Abstract: Provided herein is a method for the synthesis and the integration of ZnO nanowires and nanocrystalline diamond as a novel hybrid material useful in next generation MEMS/NEMS devices. As diamond can provide a highly stable surface for applications in the harsh environments, realization of such hybrid structures may prove to be very fruitful. The ZnO nanowires on NCD were synthesized by thermal evaporation technique.

Abstract: A method includes generating a plasma plume with a plasma gun, delivering a plurality of coating materials to the plasma plume with a powder feeder assembly to vaporize the coating materials. The delivery includes delivering a first (bond coat) material from a first powder feeder to the plasma gun, ceasing delivery of the first material, increasing a rate of delivery of a second (rare earth stabilized zirconia) material from a second powder feeder to the plasma plume, increasing a rate of delivery of a third material (a rare earth stabilized zirconia material different from the second material) from a third powder feeder to the plasma plume, decreasing a rate of delivery of the second material, and decreasing a rate of delivery of the third material, and depositing the plurality of coating materials on a work piece to produce a layered coating with blended transitions between coating layers.

Abstract: A method of radical-enhanced atomic layer deposition (REALD) involves alternating exposure of a substrate to a first precursor gas and to radicals, such as monatomic oxygen radicals (O.), generated from an oxygen-containing second precursor gas, while maintaining spatial or temporal separation of the radicals and the first precursor gas. Simplified reactor designs and process control are possible when the first and second precursor gases are nonreactive under normal processing conditions and can therefore be allowed to mix after the radicals recombine or otherwise abate. In some embodiments, the second precursor gas is an oxygen-containing compound, such as carbon dioxide (CO2) or nitrous oxide (N2O) for example, or a mixture of such oxygen-containing compounds, and does not contain significant amounts of normal oxygen (O2).

Abstract: A multilayer composite film includes in sequence: a) a biaxially oriented, opaque polyester base layer; b) a non-voided polyester layer on and coextensively in contact with a surface of the base layer; and c) a metal layer on a surface of the non-voided polyester layer opposite the opaque polyester base layer, or on a primer layer on a surface of the non-voided polyester layer opposite the opaque polyester base layer. The film may be prepared by vapor depositing or plasma depositing a metal layer on a surface of a non-voided polyester layer coextensively contacting a biaxially oriented, opaque polyester base layer, or on a primer layer on a surface the non-voided polyester layer.

Abstract: The invention relates to a method and a device for applying a coating to a substrate, where a plasma jet of a low-temperature plasma is produced by conducting a working gas through an excitation zone. The plasma jet is directed at the substrate, and plate-shaped particles having an average thickness between 10 and 50,000 nanometers and a shape factor in a value range from 10 to 2000 are fed into the plasma jet. The plate-shaped particles are fed into the plasma jet by means of a carrier gas. The plasma jet is produced by exciting the working gas by means of an alternating voltage or a pulsed direct voltage.

Abstract: Disclosed is a method for preparing a multifunctional technical textile that exhibits multiple functional properties comprising flame or fire-retardancy, EMI shielding, anti-odorous property, UV protection, oil-repellency, anti-soiling property, antimicrobial property, anti-creasing property, water-proof, and antistatic property. The method comprises washing a textile product in a water solution comprising water mixed with a predetermined quantity of non-ionic detergent, storing the textile product at a predetermined temperature and a predetermined relative humidity, and subjecting the textile product to plasma treatment by placing the same in a plasma stream within a reaction chamber.

Abstract: A method for forming a conformal film of aluminum oxide on a substrate having a patterned underlying layer by PEALD includes: adsorbing an Al precursor containing an Al—C bond and an Al—O—C or Al—N—C bond; providing an oxidizing gas and an inert gas; applying RF power to the reactant gas and the reaction-assisting gas to react the adsorbed precursor with the reactant gas on the surface, thereby forming a conformal film of aluminum oxide on the patterned underlying layer of the substrate, wherein the substrate is kept at a temperature of about 200° C. or lower.

Abstract: An article is disclosed that includes a metallic layer overlaying a substrate surface; a plasma vapor deposited (PVD) oxide layer overlaying the metallic layer; and an exposed polymeric layer overlaying the oxide layer to form a protective layer at the interface between the exposed polymeric layer and the oxide layer.

Abstract: Methods of fabricating a metal hard mask and a metal hard mask fabricated by such methods are described. The method includes flowing at least one metal reactant gas into a reaction chamber configured to perform chemical vapor deposition (CVD), wherein the at least one metal reactant gas includes a metal-halogen gas or a metal-organic gas. The method further includes depositing a hard mask metal layer by CVD using the at least one metal reactant gas.

Abstract: In the growth of carbon nanotubes, the aggregation of catalytic fine particles therefor is a problem. In order to realize the growth of carbon nanotubes into a high density, the carbon nanotube growing process includes a first plasma treatment step of treating a surface having catalytic fine particles with a plasma species generated from a gas which contains at least hydrogen or a rare gas without carbon element, a second plasma treatment step of forming a carbon layer on the surface of the catalytic fine particles by a plasma generated from a gas which contains at least a hydrocarbon after the first plasma treatment step, and a carbon nanotube growing step of growing carbon nanotubes by use of a plasma generated from a gas which contains at least a hydrocarbon after the second plasma treatment step.

Abstract: A method for providing a hard bias structure is provided. The method comprises providing a seed layer for a hard bias layer, the seed layer having a seed layer lattice constant and a natural growth texture. The method further comprises depositing the hard bias layer for the hard bias structure on the seed layer, the natural growth texture corresponding to a texture for the hard bias layer. The hard bias layer has a bulk lattice constant. The step of providing the seed layer includes forming a first plasma of a first deposition gas configured to expand the seed layer lattice constant if the bulk lattice constant is greater than the seed layer constant. The step of depositing the hard bias layer includes forming a second plasma of a second deposition gas configured to expand the bulk lattice constant if the seed layer lattice constant is greater than the bulk lattice constant.

Abstract: The invention relates to a device for vacuum coating substrates in a vacuum chamber, comprising an elongated evaporator array having a plurality of evaporator elements arranged along a longitudinal axis and a first substrate carrier unit which is associated with the evaporator array and has a first pylon that can be rotated about a first axis and contains retaining means for substrates, wherein an angular offset of less than 10° is present between the longitudinal axis and the first rotational axis. The device is characterised in that at least one second substrate carrier unit is provided, which is associated with the evaporator array and has a second pylon that can be rotated about a second axis and contains retaining means for substrates, wherein an angular offset of less than 10° is present between the longitudinal axis and the second rotational axis.

Abstract: A method for forming a film by atomic layer deposition wherein vertical growth of a film is controlled, includes: (i) adsorbing a metal-containing precursor for film formation on a concave or convex surface pattern of a substrate; (ii) oxidizing the adsorbed precursor to form a metal oxide sub-layer; (iii) adsorbing a metal-free inhibitor on the metal oxide sub-layer more on a top/bottom portion than on side walls of the concave or convex surface pattern; and (iv) repeating steps (i) to (iii) to form a film constituted by multiple metal oxide sub-layers while controlling vertical growth of the film by step (iii). The adsorption of the inhibitor is antagonistic to next adsorption of the precursor on the metal oxide sub-layer.

Abstract: The present application relates generally to atomic layer deposition of multi-component, preferably multi-component oxide, thin films. Provide herein is a method for depositing a multi-component oxide film by, for example, an ALD or PEALD process, wherein the process comprises at least two individual metal oxide deposition cycles. The method provided herein has particular advantages in producing multi-component oxide films having superior uniformity. A method is presented, for example, including depositing multi-component oxide films comprising components A-B-O by ALD comprising mixing two individual metal oxides deposition cycles A+O and B+O, wherein the subcycle order is selected in such way that as few as possible consecutive deposition subcycles for A+O or B+O are performed.

Abstract: An aluminum alloy component has a surface region alloyed with an anodic metal to increase corrosion resistance in aqueous environments with high salinity or sulfur content.

Abstract: Disclosed are titanium-tetrahydroaluminates precursors, their method of manufacture, and their use in the deposition of titanium-aluminum-containing films. The disclosed precursors have the formulae Ti(AlH4)3—X, Ti(AlH4)2L and Ti(AlH4)L2. The disclosed precursors may be used to deposit pure titanium-aluminum (TiAl), titanium-aluminum nitride (TiAlN), titanium-aluminum carbide (TiAlC), titanium-aluminum carbonitride (TiAlCN), titanium-aluminum silicide ((TiAl)Si), titanium-aluminum siliconitride ((TiAl)SiN), titanium-aluminum boron ((TiAl)B), titanium-aluminum boron nitride ((TiAl)BN), or titanium-aluminum oxide (TiAlO). or any other titanium-aluminum-containing films. The titanium-aluminum-containing films may be deposited using the disclosed precursors in thermal and/or plasma-enhanced CVD, ALD, pulse CVD or any other type of depositions methods.

Abstract: The preferred embodiments provide a method for forming at least one metal comprising elongated nanostructure on a substrate. The method comprises exposing a metal halide compound surface to a photon comprising ambient to initiate formation of the at least one metal comprising elongated nanostructure. The preferred embodiments also provide metal comprising elongated nanostructures obtained by the method according to preferred embodiments.

Abstract: Cyclopentadienyl and indenyl barium/strontium metal precursors and Lewis base adducts thereof are described. Such precursors have utility for forming Ba- and/or Sr-containing films on substrates, in the manufacture of microelectronic devices or structures.

Abstract: A metamaterial thin film with plasmonic properties formed by depositing metallic films by atomic layer deposition onto a substrate to form a naturally occurring mosaic-like nanostructure having two-dimensional features with air gaps between the two-dimensional features. Due to the unique deposition nanostructure, plasmonic thin films of metal or highly conducting materials can be produced on any substrate, including fabrics and biological materials. In addition, these plasmonic materials can be used in conjunction with geometric patterns that may be used to create multiple resonance plasmonic metamaterials.

Abstract: A fluorine-doped tin oxide (FTO) film preparation method includes the step of using a high purity tin ingot in a magnetron sputtering deposition as a target material, the step of applying argon (Ar) as a working gas to generate plasma for removing impurities from the tin target in increasing the purity of the tin target, and the step of applying reactive gases containing F atoms (CF4) and oxygen (O2) for enabling tetrafluoromethane (CF4) to be dissociated by the generated plasma into fluorine ions and excited fluorine atoms for deposition with tin ions from the tin target on a substrate to form a thin film of fluorine-doped tin oxide on the substrate.

Abstract: A package for fruits and vegetables having galvanic functionality is formed by using two or more metals with different galvanic activity properties on the surface of a nonmetallic substrate. The metals may be deposited electrolytically, by vacuum, autocatalytically, or by other methods. The metals are selected to create a galvanic reaction after the package is filled with a low pH food product and its associated liquids, juices, brine, etc. The package may extend the shelf-life of the food product contained therein, for example, by making metal ions available to the food product.

Abstract: Methods for coating a metal substrate or a metal alloy with electrically conductive titania-based material. The methods produce metal components for electrochemical devices that need high electrical conductance, corrosion resistance and electrode reaction activities for long term operation at a low cost.

Abstract: The invention is directed to a composite polymer/nanoporous film system and methods of fabrication of tunable nanoporous coatings on flexible polymer substrates. The porosity of the nanoporous film can be tuned during fabrication to a desired value by adjusting the deposition conditions. Experiments show that SiO2 coatings with tunable porosity fabricated by oblique-angle electron beam deposition can be deposited on polymer substrates. These conformable coatings have many applications, including in the field of optics where the ability to fabricate tunable refractive index coatings on a variety of materials and shapes is of great importance.

Abstract: A method for treating a surface comprises depositing a first coating comprising a plurality of nanoparticles on a substrate, wherein the first coating defines a plurality of interstitial spaces; and depositing a second coating comprising metals, metal oxides, or mixtures thereof by atomic layer deposition (ALD) on the first coating and within the interstitial spaces defined by the first coating. A mechanically stable coated product comprises a substrate; a first coating comprising a plurality of nanoparticles deposited on the substrate; wherein the first coating defines a plurality of interstitial spaces; and a second coating comprising metals, metal oxides, or mixtures thereof deposited by atomic layer deposition (ALD) on the first coating and within the interstitial spaces defined by the first coating. The mechanically stable thin film coating imparts mechanical robustness to the nanoparticles thin film, and retains or improves the desired optical and wetting properties of the nanoparticle thin film.

Abstract: Depositing pure aluminum and aluminum alloy coatings onto substrates using directed vapor deposition (DVD) method is presented herein. The aluminum alloys have decreased environmental impact both due to their composition and due to the use of DVD process with no hazardous precursors or waste. Corrosion resistance of DVD deposited aluminum and aluminum alloys is effective for protection of steel substrates. The invention includes the use of the DVD technique to apply aluminum and/or aluminum alloy coatings effective for corrosion protection; the use of plasma-activated DVD to enhance the density of aluminum and aluminum alloy coatings deposited at low substrate temperatures; the use of multi-source evaporation to control composition of aluminum alloys during DVD deposition; the application of aluminum and/or aluminum alloy coatings onto NLOS substrates can be used for corrosion protection.

Abstract: An aluminum alloy component has a surface region alloyed with an anodic metal to increase corrosion resistance in aqueous environments with high salinity or sulfur content.

Abstract: An aluminum alloy component has a surface region alloyed with an anodic metal to increase corrosion resistance in aqueous environments with high salinity or sulfur content.

Abstract: The present disclosure provides for methods of fabricating a metal hard mask and a metal hard mask fabricated by such methods. A method includes flowing at least one metal reactant gas into a reaction chamber configured to perform chemical vapor deposition (CVD), wherein the at least one metal reactant gas includes a metal-halogen gas or a metal-organic gas. The method further includes depositing a hard mask metal layer by CVD using the at least one metal reactant gas.

Abstract: The invention relates to a transparent glass substrate, associated with a transparent electro-conductive layer capable of constituting an electrode of a photovoltaic cell and composed of a doped oxide, characterized by the interposition, between the glass substrate and the transparent electroconductive layer, of a mixed layer of one or more first nitride(s) or oxynitride(s), or oxide(s) or oxycarbide(s) having good adhesive properties with glass, and one or more second nitride(s) or oxynitride(s) or oxide(s) or oxycarbide(s) capable of constituting, possibly in the doped state, a transparent electroconductive layer; a method for producing this substrate; a photovoltaic cell, a tempered and/or curved glass, a shaped heating glass, a plasma screen and a flat lamp electrode having this substrate.

Abstract: Coated polymer compositions having improved dielectric strength are disclosed. The coated polymer compositions can comprise a polymer substrate and an inorganic material. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.

Abstract: A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A precursor mixture comprising precursor particles dispersed in a carrying medium is activated in an activation chamber by application of an electric field to ionize at least a portion of the precursor mixture. The activated precursor mixture is then mixed with a combustible gas mixture to add thermal energy to the precursor particles, converting them to nanocrystals, which deposit on a substrate. A second precursor may be blended with the nanocrystals as they deposit on the surface to enhance adhesion and conductivity.

Abstract: A multilayer composite film includes in sequence: a) a biaxially oriented, opaque polyester base layer; b) a non-voided polyester layer on and coextensively in contact with a surface of the base layer; and c) a metal layer on a surface of the non-voided polyester layer opposite the opaque polyester base layer, or on a primer layer on a surface of the non-voided polyester layer opposite the opaque polyester base layer. The film may be prepared by vapor depositing or plasma depositing a metal layer on a surface of a non-voided polyester layer coextensively contacting a biaxially oriented, opaque polyester base layer, or on a primer layer on a surface the non-voided polyester layer.

Abstract: The present invention provides a manufacturing method of a semiconductor device that has a rapid film formation rate and high productivity, and to provide a substrate processing apparatus.

Abstract: Disclosed is a method for preparing a multifunctional technical textile that exhibits multiple functional properties comprising flame or fire-retardancy, EMI shielding, anti-odorous property, UV protection, oil-repellency, anti-soiling property, antimicrobial property, anti-creasing property, water-proof, and antistatic property. The method comprises washing a textile product in a water solution comprising water mixed with a predetermined quantity of non-ionic detergent, storing the textile product at a predetermined temperature and a predetermined relative humidity, and subjecting the textile product to plasma treatment by placing the same in a plasma stream within a reaction chamber.

Abstract: A flow field plate or bipolar plate for a fuel cell that includes a combination of non-stoichiometric and a conductive material that makes the bipolar plate conductive, hydrophilic and stable in the fuel cell environment. The non-stoichiometric and the conductive material can be deposited on the plate as separate layers or can be combined as a single layer. Either the non-stoichiometric layer or the conductive layer can be deposited first. In one embodiment, the conductive material is gold.

Abstract: The present invention relates to a process for the use of Ruthenium amidinate metal precursors for the deposition of Ruthenium-containing films via Plasma Enhanced Atomic Layer Deposition (PEALD) or Plasma Enhanced Chemical Vapor Deposition (PECVD).

Abstract: The present invention relates to a process for the use of Titanium amidinate metal precursors for the deposition of Titanium-containing films via Plasma Enhanced Atomic Layer Deposition (PEALD) or Plasma Enhanced Chemical Vapor Deposition (PECVD).

Abstract: The disclosure relates to a process for depositing a Manganese-containing film comprising the step of providing a metal guanidinate and/or metal amidinate precursor, suitable for plasma deposition at temperature equal or lower than 500 degrees C., to a plasma deposition process comprising a deposition temperature equal or lower than 500 degrees C.

Abstract: The disclosure relates to a process for depositing a Nickel or Cobalt containing film comprising the step of providing a metal guanidinate and/or metal amidinate precursor, suitable for plasma deposition at temperature equal or lower than 500 degrees C., to a plasma deposition process comprising a deposition temperature equal or lower than 500 degrees C.

Abstract: The invention relates to a method for diffusing metal particles included in a composite layer previously deposited on a substrate, said composite layer further including at least one dielectric matrix. According to this method, the diffusion of said metal particles towards said substrate is achieved by means of a plasma treatment.

Abstract: Metal imidazolate complexes are described where imidazoles ligands functionalized with bulky groups and their anionic counterpart, i.e., imidazolates are described. Compounds comprising one or more such polyalkylated imidazolate anions coordinated to a metal or more than one metal, selected from the group consisting of alkali metals, transition metals, lanthanide metals, actinide metals, main group metals, including the chalcogenides, are contemplated. Alternatively, multiple different imidazole anions, in addition to other different anions, can be coordinated to metals to make new complexes. The synthesis of novel compounds and their use to form thin metal containing films is also contemplated.

Abstract: A main object of the present invention is to provide a solid electrolyte material having excellent Li ion conductivity. To attain the object, the present invention provides a solid electrolyte material represented by a general formula: Lix(La1-aM1a)y(Ti1-bM2b)zO?, characterized in that “x”, “y”, and “z” satisfy relations of x+y+z=1, 0.652?x/(x+y+z)?0.753, and 0.167?y/(y+z)?0.232; “a” is 0?a?1; “b” is 0?b?1; “?” is 0.8???1.2; “M1” is at least one selected from the group consisting of Sr, Na, Nd, Pr, Sm, Gd, Dy, Y, Eu, Tb, and Ba; and “M2” is at least one selected from the group consisting of Mg, W, Mn, Al, Ge, Ru, Nb, Ta, Co, Zr, Hf, Fe, Cr, and Ga.

Abstract: Enhanced corrosion resistance is achieved in a coating by using a germanium-containing precursor and hollow cathode techniques to form a first layer directly on the surface of a workpiece, prior to forming an outer layer, such as a layer of diamond-like carbon (DLC). The use of a germanium or germanium-carbide precursor reduces film stress and enables an increase in the thickness of the subsequently formed DLC. Germanium incorporation also reduces the porosity of the layer. In one embodiment, a cap layer containing germanium is added after the DLC in order to further reduce the susceptibility of the coating to chemical penetration from the top.

Abstract: A molecular plasma deposition (MPD) method in combination with an atomic layer deposition (ALD) procedure is used to produce amorphous, nonconformal thin metal film coatings on a variety of substrates. The films are porous, mesh-like lattices with imperfections such as pinholes and pores, which are useful as scaffolds for cell attachment, controlled release of bioactive agents and protective coatings.

Abstract: The present invention relates to a method for manufacturing a fuel cell electrode (E) by depositing a catalytic layer (2) on a diffusion layer (3), characterized in that said catalyst is deposited on the diffusion layer (3) by ionized physical vapor deposition (IPVD) in a vacuum chamber. The invention also relates to a method for manufacturing a fuel cell half-core comprising an ionic membrane (1), a catalytic layer (2) and a diffusion layer (3) by depositing the catalytic layer (2) on a support (1; 3), characterized in that said catalyst is deposited on the support (1; 3) by ionized physical vapor deposition (IPVD) in a vacuum chamber.

Abstract: Processes, systems, and apparatuses are disclosed for forming products from atomized metals and alloys. A stream of molten alloy and/or a series of droplets of molten alloy are produced. The molten alloy is atomized to produce electrically-charged particles of the molten alloy by impinging electrons on the stream of molten alloy and/or the series of droplets of molten alloy. The electrically-charged molten alloy particles are accelerated with at least one of an electrostatic field and an electromagnetic field. The accelerating molten alloy particles are cooled to a temperature that is less than a solidus temperature of the molten alloy particles so that the molten alloy particles solidify while accelerating. The solid alloy particles are impacted onto a substrate and the impacting particles deform and metallurgically bond to the substrate to produce a solid alloy preform.

Abstract: A process for the deposition of a tin oxide film is provided that includes the decomposition of a tetravalent tin precursor under conditions of plasma enhanced chemical vapor deposition in a linear plasma source and onto a substrate moving through a plasma generated by the linear plasma source with a linear uniformity of thickness that varies by less than 5 thickness percent across the substrate. The substrate having a width of greater than 30 centimeters. The tin oxide film contains a dopant and a dopant concentration such that the film has a resistivity as a function of film deposition temperature of less than ?4.6×10?5 Ohm-centimeter per degree Kelvin (T) plus 0.01 Ohm-centimeter where T is between 293 Kelvin and 673 Kelvin.

Abstract: The present invention relates to a silver complex obtained by reacting at least one silver compound represented by the formula 2 below with at least one ammonium carbamate compound or ammonium carbonate compound represented by the formula 3, 4 or 5 below:

Abstract: Methods and compositions for depositing a film on one or more substrates include providing a reactor with at least one substrate disposed in the reactor. At least one metal precursor are provided and at least partially deposited onto the substrate to form a metal-containing film.

Abstract: A metal nanoparticle composite is provided, in which a matrix resin layer and metal nanoparticles are immobilized on the matrix resin layer. The metal nanoparticle composite has the following characteristics: a) the metal nanoparticles are obtained by heat-reducing metal ions or metal salts contained in the matrix resin layer or a precursor resin layer thereof; b) the metal nanoparticles exist within a region from the surface of the matrix resin layer to a depth of at least 50 nm; c) particle diameters of the metal nanoparticles are in the range of 1 nm to 100 nm with the mean particle diameter of greater than and equal to 3 nm; and d) a spacing between adjacent metal nanoparticles is greater than and equal to the particle diameter of a larger one of the adjacent metal nanoparticles.