Composition Or Product Which Contains Radiation Sensitive Compound Having Moiety Of Nitrogen Double Or Triple Bonded Directly To Nitrogen Other Than Chromophore Moiety, E.g., Triazene Containing Product, Etc., Process Of Making, And Composition Or Product Used To Finish Or Develop A Diazo Reproduction Patents (Class 430/154)
  • Patent number: 10684546
    Abstract: A composition for forming a resist underlayer film has excellent storage stability at normal temperature. A composition for forming a resist underlayer film for lithography including a nitrogen-containing compound having 2 to 6 substituents of the following Formula (1) which bond to nitrogen atoms in one molecule, a polymer, a compound that promotes a crosslinking reaction, and an organic solvent. The nitrogen-containing compound having 2 to 6 substituents of Formula (1) in one molecule is for example a glycoluril derivative of the following Formula (1A). In the formula, each R1 is a methyl group or an ethyl group, and R2 and R3 are independently a hydrogen atom, a C1-4 alkyl group, or phenyl group.
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: June 16, 2020
    Inventors: Yasushi Sakaida, Kenji Takase, Takahiro Kishioka, Rikimaru Sakamoto
  • Patent number: 10626013
    Abstract: A photo-patterned fluorocarbon monolayer directly grafted to Si surface atoms provides anti-wetting performance at controlled locations, wherein the Si surface oxide is etched and reacted with fluorocarbon chains with a terminal C—C double bond, resulting in Si—C surface. As the direct Si—C linkages are chemically robust, and much more resistant to decomposition than Si—O—C bonds, the resulting surface does not suffer from the shortcomings of current MEMS dispensers.
    Type: Grant
    Filed: April 4, 2018
    Date of Patent: April 21, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventor: Matthew C. Traub
  • Publication number: 20070287091
    Abstract: A flash lamp exposure system for exposing a substrate to ultraviolet radiation. The system includes at least one flash lamp, each of which includes: at least one lamp for emitting ultraviolet radiation in response to a voltage; at least one first reflector, each first reflector being adapted to reflect the ultraviolet radiation toward the substrate; a second reflector surrounding a path of the ultraviolet radiation from the at least one lamp to the substrate, the second reflector being adapted to reflect first rays of the ultraviolet radiation toward the substrate; and a third reflector disposed closer to the substrate than the secondary reflector and surrounding the path of the ultraviolet radiation from the at least one lamp to the substrate, the third reflector being adapted to reflect second rays of the ultraviolet radiation toward the substrate.
    Type: Application
    Filed: June 12, 2006
    Publication date: December 13, 2007
    Inventors: Victor M. Jacobo, Raja D. Singh, Andre Soukasian, David A. Jacobsen, Frank E. Fabela
  • Patent number: 6875554
    Abstract: A positive photosensitive polyimide resin composition comprising: (a) a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one solvent solubilizing functional group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g, (b) a photosensitive orthoquinonediazide compound, and (c) from 0.1 to 50 wt %, based on the total weight of all polymers of the composition, of a component (c1) or (c2), wherein: component (c1) is a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one functional group selected from the group consisting of a long chain alkyl group having at least 6 carbon atoms and a fluorinated alkyl group, the polyimide having a reduced viscosity ranging from 0.05 to 5.
    Type: Grant
    Filed: October 3, 2001
    Date of Patent: April 5, 2005
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Tadashi Hatanaka, Tomonari Nakayama, Takayasu Nihira
  • Publication number: 20040259020
    Abstract: The invention provides a positive-working photosensitive resin composition comprising an alkali soluble resin (A), a diazoquinone compound (B) and a compound (C) which contains a —CH2OH group but not a phenolic hydroxyl group, a method for producing a pattern-formed resin film using the composition, a semiconductor device and a display device using the composition, and a method for producing the semiconductor device and the display device.
    Type: Application
    Filed: June 23, 2004
    Publication date: December 23, 2004
    Inventors: Toshio Banba, Takuji Ikeda, Tatsuya Yano, Takashi Hirano
  • Publication number: 20040259019
    Abstract: A positive photosensitive composition comprising a quinonediazide compound, a novolak resin, a compound reacting with the novolak resin by the action of an acid, and a compound generating an acid by heating.
    Type: Application
    Filed: January 29, 2004
    Publication date: December 23, 2004
    Inventor: Isao Yahagi
  • Publication number: 20040048188
    Abstract: A novel positive photosensitive resin composition is presented by improving the water repellency at the surface and imparting additional functions to a positive photosensitive resin which can be developed by an alkali aqueous solution and which is excellent in sensitivity and developability, while maintaining such properties.
    Type: Application
    Filed: April 3, 2003
    Publication date: March 11, 2004
    Inventors: Tadashi Hatanaka, Tomonari Nakayama, Takayasu Nihira
  • Publication number: 20040009414
    Abstract: A dye-containing curable composition which contains a binder and an organic solvent soluble dye, and in which the organic solvent soluble dye is a compound represented by the following general formula (I), and a color filter formed by using this compound. In general formula (I), Dye represents an acidic dye portion having a sulfonic acid group or a carboxylic acid group; X represents a portion derived from at least one of a nitrogen-containing compound with a molecular weight of 250 or less having carbon, hydrogen, and two or more nitrogen atoms, and an aliphatic cyclic amine compound with a molecular weight of 250 or less having carbon, hydrogen and one or more nitrogen atoms; and n represents a value that satisfies 0<n≦5.
    Type: Application
    Filed: June 26, 2003
    Publication date: January 15, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Katsumi Araki
  • Patent number: 6524763
    Abstract: The object of the present invention is to provide a material which takes on a color or which changes its colors when selectively sensitized by ionizing radiation (especially by low doses of radiation) and which is not sensitive to visible and ultraviolet light etc. This is achieved by microcapsules containing a radiation sensitive composition comprising leuco compounds (a) and organic halogen compounds (b) as indispensable components.
    Type: Grant
    Filed: March 1, 2001
    Date of Patent: February 25, 2003
    Assignees: The Japan Atomic Power Company, Nuclear Fuel Industries, Ltd.
    Inventors: Yuji Kuroda, Masahiko Seki, Yumiko Fujita, Mitsuto Montani, Takeshi Sakai, Shozo Suefuku, Hiroyuki Nakazumi
  • Patent number: 6165681
    Abstract: This invention relates to a black-pigmented high molecular weight organic material which is structured from a radiation-sensitive precursor by irradiation, the pigmentation of which material consists of coloured organic pigments, at least one of which is in latent form before irradiation. This material is preferably used as a thin layer which is built up in the form of patterns on a transparent substrate and which can be used, for example, as black matrix for optical colour filters. This invention also relates to a process for the preparation of this material as well as to novel soluble derivatives of yellow disazo condensation pigments which can be used in this process.
    Type: Grant
    Filed: August 17, 1999
    Date of Patent: December 26, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Veronique Hall-Goulle, Gerardus de Keyzer
  • Patent number: 5916680
    Abstract: A thermo-responsive microcapsule containing a diazo compound or an electron donative dye precursor, wherein the capsule wall of the microcapsule is composed of at least one polymer obtained by polymerization of an isocyanate compound containing an adduct of (A) a compound having one active hydrogen in the molecule and having an average molecular weight from 500 to 20000 and (B) a multifunctional isocyanate having two or more isocyanate groups in the molecule, and a heat-sensitive recording material and a multicolor heat-sensitive recording material comprising a heat-sensitive recording layer containing the microcapsule are disclosed.
    Type: Grant
    Filed: October 6, 1997
    Date of Patent: June 29, 1999
    Assignee: Fuji Photo Film Co., Ltd
    Inventors: Yuichi Wakata, Kimio Ichikawa
  • Patent number: 5582952
    Abstract: A photosensitive lithographic printing plate which provides a wide range of proper conditions for development, high impression capacity, a flexible film sufficient in adhesion to a support and excellent processing suitability with a weakly alkaline developer (pH 12.5 or less) is disclosed. The photosensitive lithographic printing plate comprises a support and a photosensitive layer provided thereon, wherein the photosensitive layer is formed from a photosensitive composition containing at least a two-equivalent coupler residue-containing compound and a photosensitive compound or a photosensitive mixture acting as a positive type.
    Type: Grant
    Filed: March 7, 1995
    Date of Patent: December 10, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Koichi Kawamura, Keiji Akiyama, Toshifumi Inno, Katsuji Kitatani
  • Patent number: 5338640
    Abstract: A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or acetylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.
    Type: Grant
    Filed: August 28, 1992
    Date of Patent: August 16, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiaki Aoai, Kazuyoshi Mizutani
  • Patent number: 5314781
    Abstract: A blueprint developing solution and process for developing blueprints, wherein the ammonia odor in the blueprints is reduced without eliminating the odor of the developing solution, comprising the incorporation of an effective amount of sodium chlorite in the developing solution or the addition of the vapor products of an aqueous sodium chlorite solution to the developing chamber of a blueprint developing machine.
    Type: Grant
    Filed: September 11, 1991
    Date of Patent: May 24, 1994
    Inventor: Ronald L. Balk
  • Patent number: 5259988
    Abstract: A polycyanamide compound represented by the general formula (I): ##STR1## wherein A is ##STR2## X is an integer ranging from 10 to 30. This polycyanamide compound of the formula (I) is a photoelectric material and, in this respect, can be used for photovoltaic cells, macromolecular cells and functional elements such as photo sensors.
    Type: Grant
    Filed: December 3, 1992
    Date of Patent: November 9, 1993
    Assignee: Korea Institute of Science and Technology
    Inventors: Sang W. Park, Kyung H. Yoo, Yong K. Kang, Young H. Lee, Hyung Y. Kim, Hyon T. Kwak, Yeong I. Lee
  • Patent number: 5106724
    Abstract: There are disclosed an aqueous alkaline developer for light-sensitive lithographic printing plate commonly processing a negative-type light-sensitive lithographic printing plate having a light-sensitive layer containing a diazo compound and a positive-type light-sensitive lithographic printing plate having a light-sensitive layer containing an o-quinonediazide compound, which comprises containing an alkali agent, 0.1 to 10% by weight of a water-soluble reducing agent, a sodium, potassium or ammonium salt of an organic carboxylic acid, and a non-ionic or cationic surfactant, and having a pH in the range of 12.5 to 13.5, and also a developer composition for light-sensitive material, which comprises an aqueous solution containing a compound represented by the formula (I) shown below: ##STR1## wherein R.sub.1 represents an alkyl group or an alkoxy group each having 2 to 5 carbon atoms, or a hydroxyalkyl group having 2 to 5 carbon atoms; and R.sub.
    Type: Grant
    Filed: June 1, 1990
    Date of Patent: April 21, 1992
    Assignee: Konica Corporation
    Inventors: Akira Nogami, Minoru Seino, Masafumi Uehara, Miegi Nakano
  • Patent number: 4986921
    Abstract: This invention relates to a photosensitizer which is bound to a cellulose acetate polymer, a method of preparing the bound photosensitizer and a process for using the bound photosensitizer. The photosensitizers which may be used in the invention include rose bengal, rhodamine B, acridine orange, methylene blue and zinc phthalocyanine. The photosensitizer is attached to the cellulose acetate by reacting an acid group on the photosensitizer with a hydroxyl group. Finally, the bound photosensitizer may be used to oxidize undesirable oxidizable compounds present in a hydrocarbon or aqueous fraction. One specific example is the sweetening of kerosene which involves oxidizing the mercaptans contained in the kerosene.
    Type: Grant
    Filed: August 29, 1990
    Date of Patent: January 22, 1991
    Assignee: Allied-Signal Inc.
    Inventors: Stephen F. Yates, Mary L. Good, Inara M. Brubaker
  • Patent number: 4980271
    Abstract: A composition capable of removing the non-image areas of an imagewise exposed photographic element, consisting essentially of in admixture:(a) from at least about 5% to about 30% by weight benzyl alcohol; and(b) from about 1% to about 20% by weight of one or more compounds selected from the group consisting of sodium xylene sulfonate and sodium cumene sulfonate; and(c) from about 5% to about 40% by weight potassium toluene sulfonate; and(d) water.
    Type: Grant
    Filed: August 5, 1985
    Date of Patent: December 25, 1990
    Assignee: Hoechst Celanese Corporation
    Inventors: Shane Hsieh, Wayne A. Mitchell
  • Patent number: 4956251
    Abstract: A multicolor heat-sensitive recording material which comprises a transparent support having two or more of color-producing unit layers differing in hue of the produced color in such a situation that at least one unit layer is provided on each side of the support, wherein at least one color-producing unit layer is essentially transparent, namely, Haze % of said transparent layer is less than 40% and a multicolor heat-sensitive recording material further provided a transparent protective layer on the outermost color producing unit layer are disclosed.
    Type: Grant
    Filed: March 28, 1988
    Date of Patent: September 11, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shintaro Washizu, Toshimasa Usami, Sumitaka Tatsuta, Jun Yamaguchi
  • Patent number: 4939065
    Abstract: Substrates, e.g., silicon wafers, coated with a UV-curable organopolysiloxane composition including a crosslinking catalyst therefor (e.g., a platinum group metal compound) and an amount of a crosslinking inhibitor (e.g., an azodicarboxylate) which is effective at ambient temperature, but ineffective to prevent crosslinking on exposure of the composition to ultraviolet radiation, are well adapted for the imaging of negative intelligence patterns thereon.
    Type: Grant
    Filed: July 11, 1988
    Date of Patent: July 3, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Jacques Cavezzan, Sylvianne Dumas, Louis Giral, Christian Prud'Homme, Francois Schue
  • Patent number: 4880722
    Abstract: The dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line resolution by reducing the acidity of the polyamic acid prior to exposure.
    Type: Grant
    Filed: October 8, 1987
    Date of Patent: November 14, 1989
    Assignee: International Business Machines Corporation
    Inventors: Wayne M. Moreau, Kaolin N. Chiong
  • Patent number: 4806458
    Abstract: The invention provides a composition which comprises from about 3 to about 50% by weight of a hexa-alkyl disilazane and a solvent composition which comprises one or more compounds selected from the group consisting of a propylene glycol alkyl ether and a propylene glycol alkyl ether acetate.
    Type: Grant
    Filed: August 27, 1987
    Date of Patent: February 21, 1989
    Assignee: Hoechst Celanese Corporation
    Inventor: Dana Durham
  • Patent number: 4741989
    Abstract: A developer for positive photoresists which can improve the sensitivity and resolution of the resist is disclosed. The developer comprises an aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, and at least one development modifier selected from the group consisting of water-soluble aliphatic ketones, cyclic ethers, and tertiary amines, and optionally, at least one another development modifier selected from the group consisting of water-soluble primary amines and secondary amines.
    Type: Grant
    Filed: May 28, 1986
    Date of Patent: May 3, 1988
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kenji Niwa, Ichiro Ichikawa
  • Patent number: 4714670
    Abstract: Emulsion developers for diazo-sensitized printing plates are disclosed which are characterized by an oil phase containing a partially water-soluble aliphatic cyclic carbonate having the formula: ##STR1## where n is an integar from 0-2, and Z is selected from hydrogen, C.sub.1 -C.sub.3 alkyl, hydroxyl alkyl or chloroalkyl, chlorine, hydroxy or phenyl. The preferred carbonate is propylene carbonate.
    Type: Grant
    Filed: June 9, 1986
    Date of Patent: December 22, 1987
    Assignee: Imperial Metal & Chemical Company
    Inventors: Luigi Amariti, Llandro C. Santos
  • Patent number: 4711836
    Abstract: Disclosed is an aqueous developing solution containing a quaternary ammonium hydroxide developing agent, and as an additive an effective amount of a select compound which is either 1,3,5-trihydroxy benzene, 4-methylesculetin or a novolak-type resin. The aqueous developing solution is particularly useful in developing an imagewise-exposed layer of a positive-working photoresist composition containing a novolak-type resin and a photosensitive agent. In such application, it has been found that the developing solution more effectively removes the exposed portions of the photoresist composition without leaving a residue of exposed photoresist composition at the interface of the edges of the unexposed portions of the photoresist composition and the oxidized silicon substrate.
    Type: Grant
    Filed: August 11, 1986
    Date of Patent: December 8, 1987
    Assignee: Olin Hunt Specialty Products, Inc.
    Inventor: Lawrence Ferreira
  • Patent number: 4610953
    Abstract: The invention provides an aqueous alkaline developer solution for a positive-type photoresist layer for pattern-wise treatment of the surface of a substrate, e.g., semiconductor wafer. The developer solution contains a tetraalkyl ammonium hydroxide, e.g., tetramethyl ammonium hydroxide, and a trialkyl hydroxyalkyl ammonium hydroxide, e.g., trimethyl hydroxyethyl ammonium hydroxide, as the essential ingredients and the temperature dependency of the development performance thereof is noticeably smaller than that of conventional developer solutions with respect to properties of the sensitivity of the photoresist and the thickness reduction of the photoresist layer in the unexposed areas, by virtue of the compensating temperature dependencies for these properties of these two ingredients for each other.
    Type: Grant
    Filed: May 29, 1984
    Date of Patent: September 9, 1986
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Koichiro Hashimoto, Shirushi Yamamoto, Hisashi Nakane, Akira Yokota
  • Patent number: 4576899
    Abstract: A developer is provided for lithographic plates or the like having a layer including a diazonium material, which developer enhances the effectiveness of the photolysis to which the plate had been subjected, with the result that the exposure time needed for the plate is substantially reduced. The developer, which thus enhances the apparent photospeed of the plate, includes an insolubilizing reactant that reacts with diazonium groups of diazonium materials on the plate that were not removed by photolysis during exposure in order to decrease the solubility of the diazonium material.
    Type: Grant
    Filed: May 1, 1984
    Date of Patent: March 18, 1986
    Assignee: Imperial Metal & Chemical Company
    Inventors: Luigi Amariti, Llandro C. Santos
  • Patent number: 4576892
    Abstract: A presensitized plate adapted for use in lithography comprising a support member with a metal surface, e.g. aluminum metal, and overlying layer containing a diazo compound. In accordance with this invention, the relative exposure sensitivity of the diazo compound is improved by pretreatment to accelerate its reactivity in the presence of actinic light. One method of pretreatment involves preheating the diazo compound to a temperature above about C. up to about C. The improved lithographic plate and the process of preparing plate are claimed.
    Type: Grant
    Filed: March 12, 1985
    Date of Patent: March 18, 1986
    Assignee: Polychrome Corporation
    Inventors: Eugene Golda, Alan Wilkes
  • Patent number: 4544627
    Abstract: A negative-working image forming process which comprises uniformly exposing a photosensitive material comprising a support having thereon a sensitive layer comprising (i) an o-quinonediazide compound and (ii) a second compound, to actinic radiation which is able to convert the o-quinonediazide compound to the corresponding indenecarboxylic acid compound, and subsequent to said uniformly exposing imagewise exposing said exposed photosensitive material to a laser beam to thereby render the indenecarboxylic acid compound of the imagewise exposed areas convert to the corresponding indene compound and developing with an alkaline developing solution to dissolve out the unexposed area to the laser beam, wherein said second compound reduces the rate of dissolution of the laser exposed areas in the developing solution by converting the indenecarboxylic acid to the corresponding indene compound, whereby said image results.
    Type: Grant
    Filed: November 3, 1983
    Date of Patent: October 1, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yonosuke Takahashi, Hiromichi Tachikawa, Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4436804
    Abstract: This invention relates to novel condensation products, novel light-sensitive condensation products of aromatic diazonium salts, processes for preparation thereof, and to light-sensitive reproduction materials, which latter comprise a support having a reproduction layer containing at least one of the novel light-sensitive products. The light-sensitive condensation products are prepared by first homo-condensing non-diazo containing monomers of the structure R--M--R to form an oligomer. The oligomer is next condensed with an aromatic diazonium salt form the desired novel light-sensitive condensation product. R is a reactive substituent capable of undergoing condensation reactions in acid medium. M is selected from the group consisting of aromatic hydrocarbons, diaryl ethers, diaryl sulfides, diaryl amines, diaryl sulfones, diaryl ketones and diaryl diketones. The resulting novel light-sensitive condensation products have approximately four times the speed of prior art compounds.
    Type: Grant
    Filed: March 18, 1982
    Date of Patent: March 13, 1984
    Assignee: American Hoechst Corporation
    Inventor: John E. Walls
  • Patent number: 4394433
    Abstract: A novel light sensitive, heat developable imaging system incorporating a diazonium salt and a leuco dye in a binder is disclosed.
    Type: Grant
    Filed: July 23, 1981
    Date of Patent: July 19, 1983
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Kenneth G. Gatzke
  • Patent number: 4391894
    Abstract: A method for preparing a substantially uniformily dyed photosensitive composition useful in the reprographic arts, and compositions useful therefor. A water soluble basic dye is reacted with an organic acid, or an ammonium or alkali metal salt thereof which is preferably monofunctional and the reaction product is substantially uniformly dissolved in a photosensitive diazo composition to impart the desired dye color thereto. The resultant dye colored photosensitive composition may then be coated upon a suitable support, for example, a film or metal sheet, to provide a photosensitized product useful in the reprographic arts, which possesses substantially uniform color characteristics and extended shelf life.
    Type: Grant
    Filed: August 28, 1981
    Date of Patent: July 5, 1983
    Assignee: Polychrome Corporation
    Inventors: Ken-ichi Shimazu, Albert Deutsch
  • Patent number: 4362806
    Abstract: Photographic elements, multicolor filters and receivers are disclosed having supports providing microvessels for materials such as radiation-sensitive materials, imaging materials, mordants, silver precipitating agents and materials which are useful in conjunction with these materials. Processes of forming microvessels and introducing materials therein are also disclosed. Processes of forming images are disclosed employing microvessel containing elements. Image transfer processes are disclosed for producing one or a combination of silver and multicolor subtractive primary images alone or in combination with multicolor additive primary images.
    Type: Grant
    Filed: September 8, 1980
    Date of Patent: December 7, 1982
    Assignee: Eastman Kodak Company
    Inventor: Keith E. Whitmore
  • Patent number: 4343884
    Abstract: One component diazotype material is imagewise exposed and developed odorless and curlfree with 0.6-4.5 g/m.sup.2 per square meter of a substantially water free liquid developer in a pressure development or transfer roller apparatus.
    Type: Grant
    Filed: December 29, 1980
    Date of Patent: August 10, 1982
    Assignee: Andrews Paper & Chemical Co., Inc.
    Inventors: Peter Muller, Henry Mustacchi
  • Patent number: 4287288
    Abstract: A method of making a presensitized lithographic plate is disclosed wherein a steel support having a tin-plated layer is depassivated and coated with a photosensitive product. Depassivation is accomplished by immersion of the support in an electrolytic bath of sodium carbonate. The electrolysis is performed with the support as a cathode and reversed so that the support is an anode of the bath. Preferably, the bath is an aqueous solution of 50 grams per liter of sodium carbonate at a temperature of C. with a current density of the bath being approximately 2.5 amperes per dm.sup.2. It is also contemplated that the depassivated tin-plated layer may be coated with copper before application of the photosensitive product. This can be accomplished by immersion in an electrolytic bath of copper cyanide. Preferably, the copper cyanide bath is at a temperature of C. with immersion occurring for approximately 3 minutes with the support in the cathode position and having a current density of 2.
    Type: Grant
    Filed: February 8, 1979
    Date of Patent: September 1, 1981
    Assignee: Rhone-Poulenc-Graphic
    Inventors: Marcel Pigeon, Yannick de Maquille
  • Patent number: 4286041
    Abstract: A composition and process for developing diazotype material utilizes a developing liquid comprising a buffered, aqueous solution of an azo-coupling component having a pH between 5.5 and 8 and, as an additive compound, sorbic acid, an alkali metal salt, ammonium salt, or magnesium salt of sorbic acid or mixtures of the same. The process produces a clear copy image more quickly than a process in which the developing liquid does not contain the additive compound and, when the azo-coupling component is a mixture of phloroglucinol and resorcinol, forms a neutrally black image. The additive compound is added in an amount of 10 to 80%, and preferably 30 to 60%, by weight, of the maximum amount soluble in the solution at room temperature.
    Type: Grant
    Filed: March 1, 1979
    Date of Patent: August 25, 1981
    Assignee: Oce-van der Grinten
    Inventor: Wilhelmus J. M. van de Vorle
  • Patent number: 4284704
    Abstract: Imaging means, such as a tetrazolium salt, capable of reduction to form a visible image is present in a radiation-sensitive layer in combination with a photoreductant incorporating one or more labile hydrogen atoms and capable of producing a reducing agent precursor in radiation-struck areas of the layer. An image is produced in the layer by processing the layer after imagewise exposure to actinic radiation.
    Type: Grant
    Filed: September 29, 1978
    Date of Patent: August 18, 1981
    Assignee: Eastman Kodak Company
    Inventors: James C. Fleming, Joseph W. Manthey, Ralph T. Brongo
  • Patent number: 4268600
    Abstract: A photochemical color-printing process for textile articles wherein a photosensitive triazene and azo dye coupling agent are applied to surface of textile article, the coated textile is exposed to light with a negative image, unreacted chemical products are removed by washing and rinsing the coated textile article after imaging, and then the coated textile article is dried.
    Type: Grant
    Filed: December 1, 1978
    Date of Patent: May 19, 1981
    Assignee: Issec and Tissages de Soieries Rennis
    Inventors: Jean J. Robillard, Claude R. Riou
  • Patent number: 4220701
    Abstract: A method of photographic trichromatic printing comprises the steps ofA. applying to the substrate a photosensitive emulsion comprising(a) a binder;(b) three types of grains of semiconductor oxides dispersed in the binder, each adapted to desorb OH.sup.- ions under the action of a primary color radiation; and either(c) a diazo system comprising a diazonium salt and three couplers each being adsorbed onto, or dispersed in the immediate vicinity of, one of said three types of grain; or(d) a diazo system comprising a coupler and three diazonium salts each being adsorbed onto, or dispersed in the immediate vicinity of, one of said three types of grain;B. exposure,C. development by heating; andD. decomposition of unreacted diazonium salts by exposure to UV light, to fix the image.An emulsion so produced and substrates carrying such an emulsion are also produced.
    Type: Grant
    Filed: May 1, 1979
    Date of Patent: September 2, 1980
    Assignee: Roval S.A.
    Inventor: Jean J. Robillard
  • Patent number: 4215041
    Abstract: Substituted amino-benzene diazonium compounds particularly useful for the preparation of lithographic printing plates, a process for the preparation of this compound and printing plate, and for the use of the plate; and a lithographic plate presensitized with this compound, are described.
    Type: Grant
    Filed: July 12, 1978
    Date of Patent: July 29, 1980
    Assignee: Eastman Kodak Company
    Inventors: Georges A. Phlipot, Jacques R. G. Haeck, Simone J. Kempen
  • Patent number: 4196003
    Abstract: A light-sensitive copying layer containing an o-quinone-diazide compound and at least one of a secondary amine and a tertiary amine.
    Type: Grant
    Filed: February 2, 1977
    Date of Patent: April 1, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masaru Watanabe
  • Patent number: 4195998
    Abstract: A radiation-sensitive element is disclosed including a radiation-sensitive layer comprised of a cobalt(III)complex and a photoreductant. A process is disclosed in which the photoreductant is converted to a reducing agent by exposure to electromagnetic radiation longer than 300 nanometers. The reducing agent is then reacted with a cobalt(III)complex. Images can be recorded directly within the radiation-sensitive layer or in a separate image-recording element or layer by use of the residual cobalt(III)complex not exposed or one or more of the reaction products produced by exposure. By using the ammonia liberated from ammine ligand-containing cobalt(III)complexes on exposure in combination with imagewise and uniform exposures, positive or negative images can be formed in diazo image-recording layers or elements associated with the radiation-sensitive layer.
    Type: Grant
    Filed: October 27, 1977
    Date of Patent: April 1, 1980
    Assignee: Eastman Kodak Company
    Inventors: Anthony Adin, James C. Fleming