Identified Backing Or Protective Layer Containing Patents (Class 430/271.1)
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Patent number: 12242196Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B2.Type: GrantFiled: June 9, 2023Date of Patent: March 4, 2025Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Hikaru Tokunaga, Daigo Saito, Keisuke Hashimoto, Rikimaru Sakamoto
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Patent number: 12055854Abstract: A coating composition comprising a crosslinkable polyester polymer comprising an isocyanurate group and a crosslinkable group; a crosslinker; and an acid catalyst, wherein at least one of the crosslinkable polyester polymer and the crosslinker comprises an iodine-containing polymer.Type: GrantFiled: December 30, 2020Date of Patent: August 6, 2024Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.Inventors: Jin Hong Park, Yoo-Jin Ghang, Suwoong Kim, You Rim Shin, Jung June Lee, Jae Hwan Sim
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Patent number: 11972948Abstract: New lithographic compositions for use as EUV adhesion layers are provided. The present invention provides methods of fabricating microelectronics structures using those compositions as well as structures formed by those methods. The method involves utilizing an adhesion layer immediately below the photoresist layer. The adhesion layer can either be directly applied to the substrate, or it can be applied to any intermediate layer(s) that may be applied to the substrate, such as an alpha-carbon, spin-on carbon, spin-on silicon hardmask, metal hardmask, or deposited silicon layer. The preferred adhesion layers are formed from spin-coatable, polymeric compositions. The inventive method improves adhesion and reduces or eliminates pattern collapse issues.Type: GrantFiled: June 12, 2019Date of Patent: April 30, 2024Assignee: Brewer Science, Inc.Inventors: Andrea M. Chacko, Vandana Krishnamurthy, Yichen Liang, Hao Lee, Stephen Grannemann, Douglas J. Guerrero
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Patent number: 11822248Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):Type: GrantFiled: October 28, 2016Date of Patent: November 21, 2023Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.Inventors: Eui-Hyun Ryu, Jin Hong Park, You Rim Shin, Ji-Hon Kang, Jung-June Lee, Jae-Bong Lim
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Patent number: 11767435Abstract: Provided is an anti-reflection coating composition. The anti-reflection coating composition includes an active component and a solvent B. The active component includes a matting resin A, a catalyst C, and a crosslinking agent D. The weight average molecular weight of the matting resin A is less than or equal to 20000. Also provided is use of the anti-reflection coating composition.Type: GrantFiled: December 23, 2021Date of Patent: September 26, 2023Assignee: PhiChem CorporationInventors: Yun Zhang, Jiaqi Zhao, Fanjie Xu
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Patent number: 11746189Abstract: A hard-mask forming composition including a resin (P1) having a repeating structure (u1) represented by General Formula (u1-0), wherein Ar01 and Ar02 are aromatic hydrocarbon groups which may have a substituent, Ar02 has at least one nitrogen atom or oxygen atom, L01 and L02 are each independently a single-bonded or divalent linking group, and X is NH4 and the likeType: GrantFiled: February 12, 2021Date of Patent: September 5, 2023Assignee: TOKYO OHKA KOGYO CO., LTD.Inventor: Keiichi Ibata
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Patent number: 11626298Abstract: A liquid supply device includes: a storage tank configured to store a processing liquid including a first processing liquid (sulfuric acid) and a second processing liquid (hydrogen peroxide solution); a circulation path having a first pipeline through which the processing liquid passes in a horizontal direction, and configured to circulate the processing liquid stored in the storage tank; a branch path configured to supply the processing liquid to a processing unit; and a branching part having an opening for allowing the processing liquid to flow out from the first pipeline to the branch path, wherein the opening is formed in the branching part and formed below a periphery of the first pipeline when the first pipeline is viewed in section.Type: GrantFiled: March 23, 2018Date of Patent: April 11, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Yusuke Takamatsu, Yasuhiro Takaki, Shinichi Umeno, Shogo Fukui
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Patent number: 11495462Abstract: A method for forming reliefs on a face of a substrate is provided, successively including forming a protective screen for protecting at least a first zone of the face; an implanting to introduce at least one species comprising carbon into the substrate from the face of the substrate, the forming of the protective screen and the implanting being configured to form, in the substrate, at least one carbon modified layer having a concentration of implanted carbon greater than or equal to an etching threshold only from a second zone of the face of the substrate not protected by the protective screen; removing the protective screen; and etching the substrate from the first zone selectively with respect to the second zone.Type: GrantFiled: July 2, 2020Date of Patent: November 8, 2022Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVESInventors: Lamia Nouri, Stefan Landis, Nicolas Posseme
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Patent number: 11465402Abstract: A photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and a process of making the photosensitive element are disclosed. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features, and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: GrantFiled: April 24, 2020Date of Patent: October 11, 2022Assignee: DUPONT ELECTRONICS, INC.Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
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Patent number: 11367617Abstract: A patterning stack and methods are provided for semiconductor processing. The method includes forming a graded hardmask, the graded hardmask including a first material and a second material with extreme ultraviolet (EUV) absorption cross sections for absorption of EUV wavelengths, the second material configured to provide adhesion to photoresist materials. The method also includes depositing a photoresist layer over the graded hardmask. The method additionally includes patterning the photoresist layer. The method further includes etching the graded hardmask. The method also includes removing the photoresist layer.Type: GrantFiled: March 10, 2021Date of Patent: June 21, 2022Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Jennifer Church, Ekmini A. De Silva, Dario Goldfarb
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Patent number: 11181786Abstract: The electro-optical device includes a first substrate including a plurality of pixel electrodes, a second substrate facing the first substrate, and an electro-optical layer disposed between the first substrate and the second substrate. The first substrate is provided with a spacer protruding from a position overlapping with a portion between adjacent pixel electrodes toward the second substrate, and an insulating protective film is provided between the spacer and the pixel electrode. The spacer is made of a metal material such as titanium nitride, and a surface of the spacer is covered with an insulating film. A first oriented film overlaps the spacer with the insulating film interposed therebetween. The first substrate is formed with a recessed portion that is recessed toward a substrate body, and a root portion of the spacer is embedded in the recessed portion.Type: GrantFiled: February 4, 2021Date of Patent: November 23, 2021Assignee: SEIKO EPSON CORPORATIONInventor: Satoshi Ito
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Patent number: 10953641Abstract: A thermally conductive type polyimide substrate is provided. The substrate comprises at least one insulating layer having a metal layer on a single side or both sides thereof. The material of the insulating layer is a thermally conductive type photosensitive resin having a thermal conductivity of 0.4 to 2, and the thermally conductive type photosensitive resin includes the following components: (a) a photosensitive polyimide, (b) an inorganic filler, and (c) a silica solution. The photosensitive polyimide accounts for 50 to 70% of a total weight of a solid composition of the thermally conductive type photosensitive resin. The inorganic filler accounts for 20-30% of the total weight of the solid composition of the thermally conductive type photosensitive resin, and has a particle size between 40 nm and 5 ?m.Type: GrantFiled: March 22, 2018Date of Patent: March 23, 2021Assignee: Microcosm Technology Co., Ltd.Inventors: Tang-Chieh Huang, Po-Cheng Chen
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Patent number: 10910236Abstract: In one embodiment, a semiconductor manufacturing apparatus includes a liquid supplier configured to supply liquid to a film on a substrate and cause a substance to dissolve from the film in the liquid. The apparatus further includes a first channel configured to recover the liquid supplied to the film and feed the liquid again to the liquid supplier, and a second channel configured to drain the liquid supplied to the film. The apparatus further includes a first switching module configured to switch a discharge destination of the liquid supplied to the film between the first and second channels, and a second switching module configured to switch between supplementing and not supplementing the first channel with new liquid. The apparatus further includes a controller configured to control the first and second switching modules to adjust concentration of the substance in the liquid to be supplied to the film.Type: GrantFiled: March 7, 2019Date of Patent: February 2, 2021Assignee: TOSHIBA MEMORY CORPORATIONInventors: Shinsuke Muraki, Hiroaki Yamada, Yuji Hashimoto
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Patent number: 10792909Abstract: A laser-engravable pad printing plate comprising at least (a) a metal support, (b) an adhesion layer, (c) a laser-engravable recording layer having a layer thickness of 20 ?m to 200 ?m, (d) a cover film, characterized in that the laser-engravable recording layer (c) comprises (c1) 40 to 95 wt % of a polyvinyl alcohol, (c2) 5 to 50 wt % of an IR absorber, (c3) 0 to 30 wt % of an inorganic filler, (c4) 0 to 20 wt % of a crosslinker, and (c5) 0 to 10 wt % of further additives.Type: GrantFiled: May 3, 2016Date of Patent: October 6, 2020Assignee: Flint Group Germany GmbHInventors: Markus Mühlfeit, Alfred Leinenbach, Jochen Unglaube
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Patent number: 10774237Abstract: A thermosetting resin composition, a thermosetting resin composition for protective films, a thermosetting resin composition for planarizing films, and a method for producing a cured film, a protective film, or a planarizing film by using the resin composition. A thermosetting resin composition has a polymer having a structural unit of Formula (1) below, a curing agent in an amount of 0% by mass to 30% by mass with respect to the polymer, and a solvent. When the thermosetting resin composition includes the curing agent, the curing agent is at least one compound selected from polyfunctional (meth)acrylate compounds and polyfunctional blocked isocyanate compounds: (wherein A1 is a C2 or C3 alkenyl group or alkynyl group, and A2 is a C2 alkenylene group or alkynylene group).Type: GrantFiled: September 23, 2016Date of Patent: September 15, 2020Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Takahiro Sakaguchi, Yuki Sugawara, Isao Adachi
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Patent number: 10761426Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film using a composition for forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer containing an organic solvent, in which the composition for forming an upper layer film includes a resin and at least one of a compound capable of generating an acid with actinic rays or radiation, a compound capable of generating an acid with heat, and an acid, in which the resin includes a repeating unit represented by General Formula (II). The method for manufacturing an electronic device includes the pattern forming method. A laminate includes the film and the upper layer film.Type: GrantFiled: February 26, 2018Date of Patent: September 1, 2020Assignee: FUJIFILM CorporationInventors: Hideaki Tsubaki, Wataru Nihashi, Toru Tsuchihashi, Kei Yamamoto
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Patent number: 10723847Abstract: A method for determining hydration of a polymer includes mixing a water-soluble, powdered dye with a powdered polymer and introducing the mixed water-soluble, powdered dye and powdered polymer into a water-based fluid. Full hydration of the powdered polymer is determined when the mixed water-soluble, powdered dye, powdered polymer and water-based fluid comprises substantially no internal optical contrast.Type: GrantFiled: October 12, 2018Date of Patent: July 28, 2020Assignee: ProAction Fluids LLCInventors: Nathan R. Hutchings, John Paxton Monsour, Ryan Humphrey
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Patent number: 10675657Abstract: A method for fabricating an optical element is provided. The fabrication method includes the following steps. A substrate is provided. A plurality of metal grids are formed on the substrate. A first organic layer is formed on the substrate between the plurality of metal grids. A second organic layer is formed on the first organic layer and the plurality of metal grids. The second organic layer and the first organic layer are etched to leave the plurality of metal grids and a plurality of patterned second organic layers on the plurality of metal grids. An optical element fabricated by the method is also provided.Type: GrantFiled: July 10, 2018Date of Patent: June 9, 2020Assignee: VISERA TECHNOLOGIES COMPANY LIMITEDInventors: Sheng-Chuan Cheng, Huang-Jen Chen, Chi-Han Lin, Han-Lin Wu
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Patent number: 10649337Abstract: Provided is a positive type lithographic printing plate precursor including at least: a support which has a hydrophilic surface or a hydrophilic layer; and an underlayer, an interlayer, and an upper layer on the support in this order, in which the underlayer contains a polymer compound 1 which has at least one structure selected from the group consisting of a urethane bond, an acetal structure, and a urea bond in a main chain, the interlayer contains a polymer compound 2 which has at least one structure selected from the group consisting of a sulfonamide group, an active imide group, and a urea bond in a side chain, the upper layer contains a polymer compound 3 which has a phenolic hydroxy group, and one or more layers among the underlayer, the interlayer, and the upper layer contain an infrared absorbent.Type: GrantFiled: March 13, 2019Date of Patent: May 12, 2020Assignee: FUJIFILM CORPORATIONInventors: Takashi Sato, Rena Mukaiyama, Yuichi Yasuhara
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Patent number: 10578969Abstract: Photoresist topcoat compositions, comprising: a first polymer comprising a first repeat unit of general formula (I) and a second repeat unit of general formula (II): wherein: R1 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R2 represents optionally fluorinated linear, branched or cyclic C1 to C20 alkyl; L1 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; a second polymer comprising a first repeat unit of general formula (III) and a second repeat unit of general formula (IV): wherein: R3 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R4 represents linear, branched or cyclic C1 to C20 alkyl; R5 represents linear, branched or cyclic C1 to C20 fluoroalkyl; L2 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; and a solvent. Coated substrates coated with the described topcoat compositions and methods of processing a photoresist composition are also provided.Type: GrantFiled: January 11, 2019Date of Patent: March 3, 2020Assignee: Rohm and Haas Electronic Materials LLCInventors: Cong Liu, Doris H. Kang, Deyan Wang, Cheng-Bai Xu, Mingqi Li, Irvinder Kaur
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Patent number: 10539867Abstract: A film and method of forming a film provides an unmodified starting layer of a starting material, the starting layer having opposed first and second surfaces and an initial thickness, T1, and a modified surface layer of thickness T2 which is less than T1, formed in at least a portion of the second surface, wherein a portion of the modified surface layer is not supported by unmodified starting material removed from the first surface opposite the modified surface layer.Type: GrantFiled: May 21, 2014Date of Patent: January 21, 2020Assignee: Exogenesis CorporationInventors: Sean R. Kirkpatrick, Son T. Chau
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Patent number: 10539873Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.Type: GrantFiled: January 26, 2015Date of Patent: January 21, 2020Assignee: Rohm and Haas Electronic Materials LLCInventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Gregory P. Prokopowicz, David A. Valeri
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Patent number: 10518571Abstract: A digitally imageable, photopolymerizable flexographic printing element that includes, disposed one above another in order, at least a dimensionally stable support, at least one photopolymerizable, relief-forming layer having a layer thickness of 300-6000 ?m, including at least one elastomeric binder, an ethylenically unsaturated monomer, and a photoinitiator or a photoinitiator system, an oxygen-blocking barrier layer which is transparent to UVA light and has a layer thickness of 0.3-5 ?m, a laser-ablatable mask layer having a layer thickness of 0.3-5 ?m, including at least one elastomeric binder and a material which absorbs UV/VIS light, and a removable outer film, wherein the at least one relief-forming layer, the barrier layer and the mask layer are soluble or dispersible in an organic solvent, and the barrier layer includes at least one oxygen-blocking binder and an oligomeric or polymeric basic adhesion component.Type: GrantFiled: May 24, 2016Date of Patent: December 31, 2019Assignee: FLINT GROUP GERMANY GmbHInventors: Matthias Beyer, Armin Becker
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Patent number: 10481495Abstract: Provided are topcoat compositions that include: a matrix polymer; a surface active polymer; an ionic thermal acid generator comprising an anion and a cation, wherein the anion, the cation, or the anion and the cation are fluorinated; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.Type: GrantFiled: February 7, 2019Date of Patent: November 19, 2019Assignee: Rohm and Haas Electronic Materials LLCInventors: Irvinder Kaur, Doris Kang, Cong Liu, Gerhard Pohlers, Mingqi Li
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Patent number: 10466414Abstract: A grating for line-narrowing a laser beam that is outputted from a laser apparatus at a wavelength in a vacuum ultraviolet region may include: a grating substrate; a first aluminum metal film formed above the grating substrate, the first aluminum metal film having grooves in a surface thereof; and a first protective film formed by an ALD method above the first aluminum metal film.Type: GrantFiled: May 15, 2017Date of Patent: November 5, 2019Assignee: Gigaphoton Inc.Inventors: Hirotaka Miyamoto, Osamu Wakabayashi
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Patent number: 10437152Abstract: Photopolymerizable, preferably digitally imageable photopolymerizable, flexographic printing elements having a PET support sheet of low thermal shrinkage, methods of preparing such flexographic printing elements and their use for making flexographic printing plates by imagewise exposure to light, washing out with organic solvents and drying, wherein said drying is carried out at temperatures of more than 60° C.Type: GrantFiled: June 2, 2015Date of Patent: October 8, 2019Assignee: Flint Group Germany GmbHInventors: Armin Becker, Jochen Unglaube, Andrea Wochele
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Patent number: 10400760Abstract: A liquid can be delivered with a simple configuration. A liquid delivery method includes allowing a liquid to flow in a tube having elasticity depending on a pressure of a gas filled in an inner space between a tube housing covering an outside of the tube and an outer surface of the tube; obtaining a magnitude of a pressure of the liquid flowing in the tube as a first value; obtaining a magnitude of the pressure of the gas filled in the inner space as a second value; calculating a difference between the first value and the second value as a third value; and detecting a status of the tube on the basis of the third value.Type: GrantFiled: October 21, 2015Date of Patent: September 3, 2019Assignee: TOKYO ELECTRONIC LIMITEDInventors: Takashi Sasa, Katsuya Hashimoto, Daiki Shibata, Takeshi Ohto
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Patent number: 10262880Abstract: Techniques disclosed herein provide an apparatus and method of spin coating that inhibits the formation of wind marks and other defects from turbulent fluid-flow, thereby enabling higher rotational velocities and decreased drying times, while maintaining film uniformity. Techniques disclosed herein include a fluid-flow member, such as a ring or cover, positioned or suspended above the surface of a wafer or other substrate. The fluid-flow member has a radial curvature that prevents wind marks during rotation of a wafer during a coating and spin drying process.Type: GrantFiled: February 19, 2013Date of Patent: April 16, 2019Assignee: Tokyo Electron LimitedInventors: Derek W. Bassett, Wallace P. Printz, Joshua S. Hooge, Katsunori Ichino, Yuichi Terashita, Kousuke Yoshihara
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Patent number: 10259236Abstract: A process for printing multiple layers on a fabric or other material using UV-curable ink that includes a step of printing a first layer on the material and another step of partially curing the first layer. A next step includes printing a partially UV-transparent layer over the first layer and fully curing the UV-transparent layer while simultaneously fully curing the first layer.Type: GrantFiled: February 1, 2017Date of Patent: April 16, 2019Assignee: NIKE, Inc.Inventor: Todd W. Miller
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Patent number: 10245617Abstract: The present invention relates to a process for producing a surface-functionalized molding (oF) having a functionalized surface (fO). In this process a surface (O) of a molding (F) is brought into contact with a dienophile-containing solution (dL). The surface (O) comprises a polyamide (P) which comprises furan units. These furan units are able to react with the at least one dienophile present in the dienophile-containing solution (dL) to give the surface-functionalized molding (oF) having the functionalized surface (fO).Type: GrantFiled: July 6, 2016Date of Patent: April 2, 2019Assignee: BASF SEInventors: Gijsbrecht Jacobus Maria Habraken, Johannes Klaus Sprafke, Marion da Silva
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Patent number: 10214610Abstract: The present invention relates to a novel multipurpose polymer and a composition containing the same. The polymer and the composition of the present invention are very useful for preparing a semiconductor device having very good mechanical and optical properties.Type: GrantFiled: August 22, 2014Date of Patent: February 26, 2019Assignees: DNF CO., LTD., SKC CO., LTD.Inventors: Joo Hyeon Park, Myong Woon Kim, Sang Ick Lee, Tae Seok Byun, Seung Son, Yong Hee Kwone, In Kyung Jung, Joon Sung Ryou
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Patent number: 10202528Abstract: There is provided a novel polymer, a composition containing the polymer, and a novel adhesive composition containing the polymer from which a cured film having desired properties is obtained. A polymer comprising a structural unit of Formula (1): wherein Q is a bivalent group, R1 is a C1-10 alkylene group, a C2-10 alkenylene group or C2-10 alkynylene group, a C6-14 arylene group, a C4-10 cyclic alkylene group, etc., or a polymer comprising a structural unit of Formula (6): wherein Q4 is an allyl group, a vinyl group, an epoxy group, or a glycidyl group, and R5 is a bivalent organic group having a main chain containing only carbon atom or at least one of oxygen atom, nitrogen atom and sulfur atom in addition to carbon atom, a composition comprising the polymer, and an adhesive composition comprising the polymer and a solvent.Type: GrantFiled: April 13, 2016Date of Patent: February 12, 2019Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Mamoru Tamura, Takuya Ohashi, Takahiro Kishioka, Tomoyuki Enomoto
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Patent number: 10189947Abstract: An anti-reflective hardmask composition is provided.Type: GrantFiled: January 6, 2017Date of Patent: January 29, 2019Inventor: Sang Jun Choi
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Patent number: 10160846Abstract: The inventions are an optical film containing cellulose acylate and a compound having a structure denoted by General Formula (A) described below, and a polarizing plate and a liquid crystal display device employing the optical film. L represents n-valent connecting group, n represents an integer of greater than or equal to 2, and A represents a heterocyclic group denoted by General Formula (I). R1, R3, and R5 represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, or a heteroaryl group. Here, any one of R1, R3, and R5 is bonded to L.Type: GrantFiled: January 8, 2016Date of Patent: December 25, 2018Assignee: FUJIFILM CorporationInventors: Masaki Noro, Yutaka Nozoe, Hiroshi Inada, Naoya Shimoju, Aiko Yoshida, Yu Naito, Yasukazu Kuwayama
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Patent number: 10120277Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.Type: GrantFiled: February 17, 2017Date of Patent: November 6, 2018Assignees: JSR CORPORATION, Cornell UniversityInventors: Kazuki Kasahara, Vasiliki Kosma, Jeremy Odent, Hong Xu, Mufei Yu, Emmanuel P. Giannelis, Christopher K. Ober
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Patent number: 10121923Abstract: The present invention relates to a laminate including an alkali metal-doped layer. The laminate is processable at high temperatures of at least 550° C. and has excellent durability and barrier properties. Due to these advantages, the laminate can be used to fabricate a thin film solar cell with high flexibility and improved energy conversion efficiency. The present invention also relates to a thin film solar cell including the laminate.Type: GrantFiled: June 19, 2014Date of Patent: November 6, 2018Assignee: LG CHEM, LTD.Inventors: Hee Han, Kyungjun Kim
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Patent number: 10113083Abstract: The present invention provides a resist underlayer film that has a wide focus position range within which a good resist shape can be obtained. A resist underlayer film-forming composition for lithography comprising a linear polymer that is obtained by a reaction of a diepoxy group-containing compound (A) with a dicarboxyl group-containing compound (B). The linear polymer has structures of the following formulae (1), (2), and (3) derived from the diepoxy group-containing compound (A) or the dicarboxyl group-containing compound (B): The linear polymer preferably contains a polymer obtained by a reaction of two diepoxy group-containing compounds (A) each having structures of Formulae (1) and (2) with a dicarboxyl group-containing compound (B) having a structure of Formula (3), or a polymer obtained by a reaction of a diepoxy group-containing compound (A) having a structure of Formula (1) with two dicarboxyl group-containing compounds (B) each having structures of Formulae (2) and (3).Type: GrantFiled: August 1, 2014Date of Patent: October 30, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Ryuji Ohnishi, Ryuta Mizuochi, Tokio Nishita, Yasushi Sakaida, Rikimaru Sakamoto
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Patent number: 10108088Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, a radiation-sensitive acid generator, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A van der Waals volume of an acid generated from the radiation-sensitive acid generator is no less than 2.0×10?28 m3. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %.Type: GrantFiled: February 17, 2017Date of Patent: October 23, 2018Assignee: JSR CORPORATIONInventor: Kazuki Kasahara
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Patent number: 10090194Abstract: A method of manufacturing a semiconductor device includes the step of positioning a patterned mask over a dielectric layer. The dielectric layer comprises a low-temperature cure polyimide. The method further includes the steps of exposing a first surface of the dielectric layer through the patterned mask to an I-line wavelength within an I-line stepper, and developing the dielectric layer to form an opening.Type: GrantFiled: March 18, 2016Date of Patent: October 2, 2018Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Zi-Jheng Liu, Yu-Hsiang Hu, Hung-Jui Kuo
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Patent number: 10061196Abstract: A photosensitive composition, a method for producing a cured film using the photosensitive composition, a cured film prepared by curing the photosensitive composition, and a touch panel and a display device that use the cured film are provided. The photosensitive composition contains: a compound having two or more ethylenically unsaturated groups; a photopolymerization initiator; a polymer A1 containing a constitutional unit a1 represented by the following Formula 1 and a constitutional unit a2 having a carboxylic acid anhydride structure; particles; and a solvent. A molar content ratio of the constitutional unit a1 to the constitutional unit a2 in the polymer A1 is in a range of a1:a2=3:1 to 6:1. An acid anhydride value of the polymer A1 is from 1.30 to 3.00 mmol/g. A number average primary particle size of the particles is from 10 to 200 nm.Type: GrantFiled: November 17, 2016Date of Patent: August 28, 2018Assignee: FUJIFILM CORPORATIONInventors: Yuzo Fujiki, Shigekazu Suzuki
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Patent number: 10042257Abstract: A resin laminate having a structure in which a support, an intermediate layer and an image-forming resin layer are laminated in the order mentioned, the resin laminate including (A) a cationic polymer in the image-forming resin layer, and (B) an anionic polymer in the intermediate layer in contact with image-forming resin layer, wherein the (B) anionic polymer is a modified and partially saponified polyvinyl acetate in which a carboxyl group is introduced to a polymer side chain using a hydroxyl group of a partially saponified polyvinyl acetate as an origin of introduction.Type: GrantFiled: February 16, 2015Date of Patent: August 7, 2018Assignee: Toray Industries, Inc.Inventors: Tsutomu Abura, Kenji Ido
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Patent number: 9963571Abstract: Aerogel compositions that include polyamic amides, methods for preparing the aerogel compositions, and articles of manufacture that include or manufactured from the aerogel compositions are described.Type: GrantFiled: June 7, 2017Date of Patent: May 8, 2018Assignee: Blueshift Materials, Inc.Inventors: Alan D. Sakaguchi, Garrett D. Poe, David J. Irvin, Alysa M. Joaquin, Janae D. Manning
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Patent number: 9927705Abstract: An additive for a resist underlayer film-forming composition that modifies a surface state of a resist underlayer film into a hydrophobic state to enhance adhesion between the resist underlayer film and a resist pattern formed on the resist underlayer film, and a resist underlayer film-forming composition containing the additive. An additive for a resist underlayer film-forming composition including a polymer having a structural unit of Formula (1): (wherein R1 is a hydrogen atom or methyl group, L is a single bond or a divalent linking group, and X is an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, or a heterocyclic group having an oxygen atom as a heteroatom that does not have a hydroxy group). A resist underlayer film-forming composition for lithography including a resin binder, an organic solvent, and the additive.Type: GrantFiled: July 16, 2014Date of Patent: March 27, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Noriaki Fujitani, Takafumi Endo, Ryuji Ohnishi, Rikimaru Sakamoto
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Patent number: 9921513Abstract: A charging member capable of inhibiting the effect of the contact mark on the electrophotographic image, even after in contact with another member for a long term, is provided. The charging member has a surface layer on a support, the surface layer containing a polymer compound having a structural unit represented by the following formula (1): In the formula (1), A represents an aromatic cyclic hydrocarbon group; R1 represents a specific hydrocarbon group. L represents a polysiloxane having at least one of an SiO3/2 unit (T) and an SiO2/2 unit (D). U represents an integer of 1 or more.Type: GrantFiled: December 2, 2015Date of Patent: March 20, 2018Assignee: CANON KABUSHIKI KAISHAInventors: Hiroki Masu, Noriyuki Doi, Kineo Takeno
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Patent number: 9914687Abstract: A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W1 and W2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or —S—, R1 is a single bond or a C1-4 alkylene group, R2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R1, R2, and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y1, Y2) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R3a and R3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.Type: GrantFiled: March 28, 2014Date of Patent: March 13, 2018Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Dai Shiota, Kunihiro Noda, Hiroki Chisaka
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Patent number: 9908990Abstract: An organic layer composition, an organic layer, and a method of forming patterns, the composition including a polymer that includes a substituted or unsubstituted fluorene structure, an additive represented by Chemical Formula 1, and a solvent:Type: GrantFiled: November 25, 2015Date of Patent: March 6, 2018Assignee: SAMSUNG SDI CO., LTD.Inventors: Sun-Hae Kang, Youn-Hee Nam, Min-Soo Kim, Dominea Rathwell, You-Jung Park, Hyun-Ji Song, Sun young Yang
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Patent number: 9841534Abstract: Optically clear adhesive or coating layers can be prepared by preparing a curable mixture, coating the curable mixture to form a layer, partially curing the curable mixture, drying the coated layer, and fully curing the curable mixture. The curable mixture may also be partially cured and then coated, dried and fully cured. The curable mixture includes two free radically polymerizable monomer compositions that are relatively incompatible and a transient compatibilizer, such as a solvent. Polymers of the two monomer compositions, if polymerized separately and blended, form phase separated domains. The curable mixture provides for adhesive or coating layers that are optically clear.Type: GrantFiled: December 13, 2011Date of Patent: December 12, 2017Assignee: 3M Innovative Properties CompanyInventors: Scott M. Tapio, Audrey A. Sherman, William R. Dudley, Joan M. Noyola
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Patent number: 9839138Abstract: The present invention relates to a method for fabricating blackened conductive patterns, which includes (i) forming a resist layer on a non-conductive substrate; (ii) forming fine pattern grooves in the resist layer using a laser beam; (iii) forming a mixture layer containing a conductive material and a blackening material in the fine pattern grooves; and (iv) removing the resist layer remained on the non-conductive substrate.Type: GrantFiled: September 9, 2014Date of Patent: December 5, 2017Assignee: Inktec Co., Ltd.Inventors: Kwang Choon Chung, Ji Hoon Yoo, Su-Han Kim, Byung Hun Kim
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Patent number: 9832990Abstract: A composition and a method of preparing the composition are provided herein. The composition comprises an active substance and a polymeric additive comprising at least one unit represented by the formula (I): wherein each R is independently selected from the group of a hydrogen atom, an alkyl group, an aryl group, and combinations thereof; and Z comprises at least 10 units represented by the formula (II): wherein each R1 is independently selected from the group of a hydrogen atom, an alkyl group, an aryl group, a carbonyl group, a hydroxyl group, an ether group, and combinations thereof and R2 is a C1-C10 hydrocarbon group. The polymeric additive further comprising at least one unit represented by the formula (III): A??(III) wherein A is an alkyleneoxy group having from 2 to 10 carbon atoms.Type: GrantFiled: March 7, 2011Date of Patent: December 5, 2017Assignee: BASF SEInventors: Laura L. Brasher, Michael D. Capracotta, Sonia Patterson, Murat Mertoglu, Marc Nolte, Stefan Bechtel, Kristin Klappach
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Patent number: 9809027Abstract: A method of manufacturing a structure includes (1) positioning a first resin layer provided on a first supporting member on a substrate having a through hole, with the first resin layer facing toward the substrate, and releasing the first supporting member from the first resin layer; and (2) positioning a second resin layer provided on a second supporting member on the first resin layer from which the first supporting member has been released, with the second resin layer facing toward the first resin layer, and releasing the second supporting member from the second resin layer. A first resin layer portion that is above the through hole is removed before or simultaneously with the releasing of the first supporting member.Type: GrantFiled: January 13, 2015Date of Patent: November 7, 2017Assignee: CANON KABUSHIKI KAISHAInventors: Keiji Matsumoto, Jun Yamamuro, Kazuhiro Asai, Kunihito Uohashi, Seiichiro Yaginuma, Masahisa Watanabe, Koji Sasaki, Ryotaro Murakami, Kenji Fujii