Element Patents (Class 430/259)
  • Patent number: 10625334
    Abstract: A method of producing a relief image or mold from a liquid photopolymer resin, said method comprising the steps of: a) placing an image film onto an exposure glass; b) placing a cover film over the image film and drawing a vacuum c) placing substrate material on a bottom glass d) casting a liquid photopolymer resin layer onto the substrate material; d) laminating a flexible polyester sheet onto a backside of the liquid photopolymer resin layer as the liquid photopolymer resin layer is being cast onto the substrate material; and e) exposing the liquid photopolymer resin layer through the image film to selectively crosslink and cure the photopolymerizable resin layer and form a cured relief image, wherein said depth of the cured relief image is less than the height of the cast liquid photopolymerizable resin.
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: April 21, 2020
    Assignee: MACDERMID GRAPHICS SOLUTIONS, LLC
    Inventors: David A. Recchia, Ryan W. Vest
  • Patent number: 10509323
    Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: December 17, 2019
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ying-Hao Wang, Chia-Chi Chung, Han-Chih Chung, Yu-Xiang Lin, Yu-Shine Lin, Yu-Hen Wu, Han Wen Hsu
  • Patent number: 9746771
    Abstract: There is provided a laminate body which is capable of forming an excellent pattern on an organic semiconductor. A laminate body includes at least a water-soluble resin film and a resist film formed of a chemically amplified photosensitive resin composition on a surface of an organic semiconductor film in this order, in which the chemically amplified photosensitive resin composition contains a photoacid generator which is decomposed in an amount of 80% by mole or greater when exposed to light under the condition of 100 mJ/cm2 or greater at a wavelength of 365 nm, a mask pattern is formed by an exposed portion being hardly soluble in a developer containing an organic solvent, and the formed mask pattern is used as an etching mask.
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: August 29, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Yoshitaka Kamochi, Ichiro Koyama, Yu Iwai, Atsushi Nakamura
  • Patent number: 9123855
    Abstract: An underlayer is formed on a side wall 101a of a through hole 101 out of the side wall 101a of the through hole 101 and a substrate main surface, with a main surface having a low adhesion to a conductive layer disposed as an upper surface, and the conductive layer is formed on the substrate main surface and the side wall 101a of the through hole 101 on which the underlayer is formed, and the underlayer formed on the side wall 101a of the through hole 101 is selectively etched.
    Type: Grant
    Filed: November 22, 2011
    Date of Patent: September 1, 2015
    Assignee: HOYA CORPORATION
    Inventors: Takashi Fushie, Hajime Kikuchi
  • Patent number: 8846302
    Abstract: A method of forming a semiconductor structure includes forming a photoresist layer over a substrate. The photoresist layer includes a first material removable by a removal process. The first material at a guard band portion of the photoresist layer along an edge portion of the photoresist layer is converted to a second material. The second material is not removable by the removal process. Also, the first material at the edge portion of the photoresist layer is not converted to the second material. The guard band portion is farther from a periphery of the substrate than the edge portion. The removal process is performed to remove the first material after the conversion of the guard band portion.
    Type: Grant
    Filed: February 1, 2012
    Date of Patent: September 30, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: George Liu, Kuei Shun Chen
  • Patent number: 8034206
    Abstract: A method of fabricating a flexible display device, the method including applying a transparent adhesive layer on a carrier substrate, laminating a flexible substrate comprising a barrier layer on the transparent adhesive layer, forming a thin film transistor array on the flexible substrate, and separating the carrier substrate from the flexible substrate by irradiating a laser beam onto the barrier layer.
    Type: Grant
    Filed: September 9, 2008
    Date of Patent: October 11, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Myung-Hwan Kim, Nam-Seok Roh, Sang-Il Kim
  • Patent number: 8012288
    Abstract: A method of fabricating a flexible display device, the method including applying an adhesive layer including polyimide on a carrier substrate, laminating a flexible substrate on the adhesive layer, and separating the carrier substrate from the flexible substrate by irradiating a laser beam or light onto the adhesive layer.
    Type: Grant
    Filed: August 12, 2008
    Date of Patent: September 6, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Myung-Hwan Kim, Woo-Jae Lee, Hyung-Il Jeon, Myeong-Hee Kim
  • Patent number: 7866037
    Abstract: A metallization forming method comprises the steps of: patterning a silver halide emulsion on a surface of at least one side of a substrate in accordance with a desired metallization pattern to form a patterned emulsion layer; exposing the patterned emulsion layer; and thereafter developing the exposed patterned emulsion layer to form a patterned conductive silver layer having the metallization pattern.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: January 11, 2011
    Assignee: Fujifilm Corporation
    Inventors: Seiichi Inoue, Akira Ichiki
  • Patent number: 7261996
    Abstract: The present invention provides a halogen-free dry film photosensitive resin composition, which comprises (a) 10˜60 wt % of at least two kinds of acrylic resins having unsaturated carboxylic acid monomers as polymerized units; (b) 5˜20 wt % of a photosensitive resin having at least two (meth)acrylate groups; (c) 0.1˜15 wt % of a photoinitiator; and (d) 0.5˜20 wt % of a thermo-curing agent. The resin composition of the invention is suitable for use as a photoresist in the process of producing printed circuit boards. The resin composition of the invention is particularly suitable for use in the surface of printed circuit boards or semiconductor packages as a protective dry film solder mask.
    Type: Grant
    Filed: January 26, 2006
    Date of Patent: August 28, 2007
    Assignee: Eternal Chemical Co., Ltd.
    Inventor: Feng-Yi Wang
  • Patent number: 7247507
    Abstract: A method for forming a LOCOS layer in a semiconductor device includes steps of oxidizing a high voltage region of the semiconductor device to form a LOCOS layer in the high voltage region; and etching the LOCOS layer according to a pattern.
    Type: Grant
    Filed: December 30, 2005
    Date of Patent: July 24, 2007
    Assignee: Dongbu Electronics Co., Ltd.
    Inventor: Woong Je Sung
  • Patent number: 7223519
    Abstract: Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to a work piece to mark it and removed from the work piece by peeling.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: May 29, 2007
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor
  • Patent number: 7198884
    Abstract: The invention relates to a process for preparing a dry film resist by forming a photocurable resin composition onto a support film with a thickness of 1 to 50 ?m and optionally laminate a protective film onto the photocurable composition layer to obtain a dry film resist; whereby the photocurable resin is formed from a homogeneous mixture comprising (a) from 20–90 wt % of an alkaline soluble binder oligomer or polymer; (b) from 5 to 60 wt % of one or more photopolymerizable monomers which are compatible with the oligomers and polymers of component (a); (c) from 0.01 to 20% by weight of one or more photoinitiators; (d) from 0 to 20% by weight of additives and/or assistants; and (e) from 0.
    Type: Grant
    Filed: July 1, 2003
    Date of Patent: April 3, 2007
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Hidetaka Oka, Masaki Ohwa, James Philip Taylor
  • Patent number: 7153629
    Abstract: There are disclosed a releasing sheet comprising a substrate and a releasing agent layer which is installed by coating the substrate with a releasing agent liquid containing 1,4-polybutadiene and an antioxidant, and irradiating the coated layer with ultraviolet ray so that the layer is cured; and also a releasing sheet comprising in turn a substrate, an undercoat layer which is formed thereon and is composed of an elastic body, and a releasing agent layer which is installed on the undercoat layer by coating the same with a releasing agent liquid containing 1,4-polybutadiene and an antioxidant, and irradiating the layers with ultraviolet ray so that the layers are cured. Being of non-silicone base, the releasing sheets are excellent in releasability from a tacky adhesive agent layer and adhesiveness to the substrate.
    Type: Grant
    Filed: December 27, 2004
    Date of Patent: December 26, 2006
    Assignee: Lintec Corporation
    Inventors: Yasushi Sasaki, Daisuke Tomita
  • Patent number: 7144676
    Abstract: Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to a work piece to mark it and removed from the work piece by peeling.
    Type: Grant
    Filed: July 12, 2004
    Date of Patent: December 5, 2006
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor
  • Patent number: 7081324
    Abstract: An image transfer sheet is provided which comprises a support, a barrier layer, a dye sublimation ink layer and a polyester layer; wherein the image transfer sheet exhibits cold peel, warm peel and hot peel properties when transferred. A method for transferring an image to a receptor element using the image transfer sheet is also provided. More specifically, the invention relates to an image transfer sheet which can be applied to a receptor element, such as cotton or cotton/polyester blend fabrics or the like.
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: July 25, 2006
    Assignee: Foto-Wear, Inc.
    Inventors: Donald S. Hare, Scott A. Williams
  • Patent number: 7063925
    Abstract: The invention relates to a photographic article comprising a base material carrying at least one layer comprising a photographic image formed by combination of dyes formed from couplers wherein areas of said photo image are colored without dyes formed by couplers.
    Type: Grant
    Filed: June 20, 2003
    Date of Patent: June 20, 2006
    Assignee: Eastman Kodak Company
    Inventors: William T. Rochford, Robert P. Bourdelais, Mridula Nair
  • Patent number: 7056551
    Abstract: Disclosed is a protective transparent overcoat comprising a protective polymer and a surfactant compound having multiple non-end-group hydrogen bonding groups directly or indirectly bonded to the backbone chain of the surfactant compound. The coating enables simplified manufacturing of a thermal sublimation dye transfer donor of high quality.
    Type: Grant
    Filed: April 29, 2005
    Date of Patent: June 6, 2006
    Assignee: Eastman Kodak Company
    Inventors: Rukmini B. Lobo, David C. Boris, Scott A. Strong, Anita M. Fees
  • Patent number: 7008746
    Abstract: A polymeric composition comprising a film-forming binder and a wax emulsion. Optionally included is a retention aid. Also provided is a coated transfer sheet comprising a substrate and at least one release layer comprising the polymeric composition.
    Type: Grant
    Filed: September 12, 2003
    Date of Patent: March 7, 2006
    Assignee: Foto-Wear, Inc.
    Inventors: Scott Williams, Heather Penk, Heather Reid
  • Patent number: 6984424
    Abstract: Disclosed are a thermally transferable image protective sheet and a method for protective layer formation that can provide a protective layer which can protect an image of a record produced by a nonsilver photographic color hard copy recording method, can impart lightfastness and other properties to the record, and can realize a record having a glossy impression comparable to silver salt photographs. The thermally transferable image protective sheet comprises a support and a thermally transferable resin layer having a single-layer or multilayer structure stacked on the support so as to be separable from the support.
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: January 10, 2006
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Taro Suzuki, Daisuke Fukui, Masahiro Fujita
  • Patent number: 6942950
    Abstract: Disclosed is a protective transparent overcoat comprising a protective polymer and a surfactant compound having multiple non-end-group hydrogen bonding groups directly or indirectly bonded to the backbone chain of the surfactant compound. The coating enables simplified manufacturing of a thermal sublimation dye transfer donor of high quality.
    Type: Grant
    Filed: August 26, 2002
    Date of Patent: September 13, 2005
    Assignee: Eastman Kodak Company
    Inventors: Rukmini B. Lobo, David C. Boris, Scott A. Strong, Anita M. Fees
  • Patent number: 6916589
    Abstract: A method for applying an image to a receptor element, which comprises the steps of (i) providing a transfer sheet comprising a support having a first surface and a second surface, and a coating capable of receiving an image on the first surface of the support, (ii) imaging the coating, (iii) dry peeling the coating from the support in the absence of wet release prior to hand ironing, (iv) positioning the dry peeled coating on a receptor element having valleys or pores, (v) positioning a non-stick sheet on the dry peeled coating which is positioned on the receptor element having valleys or pores, and (vi) heating the non-stick sheet to drive the dry peeled coating into the receptor element having valleys or pores.
    Type: Grant
    Filed: July 29, 2003
    Date of Patent: July 12, 2005
    Assignee: Foto-Wear, Inc.
    Inventors: Donald S. Hare, Scott A. Williams
  • Patent number: 6913867
    Abstract: The present invention provides a negative photosensitive resin composition comprising (A) a photocurable resin having a photosensitive group or groups crosslinkable by light irradiation, (B) a photoacid generator and (C) a photosensitizer which is a benzopyran condensed ring compound capable of increasing photosensitivity to visible light with a wavelength of 480 nm or more, a negative photosensitive dry film prepared by applying the photosensitive resin composition to a surface of support film, followed by drying, to form a photosensitive resin layer, and a method of forming a pattern using the resin composition or the dry film.
    Type: Grant
    Filed: October 15, 2001
    Date of Patent: July 5, 2005
    Assignee: Kansai Paint Co., Ltd.
    Inventor: Genji Imai
  • Patent number: 6911294
    Abstract: A multicolor image forming material comprising: an image receiving sheet comprising an image receiving layer; and at least five heat transfer sheets different in color each comprising a substrate, a light-heat conversion layer and an image forming layer, each of the heat transfer sheets being adapted to be superposed on the image receiving sheet with the image forming layer facing the image receiving layer and irradiated with laser light to transfer the irradiated area of the image forming layer to the image receiving layer to record an image on the image receiving sheet, wherein the area of the recording has a size of 515 mm by 728 mm or larger, and at least one of the heat transfer sheets comprises titanium oxide as a colorant in the image forming layer thereof.
    Type: Grant
    Filed: August 29, 2003
    Date of Patent: June 28, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Shinichi Yoshinari
  • Patent number: 6878423
    Abstract: A transfer sheet comprises a support, and a transfer layer for receiving an ink, wherein the transfer layer is formed in the support by heating at a predetermined temperature and is separable from the support. The hot-melt adhesive particle comprises a first particle having a melting point more than the predetermined temperature and a second particle having a melting point not more than the predetermined temperature. The transfer layer may further comprise a film-forming resin component and a dye fixing agent. The hot-melt adhesive particle may comprise a polyamide-series particle. In particular, the average particle size of the first particle may be 3 to 100 mm. The transfer sheet is excellent in stability on delivery of a paper as well as can prevent the inside of the printer from staining.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: April 12, 2005
    Assignee: Daicel Chemical Industries, Ltd.
    Inventor: Hideki Nakanishi
  • Patent number: 6878500
    Abstract: Compositions and methods for the removal of patterned photodefinable materials, such as photoresists and/or photoimageable dielectric materials, from substrates are provided. Such compositions and methods are useful in the manufacture of electronic devices. Methods of reworking electronic device substrates by removing patterned photodefinable material from an underlying organic film are also provided.
    Type: Grant
    Filed: April 5, 2003
    Date of Patent: April 12, 2005
    Assignee: Marlborough,
    Inventors: Edward W. Rutter, Jr., Cuong Manh Tran, Edward C. Orr
  • Patent number: 6869743
    Abstract: There is disclosed a method of processing a light-sensitive material which comprises exposing a light-sensitive material having at least one light-sensitive layer on a support, and subjecting to development by a dipping system or a coating system, and then, peeling at least the light-sensitive layer off by bringing a peeling material into close contact with the light-sensitive material, wherein the peeling material is a material having a liquid-absorbing rate in which a liquid-absorption amount within 0.1 second after getting in contact with a liquid is 60% or more based on a liquid-absorption amount within 0.2 second after the same.
    Type: Grant
    Filed: November 15, 2000
    Date of Patent: March 22, 2005
    Assignee: Mitsubishi Paper Mills Limited
    Inventors: Shigeyoshi Suzuki, Yasuo Tsubai, Sadao Kuriu, Toshihito Maruyama, Kenji Hirata, Masato Asano, Masahiko Saikawa, Akira Furukawa
  • Patent number: 6855473
    Abstract: The present invention relates to a method for image formation using an intermediate transfer recording medium. An object of the present invention is to provide an intermediate transfer recording medium and a method for image formation which can yield a thermally transferred image possessing excellent various fastness properties even under severe service conditions, can transfer a protective layer onto an image on the object without transfer failure in an accurate and simple manner, and, in addition, can yield a highly lightfast image which is not deteriorated upon exposure to ultraviolet light. The intermediate transfer recording medium comprises: a sheet substrate provided with a resin layer; and a transparent sheet provided with a receptive layer, the sheet substrate provided with the resin layer having been put on top of the transparent sheet provided with the receptive layer so that the transfer sheet faces the resin layer.
    Type: Grant
    Filed: April 12, 2002
    Date of Patent: February 15, 2005
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Kozo Odamura, Katsuyuki Oshima, Takayuki Imai, Shinji Kometani, Masayasu Yamazaki
  • Patent number: 6830864
    Abstract: A method for transferring a transparent conductive film onto one surface of a sheet base material made of a plastic material, wherein the transparent conductive film as an object to be transferred is preliminarily formed on a substrate side which is superior in heat resistance to the plastic material, the transparent conductive film being sandwiched between a peelable layer which can be peeled off at the time of transfer and a protective film for protecting the transparent conductive film on the substrate side which is superior in heat resistance to the plastic material.
    Type: Grant
    Filed: December 20, 2001
    Date of Patent: December 14, 2004
    Assignee: Kyodo Printing Co., Ltd.
    Inventors: Ichiro Bekku, Tadahiro Furukawa, Akiyoshi Murakami, Kazumi Arai, Hisashi Sato
  • Patent number: 6815142
    Abstract: A method for forming resist patterns, and an overlying layer material and a semiconductor device used in the method for forming resist patterns, which can improve the dimensional uniformity of resist patterns by inhibiting the multiple interference of light beams within a resist film; improve the environmental resistance in a clean room or the like; and obtain resist patterns having rectangular sectional shapes by preventing the acid in the overlying layer material from diffusing into the resist. By using an overlying layer material containing a water-soluble low-molecular-weight acidic substance and a water-soluble photo base generator preventing the diffusion of the acidic substance into the resist, the base formed after exposure neutralizes the acids contained in the overlying layer material in nature, and the diffusion of the acid into the resist can be inhibited.
    Type: Grant
    Filed: May 31, 2000
    Date of Patent: November 9, 2004
    Assignee: Renesas Technology Corp.
    Inventors: Yoshika Kimura, Takeo Ishibashi
  • Patent number: 6790568
    Abstract: The present invention provides a photosensitive transfer material comprising a temporary support, a peelable layer, an alkali-soluble thermoplastic resin layer, an intermediate layer and a photosensitive resin layer that are disposed in this order, wherein the bonding strength between the peelable layer and the thermoplastic resin layer is the smallest of all the bonding strengths between neighboring layers.
    Type: Grant
    Filed: January 23, 2003
    Date of Patent: September 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Hidenori Goto
  • Patent number: 6773860
    Abstract: An image receiving sheet, in which the received image is further transferable to a final recording medium is disclosed, comprising a support having thereon a heat-softening layer, an interlayer and an image receiving layer, wherein the interlayer has a surface roughness (Ra) of 0.05 to 5 &mgr;m and the image receiving layer has a surface roughness (Ra) of 0.01 to 0.4 &mgr;m, and the surface roughness (Ra) of the interlayer being greater than that of the image receiving layer. An imaging process by use of the image receiving sheet is also disclosed.
    Type: Grant
    Filed: August 22, 2002
    Date of Patent: August 10, 2004
    Assignee: Konica Corporation
    Inventors: Takaaki Kuroki, Rieko Takahashi
  • Patent number: 6764804
    Abstract: The invention relates to an imaging element comprising a pragmatic imaging sheet comprising paper having a resin coat on each side, adhesively adhered to a carrier sheet with a pressure-sensitive adhesive, comprising at least one core layer of polyester and a rough lower surface layer.
    Type: Grant
    Filed: December 11, 2002
    Date of Patent: July 20, 2004
    Assignee: Eastman Kodak Company
    Inventors: Robert P. Bourdelais, Cheryl J. Kaminsky, John M. Palmeri, William Baum, Philip J. Smith, Timothy J. Giarrusso
  • Publication number: 20040126681
    Abstract: A photosensitive transfer material comprising a temporary support, a thermoplastic resin layer, an alkali-soluble intermediate layer, and an alkali-soluble photosensitive resin layer including a pigment in this order, wherein, when the thermoplastic resin layer and the intermediate layer are separated from each other at a separation speed of 1 m/min under an atmosphere of 25° C. and 30% RH, both an absolute value of a surface potential of the separated thermoplastic resin layer and that of the separated intermediate layer are no more than 5 kV; and a method for producing a color filter by using the photosensitive transfer material.
    Type: Application
    Filed: December 17, 2003
    Publication date: July 1, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Hideaki Ito, Akira Hatakeyama
  • Patent number: 6723199
    Abstract: A lamination method, which is a method in which a dry resist film, formed by providing a color resist layer on a base film, is cut based upon the length of a substrate in the feeding direction, and press-bonded onto the substrate, and then the color resist layer is transferred onto the substrate by separating the base film, is provided with the following steps: in the cutting process, cutting the film so that the rear end of the dry resist film, after the press-bonding, extrudes from the rear end of the substrate by a predetermined width; and cutting the dry resist film again at a position inside the rear end of the substrate prior to separating the base film after the dry resist film has been press-bonded so as to eliminate the portion of the dry resist film extruding from the substrate.
    Type: Grant
    Filed: June 13, 2000
    Date of Patent: April 20, 2004
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Masaharu Akitomo, Tetsurou Koyama
  • Patent number: 6689517
    Abstract: The invention relates to an imaging element comprising at least one image layer and a base wherein said base comprises an upper polymer sheet having an elastic modulus of between 500 and 6,000 MPa said upper sheet being adhered to a textile having a roughness of between 0.8 and 8.0 micrometers, and a lower polymer sheet adhered to said textile.
    Type: Grant
    Filed: August 20, 2002
    Date of Patent: February 10, 2004
    Assignee: Eastman Kodak Company
    Inventors: Cheryl J. Kaminsky, Robert P. Bourdelais, Steven J. Neerbasch, Kalpana Singh
  • Patent number: 6680156
    Abstract: A photosensitive transfer material including a temporary support having disposed thereon an alkali-soluble photosensitive resin layer containing a colorant, wherein when the temporary support is peeled from an adjacent layer provided between the temporary support and the photosensitive resin layer at a peeling rate of 1 m/min in an atmosphere of 25° C. and 30% RH, each of the temporary support and the adjacent layer has a surface potential whose absolute value is 5 kV or less after being peeled.
    Type: Grant
    Filed: January 13, 2003
    Date of Patent: January 20, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Akira Hatakeyama
  • Patent number: 6673509
    Abstract: The invention relates to a photopolymerizable recording element and process for preparing flexographic printing forms, whereby the photo-polymerizable recording element comprises a support, at least one photo-polymerizable layer, an adhesive wax layer, and a layer sensitive to infrared radiation and opaque to actinic radiation.
    Type: Grant
    Filed: February 24, 2000
    Date of Patent: January 6, 2004
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Berhnard Metzger
  • Patent number: 6670091
    Abstract: The present invention relates to a photosensitive transfer material comprising a temporary support and a thermoplastic resin layer, an alkali-soluble intermediate layer and an alkali-soluble photosensitive resin layer containing a pigment which layers are disposed in this order on the support, wherein the ratio (Em/Ep) of the elastic modulus Em of the intermediate layer to the elastic modulus Ep of the thermoplastic resin layer is in the range of 0.8 to 2.0.
    Type: Grant
    Filed: April 2, 2003
    Date of Patent: December 30, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Akira Hatakeyama
  • Patent number: 6653061
    Abstract: The invention relates to a photographic label comprising a pragmatic polymer sheet, at least one layer comprising at least one image forming layer comprising photosensitive silver halide grains and dye forming coupler above said pragmatic polymer sheet, wherein said at least one image forming layer has an exposure time to obtain a usable Dmax of 1.5 of less than 0.01 seconds, wherein said at least one image forming layer is substantially free of image dye stabilizers, and wherein said polymer sheet has an L* of greater than 95.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: November 25, 2003
    Assignee: Eastman Kodak Company
    Inventors: John B. Rieger, Robert P. Bourdelais
  • Publication number: 20030211406
    Abstract: A process for patterning thick film electrically functional patterns using a photosensitive polymer layer. A tacky photosensitive layer is applied onto a substrate surface. The photosensitive layer is imaged with a pattern using actinic radiation, the exposed areas of the photosensitive layer become hardened and non-tacky. A subsequent application of a thick film composition sheet will cause the thick film to adhere to the remaining tacky areas. Upon peeling the sheet, a thick film print pattern will be produced. This step is followed by a processing profile prescribed by the thick film composition used which results in a pattern having electrically functional properties. The invention also extends to a process wherein a thick film composition is recovered from a used sheet.
    Type: Application
    Filed: November 1, 2002
    Publication date: November 13, 2003
    Inventor: Roupen Leon Keusseyan
  • Patent number: 6645690
    Abstract: The invention relates to a photographic element comprising a base and hydrophillic colloid layers comprising at least one layer comprising photosensitive silver halide, wherein said hydrophilic colloid imaging layers further comprise a flexibilizer agent and said flexibilizer agent has a logP of greater than −1.2.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: November 11, 2003
    Assignee: Eastman Kodak Company
    Inventors: Mridula Nair, Robert P. Bourdelais, Jehuda Greener
  • Publication number: 20030170558
    Abstract: A photosensitive transfer material including a temporary support having disposed thereon an alkali-soluble photosensitive resin layer containing a colorant, wherein when the temporary support is peeled from an adjacent layer provided between the temporary support and the photosensitive resin layer at a peeling rate of 1 m/min in an atmosphere of 25° C. and 30% RH, each of the temporary support and the adjacent layer has a surface potential whose absolute value is 5 kV or less after being peeled.
    Type: Application
    Filed: January 13, 2003
    Publication date: September 11, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Akira Hatakeyama
  • Publication number: 20030162122
    Abstract: The invention relates to a photographic element comprising a base and hydrophillic colloid layers comprising at least one layer comprising photosensitive silver halide, wherein said hydrophilic colloid imaging layers further comprise a flexibilizer agent and said flexibilizer agent has a logP of greater than −1.2.
    Type: Application
    Filed: December 21, 2001
    Publication date: August 28, 2003
    Applicant: Eastman Kodak Company
    Inventors: Mridula Nair, Robert P. Bourdelais, Jehuda Greener
  • Patent number: 6573011
    Abstract: The invention relates to a packaging label comprising in order an environmental protection layer, an image formed by means of silver halide, a base, an adhesive, and a peelable back wherein said environmental protection layer comprises a mixture of vinyl polymer and urethane polymer wherein said urethane polymer has an indentation modulus less than 0.6 GPa and wherein said environmental protection layer is less than 10 micrometers in thickness.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: June 3, 2003
    Assignee: Eastman Kodak Company
    Inventors: Mridula Nair, Tamara K. Jones, Ramasubramaniam Hanumanthu, Joseph S. Sedita
  • Patent number: 6569585
    Abstract: Improved processes and products for laser thermal imaging are described. These improved processes and products utlilize an image rigidification element and significantly reduce halftone dot movement, swath boundary cracking and banding.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: May 27, 2003
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Jonathan V. Caspar, Harvey Walter Taylor, Jr., Gregory C. Weed, Rolf S. Gabrielsen
  • Patent number: 6566024
    Abstract: The invention relates a photographic label comprising a pragmatic polymer sheet, at least one layer comprising an image comprising dyes formed from couplers above said pragmatic polymer sheet, and a lower strippable paper carrier, a pressure sensitive adhesive layer between said lower strippable carrier and said pragmatic polymer sheet, and an environmental protection layer overlaying at least one photosensitive layer wherein said carrier has exposed edges where it has a greater surface area than the pragmatic sheet and said image further comprises fiducial marks.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: May 20, 2003
    Assignee: Eastman Kodak Company
    Inventors: Robert P. Bourdelais, Mridula Nair, William T. Rochford, John B. Rieger
  • Patent number: 6562552
    Abstract: A method of manufacturing a panel assembly used to assemble a display panel intends to achieve an alignment-free between barrier ribs and a fluorescent layer and minimize the waste of a barrier rib material for cost reduction. On a support body 51 which is not a substrate, formed are a plurality of walls 281 through 283 made of a fluorescent material that are belt-shaped in plan view arranged in stripes, an electrode material layer a1, and a barrier rib material filling spaces between the walls. The support body 51 and a substrate 21 are coupled so that the barrier rib material faces the substrate. The walls 281 through 283, the electrode material layer a1 and the barrier rib material 291 are transferred in one step to the substrate 21, and thus a panel assembly 20 having barrier ribs 29, electrodes A and fluorescent layers 28R, 28G and 28B is obtained.
    Type: Grant
    Filed: January 29, 2001
    Date of Patent: May 13, 2003
    Assignee: Fujitsu Limited
    Inventors: Osamu Toyoda, Shinji Tadaki, Akira Tokai, Keiichi Betsui
  • Publication number: 20030087179
    Abstract: A positive photoresist transfer material, wherein an alkali-soluble thermoplastic resin layer, an intermediate layer and a positive photoresist layer are successively applied on an adhesive surface of a temporary support, and adhesion between the positive photoresist layer and the intermediate layer is less than adhesion between other layers or surfaces.
    Type: Application
    Filed: May 13, 2002
    Publication date: May 8, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Masayuki Iwasaki
  • Patent number: 6558868
    Abstract: The present invention is for a method of fabricating a high aspect ratio, freestanding microstructure. The fabrication method modifies the exposure process for SU-8, an negative-acting, ultraviolet-sensitive photoresist used for microfabrication whereby a UV-absorbent glass substrate, chosen for complete absorption of UV radiation at 380 nanometers or less, is coated with a negative photoresist, exposed and developed according to standard practice. This UV absorbent glass enables the fabrication of cylindrical cavities in a negative photoresist microstructures that have aspect ratios of 8:1.
    Type: Grant
    Filed: February 16, 2001
    Date of Patent: May 6, 2003
    Assignee: Brookhaven Science Associates, LLC
    Inventor: John B. Warren
  • Publication number: 20030068572
    Abstract: A multicolor image-forming material of recording an image using an image-receiving sheet comprising a support having thereon at least an image-receiving layer, and thermal transfer sheets for forming four or more different colors each comprising a support having thereon at least a light-to-heat conversion layer and an image-forming layer, said image being recorded by superposing each said thermal transfer sheet and said image-receiving sheet such that the image-forming layer of the thermal transfer sheet and the image-receiving layer of the image-receiving layer come to face each other, irradiating laser light and transferring the image-forming layer in the region irradiated with the laser light onto the image-receiving layer of the image-receiving sheet, wherein the adhesive tape peeling strength on the image-receiving layer surface of said image-receiving sheet is from 800 to 20,000 mN/cm at room temperature.
    Type: Application
    Filed: March 15, 2002
    Publication date: April 10, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Yasutomo Goto, Susumu Sugiyama