Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.

Abstract: As a display device has a higher definition, the number of pixels, gate lines, and signal lines are increased. When the number of the gate lines and the signal lines are increased, there occurs a problem that it is difficult to mount an IC chip including a driver circuit for driving the gate and signal lines by bonding or the like, whereby manufacturing cost is increased. A pixel portion and a driver circuit for driving the pixel portion are provided over the same substrate, and at least part of the driver circuit includes a thin film transistor using an oxide semiconductor interposed between gate electrodes provided above and below the oxide semiconductor. Therefore, when the pixel portion and the driver circuit are provided over the same substrate, manufacturing cost can be reduced.

Abstract: A photosensitive thick film composition is provided which has superior storage stabilities and can be reliably processed by developing. The photosensitive thick film composition is composed of a photosensitive organic component containing an organic binder having an acidic functional group, such as a carboxyl group, an inorganic component containing a polyvalent metal oxide, such as borosilicate glass, and an alcohol having a plurality of hydroxyl group, such as glucitol.

Abstract: The polybenzoxazole and polybenzothiazole precursors of the invention have the following partial structure: ##STR1## where: A.sup.1 to A.sup.6 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.3 CF.sub.3 ;T is O or S, and m is 1;Z is a carbocyclic or heterocyclic aromatic radical.

Abstract: The polybenzoxazole and polybenzothiazole precursors of the invention have the following partial structure: ##STR1## where: A.sup.1 to A.sup.7 are--independently of one another--H, F, CH.sub.3, CF.sub.3, OCH.sub.3, OCF.sub.3, CH.sub.2 CH.sub.3, CF.sub.2 CF.sub.3, OCH.sub.2 CH.sub.3 or OCF.sub.2 CF.sub.3 ;T is O or S, and m is 1;Z is a carbocyclic or heterocyclic aromatic radical.

Abstract: Photoimageable polyquinoline compositions comprise a polyquinoline polymer, a diazonaphthoquinone and optionally a photosensitizer. The composition is prepared by dissolving the polyquinoline polymer, diazonaphthoquinone and photosensitizer in a solvent to form a solution, coating the solution onto a substrate and thereafter removing the solvent to form a film. The film is exposed to light through a photomask and developed by immersion in a selective solvent to yield a photopatterned dielectric film.

Abstract: A method for forming resist patterns comprising coating a resist comprising a polymeric or copolymeric compound having a repeating unit comprising a protected alkali-soluble group in which the protecting group is cleaved with an acid so that the compound is made alkali-soluble, and an acid generator capable of generating an acid upon the radiation exposure to a substrate to be fabricated, then pre-baking the formed resist film, successively selectively exposing the resist film, thereafter, developing a latent image with a developer containing an aqueous or alcoholic solution of a specified ammonium compound or morpholine compound. According to this method, crack formation and peeling of a pattern can be suppressed at the time of forming resist patterns.

Abstract: A blueprint developing solution and process for developing blueprints, wherein the ammonia odor in the blueprints is reduced without eliminating the odor of the developing solution, comprising the incorporation of an effective amount of sodium chlorite in the developing solution or the addition of the vapor products of an aqueous sodium chlorite solution to the developing chamber of a blueprint developing machine.

Abstract: There are disclosed an aqueous alkaline developer for light-sensitive lithographic printing plate commonly processing a negative-type light-sensitive lithographic printing plate having a light-sensitive layer containing a diazo compound and a positive-type light-sensitive lithographic printing plate having a light-sensitive layer containing an o-quinonediazide compound, which comprises containing an alkali agent, 0.1 to 10% by weight of a water-soluble reducing agent, a sodium, potassium or ammonium salt of an organic carboxylic acid, and a non-ionic or cationic surfactant, and having a pH in the range of 12.5 to 13.5, and also a developer composition for light-sensitive material, which comprises an aqueous solution containing a compound represented by the formula (I) shown below: ##STR1## wherein R.sub.1 represents an alkyl group or an alkoxy group each having 2 to 5 carbon atoms, or a hydroxyalkyl group having 2 to 5 carbon atoms; and R.sub.

Abstract: The invention provides a positive working photosensitive element with improved odor and increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a solvent mixture comprising propylene glycol alkyl ether and propylene glycol alkyl ether acetate, onto a substrate, drying, exposing to imaging energy and developing.

Abstract: The invention provides a mixture suitable for treating a photographic composition which comprises from about 1 to about 10 parts by weight of a propylene glycol alkyl ether and from about 1 to about 10 parts by weight of a propylene glycol alkyl ether acetate.

Abstract: A photographic element formed from a substrate and light sensitive coating on the substrate wherein the coating comprises a mixture of a diazo compound and an aromatic carboxylic coupling agent having phenolic hydroxy groups, in an acidic medium.

Abstract: The aqueous developer solution for a positive-working photoresist composition comprises, as dissolved in an aqueous solvent, a water-soluble organic basic compound and a specific non-ionic surface active agent which may be an alkyl-substituted phenyl or naphthyl ether of polyoxyethyleneglycol in a specified concentration. The developer solution is advantageous in respect of the completeness of removal of film residua and scums from the substrate surface after development so that the patterned photoresist layer is imparted with greatly increased accuracy and fidelity of the pattern reproduction.

Abstract: The invention provides a composition which comprises from about 3 to about 50% by weight of a hexa-alkyl disilazane and a solvent composition which comprises one or more compounds selected from the group consisting of a propylene glycol alkyl ether and a propylene glycol alkyl ether acetate.

Abstract: The invention provides a method for developing negative working photographic elements using an aqueous developer comprising(a) a solvent composition consisting essentially of(i) n-propanol or isopropanol; and(ii) a glycol ether or acetate(b) a salt which is preferably magnesium sulfate; and(c) an ethoxylated alkyl phenol type non-ionic surfactant.

Abstract: A developer for positive photoresists which can improve the sensitivity and resolution of the resist is disclosed. The developer comprises an aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, and at least one development modifier selected from the group consisting of water-soluble aliphatic ketones, cyclic ethers, and tertiary amines, and optionally, at least one another development modifier selected from the group consisting of water-soluble primary amines and secondary amines.

Abstract: Disclosed is an aqueous developing solution containing a quaternary ammonium hydroxide developing agent, and as an additive an effective amount of a select compound which is either 1,3,5-trihydroxy benzene, 4-methylesculetin or a novolak-type resin. The aqueous developing solution is particularly useful in developing an imagewise-exposed layer of a positive-working photoresist composition containing a novolak-type resin and a photosensitive agent. In such application, it has been found that the developing solution more effectively removes the exposed portions of the photoresist composition without leaving a residue of exposed photoresist composition at the interface of the edges of the unexposed portions of the photoresist composition and the oxidized silicon substrate.

Abstract: A novel low metal ion developer composition used in a two step process which provided high contrast images and long developer bath life is provided. The process gives high contrast images. The substrate coated with positive photoresist is exposed then immersed in a "predip" bath, rinsed, and then, immersed in the developer bath, rinsed and dried. This process provided high contrast which does not decrease over the life of the developer system. The system consists of (1) a predip solution containing aqueous non-metal ion organic base and a cationic surfactant adjusted to a concentration that does not give development, and (2) a developer solution containing an aqueous solution of an non-metal ion organic base and a fluorochemical surfactant adjusted to a concentration that provides development. The high contrast is achieved by the cationic surfactant coating the resist and inhibiting the attack on the unexposed resist by the developer while permitting the developer to dissolve away the exposed resist.

Abstract: The invention provides a composition which comprises from about 3 to about 50% by weight of a hexa-alkyl disilazane and a solvent composition which comprises one or more compounds selected from the group consisting of a propylene glycol alkyl ether and a propylene glycol alkyl ether acetate.

Abstract: A method of producing a light sensitive element wherein a substrate is coated with a photosensitive layer having a particular class of diazonium salts, a colorant and a polyvinyl acetal resin. Upon imagewise exposure it is developed with an aqueous composition of salts and surfactants in the absence of organic solvents.

Abstract: The invention provides an aqueous alkaline developer solution for a positive-type photoresist layer for pattern-wise treatment of the surface of a substrate, e.g., semiconductor wafer. The developer solution contains a tetraalkyl ammonium hydroxide, e.g., tetramethyl ammonium hydroxide, and a trialkyl hydroxyalkyl ammonium hydroxide, e.g., trimethyl hydroxyethyl ammonium hydroxide, as the essential ingredients and the temperature dependency of the development performance thereof is noticeably smaller than that of conventional developer solutions with respect to properties of the sensitivity of the photoresist and the thickness reduction of the photoresist layer in the unexposed areas, by virtue of the compensating temperature dependencies for these properties of these two ingredients for each other.

Abstract: Disclosed is a developer composition for exposed, light-sensitive, negative-working reproduction layers, which may contain an organic binder, comprising water and a salt of a substituted aromatic carboxylic acid, in particular, from about 5 to 60% by weight of at least one salt of an aromatic carboxylic acid having substituents which are immediately adjacent to the carboxyl group and represent an amino group, a hydroxyl group, and/or chlorine or bromine. Also disclosed is a process for developing the reproduction layers utilizing the disclosed developers, wherein the reproduction layer contains, in particular, a polymeric organic binder with an acetal, anhydride, amide and/or a carboxyl group.

Abstract: A developer is provided for lithographic plates or the like having a layer including a diazonium material, which developer enhances the effectiveness of the photolysis to which the plate had been subjected, with the result that the exposure time needed for the plate is substantially reduced. The developer, which thus enhances the apparent photospeed of the plate, includes an insolubilizing reactant that reacts with diazonium groups of diazonium materials on the plate that were not removed by photolysis during exposure in order to decrease the solubility of the diazonium material.

Abstract: A water-soluble, positive-working photoresist composition is disclosed which comprises water-soluble aromatic diazonium salt, water-soluble phenolic compound, and water-soluble polymeric compound. When the film of this composition is irradiated with a pattern of actinic ray and then brought into contact with an alkaline gas or solution, the coating of unexposed areas hardens to become water-insoluble. Preferably, when the film is brought into contact with a suspension of powder or dry powder after being hardened, a positive pattern of powder is obtained by the development with water.

Abstract: A developer for a light-sensitive lithographic printing plate having an o-quinonediazide-containing light-sensitive layer is disclosed. The developer is comprised of an aqueous solution of an alkali silicate containing an organic boron compound. The organic boron compound is represented by the formula ##STR1## the substituents are defined within the specification. By utilizing the developer of the invention it is possible to provide excellent developing power, development stability, processability and preferred forming properties during development.

Abstract: Zinc salts of sulfonic acids are described as stabilizers for diazotype materials.

Abstract: Diazotype material having enhanced water-wet properties and especially suitable when imaged for being drawn or written upon, and for use as an intermediate original, is made of a support such as a transparent polymeric film carrying on one of its sides a light sensitive diazo layer formed of a dispersion of a light sensitive diazonium compound and a large amount of amorphous hydrated silica particles having a bound water content of at least 50% by weight in a polymeric binder consisting essentially of a 20 to 45% hydrolyzed polyvinyl acetate which preferably is a product of partial hydrolysis of a PVAC having in ethyl acetate at 20.degree. C. a Heoppler viscosity of 100 to 800 mPa.s. The weight ratio of the hydrated silica to the partially hydrated PVAC in the layer typically is in the range of 2:3 to 3:2. The support advantageously carries on its other side a light-pervious drafting layer formed of a dispersion of a silica filler in a partially hydrolyzed PVAC the same as that required for the diazo layer.

Abstract: Phenylurethane compounds formed by the reaction between a phenolic coupler compound and an organic isocyanate compound are utilized to form phenolic coupler compounds in situ in order to react with chromogenic compounds present in the sensitive layer of recording or reproducing materials.The phenolic coupler compounds can also be stabilized by blocking the phenolic hydroxyl with carbonate, an alkyl ether, organosilylated ether or organophosphoric acid ester, some of which are novel compounds. These stabilized derivatives of the stabilized phenolic coupler compound will decompose by application to sufficient thermal energy or suitable liquid or gaseous fluid to form the phenolic coupler compound in situ. The phenolic coupler compound is formed in situ by applying thermal energy to the sensitive layer or by applying to the sensitive layer a liquid or gaseous fluid which is able to decompose the stabilized phenolic coupler compound and release the phenolic coupler compound.

Abstract: A positive-working photosensitive material and a process for developing the same are disclosed.The positive-working photosensitive material is obtained by forming on a base material a layer of a photosensitive composition containing (A), 100 weight parts of a resin binder including a vinylic polymer compound having phenolic hydroxyl groups and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group.The positive-working photosensitive material is developed by using an aqueous alkali solution.

Abstract: A single-phase, non-emulsion water containing subtractive developer for lithographic plates having photopolymer coatings is provided. These developers include water and an active or primary solvent which is only partially soluble in water and which is a good solvent for the photopolymer of a lithographic plate that has not been exposed to and insolubilized by actinic radiation, this active solvent typically being present at a concentration near its water solubility limit. Preferably, a cosolvent is also included to increase the water solubility of the active solvent when necessary. A desensitizer may be included to impart to the formulation the properties of a one-step developer or of a finisher. Formulation and development methods for these developers are also included, and they may be used either as developers or as a machine developer solution replenisher.

Abstract: A developer composition for positive photosensitive lithographic printing plates and photoresists comprising an aqueous solution of an inorganic lithium compound and sodium metasilicate.

Abstract: One component diazotype material is imagewise exposed and developed odorless and curlfree with 0.6-4.5 g/m.sup.2 per square meter of a substantially water free liquid developer in a pressure development or transfer roller apparatus.

Abstract: A light-sensitive nameplate material comprising an aluminum support having a porous aluminum oxide film on the surface thereof and a light-sensitive organic coating layer comprising an o-quinone diazide provided on the aluminum oxide film.

Abstract: A desensitizing solution and process for using the solution are disclosed to desensitize a diazo photosensitive printing plate after development. The solution comprises a water soluble desensitizing agent capable of reacting with any residual photosensitive diazo on the developed plate to render the diazo incapable of forming an oleophilic substance and a filming agent selected from water soluble aliphatic polyols have less than eight carbon units, the acid derived monoesters of these polyols, and the alkali metal salts of the monoesters.

Abstract: A two-component type diazo copying material according to this invention, which comprises a support and a photosensitive layer formed thereon, said layer consisting essentially of a diazo compound expressed by the following general formula I and a coupler mixture consisting of a compound expressed by the following formula II, a compound expressed by the following general formula III and a compound expressed by the following general formula IV, can form a genuine black-color image and is especially optimum for preparing a secondary original used in electrophotographic copying machines. General formula I ##STR1## (wherein R represents alkyl radical having 1 to 5 carbon atoms; R.sub.1 and R.sub.2 represent substituted or non-substituted alkyl radical, aralkyl radical or cycloalkyl radical, or R.sub.1 and R.sub.2 may form a heterocyclic ring together with the nitrogen atom to which they bond; and X represents anion.) ##STR2## (wherein X is of no account or represents O, S, SO or SO.sub.2.) ##STR3## [wherein R.sub.

Abstract: A photosensitive material and a process for developing the same are disclosed.The photosensitive material is obtained by forming on a base material a layer of photosensitive composition comprising (A), 100 weight parts of a water soluble resin binder containing at least 60 weight % of acrylamide-diacetoneacrylamide copolymer, the copolymerization ratio of acrylamide and diacetoneacrylamide being 8:2-5:5 and average polymerization degree being 300-1500, and (B), 5-20 weight parts of a water soluble diazonium salt.The photosensitive material is developed by using an aqueous alkali solution.

Abstract: A composition and process for developing diazotype material utilizes a developing liquid comprising a buffered, aqueous solution of an azo-coupling component having a pH between 5.5 and 8 and, as an additive compound, sorbic acid, an alkali metal salt, ammonium salt, or magnesium salt of sorbic acid or mixtures of the same. The process produces a clear copy image more quickly than a process in which the developing liquid does not contain the additive compound and, when the azo-coupling component is a mixture of phloroglucinol and resorcinol, forms a neutrally black image. The additive compound is added in an amount of 10 to 80%, and preferably 30 to 60%, by weight, of the maximum amount soluble in the solution at room temperature.

Abstract: Diazotype material having a thin light-sensitive layer that is developable excellently by a limited application (1.5 to 4.5 cm.sup.3 /m.sup.2) of a buffered aqueous solution of an azo component, and which adheres well to the support even in moist condition, can be obtained by providing on a paper support a light-sensitive layer containing a binder and filler with at least one diazo compound, when the binder comprises a condensation product of an amino compound with formaldehyde, e.g. cross-linked hexamethoxymethyl-melamine, and a hydrophilic polymer crosslinkable with said product, e.g. highly hydrolyzed polyvinyl alcohol, and the filler comprises starch particles, e.g. rice starch powder, in a weight proportion to said polymer of at least 5 to 1, and even as high as 30-70 to 1. A water-sealing layer on both sides of the support, or only on a side beneath the light-sensitive layer, renders the material curl resistant.

Abstract: Benzene diazonium compounds of the general formula ##STR1## wherein R.sub.1 is alkylamino, dialkylamino, cycloalkylamino, dicycloalkylamino, cycloalkylalkylamino, aralkylamino, diaralkylamino, alkylaralkylamino, cycloalkylaralkylamino, arylamino, diarylamino, alkylarylamino, cycloalkylarylamino, acoylamino, acoylalkylamino, acoylcycloalkylamino, acoylaralkylamino, acoylarylamino, aroylamino, aroylalkylamino, aroylcycloalkylamino, aroylaralkylamino, aroylarylamino, morpholino, piperidino, triazinyl, alkylthio, hydroxyalkylthio, cycloalkylthio, aralkylthio, or arylthio; R.sub.2 is alkyl, aralkyl, aryl, or alkoxyalkyl; R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 may be the same or different and are hydrogen, alkyl, cycloalkyl, aralkyl, aryl, or halogen, at least one of the substituents R.sub.3 to R.sub.8 not being hydrogen; and X is an anion.

Abstract: A light-sensitive copying layer containing an o-quinone-diazide compound and at least one of a secondary amine and a tertiary amine.