic strip suitable for use in the coils of power transformers and method of producing the same. Following the extrusion of a flat metallic strip of conductive material for winding into a magnet coil, the flat strip having a predetermined thickness and first and second sides bounded by a pair of fully rounded edges, the method of insulating the strip of conductive material by supporting the flat strip in a level state at a predetermined temperature in a vacuum chamber and while in the vacuum chamber applying a liquid coating of resin to the entire first side of the strip and the pair of rounded edges and extending onto the second side of the strip from each of the edges a distance at least as great as about 0.25" to prevent turn to turn discharge.Type: GrantFiled: January 19, 1999Date of Patent: November 9, 1999Assignee: ABB Power T&D Company Inc.Inventors: Thomas L. Linsenbardt, Norris L. Hill, Hoan Duy Le
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Patent number: 5981039Abstract: A magnetic recording medium in accordance with the present invention is constituted by a first magnetic film having a magnetic anisotropy in a first direction parallel to the film surface and a second magnetic film that is formed on the first magnetic film and that is made of an amorphous alloy film of a rare-earth metal and a transition metal having a magnetic anisotropy in a second direction that is parallel to the film surface, and different from the first direction. In the above-mentioned magnetic recording medium, the first and second magnetic films have magnetic anisotropies having directions parallel to their surfaces and different from each other. When a magnetic latent image is formed on the magnetic recording medium of this type, it is possible to reduce the height of serration in the serrate magnetization transition structure appearing in the border of magnetization inversion in the magnetic latent image.Type: GrantFiled: August 27, 1997Date of Patent: November 9, 1999Assignee: Sharp Kabushiki KaishaInventors: Hitoshi Isono, Kazuo Van
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Patent number: 5976444Abstract: The present invention is a process for making a nanochannel glass (NCG) rica, having the steps of: coating a face of an etched NCG with a replica material (with or without an intervening buffer layer), where the etched NCG face has a plurality of channels arranged in a desired pattern, to form a replica coating on the NCG conforming to the pattern; and removing the replica coating from the etched NCG. The present invention is also the replica made by this process.Type: GrantFiled: September 24, 1996Date of Patent: November 2, 1999Assignee: The United States of America as represented by the Secretary of the NavyInventors: Douglas H. Pearson, Ronald J. Tonucci
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Patent number: 5968606Abstract: The present invention provides a novel UV curable composition for forming thermally conductive interface and a method of using the same. The composition is used to promote the transfer of heat from a source of heat such as an electronic device to a heat dissipation device such as a heat sink. The composition comprises by weight from about 35% to about 75% of a UV curable acrylate material, from about 0.5% to about 15% catalyst, from about 10% to about 30% hydrocarbon solvent and from about 20% to about 70% conductive filler.Type: GrantFiled: June 30, 1997Date of Patent: October 19, 1999Assignee: Ferro CorporationInventors: Jesus E. Osuna, Keith M. Mason, Vernon E. Stygar
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Patent number: 5962581Abstract: A method of forming a pattern comprising the steps of forming a film of an organosilane compound comprising a polysilane having a repeating unit represented by the following general formula (1) on a substrate, irradiating an actinic radiation onto a predetermined portion of the film of the organosilane compound formed on the substrate, and removing the predetermined portion of the film irradiated by the actinic radiation by dissolving it with an aqueous alkaline developing solution. ##STR1## wherein Ar is a substituted or non-substituted aryl group.Type: GrantFiled: April 26, 1996Date of Patent: October 5, 1999Assignee: Kabushiki Kaisha ToshibaInventors: Shuzi Hayase, Yoshihiko Nakano, Rikako Kani, Mao Ito, Satoshi Mikoshiba, Takeshi Okino, Sawako Fujioka
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Patent number: 5956063Abstract: A method for manufacturing a color filter colors a large number of filter elements on a substrate respectively in a predetermined color. A filter element is colored while an ink-jet head nozzle and the filter element are aligned. The method comprises a detection step of detecting the position of the filter element, a correction step of correcting a relative position of the filter element and a discharge nozzle for discharging coloring material, based on position information of the filter element detected at the detection step, so that the filter element and the discharge nozzle are aligned, and a coloring step of coloring the filter element by discharging the coloring material by the discharge nozzle.Type: GrantFiled: September 7, 1995Date of Patent: September 21, 1999Assignee: Canon Kabushiki KaishaInventors: Hideto Yokoi, Hiroshi Sato, Katsuhiro Shirota, Takeshi Miyazaki, Akio Kashiwazaki, Shoji Shiba
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Patent number: 5955245Abstract: Disclosed is a method of forming a pattern on a substrate. A first solution is formed of an organic solvent and monomers of diamine and dianhydride. The monomers are polymerized to form a polyamic acid soluble in the organic solvent. About 20 to about 95% of the amic acid groups in the polyamic acid are imidized to form a partially imidized polyamic acid. A more concentrated solution of the partially imidized polyamic acid is formed. This can be accomplished by precipitating the partially imidized polyamic acid from the first solution and dissolving it in a second organic solvent to form a second solution. The second solution is applied to the substrate and the solvent is evaporated to form a coating of the partially imidized polyamic acid on the substrate. A portion of the coating is removed to form a pattern on the substrate and the remaining partially imidized polyamic acid is fully imidized on the substrate.Type: GrantFiled: October 12, 1993Date of Patent: September 21, 1999Assignee: Occidental Chemical CorporationInventor: Jin-O Choi
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Patent number: 5948232Abstract: The present invention provides electronically conducting polymer films formed from formulations of pyrrole and an electron acceptor. The formulations may include photoinitiators, flexibilizers, solvents and the like. These formulations can be used to manufacture multichip modules on typical multichip module substrates, such as alumina, fiberglass epoxy, silicon and polyimide. The formulations and methods of the invention enable the formation of passive electronic circuit elements such as resistors, capacitors and inductors in multichip modules or printed wiring boards.Type: GrantFiled: June 23, 1997Date of Patent: September 7, 1999Assignee: Lynntech, Inc.Inventors: Oliver J. Murphy, G. Duncan Hitchens, Dalibor Hodko, Eric T. Clarke, David L. Miller, Donald L. Parker
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Patent number: 5942290Abstract: Molecular complex compounds comprising a mono-, bis- or trisacylphosphine oxide compound with an .alpha.-hydroxy ketone compound are suitable as photoinitiators for the photopolymerization of free-radically polymerizable compounds.Type: GrantFiled: August 21, 1997Date of Patent: August 24, 1999Assignee: Ciba Specialty Chemicals CorporationInventors: David George Leppard, Thomas Lloyd James, Nils Hock, Manfred Kohler, Ronald Salathe
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Patent number: 5939148Abstract: The present invention provides a visible laser-curable photosensitive composition wherein a photocuring resin having photosensitive group which is crosslinkable or polymerizable upon light exposure, is mixed with a photopolymerization inititor system consisting of a coumarin type pigment of particular structure and a titanocene compound. This composition has an unexpectedly high sensitivity to visible laser.Type: GrantFiled: September 9, 1997Date of Patent: August 17, 1999Assignee: Kansai Paint Co., Ltd.Inventors: Genji Imai, Hideo Kogure
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Patent number: 5939150Abstract: The present invention relates to a method for treating a substrate surface. The substrate surface is coated with a thin film of a treating agent, which is capable of enhancing or reducing its affinity towards a metal precursor by exposure to an arbitrary kind of radiation beam. In a subsequent metal deposition step utilizing the metal precursor, the metal is selectively deposited on the exposed or unexposed areas, depending on the kind of treating agent. (FIG.Type: GrantFiled: April 25, 1997Date of Patent: August 17, 1999Assignees: Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V., CNRS-Service De La ValorisationInventors: Martin Stelzle, Pascal Doppelt
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Patent number: 5922414Abstract: A composition comprising at least two resins with widely different molecular weights is disclosed. The composition is particularly suitable as a permanent dielectric which provides an optimum surface for plating upon. The composition is particularly useful in the fabrication of printed circuit boards.Type: GrantFiled: December 9, 1997Date of Patent: July 13, 1999Assignee: MacDermid IncorporatedInventor: Peter Gabriele
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Patent number: 5912056Abstract: A method for forming a conductively coated matrix structure for separating rows and columns of sub-pixels on the faceplate of a flat panel display device. In one embodiment, the present invention deposits a photoresistive material over the interior surface of a faceplate having a non-conductive matrix structure formed thereon. The photoresistive material is deposited into sub-pixel regions separated by the matrix structure. The photoresistive material is dried and exposed in the sub-pixel regions. After unexposed photoresistive material is removed, a layer of aluminum is evaporated over the interior surface of the faceplate such that the matrix structure and the exposed layer of photoresistive material in the sub-pixel regions is coated with a conductive layer of aluminum. Next, the present invention applies an etchant to the exposed photoresistive material disposed in the sub-pixel regions.Type: GrantFiled: March 31, 1997Date of Patent: June 15, 1999Assignee: Candescent Technologies CorporationInventor: Paul M. Drumm
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Patent number: 5902648Abstract: The present invention aims to form a thin coating film of even thickness within a short processing time under a curtailed consumption of coating liquid; where, a gas is spouted from nozzle 4 disposed facing to protection glass 2 of cathode ray tube, and a liquid containing fluorescent material is made to spout accompanied by the spouting gas, to be applied on protection glass 2 by shifting the positioning of protection glass 2 relative to nozzle 4 while spouting the liquid containing fluorescent material.Type: GrantFiled: May 22, 1996Date of Patent: May 11, 1999Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Hiroyuki Naka, Masato Mitani, Kazuto Nakajima, Nobutaka Hokazono
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Patent number: 5900287Abstract: A film that exhibits increased scratch resistant characteristics. The film is formed from a layer of crosslinkable oligomeric resin composition on a base. The film is made by: forming the layer of crosslinkable oligomeric resin composition on the base, and curing the resin composition to an extent that the film exhibits a haze decrease of less than or equal to 60 percent after abrading according to the ASTM D-968-81 procedure using 200 milliliters of sand. Preferably, the layer has a microstructure of alternating tips and grooves. Such films are useful in backlit displays which are useful in computers and the like.Type: GrantFiled: October 31, 1997Date of Patent: May 4, 1999Assignee: Minnesota Mining and Manufacturing CompanyInventor: Todd R. Williams
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Patent number: 5900286Abstract: An attenuating structure composed of an epoxy resin which cationically cures with UV initiation is proposed for a surface wave component. The solvent-free epoxy resin is based on a cycloaliphatic epoxide and is applied to the wafer by screen printing. When the wafers are sawn up, sawing through can be carried out without detaching or splintering off the attenuating material. Attenuation and corrosion behavior of the attenuating structures fulfill the requirements for surface wave filters.Type: GrantFiled: June 5, 1997Date of Patent: May 4, 1999Assignee: Siemens AktiengesellschaftInventors: Heiner Bayer, Walter Fischer, Winfried Plundrich, Hans Stelzl, Wolfgang Pahl
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Patent number: 5896663Abstract: The instant invention contemplates a process for manufacturing jewelry including the steps of: (a) creating a photographic negative from a computer-generated image; (b) exposing the back side of a polyester backed soft photopolymerizable resin sheet to ultra-violet radiation thereby causing photopolymerization to a predetermined depth corresponding the exposure duration; (c) masking the negative over a "soft" photopolymerizable resin; (d) irradiating the unmasked resin with ultraviolet radiation; (e) chemically removing the non-photoset resin from the photopolymer resulting in a positive three-dimensional likeness of the object to be cast; and (f) creating a final negative mold using the positive three-dimensional likeness via a "lost-wax" type process.Type: GrantFiled: April 4, 1995Date of Patent: April 27, 1999Assignee: Aurafin CorporationInventor: Donald W. Greve
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Patent number: 5891529Abstract: Curable compositions comprising a substance that produces a base when exposed to radiation and a polymer molecule that contains silicon-hydrogen bonds which react with hydroxyl groups under the action of the base to form silicon-oxygen bonds (Si--O) and hydrogen molecules. These compositions cure when exposed to radiation. A pattern can be formed by placing a mask between a coating of the composition and the radiation source during this exposure episode and thereafter dissolving the uncured composition. The compositions have little weight loss during their cure, they can be cured by low intensity radiation, and they yield heat-resistant cured products.Type: GrantFiled: May 18, 1998Date of Patent: April 6, 1999Assignee: Dow Corning Asia, Ltd.Inventors: Brian Robert Harkness, Mamoru Tachikawa
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Patent number: 5863679Abstract: The present invention provides a method for forming a thin film pattern having an excellent accuracy of the pattern. The method comprises the steps of:(a) exposing a polysilane layer formed from a polysilane having a structure of the formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 indicate a group which is independently selected from the group consisting of a substituted or non-substituted aliphatic hydrocarbon residue, an alicyclic hydrocarbon residue and an aromatic hydrocarbon residue and m and n indicate an integer, provided on a substrate, to ultraviolet light selectively to form a latent image of the thin film pattern; and(b) dipping the polysilane layer in which the latent image of the thin film pattern is formed in a metal oxide sol and then drying.Type: GrantFiled: July 5, 1996Date of Patent: January 26, 1999Assignee: Nippon Paint Co., Ltd.Inventors: Hiroshi Tsushima, Iwao Sumiyoshi, Masaaki Yokoyama
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Patent number: 5858514Abstract: A method and related compositions for preparing a substrate for printing are described. The invention comprises coating a non-paper substrate with an adherent base coat and a hydrophilic top coat. The base coat adheres to the substrate and the top coat, which is applied to the base coat and adheres to it, provides an ink receptive surface on which ink pigment can be deposited. A base coating composition comprises a type-A gelatin and an acrylic polymer. A top coating composition comprises a type-A or type-B gelatin and a hydrophilic organic polymer. A base- and top-coated substrate of the invention is particularly suited for use with ink-jet printers that employ aqueous-based inks. Printing substrates include such materials as canvas, leather, polymeric films and sheets, and the like.Type: GrantFiled: August 17, 1994Date of Patent: January 12, 1999Assignee: Triton Digital Imaging Systems, Inc.Inventor: Wade Bowers
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Patent number: 5859084Abstract: A process for the preparation of a radiation-curable acrylate composition, wherein to compounds A containing at least 2 acrylic groups there are added benzophenone derivatives which are not copolymerizable by free-radical copolymerization and which contain at least one primary or secondary amino group or a hydroxyl group or a mercapto group.Type: GrantFiled: July 15, 1996Date of Patent: January 12, 1999Assignee: BASF AktiengesellschaftInventors: Jochen Schroder, Wolfgang Reich, Erich Beck, Martin Fischer, Wolfram Weiss
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Patent number: 5855755Abstract: The present invention provides electronically conducting polymer films formed from photosensitive formulations of pyrrole and an electron acceptor that have been selectively exposed to UV light, laser light, or electron beams. The formulations may include photoinitiators, flexibilizers, solvents and the like. These formulations can be used to manufacture multichip modules on typical multichip module substrates, such as alumina, fiberglass epoxy, silicon and polyimide. The formulations and methods of the invention enable the formation of passive electronic circuit elements such as resistors, capacitors and inductors in multichip modules or printed wiring boards.Type: GrantFiled: April 12, 1996Date of Patent: January 5, 1999Assignee: Lynntech, Inc.Inventors: Oliver J. Murphy, G. Duncan Hitchens, Dalibor Hodko, Eric T. Clarke, David L. Miller, Donald L. Parker
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Patent number: 5855716Abstract: The present invention is a method for modifying a substrate in a predetermined pattern, comprising the steps of: (a) applying a material to the face of an etched nanochannel glass (NCG), where this face has a pattern of channels corresponding to the predetermined pattern, and (b) contacting the substrate with the etched NCG face having applied material, under conditions for transferring the material to the substrate.Type: GrantFiled: September 24, 1996Date of Patent: January 5, 1999Assignee: The United States of America as represented by the Secretary of the NavyInventors: Ronald J. Tonucci, Douglas H. Pearson
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Patent number: 5853818Abstract: A method for fabricating a multi-domain liquid crystal cell is disclosed, wherein first and second alignment directions are formed in first and second portions of an alignment layer provided on a substrate by selectively subjecting the first and second portions to different energy doses of linearly polarized ultraviolet light. Liquid crystal material is then injected between the one substrate and another substrate and into contact with the alignment layer, thereby obtaining a wide viewing angle in the liquid crystal device.Type: GrantFiled: March 11, 1997Date of Patent: December 29, 1998Assignee: LG Electronics, Inc.Inventors: Soon Bum Kwon, Jong Hyun Kim, Oleg Yaroshchuk, Andrey Dyadyusha
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Patent number: 5849809Abstract: Disclosed is a composition which comprises (a) a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are hydroxyalkyl groups; (b) at least one member selected from the group consisting of photoinitiators and sensitizers; and (c) an optional solvent. Also disclosed are processes for preparing the above polymers and methods of preparing thermal ink jet printheads containing the above polymers.Type: GrantFiled: August 29, 1996Date of Patent: December 15, 1998Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 5849582Abstract: A method and apparatus for curing a photoresist that is deposited in liquid form and spun on a surface of a wafer leaving a thin film to be cured. This invention teaches methods for curing the resist with improved thickness control using front side heating.Type: GrantFiled: May 1, 1997Date of Patent: December 15, 1998Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chao-Chen Chen, Wei-Kay Chiu
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Patent number: 5846609Abstract: A method of forming a mask including providing a fluid from a group including oxygen based, nitrogen based, or carbon based fluids, introducing a substrate of semiconductor material into the fluid, and growing a film with thickness in a range of 10-20 .ANG. on a surface by converting the fluid adjacent the surface into a reactive species. The reactive species is created by directing light having a wavelength at the absorption peak of the fluid so as to convert the fluid into the reactive species. The surface of the substrate reacts with the reactive species to form the film.Type: GrantFiled: January 3, 1997Date of Patent: December 8, 1998Assignee: Motorola, Inc.Inventor: Kumar Shiralagi
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Patent number: 5820943Abstract: A method for imprinting a pattern onto a blade of a fan includes the steps of 1) forming a blade with thermoplastic material by injection-molded; 2) coating an ink layer of wooden pattern onto the blade made from step 1) with a suitable printing device at room temperature; 3) drying the ink layer on the blades with infrared radiation during the transferring; 4) coating a protecting layer onto the ink layer with a suitable printing device at room temperature; 6) drying the clear UV layer at room temperature and then further drying the clear UV layer with ultraviolet radiation in a dryer such that the ink layer and said clear UV layer are polymerized with each other until the clear UV layer is completely cured and hardened.Type: GrantFiled: January 16, 1997Date of Patent: October 13, 1998Inventor: Yu-Keng Huang
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Patent number: 5820944Abstract: The present invention pertains to a curable composition which comprises a) a N-substituted 4-(o-nitrophenyl)dihydropyridine which constitutes a base-generating substance that is caused to generate a base by the action of ultraviolet light, and (b) a silicone polymer (R.sub.2 SiO.sub.2/2)(RSiO.sub.3/2) containing silicon-hydrogen bonds (Si--H) which are capable of reacting with hydroxy groups to form silicon-oxygen bonds (Si--O) and hydrogen molecules (H.sub.2) under the effect of the base. This composition is cured by irradiation with ultraviolet light. Patterns are formed by placing a mask between a coating film of the composition and the ultraviolet light source during the irradiation with ultraviolet light, and then dissolving and removing the uncured portions of the composition following said irradiation.Type: GrantFiled: March 31, 1997Date of Patent: October 13, 1998Assignee: Dow Corning Asia, Ltd.Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takei
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Patent number: 5817377Abstract: The invention comprises a method for applying a curable resin, such as a photosensitive resin, to a substrate such as a papermaker's dewatering felt. The method comprises the steps of providing a substrate; providing a curable liquid resin; providing a second material different from the curable liquid resin; applying the second material to the substrate to occupy at least some of the voids in the substrate intermediate the first and second surfaces of the substrate; applying the curable resin to the substrate; curing at least some of the resin to provide a resin layer on the substrate; and removing at least some of the second material from the substrate, wherein at least some of the second material is removed from the substrate after applying the curable resin to the substrate.Type: GrantFiled: May 12, 1997Date of Patent: October 6, 1998Assignee: The Procter & Gamble CompanyInventors: Paul Dennis Trokhan, John Robert Powers, James Daniel Miller, II, Glenn David Boutilier
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Patent number: 5814265Abstract: A system for generating three-dimensional objects by creating a cross-sectional pattern of the object to be formed at a selected surface of a fluid medium capable of altering its physical state in response to appropriate synergistic stimulation by impinging radiation, particle bombardment or chemical reaction, successive adjacent laminae, representing corresponding successive adjacent cross-sections of the object, being automatically formed and integrated together to provide a step-wise laminar buildup of the desired object, whereby a three-dimensional object is formed and drawn from a substantially planar surface of the fluid medium during the forming process.Type: GrantFiled: June 6, 1995Date of Patent: September 29, 1998Assignee: 3D Systems, Inc.Inventor: Charles W. Hull
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Patent number: 5789039Abstract: The present invention relates to powder coatings curable by exposure to radiation, typically ultraviolet radiation. Powder coatings based upon cationically catalyzed resins (typically epoxy resins) are described including bisphenols, bisphenols modified by novolac, as well as aliphatic type epoxides including hydrogenated bisphenol-A, glycidyl methacrylic, glycidyl acrylics or related compounds, and vinyl ethers including mixtures of the foregoing compounds. Photoinitiators of sulfonium type, ferrocinium type, iodonium type, triphenolic types and related compounds are also included. Opacifiers, flow agents and plasticizers are also included. Charge additives for improved electrostatic deposition of the power coating are also described. Degassing agents are also typically included in the formulation, both for degassing the powder coating during cure, and to assist in degassing those substrates (such as wood) which tend to form bubbles during cure. Flow agents are also typically included in the formulation.Type: GrantFiled: January 26, 1996Date of Patent: August 4, 1998Assignee: Herberts Powder Coatings, Inc.Inventors: Kevin M. Biller, Ben A. MacFadden
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Patent number: 5779751Abstract: A method for making a fresnel lens on a substrate by forming a plurality of annular rings. Each ring has a plurality of steps, with each step having an inner wall and an outer wall, and an upper surface. The first step is formed on the substrate, and successive steps are formed at least partially on the upper surface of the previous step such that the outer wall of each successive annular step is offset from the outer wall of the previous annular step in an outward radial direction.Type: GrantFiled: March 14, 1997Date of Patent: July 14, 1998Assignee: Xerox CorporationInventor: Kaiser H. Wong
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Patent number: 5766674Abstract: In a method of producing a printed wiring board, solder layers are formed on pads beforehand. After the solder layers have been covered with a solder resist, the solder layers are caused to flow so as to render only the portion of the solder resist overlying the pads fragile. Then, the fragile portions of the solder resist are removed by roughening with the result that solder resist dams for preventing the solder from flowing are formed. This kind of procedure allows thick solder layers to be formed simultaneously with the solder resist dams without resorting to a great number of steps or an extra mask.Type: GrantFiled: February 20, 1996Date of Patent: June 16, 1998Assignee: NEC CorporationInventor: Koichi Hirosawa
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Patent number: 5766694Abstract: A method for forming a uniformly-spaced plastic substrate liquid crystal cell (100) includes the step of forming a cell with a liquid crystal-monomer mixture (150) disposed between upper and lower plastic substrates (111, 112). The cell (100) is then exposed to ultraviolet light (170) causing the monomer to be selectively polymerized to form support walls (108) between substrates (111, 112) of the cell in the light-intense areas. The monomer may be selectively polymerized by exposing the cell (100) through a mask (180, 188). The distance between the substrates (111, 112) is maintained before the walls (108) are formed by dispersing plastic ball spacers (114) between the substrates (111, 112). During exposure to the UV light, the substrates (111, 112) are sandwiched between substantially planar supports (182, 184) to maintain contact between the substrates (111, 112) and the spacers (114) and thus a uniform distance between the substrates (111, 112).Type: GrantFiled: May 29, 1997Date of Patent: June 16, 1998Inventors: John L. West, Philip J. Bos
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Patent number: 5763016Abstract: Water-free, gaseous sulfur trioxide is used as an agent to form patterns in organic coatings, films, and layers, including photoresists, by etching areas exposed to the agent through an overlying mask or by developing a latent image of the desired pattern using the agent as a dry-developer.Type: GrantFiled: December 19, 1996Date of Patent: June 9, 1998Assignee: Anon, IncorporatedInventors: Eric O. Levenson, Ahmad Waleh
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Patent number: 5759637Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.Type: GrantFiled: June 7, 1995Date of Patent: June 2, 1998Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
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Patent number: 5733948Abstract: A photopolymer resin composition useful in producing printing plates with low levels of surface tack is disclosed. Acetal compounds are incorporated into the photopolymer resin composition to achieve the low tack results.Type: GrantFiled: July 15, 1996Date of Patent: March 31, 1998Assignee: MAC Dermid, Imaging Technology, Inc.Inventor: Lawrence Nelson
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Patent number: 5731364Abstract: The invention provides positive- and negative-acting a photoresist compositions that contain a photoacid generator component that includes multiple aryl sulfonium compounds. Specifically, the photoactive component contains at least one multiple cation aryl sulfonium compound, preferably a di-cation compound. The photoactive component of the resists of the invention can be conveniently prepared and provide a deep UV sensitive resist with excellent microlithographic properties.Type: GrantFiled: January 24, 1996Date of Patent: March 24, 1998Assignee: Shipley Company, L.L.C.Inventors: Roger F. Sinta, James F. Cameron, Timothy G. Adams, Martha M. Rajaratnam, Michael F. Cronin
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Patent number: 5730761Abstract: A method of forming a button-type battery, includes: a) providing an electrically conductive sheet having an exposed surface which is divisible into a plurality of areas; b) depositing an uncured electrically insulative gasket material onto the conductive sheet into a plurality of the areas, the gasket material being deposited to define at least one discrete pattern within the respective deposited areas, the respective discrete patterns covering less than a total of their respective areas; c) curing the deposited gasket material; d) cutting and forming a plurality of discrete first terminal housing members from the areas of the conductive sheet, the respective first terminal housing members comprising at least a portion of one of the discrete patterns of gasket material; d) providing a discrete electrically conductive second terminal housing member in facing juxtaposition to one of the first terminal housing members; e) providing an anode and a cathode having a separator and electrolyte positioned therebetweeType: GrantFiled: October 24, 1996Date of Patent: March 24, 1998Assignee: Micron Communications, Inc.Inventors: Rickie Lake, Peter M. Blonsky
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Patent number: 5728427Abstract: Wet color cards prepared with water-based emulsion paints applied in layers of at least 75 g/m.sup.2 are dried using infra-red dryers irradiating the uncoated side of the cardboard or paper cards.Type: GrantFiled: December 14, 1995Date of Patent: March 17, 1998Assignee: Fina Research, S.A.Inventors: Matthias Anthonie Johannes Akkerman, Gerhardus Johannis Mulder
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Patent number: 5714420Abstract: A ceramic enamel composition consists of an oxide frit, a bismuth silicate seed material, a pigment, and a vehicle. A preferred bismuth silicate seed material is selected from crystalline Bi.sub.12 SiO.sub.20, Bi.sub.4 (SiO.sub.4).sub.3, and Bi.sub.2 SiO.sub.5, and mixtures thereof. Upon firing a glass substrate coated with the enamel, components of the enamel adhere to the substrate. The glass can be formed with a die to a desired shape with reduced sticking of the coated region to the die. The ceramic enamel is particularly useful in providing a colored border around automotive glass, which enhances appearance and reduces degradation of adhesives by ultraviolet radiation.Type: GrantFiled: December 8, 1995Date of Patent: February 3, 1998Assignee: Cerdec Corporation - Drakenfeld ProductsInventors: George E. Sakoske, Joseph W. Ryan