Abstract: A primer composition comprising a compound containing an epoxy group, a Si—H group, and an aromatic ring per molecule, and a solvent is effective for assisting in integral molding or bonding a silicone rubber to an adherend of gold, silver or platinum.

Abstract: Various embodiments of the present invention are directed to methods of forming nanostructures on non-single crystal substrates, and resulting nanostructures and nanoscale functional devices. In one embodiment of the present invention, a method of forming nanostructures includes forming a multi-layer structure comprising a metallic layer and a silicon layer. The multi-layer structure is subjected to a thermal process to form metal-silicide crystallites. The nanostructures are grown on the metal-silicide crystallites. In another embodiment of the present invention, a structure includes a non-single-crystal substrate and a layer formed over the non-single-crystal substrate. The layer includes metal-silicide crystallites. A number of nanostructures may be formed on the metal-silicide crystallites. The disclosed structures may be used to form a number of different types of functional devices for use in electronics and/or optoelectronics devices.

Abstract: Coatings are provided in which surfaces may be activated by covalently bonding a silane derivative to the metal surface, covalently bonding a lactone polymer to the silane derivative by in situ ring opening polymerization, and depositing at least one layer of a polyester on the bonded lactone. Biologically active agents may be deposited with the polyester layers. Such coated surfaces may be useful in medical devices, in particular stents.

Abstract: The invention is directed to elements having fluoride coated surfaces having multiple layers of fluoride material coatings for use in laser systems, and in particular in laser systems operating at wavelength <200 nm. In a particular embodiment the invention is directed to highly reflective mirrors for use in wavelengths <200 nm laser systems. The invention describes the mirrors and a method of making them that utilizes a plurality of periods of fluoride coatings, each period comprising one layer a high refractive index fluoride material and one layer low refractive index fluoride material, and additionally at least one layer of an amorphous silica material. The silica material can be inserted between each period, inserted between a stack consisting of a plurality of periods, and, optionally, can also be applied as the final layer of the finished element to protect the element.

Abstract: A thermal diffusion sheet is provided with a heat conducting layer, a thermal diffusion layer provided on the surface of the heat conducting layer and a heat insulating layer provided on the surface of the thermal diffusion layer. The heat conducting layer is formed of a composition containing an organic polymer and a heat conductive filler. The thermal diffusion layer is formed of a metal material. The heat insulating layer is formed of a material having electrical insulation properties. The thermal diffusion sheet is manufactured through providing a heat insulating layer on the surface of a thermal diffusion layer, preparing a composition, and forming a heat conducting layer. When preparing a composition, an organic polymer in liquid form having thermosetting properties and a heat conductive filler are mixed.

Abstract: An electrostatic chucking device having a laminated structure formed by sequentially laminating a first insulation layer, an electrode layer, and a second insulation layer on a metal substrate. The first and second insulation layers are formed from polyimide films. At least one adhesion layer is provided between the metal substrate and the first insulation layer, and is a thermoplastic polyimide-based adhesive film having a film thickness of 5 to 50 ?m.

Abstract: A process for applying an oxidation resistant coating to an article includes the steps of mixing at least about 10% by volume to up to about 99% by volume of a slurry at least one silica based material having a viscosity of about 1×102 poise to about 1×107 poise at a temperature of about 1,292° F. (700° C.) to about 3,272° F. (1,800° C.) at least about 1% by volume to up to about 90% by volume of the slurry at least one oxygen scavenger, and a liquid medium to form the slurry; coating an article with the slurry to form a slurry coated article; and heat treating under an inert atmosphere the slurry coated article to form an article having at least one oxidation resistant coating layer containing the at least one oxygen scavenger.

Abstract: The present invention provides novel compounds of the formula Gei-x-ySixSny, wherein 0.01<y<0.11, and 0.26<x<0.35, and semiconductor structures comprising such compounds. The present invention also provides novel semiconductor structures comprising silicon substrates, an SiGe buffer layer, and a Group III-V or II-VI active layer. The present invention also provides novel semiconductor structures comprising silicon substrates, an SiGe buffer layer, an SiGeSn template layer, and an SiGe, Ge, Group III-V, or Group II-VI active layer.

Abstract: A turbine engine component is provided which has a substrate, a yttria-stabilized zirconia coating applied over the substrate, and a molten silicate resistant outer layer. The molten silicate resistant outer layer is formed from gadolinia or gadolinia-stabilized zirconia. A method for forming the coating system of the present invention is described.

Abstract: A strong silicide joint between silicon carbide and a metal is resistant to fracture even at high temperature. A method for manufacturing the silicide joint is also provided. This method includes the steps of: bringing a silicon carbide-based member into contact with a Kovar (Fe—Ni—Co alloy) member; and thermally joining the silicon carbide-based member to the Kovar member.

Abstract: The invention includes a method of depositing a noble metal. A substrate is provided. The substrate has a first region and a second region. The first and second regions are exposed to a mixture comprising a precursor of a noble metal and an oxidant. During the exposure, a layer containing the noble metal is selectively deposited onto the first region relative to the second region. In particular applications, the first region can comprise borophosphosilicate glass, and the second region can comprise either aluminum oxide or doped non-oxidized silicon. The invention also includes capacitor constructions and methods of forming capacitor constructions.

Abstract: A surface treating method for metallizing the surface of a polymer containing silicon by the use of a non-expensive material and a method for metallizing the surface of or forming a pattern of a metal layer such as a wiring on the surface of a substrate comprising an arbitrary material, or a method for producing fine particles of a specific transition metal are provided. The method for treating the surface of a silicon-containing polymer or a method for preparing fine transition metal particles involves contacting an organosilicon compound with a solid, a solution or a suspension of a specific transition metal salt, to reduce and precipitate the transition metal and thereby precipitate fine particles of the transition metal on the surface of said organosilicon compound or in the organosilicon compound.

Abstract: A coated cutting tool is disclosed having a substrate and a coating including an aperiodic, multilayered structure with an average composition of (Ti,Al,Cr,Si)N, wherein the average composition is (Ti(1-a-b-c)AlaCrbSic)N, where 0<a<0.5, preferably 0.05<a<0.4 most preferably 0.25<a<0.3, where 0<b<0.15, preferably 0.02<b<0.10, most preferably 0.04<b<0.08, where 0.01<c<0.17, preferably 0.02<c<0.10, most preferably 0.04<c<0.08, and a+b+c<1, and wherein the average thickness of the individual layers is 0.1 to 100 nm.

Abstract: The invention includes methods of forming a metallic coating on a substrate which contains silicon. A metallic glass layer is formed over a silicon surface of the substrate. The invention includes methods of protecting a silicon substrate. The substrate is provided within a deposition chamber along with a deposition target. Material from the deposition target is deposited over at least a portion of the silicon substrate to form a protective layer or structure which contains metallic glass. The metallic glass comprises iron and one or more of B, Si, P and C. The invention includes structures which have a substrate containing silicon and a metallic layer over the substrate. The metallic layer contains less than or equal to about 2 weight % carbon and has a hardness of at least 9.2 GPa. The metallic layer can have an amorphous microstructure or can be devitrified to have a nanocrystalline microstructure.

Abstract: A vulcanizable rubber composition having improved adhesion and adhesion retention properties with steel reinforcement includes up about 10 pbw of a compound selected from aminosilanes and/or mercaptosilanes per 100 parts of the rubber component in the rubber composition. The silane component can be incorporated into the rubber composition prior to curing. Composite structures and methods for providing the rubber composition also are provided.

Abstract: A coating composition is described, containing (a) a metallic matrix based on nickel, cobalt, iron; or combinations thereof; (b) a ceramic phase, containing at least one metal boride or metal silicide compound; and (c) a lubricant phase. Methods of providing wear-resistance and low-friction characteristics to an article (e.g., a gas turbine) are also described, using the coating composition. Related structures are also discussed.

Abstract: The invention relates to a process for coating metallic surfaces with a composition containing silane/silanol/ siloxane/polysiloxane, the composition consisting essentially of a) at least one compound selected from silanes, silanols, siloxanes and polysiloxanes, b) at least two compounds selected from compounds containing titanium, hafnium, zirconium, aluminium and/or boron, and optionally c) at least one type of cation selected from cations of metals of subgroups 1 to 3 and 5 to 8, including lanthanides, and of main group 2 of the periodic table of the elements, and/or at least one corresponding compound, d) at least one organic compound selected from monomers, oligomers, polymers, copolymers and block copolymers, and/or e) at least one substance that influences the pH, as well as f) water, and g) optionally at least one organic solvent. The invention further relates to corresponding aqueous compositions.

Abstract: The invention relates to the use of polysilazanes as permanent coatings on metal surfaces for the prevention of the susceptibility to fingerprints, characterized in that the polysilazane is in the form of a solution of a polysilazane or a mixture of polysilazanes of the general formula 1 —(SiR?R?—NR??)n— ??(1) where R?, R?, R?? independently=H, optionally-substituted alkyl-, aryl, vinyl- or (trialkoxysilyl)alkyl, n=a whole number such that the polysilazane has a number-average molecular weight of from 150 to 150,000 g/mol in a solvent. The invention further relates to a method for production of the coating.

Abstract: The present invention relates to a film made from a cross-linked polysiloxane obtained by subjecting a polysiloxane that has a specific chemical structure and contains at least two unsaturated aliphatic hydrocarbon groups in one molecule and an organosilicon compound with at least two hydrogen atoms directly bonded to silicon atoms in one molecule to cross-linking reaction in the presence of a platinum-type catalyst. The film provided by the invention possesses superior heat-resistant properties, has excellent permeability for light in the visible wavelength range, is characterized by low birefringence, and demonstrates physical properties suitable for practical application. By forming an inorganic substance layer on the aforementioned polysiloxane, it is possible to use the laminated film of the invention, e.g., as a transparent electrode film.

Abstract: Metallic substrates having a deformable vitreous coating, obtainable by applying an alkali metal silicate-containing coating sol to the substrate and thermally densifying the layer thus obtained in a two-stage heat treatment process, the heat treatment being carried out, in the first stage, either (A) in an oxygen-containing atmosphere or (B) in a vacuum at a residual pressure of ?15 mbar and, in the second stage, in a low-oxygen atmosphere up to full densification with formation of a vitreous layer.

Abstract: A metal coated with a ceramic material and a method of manufacturing the same are provided. The method includes a) preparing a coating solution by dissolving a SiC precursor in a solvent; b) coating a metal material with the coating solution using a non-thermal coating technique; c) forming a SiC precursor coating layer on the metal material by drying the metal material coated with the coating solution in an oxygen-free atmosphere; d) partially removing a polymer by preprocessing the SiC precursor coating layer; and e) converting the SiC precursor coating layer into a SiC coating layer using a thermal treatment process. In this method, the SiC precursor is coated on the metal material and converted into the SiC coating layer, so that a pure SiC coating layer can be formed without causing cracking or delaminating. Thus, the metal material can have higher resistance to oxidation, chemicals, and heat.

Abstract: A bond coat system for silicon based substrates wherein a compliant layer having an elastic modulus of between 30 and 130 GPa is provided between the silicon based substrate and a silicon metal containing oxygen gettering layer.

Abstract: A patterned organic monolayer or multiplayer film self-assembled on a solid substrate, the pattern consisting in a site-defined surface chemical modification non-destructively inscribed in the organic monolayer or multilayer by means of an electrically biased conducting scanning probe device, stamping device and/or liquid metal or metal alloy or any other device that can touch the organic monolayer or multilayer surface and inscribe therein a chemical modification pattern upon application of an electrical bias.

Abstract: Interconnect structures possessing an organosilicate glass based material for 90 nm and beyond BEOL technologies in which a multilayer hardmask using a line-first approach are described. The interconnect structure of the invention achieves respective improved device/interconnect performance and affords a substantial dual damascene process window owing to the non-exposure of the OSG material to resist removal plasmas and because of the alternating inorganic/organic multilayer hardmask stack. The latter feature implies that for every inorganic layer that is being etched during a specific etch step, the corresponding pattern transfer layer in the field is organic and vice-versa.

Abstract: A sintering temperature can be lowered to 1,200° C. by adding from 15% by weight or more to 35% by weight or less of rutile-type titanium dioxide into forsterite. By carrying out sintering at such a low temperature, a sintered product can be obtained in which sintering was carried out while retaining the respective crystal phases of the forsterite and rutile-type titanium dioxide. Such a sintered product is an excellent high-frequency ceramic composition, wherein the high quality factor Q·f value derived from forsterite is hardly impaired, and, the absolute value of the temperature coefficient ?f is controlled to 30 ppm/° C. or less by rutile-type titanium dioxide.

Abstract: A coating and method for overcoating a TBC on a component used in a high-temperature environment, such as the combustor section of an industrial gas turbine. The coating defines the outermost surface of the component and is formed of at least two layers having different compositions. An inner layer of the coating contains alumina in a first silica-containing matrix material that is free of zinc titanate. An outer layer of the coating contains alumina, a glass material, and zinc titanate in a second silica-containing matrix material. The outer layer of the coating has a surface roughness of not greater than three micrometers Ra and forms the outermost surface of the component. The coating reduces the component temperature by reducing the convective and radiant heat transfer thereto.

Abstract: By performing epitaxial growth on a semiconductor substrate while keeping conformity, a membrane multi-layer structure showing increased polarization is provided. A membrane multi-layer structure comprising a thin layer composed of zirconium oxide as the main component for allowing epitaxial growth, a thin layer having a simple perovskite structure, showing in-plane rotation by 45° of the (001) plane to the thin layer composed of zirconium oxide as the main component and performing epitaxial growth, and an intermediate layer provided between the thin layer composed of zirconium oxide as the main component and the thin layer having a simple perovskite structure.

Abstract: Coatings are provided in which surfaces may be activated by covalently bonding a silane derivative to the metal surface, covalently bonding a lactone polymer to the silane derivative by in situ ring opening polymerization, and depositing at least one layer of a polyester on the bonded lactone. Biologically active agents may be deposited with the polyester layers. Such coated surfaces may be useful in medical devices, in particular stents.

Abstract: An adhesive composition is provided comprising (A) a polyimide resin containing a diorganopolysiloxane linkage having vinyl groups as organic substituent groups on the backbone, (B) an epoxy resin, and (C) an epoxy resin-curing catalyst. An adhesive film prepared from the adhesive composition has a high bond strength to various substrates and to encapsulating resins when thermocompression bonded and heat cured thereto, and possesses a low modulus of elasticity and high heat resistance, ensuring manufacture of resin packaged semiconductor devices with high reliability.

Abstract: The present invention provides an apparatus and method for use in processing semiconductor workpieces. The new apparatus and method allows for the production of thinner workpieces that at the same time remain strong. Particularly, a chuck is provided that includes a body, a retainer removeably attached to the body and a seal forming member. When a workpiece is placed on the chuck body and the retainer is engaged to the body, a peripheral portion of the back side of the workpiece is covered by the retainer while an interior region of the back side of the workpiece is exposed. The exposed back side of the workpiece is then subjected to a wet chemical etching process to thin the workpiece and form a relatively thick rim comprised of semiconductor material at the periphery of the workpiece. The thick rim or hoop imparts strength to the otherwise fragile, thinned semiconductor workpiece.

Abstract: A fabricating method for a ceramic substrate includes the steps of: providing a ceramic thin plate and a pre-mold plate; stacking the ceramic thin plate and the pre-mold plate together; and sintering the ceramic thin plate and the pre-mold plate, both of which jointly form the ceramic substrate. Also, a ceramic substrate composed of a ceramic thin plate and a pre-mold plate is disclosed. The ceramic substrate is an LTCC substrate, and the pre-mold plate is formed by mixing a ceramic material and an inorganic adhesive including crystallized or non-crystallized glass or a glass ceramic, or the inorganic adhesive has properties of a worse chemical activity than other materials, a sintering temperature lower than that of the ceramic material, and being in a liquid phase during a sintering process.

Abstract: A toner fuser member contains a substrate on which is disposed a toner release surface layer formed from a composition that includes a silsesquioxane and a curable phenolic resin. On curing, the composition forms an interpenetrating polymer network of the silsesquioxane and phenolic resin.

Abstract: An indium-containing wafer from which removal of mercury can be reliably performed and a method of manufacturing such a wafer are provided in order to make the mercury C-V method, allowing characteristics of a the indium-containing wafer to be measured with high precision and being a non-destructive test, viable. An indium-containing wafer relating to the present invention is characterized by having, formed on its episurface layer, an added-on mercury-removal layer directed to removing wafer-surface adherent mercury and composed of a compound semiconductor. In addition, a method of manufacturing an indium-containing wafer relating to the present invention is characterized in that after evaluating electrical characteristics of the wafer with, as an electrode, mercury adhered onto the surface of the mercury-removal layer, the superficially adhered mercury is eliminated by removing the mercury-removal layer.

Abstract: The invention relates to a heating device (1) comprising a metallic substrate (2) whose at least one part is coated with a self-cleaning coating. The inventive coating consists of an external layer (4) contacting ambient air and comprising at least one type of oxidation catalyst selected from platinoid oxides, at least one internal layer (3) which is arranged between the metallic substrate and the external layer and comprises at least one type of oxidation catalyst selected from transition elements oxides of 1b group. The inventive heating device can be embodied, for instance in the form of an iron soleplate consisting of a heating base (6) provided with heating elements (7) or a cooking appliance. Said metallic substrate can be covered with an intermediary enamel layer (5). A method for coating the metallic substrate of a heating device with said coating is also disclosed.

Abstract: Applying liquid for hard coating that is made of organic silane compounds, the fine particles of composite mainly based on titanium-oxide, which also includes zirconium-oxide and silicon-oxide etc., dicyandiamide, itaconic acid, and Co(II) acetylacetonate compound on plastic lenses in order to form a hard coating layer after hardening.

Abstract: A timepiece dial having a base member made primarily of polycarbonate, a silicon compound layer made primarily of a silicon oxide compound, and a zinc sulfide compound layer made primarily of a zinc sulfide compound and rendered on the opposite side of the silicon compound layer as the side facing the base member.

Abstract: A metal film according to the present invention has a cubic crystal structure having a periodic pattern of crystal orientation in a plane. The crystal orientation is gradually rotated about a particular crystal-axis direction such that a {100} plane, a {110} plane, and a {111} plane appear.

Abstract: A reflective article useful, for example, in automotive headlights includes a substrate, a reflective metal layer, and a haze-prevention layer between the substrate and the reflective metal layer. The substrate includes an amorphous thermoplastic resin having a heat distortion temperature of at least about 140° C., a density less than 1.7 grams per milliliter, and an organic volatiles content less than 1,000 parts per million measured according to ASTM D4526. The haze-prevention layer includes a material having a volume resistivity of at least 1×10?4 ohm-centimeters and a tensile modulus of at least about 3×105 pounds per square inch. The article resists hazing of the reflective layer at elevated temperatures.

Abstract: A coating system for reducing the tendency for hydrocarbon fluids, such as fuels and oils, to form carbonaceous deposits that adhere to fluid containment surfaces. The coating system combines an outermost layer of platinum with an inner ceramic barrier layer of silica and/or tantala. The platinum layer catalyzes the hydrocarbon fluid to form particles of carbonaceous gum substances, and the ceramic barrier layer seals the containment surface from the hydrocarbon fluid to eliminate attachments points for deposits and inhibit interdiffusion between the platinum layer and the containment surface. The invention also encompasses a coating apparatus and process for depositing the coating system.

Abstract: A radical-enhanced atomic layer deposition (REALD) system and method involves moving a substrate along a circulating or reciprocating transport path between zones that provide alternating exposure to a precursor gas and a gaseous radical species. The radical species may be generated in-situ within a reaction chamber by an excitation source such as plasma generator or ultraviolet radiation (UV), for example. The gaseous radical species is maintained in a radicals zone within the reaction chamber while a precursor gas is introduced into a precursor zone. The precursor zone is spaced apart from the radicals zone to define a radical deactivation zone therebetween. Purge gas flowing through the various zones may provide flow and pressure conditions that substantially prevent the precursor gas from flowing into the radicals zone. In some embodiments, the system includes a partition having one or more flow-restricting passageways though which the substrate is transported.

Abstract: Affords a method of storing GaN substrates from which semiconductor devices of favorable properties can be manufactured, the stored substrates, and semiconductor devices and methods of manufacturing the semiconductor devices. In the GaN substrate storing method, a GaN substrate (1) is stored in an atmosphere having an oxygen concentration of 18 vol. % or less, and/or a water-vapor concentration of 12 g/m3 or less. Surface roughness Ra of a first principal face on, and roughness Ra of a second principal face on, the GaN substrate stored by the storing method are brought to no more than 20 nm and to no more than 20 ?m, respectively. In addition, the GaN substrates are rendered such that the principal faces form an off-axis angle with the (0001) plane of from 0.05° to 2° in the <1 100> direction, and from 0° to 1° in the <11 20> direction.

Abstract: In a method for fabricating a nitride-based semiconductor laser which forms, by a selective deposition, a current narrowing structure and a structure confining a light in a horizontal direction in parallel to a substrate, when the nitride-based semiconductor is selectively deposited by a metal organic chemical vapor deposition, silicon generated by decomposition of the silicon oxide film used as the mask for the selective deposition is prevented from being deposited on a re-growth boundary. For this purpose, a silicon nitride film is used as the mask for the selective deposition, and when the nitride-based semiconductor is selectively deposited by the metal organic chemical vapor deposition, a V-group material of the nitride-based semiconductor, namely, a nitrogen material, for example, ammonia, is supplied so that the decomposition of the silicon nitride film used as the mask for the selective deposition, is prevented.

Abstract: Disclosed herein are polysiloxane/polyimide block copolymer blends and the application of these blends in conductive wires.

Abstract: A primer for vulcanization bonding, which comprises a copolymerization copolymer of amino group-containing alkoxysilane and vinyl group-containing alkoxysilane, and an organometallic compound, can give a metal-rubber composite having a water-resistant adhesiveness equivalent or superior to that of coating type chromate processing agent, without application of harmful coating type chromate processing to a metal, and thus can be effectively used in surface treatment of metals such as stainless steel, etc. for the production of seal products of rubber-bonded metal (e.g. oil seals, packings and gaskets), valves, vibration-controlled or vibration damped products (e.g. vibration-controlled steel sheets and vibration-damped rubber), industrial rubber products, etc.

Abstract: A thermal interface material is described for thermal coupling of an electronic component to a thermally conductive member. The thermal interface material includes a viscoelastic polymer matrix material, fusible solder particles in the matrix material, and filler particles in the matrix material. The solder particles have a melting temperature below a selected temperature (e.g. 157° C. for indium) and the filler particles have a melting temperature substantially above the selected temperature (e.g. 961° C. for silver). The filler particles keep the thermal interface material intact under adverse thermal and stress conditions.

Abstract: A coating system and method for reducing the tendency for hydrocarbon fluids, such as fuels and oils, to form carbonaceous deposits that adhere to a wall of a containment article. Of particular concern are carbonaceous deposits that form at temperatures below about 650° F. (about 345° C.). The coating system combines an outermost layer of platinum with a ceramic barrier layer. The coating system significantly reduces the formation of carbonaceous deposits and the adhesion of such deposits. To further reduce wall and hydrocarbon fluid temperatures and formation of carbonaceous deposits, the coating system is preferably applied to the surface of the wall wetted by the fluid, as well as the opposite surface of the wall exposed to a surrounding environment. The outermost layers serve as radiation shields to reduce heat transfer from the surrounding environment to the wall, and from the wall to the hydrocarbon fluid.

Abstract: A protective coating composition comprising a silicate, such as an organosilicate, an organosilicate polymer and colloidal silica and an organic titanate, preferably a titanate chelate or a titanate ester in a suitable organic solvent. The composition is free from metal particles.

Abstract: The present invention provides a method of manufacturing Group III nitride crystals that are of high quality, are manufactured highly efficiently, and are useful and usable as a substrate that is used in semiconductor manufacturing processes.

Abstract: A ferroelectric film wherein 5 to 40 mol % in total of at least one of Nb, V, and W is included in the B site of a Pb(Zr,Ti)O3 ferroelectric which includes at least four-fold coordinated Si4+ or Ge4+ in the A site ion of a ferroelectric perovskite material in an amount of 1% or more. This enables to significantly improve reliability of the ferroelectric film.

Abstract: The use of a heat-stabilized, heat-set oriented film comprising poly(ethylene naphthalate) as a substrate in, or in the manufacture of, an electronic or opto-electronic device containing a conjugated conductive polymer, wherein said film has a shrinkage at 30 mins at 230° C. of less than 1%; and a composite film comprising such a substrate layer and on a surface thereof a barrier layer.