Identified Backing Or Protective Layer Containing Patents (Class 430/271.1)
  • Patent number: 10792909
    Abstract: A laser-engravable pad printing plate comprising at least (a) a metal support, (b) an adhesion layer, (c) a laser-engravable recording layer having a layer thickness of 20 ?m to 200 ?m, (d) a cover film, characterized in that the laser-engravable recording layer (c) comprises (c1) 40 to 95 wt % of a polyvinyl alcohol, (c2) 5 to 50 wt % of an IR absorber, (c3) 0 to 30 wt % of an inorganic filler, (c4) 0 to 20 wt % of a crosslinker, and (c5) 0 to 10 wt % of further additives.
    Type: Grant
    Filed: May 3, 2016
    Date of Patent: October 6, 2020
    Assignee: Flint Group Germany GmbH
    Inventors: Markus Mühlfeit, Alfred Leinenbach, Jochen Unglaube
  • Patent number: 10774237
    Abstract: A thermosetting resin composition, a thermosetting resin composition for protective films, a thermosetting resin composition for planarizing films, and a method for producing a cured film, a protective film, or a planarizing film by using the resin composition. A thermosetting resin composition has a polymer having a structural unit of Formula (1) below, a curing agent in an amount of 0% by mass to 30% by mass with respect to the polymer, and a solvent. When the thermosetting resin composition includes the curing agent, the curing agent is at least one compound selected from polyfunctional (meth)acrylate compounds and polyfunctional blocked isocyanate compounds: (wherein A1 is a C2 or C3 alkenyl group or alkynyl group, and A2 is a C2 alkenylene group or alkynylene group).
    Type: Grant
    Filed: September 23, 2016
    Date of Patent: September 15, 2020
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takahiro Sakaguchi, Yuki Sugawara, Isao Adachi
  • Patent number: 10761426
    Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film using a composition for forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer containing an organic solvent, in which the composition for forming an upper layer film includes a resin and at least one of a compound capable of generating an acid with actinic rays or radiation, a compound capable of generating an acid with heat, and an acid, in which the resin includes a repeating unit represented by General Formula (II). The method for manufacturing an electronic device includes the pattern forming method. A laminate includes the film and the upper layer film.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: September 1, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Wataru Nihashi, Toru Tsuchihashi, Kei Yamamoto
  • Patent number: 10723847
    Abstract: A method for determining hydration of a polymer includes mixing a water-soluble, powdered dye with a powdered polymer and introducing the mixed water-soluble, powdered dye and powdered polymer into a water-based fluid. Full hydration of the powdered polymer is determined when the mixed water-soluble, powdered dye, powdered polymer and water-based fluid comprises substantially no internal optical contrast.
    Type: Grant
    Filed: October 12, 2018
    Date of Patent: July 28, 2020
    Assignee: ProAction Fluids LLC
    Inventors: Nathan R. Hutchings, John Paxton Monsour, Ryan Humphrey
  • Patent number: 10675657
    Abstract: A method for fabricating an optical element is provided. The fabrication method includes the following steps. A substrate is provided. A plurality of metal grids are formed on the substrate. A first organic layer is formed on the substrate between the plurality of metal grids. A second organic layer is formed on the first organic layer and the plurality of metal grids. The second organic layer and the first organic layer are etched to leave the plurality of metal grids and a plurality of patterned second organic layers on the plurality of metal grids. An optical element fabricated by the method is also provided.
    Type: Grant
    Filed: July 10, 2018
    Date of Patent: June 9, 2020
    Assignee: VISERA TECHNOLOGIES COMPANY LIMITED
    Inventors: Sheng-Chuan Cheng, Huang-Jen Chen, Chi-Han Lin, Han-Lin Wu
  • Patent number: 10649337
    Abstract: Provided is a positive type lithographic printing plate precursor including at least: a support which has a hydrophilic surface or a hydrophilic layer; and an underlayer, an interlayer, and an upper layer on the support in this order, in which the underlayer contains a polymer compound 1 which has at least one structure selected from the group consisting of a urethane bond, an acetal structure, and a urea bond in a main chain, the interlayer contains a polymer compound 2 which has at least one structure selected from the group consisting of a sulfonamide group, an active imide group, and a urea bond in a side chain, the upper layer contains a polymer compound 3 which has a phenolic hydroxy group, and one or more layers among the underlayer, the interlayer, and the upper layer contain an infrared absorbent.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: May 12, 2020
    Assignee: FUJIFILM CORPORATION
    Inventors: Takashi Sato, Rena Mukaiyama, Yuichi Yasuhara
  • Patent number: 10578969
    Abstract: Photoresist topcoat compositions, comprising: a first polymer comprising a first repeat unit of general formula (I) and a second repeat unit of general formula (II): wherein: R1 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R2 represents optionally fluorinated linear, branched or cyclic C1 to C20 alkyl; L1 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; a second polymer comprising a first repeat unit of general formula (III) and a second repeat unit of general formula (IV): wherein: R3 independently represents H, F or optionally fluorinated C1 to C4 alkyl; R4 represents linear, branched or cyclic C1 to C20 alkyl; R5 represents linear, branched or cyclic C1 to C20 fluoroalkyl; L2 represents a single bond or a multivalent linking group; and n is an integer of from 1 to 5; and a solvent. Coated substrates coated with the described topcoat compositions and methods of processing a photoresist composition are also provided.
    Type: Grant
    Filed: January 11, 2019
    Date of Patent: March 3, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Cong Liu, Doris H. Kang, Deyan Wang, Cheng-Bai Xu, Mingqi Li, Irvinder Kaur
  • Patent number: 10539873
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: January 21, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Gregory P. Prokopowicz, David A. Valeri
  • Patent number: 10539867
    Abstract: A film and method of forming a film provides an unmodified starting layer of a starting material, the starting layer having opposed first and second surfaces and an initial thickness, T1, and a modified surface layer of thickness T2 which is less than T1, formed in at least a portion of the second surface, wherein a portion of the modified surface layer is not supported by unmodified starting material removed from the first surface opposite the modified surface layer.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: January 21, 2020
    Assignee: Exogenesis Corporation
    Inventors: Sean R. Kirkpatrick, Son T. Chau
  • Patent number: 10518571
    Abstract: A digitally imageable, photopolymerizable flexographic printing element that includes, disposed one above another in order, at least a dimensionally stable support, at least one photopolymerizable, relief-forming layer having a layer thickness of 300-6000 ?m, including at least one elastomeric binder, an ethylenically unsaturated monomer, and a photoinitiator or a photoinitiator system, an oxygen-blocking barrier layer which is transparent to UVA light and has a layer thickness of 0.3-5 ?m, a laser-ablatable mask layer having a layer thickness of 0.3-5 ?m, including at least one elastomeric binder and a material which absorbs UV/VIS light, and a removable outer film, wherein the at least one relief-forming layer, the barrier layer and the mask layer are soluble or dispersible in an organic solvent, and the barrier layer includes at least one oxygen-blocking binder and an oligomeric or polymeric basic adhesion component.
    Type: Grant
    Filed: May 24, 2016
    Date of Patent: December 31, 2019
    Assignee: FLINT GROUP GERMANY GmbH
    Inventors: Matthias Beyer, Armin Becker
  • Patent number: 10481495
    Abstract: Provided are topcoat compositions that include: a matrix polymer; a surface active polymer; an ionic thermal acid generator comprising an anion and a cation, wherein the anion, the cation, or the anion and the cation are fluorinated; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.
    Type: Grant
    Filed: February 7, 2019
    Date of Patent: November 19, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Irvinder Kaur, Doris Kang, Cong Liu, Gerhard Pohlers, Mingqi Li
  • Patent number: 10466414
    Abstract: A grating for line-narrowing a laser beam that is outputted from a laser apparatus at a wavelength in a vacuum ultraviolet region may include: a grating substrate; a first aluminum metal film formed above the grating substrate, the first aluminum metal film having grooves in a surface thereof; and a first protective film formed by an ALD method above the first aluminum metal film.
    Type: Grant
    Filed: May 15, 2017
    Date of Patent: November 5, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Hirotaka Miyamoto, Osamu Wakabayashi
  • Patent number: 10437152
    Abstract: Photopolymerizable, preferably digitally imageable photopolymerizable, flexographic printing elements having a PET support sheet of low thermal shrinkage, methods of preparing such flexographic printing elements and their use for making flexographic printing plates by imagewise exposure to light, washing out with organic solvents and drying, wherein said drying is carried out at temperatures of more than 60° C.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: October 8, 2019
    Assignee: Flint Group Germany GmbH
    Inventors: Armin Becker, Jochen Unglaube, Andrea Wochele
  • Patent number: 10400760
    Abstract: A liquid can be delivered with a simple configuration. A liquid delivery method includes allowing a liquid to flow in a tube having elasticity depending on a pressure of a gas filled in an inner space between a tube housing covering an outside of the tube and an outer surface of the tube; obtaining a magnitude of a pressure of the liquid flowing in the tube as a first value; obtaining a magnitude of the pressure of the gas filled in the inner space as a second value; calculating a difference between the first value and the second value as a third value; and detecting a status of the tube on the basis of the third value.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: September 3, 2019
    Assignee: TOKYO ELECTRONIC LIMITED
    Inventors: Takashi Sasa, Katsuya Hashimoto, Daiki Shibata, Takeshi Ohto
  • Patent number: 10259236
    Abstract: A process for printing multiple layers on a fabric or other material using UV-curable ink that includes a step of printing a first layer on the material and another step of partially curing the first layer. A next step includes printing a partially UV-transparent layer over the first layer and fully curing the UV-transparent layer while simultaneously fully curing the first layer.
    Type: Grant
    Filed: February 1, 2017
    Date of Patent: April 16, 2019
    Assignee: NIKE, Inc.
    Inventor: Todd W. Miller
  • Patent number: 10262880
    Abstract: Techniques disclosed herein provide an apparatus and method of spin coating that inhibits the formation of wind marks and other defects from turbulent fluid-flow, thereby enabling higher rotational velocities and decreased drying times, while maintaining film uniformity. Techniques disclosed herein include a fluid-flow member, such as a ring or cover, positioned or suspended above the surface of a wafer or other substrate. The fluid-flow member has a radial curvature that prevents wind marks during rotation of a wafer during a coating and spin drying process.
    Type: Grant
    Filed: February 19, 2013
    Date of Patent: April 16, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Derek W. Bassett, Wallace P. Printz, Joshua S. Hooge, Katsunori Ichino, Yuichi Terashita, Kousuke Yoshihara
  • Patent number: 10245617
    Abstract: The present invention relates to a process for producing a surface-functionalized molding (oF) having a functionalized surface (fO). In this process a surface (O) of a molding (F) is brought into contact with a dienophile-containing solution (dL). The surface (O) comprises a polyamide (P) which comprises furan units. These furan units are able to react with the at least one dienophile present in the dienophile-containing solution (dL) to give the surface-functionalized molding (oF) having the functionalized surface (fO).
    Type: Grant
    Filed: July 6, 2016
    Date of Patent: April 2, 2019
    Assignee: BASF SE
    Inventors: Gijsbrecht Jacobus Maria Habraken, Johannes Klaus Sprafke, Marion da Silva
  • Patent number: 10214610
    Abstract: The present invention relates to a novel multipurpose polymer and a composition containing the same. The polymer and the composition of the present invention are very useful for preparing a semiconductor device having very good mechanical and optical properties.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: February 26, 2019
    Assignees: DNF CO., LTD., SKC CO., LTD.
    Inventors: Joo Hyeon Park, Myong Woon Kim, Sang Ick Lee, Tae Seok Byun, Seung Son, Yong Hee Kwone, In Kyung Jung, Joon Sung Ryou
  • Patent number: 10202528
    Abstract: There is provided a novel polymer, a composition containing the polymer, and a novel adhesive composition containing the polymer from which a cured film having desired properties is obtained. A polymer comprising a structural unit of Formula (1): wherein Q is a bivalent group, R1 is a C1-10 alkylene group, a C2-10 alkenylene group or C2-10 alkynylene group, a C6-14 arylene group, a C4-10 cyclic alkylene group, etc., or a polymer comprising a structural unit of Formula (6): wherein Q4 is an allyl group, a vinyl group, an epoxy group, or a glycidyl group, and R5 is a bivalent organic group having a main chain containing only carbon atom or at least one of oxygen atom, nitrogen atom and sulfur atom in addition to carbon atom, a composition comprising the polymer, and an adhesive composition comprising the polymer and a solvent.
    Type: Grant
    Filed: April 13, 2016
    Date of Patent: February 12, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Mamoru Tamura, Takuya Ohashi, Takahiro Kishioka, Tomoyuki Enomoto
  • Patent number: 10189947
    Abstract: An anti-reflective hardmask composition is provided.
    Type: Grant
    Filed: January 6, 2017
    Date of Patent: January 29, 2019
    Inventor: Sang Jun Choi
  • Patent number: 10160846
    Abstract: The inventions are an optical film containing cellulose acylate and a compound having a structure denoted by General Formula (A) described below, and a polarizing plate and a liquid crystal display device employing the optical film. L represents n-valent connecting group, n represents an integer of greater than or equal to 2, and A represents a heterocyclic group denoted by General Formula (I). R1, R3, and R5 represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, or a heteroaryl group. Here, any one of R1, R3, and R5 is bonded to L.
    Type: Grant
    Filed: January 8, 2016
    Date of Patent: December 25, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Masaki Noro, Yutaka Nozoe, Hiroshi Inada, Naoya Shimoju, Aiko Yoshida, Yu Naito, Yasukazu Kuwayama
  • Patent number: 10120277
    Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.
    Type: Grant
    Filed: February 17, 2017
    Date of Patent: November 6, 2018
    Assignees: JSR CORPORATION, Cornell University
    Inventors: Kazuki Kasahara, Vasiliki Kosma, Jeremy Odent, Hong Xu, Mufei Yu, Emmanuel P. Giannelis, Christopher K. Ober
  • Patent number: 10121923
    Abstract: The present invention relates to a laminate including an alkali metal-doped layer. The laminate is processable at high temperatures of at least 550° C. and has excellent durability and barrier properties. Due to these advantages, the laminate can be used to fabricate a thin film solar cell with high flexibility and improved energy conversion efficiency. The present invention also relates to a thin film solar cell including the laminate.
    Type: Grant
    Filed: June 19, 2014
    Date of Patent: November 6, 2018
    Assignee: LG CHEM, LTD.
    Inventors: Hee Han, Kyungjun Kim
  • Patent number: 10113083
    Abstract: The present invention provides a resist underlayer film that has a wide focus position range within which a good resist shape can be obtained. A resist underlayer film-forming composition for lithography comprising a linear polymer that is obtained by a reaction of a diepoxy group-containing compound (A) with a dicarboxyl group-containing compound (B). The linear polymer has structures of the following formulae (1), (2), and (3) derived from the diepoxy group-containing compound (A) or the dicarboxyl group-containing compound (B): The linear polymer preferably contains a polymer obtained by a reaction of two diepoxy group-containing compounds (A) each having structures of Formulae (1) and (2) with a dicarboxyl group-containing compound (B) having a structure of Formula (3), or a polymer obtained by a reaction of a diepoxy group-containing compound (A) having a structure of Formula (1) with two dicarboxyl group-containing compounds (B) each having structures of Formulae (2) and (3).
    Type: Grant
    Filed: August 1, 2014
    Date of Patent: October 30, 2018
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Ryuji Ohnishi, Ryuta Mizuochi, Tokio Nishita, Yasushi Sakaida, Rikimaru Sakamoto
  • Patent number: 10108088
    Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, a radiation-sensitive acid generator, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A van der Waals volume of an acid generated from the radiation-sensitive acid generator is no less than 2.0×10?28 m3. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %.
    Type: Grant
    Filed: February 17, 2017
    Date of Patent: October 23, 2018
    Assignee: JSR CORPORATION
    Inventor: Kazuki Kasahara
  • Patent number: 10090194
    Abstract: A method of manufacturing a semiconductor device includes the step of positioning a patterned mask over a dielectric layer. The dielectric layer comprises a low-temperature cure polyimide. The method further includes the steps of exposing a first surface of the dielectric layer through the patterned mask to an I-line wavelength within an I-line stepper, and developing the dielectric layer to form an opening.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: October 2, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Zi-Jheng Liu, Yu-Hsiang Hu, Hung-Jui Kuo
  • Patent number: 10061196
    Abstract: A photosensitive composition, a method for producing a cured film using the photosensitive composition, a cured film prepared by curing the photosensitive composition, and a touch panel and a display device that use the cured film are provided. The photosensitive composition contains: a compound having two or more ethylenically unsaturated groups; a photopolymerization initiator; a polymer A1 containing a constitutional unit a1 represented by the following Formula 1 and a constitutional unit a2 having a carboxylic acid anhydride structure; particles; and a solvent. A molar content ratio of the constitutional unit a1 to the constitutional unit a2 in the polymer A1 is in a range of a1:a2=3:1 to 6:1. An acid anhydride value of the polymer A1 is from 1.30 to 3.00 mmol/g. A number average primary particle size of the particles is from 10 to 200 nm.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: August 28, 2018
    Assignee: FUJIFILM CORPORATION
    Inventors: Yuzo Fujiki, Shigekazu Suzuki
  • Patent number: 10042257
    Abstract: A resin laminate having a structure in which a support, an intermediate layer and an image-forming resin layer are laminated in the order mentioned, the resin laminate including (A) a cationic polymer in the image-forming resin layer, and (B) an anionic polymer in the intermediate layer in contact with image-forming resin layer, wherein the (B) anionic polymer is a modified and partially saponified polyvinyl acetate in which a carboxyl group is introduced to a polymer side chain using a hydroxyl group of a partially saponified polyvinyl acetate as an origin of introduction.
    Type: Grant
    Filed: February 16, 2015
    Date of Patent: August 7, 2018
    Assignee: Toray Industries, Inc.
    Inventors: Tsutomu Abura, Kenji Ido
  • Patent number: 9963571
    Abstract: Aerogel compositions that include polyamic amides, methods for preparing the aerogel compositions, and articles of manufacture that include or manufactured from the aerogel compositions are described.
    Type: Grant
    Filed: June 7, 2017
    Date of Patent: May 8, 2018
    Assignee: Blueshift Materials, Inc.
    Inventors: Alan D. Sakaguchi, Garrett D. Poe, David J. Irvin, Alysa M. Joaquin, Janae D. Manning
  • Patent number: 9927705
    Abstract: An additive for a resist underlayer film-forming composition that modifies a surface state of a resist underlayer film into a hydrophobic state to enhance adhesion between the resist underlayer film and a resist pattern formed on the resist underlayer film, and a resist underlayer film-forming composition containing the additive. An additive for a resist underlayer film-forming composition including a polymer having a structural unit of Formula (1): (wherein R1 is a hydrogen atom or methyl group, L is a single bond or a divalent linking group, and X is an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, or a heterocyclic group having an oxygen atom as a heteroatom that does not have a hydroxy group). A resist underlayer film-forming composition for lithography including a resin binder, an organic solvent, and the additive.
    Type: Grant
    Filed: July 16, 2014
    Date of Patent: March 27, 2018
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Noriaki Fujitani, Takafumi Endo, Ryuji Ohnishi, Rikimaru Sakamoto
  • Patent number: 9921513
    Abstract: A charging member capable of inhibiting the effect of the contact mark on the electrophotographic image, even after in contact with another member for a long term, is provided. The charging member has a surface layer on a support, the surface layer containing a polymer compound having a structural unit represented by the following formula (1): In the formula (1), A represents an aromatic cyclic hydrocarbon group; R1 represents a specific hydrocarbon group. L represents a polysiloxane having at least one of an SiO3/2 unit (T) and an SiO2/2 unit (D). U represents an integer of 1 or more.
    Type: Grant
    Filed: December 2, 2015
    Date of Patent: March 20, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Hiroki Masu, Noriyuki Doi, Kineo Takeno
  • Patent number: 9914687
    Abstract: A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W1 and W2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or —S—, R1 is a single bond or a C1-4 alkylene group, R2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R1, R2, and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y1, Y2) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R3a and R3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.
    Type: Grant
    Filed: March 28, 2014
    Date of Patent: March 13, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Dai Shiota, Kunihiro Noda, Hiroki Chisaka
  • Patent number: 9908990
    Abstract: An organic layer composition, an organic layer, and a method of forming patterns, the composition including a polymer that includes a substituted or unsubstituted fluorene structure, an additive represented by Chemical Formula 1, and a solvent:
    Type: Grant
    Filed: November 25, 2015
    Date of Patent: March 6, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Sun-Hae Kang, Youn-Hee Nam, Min-Soo Kim, Dominea Rathwell, You-Jung Park, Hyun-Ji Song, Sun young Yang
  • Patent number: 9841534
    Abstract: Optically clear adhesive or coating layers can be prepared by preparing a curable mixture, coating the curable mixture to form a layer, partially curing the curable mixture, drying the coated layer, and fully curing the curable mixture. The curable mixture may also be partially cured and then coated, dried and fully cured. The curable mixture includes two free radically polymerizable monomer compositions that are relatively incompatible and a transient compatibilizer, such as a solvent. Polymers of the two monomer compositions, if polymerized separately and blended, form phase separated domains. The curable mixture provides for adhesive or coating layers that are optically clear.
    Type: Grant
    Filed: December 13, 2011
    Date of Patent: December 12, 2017
    Assignee: 3M Innovative Properties Company
    Inventors: Scott M. Tapio, Audrey A. Sherman, William R. Dudley, Joan M. Noyola
  • Patent number: 9839138
    Abstract: The present invention relates to a method for fabricating blackened conductive patterns, which includes (i) forming a resist layer on a non-conductive substrate; (ii) forming fine pattern grooves in the resist layer using a laser beam; (iii) forming a mixture layer containing a conductive material and a blackening material in the fine pattern grooves; and (iv) removing the resist layer remained on the non-conductive substrate.
    Type: Grant
    Filed: September 9, 2014
    Date of Patent: December 5, 2017
    Assignee: Inktec Co., Ltd.
    Inventors: Kwang Choon Chung, Ji Hoon Yoo, Su-Han Kim, Byung Hun Kim
  • Patent number: 9832990
    Abstract: A composition and a method of preparing the composition are provided herein. The composition comprises an active substance and a polymeric additive comprising at least one unit represented by the formula (I): wherein each R is independently selected from the group of a hydrogen atom, an alkyl group, an aryl group, and combinations thereof; and Z comprises at least 10 units represented by the formula (II): wherein each R1 is independently selected from the group of a hydrogen atom, an alkyl group, an aryl group, a carbonyl group, a hydroxyl group, an ether group, and combinations thereof and R2 is a C1-C10 hydrocarbon group. The polymeric additive further comprising at least one unit represented by the formula (III): A??(III) wherein A is an alkyleneoxy group having from 2 to 10 carbon atoms.
    Type: Grant
    Filed: March 7, 2011
    Date of Patent: December 5, 2017
    Assignee: BASF SE
    Inventors: Laura L. Brasher, Michael D. Capracotta, Sonia Patterson, Murat Mertoglu, Marc Nolte, Stefan Bechtel, Kristin Klappach
  • Patent number: 9809027
    Abstract: A method of manufacturing a structure includes (1) positioning a first resin layer provided on a first supporting member on a substrate having a through hole, with the first resin layer facing toward the substrate, and releasing the first supporting member from the first resin layer; and (2) positioning a second resin layer provided on a second supporting member on the first resin layer from which the first supporting member has been released, with the second resin layer facing toward the first resin layer, and releasing the second supporting member from the second resin layer. A first resin layer portion that is above the through hole is removed before or simultaneously with the releasing of the first supporting member.
    Type: Grant
    Filed: January 13, 2015
    Date of Patent: November 7, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Keiji Matsumoto, Jun Yamamuro, Kazuhiro Asai, Kunihito Uohashi, Seiichiro Yaginuma, Masahisa Watanabe, Koji Sasaki, Ryotaro Murakami, Kenji Fujii
  • Patent number: 9793131
    Abstract: A pattern forming method which uses a resist underlayer film having resistance to a basic aqueous hydrogen peroxide solution. A pattern forming method including: a first step of applying a resist underlayer film-forming composition containing a solvent and a polymer having a weight average molecular weight of 1,000 to 100,000 and an epoxy group on a semiconductor substrate that may have an inorganic film on the surface, followed by baking, to form a resist underlayer film; a second step of forming a resist pattern on the resist underlayer film; a third step of dry etching the resist underlayer film using the resist pattern as a mask to expose a surface of the inorganic film or the semiconductor substrate; and a fourth step of wet etching the inorganic film or the semiconductor substrate using the dry-etched resist underlayer film as a mask and a basic aqueous hydrogen peroxide solution.
    Type: Grant
    Filed: August 27, 2014
    Date of Patent: October 17, 2017
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tomoya Ohashi, Shigeo Kimura, Yuki Usui, Hiroto Ogata
  • Patent number: 9718935
    Abstract: A method is used to provide an electrically-conductive polyaniline patterns on a substrate. A photocurable composition is applied as a pattern, comprising a water-soluble reactive polymer comprising (a) greater than 40 mol % of recurring units comprising sulfonic acid or sulfonate groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition. The pattern is exposed to radiation sufficient to cause crosslinking via [2+2] photocycloaddition of the (b) recurring units to form a pattern of crosslinked polymer. The crosslinked polymer is contacted with an aniline reactive composition comprising an aniline monomer and up to 0.5 molar of an aniline oxidizing agent, in a molar ratio of from 1:0.5 to 1:1.5 of the aniline monomer to the aniline oxidizing agent. A pattern of electrically-conductive polyaniline disposed within, on top of, or both within and on top of, the crosslinked polymer only.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: August 1, 2017
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Thomas B. Brust, Anne Troxell Wyand, Grace Ann Bennett, Catherine A. Falkner
  • Patent number: 9708493
    Abstract: In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Grant
    Filed: November 10, 2014
    Date of Patent: July 18, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: John P. Amara, James F. Cameron, Jin Wuk Sung, Gregory P. Prokopowicz
  • Patent number: 9708466
    Abstract: A resin composition for laser processing which is able to enhance laser processability with maintaining a resist performance of a resin after ultraviolet laser processing, and which can be, for example, used as a resist in forming a circuit of a printed wiring board is provided. Disclosed is a resin composition for laser processing containing a resin and an ultraviolet absorber, wherein the resin is a thermoplastic resin having a carboxyl group and having a softening temperature of from 70 to 140° C., and a content of the ultraviolet absorber is from 1 to 30 parts by mass based on 100 parts by mass of the thermoplastic resin.
    Type: Grant
    Filed: February 20, 2013
    Date of Patent: July 18, 2017
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Satoshi Murakami, Manabu Kikuta
  • Patent number: 9690195
    Abstract: Lithographic printing plates and processes for preparing the lithographic printing plates are provided. The plates have excellent printing durability, staining resistance and staining resistance over time. The lithographic printing plate precursor includes: a substrate; a photosensitive layer provided on the substrate; and an extra layer optionally provided between the substrate and the photosensitive layer. The photosensitive layer or the extra layer adjacent to the substrate contains (A) a copolymer. The copolymer (A) includes: (a1) a repeating unit of formula (a1-1) below in a side chain, and (a2) a repeating unit having at least one of the structures represented by formulae (a2-1) to (a2-6) shown in the specification in a side chain. L1, Z1, R1, and R21, R22 and R23 in formula (a1-1) and the variables in formulae (a2-1) to (a2-6) are as defined in the specification.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: June 27, 2017
    Assignee: FUJIFILM Corporation
    Inventor: Hiroyuki Suzuki
  • Patent number: 9580623
    Abstract: The present invention provides a patterning process, which comprises step of forming a BPSG film on the under layer film by using a composition for forming a coating type BPSG film including a base polymer and an organic compound with a content of 25 parts by mass or more of the organic compound with respect to 100 parts by mass of the base polymer, the base polymer having a silicon containing unit, a boron containing unit and a phosphorus containing unit with a total content of the boron containing unit and the phosphorus containing unit being 10 mol % or more, the organic compound having two or more hydroxyl groups or carboxyl groups per one molecule.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: February 28, 2017
    Assignees: SHIN-ETSU CHEMICAL CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Seiichiro Tachibana, Yoshinori Taneda, Rie Kikuchi, Tsutomu Ogihara, Yoshio Kawai, Karen Petrillo, Martin Glodde
  • Patent number: 9564325
    Abstract: A method for fabricating a semiconductor device is provided. In the method, a first hard mask layer is formed on a stepped structure. The first hard mask layer has a level top surface and thickness sufficient to etch the structure. A second hard mask pattern is formed on the first hard mask layer. The first hard mask layer is etched using the second hard mask pattern. Size dispersion of the patterns may be reduced by the first hard mask layer.
    Type: Grant
    Filed: July 10, 2014
    Date of Patent: February 7, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Chawon Koh, Cheol Hong Park, Ki-Jeong Kim, Hyunwoo Kim, Hyosung Lee
  • Patent number: 9543147
    Abstract: A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating additive in order to form a floating additive region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating additive may comprise an additive group which will decompose along with a fluorine unit bonded to the additive group which will decompose. Additionally, adhesion between the middle layer and the photoresist may be increased by applying an adhesion promotion layer using either a deposition process or phase separation, or a cross-linking may be performed between the middle layer and the photoresist.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: January 10, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chen-Yu Liu, Ching-Yu Chang, Chien-Chih Chen, Yen-Hao Chen
  • Patent number: 9512242
    Abstract: The embodiments of the invention provide a polymerizable oligomer and a photoresist composition including the polymerizable oligomer, wherein the polymerizable oligomer contains a polymerizable double bond and a hydrophilic group.
    Type: Grant
    Filed: June 27, 2013
    Date of Patent: December 6, 2016
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Wenwen Sun, Lin Li
  • Patent number: 9502231
    Abstract: A system and method for middle layers is provided. In an embodiment the middle layer comprises a floating component in order to form a floating region along a top surface of the middle layer after the middle layer has dispersed. The floating component may be a polymer with a floating group incorporated into the polymer. The floating group may comprise a fluorine atom.
    Type: Grant
    Filed: May 28, 2015
    Date of Patent: November 22, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chen-Yu Liu, Ching-Yu Chang
  • Patent number: 9460909
    Abstract: A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating component in order to form a floating region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating component may be a floating cross-linking agent, a floating polymer resin, or a floating catalyst. The floating cross-linking agent, the floating polymer resin, or the floating catalyst may comprise a fluorine atom. The anti-reflective layers are removed using a fluid.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: October 4, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ching-Yu Chang, Chen-Yu Liu
  • Patent number: 9436086
    Abstract: A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating component in order to form a floating region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating component may be a floating cross-linking agent, a floating polymer resin, or a floating catalyst. The floating cross-linking agent, the floating polymer resin, or the floating catalyst may comprise a fluorine atom.
    Type: Grant
    Filed: January 25, 2016
    Date of Patent: September 6, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Chung Su, Ching-Yu Chang, Wen-Yun Wang
  • Patent number: 9410049
    Abstract: Single phase, water based, energy curable compositions and a method of preparing coatings and printing inks from same.
    Type: Grant
    Filed: May 6, 2003
    Date of Patent: August 9, 2016
    Assignee: SUN CHEMICAL CORPORATION
    Inventors: Jean Do Turgis, Richard M. Jones, Kai-Uwe Gaudl, Mikhail Laksin, Subhankar Chatterjee, Neil Young, Volker Linzer, John Rooney