Of Silicon Containing (not As Silicon Alloy) Patents (Class 428/446)
-
Patent number: 12084808Abstract: Provided are a self-cleaning coating, a self-cleaning fiber, a self-cleaning carpet and uses thereof. The self-cleaning coating is provided with a porous structure where pores communicate with one another; the volume of the pores comprised in the coating makes up 20%-98% of the total volume of the coating; and the pore diameter of the pores in the porous structure is between 0.5 nm-50 nm. The self-cleaning coating is mainly prepared from host materials; the host materials are one or more of titanium oxide, zirconia, titanium nitride, silicon oxide, tungsten oxide, g-C3N4 semiconducting polymer, perovskite semiconductor, silver, iron, gold, aluminum, copper, zinc, tin and platinum.Type: GrantFiled: October 31, 2018Date of Patent: September 10, 2024Inventor: Feng Liu
-
Patent number: 11964038Abstract: Disclosed is a personal care composition comprising: (a) a cationic or nonionic surfactant; (b) a high melting point fatty compound having a melting point of from 25° C. to 60° C. (c) a solid organic compound having a water solubility of lower than 25 g per 1 liter water, and having a melting point of exceeding 60° C., and also having a specific AlogP; (d) a first liquid oily compound other than a second liquid oily compound, wherein the first liquid oily compound has a water solubility of 10 g per 1 liter water or less, wherein a mixture of all the first liquid oily compounds included in the composition has a di-electric constant of from about 5 to about 10, and wherein the weight ratio of the solid organic compound to the first liquid oily compound is from about 1:1 to about 1:10; and (e) an aqueous carrier, wherein the composition comprises 0.1% or less of a second liquid oily compound having a higher AlogP of 7.0 or higher.Type: GrantFiled: October 3, 2019Date of Patent: April 23, 2024Assignee: The Procter & Gamble CompanyInventors: Toshiyuki Iwata, Shikhar Gupta, Marco Klaehn
-
Patent number: 11643730Abstract: The disclosure provides for anti-scale deposition coatings for use on surface, such as on oilfield parts. The coating includes a first, sublayer of a metal, ceramic, or metal-ceramic composite, which is characterized in having a hardness in excess of 35 HRC. The coating includes a second, top layer over the first layer, that is a polymer. A surface of the first layer may be conditioned to have a roughened or patterned topology for receipt of and adherence with the at least one top layer. The first layer may provide the coating with hardness, and the at least one top layer may provide the coating with low-friction and anti-scale properties.Type: GrantFiled: June 28, 2019Date of Patent: May 9, 2023Assignee: SCHLUMBERGER TECHNOLOGY CORPORATIONInventors: Manuel Marya, Virendra Singh
-
Patent number: 11608303Abstract: Provided are a coated member in which damage of a coating film can be suppressed in a high temperature environment and the coating may be performed at low cost, and a method of manufacturing the same. A coated member includes a bond coat and a top coat sequentially laminated on a substrate made of a Si-based ceramic or a SiC fiber-reinforced SiC matrix composite, wherein the top coat includes a layer composed of a mixed phase of a (Y1-aLn1a)2Si2O7 solid solution (here, Ln1 is any one of Nd, Sm, Eu, and Gd) and Y2SiO5 or a (Y1-bLn1?b)2SiO5 solid solution (here, Ln1? is any one of Nd, Sm, Eu, and Gd), or a mixed phase of a (Y1-cLn2c)2Si2O7 solid solution (here, Ln2 is any one of Sc, Yb, and Lu) and Y2SiO5 or a (Y1-dLn2?d)2SiO5 solid solution (here, Ln2? is any one of Sc, Yb, and Lu).Type: GrantFiled: April 27, 2022Date of Patent: March 21, 2023Assignee: MITSUBISHI HEAVY INDUSTRIES AERO ENGINES, LTD.Inventors: Mineaki Matsumoto, Takayuki Kurimura, Kosuke Nishikawa, Tadayuki Hanada
-
Patent number: 11542209Abstract: An article includes a ceramic-based substrate and a barrier layer on the ceramic-based substrate. The barrier layer includes a matrix phase and gettering particles in the matrix phase. The gettering particles with an aspect ratio greater than one are aligned such that a maximum dimension of the gettering particles extends along an axis that is generally parallel to the substrate. The barrier layer includes a dispersion of diffusive particles in the matrix phase. A composite material and a method of applying a barrier layer to a substrate are also disclosed.Type: GrantFiled: February 7, 2020Date of Patent: January 3, 2023Assignee: Raytheon Technologies CorporationInventors: Richard Wesley Jackson, Michael R. Kracum, Xia Tang, James T. Beals
-
Patent number: 11524495Abstract: The pressing of an article is achieved with a closed-loop feedback press. The closed-loop feedback press is effective to measure an amount of pressure applied and adjust the pressure to achieve a prescribed amount of compression on the article. Further, the press may leverage a closed-loop feedback system to maintain a consistent temperature of one or more platens. The press is able to adjust a pressure applied one or more times during a pressing operation to accelerate a temperature change in the pressed article while reducing the pressure applied as the temperature approaches a target temperature to limit unintentional deformation and bleeding of the pressed material of the article.Type: GrantFiled: March 17, 2020Date of Patent: December 13, 2022Assignee: NIKE, Inc.Inventors: Stephen Hancock, Nicolai Luksza, Adam Montoya, Charles W. Morrison, Daniel Black Thayer
-
Patent number: 11435279Abstract: A method for analysing a bonding between two aeronautical parts. The method includes the steps of a) applying a release agent to a first surface to be bonded of a first part and to a second surface to be bonded of a second part, b) applying an adhesive to at least one of the first and second surfaces and positioning these surfaces on top of each other, the adhesive forming an adhesive film after polymerisation, c) separating the parts from each other and removing the adhesive film in one piece, d) analysing the adhesive film. The invention also relates to a method for bonding two aeronautical parts.Type: GrantFiled: May 4, 2021Date of Patent: September 6, 2022Assignees: SAFRAN, SAFRAN AIRCRAFT ENGINESInventors: Pierre-Antoine Bossan, Thierry Patrick Chauvin, Lauren Chin, Cali Lapenta, Philippe Gallois
-
Patent number: 11434393Abstract: The present invention relates to an adhesive film including a photothermal conversion layer including a light absorber and a thermally decomposable resin; and an adhesive layer, in which the thermally decomposable resin has a —COOH or —OH functional group and includes two kinds of acrylic resins having different weight average molecular weights, and an adhesive substrate including the adhesive film and a substrate to be processed. In the adhesive film and the adhesive substrate according to the present invention, it is possible to simplify a processing process of the substrate and reduce costs and time, and prevent damage to a substrate and a circuit or an element formed on the substrate.Type: GrantFiled: December 14, 2017Date of Patent: September 6, 2022Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Yongsuk Yang, Kyosung Hwang, Gyu Jin Jung
-
Patent number: 11407904Abstract: Methods of preparing waterborne polyurethane dispersions involving reacted units of a polyol, an acidic diol, a hydroxy functionalized polyhedral oligomeric silsesquioxane, a diisocyanate, and a chain extender. Polyurethane coatings based on these waterborne polyurethane dispersions are evaluated on their hydrophobicity (water contact angle), mechanical strength (e.g. tensile strength, Young's modulus, elongation at break), and antifouling properties.Type: GrantFiled: February 11, 2019Date of Patent: August 9, 2022Assignee: KING FAHD UNIVERSITY OF PETROLEUM AND MINERALSInventors: Mohammad Mizanur Rahman, Md. Hasan Zahir
-
Patent number: 11378918Abstract: A method for manufacturing a micromechanical timepiece part starting from a silicon-based substrate, including, providing a silicon-based substrate, forming pores on the surface of at least one part of a surface of the silicon-based substrate of a depth of at least 10 ?m, preferably of at least 50 ?m, and more preferably of at least 100 ?m, the pores being designed in order to open out at the external surface of the micromechanical timepiece part. A micromechanical timepiece part including a silicon-based substrate which has, on the surface of at least one part of a surface of the silicon-based substrate, pores of a depth of at least 10 ?m, preferably of at least 50 ?m, and more preferably of at least 100 ?m, the pores being designed in order to open out at the external surface of the micromechanical timepiece part.Type: GrantFiled: August 11, 2016Date of Patent: July 5, 2022Assignee: Nivarox-FAR S.A.Inventor: Philippe Dubois
-
Patent number: 11370685Abstract: A method of melting glass and glass-ceramics that includes the steps: conveying a batch of raw materials into a submerged combustion melting apparatus, the melting apparatus having liquid-cooled walls and a floor; directing a flame into the batch of raw materials and the melted batch with sufficient energy to form the raw materials into the melted batch; and heating a delivery orifice assembly in the floor of the submerged melting apparatus to convey the melted batch through the orifice assembly into a containment vessel. The melted batch has a glass or glass-ceramic composition that is substantially reactive to a refractory material comprising one or more of silica, zirconia, alumina, platinum and platinum alloys.Type: GrantFiled: August 1, 2017Date of Patent: June 28, 2022Assignee: Corning IncorporatedInventors: Curtis Richard Cowles, Gilbert De Angelis, Nicolas LeBlond, David John McEnroe, Jeffrey Lee Merriman, Rand Alan Murnane, Katherine Rose Rossington, Michael Joshua Snyder
-
Patent number: 11365159Abstract: Provided are a coated member in which damage of a coating film can be suppressed in a high temperature environment and the coating may be performed at low cost, and a method of manufacturing the same. A coated member includes a bond coat and a top coat sequentially laminated on a substrate made of a Si-based ceramic or a SiC fiber-reinforced SiC matrix composite, wherein the top coat includes a layer composed of a mixed phase of a (Y1-aLn1a)2Si2O7 solid solution (here, Ln1 is any one of Nd, Sm, Eu, and Gd) and Y2SiO5 or a (Y1-bLn1?b)2SiO5 solid solution (here, Ln1? is any one of Nd, Sm, Eu, and Gd), or a mixed phase of a (Y1-cLn2c)2Si2O7 solid solution (here, Ln2 is any one of Sc, Yb, and Lu) and Y2SiO5 or a (Y1-dLn2?d)2SiO5 solid solution (here, Ln2? is any one of Sc, Yb, and Lu).Type: GrantFiled: February 9, 2016Date of Patent: June 21, 2022Assignee: MITSUBISHI HEAVY INDUSTRIES AERO ENGINES, LTD.Inventors: Mineaki Matsumoto, Takayuki Kurimura, Kosuke Nishikawa, Tadayuki Hanada
-
Patent number: 11331402Abstract: The present invention relates to a solid aromatic composition capable of significantly improving the loading rate of fragrance substances, selectively loading fragrance that can be acquired during the aging procedure of blended fragrance substances, maintaining fragrance from the early stage of the loading, and improving the persistence of fragrance to have constant intensity. Furthermore, the solid aromatic composition can resolve the problem of harmfulness to the human body by reducing a powder flying phenomenon, and can be applied to various environments by improving high-temperature stability.Type: GrantFiled: June 13, 2019Date of Patent: May 17, 2022Assignee: MASSCON CO., LTD.Inventors: Yongeui Lee, Min Young Cheong, Chang Bin Lee
-
Patent number: 11320174Abstract: The present invention relates to a solar selective coating for a metal substrate comprising at least one absorber layer and at least one semi-absorber layer selected from the structures of AlTiN and AlTiSiN. In preferred embodiments, the solar selective coating according to the present invention is a double layer coating with AlTiN—AlTiN or AlTiSiN—AlTiSiN formation. The process for producing the coating includes a step of treatment of the metal substrate with a reactive magnetron sputtering system.Type: GrantFiled: May 9, 2018Date of Patent: May 3, 2022Assignee: B-PLAS-BURSA PLASTIK, METAL, INSAAT, ENERJI, MADENCILIK, JEOTERMAL, TURIZM, SIVIL HAVACILIK VE TARIM, SAN. VE TIC. A.S.Inventors: Mustafa K. Urgen, M. Kursat Kazmanli, M. Celal Gokcen, Eren Seckin, Serdar S. Ozbay
-
Patent number: 11276759Abstract: A scalable process for fabricating graphene/hexagonal boron nitride (h-BN) heterostructures is disclosed herein. The process includes (BN)XHy-radical interfacing with active sites on silicon nitride coated silicon (Si3N4/Si) surfaces for nucleation and growth of large-area, uniform and ultrathin h-BN directly on Si3N4/Si substrates (B/N atomic ratio=1:1.11±0.09). Further, monolayer graphene van der Waals bonded with the produced h-BN surface benefits from h-BN's reduced roughness (3.4 times) in comparison to Si3N4/Si. Because the reduced surface roughness leads to reduction in surface roughness scattering and charge impurity scattering, therefore an enhanced intrinsic charge carrier mobility (3 folds) for graphene on h-BN/Si3N4/Si is found.Type: GrantFiled: December 24, 2019Date of Patent: March 15, 2022Assignees: GlobalWafers Co., Ltd., Board of Trustees of the University of IllinoisInventors: Vikas Berry, Sanjay Behura, Phong Nguyen, Michael R. Seacrist
-
Patent number: 11270880Abstract: A method for depositing a silicon-containing film, the method comprising: placing a substrate comprising at least one surface feature into a flowable CVD reactor which is at a temperature of from about ?20° C. to about 400° C.; introducing into the reactor at least one silicon-containing compound having at least one acetoxy group to at least partially react the at least one silicon-containing compound to form a flowable liquid oligomer wherein the flowable liquid oligomer forms a silicon oxide coating on the substrate and at least partially fills at least a portion of the at least one surface feature. Once cured, the silicon oxide coating has a low k and excellent mechanical properties.Type: GrantFiled: September 24, 2019Date of Patent: March 8, 2022Assignee: Versum Materials US, LLCInventors: Jianheng Li, Raymond Nicholas Vrtis, Robert Gordon Ridgeway, Manchao Xiao, Xinjian Lei
-
Patent number: 11251041Abstract: A semiconductor substrate includes a main surface inclined by a first off-angle greater than 0° from a first direction parallel to a crystal plane, with respect to the crystal plane, in a first radial direction of the main surface, and a notch disposed toward the first direction, at an edge of the main surface in the first radial direction.Type: GrantFiled: March 5, 2019Date of Patent: February 15, 2022Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: In-Ji Lee, Doek-Gil Ko, Yeon-sook Kim
-
Patent number: 11198769Abstract: The present invention relates to plastic films with improved laser engraving capability, chemical resistance and mechanical stress, special embodiments of such films in the form of co-extrusion films, layer structures comprising such films, use of such films, as well as security documents, preferably identification documents, containing such films.Type: GrantFiled: December 18, 2017Date of Patent: December 14, 2021Assignee: Covestro Deutschland AGInventors: Heinz Pudleiner, Georgios Tziovaras, Kira Planken, Stefan Janke, Christoph Köhler
-
Patent number: 11155508Abstract: To provide a fluorinated ether compound capable of forming a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance and light resistance; a fluorinated ether composition and a coating liquid containing the fluorinated ether compound; an article having a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance and light resistance and a method for producing it. A fluorinated ether compound having a poly(oxyperfluoroalkylene) chain having a unit (?) which is an oxyperfluoroalkylene unit having 5 or 6 carbon atoms, and a unit (?) which is an oxyperfluoroalkylene unit having at most 4 carbon atoms, and having at least one of a hydrolysable silyl group and a silanol group on at least one terminal of the poly(oxyperfluoroalkylene) chain via a linking group.Type: GrantFiled: November 11, 2019Date of Patent: October 26, 2021Assignee: AGC Inc.Inventors: Taiki Hoshino, Makoto Uno, Masahiro Ito
-
Patent number: 11130194Abstract: The friction stir welding tool member according to the present invention is made of a ceramic member in which a shoulder portion and a probe portion are integrally formed, wherein a root portion of the probe portion and an end portion of the shoulder portion have a curved surface shape; and the friction stir welding tool member has a ratio (R1/D) of 0.02 or more and 0.20 or less when a curvature radius of the end portion of the shoulder portion is defined as R1 (mm) and an outer diameter of the shoulder portion is defined as D (mm). In addition, the ceramic member is preferably made of a silicon nitride sintered body having a Vickers hardness of 1400 HV1 or more. According to the above-described configuration, a friction stir welding tool member having excellent durability can be provided.Type: GrantFiled: August 4, 2017Date of Patent: September 28, 2021Assignees: OSAKA UNIVERSITY, TOSHIBA MATERIALS CO., LTD.Inventors: Hidetoshi Fujii, Yoshiaki Morisada, Kai Funaki, Isao Ikeda, Yutaka Abe, Masahiro Kato
-
Patent number: 11124342Abstract: The present invention relates to a tubular packaging body formed from a flexible film having a thickness e, the ends of which are butt welded and covered by a plastic reinforcement element located on the inner surface of said tubular body and having a section defined by a width l and a height h, said tubular body being characterized in that all of the following conditions should be met: —h is greater than or equal to e, —the ratio (l·e)/h2 is between 1 and 10.Type: GrantFiled: June 12, 2013Date of Patent: September 21, 2021Assignee: AISAPACK HOLDING S.A.Inventors: Jacques Thomasset, Gerhard Keller
-
Patent number: 11122935Abstract: A ceramic deep-frying device capable of withstanding high temperatures and releasing far-infrared energy is made by grinding and mixing mullite, spodumene, energy ceramic material, ball clay, and kaolin clay into clay blank; molding the blank into ceramic green body; and sintering the green body at 1250-1320° C. for 18-24 hours. The device is completely immersed in the oil in a deep-frying vessel while leaving a gap between the device and heating pipe in the vessel or the inner bottom wall of the vessel, for enabling the oil to circulate through the through holes in the device due to temperature difference in the oil, causing the energy ceramic material to release anions and far-infrared rays that decrease van der Waals forces between oil molecules, and hence split, the oil molecules, thereby extending the service life of the oil, shortening the deep-frying time required, and lowering the oil content of deep-fried food.Type: GrantFiled: May 29, 2018Date of Patent: September 21, 2021Inventors: Chun-Shyong Lee, Sen-Kung Hsu
-
Patent number: 11117806Abstract: A silicon carbide-graphite composite is described, including (i) interior bulk graphite material and (ii) exterior silicon carbide matrix material, wherein the interior bulk graphite material and exterior silicon carbide matrix material inter-penetrate one another at an interfacial region therebetween, and wherein graphite is present in inclusions in the exterior silicon carbide matrix material. Such material may be formed by contacting a precursor graphite article with silicon monoxide (SiO) gas under chemical reaction conditions that are effective to convert an exterior portion of the precursor graphite article to a silicon carbide matrix material in which graphite is present in inclusions therein, and wherein the silicon carbide matrix material and interior bulk graphite material interpenetrate one another at an interfacial region therebetween.Type: GrantFiled: August 18, 2016Date of Patent: September 14, 2021Assignee: ENTEGRIS, INC.Inventors: Troy Scoggins, Rex Gerald Sheppard, Abuagela H. Rashed, Jonathan Loyd Burr
-
Patent number: 11094557Abstract: A silicon wafer having a BMD density of 5×108/cm3 or more and 2.5×1010/cm3 or less in a region of 80 ?m to 285 ?m from the wafer surface when the silicon wafer is heat-treated at a temperature X (° C., 700° C.?X?1000° C.) for a time Y (min) and then subjected to an infrared tomography method in which the laser power is set to 50 mW and the exposure time of a detector is set to 50 msec. The time Y and the temperature X satisfy Y=7.88×1067×X?22.5.Type: GrantFiled: June 19, 2018Date of Patent: August 17, 2021Assignee: SUMCO CORPORATIONInventors: Toshiaki Ono, Shigeru Umeno
-
Patent number: 11090725Abstract: The disclosed method includes selecting a suspension ceramic or metal photocurable composition (CPC or MPC); preparing a sacrificial organic material (SOM) forming a photocurable layer destroyed by heating; for manufacturing pieces, on the working tray, forming successive layers of SOM cured by irradiation, the one or more CPC or MPC-based pieces being manufactured by machining a recess in a layer of cured SOM; depositing the CPC or MPC within the recesses; curing the CPC or MPC to obtain a hard horizontal surface level with the adjacent layer of cured SOM, when forming each recess, it is delimited by previously defined patterns, the depth(s) selected in order to ensure the continuity of the one or more pieces to be manufactured; and obtaining one or more green pieces inserted in the SOM, which are subjected to debinding by heating in order to destroy the SOM in which they are trapped.Type: GrantFiled: August 20, 2018Date of Patent: August 17, 2021Assignee: S.A.S 3DCERAM-SINTOInventors: Richard Gaignon, Christophe Chaput, Marc Nguyen
-
Patent number: 11072566Abstract: A coated substrate is provided that comprises: a substrate; and a barrier coating comprising a compound having the formula: Ln2ABO8, where Ln comprises scandium, yttrium, lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, lutetium, or mixtures thereof; A comprises Si, Ti, Ge, Sn, Ce, Hf, Zr, or a combination thereof; and B comprises Mo, W, or a combination thereof. In one embodiment, B comprises Mo. A gas turbine is also provided that comprises the coated substrate described above.Type: GrantFiled: August 19, 2019Date of Patent: July 27, 2021Assignee: General Electric CompanyInventors: Glen Harold Kirby, Thomas Grandfield Howell
-
Patent number: 11062910Abstract: Processes for surface treatment of a workpiece are provided. In one example implementation, a method can include performing an organic radical based surface treatment process on a workpiece. The organic radical based surface treatment process can include generating one or more species in a first chamber. The surface treatment process can include mixing one or more hydrocarbon molecules with the species to create a mixture. The mixture can include one or more organic radicals. The surface treatment process can include exposing a semiconductor material on the workpiece to the mixture in a second chamber.Type: GrantFiled: June 18, 2019Date of Patent: July 13, 2021Assignees: Mattson Technology, Inc., Beijing E-Town Semiconductor Technology Co., Ltd.Inventors: Michael X. Yang, Hua Chung, Xinliang Lu
-
Patent number: 11053163Abstract: A hydrophobic coating and a method for applying such a coating to a surface of a substrate. The method includes applying a coating composition to the surface and heating the coated surface at a cure temperature from about 300° C. to about 600° C. for a time from about 2 hours to about 48 hours. The coating composition is applied to the surface by an application method selected from the group consisting of flowing, dipping, and spraying. The coating composition comprises a yttrium compound, an additive selected from the group consisting of a cerium compound and a dispersion of yttrium oxide nanoparticles, a water-soluble polymer, and a solvent solution of de-ionized water and a water-soluble alcohol.Type: GrantFiled: December 30, 2019Date of Patent: July 6, 2021Assignee: GKN Aerospace Transparency Systems, Inc.Inventors: Marlowe Moncur, Christopher Rankin
-
Patent number: 11046614Abstract: A high purity yttria or ytterbia stabilized zirconia powder wherein a purity of the zirconia is at least 99.5 weight percent purity and with a maximum amount of specified oxide impurities.Type: GrantFiled: December 8, 2017Date of Patent: June 29, 2021Assignee: OERLIKON METCO (US) INC.Inventors: Jacobus Doesburg, Mitchell Dorfman, Matthew Gold, Liangde Xie
-
Patent number: 11008670Abstract: A manufacturing method of a SiC ingot includes a crystal growth step of growing a crystal on a principal plane having an offset angle with respect to a {0001} plane, in which, at least in a latter half growth step of the crystal growth step, after the crystal in the crystal growth step grows 7 mm or more from the principal plane, and in which, the crystal is grown by setting an acute angle, between the {0001} plane and an inclined plane which is perpendicular to a cut section cut along an offset direction and passes through both a center of a crystal growth surface and an offset downstream end portion of the crystal growth surface, to be equal to or more than an angle smaller than an offset angle by 2° and equal to or less than 8.6°.Type: GrantFiled: December 22, 2017Date of Patent: May 18, 2021Assignee: SHOWA DENKO K.K.Inventors: Yohei Fujikawa, Hideyuki Uehigashi
-
Patent number: 10994522Abstract: A silicone sheet 1 of the present invention is a silicone sheet that is at least one selected from a silicone gel sheet and a silicone putty sheet. The silicone sheet has a Shore 00 hardness of 75 or less. The silicone sheet is cut in a thickness direction and cut faces 5a-5m and 6a-6f of the silicone sheet are adjacent to each other without gap. The cut faces of the silicone sheet are non-tacky, and the silicone sheet is separable at the cut faces. Preferably, the cut faces have a tackiness of 0.6 N or less based on a tackiness checker. The mounting method of the present invention is a method of mounting the above silicone sheet by pick and place mounting using an automatic mounting machine.Type: GrantFiled: October 2, 2019Date of Patent: May 4, 2021Assignee: Fuji Polymer Industries Co., Ltd.Inventors: Shingo Ito, Yuta Hatazawa
-
Patent number: 10983396Abstract: The present invention relates to a method for producing a liquid crystal panel. The method includes curing a first reactive mesogen layer with ultraviolet light at an illuminance within a range of 40 to 90 mW/cm2. The liquid crystal panel includes a first transparent base material, a TFT layer and a first alignment film stacked in order on the first transparent base material, a second transparent base material, a color filter layer, an in-cell retardation layer, and a second alignment film stacked in order on the second transparent base material, a liquid crystal layer sandwiched between the first alignment film and the second alignment film, an out-cell retardation layer disposed on a side opposite to a color filter layer side of the second transparent base material, and a pair of linearly polarizing plates arranged so as to sandwich the first transparent base material and the out-cell retardation layer and having transmission axes orthogonal to each other.Type: GrantFiled: March 25, 2020Date of Patent: April 20, 2021Assignee: SHARP KABUSHIKI KAISHAInventors: Koji Murata, Akira Sakai, Yuichi Kawahira, Takako Koide, Masahiro Hasegawa, Kiyoshi Minoura
-
Patent number: 10945499Abstract: Proposed is a decorative element containing (a) a transparent gemstone with a faceted surface comprising convex curved regions, (b) a transparent electrically conductive layer applied to said faceted surface comprising convex curved regions, (c) a wavelength-selective layer applied (c1) to the planar side opposite to the faceted curved surface, or (c2) to the photovoltaic cell (d); (d) a photovoltaic cell; and (e) a touch-sensitive electronic circuitry.Type: GrantFiled: December 19, 2016Date of Patent: March 16, 2021Assignee: D. Swarovski KGInventors: Christof Gapp, Martin Scholz, Annemarie Leber, Mathias Mair, Franz Lexer, Ernst Altenberger
-
Patent number: 10941083Abstract: A part coated in a protective coating forms a thermal barrier and includes a ceramic first layer. The protective coating further includes a second layer present on the first layer and including a majority by weight of a first feldspar mineral having a melting temperature higher than or equal to 1010° C. and presenting a thickness greater than or equal to 10 ?m.Type: GrantFiled: July 8, 2016Date of Patent: March 9, 2021Assignee: SAFRAN AIRCRAFT ENGINESInventors: Pascal Fabrice Bilhe, André Hubert Louis Malie
-
Patent number: 10934462Abstract: The invention describes compositions that include amine-containing silsesquioxane or an amine-containing alkyltrialkoxysilane and a thermoplastic elastomer as well as methods of preparation of the compositions that are useful as self-bonding adhesives for various substrates.Type: GrantFiled: July 17, 2018Date of Patent: March 2, 2021Assignee: Saint-Gobain Performance Plastics CorporatoinInventor: Duan Li Ou
-
Patent number: 10927445Abstract: Provided is a surface-coated cutting tool including: a tool body (3) and a hard coating layer on the tool body (3). The hard coating layer has an alternate laminate structure of A (1) and B layers (2). The A layer (1) is a Ti and Al complex nitride layer satisfying a compositional formula: (Ti1-zAlz)N, 0.4?z?0.7. The B layer (2) is a Cr, Al and M complex nitride layer satisfying a compositional formula: (Cr1-x-yAlxMy)N, 0.03?x?0.4 and 0?y?0.05. The value of a ratio tB/tA of the average layer thickness of the B layer (2) to the average layer thickness of the A layer (1) satisfies 0.67 to 2.0. The lattice constant a(?) of crystal grains of the hard coating layer satisfies 4.10?a?4.20. The ratio of I(200) to I(111) satisfies 2.0?I(200)/I(111)?10.Type: GrantFiled: August 25, 2016Date of Patent: February 23, 2021Assignee: MITSUBISHI MATERIALS CORPORATIONInventors: Shun Sato, Masakuni Takahashi
-
Patent number: 10892334Abstract: An n-type SiC single crystal substrate of the present invention is provided which is a substrate doped with both a donor and an acceptor, and has a difference between a donor concentration and an acceptor concentration in an outer peripheral portion which is smaller than a difference between a donor concentration and an acceptor concentration in a central portion, and is smaller than 3.0×1019/cm3.Type: GrantFiled: September 25, 2017Date of Patent: January 12, 2021Assignee: SHOWA DENKO K.K.Inventors: Kazuma Eto, Hiromasa Suo, Tomohisa Kato
-
Patent number: 10886159Abstract: A method of processing a wafer includes: preparing a support substrate that can transmit ultraviolet rays having a wavelength of 300 nm or shorter and can support the wafer thereon; integrating a face side of the wafer and the support substrate by sticking the face side of the wafer and the support substrate to each other with an UV-curable resin whose adhesive power can be lowered by ultraviolet rays applied thereto interposed therebetween, thereby integrally combining the wafer and the support substrate with each other; processing a reverse side of the wafer; destroying the UV-curable resin by applying a focused laser beam in an ultraviolet range having a wavelength of 300 nm or shorter from a support substrate side; and peeling off the support substrate from the face side of the wafer.Type: GrantFiled: June 14, 2018Date of Patent: January 5, 2021Assignee: DISCO CORPORATIONInventors: Hiroshi Morikazu, Tasuku Koyanagi
-
Patent number: 10866665Abstract: Embodiments of a vehicle interior system are disclosed. In one or more embodiments, the system includes a base with a curved surface, and a display or touch panel disposed on the curved surface. The display includes a cold-bent glass substrate with a thickness of 1.5 mm or less and a first radius of curvature of 20 mm or greater, and a display module and/or touch panel attached to the glass substrate having a second radius of curvature that is within 10% of the first radius of curvature. Methods for forming such systems are also disclosed.Type: GrantFiled: October 3, 2018Date of Patent: December 15, 2020Assignee: CORNING INCORPORATEDInventors: Jordan Thomas Boggs, Michael Timothy Brennan, Atul Kumar, Arpita Mitra, William Michael Seiderman, Yawei Sun, Wendell Porter Weeks
-
Patent number: 10822285Abstract: Coating systems are provided for positioning on a surface of a substrate, along with the resulting coated components and methods of their formation. The coating system may include a layer having a compound of the formula: A1?bBbZ1?dDdMO6 where: A is Al, Ga, In, Sc, Y, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Fe, Cr, Co, Mn, Bi, or a mixture thereof; b is 0 to about 0.5; Z is Hf, Ti, or a mixture thereof; D is Zr, Ce, Ge, Si, or a mixture thereof; d is 0 to about 0.5; and M is Ta, Nb, or a mixture thereof.Type: GrantFiled: August 29, 2017Date of Patent: November 3, 2020Assignee: General Electric CompanyInventor: Glen Harold Kirby
-
Patent number: 10808142Abstract: Provided are a method of preparing a graphene quantum dot, a graphene quantum dot prepared using the method, a hardmask composition including the graphene quantum dot, a method of forming a pattern using the hardmask composition, and a hardmask obtained from the hardmask composition. The method of preparing a graphene quantum dot includes reacting a graphene quantum dot composition and an including a polyaromatic hydrocarbon compound and an organic solvent at an atmospheric pressure and a temperature of about 250° C. The polyaromatic hydrocarbon compound may include at least four aromatic rings.Type: GrantFiled: March 19, 2018Date of Patent: October 20, 2020Assignee: Samsung Electronics Co., Ltd.Inventors: Sangwon Kim, Minsu Seol, Hyeonjin Shin, Dongwook Lee, Yunseong Lee, Seongjun Jeong, Alum Jung
-
Patent number: 10741420Abstract: A cleaning wafer or substrate for use in cleaning, or in combination with, components of, for example, integrated chip manufacturing apparatus. The cleaning substrate can include a substrate having varying predetermined surface features, such as one or more predetermined adhesive, non-tacky, electrostatic, projection, depression, or other physical sections. The predetermined features can provide for more effective cleaning of the components with which they are used, such as an integrated chip manufacturing apparatus in the place of the integrated chip wafer. The cleaning substrate can be urged into cleaning or other position by vacuum, mechanical, electrostatic, or other forces. The cleaning substrate can adapted to accomplish a variety of functions, including abrading or polishing. The cleaning substrate may be made by a novel method of making, and it may then be used in a novel method of use I combination with chip manufacturing apparatus.Type: GrantFiled: September 20, 2018Date of Patent: August 11, 2020Assignee: International Test Solutions, Inc.Inventors: Alan E. Humphrey, James H. Duvall, Jerry Broz
-
Patent number: 10714338Abstract: We describe a method for reducing bow in a composite wafer comprising a silicon wafer and a silicon carbide layer grown on the silicon wafer. The method includes applying nitrogen atoms during the growth process of the silicon carbide layer on the silicon wafer so as to generate a compressive stress within the composite wafer.Type: GrantFiled: July 14, 2017Date of Patent: July 14, 2020Assignee: ANVIL SEMICONDUCTORS LIMITEDInventor: Peter Ward
-
Patent number: 10704148Abstract: A laminated film includes a flexible base material, a first thin film layer formed on at least one of surfaces of the base material, and a second thin film layer formed on the first thin film layer, and the first thin film layer contains a silicon atom (Si), an oxygen atom (O) and a carbon atom (C), the second thin film layer contains a silicon atom, an oxygen atom and a nitrogen atom (N), and the first thin film layer and the second thin film layer are formed by using glow discharge plasma.Type: GrantFiled: December 11, 2014Date of Patent: July 7, 2020Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yasuhiro Yamashita, Yutaka Ito, Hideaki Nakajima
-
Patent number: 10676266Abstract: A tapping valve with a plastic valve housing for shipping and storage tanks for liquids, which are equipped with an inner tank with a filling socket and a drain socket for connecting the tapping valve, an outer jacket of a metal cage or sheet metal, and a pallet-like metal support frame. The tapping valve is screwed by means of the inlet socket of the valve housing onto a connecting flange, which is designed as a threaded flange, is made of an electrically conductive plastic material, and is welded onto the drain socket of the inner tank. The connecting flange of the valve housing is connected with the support frame or the outer jacket of the shipping and storage tank by an electric grounding conductor.Type: GrantFiled: July 24, 2009Date of Patent: June 9, 2020Assignee: PROTECHNA S.A.Inventor: Udo Schütz
-
Patent number: 10669447Abstract: A method for producing a coating on a substrate. The method includes producing a clearcoat directly on the substrate by applying an aqueous clearcoat material directly to the substrate. The method further includes curing the applied clearcoat material, the clearcoat material being a two-component coating composition. Also disclosed are coatings produced according to the method and their uses.Type: GrantFiled: October 9, 2017Date of Patent: June 2, 2020Assignee: BASF Coatings GmbHInventors: Jens-Henning Noatschk, Eva-Kathrin Schillinger, Simon Winzen
-
Patent number: 10654100Abstract: The present disclosure is directed at alloys and method for layer-by-layer deposition of metallic alloys on a substrate. The resulting deposition provides for relatively high hardness metallic parts with associated wear resistance. Applications for the metallic parts include pumps, valves and/or bearings.Type: GrantFiled: May 18, 2015Date of Patent: May 19, 2020Assignee: The NanoSteel Company, Inc.Inventors: Charles D. Tuffile, Harald Lemke
-
Patent number: 10633738Abstract: Embodiments described herein relate to a protective coating that protects an underlying chamber component (i.e. the object upon which the coating is being deposited) from corrosion or deterioration within a corrosive environment.Type: GrantFiled: March 29, 2017Date of Patent: April 28, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Son T. Nguyen, Michael Fong
-
Patent number: 10629796Abstract: A laminate includes, on a substrate, a first buffer layer substantially made of zirconium oxide or stabilized zirconia, a second buffer layer substantially made of yttrium oxide, a metal layer substantially made of at least one among platinum, iridium, palladium, rhodium, vanadium, chromium, iron, molybdenum, tungsten, aluminum, silver, gold, copper, and nickel, and a magnesium oxide layer substantially made of magnesium oxide, in this order.Type: GrantFiled: March 19, 2018Date of Patent: April 21, 2020Assignee: TDK CORPORATIONInventors: Kazuya Maekawa, Makoto Shibata, Katsuyuki Nakada, Yohei Shiokawa, Kazuumi Inubushi
-
Patent number: 10607776Abstract: A multilayer ceramic electronic component includes a ceramic body in which dielectric layers and internal electrodes are alternately stacked. The dielectric layers contain at least one dielectric grain having a ratio of a long axis to a short axis that is 3.5 or more. The internal electrodes contain a ceramic component containing a grain growth adjusting ingredient for dielectric grains. Each dielectric layer includes interfacial portions adjacent to the internal electrodes and a central portion disposed between the interfacial portions, and concentrations of the grain growth adjusting ingredient in the interfacial portions and the central portion are different from each other.Type: GrantFiled: March 16, 2016Date of Patent: March 31, 2020Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.Inventors: Kum Jin Park, Chang Hak Choi, Jong Hoon Yoo, Doo Young Kim, Min Gi Sin, Chi Hwa Lee, Chul Seung Lee, Jong Han Kim