Resistance Heating Patents (Class 427/545)
-
Patent number: 11211231Abstract: A plasma generation apparatus includes a plasma generation unit. The plasma generation unit has a spherical or elliptical cavity. The plasma generation unit receives radio-frequency (RF) power in such a manner that bounce resonance of electrons is performed to generate plasma in the cavity. The cavity has a plasma extraction hole to communicate with an external space.Type: GrantFiled: January 2, 2018Date of Patent: December 28, 2021Assignee: Korea Research Institute of Standards and ScienceInventors: Hyo Chang Lee, Jung-Hyung Kim, Dae-Jin Seong
-
Patent number: 9059220Abstract: The present disclosure in an exemplary embodiment relates to an apparatus for manufacturing polysilicon. The apparatus for manufacturing polysilicon comprises a base plate; a container body coupled to the base plate; at least one rod; a reaction gas source and a power supply. The at least one rod is configured to have legs respectively connected with three electrodes installed on the base plate and to be disposed in the container body. The reaction gas source is configured to communicate with the container body for supplying a reaction gas into the container body. The power supply is configured to connect with the electrodes for supplying an electric current to energize the rod to generate heat.Type: GrantFiled: November 20, 2014Date of Patent: June 16, 2015Assignee: Iljin Plant Service Co., Ltd.Inventors: Ik-jin Kim, Sung-hwan Choi
-
Publication number: 20150093523Abstract: Coatings and heatable coatings containing electrically conductive nanomaterial; methods for making such a coating; items with such a coating; and methods for applying such a coating. In one aspect, such a coating is a deicing coating. This abstract is provided to comply with the rules requiring an abstract which will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure and is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims, 37 C.F.R. 1.72(b).Type: ApplicationFiled: September 30, 2013Publication date: April 2, 2015Inventors: Kyle Ryan Kissell, James BruceSinclair Sifton, William Doyle Stringfellow, John Bready Stuart
-
Publication number: 20150093621Abstract: A battery on a conductive metal wire and components of a battery on a conductive metal wire of circular cross section diameter of 5-500 micrometers and methods of making the battery and battery components are disclosed. In one embodiment, the battery features a porous anode or cathode layer which assist with ion exchange in batteries. Methods of forming the porous anode or cathode layer include deposition of an inert gas or hydrogen enriched carbon or silicon layer on a heated metal wire followed by annealing of the inert gas or hydrogen enriched carbon silicon layer. Energy storage devices having bundles of batteries on wires are also disclosed as are other energy storage devices.Type: ApplicationFiled: December 1, 2014Publication date: April 2, 2015Inventor: Deepak Upadhyaya
-
Patent number: 8957353Abstract: A heat generation system and a method of curing an adhesive for an electrical generator rotor during a rotor rewind operation are provided. The heat generation system includes a heating source in contact with a pole of the electrical generator rotor to heat the pole, thereby reducing heat loss from the adhesive to the pole. The heat generation system also includes at least one holding arrangement holding the heating source in contact with the at least one pole. The method includes applying an adhesive onto an electrical generator rotor and utilizing a heat generation system to provide heat to the electrical generator rotor. The method further includes placing a heating source in contact with the pole, holding the heating source in contact with the pole using a holding arrangement, heating the pole by activating the heating source, and heat curing the adhesive.Type: GrantFiled: October 5, 2011Date of Patent: February 17, 2015Assignee: General Electric CompanyInventors: Jacob Wade Word, Andrew Joseph Dexter
-
Publication number: 20150030759Abstract: A multi-plume pulsed laser deposition (MPPLD) system has been provided for fabrication of an array of diverse materials in predefined regions on a substrate. In one embodiment, the method comprises splitting a high power laser beam into multiple laser beams, split laser beams being focused onto target materials, multiple plumes being generated on the surfaces of target materials, deposition of ablated target materials non-uniformly on a substrate covered with a mask, and heating the substrate during deposition.Type: ApplicationFiled: July 29, 2013Publication date: January 29, 2015Inventor: Xiaojun Zhang
-
Patent number: 8895102Abstract: A method of treating a surface of a mold that includes supplying a fullerene into an amorphous carbon layer that covers the surface of the mold and heating the amorphous carbon layer to at least 400° C. while covering a surface of the amorphous carbon layer with a covering member.Type: GrantFiled: October 28, 2010Date of Patent: November 25, 2014Assignee: Toyota Jidosha Kabushiki KaishaInventor: Yuichi Furukawa
-
Publication number: 20140295095Abstract: A method and apparatus for the continuous powder coating of a non-conductive profile produced in a continuous forming process, such as pultrusion or extrusion, such that the profile is powder coated while on the profile forming machine and before the subject segment of the continuous profile is severed from the continuous profile on the forming machine (i.e. in-line).Type: ApplicationFiled: April 2, 2013Publication date: October 2, 2014Inventors: Robert Langlois, Jeffrey Sugar, Gary Sugar
-
Patent number: 8846163Abstract: A method for removing native oxides from a substrate surface is provided. In one embodiment, the method comprises positioning a substrate having an oxide layer into a processing chamber, exposing the substrate to a gas mixture while forming a volatile film on the substrate and maintaining the substrate at a temperature below 65° C., heating the substrate to a temperature of at least about 75° C. to sublimate the volatile film and remove the oxide layer, and depositing a first layer on the substrate after heating the substrate.Type: GrantFiled: June 5, 2012Date of Patent: September 30, 2014Assignee: Applied Materials, Inc.Inventors: Chien-Teh Kao, Jing-Pei (Connie) Chou, Chiukin (Steven) Lai, Sal Umotoy, Joel M. Huston, Son Trinh, Mei Chang, Xiaoxiong (John) Yuan, Yu Chang, Xinliang Lu, Wei W. Wang, See-Eng Phan
-
Publication number: 20140186546Abstract: A reactor includes a reactor chamber and a carbon nanotube catalyst composite layer. The reactor chamber has an inlet and an outlet. The carbon nanotube catalyst composite layer rotates in the reactor chamber, wherein the carbon nanotube catalyst composite layer defines a number of apertures, gases in the reactor chamber flow penetrate the carbon nanotube catalyst composite layer through the plurality of apertures.Type: ApplicationFiled: April 24, 2013Publication date: July 3, 2014Applicants: HON HAI PRECISION INDUSTRY CO., LTD., TSINGHUA UNIVERSITYInventors: YANG WU, PENG LIU, YANG WEI, JIA-PING WANG, KAI-LI JIANG, SHOU-SHAN FAN
-
Publication number: 20140186547Abstract: A reactor includes a reactor chamber and a substrate. The reactor chamber having an inlet and an outlet. The hollow structure is received in the reactor chamber, wherein the hollow structure includes a sidewall, a bottom, and a opening opposite to the bottom, the sidewall defines a number of apertures, gases in the reactor chamber flow penetrate the hollow structure through the number of apertures.Type: ApplicationFiled: April 25, 2013Publication date: July 3, 2014Applicants: HON HAI PRECISION INDUSTRY CO., LTD., TSINGHUA UNIVERSITYInventors: YANG WU, PENG LIU, YANG WEI, JIA-PING WANG, KAI-LI JIANG, SHOU-SHAN FAN
-
Publication number: 20140178600Abstract: The present disclosure provides a coating method and a coating device. The coating method includes: heating a to-be-coated area of a to-be-coated member; and coating the heated to-be-coated area of the to-be-coated member. Therefore, by pre-heating the to-be-coated area of the to-be-coated member, the temperature of the to-be-coated area of the to-be-coated member is increased to reduce the temperature difference between the to-be-coated area of the to-be-coated member and the coating air flow, which prevents the mixture contained in the coating air flow from generating crystalline material on the to-be-coated area of the to-be-coated member. Thus, the coating layer can be stuck to the to-be-coated area directly and tightly without block from the crystalline material located therebetween, and is prevented from falling off easily to improve the success rate and stability of the coating operation.Type: ApplicationFiled: December 26, 2012Publication date: June 26, 2014Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.Inventors: Wenda Chen, Chujen Wu
-
Patent number: 8623453Abstract: A method for restoring a silver oxide-containing hydrophilic coating includes heating the coating to a temperature between about 260° C. and about 540° C. and maintaining the coating at a temperature between about 260° C. and about 540° C. in an environment containing oxygen and ozone for less than 24 hours.Type: GrantFiled: March 29, 2011Date of Patent: January 7, 2014Assignee: Hamilton Sundstrand Space Systems International, Inc.Inventors: Peter W. Keilich, Mark E. Caron
-
Publication number: 20130337186Abstract: The present invention provides a reactor and a method for the production of high purity silicon granules. The reactor includes a reactor chamber; and the reaction chamber is equipped with a solid feeding port, auxiliary gas inlet, raw material gas inlet, and exhaust gas export. The reaction chamber is also equipped with an internal gas distributor; a heating unit; an external exhaust gas processing unit connected between a preheating unit and a gas inlet. The reaction chamber is further equipped with a surface finishing unit, a heating unit and a dynamics generating unit. The reaction is through decomposition of silicon-containing gas in densely stacked high purity granular silicon layer reaction bed in relative motion, and to use remaining heat of exhaust gas for reheating. The present invention achieves a large scale, efficient, energy saving, continuous, low cost production of high purity silicon granules.Type: ApplicationFiled: August 17, 2013Publication date: December 19, 2013Inventor: Xi Chu
-
Patent number: 8609186Abstract: The presently disclosed subject matter provides a method for manufacturing a coating film whereby a problem of planarity in a plastic film wound up into a roll form can be eliminated and the coating film can be formed uniformly and precisely. There is therefore provided a method for manufacturing a coating film in which a plastic film wound into a roll form is wound off to be allowed to run and is fed while winding the film around a heat roller so as to eliminate deformations in the plastic film, and then a coating liquid is applied onto the plastic film, wherein in a position where wrinkles begin to form in the plastic film due to heating by the heat roller, the plastic film is pneumatically pressed by air jetted from an air nozzle at a pressure equal to or higher than a pressure at which the wrinkles disappear.Type: GrantFiled: December 3, 2010Date of Patent: December 17, 2013Assignee: Fujifilm CorporationInventors: Norichika Kojima, Hidetomo Itoh, Makoto Sato
-
Patent number: 8580356Abstract: A method of fabricating an alignment layer for a liquid crystal display device includes forming an alignment material layer on a substrate by coating an alignment material, irradiating UV rays onto the alignment material layer and pre-baking the alignment material layer; and post-baking the alignment material layer.Type: GrantFiled: December 31, 2007Date of Patent: November 12, 2013Assignee: LG Display Co., Ltd.Inventor: Dong-Cheon Shin
-
Publication number: 20130209702Abstract: In a method for applying a multiplicity of discrete spots of adhesive, distributed over a surface area, permanently to a substrate (3), reduced formation of threads of adhesive is achieved by a rotating applicator head that bears a pattern of openings around its circumference being moved in a direction of application (11) at a lateral distance from and in relation to the surface of the substrate that is to be permanently provided with the pattern, the adhesive is forced out of the openings (2) in the applicator head in the region of a linear or strip-like spacing gap (0) formed between the substrate and the applicator head to form lenticular blobs (4B), the blobs of adhesive are brought into contact with the substrate in the region of the spacing gap, without the applicator head thereby touching the substrate, and the blobs of adhesive are pulled away from the respective openings while becoming attached to the substrate and forming spots of adhesive (4) on the substrate.Type: ApplicationFiled: September 7, 2011Publication date: August 15, 2013Applicant: RWR PATENTVERWALTUNG GBRInventor: Josef Rothen
-
Publication number: 20130135070Abstract: There are provided a rare-earth permanent magnet and a manufacturing method thereof capable of boosting productivity by improving thickness accuracy of a green sheet. In the method, magnet material is milled into magnet powder, and the magnet powder and a binder are mixed to obtain a mixture including 1 to 40 wt % of the binder therein. Next, by high precision coating of a substrate with the mixture, a green sheet is obtained at thickness precision within a margin of error of plus or minus 5% with reference to a designed value. Thereafter, the green sheet is held for predetermined time at binder decomposition temperature in non-oxidizing atmosphere, whereby depolymerization reaction or the like changes the binder into monomer and thus removes the binder. The green sheet with the binder removed therefrom undergoes pressure sintering such as SPS method so as to obtain a permanent magnet 1.Type: ApplicationFiled: March 15, 2012Publication date: May 30, 2013Applicant: NITTO DENKO CORPORATIONInventors: Izumi Ozeki, Katsuya Kume, Toshiaki Okuno, Takashi Ozaki, Tomohiro Omure, Keisuke Taihaku
-
Publication number: 20130115384Abstract: A continuous method for applying coatings to a metal, specifically a metal sheet roll, tape, or any metallic component, which comprises cleaning and heating the metal sheet to a preset temperature and then apply a coating of paint or varnish, which is quickly cured, as the soluble is evaporated by direct contact with hot metal.Type: ApplicationFiled: November 4, 2011Publication date: May 9, 2013Inventor: Armando Sáenz-CHAPA
-
Publication number: 20130093153Abstract: A method of coating an automotive stabilizer bar having a curved portion and a straight portion includes electrically heating the stabilizer bar such that a surface temperature of the straight portion increases at a rate of 10-30° C./sec and then coating a surface of the electrically pre-heated stabilizer bar.Type: ApplicationFiled: March 15, 2011Publication date: April 18, 2013Applicant: CHUO HATSUJO KABUSHIKI KAISHAInventors: Toru Ito, Yoshitaka Ukei
-
Publication number: 20130089676Abstract: A heat generation system and a method of curing an adhesive for an electrical generator rotor during a rotor rewind operation are provided. The heat generation system includes a heating source in contact with a pole of the electrical generator rotor to heat the pole, thereby reducing heat loss from the adhesive to the pole. The heat generation system also includes at least one holding arrangement holding the heating source in contact with the at least one pole. The method includes applying an adhesive onto an electrical generator rotor and utilizing a heat generation system to provide heat to the electrical generator rotor. The method further includes placing a heating source in contact with the pole, holding the heating source in contact with the pole using a holding arrangement, heating the pole by activating the heating source, and heat curing the adhesive.Type: ApplicationFiled: October 5, 2011Publication date: April 11, 2013Applicant: General Electric CompanyInventors: Jacob Wade Word, Andrew Joseph Dexter
-
Publication number: 20130011574Abstract: Provided is a graphene production method including: contacting a carbon source substance with a surface of a flexible film-forming target having electrical conductivity; and applying a current to the film-forming target and heating the film-forming target at a temperature exceeding a graphene production temperature to produce graphene from the carbon source substance on the surface of the film-forming target.Type: ApplicationFiled: June 22, 2012Publication date: January 10, 2013Applicant: SONY CORPORATIONInventors: Toshiyuki Kobayashi, Masashi Bando, Nozomi Kimura, Keisuke Shimizu, Koji Kadono
-
Publication number: 20120242217Abstract: Disclosed herein is an organic electroluminescence display including a plurality of first electrodes, a hole injection/transport layer, a second organic light emitting layer for another color, a connection layer, a first organic light emitting layer for blue color, an electron injection/transport layer, and an electron injection/transport layer. The first electrodes are provided on a substrate on the basis of each of a first organic electroluminescence element for blue color and a second organic electroluminescence element for another color. The hole injection/transport layer is provided over the whole surface area on the first electrodes and having a property for one of hole injection or transport. The second organic light emitting layer for another color is provided over the whole surface area on the hole injection/transport layer and having a crystal part in a part. The connection layer is provided over the whole surface area on the second organic light emitting layer.Type: ApplicationFiled: February 28, 2012Publication date: September 27, 2012Applicant: SONY CORPORATIONInventors: Toshiki Matsumoto, Tadahiko Yoshinaga
-
Patent number: 8216486Abstract: A temperature control module for a semiconductor processing chamber comprises a thermally conductive component body, one or more channels in the component body and one or more tubes concentric therewith, such that gas filled spaces surround the tubes. By flowing a heat transfer liquid in the tubes and adjusting the gas pressure in the spaces, localized temperature of the component body can be precisely controlled. One or more heating elements can be arranged in each zone and a heat transfer liquid can be passed through the tubes to effect heating or cooling of each zone by activating the heating elements and/or varying pressure of the gas in the spaces.Type: GrantFiled: November 28, 2011Date of Patent: July 10, 2012Assignee: Lam Research CorporationInventors: Rajinder Dhindsa, Henry Povolny, Jerry K. Antolik
-
Publication number: 20120161600Abstract: The present invention provides templating methods for replicating patterned metal films from a template substrate such as for use in plasmonic devices and metamaterials. Advantageously, the template substrate is reusable and can provide plural copies of the structure of the template substrate. Because high-quality substrates that are inherently smooth and flat are available, patterned metal films in accordance with the present invention can advantageously provide surfaces that replicate the surface characteristics of the template substrate both in the patterned regions and in the unpatterned regions.Type: ApplicationFiled: November 24, 2009Publication date: June 28, 2012Inventors: David J. Norris, Sang Eon Han, Aditya Bhan, Prashant Nagpal, Nathan Charles Lindquist, Sang-Hyun Oh
-
Publication number: 20120033214Abstract: The invention relates to electromagnetic radiation microoptical diffraction gratings and to a method suitable for the manufacture thereof. The diffraction gratings in accordance with the invention can be used as microspectrometers in the form of scanning microgratings. The microgratings are provided with a surface structure and are able to be manufactured cost effectively and in high volumes. The surface structure is formed at a surface of a substrate and is formed from linear structural elements arranged substantially equidistantly and aligned substantially parallel to one another. At least part of the surface of the substrate and of the structural elements is coated with at least one further layer which forms a uniform sinusoidal surface contoured in a wave-shape (sinusoidal) manner and having alternating arranged wave peaks and wave troughs. A reflective layer can additionally be applied to increase the intensity of reflected radiation.Type: ApplicationFiled: August 11, 2011Publication date: February 9, 2012Applicant: HIPERSCAN GMBHInventors: Fabian Zimmer, Alexander Wolter, Harald Schenk
-
Patent number: 8057848Abstract: A donor substrate and a method of forming an organic semiconductor layer pattern using the donor substrate, whereby a donor substrate is formed using an organic semiconductor precursor having a thermally decomposable substituent through a wet process, the organic semiconductor precursor substrate in the donor substrate is transferred to a receptor substrate as a pattern and heated, and thus is changed into an organic semiconductor. As a result, an organic semiconductor layer pattern is obtained. The method can be used in the manufacture of various devices such as organic light emitting diode and organic thin film transistor. A low-molecular weight organic semiconductor layer pattern can be formed through a wet process, not through deposition. Thus, using the method, a flat display device can be conveniently manufactured at low cost.Type: GrantFiled: June 16, 2006Date of Patent: November 15, 2011Assignee: Samsung Mobile Display Co., Ltd.Inventors: Jong-Jin Park, Tae-Yong Noh, Myeong-Suk Kim, Sung-Hun Lee, Eun-Jeong Jeong, Dong-Woo Shin, Lyong-Sun Pu
-
Patent number: 7992318Abstract: A disclosed heating apparatus for heating a substrate on which a film is coated includes a process chamber having a gas supply opening for supplying a first gas to the process chamber and a gas evacuation opening for evacuating the first gas from the process chamber; a heating plate that is arranged in the process chamber and includes a heating element for heating the substrate; plural protrusions arranged on the heating plate so as to support the substrate; plural suction holes formed in the heating plate so as to attract by suction the substrate toward the heating plate; and a gas inlet adapted to supply a second gas to a gap between the heating plate and the substrate supported by the plural protrusions.Type: GrantFiled: January 17, 2008Date of Patent: August 9, 2011Assignee: Tokyo Electron LimitedInventors: Tatsuya Kawaji, Yuichi Sakai, Masatoshi Kaneda
-
Publication number: 20110151137Abstract: An improved process and apparatus for uniform gas distribution in chemical vapor deposition (CVD) Siemens type processes is provided. The process comprises introduction of a silicon-bearing gas tangentially to and uniformly along the length of a growing silicon rod in a CVD reactor, resulting in uniform deposition of polysilicon along the rod. The apparatus comprises an improved gas nozzle design and arrangement along the length of the rod, promoting uniform deposition of polysilicon.Type: ApplicationFiled: December 16, 2010Publication date: June 23, 2011Inventors: Vithal Revankar, Sanjeev Lahoti
-
Publication number: 20110097512Abstract: A method for making a carbon nanotube composite includes providing a free-standing carbon nanotube structure and a reacting liquid with a metal compound dissolved therein, treating the carbon nanotube structure by applying the reacting liquid on the carbon nanotube structure, and heating the treated carbon nanotube structure in an oxide-free environment to decompose the metal compound.Type: ApplicationFiled: June 30, 2010Publication date: April 28, 2011Applicants: TSINGHUA UNIVERSITY, HON HAI PRECISION INDUSTRY CO., LTD.Inventors: RUI-FENG ZHOU, CHUI-ZHOU MENG, KAI LIU, KAI-LI JIANG, CHANG-HONG LIU, SHOU-SHAN FAN
-
Patent number: 7931518Abstract: The present invention provides a process for preparing a light transmissive electromagnetic wave shielding material having an excellent light transmissive property, an excellent electromagnetic wave shielding property, an excellent appearance property and an excellent legibility by a simple method. A process for the preparation of a light transmissive electromagnetic wave shielding material comprising; (A1) printing a pretreatment agent for electroless plating comprising a noble metal compound and a mixture of silane coupling agent and azole compound or a reaction product thereof in a mesh pattern on a transparent substrate 11 to form a mesh-patterned pretreatment layer 12, and (A2) subjecting the pretreatment layer 12 to electroless plating to form a mesh-patterned metal conductive layer 13 on the pretreatment layer 12.Type: GrantFiled: August 3, 2007Date of Patent: April 26, 2011Assignee: Bridgestone CorporationInventors: Hidefumi Kotsubo, Tatsuya Funaki, Kiyomi Sasaki
-
Publication number: 20110042132Abstract: The present invention relates to a method of producing an electrically conducting via in a substrate and to a substrate produced thereby. In particular, in one embodiment, the present invention relates to a substrate, such as a printed circuit board having one or several metal-free electrically conducting vias.Type: ApplicationFiled: August 18, 2010Publication date: February 24, 2011Inventor: Leander DITTMANN
-
Publication number: 20100178433Abstract: A dispensing apparatus for dispensing adhesive includes an adhesive source and a dispensing member. The dispensing member is movably attached to the adhesive source. A dispensing nozzle is located on the dispensing member to dispense adhesive onto a component. A heating element is also located on the dispensing member to heat the component. Finally, a roller element is located on the dispensing member to apply pressure to the adhesive.Type: ApplicationFiled: January 14, 2009Publication date: July 15, 2010Applicant: GM GLOBAL TECHNOLOGY OPERATIONS, INC.Inventors: Pei-Chung Wang, Paul E. Crittenden, John D. Fickes
-
Patent number: 7601403Abstract: A method for preparing highly dense functional oxides with crystallite size in the range of 10-20 nm. Using a high pressure modification of a the Spark Plasma Sintering (SPS) technique, rapid thermal cycles (<10 min) coupled with very rapid pressure increase up to 1 GPa can be obtained allowing high degree of compaction and very limited grain growth. This combination of techniques was employed to produce the finest-grained ceramics ever prepared in bulk form in the case of fully stabilized zirconia and Sm-doped Ceria.Type: GrantFiled: April 15, 2005Date of Patent: October 13, 2009Assignee: The Regents of the University of CaliforniaInventors: Umberto Anselmi-Tamburini, Zuhair A. Munir, Javier E. Garay
-
Publication number: 20090202738Abstract: Processes for manufacturing capacitors are provided. The processes include direct heating by passing a current through the metal foil substrate, which allows faster heating rates which in turn allow the growth of larger dielectric grains than obtained with conventional processes. Larger dielectric grains produce a capacitor with a higher specific capacitance.Type: ApplicationFiled: February 9, 2009Publication date: August 13, 2009Applicant: E. I. DU PONT DE NEMOURS AND COMPANYInventors: John Ege Anderson, Juan Carlos Figueroa, John William Hoffman, SR., Damien Francis Reardon
-
Publication number: 20090130333Abstract: Disclosed are a method and an apparatus for preparing a polycrystalline silicon rod using a mixed core means, comprising: installing a first core means made of a resistive material together with a second core means made of silicon material in an inner space of a deposition reactor; electrically heating the first core means and pre-heating the second core by the first core means which is electrically heated; electrically heating the preheated second core means; and supplying a reaction gas into the inner space in a state where the first core means and the second core means are electrically heated for silicon deposition.Type: ApplicationFiled: May 11, 2007Publication date: May 21, 2009Inventors: Hee Young Kim, Kyung Koo Yoon, Yong Ki Park, Won Choon Choi, Won Wook So
-
Publication number: 20090081380Abstract: The reactor for polycrystalline silicon is a reactor for polycrystalline silicon in which a silicon seed rod installed inside the reactor is heated by supplying electricity, a raw material gas supplied inside the reactor is allowed to react, thereby producing polycrystalline silicon on the surface of the silicon seed rod, and specifically, the reactor for polycrystalline silicon is provided with a raw material gas supply port installed on the bottom of the reactor and a raw material gas supply nozzle attached to the raw material gas supply port so as to be communicatively connected and extending upward, in which the upper end of the raw material gas supply nozzle is set to a height in a range from ?10 cm to +5 cm on the basis of the upper end of the electrode which retains the silicon seed rod.Type: ApplicationFiled: September 19, 2008Publication date: March 26, 2009Applicant: Mitsubishi Materials CorporationInventors: Toshihide Endoh, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
-
Publication number: 20080081112Abstract: A reactor for processing a plurality of workpieces including a support for holding the plurality of workpieces, a first processing zone, one or more radiant heating elements adapted to heat a plurality of workpieces positioned in the first processing zone, a second processing zone, one or more resistive heating elements adapted to heat a plurality of workpieces positioned in the second processing zone, and an apparatus for moving the support between the first processing zone and the second processing zone.Type: ApplicationFiled: September 29, 2006Publication date: April 3, 2008Inventors: Paul Brabant, Paul Jacobson
-
Patent number: 6946405Abstract: An organic polymer film of low dielectric constant and high heating resistance which is applicable as an insulating layer of a semiconductor devices is provided, as well as a manufacturing method for the film and a semiconductor device incorporating the film.Type: GrantFiled: July 22, 2002Date of Patent: September 20, 2005Assignee: Hitachi, Ltd.Inventors: Akio Takahashi, Yuichi Satsu, Yoshiko Nakai, Igor Yefimovich Kardash, Andrei Vladimirovich Pebalk, Sergei Nicolaevich Chvalun, Karen Andranikovich Mailyan, Harukazu Nakai
-
Patent number: 6924003Abstract: The present invention provides a method of processing a nanotube, comprising the steps of: causing a selective solid state reaction between a selected part of a nanotube and a reactive substance to have the selected part only become a reaction product; and separating the nanotube from the reaction product to define an end of the nanotube.Type: GrantFiled: December 18, 2000Date of Patent: August 2, 2005Assignee: NEC CorporationInventor: Yuegang Zhang
-
Patent number: 6875318Abstract: A method for providing a level surface onto which a metallic coating may be applied is provided. Articles formed using the method are also provided. The method involves leveling the surface of a substrate by applying an electrophoresis polymeric coating followed by a physical vapor deposition of a metallic coating.Type: GrantFiled: April 11, 2001Date of Patent: April 5, 2005Assignee: Metalbond Technologies, LLCInventors: Alfred M. Gabriele, Peter Dragone, Jacob Avissar, Timothy Coxon
-
Publication number: 20030183171Abstract: A new method and apparatus for avoiding contamination of films deposited in layered depositions, such as Atomic Layer Deposition (ALD) and other sequential chemical vapor deposition (CVD) processes, is taught, wherein CVD-deposited contamination of ALD films is prevented by use of a pre-reaction chamber that effectively causes otherwise-contaminating gaseous constituents to deposit on wall elements of gas-delivery apparatus prior to entering the ALD chamber.Type: ApplicationFiled: March 27, 2003Publication date: October 2, 2003Inventors: Ofer Sneh, Carl J. Galewski
-
Patent number: 6521291Abstract: Improved articles of manufacture are disclosed, together with methods for preparing such articles, whereby the surface of a graphite or comparable substrate is first densified with carbon to reduce surface porosity while still retaining sufficient surface texture to enhance the adherence of a subsequently applied boron coating.Type: GrantFiled: September 4, 2001Date of Patent: February 18, 2003Assignee: Specialty Materials, Inc.Inventor: Raymond J. Suplinskas
-
Publication number: 20020098297Abstract: The present invention is related to a method of crystallizing an amorphous silicon layer and a crystallizing apparatus thereof which crystallize an amorphous silicon layer using of electric fields and plasma. The present invention includes the steps of depositing an inducing substance for silicon crystallization on an amorphous silicon layer by plasma exposure, and carrying out annealing on the amorphous silicon layer while applying an electric field to the amorphous silicon layer. The present invention includes a chamber having an inner space, a substrate support in the chamber wherein the substrate support supports a substrate, a plasma generating means in the chamber wherein the plasma generating means produces plasma inside the chamber, an electric field generating means in the chamber wherein the electric field generating means applies electric field to the substrate, and a heater at the substrate support wherein the heater supplies the substrate with heat.Type: ApplicationFiled: July 9, 1999Publication date: July 25, 2002Inventors: JIN JANG, SOO-YOUNG YOON, JAE-YOUNG OH, WOO-SUNG SHON, SEONG-JIN PARK
-
Patent number: 6395209Abstract: The present invention relates to a deposited plastic film comprising: a deposited plastic film comprising: a plastic film; a coating layer which is formed on at least one surface of said plastic film and comprises a cured resin composition obtained by curing a resin composition comprising 6 to 80% by weight of an oxazoline group-containing water-soluble polymer; and a deposit layer which comprises a metal, metal oxide or mixture thereof and is formed on a surface of said coating layer.Type: GrantFiled: September 24, 1998Date of Patent: May 28, 2002Assignees: Mitsubishi Chemical Corporation, Mitsubishi Polyester Film CorporationInventors: Shigenobu Yoshida, Yuzou Otani
-
Patent number: 6165543Abstract: A method of making an organic EL device which enable production of a color system having image quality in a large display screen. The method of making the organic EL devices includes the steps of, arranging an organic EL transfer base plate obtained by depositing a luminescent organic compound on one side of a heat resistant base film and a transparent substrate provided with at least a transparent electrode leaving a space therebetween, and transferring by sublimation said luminescent organic compound on said transparent substrate by locally heating the heat resistant base film of said organic EL transfer base plate.Type: GrantFiled: June 14, 1999Date of Patent: December 26, 2000Assignee: NEC CorporationInventors: Shigeyoshi Otsuki, Shinichi Fukuzawa
-
Method of manufacturing electron-emitting device and image-forming apparatus comprising such devices
Patent number: 6063453Abstract: An electron-emitting device having an electroconductive film including an electron-emitting region and arranged between a pair of electrodes is manufactured by forming an electroconductive film on a substrate and producing an electron-emitting region in the electroconductive film. The electroconductive film is formed on the substrate by heating the substrate in an atmosphere containing a gasified organic metal compound to a temperature higher than the decomposition of the gasified organic metal compound.Type: GrantFiled: October 30, 1997Date of Patent: May 16, 2000Assignee: Canon Kabushiki KaishaInventors: Yoshinori Tomida, Hisaaki Kawade, Masahito Niibe, Toshikazu Ohnishi, Yoshimasa Okamura -
Patent number: 6010754Abstract: A thermal head producing method in which dispersion of resistance values of heating resistors in each thermal head and dispersion of the resistance values of the heating resistors per dot unit are made uniform to improve printing quality. A glaze layer is formed on a substrate and a heating resistor composed of a thin film resistor material of a mixed composition of a high melting point metal and an insulating material is formed on the glaze layer. First and second pattern conductors for providing common and separate electrodes are formed on the heating resistor and, after a protective film is formed to cover the first and second pattern conductors and the heating resistor, the heating resistor is heated so as to be a higher temperature than a dot temperature required for a printing operation.Type: GrantFiled: November 25, 1997Date of Patent: January 4, 2000Assignee: Rohm Co., Ltd.Inventor: Yutaka Tatsumi
-
Patent number: 5858503Abstract: A method of applying chemical charge-modifiers to a permeable sheet including the steps of: providing a permeable sheet having a plurality of individual exposed surfaces, at least a portion of which having relatively low surface energies; providing an aqueous solution containing amphiphilic macromolecules, the solution having a relatively high surface tension; contacting the solution containing amphiphilic macromolecules under shear stress conditions with the permeable sheet so that at least a portion of the amphiphilic macromolecules are adsorbed onto at least some individual exposed surfaces to form a coated permeable sheet; and contacting the coated permeable sheet with a solution containing chemical charge modifiers to incorporate chemical charge modifiers onto at least a portion of the amphiphilic macromolecules.Type: GrantFiled: October 26, 1995Date of Patent: January 12, 1999Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Dennis Stein Everhart, Kristi Lynn Kiick-Fischer
-
Patent number: 5840449Abstract: The present invention provides a process for the preparation of a material comprising a substrate on whose surface there is at least one pigment coating consisting of one or more pigments of the formula (I) or (II) or derivatives thereofA(D.sub.1)(D.sub.2).sub.x (I)Pc (II)in whichA is the radical of a chromophore of the quinacridone, anthraquinone, perylene, indigo, azo, quinophthalone, isoindolinone, isoindoline, dioxazine, phthalocyanine or diketopyrrolopyrrole series which contains nitrogen atoms attached to D.sub.1 and to x D.sub.2, each nitrogen atom present in A being able independently of the others to be attached to 0, 1 or 2 groups D.sub.1 or D.sub.2,D.sub.1 and D.sub.Type: GrantFiled: May 6, 1996Date of Patent: November 24, 1998Assignee: Ciba Specialty Chemicals CorporationInventors: John Zambounis, Manfred Hofmann