Radiation Sensitive Composition Or Product Or Process Of Making Patents (Class 430/270.1)
  • Patent number: 9765175
    Abstract: Provided is a modified hydroxy naphthalene novolak resin which is optimal for a photosensitive composition and a resist material having high optical sensitivity, resolution, and alkali developability, and excellent heat resistance and moisture absorption resistance, and the modified hydroxy naphthalene novolak resin includes a structural moiety (I) represented by Structural Formula as a repeating unit: wherein R1is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group; m is 1 or 2; R2's each independently is any one of a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, an aralkyl group, and a halogen atom; and at least one of the R1's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.
    Type: Grant
    Filed: September 11, 2014
    Date of Patent: September 19, 2017
    Assignee: DIC CORPORATION
    Inventors: Tomoyuki Imada, Yusuke Sato
  • Patent number: 9766547
    Abstract: There is provided a pattern forming method, including: (1) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition, (2) exposing the film with actinic ray or radiation, (3) developing the film exposed by using a developer containing an organic solvent, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin having a repeating unit (R) with a structural moiety capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid, and (B) a solvent, and the developer contains an additive that causes at least one interaction selected from the group consisting of an ionic bond, a hydrogen bond, a chemical bond and a dipole interaction with respect to a polar group contained in the resin (A) after the exposing.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: September 19, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hiroo Takizawa, Shuji Hirano, Natsumi Yokokawa
  • Patent number: 9766542
    Abstract: Provided are a novel negative chemically-amplified photoresist and an imaging method thereof. The negative chemically-amplified photoresist comprises phenol resin, a photo-acid generator, a cross-linking agent, an alkaline additive, a sensitizing agent and a photoresist solvent, wherein the phenol resin is a host material of the novel negative chemically-amplified photoresist; the photo-acid generator is capable of generating an acid with a certain strength under illumination; and the cross-linking agent can undergo a condensation reaction with a phenolic hydroxyl group or an ortho-/para-hydroxymethyl functional group. The imaging method of the novel negative chemically-amplified photoresist comprises coating, baking, exposure, baking, developing and other steps. The chemically-amplified negative photoresist of the present invention can improve the resolution and photospeed of photoresists effectively.
    Type: Grant
    Filed: August 21, 2013
    Date of Patent: September 19, 2017
    Assignee: KEMPUR MICROELECTRONICS, INC.
    Inventors: Jia Sun, Xin Chen, Roger Sinta, Bing Li, Cuimei Diao, Haibo Li, Xiantao Han
  • Patent number: 9760011
    Abstract: Photoresist pattern trimming compositions comprise: a polymer that is soluble in a 0.26 normality aqueous tetramethylammonium hydroxide solution; and a solvent system, wherein the solvent system comprises one or more monoether solvents in a combined amount of from 50 to 98 wt % based on the solvent system. The compositions find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: March 7, 2016
    Date of Patent: September 12, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Kevin Rowell, Cong Liu, Cheng Bai Xu, Irvinder Kaur, Jong Keun Park
  • Patent number: 9760005
    Abstract: A salt having a group represented by formula (a): wherein Xa and Xb each independently represent an oxygen atom or a sulfur atom, X1 represents a divalent group having an alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and where a hydrogen atom may be replaced by a hydroxy group or a fluorine atom, and * represents a binding site.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: September 12, 2017
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Tatsuro Masuyama, Shingo Fujita, Koji Ichikawa
  • Patent number: 9760004
    Abstract: The present invention relates to a radiation-sensitive resin composition that contains: a compound that has a structure represented by the following formula (1); a first polymer that includes a fluorine atom; and a solvent. In the following formula (1), X represents a carbonyl group, a sulfonyl group or a single bond. Y+ represents a monovalent radiation-degradable onium cation. The first polymer preferably has at least one selected from the group consisting of a structural unit represented by the following formula (2a) and a structural unit represented by the following formula (2b). The first polymer preferably includes an alkali-labile group. The first polymer preferably includes an acid-labile group. It is preferred that a radiation-sensitive acid generator is further contained.
    Type: Grant
    Filed: September 30, 2014
    Date of Patent: September 12, 2017
    Assignee: JSR CORPORATION
    Inventors: Hiromu Miyata, Hayato Namai, Masafumi Hori
  • Patent number: 9758466
    Abstract: A compound having a group represented by formula (Ia): wherein R1 and R2 each independently represent a C1 to C8 fluorinated alkyl group, ring W represents a C5 to C18 alicyclic hydrocarbon group that may have a substituent, and * represents a binding site.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: September 12, 2017
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mitsuyoshi Ochiai, Masahiko Shimada, Koji Ichikawa
  • Patent number: 9758610
    Abstract: An acid-labile hyperbranched copolymer is formed by copolymerizing monomers that include a difunctional monomer and a mono(meth)acrylate ester. The difunctional monomer includes at least one formal group, acetal group, or ketal group that makes the copolymer acid-labile. The copolymer is useful as a component of a photoresist composition that provides low line width roughness, among other desirable photolithographic properties.
    Type: Grant
    Filed: December 18, 2015
    Date of Patent: September 12, 2017
    Assignee: DOW GLOBAL TECHNOLOGIES LLC
    Inventor: John W. Kramer
  • Patent number: 9760003
    Abstract: Provided is a method of forming a pattern and an actinic-ray- or radiation-sensitive resin composition that excels in the limiting resolving power, roughness characteristics, exposure latitude (EL) and bridge defect performance. The method of forming a pattern includes (1) forming an actinic-ray- or radiation-sensitive resin composition into a film, (2) exposing the film to light, and (3) developing the exposed film with a developer containing an organic solvent. The actinic-ray- or radiation-sensitive resin composition contains (A) a resin containing a repeating unit with a structural moiety that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid, and (B) a solvent.
    Type: Grant
    Filed: May 20, 2011
    Date of Patent: September 12, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Kaoru Iwato, Hidenori Takahashi, Shuji Hirano, Sou Kamimura, Keita Kato
  • Patent number: 9752045
    Abstract: The present invention provides a conductive polymer composite including: (A) a ?-conjugated polymer, and (B) a dopant polymer which contains a repeating unit “a” shown by the following general formula (1) and having a weight-average molecular weight in the range of 1,000 to 500,000. There can be provided a conductive polymer composite which has excellent filterability and film-formability by spin coating, and can form a conductive film having high transparency and excellent flatness. wherein R1 represents a hydrogen atom or a methyl group; R2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms, the hydrocarbon group optionally containing an ether group, an ester group, or both; “Z” represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and “a” is a number satisfying 0<a?1.0.
    Type: Grant
    Filed: August 1, 2016
    Date of Patent: September 5, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Nagasawa, Koji Hasegawa
  • Patent number: 9752052
    Abstract: Disclosed are an auto-repairing composition for overcoat layer, a method of producing the same, and a display apparatus. The composition for overcoat layer comprising 1-10 wt % of microcapsules based on the total weight of the composition for overcoat layer, said microcapsule including a capsule wall and a capsule core, wherein the capsule wall comprises an alkali-insoluble resin, and the capsule core comprises, based on the total weight of the capsule core, 30-60 wt % of a photo-curable unsaturated oligomer, 30-60 wt % of a photo-polymerizable monomer, 1-10 wt % of a photo-initiator, and 0-5 wt % of additive.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: September 5, 2017
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., BEIJING BOE DISPLAY TECHNOLODY CO., LTD.
    Inventors: Tonghua Yang, Min Li, Jikai Zhang, Sikai Zhang, He Feng
  • Patent number: 9748481
    Abstract: A method of semiconductor device fabrication that includes sequentially forming an interfacial conductive layer and an etch stop layer on a resistive memory layer; forming a main conductive layer on the etch stop layer; exposing a portion of the etch stop layer by patterning the main conductive layer; exposing a portion of the interfacial conductive layer by patterning the portion of the etch stop layer; forming an upper electrode structure by patterning the portion of the interfacial conductive layer; cleaning a surface of the upper electrode structure and an exposed surface of the resistive memory layer; and patterning the resistive memory layer using the upper electrode structure as an etch mask.
    Type: Grant
    Filed: October 14, 2015
    Date of Patent: August 29, 2017
    Assignee: SK Hynix Inc.
    Inventors: Gyu Hyun Kim, Dae Won Kim, Byoung Ki Lee, Han Woo Cho
  • Patent number: 9748072
    Abstract: In an exemplary process for lower dose rate ion implantation of a work piece, an ion beam may be generated using an ion source and an extraction manipulator. The extraction manipulator may be positioned at a gap distance from an exit aperture of the ion source. A current of the ion beam exiting the extraction manipulator may be maximized when the extraction manipulator is positioned at an optimal gap distance from the exit aperture. The gap distance at which the extraction manipulator is positioned from the exit aperture may differ from the optimal gap distance by at least 10 percent. A first potential may be applied to a first set of electrodes. An x-dimension of the ion beam may increase as the ion beam passes through the first set of electrodes. The work piece may be positioned in the ion beam to implant ions into the work piece.
    Type: Grant
    Filed: June 23, 2014
    Date of Patent: August 29, 2017
    Assignee: ADVANCED ION BEAM TECHNOLOGY, INC.
    Inventors: Zhimin Wan, Rekha Padmanabhan, Xiao Bai, Gary N. Cai, Ching-I Li, Ger-Pin Lin, Shao-Yu Hu, David Hoglund, Robert E. Kaim, Kourosh Saadatmand
  • Patent number: 9738814
    Abstract: Disclosed herein is a composition comprising a brush polymer; where the brush polymer comprises a reactive moiety that is reacted to a substrate upon which it is disposed; and a block copolymer; where the block copolymer comprises a first block and a second block that are covalently bonded to each other; where the first block comprises a first polymer and a second block comprises a second polymer; where the first polymer comprises less than or equal to 10 atomic percent polysiloxane; where the second polymer comprises at least 15 atomic percent polysiloxane; where the brush polymer is chemically different from the first polymer and the second polymer; and where the first polymer is chemically different from the second polymer; and wherein the block copolymer is disposed upon the brush polymer.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: August 22, 2017
    Assignees: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Shih-Wei Chang, Jong Keun Park, John W. Kramer, Erin B. Vogel, Phillip D. Hustad, Peter Trefonas, III
  • Patent number: 9738064
    Abstract: A positive-working lithographic printing plate precursor is disclosed which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer a heat and/or light-sensitive coating including an infrared absorbing agent, said heat and/or light-sensitive coating comprising a first layer comprising a binder including a monomeric unit including a sulfonamide group; characterized in that the binder further comprises a monomeric unit including a phosphonic acid group or a salt thereof, and that the monomeric unit comprising the phosphonic acid group is present in an amount comprised between 2 mol % and 15 mol %.
    Type: Grant
    Filed: December 3, 2010
    Date of Patent: August 22, 2017
    Assignee: Agfa Graphics N.V.
    Inventors: Johan Loccufier, Stefaan Lingier, Heidi Janssens
  • Patent number: 9740105
    Abstract: A resist pattern formation method including formation of a resist film, exposure, development, and subsequent rinsing using a resist composition containing a high-molecular compound having a constituent unit represented by the formula (a0-1), a constituent unit containing an acid decomposable group whose polarity increases by the action of an acid, and a constituent unit containing a group represented by the formula (a2-r-1). R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Ra01 represents a lactone-containing polycyclic group, an —SO2-containing polycyclic group, or a cyano group-containing polycyclic group; Ra?21 represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, —COOR?, —OC(?O)R?, a hydroxyalkyl group, or a cyano group; R? represents a hydrogen atom or an alkyl group; and n? represents an integer of from 0 to 2.
    Type: Grant
    Filed: September 20, 2013
    Date of Patent: August 22, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoichi Hori, Shinichi Hidesaka, Takeaki Shiroki
  • Patent number: 9740098
    Abstract: A chemically amplified negative resist composition is defined as comprising (A) an onium salt having an anion moiety which is a nitrogen-containing carboxylate of fused ring structure, (B) a base resin, and (C) a crosslinker. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.
    Type: Grant
    Filed: April 8, 2016
    Date of Patent: August 22, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Keiichi Masunaga, Satoshi Watanabe, Masaaki Kotake, Daisuke Domon, Takayuki Fujiwara
  • Patent number: 9740100
    Abstract: A polymer for resist use is obtainable from a hemiacetal compound having formula (1a) wherein R1 is H, CH3 or CF3, R2 to R4 each are H or a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, ZZ designates a non-aromatic mono- or polycyclic ring of 4 to 20 carbon atoms having a hemiacetal structure, k1=0 or 1, and k2=0 to 3. A resist composition comprising the polymer displays controlled acid diffusion and low roughness during both positive and negative tone developments.
    Type: Grant
    Filed: February 11, 2016
    Date of Patent: August 22, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Koji Hasegawa, Masayoshi Sagehashi, Masahiro Fukushima, Ryosuke Taniguchi
  • Patent number: 9733519
    Abstract: A material from which a cured film exhibiting high solvent resistance, liquid crystal-alignment performance, heat resistance and high transparency can be formed. A composition for forming a thermoset film having photo alignment properties, including: a component (A) that is an acrylic copolymer having a photodimerizing moiety and a thermal cross-linking moiety; and a component (B) that is a cross-linking agent.
    Type: Grant
    Filed: June 21, 2010
    Date of Patent: August 15, 2017
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tadashi Hatanaka, Isao Adachi
  • Patent number: 9726974
    Abstract: A resin comprising: a structural unit represented by formula (I), and a structural unit having an acid-labile group.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: August 8, 2017
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mitsuyoshi Ochiai, Koji Ichikawa, Masafumi Yoshida
  • Patent number: 9725542
    Abstract: Provided is an effective process for producing a fluorinated polymer excellent in adhesion, by using a polymerization medium having a low ozone layer destruction potential. The process includes polymerizing a monomer mixture comprising a fluorinated monomer and a polar functional group containing monomer (excluding one having a fluorine atom) in a polymerization medium that contains a medium compound represented by CmH2m+1?xFx—O—CnH2n+1?yFy, m is an integer of from 1 to 6, n is an integer of from 1 to 6, x is from 0 to (2m+1), y is from 0 to 2n, and (x+y) is at least 1), and wherein a solution obtained by dissolving the polar functional group-containing monomer in the polymerization medium is continuously or intermittently added to a polymerization reaction system.
    Type: Grant
    Filed: November 14, 2016
    Date of Patent: August 8, 2017
    Assignee: Asahi Glass Company, Limited
    Inventors: Shigeru Aida, Daisuke Taguchi
  • Patent number: 9726976
    Abstract: A photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (1): wherein R1 represents a hydrogen atom etc., R2 represents a hydrogen atom or a C1-C4 alkyl group, A1 represents a single bond etc., and B1 represents a group represented by the formula (1a): wherein R3, R4 and R5 each independently represents a C1-C16 aliphatic hydrocarbon group and R4 and R5 can be bonded each other to form a C3-C18 ring together with the carbon atom to which R4 and R5 are bonded, a C4-C20 saturated cyclic group having a lactone structure or a C5-C20 saturated cyclic hydrocarbon group having at least one hydroxyl group.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: August 8, 2017
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji Ichikawa, Hiromu Sakamoto, Masako Sugihara, Takashi Hiraoka
  • Patent number: 9722182
    Abstract: A heterocyclic compound represented by Formula 1 below, and an organic light-emitting device including the heterocyclic compound:
    Type: Grant
    Filed: July 11, 2013
    Date of Patent: August 1, 2017
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Sun-Young Lee, Yoon-Hyun Kwak, Bum-Woo Park, Jong-Won Choi, Wha-Il Choi, So-Yeon Kim, Ji-Youn Lee
  • Patent number: 9720323
    Abstract: A resist composition comprising a resin adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium or iodonium salt of nitrogen-containing carboxylic acid has a high resolution. By lithography, a pattern with minimal LER can be formed.
    Type: Grant
    Filed: February 16, 2016
    Date of Patent: August 1, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaaki Kotake, Takayuki Fujiwara, Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe
  • Patent number: 9718901
    Abstract: A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a halogen atom; R2 and R3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; and m+n is 5 or less.
    Type: Grant
    Filed: December 30, 2014
    Date of Patent: August 1, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Takuya Tsuruta, Tomotaka Tsuchimura, Kaoru Iwato
  • Patent number: 9716134
    Abstract: A display may have an array of organic light-emitting diode display pixels. Each display pixel may have a light-emitting diode that emits light under control of a drive transistor. Each display pixel may also have control transistors for compensating and programming operations. The array of display pixels may have rows and columns. Row lines may be used to apply row control signals to rows of the display pixels. Column lines (data lines) may be used to apply display data and other signals to respective columns of display pixels. A bottom conductive shielding structure may be formed below each drive transistor. The bottom conductive shielding structure may serve to shield the drive transistor from any electric field generated from the adjacent row and column lines. The bottom conductive shielding structure may be electrically floating or coupled to a power supply line.
    Type: Grant
    Filed: May 9, 2016
    Date of Patent: July 25, 2017
    Inventors: Chin-Wei Lin, Shih Chang Chang, Ching-Sang Chuang
  • Patent number: 9714217
    Abstract: Sulfonic acid derivatives of general formula RCOOCH2CH2CFHCF2SO3-M+ are provided, wherein R represents a substituted or unsubstituted C1-30 linear, branched, or cyclic hydrocarbon group, or a substituted or unsubstituted C6-30 aryl group, and M+ represents a counter cation. Photoacid generators and photoresists containing such sulfonic acid derivatives are also provided.
    Type: Grant
    Filed: January 13, 2011
    Date of Patent: July 25, 2017
    Assignee: TOYO GOSEI CO., LTD.
    Inventors: Yasuhiro Hosoi, Yuzuru Kaneko
  • Patent number: 9709886
    Abstract: Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Grant
    Filed: September 14, 2016
    Date of Patent: July 18, 2017
    Assignee: HERAEUS PRECIOUS METALS NORTH AMERICA DAYCHEM LLC
    Inventors: Yongqiang Zhang, Daniel Greene, Ram B. Sharma
  • Patent number: 9709891
    Abstract: A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: July 18, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hiromi Kanda, Shinichi Kanna
  • Patent number: 9709892
    Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa??1.5 when exposed to actinic rays or radiation.
    Type: Grant
    Filed: March 25, 2011
    Date of Patent: July 18, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Kaoru Iwato, Sou Kamimura, Toru Tsuchihashi, Yuichiro Enomoto, Kana Fujii, Kazuyoshi Mizutani, Shinji Tarutani, Keita Kato
  • Patent number: 9703196
    Abstract: A method for producing a resist composition includes at least a step of filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms into (D) a solvent, through a filter.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: July 11, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hiromi Kobayashi, Haruki Inabe
  • Patent number: 9703192
    Abstract: New onium salt compounds and methods for synthesis of such compounds are provided. Preferred methods of the invention include (a) providing an onium salt compound comprising a sulfonate component having an electron withdrawing group; and (b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound. The present onium compounds are useful as an acid generator component of a photoresist composition.
    Type: Grant
    Filed: September 16, 2013
    Date of Patent: July 11, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Paul J. LaBeaume
  • Patent number: 9704711
    Abstract: A method of making a semiconductor device is provided. The method includes forming a first material layer that includes a silicon-based component having an alkyl group on a substrate, forming a photoresist layer directly on the material layer, and exposing the photoresist layer to a radiation source.
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: July 11, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chen-Yu Liu, Ching-Yu Chang
  • Patent number: 9696625
    Abstract: A method of forming a resist pattern, including: step A in which a first resist pattern is formed on a substrate, step B in which a basic composition is applied to cover the first resist pattern, step C in which a base contained in the basic composition and the first resist pattern are neutralized to form a developing solution insoluble region on a surface of the first resist pattern, and step D in which the covered first resist pattern is developed, the basic composition containing a basic component, and the basic component containing a polymeric compound having a structural unit (x0) represented by general formula (x0-1) (R is H, C1˜5 alkyl group, C1˜5 halogenated alkyl group; Vx01 is divalent hydrocarbon group having ether bond or amide bond or divalent aromatic hydrocarbon group; Yx01 is single bond or divalent linking group; Rx1 is substituent having nitrogen atom).
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: July 4, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tomoyuki Hirano, Junichi Tsuchiya, Rikita Tsunoda, Tomonari Sunamichi, Takayoshi Mori
  • Patent number: 9698370
    Abstract: The present invention is aiming to provide a gas barrier film having excellent gas barrier properties and also having superior transparency and the like, and an efficient method for producing such a gas barrier film. The present invention provides a gas barrier film having a gas barrier layer on a base material, and a method for producing such a gas barrier film, in which the gas barrier layer includes, from the surface side toward the base material side, a first region and a second region having different refractive indices, the value of the refractive index in the first region is adjusted to a value within the range of 1.50 to 1.68, and the value of the refractive index in the second region is adjusted to a value within the range of 1.40 to below 1.50.
    Type: Grant
    Filed: November 27, 2012
    Date of Patent: July 4, 2017
    Assignee: LINTEC CORPORATION
    Inventors: Satoshi Naganawa, Yuta Suzuki
  • Patent number: 9696626
    Abstract: A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.
    Type: Grant
    Filed: May 19, 2016
    Date of Patent: July 4, 2017
    Assignee: JSR CORPORATION
    Inventors: Fumihiro Toyokawa, Shin-ya Nakafuji, Gouji Wakamatsu
  • Patent number: 9696627
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have base-reactive groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: July 4, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Jinrong Liu, Cong Liu, Doris Kang, Anthony Zampini, Cheng-Bai Xu
  • Patent number: 9696622
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymers; and/or 4) polymeric particles. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: June 27, 2011
    Date of Patent: July 4, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Deyan Wang
  • Patent number: 9696624
    Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.
    Type: Grant
    Filed: July 29, 2015
    Date of Patent: July 4, 2017
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE UNIVERSITY OF QUEENSLAND
    Inventors: James W. Thackeray, Meiliana Siauw, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Patent number: 9679956
    Abstract: A display may have an array of organic light-emitting diode display pixels. Each display pixel may have a light-emitting diode that emits light under control of a drive transistor. Each display pixel may also have control transistors for compensating and programming operations. The array of display pixels may have rows and columns. Row lines may be used to apply row control signals to rows of the display pixels. Column lines (data lines) may be used to apply display data and other signals to respective columns of display pixels. A bottom conductive shielding structure may be formed below each drive transistor. The bottom conductive shielding structure may serve to shield the drive transistor from any electric field generated from the adjacent row and column lines. The bottom conductive shielding structure may be electrically floating or coupled to a power supply line.
    Type: Grant
    Filed: May 9, 2016
    Date of Patent: June 13, 2017
    Inventors: Chin-Wei Lin, Shih Chang Chang, Ching-Sang Chuang
  • Patent number: 9678422
    Abstract: Methods and materials for making a semiconductor device are described. The method includes providing a substrate, forming a middle layer comprising a floating additive polymer (FAP) at an upper surface of the middle layer, the FAP chemically bound to a photoacid generator (PAG) and including a fluorine-containing material over the substrate, forming a photoresist layer over the middle layer, exposing the photoresist layer and the middle layer to an exposure energy to produce acid bound to the middle layer in the exposed areas of the middle layer, and developing the photoresist layer.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: June 13, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ching-Yu Chang, Chen-Yu Liu
  • Patent number: 9678423
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B0-1) represented by general formula (b0) shown below (in the formula, Yx01 represents a divalent linking group; n represents an integer of 1 to 3; and M?m+ represents an organic cation having a valency of m.
    Type: Grant
    Filed: March 16, 2016
    Date of Patent: June 13, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takashi Nagamine, Hideto Nito, Daichi Takaki
  • Patent number: 9678425
    Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: June 13, 2017
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto
  • Patent number: 9676891
    Abstract: Methods and materials for preparing a covalent 3D nano-object are provided. A diamine or triamine monomer and a monoamine terminated precursor may be reacted to form a star polymer material. A cross-linking polymerization process may in a nanogel core with the monoamine terminated precursor covalently linked to the nanogel core. The covalent 3D nano-object may comprise HT, PHT, HA, and/or PHA materials.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: June 13, 2017
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Dylan J. Boday, Jeannette M. Garcia, James L. Hedrick, Rudy J. Wojtecki
  • Patent number: 9678426
    Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: June 13, 2017
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto
  • Patent number: 9671690
    Abstract: A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid. The composition includes a base material component whose solubility in a developing solution changes under the action of an acid; an acid generator component which generates an acid upon exposure; and a photo-reactive quencher which contains a compound represented by the general formula shown below: in which Ra1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent; and Ra2 and Ra3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent. X? represents a counter anion.
    Type: Grant
    Filed: March 16, 2016
    Date of Patent: June 6, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takashi Nagamine, Daichi Takaki, Miki Shinomiya
  • Patent number: 9671694
    Abstract: A layered structure includes a substrate; an underlayer including a reversibly crosslinked polymer and/or oligomer interconnected by ester functionalities; a silicon-containing mask overlaying the underlayer; and a photoresist overlaying the silicon-containing hardmask layer. Also described are multilayer lithographic processes and processes of forming the underlayer, which generally includes coating an underlayer composition onto a surface of the substrate at a thickness effective to provide a planar upper surface, wherein the underlayer composition includes a polymer including terminal alcohol groups, a multifunctional anhydride, and a solvent. The underlayer composition is heated to a temperature to effect a crosslinking reaction between the multifunctional anhydride and the terminal alcohol groups to form the ester functionalities, which can be selectively removed (reversibly crosslinked) using a wet etchant.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: June 6, 2017
    Assignees: INTERNATIONAL BUSINESS MACHINES CORPORATION, SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Martin Glodde, Ratnam Sooriyakumaran, Seiichiro Tachibana, Hoa D. Truong
  • Patent number: 9671693
    Abstract: A resist composition contains; (A1) a resin having a structural unit represented by the formula (aa) and at least one structural unit selected from the group consisting of a structural unit represented by the formula (a1-1) and a structural unit represented by the formula (a1-2); (A2) a resin which does not have the structural unit represented by the formula (aa) and which is insoluble or poorly soluble in aqueous alkali solution, but becomes soluble in aqueous alkali solution by the action of acid; and (B) an acid generator, wherein Raa1, Aaa1, Raa2, La1, La2, Ra4, Ra5, Ra6, Ra7, m1, n1 and n1? are defined in the specification.
    Type: Grant
    Filed: December 14, 2011
    Date of Patent: June 6, 2017
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji Ichikawa, Takashi Hiraoka, Shingo Fujita
  • Patent number: 9666154
    Abstract: A liquid crystal display includes: a signal controller configured to receive an input image signal corresponding to a gray from the outside, and an image signal corrector configured to correct the input image signal. The image signal corrector is configured to shift a first input image signal value corresponding to a black gray by a first value based on a common voltage, is configured to shift a second input image signal value corresponding to a halftone gray by a second value based on the common voltage, and is configured to shift a third input image signal value corresponding to a white gray by a third value based on the common voltage. The first value and the second value are larger than a kickback voltage of each of the black gray and the halftone gray, and the third value is the same as a kickback voltage of the white gray.
    Type: Grant
    Filed: September 12, 2014
    Date of Patent: May 30, 2017
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jin-Soo Jung, Hwa Sung Woo, Jun Woo Lee, Baek Kyun Jeon
  • Patent number: 9665002
    Abstract: Sulfonium and iodonium salts of a carboxylate having an aromatic ring to which a nitrogen-containing alkyl or cyclic structure is attached are novel. The onium salt functions as an acid diffusion controlling agent in a resist composition, enabling to form a pattern of good profile with high resolution, improved MEF, LWR and DOF.
    Type: Grant
    Filed: November 3, 2015
    Date of Patent: May 30, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Fukushima, Masaki Ohashi, Jun Hatakeyama