Electromagnetic Or Particulate Radiation Utilized (e.g., Ir, Uv, X-ray, Gamma Ray, Actinic, Microwave, Radio Wave, Atomic Particle; I.e., Alpha Ray, Beta Ray, Electron, Etc.) Patents (Class 427/595)
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Patent number: 7294367Abstract: A method of laser forward transfer is disclosed. Photon energy is directed through a photon-transparent support and absorbed by an interlayer coated thereon. The energized interlayer causes the transfer of a biological material coated thereon across a gap and onto a receiving substrate.Type: GrantFiled: June 4, 2004Date of Patent: November 13, 2007Assignee: The United States of America as represented by the Secretary of the NavyInventors: Jason Barron, Bradley R. Ringeisen, Heungsoo Kim, Peter Wu
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Patent number: 7282454Abstract: A component delivery mechanism for distributing a component inside a process chamber is disclosed. The component is used to process a work piece within the process chamber. The component delivery mechanism includes a plurality of component outputs for outputting the component to a desired region of the process chamber. The component delivery mechanism further includes a spatial distribution switch coupled to the plurality of component outputs. The spatial distribution switch is arranged for directing the component to at least one of the plurality of component outputs. The component delivery mechanism also includes a single component source coupled to the spatial distribution switch. The single component source is arranged for supplying the component to the spatial distribution switch.Type: GrantFiled: August 15, 2003Date of Patent: October 16, 2007Assignee: Lam Research CorporationInventors: Richard A. Gottscho, Robert J. Steger
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Patent number: 7267848Abstract: In a method of fabricating a protective film, a vacuum ultraviolet radiation CVD (Chemical Vapor Deposition) system is used. The method includes providing a vacuum ultraviolet rays generator, a reactor provided with a platform for supporting a substrate, a heat retainer provided on the platform, and a window separating the vacuum ultraviolet rays generator from the reactor. Then, a step of feeding an organic stock gas from a gas feeder into the reactor while retaining the temperature of the substrate at a temperature of about equal to or less than 100° C. with the heat retainer is performed. Simultaneously, a step of irradiating the reactor with vacuum ultraviolet rays from the vacuum ultraviolet rays generator through the window is performed.Type: GrantFiled: October 2, 2003Date of Patent: September 11, 2007Assignee: Oki Electric Industry Co., Ltd.Inventors: Junichi Miyano, Kiyohiko Toshikawa, Yoshikazu Motoyama
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Patent number: 7258901Abstract: A nanostructure is fabricated using charged particle deposition to deposit a catalyst on a substrate. A charged particle beam is directed to location on the substrate where the catalyst is to be deposited, with a beam-activated precursor gas also being directed to the location. For example, a nickel dot can be selectively deposited onto a substrate by using a charged particle beam to decompose a nickel-containing precursor gas, and then a carbon nanotube can be grown on the nickel dot, with the diameter of the nanotube conforming to the size of the nickel dot.Type: GrantFiled: March 23, 2006Date of Patent: August 21, 2007Assignee: FEI CompanyInventors: Randall Lee, Thomas Owen Mitchell, Johannes Jacobus Lambertus Mulders
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Patent number: 7211300Abstract: An element is deposited by flowing a gas through a solid donor compound that includes the element, and over a substrate. The flow of gas deposits a film of a few monolayers of donor compound on the substrate. An optical radiation source (e.g., a femtosecond laser) which produces optical radiation at an instantaneous intensity sufficient to cause non linear or otherwise enhanced interaction between optical radiation photons and the donor compound is used to decompose the donor compound and deposit the metal on the substrate. After an initial deposit of the donor compound is produced, optical radiation can be absorbed and heat the substrate in the localized area of the deposit in order to accelerate the deposition process by thermally decomposing the donor compound.Type: GrantFiled: October 31, 2003Date of Patent: May 1, 2007Assignee: International Business Machines CorporationInventors: Richard A. Haight, Peter P. Longo, Alfred Wagner
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Patent number: 7192622Abstract: Process of masking cooling holes of a gas turbine component with an external surface, comprising a cavity and a plurality of cooling holes before coating the gas turbine component, comprising the steps of first applying a mask material to the cooling holes so that the cooling holes are filled at least closest to the external surface, whereby the mask material contains a substance which fluoresces under ultraviolet light and a filler material. Then the mask material within the cooling holes is thickening. An inspection using ultraviolet light to locate any unwanted residual mask material on the external surface is carried out and unwanted residual mask material is removed before the coating is applied to the external surface of the component and the masked cooling holes. In the end the mask material is removed from the cooling holes.Type: GrantFiled: November 24, 2004Date of Patent: March 20, 2007Assignee: Alstom Technology LtdInventors: John Fernihough, Andreas Boegli, Alexander Stankowski
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Patent number: 7175733Abstract: A multi-layer structure includes a fluoropolymer bonded to a substrate. The structure is prepared by exposing a bonding composition to actinic radiation, such as ultraviolet radiation, to form the bond. The bonding composition includes a light-absorbing compound and an electron donor. The bonding composition includes non-adhesive materials.Type: GrantFiled: September 19, 2003Date of Patent: February 13, 2007Assignee: 3M Innovative Properties CompanyInventors: Naiyong Jing, Trang D. Pham, Andrew M. Hine
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Patent number: 7157120Abstract: A method for treating wood having a high extractive content is disclosed. The method generally comprises applying to the wood a coating comprising a water-based polyurethane dispersion and a crosslinker. The dispersion can be cured and one or more additional coatings can be applied. The method results in reduced migration of extractives to the surface of the wood, improved adhesion and/or reduced staining of the wood.Type: GrantFiled: May 4, 2004Date of Patent: January 2, 2007Assignee: PPG Industries Ohio, Inc.Inventors: Nilo M. Neto, Brian J. Knapp
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Patent number: 7128950Abstract: An electron beam physical vapor deposition (EBPVD) process performed with a coating apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber operated at an elevated temperature and a subatmospheric pressure. The coating chamber contains a crucible and a coating material surrounded by and contained within the crucible, and the coating material has a surface exposed by the crucible. The process entails projecting an electron beam onto the surface of the coating material, wherein the electron beam defines a beam pattern having a higher intensity at an interface of the surface of the coating material with the crucible than at a central region of the surface of the coating material.Type: GrantFiled: January 8, 2004Date of Patent: October 31, 2006Assignee: General Electric CompanyInventors: Robert William Bruce, John Douglas Evans, Sr.
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Patent number: 7109024Abstract: This invention features a biomolecule-bound substrate that includes a support made of an organic polymer and having an unmodified surface; and a plurality of unmodified biomolecules immobilized on the unmodified surface. The organic polymer is acrylic resin, polypropylene, polystyrene, polyethylene, polyvinyl chloride, polysulfone, polycarbonate, cellulose acetate, rubber, latex, polyethylene terephthalate, acrylonitrile butadiene styrene, acrylonitrile styrene, or a combination thereof. The substrate is formed by placing the unmodified biomolecules on the unmodified surface followed by ultraviolet irradiation.Type: GrantFiled: April 7, 2003Date of Patent: September 19, 2006Assignee: Dr. Chip Biotechnology Inc.Inventors: Kan-Hung Lee, Yu-Hau Shih, Chuan-Mei Tsai, Yih-Weng Wang, Hsiung Hsiao, Chi-Horng Bair, Shin-Hwan Wang
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Patent number: 7105208Abstract: The invention includes methods and processes in which microwave radiation is utilized to activate at least one component within a reaction chamber during deposition of a material over a substrate within the reaction chamber.Type: GrantFiled: October 30, 2003Date of Patent: September 12, 2006Assignee: Micron Technology, Inc.Inventors: Craig M. Carpenter, Ross S. Dando, Philip H. Campbell
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Patent number: 7101593Abstract: A method for producing a disk-shaped substrate 10 used for producing an optical disk includes: (a) forming a protective layer 12a that is larger in area than the disk-shaped substrate 10 on a surface of a transparent plate 11a; and (b) cutting a portion of the plate 11a with the protective layer 12a formed thereon other than an outer edge portion of the protective layer 12a to form a disk shape. According to this producing method, a thin substrate can be prevented from being damaged by forming a protective layer. Furthermore, according to this producing method, a protective layer with a uniform thickness can be formed.Type: GrantFiled: April 24, 2001Date of Patent: September 5, 2006Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Kazuhiro Hayashi, Kazuya Hisada, Eiji Ohno
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Patent number: 7097884Abstract: A method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions, and reactive gas is introduced to the ion beam to saturate dangling bonds on the surface. Another method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions and quenched with a reactive component to saturate dangling bonds on the surface.Type: GrantFiled: June 26, 2003Date of Patent: August 29, 2006Assignee: International Business Machines CorporationInventors: Alessandro C. Callegari, Praveen Chaudhari, Fuad E. Doany, James P. Doyle, Eileen A. Galligan, James H. Glownia, Gareth G. Hougham, James A. Lacey, Shui-Chih Lien, Minhua Lu, Alan E. Rosenbluth, Kei-Hsiung Yang
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Patent number: 7094451Abstract: A method using irradiation with optical light in the presence of a chemical dissolved in a solvent which chemical reacts with the surface in the presence of the irradiation to modify the surface (12A, 104A, 202A, 304A, 402A, 502A) of a substrate (12, 104, 202, 304, 402, 502) is described. The light can be pulsed or continuous. The method is significantly enhanced by the presence of water (14, 124, 204, 308, 410, 508) as the solvent containing the dissolved chemical on the surface. The treated surfaces are more paintable and bondable.Type: GrantFiled: November 7, 2002Date of Patent: August 22, 2006Assignee: Board of Trustees of Michigan State UniversityInventors: Lawrence T. Drzal, Praveen Tummala
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Patent number: 7091126Abstract: An improvement in a copper damascene process is disclosed. The improvement comprises the step of projecting an electron beam on to a chemical mechanically polished material surface having copper filled etched trenches at a known angle of incidence with respect to the material surface for a known period of time, the electron beam having a beamwidth substantially covering the material surface and a known intensity.Type: GrantFiled: April 24, 2003Date of Patent: August 15, 2006Assignee: Taiwan Semiconductor Manufacturing CompanyInventors: Han-Hsin Kuo, Hung-Wen Su, Wen-Chih Chiou, Tsu Shih, Hsien-Ming Lee
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Patent number: 7083824Abstract: It is disclosed a method of protecting a local area of components (1) from the effects of thermochemical or mechanical processes carried out on the surface (6) of the component. A masking material (5) containing at least one filler material is applied to the local area so that the local area is protected by the masking material (5). This is at least partially polymerized on the local area. Subsequently the thermochemical or physical processes on the surface (6) of the component (1) are carried out after which the polymerized masking material (5) is removed from the local area of the component (1).Type: GrantFiled: August 1, 2003Date of Patent: August 1, 2006Assignee: Alstom Technology LTDInventors: Alexander Stankowski, Andreas Boegli, John Fernihough
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Patent number: 7041342Abstract: There are now provided thin-film solar cells and method of making. The devices comprise a low-cost, low thermal stability substrate with a semiconductor body deposited thereon by a deposition gas. The deposited body is treated with a conversion gas to provide a microcrystalline silicon body. The deposition gas and the conversion gas are subjected to a pulsed electromagnetic radiation to effectuate deposition and conversion.Type: GrantFiled: October 10, 2003Date of Patent: May 9, 2006Assignee: Schott GlasInventors: Manfred Lohmeyer, Stefan Bauer, Burkhard Danielzik, Wolfgang Möhl, Nina Freitag
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Patent number: 7033647Abstract: Method of synthesizing carbon nano tubes (CNTs) on a catalyst layer formed on a support member, by catalytic deposition of carbon from a gaseous phase, whereby an ion beam is used prior to, during, and/or after formation of the carbon nano tubes for modifying the physical, chemical, and/or conductive properties of the carbon nanotubes.Type: GrantFiled: November 20, 2002Date of Patent: April 25, 2006Assignees: Electrovac, Fabrikation Elektrotechnischer Spezialartikel Gesellschaft M.B.H., IMS-Ionen Mikrofabrikationas SystemeInventors: Xinhe Tang, Klaus Mauthner, Ernst Hammel, Hans Löschner, Elmar Platzgummer, Gerhard Stengl
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Patent number: 7014889Abstract: Plasma deposition apparatus (1) and method that allows metal or nonmetal vapor (6) to be generated by electron-beam evaporation, guides that vapor using a noble gas stream (containing reactive gases in cases of reactive evaporation), ionizes the dense directed gas and vapor stream at working pressures above about 0.0001 mbar using a hollow cathode plasma arc discharge (11), and conveys the ionized vapor and/or gas stream towards the substrate (4) for impact on the surface at energies varying from thermal levels (as low as about 0.05 eV) up to about 300 eV.Type: GrantFiled: May 23, 2001Date of Patent: March 21, 2006Assignee: University of Virginia Patent FoundationInventors: James F. Groves, Derek D. Hass, Haydn N. G. Wadley, Goesta Mattausch, Henry Morgner, Siegfried Schiller
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Patent number: 7014885Abstract: A device and method for depositing a material of interest onto a receiving substrate includes a first laser and a second laser, a receiving substrate, and a target substrate. The target substrate comprises a laser transparent support having a back surface and a front surface. The front surface has a coating that comprises the source material, which is a material that can be transformed into the material of interest. The first laser can be positioned in relation to the target substrate so that a laser beam is directed through the back surface of the target substrate and through the laser-transparent support to strike the coating at a defined location with sufficient energy to remove and lift the source material from the surface of the support. The receiving substrate can be positioned in a spaced relation to the target substrate so that the source material is deposited at a defined location on the receiving substrate.Type: GrantFiled: July 19, 2000Date of Patent: March 21, 2006Assignee: The United States of America as represented by the Secretary of the NavyInventors: Alberto Piqué, Raymond Auyeung, James Fitzgerald, Douglas B. Chrisey, Huey-Daw Wu, Paul Kydd, David L. Richard
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Patent number: 7011890Abstract: A method for depositing a low dielectric constant film is provided. The low dielectric constant film includes alternating sublayers, which include at least one carbon-doped silicon oxide sublayer. The sublayers are deposited by a plasma process than includes pulses of RF power. The alternating sublayers are deposited from two or more compounds that include at least one organosilicon compound. The two or more compounds and processing conditions are selected such that adjacent sublayers have different and improved mechanical properties.Type: GrantFiled: March 3, 2003Date of Patent: March 14, 2006Assignee: Applied Materials Inc.Inventors: Son Van Nguyen, Yi Zheng
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Patent number: 6994894Abstract: A method of depositing a solid film on a substrate in which a stream comprising particles suspended in a transport gas is moved through a heating zone. The particles are combined with the transport gas from a powder feeder operatively coupled to a gas flow tube. The particle stream is directed toward the heating zone by ejecting the powder stream from a nozzle connected to a distal end of the gas flow tube. A radiation source is directed at the suspended particles as they move through the heating zone so that the particles heated to a molten state. The droplets are undercooled in a cooling zone before impact with the substrate.Type: GrantFiled: April 20, 2001Date of Patent: February 7, 2006Assignee: Vanderbilt UniversityInventor: William Hofmeister
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Patent number: 6984421Abstract: Encapsulating a component structure includes applying a fluid, light-sensitive first reactive resin layer to a surface of a component substrate containing the component structure, exposing and developing the first reactive resin layer so as to form a frame structure that encloses the component structure, covering the frame structure with an auxiliary foil, applying a second reactive resin layer to a surface of the auxiliary foil so as to form ceiling structures on the surface of the auxiliary foil, at least one of the ceiling structures making a seal with the frame structure, and removing the auxiliary foil in areas between ceiling structures.Type: GrantFiled: February 2, 2001Date of Patent: January 10, 2006Assignee: EPCOS AGInventors: Wolfgang Pahl, Walter Fischer
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Patent number: 6977025Abstract: The invention provides a method of forming a monolayer of substantive particles including the steps of applying to a substrate a curable composition having substantive particles contained therein, the substantive particles having a particle size on at least one dimension thereof of at least 1 micrometer and being in two or more groups of different sizes; exposing the substantive particle-containing curable composition to a source of energy suitable for effecting polymerization of the curable composition for a sufficient time to effect polymerization of a layer of the curable composition having a thickness of no more than 50% of the height of the largest substantive particles; and optionally, removing uncured curable composition. The invention also provides a method of forming a monolayer of substantive particles in a non-random array where the curable composition comprises a ferrofluid composition.Type: GrantFiled: March 17, 2003Date of Patent: December 20, 2005Assignee: Loctite (R&D) LimitedInventors: Ciaran Bernard McArdle, Rory Brian Barnes
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Patent number: 6964793Abstract: A high-throughput lithography process for creating high-resolution patterns in a polymerizable composition using carefully controlled electric field followed by curing of the polymerizable composition is described. The process involves the use of a template that includes the desired patterns. This template is brought into close proximity to the polymerizable composition on the substrate. An external electric file is applied to the template-substrate interface while maintaining a uniform, carefully controlled gap between the template and substrate. This causes the polymerizable composition to be attracted to the raised portions of the template. By appropriately choosing the various process parameters such as the viscosity of the polymerizable composition, the magnitude of the electric field, and the distance between the template and substrate, the resolution of the structures formed in the liquid may be controlled to conform to that of the template.Type: GrantFiled: May 16, 2001Date of Patent: November 15, 2005Assignee: Board of Regents, The University of Texas SystemInventors: Carlton Grant Willson, Sidlgata V. Sreenivasan, Roger T. Bonnecaze
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Patent number: 6957624Abstract: One embodiment of the invention involves introducing at least two metals into a chamber for forming an alloy layer over a substrate. This is accomplished by a variety of methods. In one embodiment, at least two metals are mixed and introduced into a chamber in which a focused ion beam contacts the two metals to form at least one alloy layer over a substrate. In another embodiment, at least two precursor gas sources are introduced into the chamber in which each precursor gas source contains a metal. The focused ion beam contacts the two precursor gases to form an alloy layer over the substrate. In yet another embodiment, a second metal layer is formed over a first metal layer to form a multi-metal layer. Thereafter, thermal treatment or introducing a focused ion beam to at least a portion of the multi-metal layer is performed to create at least one alloy layer over the substrate.Type: GrantFiled: July 28, 2003Date of Patent: October 25, 2005Assignee: Intel CorporationInventor: Ilan Gavish
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Patent number: 6953519Abstract: In order to establish processing techniques capable of making multi-tip probes with sub-micron intervals and provide such microscopic multi-tip probes, there is provided an outermost surface analysis apparatus for semiconductor devices etc. provided with a function for enabling positioning to be performed in such a manner that there is no influence on measurement in electrical measurements at an extremely small region using this microscopic multi-tip probe, and there are provided the steps of making a cantilever 1 formed with a plurality of electrodes 3 using lithographic techniques, and forming microscopic electrodes 6 minute in pitch by sputtering or gas-assisted etching a distal end of the cantilever 1 using a focused charged particle beam or using CVD.Type: GrantFiled: August 29, 2003Date of Patent: October 11, 2005Assignee: SII NanoTechnology Inc.Inventors: Yoshiharu Shirakawabe, Hiroshi Takahashi, Tadashi Arai
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Patent number: 6954257Abstract: An optical element of a lithographic projection apparatus includes a Si/Mo multilayer structure, an outer capping layer and an interlayer positioned between the multilayer structure and the outer capping layer. The interlayer has a thickness of between 0.3 and 0.7 times the wavelength of the incident radiation. The interlayer may be C or Mo and has a thickness of between 6.0 and 9.0 nm. The interlayer may include an inner interlayer including Mo next to the multilayer structure and an outer interlayer including C next to the capping layer. The outer interlayer is at least 3.4 nm thick and the capping layer is Ru and at least 2.0 nm thick.Type: GrantFiled: August 26, 2003Date of Patent: October 11, 2005Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Ralph Kurt, Andrei Evgenuevich Iakchine Yakshin
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Patent number: 6951668Abstract: A process for applying a coating containing a fusible material to a cutting edge of a cutting tool includes heating the fusible material to fuse the same, the heating being provided by microwave energy.Type: GrantFiled: March 27, 2003Date of Patent: October 4, 2005Assignee: Eveready Battery Company, Inc.Inventors: Raymond Guimont, Randy Nicolgai
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Patent number: 6936311Abstract: A method for creating a microarray of biomaterial uses a source of laser energy, a receiving substrate, and a target substrate. The target substrate comprises a laser-transparent support having a laser-facing surface and a support surface. The target substrate also comprises a composite material having a back surface in contact with the support surface and a front surface. The composite material comprises a mixture of the biomaterial to be deposited and a matrix material. The matrix material is a material that has the property that, when it is exposed to laser energy, it desorbs from the laser-transparent support. The source of laser energy is positioned in relation to the target substrate so that laser energy is directed through the laser-facing surface of the target substrate and through the laser-transparent support to strike the composite material at a defined target location. The receiving substrate is positioned in a spaced relation to the target substrate.Type: GrantFiled: February 8, 2002Date of Patent: August 30, 2005Assignee: The United States of America as represented by the Secretary of the NavyInventors: Bradley R. Ringeisen, Douglas B. Chrisey, Alberto Pique, R. Andrew McGill, David Krizman
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Patent number: 6933020Abstract: A coating composition that can be used in a process for coating a substrate where in a first step a radiation curable coating composition is applied to the substrate and/or a radiation permeable film. Next, the substrate and the film are pressed together in such a way that the coating composition is sandwiched between them. Thereafter, the coating composition is cured by irradiation through the film to obtain a coated substrate. In a subsequent step, the film is removed from the coated substrate. The coating composition applied to the film and/or the substrate is a hot melt composition comprising 20 to 100 wt. % of a radiation curable resin or mixture of radiation curable resins having a viscosity in the range of from 15 to 10,000 mPa.s in the temperature range of from 40 to 150° C.Type: GrantFiled: March 6, 2003Date of Patent: August 23, 2005Assignee: Akzo Nobel N.V.Inventors: Clive Nicholas Dove, John Sutcliffe, Ann Kerstin Birgitta Kjelqvist Lindell
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Patent number: 6905738Abstract: A method for depositing a transfer material onto a receiving substrate uses a source of laser energy, a receiving substrate, and a target substrate. The target substrate comprises a laser-transparent support having a laser-facing surface and a support surface. The target substrate also comprises a composite material having a back surface in contact with the support surface and a front surface. The composite material comprises a mixture of the transfer material to be deposited and a matrix material. The matrix material is a material that has the property that, when it is exposed to laser energy, it desorbs from the laser-transparent support. The source of laser energy is positioned in relation to the target substrate so that laser energy is directed through the laser-facing surface of the target substrate and through the laser-transparent support to strike the composite material at a defined target location. The receiving substrate is positioned in a spaced relation to the target substrate.Type: GrantFiled: February 8, 2002Date of Patent: June 14, 2005Assignee: The United States of America as represented by the Secretary of the NavyInventors: Bradley R. Ringeisen, Douglas B. Chrisey, Alberto Pique, R. Andrew McGill
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Patent number: 6905736Abstract: The method for the fabrication of nano scale temperature sensors and nano scale heaters using focused ion beam (FIB) techniques. The process used to deposit metal nano strips to form a sensor is ion beam assisted chemical vapor deposition (CVD). The FIB Ga+ ion beam can be used to decompose W(CO)6 molecules to deposit a tungsten nano-strip on a suitable substrate. The same substrate can also be used for Pt nano-strip deposition. The precursors for the Pt can be trimethyl platinum (CH3)3Pt in the present case. Because of the Ga+ beam used in the deposition, both Pt and W nano-strips can contain a certain percentage of Ga impurities, which we denoted as Pt(Ga) and W(Ga) respectively. Our characterization of the response of this Pt(Ga)/W(Ga) nano scale junction indicates it has a temperature coefficient of approximately 5.4 mV/° C. This is a factor of approximately 130 larger than the conventional K-type thermocouples.Type: GrantFiled: February 27, 2002Date of Patent: June 14, 2005Assignee: University of Central FloridaInventors: Lee Chow, Dan Zhou, Fred Stevie
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Patent number: 6902769Abstract: The present invention relates to a process for process for preparing a coating by a) applying to a porous and/or absorbent substrate a liquid coating composition containing at least one component having (meth)acryloyl groups and a dynamic viscosity of less than 2000 mPa.s and 0.1 to 10 wt. %, based on the non-volatile content of the coating composition, of an additive selected from polyamides, oligomeric fatty acid amides and polymeric fatty acid amides and b) polymerizing the composition with radiation. The present invention also relates to the resulting coated substrates and to the coating compositions used in the process.Type: GrantFiled: July 15, 2003Date of Patent: June 7, 2005Assignee: Bayer AktiengesellschaftInventors: Jan Weikard, Wolfgang Fischer, Manfred Müller
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Patent number: 6899775Abstract: This invention relates to the printing of a substrate having a pre-printed “print pattern” with a “design layer” of ink where there is differential adhesion within and without the print pattern. The print pattern is receptive to an ink, and the design layer ink forms a durable image material with good bond to the print pattern, but the ink does not form a durable image material on the portions of the substrate outside the print pattern. The design layer ink is a UV-curable ink, and the print pattern may have a higher surface energy than the portions of the substrate outside the print pattern.Type: GrantFiled: January 23, 2003Date of Patent: May 31, 2005Assignee: Contra Vision Ltd.Inventors: George Roland Hill, Chris David Parry
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Patent number: 6884328Abstract: Magnetic films are annealed by radio frequency (RF) radiation. During the RF annealing process, the layers may be subjected to a magnetic field in order to control their anisotropy axes. The RF annealed layers are useful for applications such as longitudinal and perpendicular magnetic recording layers of magnetic data storage media.Type: GrantFiled: November 27, 2002Date of Patent: April 26, 2005Assignee: Seagate Technology LLCInventors: Dmitri Litvinov, Nisha Shukla, Erik Bjorn Svedberg, Sakhrat Khizroev, Dieter K. Weller
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Patent number: 6869508Abstract: A PVD process and apparatus (120) for depositing a coating (132) from multiple sources (110, 111) of different materials. The process and apparatus (120) are particulaity intended to deposit a beta-nickel aluminide coating (132) containing one or more elements whose vapor pressures are lower than NiAl. The PVD process and apparatus (120) entail feeding at least two materials (110, 111) into a coating chamber (122) and evaporating the materials (110, 111) at different rates from separate molten pools (114, 115) thereof. Articles (130) to be coated are suspended within the coating chamber (122), and transported with a support apparatus (118) relative to the two molten pools (114, 115) so as to deposit a coating (132) with a controlled composition that is a mixture of the first and second materials (110, 111).Type: GrantFiled: May 15, 2002Date of Patent: March 22, 2005Assignee: General Electric CompanyInventors: Ramgopal Darolia, Reed Roeder Corderman, Joseph David Rigney, Richard Arthur Nardi, Jr., Michael James Weimer
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Patent number: 6864415Abstract: A photoelectric cell that includes a first insulating base, having on its surface a first electrode layer, which has on its surface a metal oxide semiconductor film, which includes anatase titanium oxide particles, on which a photosensitizer is absorbed and a second insulating base having on its surface a second electrode layer and an electrolyte sealed between the metal oxide semiconductor film and the second electrode layer. The first electrode layer and the second electrode layer are arranged opposite from each other. At least one of the first and second insulating bases with an electrode layer is transparent.Type: GrantFiled: February 6, 2003Date of Patent: March 8, 2005Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Tsuguo Koyanagi, Michio Komatsu, Hirokazu Tanaka, Katsuhiro Shirono
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Patent number: 6849308Abstract: A method of forming a masking pattern on a surface using the technique of droplet ejection to deposit droplets of deposition material, said method comprising depositing a plurality of droplets on said surface to form such a pattern comprising multiple discrete or coalesced extended portions.Type: GrantFiled: May 30, 2000Date of Patent: February 1, 2005Inventors: Stuart Speakman, Eric Bresler, Ian Andrew Gardner
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Patent number: 6844030Abstract: This invention concerns a process for modifying a polymeric substrate by contacting the surface with a photoreactive solution of an inorganic photochemical electron donor while irradiating the surface with actinic radiation. Patterns of modified and unmodified surfaces can be produced. Polymeric substrates with modified surfaces may be effectively bonded to polymer films to form composite articles. The process has particular applicability to the surface modification of fluorinated polymers.Type: GrantFiled: December 14, 2001Date of Patent: January 18, 2005Assignee: 3M Innovative Properties CompanyInventors: Naiyong Jing, George Van Dyke Tiers
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Patent number: 6838177Abstract: There is disclosed a process of priming a surface (preferably part of a vehicle) comprising; i) applying a UV radiation curable primer to the area to be primed; ii) curing the primer with UV radiation provided by one or more UV lamps having a UV-B:UV-A ratio of 1:1 or less and substantially no UV-C content, the UV radiation curable primer containing: A. 0-84% by weight of one or more compounds containing one ethylenically unsaturated free-radically polymerisable group per molecule; B. 5-50% by weight of one or more compounds containing two or more ethylenically unsaturated free radically polymerisable groups per molecule; C. 10-70% by weight of one or more pigments, fillers and/or dyes; D. 1-8% by weight of one or more photoinitiators; E. 0-20% by weight of volatile organic solvent and; F. 0-15% by weight of customary additives. Preferably the process also includes sanding the primer and topcoating the primer with one or more topcoats.Type: GrantFiled: February 27, 2001Date of Patent: January 4, 2005Assignee: PPG Industries Ohio, Inc.Inventors: David Robert Fenn, Iain W. Harvey, Henryk Skorupski, David N. Walters
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Patent number: 6835422Abstract: A method of producing an adhesive article including the steps of applying release coating compound(s) to a second side of a liner backing; applying an adhesive onto a first side of said coated liner backing; crosslinking said adhesive with E-Beam radiation applied through the second side of said liner backing; and winding said article into a roll.Type: GrantFiled: May 11, 2004Date of Patent: December 28, 2004Assignee: 3M Innovative Properties CompanyInventors: James J. Kobe, Junkang Jacob Liu, Jolin A. Harrison, Bradley S. Momchilovich, Raymond R. Rivera
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Patent number: 6833154Abstract: The invention is a process for radiant curing of a coating on a three-dimensional object.Type: GrantFiled: March 7, 2003Date of Patent: December 21, 2004Assignee: Fusion UV Systems, Inc.Inventor: Jeffrey K. Okamitsu
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Publication number: 20040253167Abstract: A method of forming carbon nanotubes by plasma enhanced chemical vapour deposition using a carbon containing gas plasma, wherein the carbon nanotubes are not formed on a substrate at a temperature 300° C. or above.Type: ApplicationFiled: August 4, 2004Publication date: December 16, 2004Inventors: Sembukutiarachilage Ravi Silva, Sajad Haq, Bojan O. Boskovic
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Patent number: 6821631Abstract: A method of treating substrates, such as wood, including the steps of applying an alkali silicate solution to one or more substrates and applying an alkali borate solution with boric oxide (B2O3) content to the substrates. Substrates that have been treated using the present method include a borate-silicate polymer within the substrate. When the present substrates are wood, wood products, or green lumber, they may be used to build structures.Type: GrantFiled: October 28, 2002Date of Patent: November 23, 2004Assignee: Wood treatment Products, Inc.Inventors: Robert N. Grantham, Robert R. Weaver, III
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Patent number: 6815015Abstract: A method for laser transfer and deposition of a rheological fluid wherein laser energy strikes a target substrate comprising a rheological fluid, causing a portion of the rheological fluid to evaporate and propel a jet of non-evaporated rheological fluid onto a receiving substrate.Type: GrantFiled: September 9, 2002Date of Patent: November 9, 2004Assignee: The United States of America as represented by the Secretary of the NavyInventors: Henry Daniel Young, Raymond C. Y. Auyeung, Bradley R. Ringeisen, Douglas B. Chrisey, Dana D. Dlott
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Patent number: 6809212Abstract: This invention relates to liquid cyclopentadienyltrimethylplatinum compounds selected from (isopropylcyclopentadienyl)trimethylplatinum and (tert-butylcyclopentadienyl)trimethylplatinum. This invention also relates to a process for producing a film, coating or powder by decomposing a cyclopentadienyltrimethylplatinum compound precursor selected from (isopropylcyclopentadienyl)trimethylplatinum and (tert-butylcyclopentadienyl)-trimethylplatinum, thereby producing the film, coating or powder. This invention further relates to a one pot method for producing an organometallic compound comprising reacting a metal source compound, an alkylating agent and a cyclopentadienyl compound under reaction conditions sufficient to produce said organometallic compound.Type: GrantFiled: June 11, 2003Date of Patent: October 26, 2004Assignee: Praxair Technology, Inc.Inventors: Scott Houston Meiere, Cynthia A. Hoover
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Patent number: 6805918Abstract: A method for laser transfer and deposition of a rheological fluid wherein laser energy strikes a target substrate comprising a rheological fluid, causing a portion of the rheological fluid to evaporate and propel non-evaporated rheological fluid onto a receiving substrate.Type: GrantFiled: May 10, 2002Date of Patent: October 19, 2004Assignee: The United States of America as represented by the Secretary of the NavyInventors: Raymond C. Y. Auyeung, Alberto Pique, Henry Daniel Young, Rohit Modi, Huey-Daw Wu, Douglas B. Chrisey, James M. Fitz-Gerald, Bradley R. Ringeisen
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Patent number: 6805916Abstract: A tapered profile magnetic field pulsed laser deposition (PLD) system and method for depositing a thin film on a substrate are provided. The system includes a tapered pulsed coil arranged relative to a confinement magnetic device so that the plume discharged from the confinement magnetic device is collected and concentrated by an inwardly tapered surface of the tapered pulsed coil which causes the plume to be deflected towards a substrate on which the charged species are deposited to form the thin film. In yet a further aspect, a device for maintaining cleanliness of an interior of a deposition chamber laser entry window through which a laser beam enters and converges to a target is provided. A plume that is generated when a laser beam ablates the target is ionized as a result of radioactive members such that the ionized plume is deflected toward one of the first members (e.g., metal plates) as opposed to coating the interior of the laser entry window.Type: GrantFiled: July 17, 2003Date of Patent: October 19, 2004Assignee: Research Foundation of the City University of New YorkInventor: Fred J. Cadieu
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Patent number: 6803078Abstract: The invention relates to a process for producing a surface layer with embedded inter-metallic phases, which is distinguished by the fact that a layer comprising a metal and a ceramic is applied to a substrate element, that a reaction takes place between the metal and the ceramic of the layer as a result of energy being introduced during the application of the layer or as a result of a subsequent introduction of energy, and as a result the surface layer is produced, with inter-metallic phases being formed.Type: GrantFiled: July 26, 2001Date of Patent: October 12, 2004Assignee: DaimlerChrysler AGInventors: Tilman Haug, Patrick Izquierdo, Michael Scheydecker, Oliver Storz, Tanja Tschirge, Karl-Ludwig Weisskopf