Radiation Sensitive Composition Or Product Or Process Of Making Patents (Class 430/270.1)
  • Patent number: 10730283
    Abstract: A method for producing flexographic printing plates, using a photopolymerizable flexographic printing element having, arranged one atop another, a dimensionally stable support, a photopolymerizable, relief-forming layer, an elastomeric binder, an ethylenically unsaturated compound, and a photoinitiator, and optionally a rough, UV-transparent layer, a particulate substance, and digitally imagable layer. The method includes: (a) producing a mask by imaging the digitally imagable layer, (b) exposing the photopolymerizable, relief-forming layer through the mask with actinic light, and photopolymerizing the image regions of the layer, and (c) developing the photpolymerized layer by washing out the unphotopolymerized regions of the relief-forming layer with an organic solvent, or by thermal development.
    Type: Grant
    Filed: September 26, 2018
    Date of Patent: August 4, 2020
    Assignee: Flint Group Germany GmbH
    Inventors: Jens Schadebrodt, Armin Becker, Uwe Stebani, Maximilian Thate
  • Patent number: 10725378
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt of brominated benzene-containing fluorinated sulfonic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: May 16, 2018
    Date of Patent: July 28, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 10725380
    Abstract: A compound represented by the formula (I). wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom; R2 represents a C1 to C12 fluorinated saturated hydrocarbon group; W1 represents a C5 to C18 divalent alicyclic hydrocarbon group; A1 and A2 independently represents a single bond or *—A3—X1—(A4—X2)a—; A3 and A4 independently represents a C1 to C6 alkanediyl group; X1 and X2 independently represents —O—, —CO—O—or —O—CO—; a represents 0 or 1; and * represents a bond to an oxygen atom.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: July 28, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Satoshi Yamamoto, Koji Ichikawa
  • Patent number: 10725377
    Abstract: A negative resist composition comprising a sulfonium compound having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.
    Type: Grant
    Filed: December 27, 2017
    Date of Patent: July 28, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaaki Kotake, Satoshi Watanabe, Keiichi Masunaga, Kenji Yamada, Masaki Ohashi
  • Patent number: 10727078
    Abstract: A method of forming fine patterns includes forming a mask on an etching target, forming an anti-reflective layer on the mask, forming fixing patterns such that top surfaces of the anti-reflective layer and fixing patterns are exposed, forming a block copolymer layer including first and second polymer blocks, and phase-separating the block copolymer layer to form first patterns and second patterns on the anti-reflective layer and the fixing patterns. The first and second patterns include the first and second polymer blocks, respectively. The anti-reflective layer has a neutral, i.e., non-selective, interfacial energy with respect to the first and second polymer blocks. The fixing patterns have a higher interfacial energy with respect to the first polymer block than the second polymer block.
    Type: Grant
    Filed: December 6, 2016
    Date of Patent: July 28, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jeong Ju Park, Kyeongmi Lee, Seungchul Kwon, Eunsung Kim, Shiyong Yi
  • Patent number: 10712661
    Abstract: Various compositions encompassing polymers containing acidic pendent groups in combination with one or more reactive olefinic compounds and a photoacid generators form self-imagable negative tone films. Examples of such polymers include polymers and copolymers containing norbornene-type repeating units having acidic pendent groups, ring opened maleic anhydride polymers, polyacrylic acid, polyhydroxystyrene polymers, and the like. The films formed from such compositions provide self imagable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices, among other applications.
    Type: Grant
    Filed: June 13, 2017
    Date of Patent: July 14, 2020
    Assignee: PROMERUS, LLC
    Inventor: Larry F Rhodes
  • Patent number: 10714339
    Abstract: Methods of selectively depositing a mask layer on a surface of a patterned substrate and self-aligned patterned masks are provided herein. In one embodiment, a method of selectivity depositing a mask layer includes positioning the patterned substrate on a substrate support in a processing volume of a processing chamber, exposing the surface of the patterned substrate to a parylene monomer gas, forming a first layer on the patterned substrate, wherein the first layer comprises a patterned parylene layer, and depositing a second layer on the first layer. In another embodiment, a self-aligned patterned mask comprises a parylene layer comprising a plurality of parylene features and a plurality of openings, the parylene layer is disposed on a patterned substrate comprising a dielectric layer and a plurality of metal features, the plurality of metal feature comprise a parylene deposition inhibitor metal, and the plurality of parylene features are selectivity formed on dielectric surfaces of the dielectric layer.
    Type: Grant
    Filed: January 14, 2019
    Date of Patent: July 14, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Fei Wang, Miaojun Wang, Pramit Manna, Shishi Jiang, Abhijit Basu Mallick, Robert Jan Visser
  • Patent number: 10711089
    Abstract: A method for instillation molding UV epoxy resin includes: the UV epoxy resin preparation step: adding at least two photosensitizers to a single component epoxy resin and uniformly mixing them to obtain the UV epoxy resin, wherein the photosensitizer with the highest content in the UV epoxy resin is a photosensitive curing agent for curing the UV epoxy resin, and the rest photosensitizers are photosensitive viscosity regulating agents for regulating the viscosity of the UV epoxy resin to be suitable for instillation molding; and instillation step: dividing the instillation molding of the UV epoxy resin into N procedures performed in one work station, wherein zero, one or more photosensitive viscosity regulating agents are initiated in each procedure, so that the UV epoxy resin reaches a viscosity suitable for respective instillation procedure and is subsequently instillation molded; curing step: initiating the photosensitive curing agent to finally cure the UV epoxy resin.
    Type: Grant
    Filed: October 23, 2015
    Date of Patent: July 14, 2020
    Assignee: CollTech (Dongguan) Bonding Technology Co., Ltd.
    Inventors: Zongtao Zhou, Chengsheng Huang
  • Patent number: 10701804
    Abstract: An ink adapted for forming conductive elements is disclosed. The ink includes a plurality of nanoparticles and a carrier. The nanoparticles comprise copper and have a diameter of less than 20 nanometers. Each nanoparticle has at least a partial coating of a surfactant configured to separate adjacent nanoparticles. Methods of creating circuit elements from copper-containing nanoparticles by spraying, tracing, stamping, burnishing, or heating are disclosed.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: June 30, 2020
    Assignee: Kuprion Inc.
    Inventor: Alfred A. Zinn
  • Patent number: 10698314
    Abstract: A chemically amplified resist composition comprising a quencher containing a quaternary ammonium iodide, dibromoiodide, bromodiiodide or triiodide, and an acid generator exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
    Type: Grant
    Filed: November 16, 2017
    Date of Patent: June 30, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama
  • Patent number: 10696083
    Abstract: Provided are a lithographic printing plate precursor including: a hydrophilized aluminum support, and a water-soluble or water-dispersible negative type image recording layer provided on the aluminum support, in which an arithmetic average height Sa of a surface of an outermost layer on a side opposite to a side where the image recording layer is provided is in a range of 0.3 ?m to 20 ?m; a method of producing the lithographic printing plate precursor; a lithographic printing plate precursor laminate formed of the lithographic printing plate precursor; and a lithographic printing method.
    Type: Grant
    Filed: March 28, 2019
    Date of Patent: June 30, 2020
    Assignee: FUJIFILM CORPORATION
    Inventors: Yusuke Ikeyama, Shumpei Watanabe, Atsushi Oshima, Shuji Shimanaka
  • Patent number: 10691018
    Abstract: A photoresist composition includes a photosensitive polymer including a polymer chain and at least one first functional group coupled to the polymer chain, and a photoacid generator. The first functional group has a structure represented by the following Chemical Formula 1, where R1 is one of an alkyl group having a carbon number of 1 to 20 and an aryl group having a carbon number of 1 to 20, and R2 is one of —H, —F, —Cl, —Br, an alkyl group having a carbon number of 1 to 20, and an aryl group having a carbon number of 1 to 20.
    Type: Grant
    Filed: September 13, 2017
    Date of Patent: June 23, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin Park, Hyunwoo Kim
  • Patent number: 10692757
    Abstract: Embodiments of the invention include photoresist materials and methods of patterning photoresist materials. In an embodiment a photoresist material comprises a plurality of molecular glasses (MGs). In an embodiment, a glass transition temperature Tg of the photoresist material is less than an activation temperature needed to deblock blocking groups from the MGs. Embodiments include a method of patterning a photoresist material that comprises exposing the photoresist material with ultraviolet radiation. The method may also comprise, performing a first post exposure bake at a first temperature, that is less than the activation temperature needed to deblock blocking groups from the MGs, and performing a second post exposure bake at a second temperature that is approximately equal to or greater than the activation temperature needed to deblock blocking groups from the MGs.
    Type: Grant
    Filed: May 28, 2015
    Date of Patent: June 23, 2020
    Assignee: Intel Corporation
    Inventors: Marie Krysak, Robert Lindsey Bristol, Paul Anton Nyhus, Michael J. Leeson
  • Patent number: 10688770
    Abstract: The present invention provides methods, processes, and systems for the manufacture of three-dimensional articles of polymer materials using 3D printing. A syringe or an inkjet print head prints a solution of prepolymer onto a build plate. The printed prepolymer is exposed to a stimulus whereby the prepolymer is converted to the polymer. After a predetermined time, sequential layers are printed to provide the three-dimensional article. The three-dimensional article can be cured to produce the 3D article made from the final polymer.
    Type: Grant
    Filed: March 3, 2015
    Date of Patent: June 23, 2020
    Assignees: RICOH CO., LTD., UNIVERSITY OF WASHINGTON
    Inventors: Andrew J. Boydston, Mark Ganter, Duane Storti, Adam Edward Goetz, Mete Yurtoglu, Michael Byrnes Larsen, Gregory Isaac Peterson
  • Patent number: 10683414
    Abstract: A resin composition is provided that is capable of inhibiting degradation of the organic EL device. The resin composition, includes: (A) an alicyclic epoxy compound; (B) a bisphenol A epoxy resin; (C) a bisphenol F epoxy resin; and (D) a photocationic polymerization initiator. The bisphenol A epoxy resin (B) and the bisphenol F epoxy resin (C) are compounds not having the alicyclic epoxy compound (A) and the resin composition has a moisture content of 1000 ppm or less. Alternatively, the resin composition may further include a filler (H) and may have a moisture content of 50 ppm or more.
    Type: Grant
    Filed: January 21, 2015
    Date of Patent: June 16, 2020
    Assignee: DENKA COMPANY LIMITED
    Inventors: Takako Hoshino, Yuki Hisha, Yoshitsugu Goto
  • Patent number: 10678132
    Abstract: A resin is to be added to a resist composition and localized on a surface of a resist film so as to hydrophobilize the surface of a resist film and has a peak area of a high molecular weight component having a molecular weight of 30,000 or more is 0.1% or less of a total peak area in a molecular weight distribution measured by gel permeation chromatography.
    Type: Grant
    Filed: March 14, 2008
    Date of Patent: June 9, 2020
    Assignee: FUJIFILM Corporation
    Inventor: Hiromi Kanda
  • Patent number: 10678129
    Abstract: A composition for nanoimprint including a cycloolefin-based copolymer; a polymerizable monomer; and a photoinitiator. The polymerizable monomer of the present invention may include a polyfunctional monomer, and the cycloolefin-based copolymer may include a constituent unit having a cyclic olefin and a constituent unit having an acyclic olefin.
    Type: Grant
    Filed: June 6, 2016
    Date of Patent: June 9, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Satoshi Shimatani
  • Patent number: 10678130
    Abstract: A photosensitive composition and a quantum dot-polymer composite pattern formed from the photosensitive composition are disclosed, and the photosensitive composition includes: a plurality of quantum dots; a color filter material including an absorption dye, an absorption pigment, or a combination thereof; a polymer binder; a photopolymerizable monomer having a carbon-carbon double bond; a photoinitiator; and a solvent, wherein in a normalized photoluminescence spectrum of the quantum dot and a normalized ultraviolet-visible absorption spectrum of the color filter material, a photoluminescence peak wavelength (PL peak wavelength) of the quantum dot and a wavelength of maximum absorbance of the color filter material do not overlap with each other, and the color filter material is included in an amount of less than or equal to 1 part by weight per 10 parts by weight of the plurality of quantum dots.
    Type: Grant
    Filed: June 17, 2019
    Date of Patent: June 9, 2020
    Assignees: SAMSUNG ELECTRONICS CO., LTD., SAMSUNG DISPLAY CO., LTD., SAMSUNG SDI CO., LTD.
    Inventors: Hyeyeon Yang, Tae Hyung Kim, Shang Hyeun Park, Shin Ae Jun, Yong Seok Han, Eun Joo Jang, Deukseok Chung
  • Patent number: 10670963
    Abstract: A salt represented by the formula (I). wherein Z+, Q1, Q2, R1, R2, R3, R4, R5, Z, X1, X2, Xa, Xb, L1, L2, L3 and L4 are defined in the specification.
    Type: Grant
    Filed: March 5, 2018
    Date of Patent: June 2, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Satoshi Yamaguchi, Koji Ichikawa
  • Patent number: 10670965
    Abstract: New polymers are provided comprising (i) one or more covalently linked photoacid generator moieties and (ii) one or more photoacid-labile groups, wherein the one or more photoacid generator moieties are a component of one or more of the photoacid-labile groups. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-200 nm, particularly 193 nm.
    Type: Grant
    Filed: March 31, 2011
    Date of Patent: June 2, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Emad Aqad, Cong Liu, Cheng-Bai Xu, Mingqi Li
  • Patent number: 10655002
    Abstract: Provided are a resin blend for forming a layer-separated structure, a pellet, a method of preparing a resin article using the same and a resin article. The resin blend may include a first resin, and a second resin that comprises a resin to which at least one organic functional group selected from the group consisting of an alkyl group having 2 to 20 carbon atoms, an alicyclic group having 5 to 40 carbon atoms and an aromatic group having 6 to 40 carbon atoms is introduced, that has a difference in melt viscosity from the first resin of 0.1 to 3000 pa*s at a shear rate of 100 to 1000 s?1 and a processing temperature of the resin blend, and that has a difference in glass transition temperature from the first resin of 10° C. to 150° C. The resin blend can improve mechanical and surface characteristics of a resin article.
    Type: Grant
    Filed: April 12, 2013
    Date of Patent: May 19, 2020
    Assignee: LG CHEM, LTD.
    Inventors: Houng Sik Yoo, Jin Young Ryu, Hak Shin Kim, Eun Joo Choi, Young Jun Hong, Hyun Seok Yang
  • Patent number: 10659642
    Abstract: A medium feeding device includes: a placement unit on which a medium is placed; a feeding section that feeds the medium placed on the placement unit; a wrinkle detection section that is provided on a further upstream side than the feeding section in a feeding direction and outputs a detection value in accordance with a wrinkle in the medium; and a control section that performs predetermined control on the basis of the detection value of the wrinkle detection section and stops the feeding section in a case in which the detection value output from the wrinkle detection section exceeds a predetermined allowable value.
    Type: Grant
    Filed: February 14, 2019
    Date of Patent: May 19, 2020
    Assignee: Seiko Epson Corporation
    Inventor: Sekito Masaru
  • Patent number: 10649332
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an iodonium salt of fluorinated aminobenzoic acid, fluorinated nitrobenzoic acid or fluorinated hydroxybenzoic acid offers a high dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: July 31, 2019
    Date of Patent: May 12, 2020
    Assignee: SHIN-ETSU CHEMICLA CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 10639924
    Abstract: A lithographic printing plate precursor including a hydrophilized aluminum support, and a water-soluble or water-dispersible negative type image recording layer provided on the aluminum support, in which an arithmetic average height Sa of a surface of an outermost layer on a side where the image recording layer is provided is in a range of 0.3 ?m to 20 ?m; a method of producing a lithographic printing plate precursor; a lithographic printing plate precursor laminate formed of the lithographic printing plate precursor; a plate-making method for a lithographic printing plate; and a lithographic printing method.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: May 5, 2020
    Assignee: FUJIFILM CORPORATION
    Inventors: Shumpei Watanabe, Yusuke Ikeyama, Atsushi Oshima, Shuji Shimanaka
  • Patent number: 10620538
    Abstract: The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring.
    Type: Grant
    Filed: February 3, 2016
    Date of Patent: April 14, 2020
    Assignees: Sakai Display Products Corporation, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Nobutake Nodera, Akihiro Shinozuka, Shinji Koiwa, Masahiro Kato, Takao Matsumoto, Takashi Fuke, Daishi Yokoyama, Katsuto Taniguchi
  • Patent number: 10620534
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Grant
    Filed: August 17, 2018
    Date of Patent: April 14, 2020
    Assignee: JSR CORPORATION
    Inventors: Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya
  • Patent number: 10620533
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a morpholino group offers dimensional stability on PPD and a satisfactory resolution.
    Type: Grant
    Filed: October 18, 2016
    Date of Patent: April 14, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 10613437
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: April 7, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Fujiwara
  • Patent number: 10612140
    Abstract: A method and corresponding reactor for depositing metal-nitride thin film with adjustable metal contents. The method includes several first and second half reaction process. By adjusting the ratio of first and second half reaction cycles, metal nitride thin films with different metal contents can be grown. The first half reaction process is the decomposition of metal-organic precursor adsorbed on the substrate surface, leaving behind metal atom layer by light irradiation. The second half reaction process forms metal nitride thin films by the reaction of NH3 plasma and the metal atomic layer on the substrate surface. This method can control the ratio between metal and nitrogen atom content in the film, thus achieving the regulation of film resistivity. In addition, this method offers favorable film step coverage and accurate film thickness control capability, which is significantly applicable for the film meeting the requirement of advanced CMOS integrated circuit technology.
    Type: Grant
    Filed: May 18, 2017
    Date of Patent: April 7, 2020
    Assignee: Fudan University
    Inventors: Shijin Ding, Yongping Wang, Anan Zuo, Wei Zhang
  • Patent number: 10613436
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: April 7, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 10613440
    Abstract: A resist underlayer film-forming composition for EUV lithography showing good resist shape; including: a hydrolyzable organosilane, a hydrolyzed product thereof, or a hydrolyzed condensate thereof, as a silane; and a salt of a sulfonic acid ion containing a hydrocarbon group with an onium ion. The hydrolyzable organosilane includes at least one organic silicon compound selected from the group consisting of compounds of Formula (1): R1aSi(R2)4-a??Formula (1) and compounds of Formula (2): R3cSi(R4)3-c2Yb??Formula (2) a hydrolyzed product thereof, or a hydrolyzed condensate thereof.
    Type: Grant
    Filed: July 29, 2013
    Date of Patent: April 7, 2020
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Wataru Shibayama, Shuhei Shigaki, Rikimaru Sakamoto
  • Patent number: 10606174
    Abstract: A resist composition including a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1), an onium salt having an anion moiety with a specific structure, and a photodecomposable base which is decomposed upon exposure and then loses the ability of controlling of acid diffusion. In formula (a0-1), Rax0 represents a polymerizable group-containing group; Wax0 represents an aromatic hydrocarbon group having a valency of (nax0+1), provided that Rax0 and Wax0 may together form a condensed ring structure; nax0 represents an integer of 1 to 3; Yax01 represents a carbonyl group or a single bond; Rax01 represents a hydrogen atom or a hydrocarbon group which may have a substituent.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: March 31, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masahito Yahagi, Hiroto Yamazaki, Kenta Suzuki
  • Patent number: 10606172
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an iodonium salt capable of generating fluorobenzoic acid bonded to iodized benzene offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: March 31, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 10591818
    Abstract: Various vinyl addition polymers of nadic anhydride are disclosed. Examples of such polymers include copolymers and terpolymers of nadic anhydride with a wide variety of norbornene-type monomers. The nadic anhydride polymers are found to be useful in forming a wide variety of photosensitive compositions, both positive and negative, which are capable of forming high resolution imagable films exhibiting excellent dielectric properties (low-k) and thermal properties, and thus are useful in the fabrication of a variety of microelectronic and optoelectronic devices, among others.
    Type: Grant
    Filed: July 28, 2017
    Date of Patent: March 17, 2020
    Assignee: PROMERUS, LLC
    Inventors: Brian Knapp, Cheryl Burns
  • Patent number: 10580913
    Abstract: A semiconductor nanoparticle dispersion is provided. The semiconductor nanoparticle including a plurality of semiconductor nanoparticles having a radius equal to or larger than an exciton Bohr radius; and a solvent dispersed with the plurality of semiconductor nanoparticles.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: March 3, 2020
    Assignee: SONY CORPORATION
    Inventors: Michinori Shiomi, Takeru Bessho
  • Patent number: 10577391
    Abstract: Disclosed herein are formulations, substrates, and arrays for amino acid and peptide synthesis on microarrays. In certain embodiments, methods for manufacturing and using the formulations, substrates, and arrays including one-step coupling, e.g., for synthesis of peptides in a C?N orientation are disclosed. In some embodiments, disclosed herein are formulations and methods for high efficiency coupling of biomolecules to a substrate.
    Type: Grant
    Filed: June 26, 2018
    Date of Patent: March 3, 2020
    Assignee: Vibrant Holdings, LLC
    Inventor: Vasanth Jayaraman
  • Patent number: 10577467
    Abstract: A composition that includes a blend of a fluoropolymer and an ultraviolet light-absorbing oligomer. The oligomer has a first divalent unit having a pendent ultraviolet absorbing group and at least one of a second divalent unit that is non-fluorinated or a third divalent unit that is fluorinated. The pendent ultraviolet absorbing group can include a triazine group. The composition can be an extruded film. A method of making such an extruded film is also disclosed.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: March 3, 2020
    Assignee: 3M Innovative Properties Company
    Inventors: David B. Olson, Patricia M. Savu, Timothy J. Hebrink
  • Patent number: 10577524
    Abstract: Provided herein is a conductive adhesive composition containing: a thermosetting resin having a functional group reactive with an epoxy group; an epoxy resin; a conductive filler; and urethane resin particles having a mean particle diameter of 4 ?m or more and 13 ?m or less and a hardness of 55 or more and 90 or less measured by a type A durometer in conformity with JIS K6253.
    Type: Grant
    Filed: May 23, 2017
    Date of Patent: March 3, 2020
    Assignee: TATSUTA ELECTRIC WIRE & CABLE CO., LTD.
    Inventors: Yoshihisa Yamamoto, Shigekazu Umemura
  • Patent number: 10569528
    Abstract: A method according for preparing a lithographic printing plate containing a lithographic image consisting of printing areas and non-printing areas includes the steps of jetting and curing droplets of a first curable fluid on a hydrophilic support thereby forming a printing area of the lithographic image; and jetting and curing droplets of a second curable fluid in a non-printing area of the lithographic image thereby forming a hydrophilic protective layer on the hydrophilic support.
    Type: Grant
    Filed: November 2, 2015
    Date of Patent: February 25, 2020
    Assignee: AGFA NV
    Inventors: Tim Desmet, Johan Loccufier
  • Patent number: 10571805
    Abstract: A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 and R2 independently represent a hydrogen atom, a halogen atom or a C1-6 alkyl group that may have a halogen atom, Ra25 represents a carboxy group, a cyano group or a C1-4 aliphatic hydrocarbon group, A1 represents a single bond, *-A2-O—, *-A2-CO—O—, etc., A2 and A3 independently represents a C1-6 alkanediyl group, and w1 represents an integer of 0 to 8, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g—, L2 and L3 independently represent a C1-12 divalent hydrocarbon group, g represent 0 or 1, R3 represents a C1-12 liner or branched alkyl group except for a tertiary alkyl group and * represents a binding position to an oxygen atom.
    Type: Grant
    Filed: June 23, 2016
    Date of Patent: February 25, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuki Suzuki, Yuichi Mukai, Koji Ichikawa
  • Patent number: 10564543
    Abstract: A photosensitive resin composition includes (A) a binder polymer having a structural unit derived from a hydroxyalkyl (meth)acrylate ester having a hydroxyalkyl group having from 1 to 12 carbon atoms, and a structural unit derived from a (meth)acrylic acid; (B) a photopolymerizable compound having an ethylenically unsaturated bond group; (C) a photopolymerization initiator; and (D) a styryl pyridine represented by the Formula (1). In Formula (1), each of R1, R2 and R3 independently represents an alkyl group having from 1 to 20 carbon atoms, an alkoxy group having from 1 to 6 carbon atoms, an alkyl ester group having from 1 to 6 carbon atoms, an amino group, an alkyl amino group having from 1 to 20 carbon atoms, a carboxy group, a ciano group, a nitro group, an acetyl group or a (meth)acryloyl group, each of a, b and c independently represents an integer of from 0 to 5. In a case in which each of a, b and c is independently 2 or more, the plural R1s, R2s, and R3s independently may be the same or different.
    Type: Grant
    Filed: September 14, 2015
    Date of Patent: February 18, 2020
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Shota Okade, Yukiko Muramatsu, Emiko Oota, Ken Sawabe, Sanchoru Ri
  • Patent number: 10564542
    Abstract: New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: February 18, 2020
    Inventors: Min-Kyung Jang, Eui-Hyun Ryu, Chang-Young Hong, Dong-Yong Kim
  • Patent number: 10564544
    Abstract: A photoresist composition comprising an acid generator and a resin which comprises one or more structural units (a1) derived from a monomer (a1) having an acid-liable group, all of monomers (a1) showing a distance of Hansen solubility parameters between the monomer (a1) and butyl acetate in the range of 3 to 5, the distance being calculated from formula (1): R=(4×(?dm?15.8)2+(?pm?3.7)2+(?hm?6.3)2)1/2??(1) in which ?dm represents a dispersion parameter of a monomer, ?pm represents a polarity parameter of a monomer, ?hm represents a hydrogen bonding parameter of a monomer, and R represents a distance of Hansen solubility parameters, and at least one of the monomers (a1) showing a difference of R between the monomer (a1) and a compound in which an acid is removed from the monomer (a1) in the range of not less than 5.
    Type: Grant
    Filed: May 10, 2017
    Date of Patent: February 18, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Koji Ichikawa
  • Patent number: 10562993
    Abstract: Provided is a polymer composition, wherein the polymer composition has a refractive index difference (B?A) of 0.04 or greater but 0.1 or less between a minimum refractive index A of the polymer composition in a temperature range of 5 degrees C. or higher but lower than 30 degrees C. and a maximum refractive index B of the polymer composition in a temperature range of 30 degrees C. or higher but lower than 50 degrees C.
    Type: Grant
    Filed: March 1, 2018
    Date of Patent: February 18, 2020
    Assignee: Ricoh Company, Ltd.
    Inventor: Koji Iwasaki
  • Patent number: 10558118
    Abstract: Provided are a photosensitive resin composition including (A) a binder resin, the binder resin including a polymer that includes a structural unit represented by Chemical Formula 1; (B) a black colorant; (C) a photopolymerizable monomer; and (D) a photopolymerization initiator a black pixel defining layer manufactured using the same, and a display device including the black pixel defining layer, wherein, in Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Grant
    Filed: September 14, 2017
    Date of Patent: February 11, 2020
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Sang Soo Kim, Jinhee Kang, Heekyoung Kang, Chang-Hyun Kwon, Jiyun Kwon, ChanWoo Kim, Bumjin Lee, Junho Lee, Chungbeum Hong
  • Patent number: 10558122
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sulfonamide substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: February 11, 2020
    Assignee: Rohm and Haas Electronic Materials, LLC
    Inventors: Deyan Wang, Chunyi Wu, George G. Barclay, Cheng-Bai Xu
  • Patent number: 10558089
    Abstract: The present invention relates to a photoalignment composition comprising a) 0.001 to 20%, by weight; preferably, 1 to 10% by weight, more preferably 1 to 9% by weight of at least one photoreactive compound (I) that comprises a photoalignment group and b) 80 to 99.999% by weight, preferably, 90 to 99% by weight, more preferably 91 to 99% by weight of at least one compound (II) that does not comprise a photoalignment group, and c) optionally at least one reactive or non reactive additives, and d) optionally at least one solvent. Further, the present invention relates to the use of this photoalignment composition for the alignment of liquid crystals or liquid crystal polymers, in electro-optical and optical elements, systems and devices.
    Type: Grant
    Filed: May 23, 2017
    Date of Patent: February 11, 2020
    Assignee: ROLIC AG
    Inventors: Izabela Bury, Fabien Xavier Delbaere, Olivier Muller, Joachim Reichardt, Hubert Seiberle, Peggy Studer, Satish Palika
  • Patent number: 10558084
    Abstract: A method of fabricating a liquid crystal display device includes forming a first alignment layer on a first substrate, forming a second alignment layer on a second substrate, disposing the first substrate and the second substrate such that the first alignment layer and the second alignment layer are spaced apart, forming a liquid crystal layer including liquid crystal molecules between the first alignment layer and the second alignment layer and forming an electrode layer on one of the first substrate and the second substrate, the electrode layer applying an electric field to the liquid crystal molecules along a direction parallel to the first and second substrates, the forming the first alignment layer including applying a copolymer solution including first moieties and second moieties, and the first moieties have affinity with the first substrate, and the second moieties have compatibility with the liquid crystal molecules and heating the first alignment layer.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: February 11, 2020
    Assignees: LG DISPLAY CO., LTD., TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Osamu Sato, Joji Kawamura, Masatoshi Tokita, Junji Watanabe
  • Patent number: 10551738
    Abstract: A photoresist composition includes a photoresist polymer including a repeating unit to which a silicon-containing leaving group is combined, a photo-fluorine generator including a sulfonium fluoride, and a solvent.
    Type: Grant
    Filed: January 24, 2019
    Date of Patent: February 4, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin Park, Hyun-Woo Kim, Jin-Kyu Han
  • Patent number: 10551739
    Abstract: Provided are a resist composition capable of forming a pattern having excellent pattern collapse performance, particularly in the formation of an ultrafine pattern (for example, a pattern with a line width 50 nm or less) using the resist composition containing a resin (A) having a repeating unit (a) having an aromatic ring group and a repeating unit (b) having a silicon atom in a side chain, as well as a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the resist composition.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: February 4, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Akira Takada, Shuji Hirano, Naoya Shimoju, Toshiya Takahashi, Hidehiro Mochizuki