Aluminum Patents (Class 430/278.1)
  • Patent number: 10423069
    Abstract: A non-toxic water soluble photosensitive resin composition able to function as a solder mask coating comprises a polymer containing oxazolinyl, a photosensitive monomer, and a photo-initiator. These elements are all water soluble or water dispersible. The polymer containing oxazolinyl and the photosensitive monomer have a plurality of carbon-carbon double bonds. The polymer containing oxazolinyl and the photosensitive monomer are polymerized to form a dense cross-linking network structure when the water soluble photosensitive resin composition is exposed to ultraviolet radiation. A film using the water soluble photosensitive resin composition is also provided.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: September 24, 2019
    Assignee: Zhen Ding Technology Co., Ltd.
    Inventors: Chen-Feng Yen, Chang-Hung Lee, Yi-Fang Lin, Yen-Chin Hsiao, Shou-Jui Hsiang, Mao-Feng Hsu
  • Patent number: 9364922
    Abstract: A visually seamless method of joining a first piece of metal and a second piece of metal is described. The first piece of metal is placed in contact with an edge of the second piece of metal. In some embodiments, the edge includes a sacrificial lip. The first piece of metal forming a junction area with the edge of the second piece of metal, applying a forging force to the first piece of metal, the forging force having an effect of creating an extremely tight fit up between the first and the second pieces of metal, welding the first and the second pieces to form an assembly and forming a cosmetically enhancing protective layer on the surface of the assembly, the protective layer obscuring any visible artifacts on the surface of the assembly, the obscured visible artifacts including any discoloration or discontinuity created by the laser welding.
    Type: Grant
    Filed: March 7, 2014
    Date of Patent: June 14, 2016
    Assignee: Apple Inc.
    Inventors: Carlo Catalano, Derrick Jue, Brian Miehm, Takahiro Oshima, Masashige Tatebe
  • Patent number: 9126450
    Abstract: A lithographic printing method including exposing an imaging surface layer of a printing plate to a first expose source to render the surface layer uniformly hydrophilic; the surface layer comprising a compound having reversible light controlled wettability whereby the surface layer is reversibly hydrophilic and hydrophobic. The surface layer is disposed over a variable image portion of the printing plate imaging surface or disposed over substantially all of the printing plate imaging surface. The surface is exposed to a second expose source to render image areas of the surface layer hydrophobic. Polar liquid attracts to non-image hydrophilic areas. Hydrophobic liquid colorant attracts to hydrophobic image areas. The surface layer is contacted an offset receiving member and the image is transferred to an image receiving substrate.
    Type: Grant
    Filed: July 28, 2009
    Date of Patent: September 8, 2015
    Assignee: Xerox Corporation
    Inventors: Elton T. Ray, Thomas Robson
  • Patent number: 9085698
    Abstract: Cyanine dyes with improved fluorescence intensity and photostability.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: July 21, 2015
    Assignee: Illumina Cambridge Limited
    Inventors: Nikolai Romanov, Carole Anastasi, Xiaohai Liu
  • Patent number: 9048027
    Abstract: A fluid dispersion obtained by mixing oxide particles and water is sprayed to a raw aluminum foil from a direction opposite to a travelling direction of the raw aluminum foil while the raw aluminum foil is allowed to travel. In this way, a roll-pressed mark of the raw aluminum foil is eliminated, and thus aluminum foil for aluminum electrolytic capacitor electrode is produced. Pyramidal-shaped recesses each having an acute angle tip are present all over a surface of the aluminum foil.
    Type: Grant
    Filed: August 14, 2013
    Date of Patent: June 2, 2015
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Masami Tsubaki, Mitsuhisa Yoshimura, Hayato Kato, Katsuyoshi Shingu, Tatsushi Ota, Kazuo Fujiwara
  • Patent number: 8936899
    Abstract: A thermally-sensitive, positive-working lithographic printing plate precursor can be used to prepare lithographic printing plates using high pH, silicate-free processing solutions. The precursor has a grained an anodized aluminum-containing substrate including a poly(vinyl phosphonic acid) interlayer. A first ink receptive layer, and optionally a second ink receptive layer, is disposed directly on the poly(vinyl phosphonic acid) interlayer. This first ink receptive layer comprises an aromatic acid dye that comprises at least two aromatic groups in an amount of least 0.5 weight %. In addition, the precursor comprises an infrared radiation absorber in one of the layers.
    Type: Grant
    Filed: September 4, 2012
    Date of Patent: January 20, 2015
    Assignee: Eastman Kodak Company
    Inventors: Gerhard Hauck, Dietmar Frank, Celin Savariar-Hauck
  • Patent number: 8883401
    Abstract: A presensitized plate having a long press life and excellent resistance to scum and corrosive micro-stains and capable of on-press development is provided. The presensitized plate includes a photosensitive layer containing (A) a sensitizing dye, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer; and a protective layer which are formed on a support in this order. The support is prepared from an aluminum alloy plate containing intermetallic compound particles with a circle equivalent diameter of 0.2 ?m or more at a surface density of 35,000 pcs/mm2 or more and aluminum carbide particles with a maximum length of 1 ?m or more in an amount of up to 30,000 pcs/g.
    Type: Grant
    Filed: September 7, 2010
    Date of Patent: November 11, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Atsushi Matsuura, Hirokazu Sawada, Akio Uesugi
  • Patent number: 8877426
    Abstract: A printing plate comprises a substantially planar substrate, a porous non-anodic ungrained coating, having a thickness within the range of about 0.1 to about 30 microns and comprising at least one of metals, metal oxides and admixtures thereof, and an image recording layer, provided that where the porous coating consists essentially of oxide(s) only, it comprises at least one oxide of copper, magnesium, cadmium, aluminum, zirconium, hafnium, thorium, chromium, tungsten, molybdenum and (or) cobalt, and further provided that where the porous coating consists essentially of alumina only, it comprises specified pores. The invention also relates to an article of manufacture having a nanometric porous surface layer comprising at least one of metals, metal oxides and mixtures thereof, which comprises pores in the surface layer having a width in a range 0-100 nm, and wherein a major number of pores in this range have a width in a band of about 1 to about 30 nm.
    Type: Grant
    Filed: October 3, 2005
    Date of Patent: November 4, 2014
    Assignee: Acktar Ltd.
    Inventors: Dina Katsir, Zvi Finkelstein, Yuri Zarnitsky
  • Patent number: 8722309
    Abstract: An infrared sensitive and chemical treatment free photosensitive composition, includes, based on weight percentage, 30-70% of a water soluble thermally cross-linking resin, 1-20% of a water-soluble photocross-linking polymerized resin, 10-50% of a photopolymerizable oligomer, 1-30% of a multifunctional monomer, 1-20% of a cationic photopolymerization initiator, and 1-20% of an infrared irradiation absorption dye. The photosensitive composition of the present invention is useful for preparation of an infrared sensitive and chemical treatment free lithographic plate. The lithographic plate of the present invention has a high sensitivity and a good mesh point reduction, and after exposure to an infrared light source, can be printed directly after being washed with tapped water or without any washing and processing step, and has a long run length.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: May 13, 2014
    Assignee: Lucky Huaguang Graphics Co., Ltd.
    Inventors: Qinghai Yang, Fangqian Teng, Xiaowei Song, Hecheng Li, Zhaoyang Wu, Junjun Wu, Xiaohong Chen, Dongli Liu
  • Patent number: 8722308
    Abstract: An aluminum-containing substrate can be provided for use in lithographic printing plate precursors. Before radiation-sensitive layers are applied, a grained and sulfuric acid anodized aluminum-containing support is treated with an alkaline or acidic pore-widening solution to provide its outer surface with columnar pores. The diameter of the columnar pores at their outermost surface is at least 90% of the average diameter of the columnar pores. Directly on this treated surface, a hydrophilic layer is applied, which hydrophilic layer contains a non-crosslinked hydrophilic polymer having carboxylic acid side chains.
    Type: Grant
    Filed: August 31, 2011
    Date of Patent: May 13, 2014
    Assignee: Eastman Kodak Company
    Inventor: Koji Hayashi
  • Patent number: 8715918
    Abstract: Thick film photoresist compositions are disclosed.
    Type: Grant
    Filed: September 25, 2007
    Date of Patent: May 6, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Medhat A. Toukhy, Margareta Paunescu
  • Patent number: 8703381
    Abstract: On-press developable, negative-working lithographic printing plate precursors have a sulfuric acid anodized aluminum-containing substrate in which the oxide layer pores have been widened using an acidic or alkaline treatment. Over the widened pores, a hydrophilic coating is applied, which coating comprises a non-crosslinked hydrophilic polymer having carboxylic acid side chains. This particular substrate provides improved adhesion and printing durability for on-press development and printing.
    Type: Grant
    Filed: August 31, 2011
    Date of Patent: April 22, 2014
    Assignee: Eastman Kodak Company
    Inventor: Koji Hayashi
  • Publication number: 20140065539
    Abstract: A thermally-sensitive, positive-working lithographic printing plate precursor can be used to prepare lithographic printing plates using high pH, silicate-free processing solutions. The precursor has a grained an anodized aluminum-containing substrate including a poly(vinyl phosphonic acid) interlayer. A first ink receptive layer, and optionally a second ink receptive layer, is disposed directly on the poly(vinyl phosphonic acid) interlayer. This first ink receptive layer comprises an aromatic acid dye that comprises at least two aromatic groups in an amount of least 0.5 weight %. In addition, the precursor comprises an infrared radiation absorber in one of the layers.
    Type: Application
    Filed: September 4, 2012
    Publication date: March 6, 2014
    Inventors: Gerhard Hauck, Dietmar Frank, Celin Savariar-Hauck
  • Patent number: 8632949
    Abstract: A presensitized plate bringing about the lithographic printing plate which exhibits a high resistance to scumming and in which formation of bulges causing image dropouts is suppressed is provided with the lithographic printing plate support which includes an aluminum plate and an anodized film of aluminum provided on the aluminum plate, and has a micropore extending in the anodized film in the direction of depth from a film surface opposite with a film surface facing the aluminum plate. The micropore is sealed at least partially on its inside with protrusions made of boehmite, and the protrusions made of boehmite which are located on the anodized film have a mean height of less than 15 nm.
    Type: Grant
    Filed: July 21, 2011
    Date of Patent: January 21, 2014
    Assignee: Fujifilm Corporation
    Inventors: Yusuke Namba, Keio Okano, Shinya Kurokawa, Hirokazu Sawada, Akio Uesugi
  • Patent number: 8632940
    Abstract: Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack.
    Type: Grant
    Filed: April 19, 2011
    Date of Patent: January 21, 2014
    Assignee: Eastman Kodak Company
    Inventors: Gerhard Hauck, Celin Savariar-Hauck, Oliver R. Blum, Michael Nielinger
  • Publication number: 20130129995
    Abstract: The present invention provides novel methods of fabricating microelectronics structures, and the resulting structures formed thereby, using EUV lithographic processes. The method involves utilizing an assist layer immediately below the photoresist layer. The assist layer can either be directly applied to the substrate, or it can be applied to any intermediate layer(s) that may be applied to the substrate. The preferred assist layers are formed from spin-coatable, polymeric compositions. The inventive method allows reduced critical dimensions to be achieved with improved dose-to-size ratios, while improving adhesion and reducing or eliminating pattern collapse issues.
    Type: Application
    Filed: November 20, 2012
    Publication date: May 23, 2013
    Applicant: Brewer Science Inc.
    Inventor: Brewer Science Inc.
  • Patent number: 8409784
    Abstract: Disclosed is a photosensitive resin composition which does not contain any halogenated compound or any antimony compound that has a high risk of putting a load on the environment, which exerts good flame retardancy after being cured, and which particularly meets the recent exacting requirements with respect to bending resistance and insulation reliability. Specifically disclosed is a photosensitive resin composition comprising: (A) a (meth)acrylate compound represented by the general formula (1); (B) a polyimide precursor; and (C) a photopolymerization initiator [in the formula, R1 represents a hydrogen atom or a methyl group; R2 represents a hydrogen atom or a univalent organic group; n and m independently represent an integer of 1 to 5; p represents an integer of 0 to 6; q and r independently represent an integer of 0 to 4; and s represent an integer of 0 to 6, provided that the sum of p, q, r and s is 6, and the sum total of p and s may range from 3 to 6 and is preferably 6].
    Type: Grant
    Filed: April 23, 2008
    Date of Patent: April 2, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Katsuhiko Funaki, Etsuo Ohkawado, Kousuke Hirota, Syuji Tahara
  • Publication number: 20120270152
    Abstract: Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack.
    Type: Application
    Filed: April 19, 2011
    Publication date: October 25, 2012
    Inventors: Gerhard Hauck, Celin Savariar-Hauck, Oliver R. Blum, Michael Nielinger
  • Patent number: 8206893
    Abstract: Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).
    Type: Grant
    Filed: October 30, 2008
    Date of Patent: June 26, 2012
    Assignee: Brewer Science Inc.
    Inventors: Hao Xu, Ramil-Marcelo L. Mercado, Douglas J. Guerrero, Jim D. Meador
  • Patent number: 8168372
    Abstract: Novel, developer-soluble, hard mask compositions and methods of using those compositions to form microelectronic structures are provided. The composition comprises the compound a compound for controlling development rate, and a crosslinking agent in a solvent system. The methods involve applying the composition to a substrate and curing the composition. An imaging layer is applied to the composition, followed by light exposure and developing, during which the light-exposed portions of the imaging layer are removed, along with portions of the hard mask composition adjacent said light-exposed portions. The size of the hard mask composition structures are controlled by the development rate, and they yield feature sizes that are a fraction of the imaging layer feature sizes, to give a pattern that can ultimately be transferred to the substrate.
    Type: Grant
    Filed: September 20, 2007
    Date of Patent: May 1, 2012
    Assignee: Brewer Science Inc.
    Inventor: Sam X. Sun
  • Publication number: 20120090486
    Abstract: Negative-working, infrared radiation-sensitive lithographic printing plate precursors have an imageable layer on a substrate. The imageable layer includes a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to infrared radiation, a polymeric binder, one or more infrared radiation absorbing compounds, and an inorganic phosphoric acid or inorganic phosphoric acid precursor. The lithographic printing plate precursors can be designed for either off-press or on-press development after IR imaging.
    Type: Application
    Filed: October 18, 2010
    Publication date: April 19, 2012
    Inventor: Celin Savariar-Hauck
  • Publication number: 20120021356
    Abstract: A presensitized plate bringing about the lithographic printing plate which exhibits a high resistance to scumming and in which formation of bulges causing image dropouts is suppressed is provided with the lithographic printing plate support which includes an aluminum plate and an anodized film of aluminum provided on the aluminum plate, and has a micropore extending in the anodized film in the direction of depth from a film surface opposite with a film surface facing the aluminum plate. The micropore is sealed at least partially on its inside with protrusions made of boehmite, and the protrusions made of boehmite which are located on the anodized film have a mean height of less than 15 nm.
    Type: Application
    Filed: July 21, 2011
    Publication date: January 26, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Yusuke NAMBA, Keio OKANO, Shinya KUROKAWA, Hirokazu SAWADA, Akio UESUGI
  • Publication number: 20120000385
    Abstract: Disclosed is a negative type lithographic printing plate material comprising a surface-roughened and anodically oxidized aluminum substrate and a photosensitive layer provided thereon, characterized in that: said photosensitive layer comprises a novolac resin, which contains a binder resin (a), a crosslinking agent (b), an infrared-absorbing agent (c) and an acid-generating agent (d), and in which the binder resin (a) contains 20-100 mass % inclusive of a phenol part expressed in ratio by mass, and a polyvinylphenol polymer; the content ratio of the novolac resin to the polyvinylphenol polymer (the mass of the novolac resin:the mass of the polyvinylphenol polymer) is 7:3 to 3:7; and the ratio by mass [(b)/(a)] is 0.25 to 0.50 inclusive.
    Type: Application
    Filed: January 14, 2010
    Publication date: January 5, 2012
    Applicant: KONICA MINOLTA MEDICAL & GRAPHIC, INC.
    Inventor: Takahiro Mori
  • Publication number: 20110311916
    Abstract: A lithographic printing plate precursor can be used to prepare a printing plate using thermal ablation. The precursor has a non-thermally ablatable first layer on a substrate. Over the first layer is a thermally ablatable outer layer that includes an IR absorbing compound in an ablatable polymeric binder. The first layer includes a sol gel as a continuous inorganic matrix and a discontinuous inorganic phase (inorganic particles) dispersed therein.
    Type: Application
    Filed: June 18, 2010
    Publication date: December 22, 2011
    Inventors: Mathias Jarek, Domenico Balbinot
  • Patent number: 7883827
    Abstract: The present invention provides a planographic printing plate precursor including on a support a photosensitive layer that contains a polymerizable composition containing a specific binder polymer having a repeating unit of formula (I), an infrared absorbent, a polymerization initiator and a polymerizable compound, wherein R1 represents a hydrogen atom or a methyl group; R2 represents a linking group which includes two or more atoms selected from a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom and a sulfur atom and has a number of atoms of 2 to 82; A represents an oxygen atom or —NR3— in which R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; and n represents an integer of 1 to 5. The invention also provides a planographic printing plate precursor provided with a specific photosensitive layer with respect to an alkaline developer.
    Type: Grant
    Filed: April 13, 2007
    Date of Patent: February 8, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Atsushi Sugasaki, Kazuto Kunita, Kazuhiro Fujimaki
  • Publication number: 20100316850
    Abstract: Negative-working imageable elements have an imageable layer comprising a free radically polymerizable component, an initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation, a radiation absorbing compound, one or more polymeric binders, and at least 5 weight % of core-shell particles comprising a hydrophobic polymeric core and a hydrophilic polymeric shell that is covalently bound to the polymeric core. The hydrophilic polymeric shell has one or more zwitterionic functional groups. These elements can be imaged such as by IR lasers to provide lithographic printing plates.
    Type: Application
    Filed: June 12, 2009
    Publication date: December 16, 2010
    Inventors: Ting Tao, Eric Clark, John Kalamen
  • Publication number: 20100215919
    Abstract: Negative-working, on-press developable imageable element have improved shelf life and press run length because they include a free radically polymerizable composition comprising two or more ethylenically unsaturated compounds, each of which has two or more terminal acrylate groups, provided at least one of the ethylenically unsaturated compounds further comprises alkylene glycol units. In addition, the molar ratio of terminal acrylate groups to the alkylene glycol units in the non-polymeric free radically polymerizable composition is from about 1.25:1 to about 3:1.
    Type: Application
    Filed: February 20, 2009
    Publication date: August 26, 2010
    Inventors: Ting Tao, Eric E. Clark
  • Patent number: 7767380
    Abstract: A negative-working photopolymerization type photosensitive lithographic printing plate precursor capable of conducting image recording with laser, includes: a hydrophilic support; a photopolymerizable photosensitive layer containing (i) a sensitizing dye having an absorption maximum in a wavelength range of from 360 to 450 nm, (ii) a hexaarylbiimidazole compound and (iii) an addition polymerizable compound having an ethylenically unsaturated double bond; and a protective layer, in this order, wherein the protective layer has oxygen permeability at 25° C. under one atmosphere of from 25 ml/m2·day to 200 ml/m2·day.
    Type: Grant
    Filed: September 27, 2007
    Date of Patent: August 3, 2010
    Assignee: Fujifilm Corporation
    Inventor: Noriaki Watanabe
  • Patent number: 7718242
    Abstract: A recording layer including a novel dye for a high density optical recording medium, employing short wavelength laser source with a wavelength not longer than 530 nm for recording high density information and reproduction/playback of the high density information recordings, is provided.
    Type: Grant
    Filed: February 7, 2007
    Date of Patent: May 18, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Ming-Chia Li, Chien-Liang Huang, An-Tze Lee, Wen-Yih Liao, Ching-Yu Hsieh, Tzuan-Ren Jeng
  • Patent number: 7615323
    Abstract: Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein ?1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from a
    Type: Grant
    Filed: November 11, 2005
    Date of Patent: November 10, 2009
    Assignee: Kodak Graphic Communications, GmbH
    Inventors: Bernd Strehmel, Harald Baumann, Udo Dwars, Detlef Pietsch, Axel Draber, Michael Mursal
  • Publication number: 20090246690
    Abstract: A lithographic printing plate precursor includes a support and a layer containing a polymer compound having at least one support-adsorbing group at a terminal of a main chain.
    Type: Application
    Filed: March 27, 2009
    Publication date: October 1, 2009
    Applicant: FUJIFILM Corporation
    Inventor: Hidekazu OOHASHI
  • Patent number: 7592128
    Abstract: The present invention relates to negative-working imageable elements that can be used for the manufacture of printing plates. These imageable elements can be developed on on-press by the action of a lithographic printing ink used in combination with either water or a fountain solution. The imageable elements comprise an imageable layer that is not removable in water or fountain solution alone. The imageable layer includes a free radically polymerizable compound, a free radical initiator composition, an infrared radiation absorbing compound, and a polymeric binder comprising poly(alkylene oxide) pendant groups, and preferably additionally pendant cyano groups.
    Type: Grant
    Filed: August 7, 2006
    Date of Patent: September 22, 2009
    Assignee: Eastman Kodak Company
    Inventors: Jianbing Huang, Kevin B. Ray, Scott A. Beckley
  • Patent number: 7524613
    Abstract: Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).
    Type: Grant
    Filed: January 12, 2006
    Date of Patent: April 28, 2009
    Assignee: Kodak Graphic Communications, GmbH
    Inventors: Harald Baumann, Bernd Strehmel, Ulrich Fiebag, Friederike Von Gyldenfeldt, Tanja Ebhardt, Ulrike Dallmann, Dietmar Frank
  • Patent number: 7507525
    Abstract: A lithographic printing plate precursor having a photosensitive layer containing (A) at least one saccharide selected from the group consisting of an oligosaccharide and a polysaccharide, (B) a binder polymer, (C) a compound having an addition polymerizable ethylenic unsaturated bond, and (D) a polymerization initiator, or a lithographic printing plate precursor having an undercoat layer comprising (A) at least one saccharide selected from the group consisting of an oligosaccharide and a polysaccharide, and a photosensitive layer containing (B) a binder polymer, (C) a compound having an addition polymerizable ethylenic unsaturated bond, and (D) a polymerization initiator.
    Type: Grant
    Filed: May 3, 2006
    Date of Patent: March 24, 2009
    Assignee: FUJIFILM Corporation
    Inventor: Atsushi Sugasaki
  • Patent number: 7485409
    Abstract: The present invention provides a planographic printing plate precursor including a support and a positive recording layer formed on the support and containing: (A) a polymer having a structural unit represented by the following general formula (1), (B) a photo-thermal converting agent, and (C) an amino compound having a methylol group or an alkoxymethyl group; and a positive recording layer whose solubility in an alkaline developer is improved by exposure to light or by heating. In general formula (1), R1 represents an alkyl group or a cyclic group, x represents 0 or 1, and A represents a bivalent bonding group. According to the invention, a positive planographic printing plate precursor for use with infrared lasers having excellent chemical resistance and wide image development latitude can be obtained.
    Type: Grant
    Filed: September 22, 2005
    Date of Patent: February 3, 2009
    Assignee: FujiFilm Corporation
    Inventor: Akira Nagashima
  • Publication number: 20090011363
    Abstract: Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.
    Type: Application
    Filed: January 2, 2007
    Publication date: January 8, 2009
    Inventors: Harald Baumann, Bernd Strehmel, Udo Dwars, Ursula Muller
  • Publication number: 20080311510
    Abstract: A lithographic printing plate support includes a surface which has a surface area ratio ?S5(0.02-0.2) defined by formula (1): ?S5(0.02-0.2)(%)=[(Sx5(0.02-0.2)?S0)/S0]×100(%) (Sx5(0.02-0.2)??(1) is the true surface area of a 5 ?m square surface region as determined by three-point approximation based on data obtained by extracting 0.02 to 0.2 ?m wavelength components from three-dimensional data on the surface region measured with an atomic force microscope at 512×512 points and S0 is the geometrically measured surface area of the surface region) of 50 to 90%; and an arithmetic average roughness Ra of 0.35 ?m or less. The lithographic printing plate support can be used to obtain a presensitized plate, which exhibits both an excellent scumming resistance and a particularly long press life when being made into a lithographic printing plate.
    Type: Application
    Filed: June 27, 2008
    Publication date: December 18, 2008
    Inventors: Atsushi MATSUURA, Hirokazu Sawada, Akio Uesugi
  • Patent number: 7462437
    Abstract: A presensitized lithographic plate comprises a support and a hydrophilic image-recording layer. The hydrophilic image-recording layer contains a hydrophilic polymer and an agent capable of converting hydrophilic to hydrophobic when the agent is heated. The hydrophilic polymer comprises a main chain and branched chains. Each of the branched chain comprises a hydrophilic chain having a molecular weight in the range of 200 to 1,000,000. A hydrophilic substrate and a lithographic printing process are also disclosed.
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: December 9, 2008
    Assignee: Fujifilm Corporation
    Inventors: Satoshi Hoshi, Kazuto Shimada, Gaku Kumada
  • Patent number: 7442491
    Abstract: There is provided an aluminum alloy blank for a lithographic printing plate including iron in a range of 0.20 to 0.80 wt %; and the balance being aluminum, a crystal grain refining element, and unavoidable impurity elements. The unavoidable impurity elements may include silicon and copper, wherein a content of silicon is in a range of 0.02 to 0.30 wt % and a content of copper is equal to or below 0.05 wt %. A solid solution amount of silicon is in a range of 150 ppm to 1500 ppm.
    Type: Grant
    Filed: March 17, 2005
    Date of Patent: October 28, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Hirokazu Sawada, Akio Uesugi
  • Patent number: 7429445
    Abstract: A radiation-sensitive composition includes a free radically polymerizable component, an initiator composition capable of generating free radicals sufficient to initiate polymerization upon exposure to imaging radiation, an infrared radiation absorbing dye having a tetraaryl pentadiene chromophore, a polymeric binder comprising a polymer backbone to which are directly or indirectly linked poly(alkylene glycol) side chains, and a nonionic phosphate acrylate having a molecular weight of at least 250. This composition can be used to prepare a negative-working imageable element that is sensitive to suitable imaging radiation and can be imaged at relatively low energy and developed either on-press or off-press.
    Type: Grant
    Filed: March 7, 2007
    Date of Patent: September 30, 2008
    Assignee: Eastman Kodak Company
    Inventors: Heidi M. Munnelly, Kevin D. Wieland
  • Publication number: 20080227029
    Abstract: A method of conditioning the surface of a work piece, particularly of a strip or sheet, more particularly of a lithostrip or lithosheet, including an aluminium alloy is provided. The method for conditioning the surface of a work piece and a work piece including an aluminium alloy enabling an increasing manufacturing speed in electro-chemically graining and maintaining at the same time a high quality of the grained surface, includes a conditioning method which comprises at least the two steps, degreasing the surface of the work piece with a degreasing medium and subsequently cleaning the surface of the work piece by pickling.
    Type: Application
    Filed: April 5, 2006
    Publication date: September 18, 2008
    Applicant: Hydro Aluminium Deutschland GmbH
    Inventors: Bernhard Kernig, Henk Jan Brinkman
  • Patent number: 7425402
    Abstract: A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a developer soluble polymer which comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group Q, wherein Q has the structure and is covalently linked to a carbon atom of the phenyl group and wherein L1, L2 and L3 are linking groups, a, b and c are 0 or 1, and T1, T2 and T3 are terminal groups. The polymer, substituted by the group Q, increases the chemical resistance of the coating.
    Type: Grant
    Filed: August 11, 2004
    Date of Patent: September 16, 2008
    Assignee: Agfa Graphics, N.V.
    Inventors: Johan Loccufier, Bert Groenendaal, Marc Van Damme, Huub Van Aert
  • Patent number: 7407735
    Abstract: Disclosed are a light sensitive planographic printing plate precursor and its processing method, the precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing a compound represented by the following formula (1) or (2) and a compound represented by the following formula (3) or (4):
    Type: Grant
    Filed: January 18, 2006
    Date of Patent: August 5, 2008
    Assignee: Konica Corporation
    Inventor: Kazuhiko Hirabayashi
  • Publication number: 20080102404
    Abstract: An aluminum alloy plate for lithographic printing that is capable of obtaining a lithographic printing plate support which is free from appearance defects and has a uniform surface after electrolytic graining treatment and of obtaining a lithographic printing plate having a long press life and an excellent scumming resistance is provided. The aluminum alloy plate for a lithographic printing plate is obtained by continuous casting in which an aluminum alloy melt is fed through a melt feed nozzle between a pair of cooling rollers and rolled as it is being solidified by the pair of cooling rollers, wherein the aluminum alloy plate contains 0.10 to 0.20 wt % of silicon and 0.10 to 0.40 wt % of iron, and wherein the aluminum alloy plate contains in solid solution 200 to 600 ppm of silicon and not more than 250 ppm of iron.
    Type: Application
    Filed: October 23, 2007
    Publication date: May 1, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Hiroshi TASHIRO, Hirokazu SAWADA
  • Publication number: 20080090175
    Abstract: Disclosed are a positive working planographic printing plate material comprising an aluminum support and provided thereon, a light sensitive layer, wherein the light sensitive layer contains an alkali soluble resin and pigment having on the surface a development restrainer and a positive working planographic printing plate material comprising an aluminum support and provided thereon, a lower light sensitive layer and an upper light sensitive layer in that order, each layer containing an alkali soluble resin, wherein at least one of the lower and upper light sensitive layers contains a pigment having on the surface a development restrainer.
    Type: Application
    Filed: October 4, 2007
    Publication date: April 17, 2008
    Applicant: KONICA MINOLTA MEDICAL & GRAPHIC, INC.
    Inventor: Hidetoshi Ezure
  • Patent number: 7348131
    Abstract: A laser sensitive lithographic printing plate comprises an electrochemically grained, anodized, hydrophilically treated aluminum substrate with a reflection optical density of 0.30 or higher; a free radical polymerizable photosensitive layer; and a water soluble or dispersible overcoat. The photosensitive layer comprises a polymeric binder, a free radical polymerizable monomer, a free radical initiator, and a sensitizing dye. Such dark aluminum substrate in combination with the hydrophilic treatment allows both clean background and good printing durability. Such plate can be exposed with a suitable laser at lower dosage to cause hardening in the exposed areas. The exposed plate can be developed with a regular liquid developer or with ink and/or fountain solution.
    Type: Grant
    Filed: July 5, 2005
    Date of Patent: March 25, 2008
    Inventor: Gary Ganghui Teng
  • Patent number: 7318995
    Abstract: A method for preparing a negative-working lithographic printing plate is provided which comprises the steps of (1) providing a lithographic printing plate precursor comprising on a grained and anodized aluminum support, having a hydrophilic surface, a coating comprising (i) polymer particles which are core-shell particles having a hydrophobic heat-softenable core and a hydrophilic shell and (ii) an infrared light absorbing agent, (2) exposing said coating to heat, thereby inducing coalescence of said polymer particles at exposed areas of said coating, and (iii) developing said precursor by applying a gum solution to said coating, thereby removing non-exposed areas of said coating from said support. According to the above method the printing plates exhibit after ageing an improved clean-out and a reduced background stain, resulting in toning-free printing.
    Type: Grant
    Filed: September 29, 2005
    Date of Patent: January 15, 2008
    Assignee: Agfa Graphics NV
    Inventors: Sue Wilkinson, Huub Van Aert, Dirk Faes, Joan Vermeersch
  • Patent number: 7306893
    Abstract: An image recording material of the present invention comprises an anodized aluminum support, an intermediate layer containing a polymer having a carboxylic acid group in a side chain thereof and formed on the aluminum support, and a photosensitive layer containing at least 50% by weight or more of novolak type phenol resin and a photothermal conversion agent and recordable by IR laser beam. A planographic printing plate excellent in printing durability can be obtained by subjecting the image recording material imagewise to IR laser exposure treatment and to development treatment, and then heating the image recording material at 150 to 300° C.
    Type: Grant
    Filed: August 30, 2004
    Date of Patent: December 11, 2007
    Assignee: FUJIFILM Corporation
    Inventors: Ikuo Kawauchi, Miki Takahashi, Masako Imai
  • Patent number: RE40788
    Abstract: A litho strip for use as an offset printing plate is described which has a composition of 0.05-0.25% Si, 0.30-0.40% Fe, 0.10-0.30% Mg, max. 0.05% Mn, and max. 0.04% Cu. The strip is produced from a continuous cast ingot of the above composition which is hot rolled to a thickness of up to 2-7 mm. The residual resistance ratio of the hot rolled strip is RR=10-20. The cold rolling is carried out with or without intermediate annealing, wherein the degree of rolling reduction after intermediate annealing is >60%. The further processing up to the EC roughening takes place with the microstructure adjusted in the rolling process at <100° C. The litho strip is characterized by a high thermal stability, a good roughening behavior in the EC processes, and a high reverse bending fatigue strength perpendicular to the rolling direction.
    Type: Grant
    Filed: September 10, 2004
    Date of Patent: June 23, 2009
    Assignee: Hydro Aluminium Deutschland GmbH
    Inventors: Wolfgang Von Asten, Bernhard Kernig, Barbara Grzemba
  • Patent number: RE41128
    Abstract: New polymers and new anti-reflective compositions containing such polymers are provided. The compositions comprise a polymer (e.g., epoxy cresol novolac resins) bonded with a chromophore (4-hydroxybenzoic acid, trimellitic anhydride). The inventive compositions can be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Grant
    Filed: January 25, 2007
    Date of Patent: February 16, 2010
    Assignee: Brewer Science Inc.
    Inventor: Shreeram V. Deshpande