Polymeric Azide Patents (Class 430/195)
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Patent number: 11281103Abstract: A composition for forming an upper layer film is applied onto a resist film formed using an actinic ray-sensitive or radiation-sensitive resin composition, and includes a resin X and a compound A having a radical trapping group. A pattern forming method includes applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film, applying the composition for forming an upper layer film onto the resist film to form an upper layer film on the resist film, exposing the resist film having the upper layer film formed thereon, and developing the exposed resist film using a developer including an organic solvent to form a pattern.Type: GrantFiled: September 11, 2017Date of Patent: March 22, 2022Assignee: FUJIFILM CorporationInventors: Naoya Hatakeyama, Naoki Inoue, Naohiro Tango, Michihiro Shirakawa, Akiyoshi Goto
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Patent number: 9508942Abstract: A charge transporting, liquid crystal photoalignment material comprising a charge transporting moiety connected through covalent chemical bonds to a surface derivatizing moiety, and a photoalignment moiety connected through covalent chemical bonds to a surface derivatizing moiety.Type: GrantFiled: February 16, 2009Date of Patent: November 29, 2016Assignee: Lomox LimitedInventor: Gene Carl Koch
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Patent number: 7695875Abstract: The invention pertains to a photo-sensitive composition which comprises a photochemical initiator, a polyacid or a salt thereof, and a poly(3,4-alkylenedioxythiophene) wherein the alkylene moiety is —(CH2)n-, n being an integer from 1 to 3, or 1,2-cyclo-hexylene, which may optionally be substituted, characterized in that the photochemical initiator is a water-soluble polymer comprising at least two azide or diazonium groups. Preferably, the water-soluble polymer is chemically stable at pH 6 or less, more preferably at pH 2 or less.Type: GrantFiled: February 5, 2003Date of Patent: April 13, 2010Assignee: Koninklijke Philips ElectronicsInventor: Fredericus Johannes Touwslager
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Patent number: 7285363Abstract: A method for crosslinking one or more molecules comprises crosslinking the one or more molecules with a photactivatable crosslinker by one-photon or multi-photon excitation, wherein the crosslinker comprises at least two photoactive groups linked by a bridging moiety, and further wherein the point volume of the activation has at least one dimension of less than about 1 micron. The method is of particular utility for water-soluble molecules, particularly biologically active water-soluble molecules.Type: GrantFiled: November 10, 2003Date of Patent: October 23, 2007Assignee: The University of ConnecticutInventors: Paul J. Campagnola, Amy R. Howell, Jun Wang, Steven L. Goodman
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Patent number: 6821692Abstract: The present invention relates to novel thin layers for microsystem techniques and microstructuring. It is an object of the invention to provide thin layers which can be manufactured under less problems and more economically than the previous conventional layers, and which permit the use of existing technologies for microstructuring. The object is realized in that the thin layer is formed of an enzymatically degradable biopolymer in a range of layer thicknesses of from 30 nm to 3 &mgr;m. Biopolymeric thin layers manufactured according to the invention permit their application, after a respective structurizing, as test assays or in setting up substance libraries.Type: GrantFiled: February 4, 1999Date of Patent: November 23, 2004Assignee: Clondiag Chip Technologies GmbHInventors: Eugen Ermantraut, Johann Michael Köhler, Torsten Schulz, Klaus Wohlfart, Stefan Wölfl
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Patent number: 6605406Abstract: A photosensitive laminate structure including a carrier layer and a photosensitive layer is described. The photosensitive layer includes a polymeric photosensitive resin composition containing at least one cross-linkable unit represented by the formula: wherein X is an organic moity and Y is selected from the following group: wherein Z is selected from at least one of lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, and tetraalkylammonium.Type: GrantFiled: April 27, 2001Date of Patent: August 12, 2003Assignee: The Chromaline CorporationInventors: Kyle Johnson, Toshifumi Komatsu, Jeremy William Peterson
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Patent number: 6596460Abstract: A copolymer useful in radiation sensitive compositions for lithographic printing plates comprises the units A, B, C and D, wherein A is present in an amount of 0.5 to 30 wt.-% and is of the formula wherein R is hydrogen, C1-C4 alkyl, —CH═COOH or B is present in an amount of 5 to 35 wt.-% and is of the formula C is present in an amount of 10 to 55 wt.Type: GrantFiled: December 29, 2000Date of Patent: July 22, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Hans-Joachim Timpe, Ursula Müller
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Patent number: 6531257Abstract: Provided is a photosensitive copper paste permitting the formation of a fine and thick copper pattern having high adhesion to a substrate, and having excellent preservation stability without causing gelation, and a method of forming a copper pattern, a circuit board and a ceramic multilayer substrate using the photosensitive copper paste. The photosensitive copper paste includes a mixture of an organic binder having an acid functional group, a copper powder and a photosensitive organic component. The copper powder has a surface layer having a thickness of at least 0.1 &mgr;m from the surface composed CuO as a main component. The copper powder also has an oxygen content of about 0.8% to 5% by weight.Type: GrantFiled: November 30, 2001Date of Patent: March 11, 2003Assignee: Murata Manufacturing Co. LtdInventor: Masahiro Kubota
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Publication number: 20020115014Abstract: A photosensitive laminate structure including a carrier layer and a photosensitive layer is described.Type: ApplicationFiled: April 27, 2001Publication date: August 22, 2002Inventors: Kyle Johnson, Toshifumi Komatsu, Jeremy William Peterson
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Publication number: 20020106577Abstract: Provided is a photosensitive copper paste permitting the formation of a fine and thick copper pattern having high adhesion to a substrate, and having excellent preservation stability without causing gelation, and a method of forming a copper pattern, a circuit board and a ceramic multilayer substrate using the photosensitive copper paste. The photosensitive copper paste includes a mixture of an organic binder having an acid functional group, a copper powder and a photosensitive organic component. The copper powder has a surface layer having a thickness of at least 0.1 &mgr;m from the surface composed CuO as a main component. The copper powder also has an oxygen content of about 0.8% to 5% by weight.Type: ApplicationFiled: November 30, 2001Publication date: August 8, 2002Applicant: Murata Manufacturing Co., Ltd.Inventor: Masahiro Kubota
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Publication number: 20020102397Abstract: A thermosensitive stencil paper having a thermoplastic resin film and a porous resin layer which is provided on the thermoplastic resin film by coating a porous resin layer formation coating liquid including a water-in-oil emulsion of a resin on the thermoplastic resin film and drying the coating liquid. In addition, the method of producing the above-mentioned thermosensitive stencil paper is also disclosed.Type: ApplicationFiled: January 30, 2002Publication date: August 1, 2002Inventors: Fumiaki Arai, Takehiko Iwaoka, Yuji Natori, Masanori Rimoto
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Publication number: 20020090566Abstract: A polyvinyl acetal copolymer compound comprises the units A, B, C and D, wherein A is present in an amount of 0.5 to 30 wt.Type: ApplicationFiled: December 29, 2000Publication date: July 11, 2002Applicant: Kodak Polychrome Graphics LLC.Inventors: Hans-Joachim Timpe, Ursula Muller
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Patent number: 6368774Abstract: A radiation sensitive composition comprising (A), a mixture of an isoindolinone pigment and a yellow organic pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.Type: GrantFiled: June 2, 2000Date of Patent: April 9, 2002Assignee: JSR CorporationInventors: Kouichi Sakurai, Hiroaki Nemoto, Atsushi Kumano
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Publication number: 20020039639Abstract: An ink-jet recording material having on at least one surface of a base paper at least one ink-receiving layer comprising pigment and binder, with the ink-receiving layer having a rough texture specified by a surface roughness of at least 9.0 &mgr;m when measured with a PARKER PRINT-SURF measurement device (PPS) under a soft packing condition of 5 kgf/cm2, a surface roughness of at least 7.0 &mgr;m when measured with PPS under a soft packing condition of 10 kgf/cm2, a center-line average roughness (Ra) of at least 3.0 &mgr;m and an Oken-type smoothness of at most 30 seconds, thereby creating an atmosphere of paintings or calligraphic works in the images printed thereon.Type: ApplicationFiled: February 2, 2001Publication date: April 4, 2002Inventors: Noboru Kondo, Teiichi Otani, Atsushi Ono, Hiroyuki Onishi, Masaya Shibatani
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Publication number: 20010044075Abstract: A barrier rib for an EL display element. The rib is formed from the radiation sensitive resin composition containing (A) an alkali soluble resin, (B) a polymerizable compound having an ethylenically unsaturated bond, and (C) a radiation sensitive polymerization initiator.Type: ApplicationFiled: April 24, 2001Publication date: November 22, 2001Applicant: JSR CORPORATIONInventors: Isao Nishimura, Masayoshi Suzuki, Masayuki Endo
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Publication number: 20010036599Abstract: A pattern forming material includes a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing the binary copolymer with another group: 1Type: ApplicationFiled: April 16, 2001Publication date: November 1, 2001Applicant: Matsushita Electric Industrial Co., Ltd.Inventors: Takahiro Matsuo, Masayuki Endo, Masamitsu Shiri, Masahiro Tsunooka
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Patent number: 6306556Abstract: A pattern forming material includes a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing the binary copolymer with another group: wherein R1 indicates a hydrogen atom or an alkyl group; R2 and R3 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group or together indicate a cyclic alkyl group, a cyclic alkenyl group, a cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group; R4 indicates a hydrogen atom or an alkyl group; x satisfies a relationship of 0<x<1; and y satisfies a relationship of 0<y<1.Type: GrantFiled: April 18, 2000Date of Patent: October 23, 2001Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Takahiro Matsuo, Masayuki Endo, Masamitsu Shirai, Masahiro Tsunooka
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Patent number: 6140019Abstract: A radiation sensitive composition comprising (A) a colorant containing a quinacridone pigment, a mixture of an isoindolinone pigment and a yellow organic pigment or a mixture of copper phthalocyanine blue and a green pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.Type: GrantFiled: July 23, 1998Date of Patent: October 31, 2000Assignee: JSR CorporationInventors: Kouichi Sakurai, Hiroaki Nemoto, Atsushi Kumano
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Patent number: 6090525Abstract: An actinic radiation sensitive polymer composition containing(a) a polyimide precursor obtainable by the interaction of an amine compound having a photocrosslinking group with carboxyl groups of a poly(amic acid) chain, and(b) a photoinitiator and/or photosensitizer,in which the degree of imidization Ia is 0.03.ltoreq.Ia.ltoreq.0.6, has the characteristic features of both good stability of viscosity with lapse of time and good photosensitive performance.Type: GrantFiled: May 18, 1998Date of Patent: July 18, 2000Assignee: Toray Industries, Inc.Inventors: Tomoyuki Yuba, Yoshihiro Ishikawa, Masaya Asano
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Patent number: 6054251Abstract: The present invention provides a visible laser-curable resist composition which contains at least one radical-protecting compound selected from a phosphorous acid ester compound and an aromatic compound having N,N-dimethylamino group bonded to the carbon atom forming the aromatic ring and which is free from the hindrance of curing caused by deactivation of radical by oxygen and has excellent curability, and a process for formation of a resist pattern using the above composition.Type: GrantFiled: September 25, 1997Date of Patent: April 25, 2000Assignee: Kansai Paint Co., Ltd.Inventors: Genji Imai, Hideo Kogure
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Patent number: 6027849Abstract: This invention provides an imageable element comprising a substrate having on at least one major surface thereof a layer of energy-sensitive material that is capable of being developed to form a relief image upon exposure to electromagnetic radiation having a wavelength in the ultraviolet-visible-infrared range (i.e., a wavelength ranging from 150 to 1500 nm). This invention also provides methods for imaging the imageable elements of this invention. The energy-sensitive materials suitable for this invention comprise polymers containing azido groups.Type: GrantFiled: March 23, 1992Date of Patent: February 22, 2000Assignee: Imation Corp.Inventor: Dennis E. Vogel
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Patent number: 6020093Abstract: The photosensitive compound of the present invention contains the following unit: ##STR1## and is particularly expressed by the following formula: ##STR2## Different photosensitive resin compositions can be prepared from this novel photosensitive resin compound, and the resulting photosensitive resin compositions do not raise the problem of environmental pollution, exhibit high resolution, possess a high level of sensitivity, and exhibit excellent adhesion with substrates, coating characteristics and storage stability.Type: GrantFiled: May 13, 1998Date of Patent: February 1, 2000Assignee: Toyo Gosei Kogyo, Ltd.Inventors: Toru Shibuya, Jian Rong Xie, Noriaki Tochizawa
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Patent number: 5866296Abstract: A photosensitive resin composition includes a polymer compound having a component of Formula (I) and a sensitizer having a cationic group in the molecule: ##STR1## (wherein X denotes a cationic species, and n is 0, 1 or 2.) The photosensitive resin composition is high in sensitivity, good in storage stability, and easy to produce, and is suitable for use in a screen printing plate, formation of black matrix or phosphor pattern of a color cathode-ray tube, a CCD or LCD color filter, a printing color proof, and various etching resists.Type: GrantFiled: April 25, 1997Date of Patent: February 2, 1999Assignee: Toyo Gosei Co., Ltd.Inventors: Toru Shibuya, Noriaki Tochizawa, Mitsuharu Miyazaki, Hideo Kikuchi
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Patent number: 5846451Abstract: A crosslinking type liquid crystal polymer, an oriented crosslinking film thereof, and a method of producing the oriented crosslinking film are disclosed. The crosslinking type liquid crystal polymer comprises a liquid crystal polymer containing a polyfunctional azide compound represented by the following formula (A);R.sup.1 --(N.sub.3).sub.n (A)wherein R.sup.1 represents an organic group and n represents an integer of from 1 to 5.Type: GrantFiled: November 26, 1996Date of Patent: December 8, 1998Assignee: Nitto Denko CorporationInventors: Shusaku Nakano, Amane Mochizuki, Hironori Motomura, Kyoko Izumi
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Patent number: 5725978Abstract: The improved water-soluble photosensitive resin composition comprises a high-polymer compound represented by the general formula(I): ##STR1## (where X is Na, K or NH.sub.4) and a water-soluble polymer which is either polyvinylpyrrolidone or a copolymer of vinylpyrrolidone and vinylimidazole or both. The composition is applied to a substrate, exposed through a mask pattern and developed to form a photocured pattern and, thereafter, a light absorber is applied to the entire surface of the substrate and dried, followed by stripping away the photocured pattern and the overlying light absorber to form a black matrix pattern. The composition is suitable for use as a photoresist in the manufacture of black matrices as on color CRTs and capable of efficient formation of photocured patterns with high sensitivity by shorter times and lower intensities of exposure. In addition, the composition adheres strongly to glass substrates and is capable of pattern formation as thin film that is faithful to the mask pattern used.Type: GrantFiled: January 24, 1996Date of Patent: March 10, 1998Assignees: BASF Aktiengesellschaft, Toyo Ohka Kogyo Co., Ltd.Inventor: Shozo Miyazawa
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Patent number: 5705309Abstract: An infrared imaging composition comprises three essential components: a photocrosslinkable polymeric binder having pendant photopolymerizable olefinic double bonds, a polyazide photoinitiator and an infrared absorbing compound. These compositions are useful in photosensitive elements such as lithographic printing plates that can be used to provide images using lasers, followed by development.Type: GrantFiled: September 24, 1996Date of Patent: January 6, 1998Assignee: Eastman Kodak CompanyInventors: Paul Richard West, Jeffery Allen Gurney
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Patent number: 5650257Abstract: A radiation sensitive device comprising a substrate carrying a radiation sensitive layer is coated with a discontinuous covering layer which is more light sensitive than the radiation sensitive layer. The covering layer is formed by spraying and assists in improving vacuum drawdown during image-wise exposure of the device without having a deleterious affect on the exposure and development characteristics of the device.Type: GrantFiled: October 21, 1988Date of Patent: July 22, 1997Assignee: Vickers PLCInventor: Graham Philip Cooper
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Patent number: 5593814Abstract: A device for controlling cell arrangement having a pattern composed of a cell adhesive surface and a cell non-adhesive surface, which has a good selectivity of cell adhesion and which can provide a fine pattern of cells in high resolution by culturing cells in a usual manner.Type: GrantFiled: September 19, 1994Date of Patent: January 14, 1997Assignee: Kanegafuchi kagaku kogyo Kabushiki KaishaInventors: Takehisa Matsuda, Kazuhiko Inoue, Nobutaka Tani
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Patent number: 5585225Abstract: A lithographic coating and method of framing a lithographic image are disclosed. The method comprises coating at least a portion of a surface of an article with a radiation-crosslinkable polymer, and exposing the coated surface to a pattern of radiation to crosslink the polymer in a lithographic image. The functionalized polymer is a copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene, wherein the para-alkylstyrene is functionalized with a radiation reactive group at the para-alkyl group of the para-alkylstyrene.Type: GrantFiled: October 27, 1994Date of Patent: December 17, 1996Assignee: Exxon Chemical Patents Inc.Inventors: Jay D. Audett, Kenneth O. McElrath
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Patent number: 5472823Abstract: A photosensitive resin composition comprising, as its main ingredient, a poly(amic acid) resin constituted of a diamino compound represented by formula: ##STR1## and optionally used other diamino compound and a tetracarboxylic acid dianhydride as its constituent monomers and/or a poly(amic acid) ester resin obtained by esterifying said poly(amic acid) resin and/or a polyimide resin obtained by a dehydrating or alcohol-eliminating ring-closure reaction of said poly(amic acid) resin or poly(amic acid) ester resin has an excellent developability and a high film strength and can form a relief patter of low thermal expansion.Type: GrantFiled: January 15, 1993Date of Patent: December 5, 1995Assignee: Hitachi Chemical Co., Ltd.Inventors: Hideo Hagiwara, Makoto Kaji, Hiroshi Nishizawa, Kenji Suzuki, Yasunori Kojima
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Patent number: 5446074Abstract: New photosensitive polyamic acid precursors are disclosed which have the formula: ##STR1## where Z is a tetravalent organic radical which contains at least one aromatic ring, Z' is a divalent organic radical which contains at least one aromatic ring, and R* is a photosensitive group. Particularly preferred compounds include BPDA-PDA and BPDA-ODA polyamic acid precursors. The precursor compositions within the practice of this invention are i-line, g-line, and i-/g-line active and show good photoresolution. The films formed exhibit excellent self-adhesion and adhesion to glass ceramic and silicon wafer substrates have low internal stress, a very low degree of solvent swelling, high thermal stability, and excellent mechanical properties such as high modulus/tensile strength and high elongation at break.Type: GrantFiled: December 17, 1993Date of Patent: August 29, 1995Assignee: International Business Machines CorporationInventors: George Czornyj, Moonhor Ree, Willi Volksen, Dominic C. Yang
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Patent number: 5424368Abstract: A photosensitive resin having at least one group as shown below in Chemical Formula (1) in a molecule. ##STR1## wherein n represents an integer from 1 to 10. Since the photosensitive resin has an azido group in a molecule having an adsorption region higher than 300 nm, the resin is highly sensitive. Therefore, an emulsion coating photo mask or a soda glass photo mask, which allows light permeation within the abosorption region of the azido group and is cheap in industry, can be used as the photo mask for the photosensitive resin of the invention. The photosensitive resin is particularly useful as a photo resist.Type: GrantFiled: February 3, 1994Date of Patent: June 13, 1995Assignee: Sanyo Chemical Industries, Inc.Inventors: Tadakazu Miyazaki, Masahide Mizumori, Miki Motomura
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Patent number: 5385804Abstract: A silicon-containing negative photoresist is used as the top imaging layer in a bilayer substrate patterning scheme. The photoresist is a single component resist in which the photoactive element is chemically bonded to the base polymer. In particular, an aromatic azide containing group is covalently bonded to the phenolic group of the poly(4-hydroxybenzyl)silsesquioxane (PHBS) via an esterification reaction. The new photoresist is easily synthesized and has the advantageous properties of aqueous base developability, excellent O.sub.2 RIE resistance, and high sensitivity to DUV, I-line and E-beam exposures.Type: GrantFiled: August 20, 1992Date of Patent: January 31, 1995Assignee: International Business Machines CorporationInventors: Jagannathan Premlatha, Harbans S. Sachdev, Ratnam Sooriyakumaran
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Patent number: 5278023Abstract: Laser-addressable thermal transfer materials for producing color proofs, printing plates, films, printed circuit boards, and other media are disclosed. The materials contain a substrate coated thereon with a propellant layer wherein the propellant layer contains a material capable of producing nitrogen (N.sub.2) gas at a temperature of preferably less than about 300.degree. C.; a radiation absorber; and a thermal mass transfer material. The thermal mass transfer material may be incorporated into the propellant layer or in an additional layer coated onto the propellant layer. The radiation absorber may be employed in one of the above-disclosed layers or in a separate layer in order to achieve localized heating with an electromagnetic energy source, such as a laser. Upon laser induced heating, the transfer material is propelled to the receptor by the rapid expansion of gas.Type: GrantFiled: November 16, 1992Date of Patent: January 11, 1994Assignee: Minnesota Mining and Manufacturing CompanyInventors: Richard E. Bills, William V. Dower, Thomas A. Isberg, Stanley C. Busman, Jeffrey C. Chang, Minyu Li, Hsin-hsin Chou
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Patent number: 5278022Abstract: A polymeric compound is derived from a polyhydric material and has pendant sulphonate groups of the general formula ##STR1## where X is an aliphatic, aromatic, carbocylic or heterocyclic group; Y is hydrogen, halogen or an alkyl, aryl, alkoxy, aryloxy or aralkyl group, CO.sub. --Z.sup.+, CO.sub.2 R or SO.sub.3 -Z.sup.+ ; Z.sup.+ is a cationic counter ion and R is hydrogen, alkyl, alkylene, aryl or aralkyl group.Type: GrantFiled: March 18, 1992Date of Patent: January 11, 1994Assignee: E. I. Du Pont de Nemours and CompanyInventors: John R. Wade, Robert A. W. Johnstone
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Patent number: 5254431Abstract: A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.Type: GrantFiled: November 23, 1992Date of Patent: October 19, 1993Assignee: Vickers plcInventors: Terence Etherington, Victor Kolodziejczyk
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Patent number: 5238777Abstract: A radiation-sensitive compound, which comprises a polymer including a plurality of azide-substituted aromatic ester groups and a plurality of carboxylic or sulphonic acid groups capable of imparting to the compound solubility in aqueous or alkaline medium. After image-wise exposure, the compound can be developed using an aqueous or alkaline developer. The compound is useful in the production of radiation sensitive plates for the manufacture of lithographic printing plates which can be baked to improve printing life.Type: GrantFiled: August 7, 1990Date of Patent: August 24, 1993Assignee: DuPont (U.K.) LimitedInventors: Rodney M. Potts, Terence Etherington, Jianrong Ren, Victor Kolodziejczyk
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Patent number: 5202227Abstract: A device for controlling cell arrangement having a pattern composed of a cell adhesive surface and a cell non-adhesive surface, which has a good selectivity of cell adhesion and which can provide a fine pattern of cells in high resolution by culturing cells in a usual manner.Type: GrantFiled: June 1, 1990Date of Patent: April 13, 1993Assignee: Kanegafuchi Kagaku Kogyo Kabushiki KaishaInventors: Takehisa Matsuda, Kazuhiko Inoue, Nobutaka Tani
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Patent number: 5063134Abstract: A photosensitive composition contains a polymer having a unit represented by formula I, and a photosensitive agent: ##STR1## wherein each of R.sub.1 to R.sub.4 represents a hydrogen atom, an alkyl group, an alkoxyl group, or a substituted or non-substituted allyl group, at least one of R.sub.1 to R.sub.4 being an alkyl groups having 1 to 10 carbon atoms and containing silicon, l represents a positive integer, and each of a and b represents an integer from 1 to 3, and c represents an integer from 0 to 2, a+b+c not exceeding 4.Type: GrantFiled: January 2, 1990Date of Patent: November 5, 1991Assignee: Kabushiki Kaisha ToshibaInventors: Rumiko Horiguchi, Shuzi Hayase, Yasunobu Onishi
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Patent number: 5024920Abstract: This invention relates to a process for forming a pattern using a photosensitive composition comprising a polymeric azide and a high-molecular weight copolymer or polymer. The photosensitive composition comprises a copolymer containing at least a water-soluble non-photosensitive monomeric unit having an electrolytic functional group, a monomeric unit having an azido group and an electrolytic functional group and a high-soluble high molecular weight copolymer or polymer which exhibits reciprocity law failure characteristic.Type: GrantFiled: May 23, 1989Date of Patent: June 18, 1991Assignee: Hitachi, Ltd.Inventors: Hajime Morishita, Nobuaki Hayashi, Saburo Nonogaki, Michiaki Hashimoto, Masato Ito, Masahiro Nishizawa, Kiyoshi Miura, Yoshiyuki Odaka
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Patent number: 4948693Abstract: This invention relates to positive working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process.Type: GrantFiled: August 29, 1988Date of Patent: August 14, 1990Assignee: Hoechst Celanese CorporationInventors: Richard L. Shadrach, Stephan J. W. Platzer, Gabor I. Koletar
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Patent number: 4869993Abstract: This invention relates to positive working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The element is composed of a substrate, colored photosensitive layer and adhesive layer. The adhesive layer contains an optical brightener compound which reduces residual yellow staining derived from the naphthoquinone diazide sensitizer.Type: GrantFiled: August 29, 1988Date of Patent: September 26, 1989Inventors: Wahib Farahat, Dennis J. Bellville, Richard L. Shadrach
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Patent number: 4849320Abstract: The invention provides a process for the production of an image which comprises(i) applying to a substrate a layer of a liquid composition comprising(A) a cationically polymerizable residue(B) a radiation-activated polymerization initator for (A)(C) a radiation-curable residue that is different from (A) and optionally(D) a radiation activated initiator for the cure of (C),(ii) subjecting the composition to actinic radiation having a wavelength at which initiator (B) is activated but at which the residue (C) and/or initiator (D) is not substantially activated, followed by heating, if necessary, so that (A) is polymerized and the layer of liquid composition is solidified, but remains curable,(iii) subjecting the solidified layer in a predetermined pattern to actinic radiation having a wavelength that is different from that of the radiation used in stage (ii) and at which the radiation-curable residue (C) and/or the initiator (D) is activated, such that in the exposed areas (C) is substantially cured, and(iv) reType: GrantFiled: April 30, 1987Date of Patent: July 18, 1989Assignee: Ciba-Geigy CorporationInventors: Edward Irving, Christopher P. Banks
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Patent number: 4632891Abstract: A process for the production of an image on a substrate comprises(i) inserting the substrate as an electrode into a liquid composition comprising(A) a cationically polymerizable material,(B) a polymerizing agent for (A) which is activated by an electric current, and(C) a photosensitive material,(ii) passing an electric current through the liquid composition between the substrate and another electrode, such that a photosensitive layer of essentially solid, polymerized material is deposited on the surface of the substrate,(iii) removing the substrate from the liquid composition,(iv) exposing the photosensitive layer to actinic radiation in a predetermined pattern so as to effect a difference in solubility between exposed parts and unexposed parts of the layer, and(v) removing more soluble parts of the layer by treatment with a solvent, leaving less soluble parts of the layer on the substrate.Type: GrantFiled: September 25, 1985Date of Patent: December 30, 1986Assignee: Ciba-Geigy CorporationInventors: Christopher P. Banks, Edward Irving
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Patent number: 4606937Abstract: A track recording support for recording devices is suggested with a support (10) made of paper or plastic on which a metallic coating (12) is mounted by means of evaporation and being able to be burned off by means of recording electrodes, in particular an aluminum coating. A lubricant in a finely dispersed form is added to contrast coating (11) for reducing of scratching and grinding traces on the surface of metal coating (12) which reaches metal coating (12) and the freely exposed surface thereof by means of diffusion. Preferably, the lubricant is fed to the contrast substance in a powdery form before the processing of the same. On the one hand, it acts in a physical point of view by a reduction of the slide friction on the surface and, on the other hand, in a chemical point of view in that it substantially prevents the build up of combustion residues from the contrast layer on the recording electrodes.Type: GrantFiled: January 30, 1985Date of Patent: August 19, 1986Assignee: Robert Bosch GmbHInventors: Manfred Rossler, Gerhard Winter, Hermann Stiltz
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Patent number: 4588669Abstract: A photosensitive lithographic plate comprising a hydrophilic substrate, a photosensitive diazo resin layer superposed on the substrate, and a layer of a photosensitive polyvinyl acetal resin containing an aromatic azide group in a side chain thereof and having an acid number of 10 to 100 and superposed on the diazo resin layer, and a method for the manufacture of this photosensitive lithographic plate.Type: GrantFiled: May 9, 1984Date of Patent: May 13, 1986Assignee: Fuji Chemicals Industrial Co., Ltd.Inventor: Takateru Asano
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Patent number: 4581313Abstract: A photosensitive composition containing a polymer, and a photosensitive material utilizing the composition are disclosed. The polymer, which may be in the form of a copolymer, includes a repeating unit of the formula (I): ##STR1## wherein Y is a divalent substituent; Z.sub.1 and Z.sub.2 independently each represents monovalent substituents; p and q are each 0 or an integer of 1 to 4; when p and q are each 2 or more, each of Z.sub.1 and Z.sub.2 may be the same or different; X.sup..crclbar. is an anion. The composition has high sensitivity and is capable of forming an image on a suitable photographic support without causing fog under incandescent lamps. The composition can be used to produce lithographic printing plates having high sensitivity as well as excellent ware resistance.Type: GrantFiled: December 1, 1983Date of Patent: April 8, 1986Assignee: Fuji Photo Film Co., Ltd.Inventors: Junji Minamizono, Toshiyuki Sekiya
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Patent number: 4547455Abstract: A process of forming a polyimide pattern on a base plate, which comprises exposing imagewise a layer of photosensitive polyimide precursor on the base plate, removing unexposed areas by developing and curing the resultant pattern of the polyimide precursor, characterized by employing a developer containing (A) at least one solvent selected from the group consisting of N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N,N-dimethylformamide, dimethylsulfoxide and .gamma.-butyrolactone, (B) methanol and (C) at least one solvent represented by the formula;R.sup.1 OCH.sub.2 CH.sub.2 OCH.sub.2 CH.sub.2 OR.sup.2wherein R.sup.1 is a hydrogen atom or R.sup.2 and R.sup.2 is an alkyl group having 1 to 4 carbon atoms.Type: GrantFiled: June 17, 1983Date of Patent: October 15, 1985Assignee: Toray Industries, Inc.Inventors: Hiroo Hiramoto, Masuichi Eguchi
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Patent number: 4522910Abstract: A novel photosensitive film structure comprises a generally continuous minor phase material and a generally discontinuous major phase material. The minor phase includes a photosensitive compound whose solubility relative to a selected solvent changes upon exposure to electrromagnetic radiation, while the major phase is not photosensitive nor soluble in the solvent. The two phases are uniformly interdispersed throughout the film structure. Imagewise exposure to electromagnetic radiation renders the film structure selectively permeable to the selected solvent, and, after development, the film structure exhibits the chemical and physical properties of the major phase material. The film structure finds varied application in the manufacture of graphic arts articles such as lithographi printing plates and photoresists.Type: GrantFiled: November 18, 1982Date of Patent: June 11, 1985Assignee: Napp Systems (USA), Inc.Inventor: Robert W. Hallman
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Patent number: 4500629Abstract: Images are prepared by a process in which a layer, supported on a substrate, of a liquid composition comprising(a) an anaerobically polymerizable material and(b) a photopolymerizable material is maintained in a substantially oxygen-free environment such that the composition solidifies. It is then exposed imagewise to actinic radiation and treated with a developer to remove parts of the layer which have not been struck by the radiation.The anaerobically polymerizable and photopolymerizable materials may be a mixture of two or more materials having these different functions, such as an acrylate ester with an azido compound, or the two functions may be combined in a single molecule. The products are suitable for use in producing printing plates and printed circuits.Type: GrantFiled: July 25, 1983Date of Patent: February 19, 1985Assignee: Ciba-Geigy CorporationInventors: Edward Irving, Terence J. Smith