Nonuniform Or Patterned Coating (e.g., Mask, Printing, Textured, Etc.) Patents (Class 427/510)
  • Patent number: 6004617
    Abstract: Methods and apparatus for the preparation and use of a substrate having an array of diverse materials in predefined regions thereon. A substrate having an array of diverse materials thereon is generally prepared by delivering components of materials to predefined regions on a substrate, and simultaneously reacting the components to form at least two materials. Materials which can be prepared using the methods and apparatus of the present invention include, for example, covalent network solids, ionic solids and molecular solids. More particularly, materials which can be prepared using the methods and apparatus of the present invention include, for example, inorganic materials, intermetallic materials, metal alloys, ceramic materials, organic materials, organometallic materials, non-biological organic polymers, composite materials (e.g., inorganic composites, organic composites, or combinations thereof), etc.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: December 21, 1999
    Assignees: The Regents of the University of California, Symyx Technologies
    Inventors: Peter G. Schultz, Xiaodong Xiang, Isy Goldwasser
  • Patent number: 6001414
    Abstract: A dual damascene processing method comprising the steps depositing sequentially a first oxide layer, a SRO layer and a second oxide layer over a substrate. Then, photolithographic and etching operations are conducted to form a via that links up with a desired wire-connecting region above the substrate. Next, another photolithographic and etching operations are conducted to form interconnect trench lines followed by the deposition of metal into the via and trench. Finally, the surface is polished with a chemical-mechanical polishing operation to remove the unwanted metal on the surface. The invention is capable of controlling the depth of trench and obtaining a smoother trench bottom for the metal lines. Furthermore, the separation of via and trench etching steps makes the control of the final etch profile much easier, thereby able to get an optimal result.
    Type: Grant
    Filed: December 16, 1997
    Date of Patent: December 14, 1999
    Assignee: United Microelectronics Corp.
    Inventors: Yimin Huang, Hsiao-Pang Chou, Tri-Rung Yew
  • Patent number: 5993702
    Abstract: An embossed substrate comprising a substrate of a plastic material and having a surface and an embossed surface carried by the surface of the substrate. The embossed surface is characterized by having a pattern with an average roughness of between 100 nanometers and 300 nanometers with the roughness being distributed substantially uniformly over the surface, the pattern has ridges and valleys with the horizontal distance between adjacent ridges and/or valleys being greater than the depth between the ridges and the valleys. The peaks and the valleys are randomly disposed without periodicity to cause diffusion of light impinging thereon to minimize or eliminate interference effects when the embossed surface overcoated with thin planar organic layers is exposed to light.
    Type: Grant
    Filed: June 4, 1997
    Date of Patent: November 30, 1999
    Assignee: Flex Products, Inc.
    Inventor: Gregory F. Davis
  • Patent number: 5994110
    Abstract: Compounds which possess a complementary structure to a desired molecule, such as a biomolecule, in particular polymeric or oligomeric compounds, which are useful as in vivo or in vitro diagnostic and therapeutic agents are provided. Also, various methods for producing such compounds are provided. These polymeric or oligomeric compounds are useful in particular as antimicrobial agents, receptor, hormone or enzyme agonists and antagonists.
    Type: Grant
    Filed: September 2, 1998
    Date of Patent: November 30, 1999
    Inventors: Klaus Mosbach, Peter A. G. Cormack, Olof Ramstrom, Karsten Haupt
  • Patent number: 5989628
    Abstract: A plastic lens comprising the first acrylic hard coated layer formed on the outside surface of a plastic lens base and, on the inside surface, an antifogging coated layer while interposing of the second acrylic hard coated layer is obtained by coating both sides of a plastic lens base with an acrylic hard coating agent, masking the outside surface with a peelable masking agent (e.g., a coating composition containing poly(vinyl chloride) or a vinyl chloride-vinyl acetate copolymer), coating at least the inside surface with an antifogging agent, and removing the masking layer. As the hard coating agent or antifogging agent, use can be made of an ultraviolet-curable resin composition, and as the masking agent, a coating composition containing a poly-(vinyl chloride) or vinyl chloride-vinyl acetate copolymer may be employed.
    Type: Grant
    Filed: March 21, 1997
    Date of Patent: November 23, 1999
    Assignee: Daicel Abosisangyo Co., Ltd.
    Inventors: Mitsunobu Haga, Yoshio Onisawa, Kohei Shimizu
  • Patent number: 5985377
    Abstract: A laser marking apparatus and method for marking the surface of a semiconductor chip are described herein. A laser beam is directed to a location on the surface of the chip where a laser reactive material, such as a pigment containing epoxy, is present. The heat associated with the laser beam causes the laser reactive material to fuse to the surface of the chip, creating a visibly distinct mark in contrast to the rest of the surface of the chip. Only reactive material contacted by the laser fuses to the chip surface, and the remaining residue on the non-irradiated portion can be readily removed.
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: November 16, 1999
    Assignee: Micron Technology, Inc.
    Inventor: Tim J. Corbett
  • Patent number: 5985420
    Abstract: A plastic lens comprising the first acrylic hard coated layer formed on the outside surface of a plastic lens base and, in the inside surface, an antifogging coated layer with interposing of the second acrylic hard coated layer is obtained by coating the both sides of a plastic lens base with an acrylic hard coating agent, masking the outside surface with a peelable masking agent (e.g. a coating composition containing poly(vinyl chloride) or vinyl chloride-vinyl acetate copolymer), coating at least the inside surface with an antifogging agent, and removing the masking layer. As the hard coating agent or antifogging agent, use can be made of an ultraviolet-curable resin composition, and as the masking agent, a coating composition containing a poly(vinyl chloride) or vinyl chloride-vinyl acetate copolymer may be employed.
    Type: Grant
    Filed: December 10, 1996
    Date of Patent: November 16, 1999
    Assignee: Daicel Abosisangyo Co., Ltd.
    Inventors: Mitsunobu Haga, Yoshio Onisawa, Kohei Shimizu
  • Patent number: 5985376
    Abstract: An apparatus and method enables screen printing various articles such as glassware with a radiation curable composition using, for example, UV radiation and the like in pre-existing screen printing decorating equipment having a plurality of screen printing workstations. Particularly suitable compositions are those which are environmentally safe by virtue of being free of toxic heavy metals and volatile organic compounds. The applied inked image is at least partially cured at each screen printing workstation to form a skin on the surface of the transferred image of sufficient strength to support the next layer to be applied. The UV radiation may emanate opposing and underlying each of the screen printing workstations were brought thereto from a remotely positioned laser via a fiber optic bundle or light pipe.
    Type: Grant
    Filed: May 1, 1995
    Date of Patent: November 16, 1999
    Assignee: Revlon Consumer Products Corporation
    Inventor: Melvin Edwin Kamen
  • Patent number: 5980995
    Abstract: An insulated metallic strip suitable for use in the coils of power transformers and method of producing the same. Following the extrusion of a flat metallic strip of conductive material for winding into a magnet coil, the flat strip having a predetermined thickness and first and second sides bounded by a pair of fully rounded edges, the method of insulating the strip of conductive material by supporting the flat strip in a level state at a predetermined temperature in a vacuum chamber and while in the vacuum chamber applying a liquid coating of resin to the entire first side of the strip and the pair of rounded edges and extending onto the second side of the strip from each of the edges a distance at least as great as about 0.25" to prevent turn to turn discharge.
    Type: Grant
    Filed: January 19, 1999
    Date of Patent: November 9, 1999
    Assignee: ABB Power T&D Company Inc.
    Inventors: Thomas L. Linsenbardt, Norris L. Hill, Hoan Duy Le
  • Patent number: 5981039
    Abstract: A magnetic recording medium in accordance with the present invention is constituted by a first magnetic film having a magnetic anisotropy in a first direction parallel to the film surface and a second magnetic film that is formed on the first magnetic film and that is made of an amorphous alloy film of a rare-earth metal and a transition metal having a magnetic anisotropy in a second direction that is parallel to the film surface, and different from the first direction. In the above-mentioned magnetic recording medium, the first and second magnetic films have magnetic anisotropies having directions parallel to their surfaces and different from each other. When a magnetic latent image is formed on the magnetic recording medium of this type, it is possible to reduce the height of serration in the serrate magnetization transition structure appearing in the border of magnetization inversion in the magnetic latent image.
    Type: Grant
    Filed: August 27, 1997
    Date of Patent: November 9, 1999
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Hitoshi Isono, Kazuo Van
  • Patent number: 5976444
    Abstract: The present invention is a process for making a nanochannel glass (NCG) rica, having the steps of: coating a face of an etched NCG with a replica material (with or without an intervening buffer layer), where the etched NCG face has a plurality of channels arranged in a desired pattern, to form a replica coating on the NCG conforming to the pattern; and removing the replica coating from the etched NCG. The present invention is also the replica made by this process.
    Type: Grant
    Filed: September 24, 1996
    Date of Patent: November 2, 1999
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Douglas H. Pearson, Ronald J. Tonucci
  • Patent number: 5968606
    Abstract: The present invention provides a novel UV curable composition for forming thermally conductive interface and a method of using the same. The composition is used to promote the transfer of heat from a source of heat such as an electronic device to a heat dissipation device such as a heat sink. The composition comprises by weight from about 35% to about 75% of a UV curable acrylate material, from about 0.5% to about 15% catalyst, from about 10% to about 30% hydrocarbon solvent and from about 20% to about 70% conductive filler.
    Type: Grant
    Filed: June 30, 1997
    Date of Patent: October 19, 1999
    Assignee: Ferro Corporation
    Inventors: Jesus E. Osuna, Keith M. Mason, Vernon E. Stygar
  • Patent number: 5962581
    Abstract: A method of forming a pattern comprising the steps of forming a film of an organosilane compound comprising a polysilane having a repeating unit represented by the following general formula (1) on a substrate, irradiating an actinic radiation onto a predetermined portion of the film of the organosilane compound formed on the substrate, and removing the predetermined portion of the film irradiated by the actinic radiation by dissolving it with an aqueous alkaline developing solution. ##STR1## wherein Ar is a substituted or non-substituted aryl group.
    Type: Grant
    Filed: April 26, 1996
    Date of Patent: October 5, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shuzi Hayase, Yoshihiko Nakano, Rikako Kani, Mao Ito, Satoshi Mikoshiba, Takeshi Okino, Sawako Fujioka
  • Patent number: 5956063
    Abstract: A method for manufacturing a color filter colors a large number of filter elements on a substrate respectively in a predetermined color. A filter element is colored while an ink-jet head nozzle and the filter element are aligned. The method comprises a detection step of detecting the position of the filter element, a correction step of correcting a relative position of the filter element and a discharge nozzle for discharging coloring material, based on position information of the filter element detected at the detection step, so that the filter element and the discharge nozzle are aligned, and a coloring step of coloring the filter element by discharging the coloring material by the discharge nozzle.
    Type: Grant
    Filed: September 7, 1995
    Date of Patent: September 21, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hideto Yokoi, Hiroshi Sato, Katsuhiro Shirota, Takeshi Miyazaki, Akio Kashiwazaki, Shoji Shiba
  • Patent number: 5955245
    Abstract: Disclosed is a method of forming a pattern on a substrate. A first solution is formed of an organic solvent and monomers of diamine and dianhydride. The monomers are polymerized to form a polyamic acid soluble in the organic solvent. About 20 to about 95% of the amic acid groups in the polyamic acid are imidized to form a partially imidized polyamic acid. A more concentrated solution of the partially imidized polyamic acid is formed. This can be accomplished by precipitating the partially imidized polyamic acid from the first solution and dissolving it in a second organic solvent to form a second solution. The second solution is applied to the substrate and the solvent is evaporated to form a coating of the partially imidized polyamic acid on the substrate. A portion of the coating is removed to form a pattern on the substrate and the remaining partially imidized polyamic acid is fully imidized on the substrate.
    Type: Grant
    Filed: October 12, 1993
    Date of Patent: September 21, 1999
    Assignee: Occidental Chemical Corporation
    Inventor: Jin-O Choi
  • Patent number: 5948232
    Abstract: The present invention provides electronically conducting polymer films formed from formulations of pyrrole and an electron acceptor. The formulations may include photoinitiators, flexibilizers, solvents and the like. These formulations can be used to manufacture multichip modules on typical multichip module substrates, such as alumina, fiberglass epoxy, silicon and polyimide. The formulations and methods of the invention enable the formation of passive electronic circuit elements such as resistors, capacitors and inductors in multichip modules or printed wiring boards.
    Type: Grant
    Filed: June 23, 1997
    Date of Patent: September 7, 1999
    Assignee: Lynntech, Inc.
    Inventors: Oliver J. Murphy, G. Duncan Hitchens, Dalibor Hodko, Eric T. Clarke, David L. Miller, Donald L. Parker
  • Patent number: 5942290
    Abstract: Molecular complex compounds comprising a mono-, bis- or trisacylphosphine oxide compound with an .alpha.-hydroxy ketone compound are suitable as photoinitiators for the photopolymerization of free-radically polymerizable compounds.
    Type: Grant
    Filed: August 21, 1997
    Date of Patent: August 24, 1999
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: David George Leppard, Thomas Lloyd James, Nils Hock, Manfred Kohler, Ronald Salathe
  • Patent number: 5939148
    Abstract: The present invention provides a visible laser-curable photosensitive composition wherein a photocuring resin having photosensitive group which is crosslinkable or polymerizable upon light exposure, is mixed with a photopolymerization inititor system consisting of a coumarin type pigment of particular structure and a titanocene compound. This composition has an unexpectedly high sensitivity to visible laser.
    Type: Grant
    Filed: September 9, 1997
    Date of Patent: August 17, 1999
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Genji Imai, Hideo Kogure
  • Patent number: 5939150
    Abstract: The present invention relates to a method for treating a substrate surface. The substrate surface is coated with a thin film of a treating agent, which is capable of enhancing or reducing its affinity towards a metal precursor by exposure to an arbitrary kind of radiation beam. In a subsequent metal deposition step utilizing the metal precursor, the metal is selectively deposited on the exposed or unexposed areas, depending on the kind of treating agent. (FIG.
    Type: Grant
    Filed: April 25, 1997
    Date of Patent: August 17, 1999
    Assignees: Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V., CNRS-Service De La Valorisation
    Inventors: Martin Stelzle, Pascal Doppelt
  • Patent number: 5922414
    Abstract: A composition comprising at least two resins with widely different molecular weights is disclosed. The composition is particularly suitable as a permanent dielectric which provides an optimum surface for plating upon. The composition is particularly useful in the fabrication of printed circuit boards.
    Type: Grant
    Filed: December 9, 1997
    Date of Patent: July 13, 1999
    Assignee: MacDermid Incorporated
    Inventor: Peter Gabriele
  • Patent number: 5912056
    Abstract: A method for forming a conductively coated matrix structure for separating rows and columns of sub-pixels on the faceplate of a flat panel display device. In one embodiment, the present invention deposits a photoresistive material over the interior surface of a faceplate having a non-conductive matrix structure formed thereon. The photoresistive material is deposited into sub-pixel regions separated by the matrix structure. The photoresistive material is dried and exposed in the sub-pixel regions. After unexposed photoresistive material is removed, a layer of aluminum is evaporated over the interior surface of the faceplate such that the matrix structure and the exposed layer of photoresistive material in the sub-pixel regions is coated with a conductive layer of aluminum. Next, the present invention applies an etchant to the exposed photoresistive material disposed in the sub-pixel regions.
    Type: Grant
    Filed: March 31, 1997
    Date of Patent: June 15, 1999
    Assignee: Candescent Technologies Corporation
    Inventor: Paul M. Drumm
  • Patent number: 5902648
    Abstract: The present invention aims to form a thin coating film of even thickness within a short processing time under a curtailed consumption of coating liquid; where, a gas is spouted from nozzle 4 disposed facing to protection glass 2 of cathode ray tube, and a liquid containing fluorescent material is made to spout accompanied by the spouting gas, to be applied on protection glass 2 by shifting the positioning of protection glass 2 relative to nozzle 4 while spouting the liquid containing fluorescent material.
    Type: Grant
    Filed: May 22, 1996
    Date of Patent: May 11, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Hiroyuki Naka, Masato Mitani, Kazuto Nakajima, Nobutaka Hokazono
  • Patent number: 5900287
    Abstract: A film that exhibits increased scratch resistant characteristics. The film is formed from a layer of crosslinkable oligomeric resin composition on a base. The film is made by: forming the layer of crosslinkable oligomeric resin composition on the base, and curing the resin composition to an extent that the film exhibits a haze decrease of less than or equal to 60 percent after abrading according to the ASTM D-968-81 procedure using 200 milliliters of sand. Preferably, the layer has a microstructure of alternating tips and grooves. Such films are useful in backlit displays which are useful in computers and the like.
    Type: Grant
    Filed: October 31, 1997
    Date of Patent: May 4, 1999
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Todd R. Williams
  • Patent number: 5900286
    Abstract: An attenuating structure composed of an epoxy resin which cationically cures with UV initiation is proposed for a surface wave component. The solvent-free epoxy resin is based on a cycloaliphatic epoxide and is applied to the wafer by screen printing. When the wafers are sawn up, sawing through can be carried out without detaching or splintering off the attenuating material. Attenuation and corrosion behavior of the attenuating structures fulfill the requirements for surface wave filters.
    Type: Grant
    Filed: June 5, 1997
    Date of Patent: May 4, 1999
    Assignee: Siemens Aktiengesellschaft
    Inventors: Heiner Bayer, Walter Fischer, Winfried Plundrich, Hans Stelzl, Wolfgang Pahl
  • Patent number: 5896663
    Abstract: The instant invention contemplates a process for manufacturing jewelry including the steps of: (a) creating a photographic negative from a computer-generated image; (b) exposing the back side of a polyester backed soft photopolymerizable resin sheet to ultra-violet radiation thereby causing photopolymerization to a predetermined depth corresponding the exposure duration; (c) masking the negative over a "soft" photopolymerizable resin; (d) irradiating the unmasked resin with ultraviolet radiation; (e) chemically removing the non-photoset resin from the photopolymer resulting in a positive three-dimensional likeness of the object to be cast; and (f) creating a final negative mold using the positive three-dimensional likeness via a "lost-wax" type process.
    Type: Grant
    Filed: April 4, 1995
    Date of Patent: April 27, 1999
    Assignee: Aurafin Corporation
    Inventor: Donald W. Greve
  • Patent number: 5891529
    Abstract: Curable compositions comprising a substance that produces a base when exposed to radiation and a polymer molecule that contains silicon-hydrogen bonds which react with hydroxyl groups under the action of the base to form silicon-oxygen bonds (Si--O) and hydrogen molecules. These compositions cure when exposed to radiation. A pattern can be formed by placing a mask between a coating of the composition and the radiation source during this exposure episode and thereafter dissolving the uncured composition. The compositions have little weight loss during their cure, they can be cured by low intensity radiation, and they yield heat-resistant cured products.
    Type: Grant
    Filed: May 18, 1998
    Date of Patent: April 6, 1999
    Assignee: Dow Corning Asia, Ltd.
    Inventors: Brian Robert Harkness, Mamoru Tachikawa
  • Patent number: 5863679
    Abstract: The present invention provides a method for forming a thin film pattern having an excellent accuracy of the pattern. The method comprises the steps of:(a) exposing a polysilane layer formed from a polysilane having a structure of the formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 indicate a group which is independently selected from the group consisting of a substituted or non-substituted aliphatic hydrocarbon residue, an alicyclic hydrocarbon residue and an aromatic hydrocarbon residue and m and n indicate an integer, provided on a substrate, to ultraviolet light selectively to form a latent image of the thin film pattern; and(b) dipping the polysilane layer in which the latent image of the thin film pattern is formed in a metal oxide sol and then drying.
    Type: Grant
    Filed: July 5, 1996
    Date of Patent: January 26, 1999
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Hiroshi Tsushima, Iwao Sumiyoshi, Masaaki Yokoyama
  • Patent number: 5858514
    Abstract: A method and related compositions for preparing a substrate for printing are described. The invention comprises coating a non-paper substrate with an adherent base coat and a hydrophilic top coat. The base coat adheres to the substrate and the top coat, which is applied to the base coat and adheres to it, provides an ink receptive surface on which ink pigment can be deposited. A base coating composition comprises a type-A gelatin and an acrylic polymer. A top coating composition comprises a type-A or type-B gelatin and a hydrophilic organic polymer. A base- and top-coated substrate of the invention is particularly suited for use with ink-jet printers that employ aqueous-based inks. Printing substrates include such materials as canvas, leather, polymeric films and sheets, and the like.
    Type: Grant
    Filed: August 17, 1994
    Date of Patent: January 12, 1999
    Assignee: Triton Digital Imaging Systems, Inc.
    Inventor: Wade Bowers
  • Patent number: 5859084
    Abstract: A process for the preparation of a radiation-curable acrylate composition, wherein to compounds A containing at least 2 acrylic groups there are added benzophenone derivatives which are not copolymerizable by free-radical copolymerization and which contain at least one primary or secondary amino group or a hydroxyl group or a mercapto group.
    Type: Grant
    Filed: July 15, 1996
    Date of Patent: January 12, 1999
    Assignee: BASF Aktiengesellschaft
    Inventors: Jochen Schroder, Wolfgang Reich, Erich Beck, Martin Fischer, Wolfram Weiss
  • Patent number: 5855755
    Abstract: The present invention provides electronically conducting polymer films formed from photosensitive formulations of pyrrole and an electron acceptor that have been selectively exposed to UV light, laser light, or electron beams. The formulations may include photoinitiators, flexibilizers, solvents and the like. These formulations can be used to manufacture multichip modules on typical multichip module substrates, such as alumina, fiberglass epoxy, silicon and polyimide. The formulations and methods of the invention enable the formation of passive electronic circuit elements such as resistors, capacitors and inductors in multichip modules or printed wiring boards.
    Type: Grant
    Filed: April 12, 1996
    Date of Patent: January 5, 1999
    Assignee: Lynntech, Inc.
    Inventors: Oliver J. Murphy, G. Duncan Hitchens, Dalibor Hodko, Eric T. Clarke, David L. Miller, Donald L. Parker
  • Patent number: 5855716
    Abstract: The present invention is a method for modifying a substrate in a predetermined pattern, comprising the steps of: (a) applying a material to the face of an etched nanochannel glass (NCG), where this face has a pattern of channels corresponding to the predetermined pattern, and (b) contacting the substrate with the etched NCG face having applied material, under conditions for transferring the material to the substrate.
    Type: Grant
    Filed: September 24, 1996
    Date of Patent: January 5, 1999
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Ronald J. Tonucci, Douglas H. Pearson
  • Patent number: 5853818
    Abstract: A method for fabricating a multi-domain liquid crystal cell is disclosed, wherein first and second alignment directions are formed in first and second portions of an alignment layer provided on a substrate by selectively subjecting the first and second portions to different energy doses of linearly polarized ultraviolet light. Liquid crystal material is then injected between the one substrate and another substrate and into contact with the alignment layer, thereby obtaining a wide viewing angle in the liquid crystal device.
    Type: Grant
    Filed: March 11, 1997
    Date of Patent: December 29, 1998
    Assignee: LG Electronics, Inc.
    Inventors: Soon Bum Kwon, Jong Hyun Kim, Oleg Yaroshchuk, Andrey Dyadyusha
  • Patent number: 5849809
    Abstract: Disclosed is a composition which comprises (a) a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are hydroxyalkyl groups; (b) at least one member selected from the group consisting of photoinitiators and sensitizers; and (c) an optional solvent. Also disclosed are processes for preparing the above polymers and methods of preparing thermal ink jet printheads containing the above polymers.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: December 15, 1998
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller
  • Patent number: 5849582
    Abstract: A method and apparatus for curing a photoresist that is deposited in liquid form and spun on a surface of a wafer leaving a thin film to be cured. This invention teaches methods for curing the resist with improved thickness control using front side heating.
    Type: Grant
    Filed: May 1, 1997
    Date of Patent: December 15, 1998
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chao-Chen Chen, Wei-Kay Chiu
  • Patent number: 5846609
    Abstract: A method of forming a mask including providing a fluid from a group including oxygen based, nitrogen based, or carbon based fluids, introducing a substrate of semiconductor material into the fluid, and growing a film with thickness in a range of 10-20 .ANG. on a surface by converting the fluid adjacent the surface into a reactive species. The reactive species is created by directing light having a wavelength at the absorption peak of the fluid so as to convert the fluid into the reactive species. The surface of the substrate reacts with the reactive species to form the film.
    Type: Grant
    Filed: January 3, 1997
    Date of Patent: December 8, 1998
    Assignee: Motorola, Inc.
    Inventor: Kumar Shiralagi
  • Patent number: 5820943
    Abstract: A method for imprinting a pattern onto a blade of a fan includes the steps of 1) forming a blade with thermoplastic material by injection-molded; 2) coating an ink layer of wooden pattern onto the blade made from step 1) with a suitable printing device at room temperature; 3) drying the ink layer on the blades with infrared radiation during the transferring; 4) coating a protecting layer onto the ink layer with a suitable printing device at room temperature; 6) drying the clear UV layer at room temperature and then further drying the clear UV layer with ultraviolet radiation in a dryer such that the ink layer and said clear UV layer are polymerized with each other until the clear UV layer is completely cured and hardened.
    Type: Grant
    Filed: January 16, 1997
    Date of Patent: October 13, 1998
    Inventor: Yu-Keng Huang
  • Patent number: 5820944
    Abstract: The present invention pertains to a curable composition which comprises a) a N-substituted 4-(o-nitrophenyl)dihydropyridine which constitutes a base-generating substance that is caused to generate a base by the action of ultraviolet light, and (b) a silicone polymer (R.sub.2 SiO.sub.2/2)(RSiO.sub.3/2) containing silicon-hydrogen bonds (Si--H) which are capable of reacting with hydroxy groups to form silicon-oxygen bonds (Si--O) and hydrogen molecules (H.sub.2) under the effect of the base. This composition is cured by irradiation with ultraviolet light. Patterns are formed by placing a mask between a coating film of the composition and the ultraviolet light source during the irradiation with ultraviolet light, and then dissolving and removing the uncured portions of the composition following said irradiation.
    Type: Grant
    Filed: March 31, 1997
    Date of Patent: October 13, 1998
    Assignee: Dow Corning Asia, Ltd.
    Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takei
  • Patent number: 5817377
    Abstract: The invention comprises a method for applying a curable resin, such as a photosensitive resin, to a substrate such as a papermaker's dewatering felt. The method comprises the steps of providing a substrate; providing a curable liquid resin; providing a second material different from the curable liquid resin; applying the second material to the substrate to occupy at least some of the voids in the substrate intermediate the first and second surfaces of the substrate; applying the curable resin to the substrate; curing at least some of the resin to provide a resin layer on the substrate; and removing at least some of the second material from the substrate, wherein at least some of the second material is removed from the substrate after applying the curable resin to the substrate.
    Type: Grant
    Filed: May 12, 1997
    Date of Patent: October 6, 1998
    Assignee: The Procter & Gamble Company
    Inventors: Paul Dennis Trokhan, John Robert Powers, James Daniel Miller, II, Glenn David Boutilier
  • Patent number: 5814265
    Abstract: A system for generating three-dimensional objects by creating a cross-sectional pattern of the object to be formed at a selected surface of a fluid medium capable of altering its physical state in response to appropriate synergistic stimulation by impinging radiation, particle bombardment or chemical reaction, successive adjacent laminae, representing corresponding successive adjacent cross-sections of the object, being automatically formed and integrated together to provide a step-wise laminar buildup of the desired object, whereby a three-dimensional object is formed and drawn from a substantially planar surface of the fluid medium during the forming process.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: September 29, 1998
    Assignee: 3D Systems, Inc.
    Inventor: Charles W. Hull
  • Patent number: 5789039
    Abstract: The present invention relates to powder coatings curable by exposure to radiation, typically ultraviolet radiation. Powder coatings based upon cationically catalyzed resins (typically epoxy resins) are described including bisphenols, bisphenols modified by novolac, as well as aliphatic type epoxides including hydrogenated bisphenol-A, glycidyl methacrylic, glycidyl acrylics or related compounds, and vinyl ethers including mixtures of the foregoing compounds. Photoinitiators of sulfonium type, ferrocinium type, iodonium type, triphenolic types and related compounds are also included. Opacifiers, flow agents and plasticizers are also included. Charge additives for improved electrostatic deposition of the power coating are also described. Degassing agents are also typically included in the formulation, both for degassing the powder coating during cure, and to assist in degassing those substrates (such as wood) which tend to form bubbles during cure. Flow agents are also typically included in the formulation.
    Type: Grant
    Filed: January 26, 1996
    Date of Patent: August 4, 1998
    Assignee: Herberts Powder Coatings, Inc.
    Inventors: Kevin M. Biller, Ben A. MacFadden
  • Patent number: 5779751
    Abstract: A method for making a fresnel lens on a substrate by forming a plurality of annular rings. Each ring has a plurality of steps, with each step having an inner wall and an outer wall, and an upper surface. The first step is formed on the substrate, and successive steps are formed at least partially on the upper surface of the previous step such that the outer wall of each successive annular step is offset from the outer wall of the previous annular step in an outward radial direction.
    Type: Grant
    Filed: March 14, 1997
    Date of Patent: July 14, 1998
    Assignee: Xerox Corporation
    Inventor: Kaiser H. Wong
  • Patent number: 5766674
    Abstract: In a method of producing a printed wiring board, solder layers are formed on pads beforehand. After the solder layers have been covered with a solder resist, the solder layers are caused to flow so as to render only the portion of the solder resist overlying the pads fragile. Then, the fragile portions of the solder resist are removed by roughening with the result that solder resist dams for preventing the solder from flowing are formed. This kind of procedure allows thick solder layers to be formed simultaneously with the solder resist dams without resorting to a great number of steps or an extra mask.
    Type: Grant
    Filed: February 20, 1996
    Date of Patent: June 16, 1998
    Assignee: NEC Corporation
    Inventor: Koichi Hirosawa
  • Patent number: 5766694
    Abstract: A method for forming a uniformly-spaced plastic substrate liquid crystal cell (100) includes the step of forming a cell with a liquid crystal-monomer mixture (150) disposed between upper and lower plastic substrates (111, 112). The cell (100) is then exposed to ultraviolet light (170) causing the monomer to be selectively polymerized to form support walls (108) between substrates (111, 112) of the cell in the light-intense areas. The monomer may be selectively polymerized by exposing the cell (100) through a mask (180, 188). The distance between the substrates (111, 112) is maintained before the walls (108) are formed by dispersing plastic ball spacers (114) between the substrates (111, 112). During exposure to the UV light, the substrates (111, 112) are sandwiched between substantially planar supports (182, 184) to maintain contact between the substrates (111, 112) and the spacers (114) and thus a uniform distance between the substrates (111, 112).
    Type: Grant
    Filed: May 29, 1997
    Date of Patent: June 16, 1998
    Inventors: John L. West, Philip J. Bos
  • Patent number: 5763016
    Abstract: Water-free, gaseous sulfur trioxide is used as an agent to form patterns in organic coatings, films, and layers, including photoresists, by etching areas exposed to the agent through an overlying mask or by developing a latent image of the desired pattern using the agent as a dry-developer.
    Type: Grant
    Filed: December 19, 1996
    Date of Patent: June 9, 1998
    Assignee: Anon, Incorporated
    Inventors: Eric O. Levenson, Ahmad Waleh
  • Patent number: 5759637
    Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: June 2, 1998
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey Donald Gelorme, Thomas Harold Newman, Niranjan Mohanlal Patel, David Earle Seeger
  • Patent number: 5733948
    Abstract: A photopolymer resin composition useful in producing printing plates with low levels of surface tack is disclosed. Acetal compounds are incorporated into the photopolymer resin composition to achieve the low tack results.
    Type: Grant
    Filed: July 15, 1996
    Date of Patent: March 31, 1998
    Assignee: MAC Dermid, Imaging Technology, Inc.
    Inventor: Lawrence Nelson
  • Patent number: 5731364
    Abstract: The invention provides positive- and negative-acting a photoresist compositions that contain a photoacid generator component that includes multiple aryl sulfonium compounds. Specifically, the photoactive component contains at least one multiple cation aryl sulfonium compound, preferably a di-cation compound. The photoactive component of the resists of the invention can be conveniently prepared and provide a deep UV sensitive resist with excellent microlithographic properties.
    Type: Grant
    Filed: January 24, 1996
    Date of Patent: March 24, 1998
    Assignee: Shipley Company, L.L.C.
    Inventors: Roger F. Sinta, James F. Cameron, Timothy G. Adams, Martha M. Rajaratnam, Michael F. Cronin
  • Patent number: 5730761
    Abstract: A method of forming a button-type battery, includes: a) providing an electrically conductive sheet having an exposed surface which is divisible into a plurality of areas; b) depositing an uncured electrically insulative gasket material onto the conductive sheet into a plurality of the areas, the gasket material being deposited to define at least one discrete pattern within the respective deposited areas, the respective discrete patterns covering less than a total of their respective areas; c) curing the deposited gasket material; d) cutting and forming a plurality of discrete first terminal housing members from the areas of the conductive sheet, the respective first terminal housing members comprising at least a portion of one of the discrete patterns of gasket material; d) providing a discrete electrically conductive second terminal housing member in facing juxtaposition to one of the first terminal housing members; e) providing an anode and a cathode having a separator and electrolyte positioned therebetwee
    Type: Grant
    Filed: October 24, 1996
    Date of Patent: March 24, 1998
    Assignee: Micron Communications, Inc.
    Inventors: Rickie Lake, Peter M. Blonsky
  • Patent number: 5728427
    Abstract: Wet color cards prepared with water-based emulsion paints applied in layers of at least 75 g/m.sup.2 are dried using infra-red dryers irradiating the uncoated side of the cardboard or paper cards.
    Type: Grant
    Filed: December 14, 1995
    Date of Patent: March 17, 1998
    Assignee: Fina Research, S.A.
    Inventors: Matthias Anthonie Johannes Akkerman, Gerhardus Johannis Mulder
  • Patent number: 5714420
    Abstract: A ceramic enamel composition consists of an oxide frit, a bismuth silicate seed material, a pigment, and a vehicle. A preferred bismuth silicate seed material is selected from crystalline Bi.sub.12 SiO.sub.20, Bi.sub.4 (SiO.sub.4).sub.3, and Bi.sub.2 SiO.sub.5, and mixtures thereof. Upon firing a glass substrate coated with the enamel, components of the enamel adhere to the substrate. The glass can be formed with a die to a desired shape with reduced sticking of the coated region to the die. The ceramic enamel is particularly useful in providing a colored border around automotive glass, which enhances appearance and reduces degradation of adhesives by ultraviolet radiation.
    Type: Grant
    Filed: December 8, 1995
    Date of Patent: February 3, 1998
    Assignee: Cerdec Corporation - Drakenfeld Products
    Inventors: George E. Sakoske, Joseph W. Ryan