Diazo Reproduction, Process, Composition, Or Product Patents (Class 430/141)
  • Patent number: 9645504
    Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.
    Type: Grant
    Filed: March 9, 2012
    Date of Patent: May 9, 2017
    Assignee: METAMATERIAL TECHNOLOGIES USA, INC.
    Inventor: Boris Kobrin
  • Patent number: 9618788
    Abstract: An optical film, containing a cellulose acylate, and at least one compound represented by any of formulas (I) to (III): wherein, in formulas (I) to (III), R1 and R2 each independently represent a halogen atom, an alkyl, cycloalkyl, alkenyl, aryl, hydroxy, hydroxyamino, amino, alkylamino, arylamino, alkoxy, aryloxy, alkylthio, or arylthio group (however, R1 and R2 do not represent an amino, alkylamino, or arylamino group at the same time); R3 to R6 each independently represent a hydrogen atom, an alkyl, cycloalkyl, alkenyl, aryl, acyl, alkyl- or aryl-sulfonyl, alkyl- or aryl-sulfinyl, carbamoyl, sulfamoyl, alkoxycarbonyl, or aryloxycarbonyl group; R7 represents an alkyl, cycloalkyl, alkenyl, aryl, alkylamino, arylamino, alkoxy, aryloxy, or heterocyclic group; R8 represents an alkyl, cycloalkyl, alkenyl, aryl, or heterocyclic group; and R1 to R8 each may be further substituted with a substituent; and a polarizing plate and a liquid crystal display.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: April 11, 2017
    Assignee: FUJIFILM CORPORATION
    Inventors: Yu Naito, Nobutaka Fukagawa, Aiko Yoshida, Hideyuki Nishikawa, Masaki Noro
  • Patent number: 9296870
    Abstract: Methods for functionalizing a surface of a substrate with nanoparticles are described. In certain embodiments, the method can include attaching a plurality of photoactive linker to nanoparticles to obtain photoactive nanoparticles, wherein each photoactive linker comprises a binding group that attaches to the nanoparticles and a photoactive group; depositing the photoactive nanoparticles to the surface of the substrate, wherein the surface of the substrate comprises reactive groups that are capable of reacting with the photoactive groups; and irradiating the photoactive nanoparticles with radiation to react the photoactive group with the reactive group and to functionalize the surface of the substrate with nanoparticles.
    Type: Grant
    Filed: July 27, 2010
    Date of Patent: March 29, 2016
    Assignee: The Trustees of Columbia University in the City of New York
    Inventors: Ellane J. Park, Nicholas J. Turro, Jeffrey T. Koberstein
  • Patent number: 8504427
    Abstract: Methods of, and systems for, multi-lingual two-sided printing are provided. According to one embodiment, a method of multi-lingual two-sided printing is provided, the method comprising: initiating a transaction; identifying a first language for printing on a first side of two-sided media and a second language for printing on a second side of the two-sided media based on one or more aspects of the transaction; printing information on the first side of the two-sided media in the first language; and printing information on the second side of the two-sided media in the second language, wherein the first language is different from the second language. Variations including the printing of transaction information on a first side of two-side media and additional information on a second side of the two-sided media when an identified first language is not different from an identified second language are also disclosed.
    Type: Grant
    Filed: September 28, 2007
    Date of Patent: August 6, 2013
    Assignee: NCR Corporation
    Inventors: Mark D. Quinlan, Charles Q. Maney
  • Publication number: 20070218398
    Abstract: Provided are a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern through fewer steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent comprising a 1,2-naphthoquinone-2-diazido-5-sulfonyl group or a 1,2-naphthoquinone-2-diazido-4-sulfonyl. group.
    Type: Application
    Filed: February 14, 2007
    Publication date: September 20, 2007
    Applicant: Canon Kabushiki Kaisha
    Inventors: Toshiki Ito, Natsuhiko Mizutani, Takako Yamaguchi, Yasuhisa Inao
  • Publication number: 20070172753
    Abstract: A positive photosensitive resin composition, which contains a polybenzoxazole precursor, a quinonediazide photosensitizer and a carbonate solvent, and a method of manufacturing a semiconductor device using the composition.
    Type: Application
    Filed: January 22, 2007
    Publication date: July 26, 2007
    Applicant: FUJIFILM Corporation
    Inventors: Kenichiro Sato, Tsukasa Yamanaka
  • Patent number: 7247420
    Abstract: The invention concerns a lift-off process for patterning layers that are deposited and/or sputtered. The invention provides a two-layer resist and a patterning method using the resist. The patterning method can readily produce burr-free layers on a substrate. The method comprises the steps of: sequentially applying positive radiation-sensitive resin compositions 1 and 2 to form a two-layer laminate; subjecting the two-layer resist to single exposure and development to produce fine patterns having an undercut cross section; depositing and/or sputtering an organic or inorganic thin layer with use of the resist pattern as a mask; and lifting off the resist pattern to leave a pattern of the thin layer in desired shape.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: July 24, 2007
    Assignee: JSR Corporation
    Inventors: Masaru Ohta, Atsushi Ito, Isamu Mochizuki, Katsumi Inomata, Shin-ichiro Iwanaga
  • Patent number: 7026497
    Abstract: An adhesive compound for use during the formation of a photoresist film represented by the following chemical formula, wherein R represents a photoacid generator is disclosed.
    Type: Grant
    Filed: January 12, 2005
    Date of Patent: April 11, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin-A Ryu, Boo-Deuk Kim, Kyoung-Mi Kim, Young-Ho Kim
  • Publication number: 20040253541
    Abstract: The present invention relates to a photoresist composition having high heat resistance used in the production process of an LCD, and more particularly, to a photoresist composition having high heat resistance, capable of decreasing process tact (a way), of process simplification, and of the retrenchment of expenditures. The inventive composition facilitates this through making it possible to skip 5 processes, such as Cr metal deposition forming a metal film, and the photo/etch/PR strip/etch steps of the whole surface of the metal, by substituting the inventive composition for the usual metal film, such that N+ ion doping in production of a TFT-LCD can take place due its high heat resistance.
    Type: Application
    Filed: April 19, 2004
    Publication date: December 16, 2004
    Inventors: Dong-Ki Lee, Sung-Chul Kang, You-Kyoung Lee, Jin-Ho Ju
  • Publication number: 20040234885
    Abstract: Resist compositions comprising nitrogen heterocyclic compounds having a pyrrole or nitrogen-bearing 5-membered ring structure and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light.
    Type: Application
    Filed: May 20, 2004
    Publication date: November 25, 2004
    Inventors: Takeru Watanabe, Jun Hatakeyama
  • Publication number: 20040234884
    Abstract: Resist compositions comprising basic compounds having an imidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light.
    Type: Application
    Filed: May 20, 2004
    Publication date: November 25, 2004
    Inventors: Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa
  • Publication number: 20040202953
    Abstract: Novel compositions comprising photoactive polymers comprising a dinitrobenzyl group in conjunction with a photoacid generator are disclosed. In one embodiment, the photoacid generator is a diazide and/or a sulfonyl aceto carbonyl compound. The photoacid generators are typically used in amounts of 10 weight percent or less. The compositions find particular application in storage stable, pH stable, and water stable positive photoresist compositions. Such compositions demonstrate reduced process time as compared with similar compositions lacking the photoacid generator. Methods for using these compositions are also disclosed.
    Type: Application
    Filed: April 11, 2003
    Publication date: October 14, 2004
    Inventors: James E. Jones, Randal L. Campbell, David A. Diehl, Ljiljana Maksimovic, Ronald R. Ambrose, Gerald W. Gruber
  • Publication number: 20040157149
    Abstract: The invention relates to an object, such as a sensor or a microcavity with an uncharged, functionalized hydrogel surface, comprising a hydrogel, which has hydroxy groups to which organic molecules are bound. The molecules used have one or more radicals &Lgr; and one or more radicals B. Radical &Lgr; reacts with the hydroxy groups of the hydrogel when binding the organic molecule. Radical B is selected such that, after the organic molecule binds to the hydrogel, it reacts with a biomolecule having amino groups or thio groups without the use of one or more activation reagents. The invention also relates to a method for producing the inventive object and to novel organic molecules for binding biomolecules to a hydrogel.
    Type: Application
    Filed: March 24, 2004
    Publication date: August 12, 2004
    Inventor: Andreas Hofmann
  • Publication number: 20040131963
    Abstract: The invention concerns a lift-off process for patterning layers that are deposited and/or sputtered. The invention provides a two-layer resist and a patterning method using the resist. The patterning method can readily produce burr-free layers on a substrate.
    Type: Application
    Filed: October 27, 2003
    Publication date: July 8, 2004
    Inventors: Masaru Ohta, Atsushi Ito, Isamu Mochizuki, Katsumi Inomata, Shin-ichiro Iwanaga
  • Publication number: 20030203313
    Abstract: The present invention provides a planographic printing plate precursor comprising a substrate and a negative image recording layer provided on the substrate containing: a compound that generates a radical or an acid by light or heat; a polymerizable compound or a crosslinking compound; and an infrared ray absorbing agent, wherein a dynamic friction coefficient of the outermost surface of the planographic printing plate precursor, at the side of the negative image recording layer being provided toward an inserting paper inserted into between the planographic printing plate precursors when the planographic printing plate precursors are laminated, is within a range from 0.2 to 0.7, as well as a planographic printing plate precursor laminate comprising the pluralty of the planographic printing plate precursors and inserting paper.
    Type: Application
    Filed: March 28, 2003
    Publication date: October 30, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Takahiro Goto
  • Publication number: 20030190555
    Abstract: An image forming method using a negative type image forming material is disclosed, and said method comprises the steps of exposing a negative type image forming material to infrared laser imagewise, which image forming material comprises a substrate and an image recording layer formed thereon, comprising (A) a radical generator, (B) a radical-polymerizable compound, (C) an infrared absorbing agent, and (D) a binder polymer; and developing the image forming material with an alkaline developing solution comprising a weak acid or a salt thereof having a dissociation constant pka of from 10 to 13.
    Type: Application
    Filed: March 21, 2003
    Publication date: October 9, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Hiroyuki Nagase
  • Patent number: 6582943
    Abstract: The present invention relates to a method for producing 2-hydroxyisobutyric acid where acetone cyanohydrin is converted to 2-hydroxyisobutyric acid using an enzyme catalyst having nitrilase activity, or having a combination of nitrile hydratase and amidase activities. The invention also encompasses production of methacrylic acid wherein the 2-hydroxyisobutyric acid produced with the catalyst described is dehydrated to produce methacrylic acid.
    Type: Grant
    Filed: February 5, 2002
    Date of Patent: June 24, 2003
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Sarita Chauhan, Robert DiCosimo, Robert Fallon, John Gavagan, Leo Ernest Manzer, Mark S. Payne
  • Patent number: 6566040
    Abstract: First, a hole pattern or a separation pattern of a first resist that is capable of supplying acid is formed on a semiconductor substrate. Then, a crosslinked film (organic frame) is formed on the side wall of the first resist pattern to obtain a resist pattern having a reduced hole diameter or separation width. Then, the hole diameter or the separation width is further reduced by causing thermal reflow of the crosslinked film. Finally, the semiconductor substrate is etched by using a resulting resist pattern as a mask.
    Type: Grant
    Filed: January 20, 1999
    Date of Patent: May 20, 2003
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Ryoden Semiconductor System Engineering Corporation
    Inventors: Kanji Sugino, Takeo Ishibashi, Takayuki Shoya
  • Patent number: 6015621
    Abstract: An ultraviolet-sensitive dosimeter material comprises at least one diazonium compound featuring absorption in the ultraviolet wavelength range, and a binder. The diazonium compound is preferably formed by a diazonium salt of the general formula ##STR1## in which R.sub.1, R.sub.2, R.sub.3 and X.sup.- are selected from the following groups:R.sub.1 : H, halogen, alkyl with C.sub.1 -C.sub.5, alkoxy with C.sub.1 -C.sub.5, aryloxy,R.sub.2 : H, halogen, alkyl with C.sub.1 -C.sub.5, alkoxy with C.sub.1 -C.sub.5, aryloxy,NR'R" (R', R" same or differing alkyl compounds or heterocyclic armines, or COOR.sub.4 (R.sub.4 alkyl with C.sub.1 -C.sub.5), andR.sub.3 : H, alkoxy with C.sub.1 -C.sub.5, andX.sup.- : diazo process anions, or perfluorinated aliphatic or aromatic anions.
    Type: Grant
    Filed: April 28, 1998
    Date of Patent: January 18, 2000
    Assignee: Syntec Gesellschaft fur Chemie und Technologie der Informationsaufzeichnu ng mbH
    Inventors: Regina Lischewski, Ursula Sell, Jorg Marx, Uwe Gohs
  • Patent number: 5889141
    Abstract: Photoimageable polyquinoline compositions comprise a polyquinoline polymer, a diazonaphthoquinone and optionally a photosensitizer. The composition is prepared by dissolving the polyquinoline polymer, diazonaphthoquinone and photosensitizer in a solvent to form a solution, coating the solution onto a substrate and thereafter removing the solvent to form a film. The film is exposed to light through a photomask and developed by immersion in a selective solvent to yield a photopatterned dielectric film.
    Type: Grant
    Filed: April 28, 1997
    Date of Patent: March 30, 1999
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Matthew L. Marrocco, III, Makoto Kaji
  • Patent number: 5637549
    Abstract: A recording material comprising a plastic film provided with a layer of ionizing radiation cured resin having a hardness equal to or harder than a pencil hardness of H and an image-forming layer having pressure sensitivity or thermal sensitivity or photosensitivity and thermal sensitivity, wherein rippling during storage in high humidity or caused by heat is markedly reduced.
    Type: Grant
    Filed: December 26, 1995
    Date of Patent: June 10, 1997
    Assignee: Kimoto Co., Ltd.
    Inventor: Yoshihisa Kimura
  • Patent number: 5436105
    Abstract: Disclosed is a method of making a subtractive offset printing plate, in which a subtractive offset printing plate containing at least a composite diazo photo sensitive material and a hydroxyl group-having acrylic copolymer in the photosensitive layer is imagewise exposed and the thus imagewise-exposed printing plate is automatically conveyed and developed with a developer with applying (a) developing brush(es) under pressure to the moving printing plate in the presence of the developer, the brush(es) being rotated around the axis vertical to the surface of the printing plate and being moved by reciprocating motion to the direction perpendicular to the moving direction of the printing plate and along the axis parallel to the surface of the printing plate. By the method, a good printing plate may be made, using a popular automatic additive developing machine of a particular system to which a subtractive developer involving few environmental problems is applied.
    Type: Grant
    Filed: April 23, 1993
    Date of Patent: July 25, 1995
    Assignee: Mitsubishi Chemical Corporation
    Inventor: Shigeki Shimizu
  • Patent number: 5424761
    Abstract: A direct thermal printer is provided having a lamp cover member which is attached to an open end of an optical fixing device, for protecting a thermosensitive recording medium from contacting a lamp of the optical fixing device. The lamp cover member is formed with a plurality of openings for reducing the absorption of light into the lamp cover member. All edges of the openings are not parallel to the recording medium transporting direction.
    Type: Grant
    Filed: March 12, 1993
    Date of Patent: June 13, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Ryo Imai
  • Patent number: 5387629
    Abstract: Polymers containing the phosphine oxide moiety are identified as being particularly useful in applications where resistance to atomic oxygen etching is required and in applications where second order nonlinear optical effects will be utilized. Particularly preferred polymers for these two applications include poly(arylene ether phosphine oxide)s (PEPOS), and novel PEPOS which include phenolphthalein sub-units and derivatives thereof have been prepared.
    Type: Grant
    Filed: July 30, 1993
    Date of Patent: February 7, 1995
    Assignees: The Center for Innovative Technology, Virginia Polytechnic Institute & State University, Virginia Tech Intellectual Properties, Inc.
    Inventors: James E. McGrath, Carrington D. Smith, Duane B. Priddy, Jr., Timothy Pickering
  • Patent number: 5247313
    Abstract: A direct color thermal printing method records a full-color image containing black characters on a thermosensitive color recording medium having three laminated thermosensitive recording layers. Three color components of each pixel are sequentially read out from three color frame memories. If all of the three color components of a pixel correspond to the maximum densities, that pixel is determined to be printed in black, and is stored as black pixel data in a black line buffer memory. When recording the black pixels, a thermal head is driven to apply a predetermined maximum amount of head energy to the thermosensitive color recording medium, for simultaneously coloring the three thermosensitive recording layers in accordance with the black pixel data.
    Type: Grant
    Filed: March 13, 1992
    Date of Patent: September 21, 1993
    Assignee: Fuji Photo Film Company, Limited
    Inventors: Shigenori Oosaka, Hitoshi Saito
  • Patent number: 5240807
    Abstract: A water soluble built-on mask layer is provided on a photoresist composition disposed on a substrate. The photoresist comprises an o-quinone diazide and a novolak or paravinyl phenol resin. The built-on mask layer comprises a water soluble, photobleachable diazonium salt, a coupler for the diazonium salt and an acidic, polymeric, film forming resin such as polystyrene sulfonic acid.
    Type: Grant
    Filed: August 2, 1989
    Date of Patent: August 31, 1993
    Assignee: Hoechst Celanese Corporation
    Inventors: Sangya Jain, Salvatore Emmi, Thomas S. Phillips
  • Patent number: 5183723
    Abstract: This invention relates to a method for forming a colored image on a degradable sheet material. As a result, a negative- or positive-working color proofing sheet can be produced on a variety of printing paper stocks. Upon exposure to an actinic radiation source through a screened image and development, it can accurately reproduce the image on the degradable sheet. The construction is useful as a color proof which can be employed to accurately predict the image quality from a lithographic printing process on a variety of printing surfaces.
    Type: Grant
    Filed: December 13, 1991
    Date of Patent: February 2, 1993
    Assignee: Hoechst Celanese Corporation
    Inventors: Stephan J. W. Platzer, Arthur E. Procter, Thomas Dunder
  • Patent number: 5130409
    Abstract: Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations.
    Type: Grant
    Filed: November 16, 1990
    Date of Patent: July 14, 1992
    Assignee: Morton International, Inc.
    Inventors: Richard M. Lazarus, Randall Kautz, Sunit S. Dixit
  • Patent number: 5100757
    Abstract: This invention relates to a method for forming a colored image on a degradable sheet material. As a result, a negative- or positive-working color proofing sheet can be produced on a variety of printing paper stocks. Upon exposure to an actinic radiation source through a screened image and development, it can accurately reproduce the image on the degradable sheet. The construction is useful as a color proof which can be employed to accurately predict the image quality from a lithographic printing process on a variety of printing surfaces.
    Type: Grant
    Filed: October 21, 1988
    Date of Patent: March 31, 1992
    Assignee: Hoechst Celanese Corporation
    Inventors: Stephan J. W. Platzer, Arthur E. Proctor, Thomas Dunder
  • Patent number: 5089372
    Abstract: A transfer recording medium is disclosed, comprising a light transmitting support having provided thereon a heat transfer solid ink layer via an interlayer having a photolyzable compound. The recording medium provides a clear and high-quality color image on an image-receiving sheet at high speed and low cost irrespective of surface smoothness of the image-receiving sheet.
    Type: Grant
    Filed: November 20, 1989
    Date of Patent: February 18, 1992
    Assignees: Tomoegawa Paper Co., Ltd., Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshihiro Kirihata, Chikara Murata, Masahide Tsukamoto, Yutaka Nishimura
  • Patent number: 5080996
    Abstract: A photosensitive element which comprises a substrate having a release surface; a photosensitive layer having a photosensitizer, pigment, and mixture of binders with different solubility characteristics; and an adhesive layer coated directly on the photosensitive layer. The adhesive solution dissolves one of the resins in the photosensitive layer but does not dissolve the photosensitizer and the resin used to bind the pigment. During overcoating of the adhesive on the photosensitive layer, an increasing gradient of the soluble resin towards the adhesive layer and a decreasing gradient of the photosensitizer and nonsoluble resin is formed.
    Type: Grant
    Filed: January 28, 1991
    Date of Patent: January 14, 1992
    Assignee: Hoechst Celanese Corporation
    Inventor: Stephan J. W. Platzer
  • Patent number: 5041356
    Abstract: An optical recording material comprising (I) a substrate, (II) a recording layer provided on said substrate, the recording layer consisting of light transmissive portions and light screening portions, and (III) a reflective metallic thin film layer provided on the recording layer; as well as a process therefor. The invention also includes an optical card comprising the optical recording material provided on a card substrate. In the cases of the optical recording material and the optical card, it is possible to readily carry out high density recording, the alternation of written informaton is difficult, and the written information can be read out on a basis of the difference in light reflectivity.
    Type: Grant
    Filed: August 28, 1989
    Date of Patent: August 20, 1991
    Assignee: Dai Nippon Insatsu Kabushiki Kaisha
    Inventors: Mitsuru Takeda, Wataru Kuramochi
  • Patent number: 5008174
    Abstract: A photosensitive element which comprises a substrate having a release surface; a photosensitive layer having a photosensitizer, pigment, and mixture of binders with different solubility characteristics; and an adhesive layer coated directly on the photosensitive layer. The adhesive solution dissolves one of the resins in the photosensitive layer but does not dissolve the photosensitizer and the resin used to bind the pigment. During overcoating of the adhesive on the photosensitive layer, an increasing gradient of the soluble resin towards the adhesive layer and a decreasing gradient of the photosensitizer and nonsoluble resin is formed.
    Type: Grant
    Filed: October 21, 1989
    Date of Patent: April 16, 1991
    Assignee: Hoechst Celanese Corporation
    Inventor: Stephan J. W. Platzer
  • Patent number: 4997734
    Abstract: Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations.
    Type: Grant
    Filed: December 21, 1989
    Date of Patent: March 5, 1991
    Assignee: Morton International, Inc.
    Inventors: Richard M. Lazarus, Randall M. Kautz, Sunit S. Dixit
  • Patent number: 4985344
    Abstract: A process for forming a pattern comprising forming an alkali-soluble polymer layer on a substrate, forming a radiation-sensitive composition layer containing a diazonium salt on the alkali-soluble polymer layer to form a resist layer having a two-layer structure, exposing the resist layer to a radiation to cause the change in solubility in an aqueous alkaline solution at the boundary between the two layers and forming a predetermined pattern in the resist layer by a usual resist process. The resist layer may comprise a plurality of layers comprising the two-layer structure as a repeating unit structure.
    Type: Grant
    Filed: October 13, 1989
    Date of Patent: January 15, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Shoichi Uchino, Takumi Ueno, Takao Iwayanagi, Saburo Nonogaki, Michiaki Hashimoto
  • Patent number: 4983490
    Abstract: The invention provides a mixture suitable for treating a photographic composition which comprises from about 1 to about 10 parts by weight of a propylene glycol alkyl ether and from about 1 to about 10 parts by weight of a propylene glycol alkyl ether acetate.
    Type: Grant
    Filed: May 15, 1989
    Date of Patent: January 8, 1991
    Assignee: Hoechst Celanese Corporation
    Inventor: Dana Durham
  • Patent number: 4980273
    Abstract: The matting agent particles of matted photographic imaging materials contain a finely divided solid as well as a dye that is only present at the image-forming points after exposure and development of the material. The starry night effect is thereby avoided. The dye can be formed during exposure and development from a precursor, e.g., from silver halide or from couplers for color photography or for diazo processes.
    Type: Grant
    Filed: July 26, 1989
    Date of Patent: December 25, 1990
    Assignee: E. I. DuPont de Nemours and Company
    Inventor: Manfred Fautz
  • Patent number: 4980262
    Abstract: A photographic contact printing process is disclosed having application in the mass production of replicate video discs from a master disc, and other applications wherein it is desired to replicate micro-detail over a relatively large area. A problem with conventional contact printing from a mask to a photographic medium is one of maintaining intimate contact over a relatively large area since dust, dirt, etc., are almost impossible to completely eliminate in any practical manner. In accordance with the present invention, a contact printing process is provided wherein intimate contact is not necessary for making high quality contact prints. The present invention recognizes that in contact printing information from a master disc to a replicate disc, the contact printing process is significantly less sensitive to imperfect contact between the master disc and the replicate disc if one employs a replicate disc comprising a photosensitive material having a certain optical properties.
    Type: Grant
    Filed: August 29, 1979
    Date of Patent: December 25, 1990
    Assignee: Eastman Kodak Company
    Inventors: Harold T. Thomas, Dennis G. Howe
  • Patent number: 4960670
    Abstract: A thermodevelopable photo-recording method suitable for making bar-code labels, ID cards and the like, comprising using a thermodevelopable photo-recording material provided with thermodevelopable photo-recording layer containing at least a diazo compound and a coupler, and an electricity modulation type light shutter constructed by minute matrixes which come to be able or inable to transmit light when electric current is passed therethrough, and optionally an optical system for minizing or enlarging the final image, exposing said photo-recording material to light through a temporary image formed in said light shutter by turning on or off the electricity to pass through each of the minute matrixes, then heating said photo-recording material to get a record of the image therein.
    Type: Grant
    Filed: May 12, 1988
    Date of Patent: October 2, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Koutaro Nakamura, Yoshiro Kawashima
  • Patent number: 4957847
    Abstract: A heat-sensitive recording material comprising a base and, on top of the said base, a heat-sensitive layer containing a cyclic diazo component and a coupling component, the cyclic diazo component being a benzotriazine compound of the formula ##STR1## wherein Q is --CH.sub.2 --, --CO-- or --SO.sub.2 --, R is hydrogen, hydroxyl, or aryl or alkenyl, each unsubstituted or substituted by halogen, hydroxyl, cyano, lower alkoxy, lower alkylthio, acyloxy, lower alkoxycarbonyl or lower alkylsulfonyl, or is acyl, acyloxy or acylamino, cycloalkyl, or is aryl or aralkyl such as phenyl, phenylalkyl or naphthyl each unsubstituted or substituted on the ring by cyano, halogen, nitro, trifluoromethyl, lower alkyl, lower alkylthio, lower alkoxy, lower alkylcarbonyl or lower alkoxycarbonyl, or is a heterocyclic radical, and the benzene ring A is unsubstituted or substituted by halogen, cyano, nitro, lower alkyl, lower alkoxy, lower alkylthio, lower alkylcarbonyl or lower alkoxycarbonyl.
    Type: Grant
    Filed: December 2, 1988
    Date of Patent: September 18, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Jean-Marie Adam, Hans Baumann
  • Patent number: 4956251
    Abstract: A multicolor heat-sensitive recording material which comprises a transparent support having two or more of color-producing unit layers differing in hue of the produced color in such a situation that at least one unit layer is provided on each side of the support, wherein at least one color-producing unit layer is essentially transparent, namely, Haze % of said transparent layer is less than 40% and a multicolor heat-sensitive recording material further provided a transparent protective layer on the outermost color producing unit layer are disclosed.
    Type: Grant
    Filed: March 28, 1988
    Date of Patent: September 11, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shintaro Washizu, Toshimasa Usami, Sumitaka Tatsuta, Jun Yamaguchi
  • Patent number: 4937176
    Abstract: A method of manufacturing a semiconductor device, in which a layer of photolacquer (5) containing as a photoactive component a diazo oxide is provided on a semiconductor substrate. Of this layer, parts (9) are irradiated by a first patterned irradiation (7) and these parts are then rendered poorly developable by an intermediate treatment. Subsequently, the lacquer layer (5) is subjected to a second non-patterned irradiation (11) and is then developed. According to the invention, in the parts (9) irradiated by the first irradiation a pigment is formed, which absorbs radiation having a wavelength at which diazo oxide is photosensitive. The second irradiation is carried out with radiation of that wavelength. Thus, lacquer tracks having a rectangular profile can be obtained in a simple manner.
    Type: Grant
    Filed: September 27, 1988
    Date of Patent: June 26, 1990
    Assignee: U.S. Philips Corporation
    Inventors: Franciscus A. Vollenbroek, Wilhelmus P. M. Nijssen, Marcellinus J. H. J. Geomini
  • Patent number: 4929532
    Abstract: The invention relates to negative photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process.
    Type: Grant
    Filed: April 12, 1989
    Date of Patent: May 29, 1990
    Assignee: Hoechst Celanese Corporation
    Inventor: Thomas A. Dunder
  • Patent number: 4889795
    Abstract: A process for forming a photoresist pattern comprises the steps of forming a photoresist layer on an underlying layer, forming a contrast enhancement layer for enhancing the contrast of light entering the photoresist layer on the photoresist layer, selectively exposing the photoresist layer through the contrast enhancement layer to light, and developing the photoresist layer to form a photoresist pattern. The contrast enhancement layer is formed as a layer containing a photobleachable agent and a material soluble in both of a nonpolar organic solvent and an aqueous alkali solution. The material is selected from the group of abietic acid, a derivative thereof, a rosin containing abietic acid as the main component, and a derivative thereof. The contrast enhancement layer is treated and removed simultaneously with development for the photoresist. The stability of a coating solution for the contrast enhancement layer is remarkably high.
    Type: Grant
    Filed: February 23, 1988
    Date of Patent: December 26, 1989
    Assignees: Oki Electric Industry Co., Ltd., Fuji Chemicals Industrial Co., Ltd.
    Inventors: Katsuaki Kaifu, Maki Kosuge, Yoshio Yamashita, takateru Asano, Kenji Kobayashi
  • Patent number: 4888266
    Abstract: The invention relates to a process for producing supports intended for the optical recording and reading of information. A layer containing a diazo compound is deposited onto a metallized substrate. Recording is obtained by exposing the support to light through a mask, the exposed zones of the layer of diazo compound being decomposed. Dry development in ammonia vapors shows up transparent zones and opaque zones corresponding to the information.
    Type: Grant
    Filed: March 13, 1987
    Date of Patent: December 19, 1989
    Assignee: Thomson Brandt
    Inventors: Jean-Pierre Lacotte, Claude Puech
  • Patent number: 4886731
    Abstract: Photopolymeric printing plates wherein an electrochemically etched, anodized and silicated aluminum plate has a plurality of coatings applied thereon and wherein at least one of the coatings include a solvent soluble diazo therein.
    Type: Grant
    Filed: May 10, 1989
    Date of Patent: December 12, 1989
    Assignee: Cookson Graphics Inc.
    Inventors: Maria T. Sypek, Thomas P. Rorke
  • Patent number: 4849323
    Abstract: Disclosed is a pattern forming method using contrast enhanced material for enhancing the resolution and contrast when forming patterns in fabrication of semiconductors or the like. This pattern forming method comprises a step of applying a contrast enhanced material for pattern forming on a photoresist, a step of exposing and a step of developing.The contrast enhanced material is a water-soluble material using a novel diazo compound so that the coefficient A of the contrast may be 10 or more, and when it is combined with g-line exposure to be used in pattern formation, a pattern of 0.5 .mu.m or less may be formed.
    Type: Grant
    Filed: August 10, 1987
    Date of Patent: July 18, 1989
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Masayuki Endo, Masaru Sasago, Kazufumi Ogawa
  • Patent number: 4816362
    Abstract: An optical recording material comprising (I) a substrate, (II) a recording layer provided on said substrate, the recording layer consisting of light transmissive portions and light screening portions, and (III) a reflective metallic thin film layer provided on the recording layer; as well as a process therefor. The invention also includes an optical card comprising the optical recording material provided on a card substrate. In the cases of the optical recording material and the optical card, it is possible to readily carry out high density recording, the alternation of written information is difficult, and the written information can be read out on a basis of the difference in light reflectivity.
    Type: Grant
    Filed: March 31, 1987
    Date of Patent: March 28, 1989
    Assignee: Dai Nippon Insatsu Kabushiki Kaisha
    Inventors: Mitsuru Takeda, Wataru Kuramochi
  • Patent number: 4725526
    Abstract: In a process for reducing halations during the imagewise irradiation of a reproduction layer exposed through a planar image original, at least one lubricant either is contained in the layer or is interposed between the layer and the image original. Suitable lubricants include organic polysiloxanes, hydrocarbon polymers, polyaryl esters, and alkanoic acids or alkenoic acids having at least 9 carbon atoms. Excluded are lubricants comprising copolymers of dimethyl dichlorosilane, ethylene oxide and propylene oxide, provided they are located in the reproduction layer.
    Type: Grant
    Filed: August 19, 1985
    Date of Patent: February 16, 1988
    Assignee: Hoeschst Aktiengesellschaft
    Inventors: Werner Frass, Engelbert Pliefke
  • Patent number: 4673626
    Abstract: An optical recording material comprising (I) a substrate, (II) a recording layer provided on said substrate, the recording layer consisting of light transmissive portions and light screening portions, and (III) a reflective metallic thin film layer provided on the recording layer; as well as a process therefor. The invention also includes an optical card comprising the optical recording material provided on a card substrate. In the cases of the optical recording material and the optical card, it is possible to readily carry out high density recording, the alternation of written information is difficult, and the written information can be read out on a basis of the difference in light reflectivity.
    Type: Grant
    Filed: March 27, 1985
    Date of Patent: June 16, 1987
    Assignee: Dai Nippon Insatsu Kabushiki Kaisha
    Inventors: Mitsuru Takeda, Wataru Kuramochi