Abstract: A photoresist composition including a binder resin including a novolac resin represented by Chemical Formula 1, a diazide photosensitive initiator, and a solvent including a base solvent and an auxiliary solvent, wherein the base solvent includes propylene glycol monomethyl ether acetate, and the auxiliary solvent includes dimethyl-2-methylglutarate and ethyl beta-ethoxypropionate, wherein in Chemical Formula 1, R1 to R9 are each independently a hydrogen atom or an alkyl group, “a” is an integer number from 0 through 10, “b” is an integer number from 0 through 100, and “c” is an integer number from 1 through 10.

Abstract: An imaging element is disclosed for making a lithographic printing plate comprising a lithographic support and an imaging layer comprising (i) a polymer having aryldiazosulfonate units and/or aryltriazenylsulfonate units and (ii) a compound capable of generating a radical and/or an acid upon exposure to UV light. The imaging element can be exposed by UV light and developed by water or an aqueous solution. Exposure and/or development can be performed on or off press.

Abstract: A material for making an electroconductive pattern, the material comprising a support and a light-exposure differentiable element, characterized in that the light-exposure differentiable element comprises an outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene, and optionally a second layer contiguous with the outermost layer; and wherein the outermost layer and/or the optional second layer contains a light-sensitive component capable upon exposure of changing the removability of the exposed parts of the outermost layer relative to the unexposed parts of the outermost layer; and a method of making an electroconductive pattern on a support using the material for making an electroconductive pattern.

Abstract: A material for making an electroconductive pattern, the material comprising a support and a light-exposure differentiable element, characterized in that the light-exposure differentiable element comprises a conductivity enhanced outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene, and optionally a second layer contiguous with the outermost layer; and wherein the outermost layer and/or the optional second layer contains a monodiazonium salt capable upon exposure of reducing the conductivity of the exposed parts of the outermost layer relative to the unexposed parts of the outermost layer and a method of making an electroconductive pattern.

Abstract: An imaging element is disclosed for making a lithographic printing plate comprising a lithographic support and an imaging layer comprising (i) a polymer having aryldiazosulfonate units and/or aryltriazenylsulfonate units and (ii) a compound capable of generating a radical and/or an acid upon exposure to UV light. The imaging element can be exposed by UV light and developed by water or an aqueous solution. Exposure and/or development can be performed on or off press.

Abstract: A positive resist composition comprising the components of: (A) a resin having an aliphatic cyclic hydrocarbon group on its side chain and being capable of increasing the solubility in an alkali developer by an action of acid; and (B) a compound being capable of generating an acid by irradiation with one of an actinic light and radiation, wherein the component (A) is a resin comprising at least one of repeating unit having a partial structure comprising an alicyclic hydrocarbon represented by one of the following general formulae (pI) to (pVI), and the content of the repeating units corresponding to an acrylic monomer is from 5 to 45 mol % based on the total of the repeating units.

Abstract: A method of making a lithographic printing master is disclosed which comprises the steps of

Abstract: A radiation sensitive composition comprising (A), a mixture of an isoindolinone pigment and a yellow organic pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

Abstract: According to the present invention there is provided a heat-sensitive material for making lithographic printing plates comprising on a lithographic support a first image-forming layer comprising a hydrophilic binder, a cross-linking agent for said hydrophilic binder and dispersed hydrophobic thermoplastic polymer particles, and as top image-forming layer a heat switchable image forming layer comprising a heat switchable polymer wherein said top image-forming layer or a layer adjacent to said top image-forming layer comprises a compound capable of converting light into heat, characterized in that said heat switchable polymer is a polymer containing aryldiazosulphonate units.

Abstract: According to the present invention there is provided a heat-sensitive imaging element for providing a lithographic printing plate, comprising a lithographic support with a hydrophilic surface and a top layer wherein said top layer or a layer adjacent to said top layer comprises a compound capable of converting light into heat, characterized in that said top layer further comprises a polymer containing aryldiazosulphonate units.

Abstract: A radiation sensitive composition comprising (A) a colorant containing a quinacridone pigment, a mixture of an isoindolinone pigment and a yellow organic pigment or a mixture of copper phthalocyanine blue and a green pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

Abstract: According to the present invention there is provided a heat-sensitive imaging element for providing a lithographic printing plate, comprising a support and as top layer a heat switchable image forming layer comprising a hardened hydrophilic binder and a heat switchable polymer wherein said top layer or a layer adjacent to said top layer comprises a compound capable of converting light into heat; characterized in that said heat switchable polymer is a polymer containing aryldiazosulphonate units.

Abstract: Disclosed is a method of forming a pattern on a substrate, comprising a step of forming a light-sensitive layer containing an aromatic compound on a substrate, a step of patternwise exposing the light-sensitive layer with a light having a wavelength range shorter than the maximum wavelength; in the third absorption band from the long-wave side in the absorption spectrum of the aromatic compound and longer than the maximum wavelength in the fourth absorption band from the same, thereby to cause a photochemical reaction in the light-sensitive layer, and a step of developing the exposed light-sensitive layer, optionally after heat-treating the layer, so as to selectively remove the exposed area of the layer or leave the area as it is. The method gives a pattern having a high resolving power and an excellent dry-etching resistance.

Abstract: A radiation-sensitive composition is disclosed which includes (a) a binder insoluble in water but soluble in or capable of being swelled in an aqueous alkali solution, (b) a dissolution inhibitor composed of (b1) a poly(N,O-acetal) having a general formula: ##STR1## wherein R.sup.3 is alkyl or substituted or unsubstituted aryl, R.sup.4 is a divalent group selected from alkylene, cycloalkylene, alkene or alkyne, R.sup.5 is alkyl, alkene, alkyne or cycloalkyl, X is --OCO--, --CO-- or --NHCO--, and p is a number not less than 1, and/or (b2) a phenol compound having a hydroxyl group which is protected by a group which can be cleaved in the presence of an acid, (c) a photosensitive compound capable of generating an acid when exposed to an active radiation, (d) a base capable of being decomposed when exposed to an active radiation to form a neutral compound derived therefrom, (e) a plasticizer, and (f) a solvent.

Abstract: The present invention discloses a method for making a lithographic printing plate comprising the steps of:(1) image-wise exposing an imaging element having on a hydrophilic surface of a lithographic base a photosensitive layer comprising a photosensitive polymer containing aryl-diazosulfonate units;(2) and developing a thus obtained image-wise exposed imaging element by mounting it on a print cylinder of a printing press and supplying an aqueous dampening liquid and/or ink to said photosensitive layer while rotating said print cylinder.Excellent printing results are obtained with a printing plate perpared according to the above described method. The lithographic base may be an anodized aluminium or a support provided with an ink-repellant layer containing a cross-linked hydrophilic binder.

Abstract: A photosensitive resin composition comprising (a) a polymer having carboxyl groups (b) a photoacid generator which generates an acid when irradiated with light, and (c) an aliphatic amine is capable of development with ease by use of a wide variety of aqueous solvents.

Abstract: The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing treated chelated ion exchange resins to make the neutral ammonium salt or acid form. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.

Abstract: The present invention provides methods for producing water insoluble, aqueous alkali soluble, film forming novolak resins having an extremely low level of metal ions, utilizing treated anion and cation exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resin and for producing semiconductor devices using such photoresist compositions.

Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of a substance that is an acid generator upon exposure to actinic radiation.

Abstract: A radiation-sensitive mixture is described comprising a compound which produces a strong acid under the action of actinic radiation, a binder which is insoluble in water, but soluble in organic solvents and aqueous-alkaline solutions, and a compound of either of formulae I and II ##STR1## wherein R denotes a substituted or unsubstituted alkyl group,X denotes a hydrogen or halogen atom or a hydroxyl, alkyl, alkoxy, alkoxycarbonyl, aryloxy or aryl group, andn denotes zero or a number from 1 to 3.The mixture is suitable for the production of printing plates and photoresists and is distinguished by improved high flexibility along with good overdevelopment resistance.

Abstract: Photoresist compositions suitable for deep UV and excimer laser lithography are disclosed that are mixtures of a photoacid and a polymer having imide residues to which acid labile groups are attached.The imide group ##STR1## can be blocked with certain groups, X, to form compounds containing the structure ##STR2## which have solubility properties different from the unblocked imide. These groups, X, can be cleaved by acid under the proper conditions to regenerate the unblocked imide. Where the imide group is incorporated in a polymer, the polymer with blocked imide groups can be made to function as a resist when compounded with a substance capable of forming an acid upon exposure to radiation.Preferred polymers are those in which at least 80% of the imide groups are blocked. When less than 50% of the imide groups are blocked, performance in a photoresist becomes unacceptable.

Abstract: A relief image-forming composition having an acidic pH comprises a photosensitive component and an indicator capable of existing in two states differing in actinic opacity dependent upon pH. A relief image is formed by (1) exposing to light selected areas of a layer of the composition, the indicator being in its state of lower actinic opacity, (2) removing layer material from the exposed areas or from the unexposed areas and (3) shifting the pH in the remaining layer material to a value at which the indicator exists in its state of higher actinic opacity. The resultant image can then be used as an intermediate original in diazotype copying processes.

Abstract: A heat-sensitive recording sheet is proposed which has a heat-sensitive recording layer laminated on one surface of a support body and containing a diasosulfonate; a acid coupling agent comprising a compound having aromatic ring, hetroaromatic ring or substituted aromatic ring bonded thereto OH group and COOH group; and a thermoplastic resin having a glass transition point of 70.degree.-150.degree. C. or a photocuring resin.

Abstract: A light-sensitive adduct comprising the combination of a diazo resin having a plurality of pendant diazonium groups and a sulfonated polymer having a plurality of sulfonate groups and a presensitized light-sensitive article comprising a substrate having a light-sensitive coating which is comprised of the light-sensitive adduct on a surface thereof. After imagewise exposure, unexposed portions of the coating are removable by water or aqueous developers.

Abstract: A radiation-sensitive element is disclosed including a radiation-sensitive layer comprised of a cobalt(III)complex and a photoreductant. A process is disclosed in which the photoreductant is converted to a reducing agent by exposure to electromagnetic radiation longer than 300 nanometers. The reducing agent is then reacted with a cobalt(III)complex. Images can be recorded directly within the radiation-sensitive layer or in a separate image-recording element or layer by use of the residual cobalt(III)complex not exposed or one or more of the reaction products produced by exposure. By using the ammonia liberated from ammine ligand containing cobalt(III)complexes on exposure in combination with imagewise and uniform exposures, positive or negative images can be formed in diazo image-recording layers or elements associated with the radiation-sensitive layer.

Abstract: A photo-sensitive and heat-sensitive composition consisting essentially of a leuco-pigment; a hydrogen donator; a photo-reductant which, when exposed to a visible light, produces a reducing agent by the action of said hydrogen donator coexisting therewith; a photooxidant which, when exposed to an ultraviolet ray, causes said leuco-pigment coexisting therewith to generate color and simultaneously, when reacted with said reducing agent, is deprived of its own oxidizing ability; and a cobalt complex which reacts with the reducing agent in amplifying manner to thereby suppress the reaction of a color-forming system, and a recording element using the same.

Abstract: An image-forming element is disclosed comprised of a support and a coating thereon containing a cobalt(III)complex and a compound containing a conjugated .pi. bonding system capable of forming at least a bidentate chelate with cobalt(III). The coating is predominantly free of anions which will form conjugate acids by deprotonation of a cobalt(II)complex containing the chelating compound. In one preferred form the image-forming element is radiation-sensitive. In this form the image-forming element can contain a photoactivator capable of initiating reduction of the cobalt(III)complex. An imaging process is disclosed in which the coating is exposed to actinic radiation to produce an image. Images can be recorded directly within the image-forming coating or in a separate image-recording element or layer by use of the residual cobalt(III)complex or by use of one or more of the reaction products produced by exposure.

Abstract: Photographic elements, diffusion transfer assemblages and processes are described which employ a novel nondiffusible compound having a releasable 6-arylazo-2-amino-3-pyridinol dye moiety or precursor thereof. The compound contains in the ortho position of the arylazo moiety a ballasted carrier moiety attached thereto either through a sulfonamido linking group or through the oxygen of a ##STR1## which said ballasted carrier moiety contains, the ballasted carrier moiety being capable of releasing the diffusible 6-arylazo-2-amino-3-pyridinol dye or precursor thereof under alkaline conditions. The dye is transferred imagewise to an image-receiving layer, where it is contacted with metal ions to form a metal-complexed 6-arylazo-2-amino-3-pyridinol dye transfer image of excellent stability.

Abstract: Disclosed is a novel photosensitive composition comprising an alkali-soluble photosensitive resin and an additive consisting of at least one aromatic polybasic carboxylic cellulose ether ester which is a reaction product of an aromatic polybasic carboxylic anhydride with a cellulose ether compound of the formula (I) or (II):R.sub.a.sup.1 R.sub.b.sup.2 A (I)orR.sub.c.sup.3 R.sub.d.sup.4 R.sub.e.sup.5 A (II)wherein R.sup.1 represents a hydroxyalkyl radical having 3 or 4 carbon atoms; R.sup.2 and R.sup.5 are a hydrogen atom or an alkyl radical having 1 or 2 carbon atoms, respectively; R.sup.3 and R.sup.4 represent a hydroxyalkyl radical having 2 to 4 carbon atoms, respectively, and are different from each other; A represents a cellulose residue, and; a, b, c, d and e, respectively, represent a positive number.