Electromagnetic Or Particulate Radiation Utilized (e.g., Ir, Uv, X-ray, Gamma Ray, Actinic, Microwave, Radio Wave, Atomic Particle; I.e., Alpha Ray, Beta Ray, Electron, Etc.) Patents (Class 427/595)
  • Patent number: 6649216
    Abstract: The present invention relates to a method of coating polymer film that includes the steps of extruding a cast sheet; stretching the sheet in a machine direction; applying a UV-curable coating to the sheet in-line; stretching the sheet in a transverse direction in a tenter; and exposing the coated sheet to UV radiation in-line.
    Type: Grant
    Filed: September 5, 2001
    Date of Patent: November 18, 2003
    Assignee: Mitsubishi Polyester Film, LLC
    Inventors: Steven J. Gust, Patrick M. Smith, Jan C. Westermeier
  • Patent number: 6648972
    Abstract: The invention relates to a device for powdering printed sheets, especially printed sheets made out of paper, whereby a powder coating device is arranged inside a sheet feeding device and an electrostatic charging device that is disposed outside the sheet feeding device is assigned to the sheet.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: November 18, 2003
    Assignee: Weitmann & Konrad GmbH & Co.
    Inventors: Thomas Stober, Reiner Haas, Gunter Hess
  • Patent number: 6649225
    Abstract: A process using ultraviolet light having a wavelength of 160 to 500 nanometers without higher wavelengths and a high intensity between about 1 and 40 watts/cm2 to surface treat a carbon containing fiber is described. The treated fiber contains an enhanced amount of oxygen on the surface which significantly improves the bondability of the fiber in composites.
    Type: Grant
    Filed: June 15, 2001
    Date of Patent: November 18, 2003
    Assignee: Board of Trustees of Michigan State University
    Inventors: Lawrence T. Drzal, Michael J. Rich
  • Patent number: 6645570
    Abstract: In a surface treatment method of treating the surface of a material to be treated, by irradiating with light the material to be treated and a mediating material in contact with each other, the mediating material itself causes substantially no interaction upon irradiation with light. The surface of the material to be treated is treated by provision of a chemical reaction field, in which a substituent of the material to be treated and an atom of atomic group of the mediating material is induced by excitation, by irradiating with light by using the logical product of the contact interface between the material to be treated and the mediating material and the light irradiation region, thereby causing and progressing bonded state transition.
    Type: Grant
    Filed: April 24, 2002
    Date of Patent: November 11, 2003
    Assignee: Canon Kabushiki Kaisha
    Inventor: Jun Koide
  • Patent number: 6642155
    Abstract: A method and apparatus for applying conservative amounts of a fluid to coat a silicon wafer surface. The surface is rotated and the fluid is applied to the surface through multiple application ports. Centrifugal forces spread the fluid across the wafer surface.
    Type: Grant
    Filed: June 5, 1998
    Date of Patent: November 4, 2003
    Assignee: Micron Technology, Inc.
    Inventors: John D. Whitman, Jeff Johnson
  • Publication number: 20030201429
    Abstract: The synthesis of novel, high &mgr;&bgr; electro-optical chromophores is described. These chromophores are polymerizable with a host polymer or copolymer. The chromophore polymerizable groups comprise epoxy, thioepoxy, oxetane and thiooxetane material which undergo a ring opening polymerization reaction in the presence of a cationic photoinitiator and actinic radiation. The high &mgr;&bgr; chromophores, mixed with a selected host polymer, copolymer, oligomer, or one or a plurality of polymerizable monomers, can be used to prepare optical waveguides and other optical elements and/or devices. The electro-optical chromophores of the invention can be used as a replacement for LiNbO3 in the formation of electro-optical devices, particularly electro-optical modulators.
    Type: Application
    Filed: April 30, 2002
    Publication date: October 30, 2003
    Inventors: Mingqian He, Paul J. Shustack, Jianguo Wang
  • Publication number: 20030203107
    Abstract: A method of applying a varnish, whether or not it includes a solvent, on a component, in particular a vehicle headlight reflector, comprises the following steps: (i) selecting a varnish having a viscosity at ambient temperature of about 500 to 2000 mPa.s, and a viscosity at the application temperature which is lower than about 200 mPa.s, with a viscosity which is substantially independent of variation in the temperature within the range of application; (ii) heating the surface of the component before the step of moistening the varnish at a selected temperature &thgr;p1; (iii) heating the varnish at the moment of application to a selected temperature &thgr;v; and (iv) during the spreading step, maintaining the component at a selected temperature &thgr;p2 for a selected time tp2.
    Type: Application
    Filed: April 28, 2003
    Publication date: October 30, 2003
    Inventors: Frederic Cote, Michel Montaudouin
  • Patent number: 6638580
    Abstract: One embodiment of the invention involves introducing at least two metals into a chamber for forming an alloy layer over a substrate. This is accomplished by a variety of methods. In one embodiment, at least two metals are mixed and introduced into a chamber in which a focused ion beam contacts the two metals to form at least one alloy layer over a substrate. In another embodiment, at least two precursor gas sources are introduced into the chamber in which each precursor gas source contains a metal. The focused ion beam contacts the two precursor gases to form an alloy layer over the substrate. In yet another embodiment, a second metal layer is formed over a first metal layer to form a multi-metal layer. Thereafter, thermal treatment or introducing a focused ion beam to at least a portion of the multi-metal layer is performed to create at least one alloy layer over the substrate.
    Type: Grant
    Filed: December 29, 2000
    Date of Patent: October 28, 2003
    Assignee: Intel Corporation
    Inventor: Ilan Gavish
  • Patent number: 6638579
    Abstract: A paper machine substrate modified to resist contamination by adhesive materials. The paper machine substrate includes: a paper machine substrate; and an active agent that is grafted to the surface of the paper machine substrate to lower the surface energy of the paper machine substrate so that the substrate resists contamination by adhesive material. The papermachine substrate may be made by a process that includes the steps of: providing a paper machine substrate; applying an active agent to the paper machine substrate; and exposing the paper machine substrate to greater than about 2 million rads (Mrad) of radiation to cause a reaction between the active agent and the substrate so the active agent becomes joined to the substrate. The active agent may be a fluorinated monomer, a fluorinated polymer, a perfluorinated polymers, or a polyalkyl siloxane.
    Type: Grant
    Filed: July 30, 2002
    Date of Patent: October 28, 2003
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Russell Frederick Ross, Ali Yahiaoui
  • Patent number: 6635330
    Abstract: The present invention provides a method for forming thin films, wherein thin films with a uniform thickness can be formed on substrates as objects such as spheroids, even when the films are formed by conventional film-formation methods using an incident particle beam coming from a specific direction (e.g., evaporation and sputtering). In the method, thin films are formed on substrates such as spheroids with an incident particle beam coming from a particle source located in a specific direction by performing a spin motion together with a swing motion. The spin motion is a rotation of the substrate at a constant angular velocity about the spheroidal axis. The swing motion is a rotational oscillation of the same substrate for rotationally oscillating the axis at a constant cycle in one surface, where the center of the rotational oscillation is in the vicinity of the midpoint between two focal points on the axis of the spheroid.
    Type: Grant
    Filed: September 9, 2002
    Date of Patent: October 21, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yuuji Omata, Naotaka Hashimoto, Masahide Yokoyama, Toshiyuki Suemitsu, Takahiro Kitai
  • Patent number: 6630209
    Abstract: A method for manufacturing a coated optical fiber including the step of determining a desired temperature operating range of a coated optical fiber having at least one critical limit. The intercoating delamination stresses at the critical limit of said temperature range are determined. A zero-stress temperature region using the critical limit and the delamination stresses is then selected. An optical fiber is provided and the optical fiber is coated with a first polymer coating. The first polymer coating is exposed to a source of actinic radiation, wherein the source of actinic radiation generates heat. A second polymer coating including a photopolymerizable composition is applied to the optical fiber directly on the first polymer coating. The second polymer coating is cured, where at the time the second polymer coating is cured the first polymer coating is at the zero-stress temperature region.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: October 7, 2003
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Thomas Martin Lynch, Brian Kenneth Nelson, James Craig Novack, James Robert Onstott
  • Patent number: 6630047
    Abstract: A multi-layer structure includes a fluoropolymer bonded to a substrate. The structure is prepared by exposing a bonding composition to actinic radiation, such as ultraviolet radiation, to form the bond. The bonding composition includes a light-absorbing compound and an electron donor. The bonding composition includes non-adhesive materials.
    Type: Grant
    Filed: May 21, 2001
    Date of Patent: October 7, 2003
    Assignee: 3M Innovative Properties Company
    Inventors: Naiyong Jing, Trang D. Pham, Andrew M. Hine
  • Publication number: 20030185986
    Abstract: A system and method for improving the durability and reliability of recording media used in hard drives is disclosed. A protective overcoat made by depositing a diamond like carbon (DLC) layer over a magnetic layer and then depleting a portion of the DLC protective layer of hydrogen before it is coated with a Perfluoropolyethers (PFPE) using an in-situ vapor lubrication technique. The portion of the DLC layer which is depleted can be data zone of the media so that the lubricant-bonding ratio is higher for the landing zone than it is for the data zone.
    Type: Application
    Filed: March 27, 2003
    Publication date: October 2, 2003
    Inventors: Xiaoding Ma, Michael Joseph Stirniman, Jing Gui
  • Patent number: 6627250
    Abstract: A method for marking a product for detecting unauthorized imitations of the product, in particular of electrical switchgear equipment and the like. A color imprint is applied to an outer or inner surface of a housing of the switchgear or the like. The color imprint contains pigments that can be detected only by special methods, for example infrared examination and the like.
    Type: Grant
    Filed: June 9, 2000
    Date of Patent: September 30, 2003
    Assignee: ABB Patent GmbH
    Inventors: Peter Flohr, Karl Thomas Werner
  • Patent number: 6623913
    Abstract: Disclosed is a method for producing liquid crystal display devices comprising a step for forming a transparent electrode and a circuit element of semiconductor on the surface of a pair of transparent substrates, and various steps for applying a photoresist, exposing to the light, etching, releasing the photoresist, inspecting the electrodes and circuit elements of semiconductor, forming an insulating film, forming an alignment film, rubbing the alignment film, spreading spacers, applying a sealing agent, fabricating a cell, filling a liquid crystal, pasting a polarizing plate, and connecting a driver IC characterized in that a soft X-ray is irradiated to the substrate in at least one step prior to the rubbing of the alignment films to produce liquid crystal display devices, at a high yield, in which devices number of pixel defect is small.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: September 23, 2003
    Assignees: Chisso Corporation, IInuma Gauge Manufacturing Company Limited, Hamamatsu Photonics Kabushiki Kaisha
    Inventors: Satoshi Tanioka, Shizuo Murata, Makoto Kono, Masayuki Hirano
  • Publication number: 20030170389
    Abstract: A method and system for atomic layer deposition providing a dispenser unit used to prevent mixing of a precursor gas and an input gas. From the dispenser unit a flow of the input gas is provided over a surface of the workpiece wherein a beam of the electromagnetic radiation is directed into the input gas in close proximity to the surface of the workpiece, but spaced a finite distance therefrom. The input gas is dissociated by the beam producing a high flux point of use generated reactive gas species that reacts with a surface reactant formed on the surface of the workpiece by a direct flow of the precursor gas flown from the dispensing unit. The surface reactant and reactive gas species react to form a desired monolayer of a material on the surface of the workpiece.
    Type: Application
    Filed: March 5, 2002
    Publication date: September 11, 2003
    Inventor: Gurtej S. Sandhu
  • Patent number: 6614181
    Abstract: A UV radiation source is tunable to optimize the process of densifying a carbon-doped silicon oxide film. The composition and relative concentration of stimulated gases stimulated within an airtight bulb is controlled to produce radiation optimized for absorption by undesirable chemical bonds of the carbon-doped silicon oxide film, leading to disruption of these bonds and their replacement by more desirable stable chemical bonds. The energy of radiation emitted by the source is determined by the identity of excited chemical species, and the intensity of the radiation emitted by the source is determined by the concentration of the excited chemical species. By exciting a specific mixture of gases, radiation is emitted at a combination of energies and intensities calculated to disrupt populations of unstable bonds in the carbon-doped silicon oxide film while leaving desirable bonds in the film unaffected.
    Type: Grant
    Filed: August 23, 2000
    Date of Patent: September 2, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Keith R. Harvey, Tian-Hoe Lim, Li-Qun Xia
  • Patent number: 6613395
    Abstract: A method of making a composite polymer of a molecularly doped polymer. The method includes mixing a liquid polymer precursor with molecular dopant forming a molecularly doped polymer precursor mixture. The molecularly doped polymer precursor mixture is flash evaporated forming a composite vapor. The composite vapor is cryocondensed on a cool substrate forming a composite molecularly doped polymer precursor layer, and the cryocondensed composite molecularly doped polymer precursor layer is cross linked thereby forming a layer of the composite polymer layer of the molecularly doped polymer.
    Type: Grant
    Filed: April 16, 2001
    Date of Patent: September 2, 2003
    Assignee: Battelle Memorial Institute
    Inventors: John D. Affinito, Peter M. Martin, Gordon L. Graff, Paul E. Burrows, Mark E. Gross, Linda S. Sapochak
  • Patent number: 6613398
    Abstract: According to the present invention, provided is a method for improving solubility of a protein in water by irradiating the protein with an electron beam. According to the method, the solubility of the protein in water is improved without alteration and decomposition of the protein and an associated body which is not generated in an ordinary state is formed, so that protein which is stable even in an aqueous solution can be obtained.
    Type: Grant
    Filed: August 13, 2001
    Date of Patent: September 2, 2003
    Assignees: Director of National Food Research, Institute, Ministry of Agriculture, Forestry and Fisheries, San-Ei Gen F.F.I., Inc.
    Inventors: Mikiro Tada, Kazushi Sakaue, Toru Hayashi, Setsuko Suzuki
  • Publication number: 20030161970
    Abstract: A method is adopted for deposition technology using a focused ion beam device, characterized by enabling structures to be formed by using phenanthrene as a source gas and using ions of gallium or gold, silicon or beryllium etc. of energies of 5 to 100 keV from a liquid-metal ion source as ions so as to give a gas blowing density of five to ten times greater than the case of deposition in the related art, with directionality of the gas blowing being both isotropic and symmetrical.
    Type: Application
    Filed: February 27, 2003
    Publication date: August 28, 2003
    Inventor: Takashi Kaito
  • Patent number: 6610372
    Abstract: This invention aims to make it possible to obtain curing surfaces with different surface free energies, and to provide a method of curing an ionizing radiation curing resin composition which can be used as a coating material. Further, it aims to provide a surface modification method which permits surfaces of different surface free energy to be obtained. The above object is achieved by a method of curing a mixture comprising an ionizing radiation curing resin, characterized in that at least part of a mixture comprising 0.01-10 weight parts of a compound (b) having a surface free energy not exceeding 25 mN/m relative to 100 weight parts of an ionizing radiation curing resin composition (a) having a surface free energy of at least 30 mN/m, is cured by irradiating it with ionizing radiation in contact with a medium having a surface free energy higher than that of the ionizing radiation curing resin composition (a).
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: August 26, 2003
    Assignee: Kuraray Co., Ltd.
    Inventors: Atsushi Nagasawa, Takahiro Kitano, Keiji Kubo, Katsuya Fujisawa
  • Patent number: 6599587
    Abstract: Disclosed is an organometallic precursor for forming a metal pattern, having a structure defined by the following Formula 1, and a method of forming the metal pattern using the same, in which the conductive metal pattern is readily formed through an exposing step without using a photo-resist.
    Type: Grant
    Filed: September 11, 2002
    Date of Patent: July 29, 2003
    Assignee: Samsung Eleectronics Co., Ltd.
    Inventors: Min Chul Chung, Soon Taik Hwang, Young Hun Byun, Euk Che Hwang
  • Patent number: 6599780
    Abstract: A method of producing an electrically conductive film is provided having excellent conductivity at low cost. The method includes steps of forming a colloid layer on a substrate, and then irradiating the surface of the colloid layer with an energy beam such that higher energy beam absorption occurs in the colloid layer than in the substrate. Preferably, the colloid layer is a metal colloid layer and an electrically conductive film is obtained as the film.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: July 29, 2003
    Assignee: Seiko Epson Corporation
    Inventor: Katsuyuki Morii
  • Patent number: 6599585
    Abstract: A UV curing system includes a light source, which produces UV light and non-useful light (heat energy), a shade member having a lamp-side surface that reflects light and provides thermal insulation to the target substance, and a housing having an internal reflecting surface. The shade member is situated between the light source and the target substance so that all, or most, light from the light source does not directly strike the target substance. The housing is situated on the opposite side of the light source from the barrier and partially encloses the light source.
    Type: Grant
    Filed: June 10, 2002
    Date of Patent: July 29, 2003
    Assignee: Aetek UV Systems
    Inventors: Allen P. Blacker, Jr., Thomas Becker, Kevin McKay, Simon N. Whittle
  • Publication number: 20030138561
    Abstract: A thermal cracking chemical vapor deposition method for synthesizing a nano-carbon material is provided. The method includes steps of (a) providing a substrate, (b) spreading a catalyst on the substrate, (c) putting the substrate into a reactor, (d) introducing a carbon containing material, and (e) heating the carbon containing material, thereby the carbon containing material being cracked to provide a carbon source for forming the nano-carbon material on the substrate.
    Type: Application
    Filed: January 13, 2003
    Publication date: July 24, 2003
    Inventors: Zhen-Yu Juang, Teng-Fang Kuo, Chuen-Horng Tsai, I-Nan Lin
  • Patent number: 6596133
    Abstract: An apparatus and method for the deposition of thin film material layers provides improved use of processing chamber space for enhanced processing capability in the fabrication of microelectronic devices. In one embodiment, a physical-vapor deposition target offset from the processing chamber central axis, such as a target having an annular shape and central opening, deposits a material on a substrate while leaving the central region of the processing chamber available for other deposition techniques, including a centrally located sputtering target, CVD showerhead, or ion source. Alternatively, a collimator divides a processing chamber into sub-chambers and allows energetic species from a PVD target or ion source to pass to a substrate located in a separate sub-chamber for interaction with a CVD precursor without mixing the precursor and the plasma associated with the PVD or ion processes.
    Type: Grant
    Filed: June 14, 2001
    Date of Patent: July 22, 2003
    Assignee: CVC Products, Inc.
    Inventors: Mehrdad M. Moslehi, Ajit P. Paranjpe
  • Publication number: 20030134054
    Abstract: Formation of a zirconia based thermal barrier layer is described. In accordance with the present invention, a thermal barrier layer composed of zirconia or an allow of zirconia is presented. An advantageous layer might be composed of zirconia or an alloy of zirconia with silica having improved properties. In some embodiments, such a zirconia layer might be deposited with a fraction of it's zirconia in a metallic state. Such a fraction, particularly if it were very low, would act to nucleate crystalline grains of silicon during the recrystallization phase of excimer laser melting due to the formation of point defects of zirconium silicide or other nucleating compound or formation. Heat treating the Zirconia layer anneals the Zirconia layer so that it can act as a gate oxide.
    Type: Application
    Filed: November 8, 2002
    Publication date: July 17, 2003
    Inventors: Richard E. Demaray, Vassiliki Milonopoulou
  • Patent number: 6582776
    Abstract: A photo-alignment layer having excellent long-term stability to light and heat is manufactured by coating a material for the photo-alignment layer, which contains a dichroic dye having two or more polymerizable groups per molecule, on a substrate, and exposing the coating layer to polarized light, thereby imparting a photo-alignment function, and polymerizing the polymerizable groups by heating or light exposure.
    Type: Grant
    Filed: November 19, 2001
    Date of Patent: June 24, 2003
    Assignees: Hong Kong University of Science And Technology, Dainippon Ink and Chemicals, Inc.
    Inventors: Wing C. Yip, Elena K. Prudnikova, Hoi S. Kwok, Vladimir G. Chigrinov, Vladimir M. Kozenkov, Hirokazu Takada, Masanobu Fukuda
  • Patent number: 6582778
    Abstract: Disclosed is a method of treatment with a microwave plasma by maintaining a reduced pressure in a plasma-treating chamber for treatment with a plasma in which a substrate that is to be treated with a microwave plasma is contained, introducing a treating gas into the plasma-treating chamber and introducing microwaves into the plasma-treating chamber, wherein a metallic antenna is disposed in the plasma-treating chamber. The plasma is generated within a very short period of time maintaining stability after the microwaves are introduced into the plasma-treating chamber, and the treatment is accomplished maintaining stability.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: June 24, 2003
    Assignee: Toyo Seikan Kaisha, Ltd.
    Inventors: Tsunehisa Namiki, Toshihide Ieki, Akira Kobayashi, Koji Yamada, Hideo Kurashima
  • Publication number: 20030113444
    Abstract: The invention relates to a process for repairing coated substrate surfaces comprising the following successive steps:
    Type: Application
    Filed: December 14, 2001
    Publication date: June 19, 2003
    Inventors: Carmen Flosbach, Karl-Friedrich Doessel, Werner Lenhard, Oliver Reis, Thomas Fey
  • Patent number: 6576302
    Abstract: There is disclosed a method for producing a metal oxide, which comprises the steps of: dissolving a metal organic compound (e.g. a metal organic acid salt, a metal acetylacetonato complex, and a metal alkoxide having an organic group with 6 or more carbon atoms) in a solvent to provide a state of solution, applying the solution onto a substrate, drying the solution, and subjecting the resultant substrate to irradiation with a laser light of a 400 nm or less wavelength, to form a metal oxide on the substrate. According to that method, a metal oxide can be produced without applying a heat treatment at a high temperature of the degree adopted in the conventionally known application thermal decomposition method.
    Type: Grant
    Filed: February 25, 2000
    Date of Patent: June 10, 2003
    Assignee: Agency of Industrial Science and Technology
    Inventors: Susumu Mizuta, Tetsuo Tsuchiya, Akio Watanabe, Yoji Imai, Iwao Yamaguchi, Toshiya Kumagai, Takaaki Manabe, Hiroyuki Niino, Akira Yabe
  • Patent number: 6569812
    Abstract: A polycrystalline silver member is stuck on a given long member made of Hastelloy material or stainless steel material, to make a long base material. Then, an yttrium-based high temperature superconducting film is fabricated in the long base material by a CVD method with applying a magnetic field of preferable 2T or over. Thereby, an yttrium-based high temperature superconducting tape can be provided which can maintain the superconductivity under a higher magnetic field environment.
    Type: Grant
    Filed: November 26, 2001
    Date of Patent: May 27, 2003
    Assignee: Tohoku University
    Inventors: Kazuo Watanabe, Mitsuhiro Motokawa
  • Patent number: 6562417
    Abstract: A method of depositing nano-particles in a gas stream for efficiently depositing nano-particles by irradiating an electron beam on charged nano-particles in the stream of a first gas species containing the nano-particles, as well as a method of modifying the surface of the nano-particles in a gas stream by mixing them with the first gas species in a gas mixing chamber thereby activating the second gas species, intended for providing a method of depositing nano-particles and a method of modifying the surface thereof in a gas stream, capable of efficiently depositing the nano-particles in a charged state in a gas stream and modifying the surface of the nano-particles which are extremely sensitive to defects and impurities caused by large exposure ratio of surface atoms in a gas stream at a good controllability.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: May 13, 2003
    Assignee: Matsushita Electronic Industrial Co., Ltd.
    Inventors: Nobuyasu Suzuki, Toshiharu Makino, Yuka Yamada, Takehito Yoshida
  • Patent number: 6558732
    Abstract: A method for producing increased resistance to biodegradability is provided for biomedical devices subject to in vivo implantation. Among the steps required to produce such resistance are the application of a thermoplastic polyurethane coating to the device to provide a coating, and the subsequent crosslinking of the thermoplastic polyurethane coating through the application of radiation of a sufficient intensity and duration to convert said thermoplastic polyurethane coating to a thermoset coating possessing the attribute of increased biostability.
    Type: Grant
    Filed: November 17, 1999
    Date of Patent: May 6, 2003
    Inventor: Alan M. Zamore
  • Patent number: 6555181
    Abstract: A process for making a multiple-layer elastomer-coated member, includes applying a coating of an elastomeric material to a supporting metallic substrate; and curing the elastomeric material by exposure to radiant energy in a radiant energy curing apparatus.
    Type: Grant
    Filed: November 28, 2000
    Date of Patent: April 29, 2003
    Assignee: Xerox Corporation
    Inventors: Carla M. Santos, Elizabeth L. Ogren, Alan R. Kuntz, George A. Riehle, Laurence J. Lynd
  • Publication number: 20030077403
    Abstract: A PVD process and apparatus (120) for depositing a coating (132) from multiple sources (110,111) of different materials. The process and apparatus (120) are particularly intended to deposit a beta-nickel aluminide coating (132) containing zirconium, hafnium, yttrium and/or cerium, whose vapor pressures are sufficiently lower than NiAl to require a different evaporation rate in order to achieve higher deposition rates and better control of the coating chemistry. The PVD process and apparatus (120) entail feeding at least two materials (110,111) into a coating chamber (122) and melting the materials (110,111) at different rates to form separate molten pools (114,115) thereof. Articles (130) to be coated are suspended within the coating chamber (122), and transported with a support apparatus (118) relative to the two molten pools (114,115) so as to deposit a coating (132) with a controlled composition that is a mixture of the first and second materials (110,111).
    Type: Application
    Filed: May 15, 2002
    Publication date: April 24, 2003
    Applicant: General Electric Company
    Inventors: Ramgopal Darolia, Reed Roeder Corderman, Joseph David Rigney, Richard Arthur Nardi, Michael James Weimer
  • Publication number: 20030064170
    Abstract: A hydrogen peroxide solution is applied onto the surface of a metallic member to oxidize the metallic member and to form the oxide film. At this time, a light beam is irradiated towards the metallic member through the hydrogen peroxide solution to promote oxidization of the metallic member. The light beam is one of a visible ray, a laser beam, and an ultraviolet ray.
    Type: Application
    Filed: October 1, 2002
    Publication date: April 3, 2003
    Applicant: Matsumoto Dental University
    Inventor: Michio Ito
  • Patent number: 6541088
    Abstract: A composition which provides gas, flavor, and aroma barrier to substrates, where the composition is formed by mixing an ethylenically unsaturated acid, a bis-silane and a polyamine.
    Type: Grant
    Filed: March 3, 2000
    Date of Patent: April 1, 2003
    Assignees: EG Technology Partners, L.P., Dow Corning Corporation, Dow Corning S.A.
    Inventors: Imtiaz J. Rangwalla, John E. Wyman, Patrick Jacques Jean Merlin, Shrenik Mahesh Nanavati, Lisa Marie Seibel, Laurence Gallez
  • Publication number: 20030059557
    Abstract: A planetary multi-substrate holder system for material deposition includes a substrate holder having circumferentially shaped openings in which disk-like substrates of a smaller diameter than the diameter of the openings are maintained. Upon rotation of the substrate holder, either in a vertical plane, or in a horizontal plane, the substrates self-rotate within each opening due to either gravity force (for vertically rotated substrate holder), or due to centrifugal force (for horizontally rotated substrate holder) applied to the substrates. The planetary multi-substrate system obviates the need for mechanical individual gears to rotate substrates for material deposition, and, as a sequence, yields an extended service life of the system, as well as agreeability with high temperatures used in material deposition process, and reduced cost of a final product.
    Type: Application
    Filed: September 24, 2001
    Publication date: March 27, 2003
    Inventors: K.S. Harshavardhan, Jeonggoo Kim
  • Patent number: 6537620
    Abstract: A process for preparing weather-resistant powder coatings on metallic or non-metallic surfaces by applying a powder coating composition and then melting and curing, wherein a powder coating composition is applied which contains polyester resins in which the acid structural blocks are based only or mainly on aromatic dicarboxylic acids, their anhydrides and/or esters, and polyfunctional low molecular weight epoxides as cross-linking agents, and the melting and curing is performed by NIR radiation.
    Type: Grant
    Filed: May 9, 2002
    Date of Patent: March 25, 2003
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Olaf Thiele, Frank Zimmermann
  • Patent number: 6538194
    Abstract: A photoelectric cell that includes a first insulating base, having on its surface a first electrode layer, which has on its surface a metal oxide semiconductor film, which includes anatase titanium oxide particles, on which a photosensitizer is adsorbed and a second insulating base having on its surface a second electrode layer and an electrolyte sealed between the metal oxide semiconductor film and the second electrode layer. The first electrode layer and the second electrode layer are arranged opposite from each other. At least one of the first and second insulating bases with an electrode layer is transparent.
    Type: Grant
    Filed: November 28, 2000
    Date of Patent: March 25, 2003
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Tsuguo Koyanagi, Michio Komatsu, Hirokazu Tanaka, Katsuhiro Shirono
  • Publication number: 20030039767
    Abstract: To provide a method for manufacturing an electron source having electron-emitting devices with excellent electron-emitting property arranged on a substrate and enabling an image-forming apparatus capable of displaying an image with high brightness and uniformity to be enhanced in terms of screen size and production scale. The method for manufacturing the electron source includes a step of disposing a plurality of units and a plurality of wirings connected to the plurality of units on a substrate, each unit including a polymer film and a pair of electrodes with the polymer film interposed therebetween, and a step of forming electron-emitting devices from the plurality of units by repeatedly performing a process including a selecting substep of selecting a desired number of units from the plurality of units, a resistance-reducing substep of reducing resistance of the polymer films of the selected units and a gap-forming substep of forming a gap in each of the films formed by the resistance-reducing substep.
    Type: Application
    Filed: August 7, 2002
    Publication date: February 27, 2003
    Inventors: Hironobu Mizuno, Masaharu Naka, Koki Nukanobu
  • Patent number: 6524664
    Abstract: A method for highly hydrophilifying the surface of an article by photoexcitation of a semiconductor photocatalyst and maintaining the hydrophilicity is disclosed. A layer containing a photocatalyst is formed on a substrate. Onto the surface of the layer are fixed a hydroxyl group upon photoexcitation of the photocatalyst and a physically adsorbed water molecule in the vicinity of the hydroxyl group upon photoexcitation of the photocatalyst. Thus, the surface is highly hydrophilified. Further, this surface, simultaneously with the hydrophilification, exhibits higher hydrophobicity.
    Type: Grant
    Filed: August 13, 1999
    Date of Patent: February 25, 2003
    Assignee: Toto Ltd.
    Inventors: Kazuhito Hashimoto, Akira Fujishima, Toshiya Watanabe, Mitsuhide Shimohigoshi, Makoto Hayakawa
  • Patent number: 6521291
    Abstract: Improved articles of manufacture are disclosed, together with methods for preparing such articles, whereby the surface of a graphite or comparable substrate is first densified with carbon to reduce surface porosity while still retaining sufficient surface texture to enhance the adherence of a subsequently applied boron coating.
    Type: Grant
    Filed: September 4, 2001
    Date of Patent: February 18, 2003
    Assignee: Specialty Materials, Inc.
    Inventor: Raymond J. Suplinskas
  • Patent number: 6517911
    Abstract: There is provided a process for forming a silicon oxide film which is useful as an electrical insulating film, dielectric film or protective film as used in LSI, thin-film transistor, photoelectric converter, photosensitive body and the like. The process comprises forming a coating film from a polysilane compound represented by the formula SinRm (wherein n is an integer of 3 or more, m is an integer of n to 2n+2, and a plurality of R's are independently a hydrogen atom or an alkyl group) and oxidizing the coating film to form the silicon oxide film.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: February 11, 2003
    Assignee: JSR Corporation
    Inventor: Yasuo Matsuki
  • Publication number: 20030026921
    Abstract: A method of synthesizing metal doped carbon films by placing a substrate in a chamber with a selected amount of a metalorganic compound. An electron cyclotron resonance is applied to the chamber in order to vaporize the metalorganic compound. The resonance is applied to the chamber until a metal doped carbon film is formed. The metalorganic compound is preferably selected from the group consisting of an organic salt of ruthenium, palladium, gold or platinum.
    Type: Application
    Filed: July 6, 2001
    Publication date: February 6, 2003
    Inventors: Mayumi Ueno, Mahendra Kumar Sunkara
  • Publication number: 20030012886
    Abstract: The present invention provides a method for forming thin films, wherein thin films with a uniform thickness can be formed on substrates as objects such as spheroids, even when the films are formed by conventional film-formation methods using an incident particle beam coming from a specific direction (e.g., evaporation and sputtering). In the method, thin films are formed on substrates such as spheroids with an incident particle beam coming from a particle source located in a specific direction by performing a spin motion together with a swing motion. The spin motion is a rotation of the substrate at a constant angular velocity about the spheroidal axis. The swing motion is a rotational oscillation of the same substrate for rotationally oscillating the axis at a constant cycle in one surface, where the center of the rotational oscillation is in the vicinity of the midpoint between two focal points on the axis of the spheroid.
    Type: Application
    Filed: September 9, 2002
    Publication date: January 16, 2003
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yuuji Omata, Naotaka Hashimoto, Masahide Yokoyama, Toshiyuki Suemitsu, Takahiro Kitai
  • Publication number: 20030008074
    Abstract: A system and method for directing metal or ceramic particles toward a substrate (18) in a vacuum chamber includes a powder hopper (11), an enclosure (12) containing multiple differentially pumped vacuum chambers (19), a charging lamp (13), a tube (14), multiple charging and heating diodes 15, and an electromagnetic field generating device (EFGD) (17). The hopper (11) holds metal or ceramic particles, the chambers (19) propel the particles through the tube (14) towards substrate (18) positioned close to the tube, charging lamp (13) charges the particles, diodes (15) are used to heat the particles, and the EFGD (17) controls the direction of the particles propelled out of the tube.
    Type: Application
    Filed: October 25, 2001
    Publication date: January 9, 2003
    Inventors: William Hofmeister, David Gustafson, Bridget Rogers
  • Publication number: 20030003241
    Abstract: A method of depositing nano-particles in a gas stream for efficiently depositing nano-particles by irradiating an electron beam on charged nano-particles in the stream of a first gas species containing the nano-particles, as well as a method of modifying the surface of the nano-particles in a gas stream by mixing them with the first gas species in a gas mixing chamber thereby activating the second gas species, intended for providing a method of depositing nano-particles and a method of modifying the surface thereof in a gas stream, capable of efficiently depositing the nano-particles in a charged state in a gas stream and modifying the surface of the nano-particles which are extremely sensitive to defects and impurities caused by large exposure ratio of surface atoms in a gas stream at a good controllability.
    Type: Application
    Filed: June 27, 2002
    Publication date: January 2, 2003
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Nobuyasu Suzuki, Toshiharu Makino, Yuka Yamada, Takehito Yoshida
  • Patent number: 6500552
    Abstract: The present invention relates to an electrically conductive coating that is producible by hydrolytic condensation of a mixture comprising at least one silicon compound of the general formula SiXnR(4−n) (I), wherein at least one of the groups R is a mercapto-substituted alkyl or aryl group; and a compound of the general formula ZaSiYbR(a−4−b) (II), wherein the group Z is a quaternary ammonium salt, for example. Said coating is particularly suitable for toner transfer drums, and exhibits high scratch resistance and good adhesion to the substrate.
    Type: Grant
    Filed: September 5, 2000
    Date of Patent: December 31, 2002
    Assignee: AEG Elektrofotografie GmbH
    Inventors: Sabine Dreihofer, Gert Neumann, Alexandra Geiss, Klaus Rose