Radiation Sensitive Composition Or Product Or Process Of Making Patents (Class 430/270.1)
  • Patent number: 10353292
    Abstract: A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1:
    Type: Grant
    Filed: November 18, 2016
    Date of Patent: July 16, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Younhee Nam, Sunghwan Kim, Minsoo Kim, Youjung Park, Seulgi Jeong
  • Patent number: 10350685
    Abstract: The present disclosure relates to a method for preparing metal nanoparticles, and particularly, to a method for preparing metal nanoparticles, the method including reacting a hydrazine-carbon dioxide binded compound with a metal oxide or a metal ion compound.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: July 16, 2019
    Assignee: SOGANG UNIVERSITY RESEARCH FOUNDATION
    Inventors: Nam Hwi Hur, Byeongno Lee, Kyu Hyung Lee
  • Patent number: 10353293
    Abstract: The conductive pattern formation method according to the present invention comprises a step of providing a photosensitive conductive film including a conductive layer containing conductive fibers, a photosensitive resin layer containing a photosensitive resin and an inorganic filler, and a support film in this order, and laminating the conductive layer and the photosensitive resin layer on a base material such that the conductive layer side is closely bonded to the base material, and a step of exposing and developing the photosensitive resin layer and the conductive layer on the base material to form a conductive pattern.
    Type: Grant
    Filed: August 28, 2014
    Date of Patent: July 16, 2019
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Masahiko Ebihara, Emiko Oota, Yasuharu Murakami, Hiroshi Yamazaki, Hiroyuki Tanaka
  • Patent number: 10351499
    Abstract: The production of solvents for applications such as heat transfer, cleaning, and degreasing, for example. In particular, the production of solvents derived from 1-chloro-3,3,3-trifluoro-propene, such as chloro and/or fluoro substituted alkanes and chloro and/or fluoro substituted trifluoropropenyl ethers.
    Type: Grant
    Filed: May 26, 2017
    Date of Patent: July 16, 2019
    Assignee: Honeywell International Inc.
    Inventors: Ya Qun Liu, Hong Min Huang, Jun Liu, Rajiv R. Singh
  • Patent number: 10353290
    Abstract: The disclosed embodiments provide a photoresist composition for extreme ultraviolet (EUV) and a method of forming a photoresist pattern using the same. The photoresist composition includes an out-of-band (OOB) absorbing material absorbing light of a wavelength of 100 nm to 300 nm.
    Type: Grant
    Filed: June 15, 2016
    Date of Patent: July 16, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Cheol Hong Park, Chawon Koh, Hyunwoo Kim, Sang-Yoon Woo, Hyejin Jeon
  • Patent number: 10343967
    Abstract: The present invention provides mixtures of compounds and compounds having the formula: which are useful as functionalized photoinitiators and which may be used directly or after further functionalization in various photo-curable coating compositions, including varnishes, lacquers, printing inks and the like. The present invention also relates to a process to prepare the mixtures and the compounds. The present invention also provides radiation-curable surface coating compositions which include at least one of the compounds of the present invention as a photoinitiator. The compounds are especially suitable for radiation curable formulations which are intended for applications where low extracables or leachables are used such as printing inks for food packaging.
    Type: Grant
    Filed: April 6, 2016
    Date of Patent: July 9, 2019
    Assignee: SCHMID RHYNER AG
    Inventors: Alexander Ossenbach, Dirk Schlatterbeck, Peter Eladio Ludwig, Baktash Jahanbani
  • Patent number: 10345706
    Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: July 9, 2019
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hyun-Ji Song, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Yoo-Jeong Choi, Seung-Hee Hong
  • Patent number: 10340141
    Abstract: An embodiment method includes defining a first mandrel and a second mandrel over a hard mask layer. The method also includes depositing a spacer layer over and along sidewalls of the first mandrel and the second mandrel, and forming a sacrificial material over the spacer layer between the first mandrel and the second mandrel. The sacrificial material includes an inorganic oxide. The method further includes removing first horizontal portions of the spacer layer to expose the first mandrel and the second mandrel. Remaining portions of the spacer layer provide spacers on sidewalls of the first mandrel and the second mandrel. The method further includes removing the first mandrel and the second mandrel and patterning the hard mask layer using the spacers and the sacrificial material as an etch mask.
    Type: Grant
    Filed: July 3, 2017
    Date of Patent: July 2, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tai-Yen Peng, Chao-Kuei Yeh, Ying-Hao Wu, Chih-Hao Chen
  • Patent number: 10338469
    Abstract: A photosensitive resin composition contains a polymer compound having a constitutional unit represented by the following Formula A-1 as a constitutional unit A and at least one constitutional unit among constitutional units represented by the following Formulas B-1 to B-6 as a constitutional unit B in the main chain, and an infrared absorbing material.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: July 2, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Kotaro Asano, Atsuyasu Nozaki, Takashi Sato, Rena Mukaiyama, Kazuto Shimada
  • Patent number: 10331032
    Abstract: Photosensitive, developer-soluble bottom anti-reflective coatings are described. Compositions and methods of forming the same are also disclosed along with resulting microelectronic structures. The anti-reflective compositions comprise a multi-functional epoxy compound having multiple epoxy moieties pendant therefrom and one or more crosslinkable chromophores bonded thereto. The compounds are dispersed or dissolved in a solvent system with a vinyl ether crosslinker and can be used to create crosslinkable and de-crosslinkable coatings for microelectronics fabrication.
    Type: Grant
    Filed: April 22, 2013
    Date of Patent: June 25, 2019
    Assignee: Brewer Science, Inc.
    Inventors: Joyce Lowes, Jinhua Dai, Alice Guerrero
  • Patent number: 10331031
    Abstract: A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R1 to R4 has the fluorine atom or a group including the fluorine atom. R5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).
    Type: Grant
    Filed: January 10, 2017
    Date of Patent: June 25, 2019
    Assignee: JSR CORPORATION
    Inventor: Hayato Namai
  • Patent number: 10329440
    Abstract: An inkjet ink includes a) an aqueous medium; and b) capsules composed of a polymeric shell surrounding a core; wherein the capsules are dispersed in the aqueous medium using a dispersing group covalently bonded to the polymeric shell; the core contains one or more chemical reactants capable of forming a reaction product upon application of heat and/or infrared light; and the capsules have an average particle size smaller than 4 ?m as determined by dynamic laser diffraction.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: June 25, 2019
    Assignee: AGFA NV
    Inventors: Johan Loccufier, Luc Decoster
  • Patent number: 10324377
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.
    Type: Grant
    Filed: June 6, 2016
    Date of Patent: June 18, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Taku Hirayama, Daisuke Kawana, Yoshitaka Komuro, Masatoshi Arai, Shogo Matsumaru, Kenta Suzuki, Takashi Kamizono, Tatsuya Fujii
  • Patent number: 10323124
    Abstract: A polymer including a moiety represented by Chemical Formula 1, an organic layer composition including the polymer, an organic layer manufactured from the organic layer composition, and a method of forming patterns using the organic layer composition are provided. The definitions of the Chemical Formula 1 are the same as defined in the detailed description.
    Type: Grant
    Filed: June 9, 2015
    Date of Patent: June 18, 2019
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Youn-Hee Nam, Seung-Hyun Kim, Hyo-Young Kwon, Sung-Hwan Kim, Ran Namgung, Soo-Hyoun Mun, Dominea Rathwell, Hyun-Ji Song, Hyeon-Il Jung, Yu-Mi Heo
  • Patent number: 10317801
    Abstract: In accordance with some embodiments of the disclosed subject matter, a method for forming a photolithographic pattern is provided. The method comprises: providing a substrate with a negative photoresist layer formed on the substrate; performing an exposure process on a portion of the negative photoresist layer to form an exposed region, wherein a remaining portion of the negative photoresist layer is an unexposed region; performing a first developing process using a water-based developing solution to remove an upper portion of the exposed region, and to reveal a top surface and a side wall of the unexposed region; and performing a second developing process using an organic developing solution after the first developing process to remove the unexposed region and form the photolithographic pattern.
    Type: Grant
    Filed: June 30, 2016
    Date of Patent: June 11, 2019
    Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
    Inventor: Hui Wang
  • Patent number: 10319637
    Abstract: A formed back-end-of-line (BEOL) metal line layer may include a plurality of metal lines with dielectric oxide caps that are disposed in between each metal lines. To overlay an interconnecting layer of metal lines on a selected metal line of the BEOL metal line layer, a block copolymer (BCP) may be formed on a patterning layer. Thereafter, a selective etching of the formed BCP creates a recess above the selected metal line. The created recess facilitates the overlaying of the interconnecting layer of metal lines.
    Type: Grant
    Filed: November 9, 2017
    Date of Patent: June 11, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Nihar Mohanty, Elliott Franke, Richard Farrell
  • Patent number: 10319911
    Abstract: A wiring pattern production method includes forming, on a substrate, a precursor film for a plating base film including a first formation material having an amino group protected by a photoreactive protecting group, forming a photoresist layer including a photoresist material on a surface of the precursor film, exposing the photoresist layer with a desired pattern of light, exposing the precursor film with a desired pattern of light to form the plating base film, developing the exposed photoresist layer, removing a deprotected protecting group, and depositing an electroless plating catalyst on the exposed surface of the plating base film.
    Type: Grant
    Filed: August 22, 2016
    Date of Patent: June 11, 2019
    Assignee: NIKON CORPORATION
    Inventors: Shohei Koizumi, Takashi Sugizaki, Yusuke Kawakami
  • Patent number: 10317795
    Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: June 11, 2019
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: William Williams, III, Emad Aqad, James F. Cameron
  • Patent number: 10319735
    Abstract: Embodiments of the inventive concept provide a method for manufacturing a semiconductor device. The method includes forming a stack structure by alternately and repeatedly stacking insulating layers and sacrificial layers on a substrate, sequentially forming a first lower layer and a first photoresist pattern on the stack structure, etching the first lower layer using the first photoresist pattern as an etch mask to form a first lower pattern. A first part of the stack structure is etched to form a stepwise structure using the first lower pattern as an etch mask. The first lower layer includes a novolac-based organic polymer, and the first photoresist pattern includes a polymer including silicon.
    Type: Grant
    Filed: March 10, 2017
    Date of Patent: June 11, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Suk Koo Hong, Miyeong Kang, Hyosung Lee, Kyoungyong Cho, Bora Kim, Hyeji Kim, Sunkak Jo
  • Patent number: 10310378
    Abstract: The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: June 4, 2019
    Assignee: LG Chem, Ltd.
    Inventors: Eun Young Choi, No Jin Park, Jung Keun Kim, Je Gwon Lee, Se Jin Ku, Mi Sook Lee, Hyung Ju Ryu, Sung Soo Yoon
  • Patent number: 10310376
    Abstract: A polymer comprising recurring units containing a specific lactone ring and having an alkyl group on ?-butyrolactone skeleton of fused ring lactone and an alkyl ester substituent group intervening between the lactone structure and the polymer backbone is provided. A resist composition comprising the polymer as base resin is improved in such properties as DOF margin and MEF and quite effective for precise micropatterning.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: June 4, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei Adachi, Ryosuke Taniguchi, Koji Hasegawa, Kenji Yamada
  • Patent number: 10310377
    Abstract: The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1): wherein, each R0 independently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.
    Type: Grant
    Filed: May 8, 2015
    Date of Patent: June 4, 2019
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takashi Makinoshima, Masatoshi Echigo
  • Patent number: 10303052
    Abstract: A resist composition comprising a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene salt of tetraiodophenolphthalein, tetraiodophenolsulfonphthalein or tetraiodofluorescein exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: May 28, 2019
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 10301452
    Abstract: The present invention relates to the use of a mono-azide compound for cross-linking polymer strands, wherein said mono-azide compound has a structure of the formula (I): (I), wherein Q1 and Q2 are each independently from another a halogen and wherein R1, R2 and R3 are each independently from another any not comprising an azido moiety. Further, the present invention relates to a method for cross-linking polymer stands and to a cross-linked polymer composition obtainable from said method and an electronic device comprising such composition.
    Type: Grant
    Filed: November 23, 2015
    Date of Patent: May 28, 2019
    Assignee: BASF SE
    Inventors: Chao Wu, Fulvio G. Brunetti, Stefan Becker, Maximilian Hemgesberg
  • Patent number: 10303060
    Abstract: A method for forming a film for the fabrication of a microelectronic or optoelectronic device comprising a series of diazirine compounds of formula (I) having utility as photocrosslinkers are disclosed. Where, A, L, z, Arx and Ry are as defined herein.
    Type: Grant
    Filed: March 1, 2018
    Date of Patent: May 28, 2019
    Assignee: PROMERUS, LLC
    Inventors: Hugh Burgoon, Crystal D. Cyrus, Larry F. Rhodes
  • Patent number: 10295905
    Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: May 21, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Takaya Maehashi
  • Patent number: 10295906
    Abstract: A conductive polymer composition including: (A) ?-conjugated conductive polymer having at least one repeating unit shown by the following general formulae (1-1), (1-2), and (1-3); (B) a dopant polymer which contains a repeating unit “a” shown by the following general formula (2) and has a weight-average molecular weight in a range of 1,000 to 500,000; and (C) an amphoteric ion compound shown by the following general formula (3). This provides a conductive polymer composition having good filterability, coating property and film-formability onto a substrate to form a conductive film with good film quality and peelability with H2O or an alkaline developer; and forming a conductive film which reveals antistatic performance with high charge discharging ability and does not affect an influence of acid on the adjoined layer to be contact with.
    Type: Grant
    Filed: September 8, 2016
    Date of Patent: May 21, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Nagasawa, Jun Hatakeyama
  • Patent number: 10289002
    Abstract: An electron beam resist underlayer film-forming composition includes a polymer containing a unit structure having a lactone ring and a unit structure having a hydroxy group. The polymer may be a polymer obtained by copolymerizing a monomer mixture containing a lactone (meth)acrylate, a hydroxyalkyl (meth)acrylate, and phenyl (meth)acrylate or benzyl (meth)acrylate. A method for producing a semiconductor device including: applying the electron beam resist underlayer film-forming composition onto a substrate and heating the applied composition to form an electron beam resist underlayer film; coating the electron beam resist underlayer film with an electron beam resist; irradiating the substrate coated with the electron beam resist underlayer film and the electron beam resist with an electron beam; developing the substrate; and transferring an image onto the substrate by dry etching to form an integrated circuit element.
    Type: Grant
    Filed: December 5, 2014
    Date of Patent: May 14, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yasushi Sakaida, Ryuta Mizuochi, Rikimaru Sakamoto
  • Patent number: 10289000
    Abstract: A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: May 14, 2019
    Assignee: ORTHOGONAL, INC.
    Inventors: Charles Warren Wright, Douglas Robert Robello, John Andrew Defranco, Diane Carol Freeman, Frank Xavier Byrne
  • Patent number: 10290500
    Abstract: Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: May 14, 2019
    Assignee: Irresistible Materials LTD
    Inventors: Alex Phillip Graham Robinson, Andeas Frommhold, Alan Brown, Tom Lada
  • Patent number: 10281818
    Abstract: A resist composition comprising an alkali metal salt of tetraiodophenolphthalein, tetraiodophenolsulfonphthalein or tetraiodofluorescein exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
    Type: Grant
    Filed: September 6, 2017
    Date of Patent: May 7, 2019
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 10275104
    Abstract: A laminate member is provided which has excellent ion migration resistance between a light-sensitive resin layer and a conductive layer formed on a substrate. This laminate member is provided with a resin layer A formed on the substrate, a transparent electrode layer B formed on the resin layer A, and a conductive layer C formed on the resin layer A and the transparent electrode layer B, wherein the resin layer A contains a resin (a) containing a carboxyl group, the conductive layer C contains a resin (c) having conductive particles and a carboxylic group, the conductive layer C contacts the resin layer A and the transparent electrode layer B, and, defining SA as the acid value of an organic component contained by the resin layer A and SC the acid value of an organic component contained by the resin layer C, the value of SA?SC is 20-150 mg KOH/g.
    Type: Grant
    Filed: October 19, 2017
    Date of Patent: April 30, 2019
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Tsukuru Mizuguchi, Tomotaka Kawano
  • Patent number: 10272478
    Abstract: An object of the present invention is to obtain a high removing performance of particles. The substrate processing system according to the exemplary embodiment includes a holding unit and a removing solution supply unit. The holding unit holds a substrate that has a treatment film formed thereon, the treatment film includes an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent. The removing solution supply unit supplies to the treatment film formed on the substrate, a removing solution capable of removing the treatment film.
    Type: Grant
    Filed: July 27, 2015
    Date of Patent: April 30, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Meitoku Aibara, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Itaru Kanno, Kenji Mochida, Motoyuki Shima
  • Patent number: 10274825
    Abstract: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, cyclic sulfonium salt and photoresist compositions that comprise such compounds are provided. In another preferred aspect, acid generator compounds are provided that comprise one or more covalently linked acid-labile moieties, particularly ester-containing acid-labile moieties.
    Type: Grant
    Filed: September 16, 2013
    Date of Patent: April 30, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Paul J. LaBeaume
  • Patent number: 10268117
    Abstract: [Object] To provide compositions for forming a top coat layer capable of forming patterns with an excellent roughness and pattern shape in a pattern formation method by exposure to extreme ultraviolet rays, and a pattern formation method using the composition. [Means for solving problem] Provided are compositions for forming a top coat layer comprises an aromatic compound having an aromatic hydroxyl group and an aqueous solvent; and a method of forming patterns by applying the composition onto the resist surface and subjecting the resultant to exposure and development. This composition can further comprise binders.
    Type: Grant
    Filed: May 19, 2015
    Date of Patent: April 23, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Masato Suzuki, Xiaowei Wang, Tetsuo Okayasu, Yusuke Hama, Georg Pawlowski
  • Patent number: 10266620
    Abstract: The invention describes novel coating agents that include a polymer, one or more latent reactive groups and one or more noncovalent linking groups, the noncovalent linking groups selected to interact with a substrate to which the coating agent is applied. The coating agents are useful for providing a coating that can be further functionalized (for example, by application of additional coating layers), or for providing desirable properties to a surface.
    Type: Grant
    Filed: December 6, 2016
    Date of Patent: April 23, 2019
    Assignee: Innovative Surface Technologies, Inc.
    Inventors: Jie Wen, Kristin Taton, Laurie Lawin, William Knopke, Eric Guire, Patrick Guire
  • Patent number: 10268078
    Abstract: A spectrum of light which is emitted from an illuminator (2) of a liquid crystal display device (100) has a peak in each of the wavelength ranges of 447 to 453 nm, 538 to 542 nm, 613 to 617 nm, 628 to 632 nm, and 648 to 652 nm. The peak wavelength and rising wavelength of the transmission spectrum of the red color filters are, respectively, not less than 600 nm; and not less than 568 nm and not more than 572 nm. At wavelengths of 400 nm, 420 nm and 580 nm, the transmission spectrum of the red color filters has transmittances of, respectively, 10 to 15%; 3 to 6%; and 25 to 30%. The wavelengths at which the transmission spectrum of the red color filters exhibits a transmittance of 50% are contained within a range of 583 to 587 nm. The peak wavelength of the transmission spectrum of the green color filters is not less than 500 nm and not more than 560 nm. At wavelengths of 480 nm and 580 nm, the transmission spectrum of the green color filters exhibits transmittances of, respectively, 45 to 55%; and 65 to 70%.
    Type: Grant
    Filed: August 8, 2014
    Date of Patent: April 23, 2019
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Toshiyuki Tanaka
  • Patent number: 10261416
    Abstract: A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid, including a base material including a copolymer having a structural unit represented by general formula (a9-1) or a structural unit represented by general formula (a9-2), 30 mol % or more of a structural unit represented by general formula (a10-1) and 45 mol % or more of a structural unit having an acid-decomposable group which increases a polarity under the action of an acid. In each formula, Rs is a hydrogen atom or the like; Ya91 and YaX1 are a single bond or a divalent linking group; R91 is a hydrocarbon group having 1 to 20 carbon atoms or the like; R92 is an oxygen atom or the like; j and nax1 are integers of 1 to 3; Wax1 is a (nax1+1)-valent aromatic hydrocarbon group.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: April 16, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tomotaka Yamada, Takashi Kamizono, Yuki Fukumura, Tatsuya Fujii
  • Patent number: 10254652
    Abstract: An extreme ultraviolet lithography pattern stack, including, an inorganic hardmask layer, an under layer on the inorganic hardmask layer, and a resist layer on the under layer, where the inorganic hardmask layer, under layer, and resist layer have a combined thickness in the range of about 8.5 nm to about 70 nm.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: April 9, 2019
    Assignee: International Business Machines Corporation
    Inventors: Ekmini A. De Silva, Karen E. Petrillo, Indira P. Seshadri
  • Patent number: 10254646
    Abstract: Provided is a composition that is sensitive to radiation in electromagnetic spectrum ranges for printing purposes, and includes (a) one or more binder polymers; (b) an ethylenically unsaturated compound; (c) one or more compounds that absorbs radiations in the selected region of the spectrum; (d) a sensitizer; (e) optionally a photoaccelarator; (f) an adhesion promoter; (g) a dye; and (h) optionally thermal polymerization inhibitors. Also provided is a printing plate including the radiation sensitive composition, as well as the use of the composition and an image developing process.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: April 9, 2019
    Assignee: IBF INDUSTRIA BRASILEIRA DE FILMES S/A
    Inventors: Andre Luiz Arias, Luiz Nei Arias, Marjorie Arias, Mario Italo Provenzano
  • Patent number: 10253131
    Abstract: Dimethoxyphenol-based monomers containing polymerizable functional groups such as [meth]acrylate groups are useful for the preparation of polymers, wherein one or more dimethoxyphenyl moieties are part of side chains pendant to the backbones of the polymers. The polymers thereby obtained may have different, improved properties, such as higher glass transition temperatures, thermal stability and solvent resistance, as compared to polymers based on other types of lignin-derived monomers.
    Type: Grant
    Filed: July 12, 2016
    Date of Patent: April 9, 2019
    Assignee: UNIVERSITY OF DELAWARE
    Inventors: Angela L. Holmberg, Kaleigh H. Reno, Thomas H. Epps, III
  • Patent number: 10248022
    Abstract: A sulfonium compound having formula (1) exerts a satisfactory acid diffusion control function wherein R1, R2 and R3 are a C1-C20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved resolution, LWR, MEF and CDU.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: April 2, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki Ohashi, Ryosuke Taniguchi
  • Patent number: 10248021
    Abstract: Provided are a polymer that can be favorably used as a positive resist having a low film reduction rate in a state of low irradiation with ionizing radiation or the like and a positive resist composition that can favorably form a high-resolution pattern. The polymer includes an ?-methylstyrene unit and a methyl ?-chloroacrylate unit, and the proportion of components having a molecular weight of less than 6,000 in the polymer is no greater than 0.5%. The positive resist composition contains the aforementioned polymer and a solvent.
    Type: Grant
    Filed: February 15, 2016
    Date of Patent: April 2, 2019
    Assignee: ZEON CORPORATION
    Inventor: Manabu Hoshino
  • Patent number: 10248020
    Abstract: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a second onium salt acid generator that 1) comprises a covalently bound acid-labile moiety and 2) produces a second acid upon exposure of the photoresist composition to activating radiation, wherein the first acid and second acid have pKa values that differ by at least 0.5.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: April 2, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James W. Thackeray, Paul J. LaBeaume, James F. Cameron
  • Patent number: 10241407
    Abstract: Provided are ionic thermal acid generators of the following general formula (I): wherein: Ar1 represents an optionally substituted carbocyclic or heterocyclic aromatic group; W independently represents a group chosen from carboxyl, hydroxy, nitro, cyano, C1-5 alkoxy and formyl; X is a cation; Y independently represents a linking group; Z independently represents a group chosen from hydroxyl, fluorinated alcohols, esters, optionally substituted alkyl, C5 or higher optionally substituted monocyclic, polycyclic, fused polycyclic cycloaliphatic, or aryl, which may optionally comprise a heteroatom, provided at least one occurrence of Z is a hydroxyl group; a is an integer of 0 or greater; b is an integer of 1 or greater; provided that a+b is at least 1 and not greater than the total number of available aromatic carbon atoms of the aromatic group. Also provided are photoresist pattern trimming compositions and methods of trimming a photoresist pattern using the trimming compositions.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: March 26, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Irvinder Kaur, Cong Liu, Kevin Rowell, Gerhard Pohlers, Mingqi Li
  • Patent number: 10241405
    Abstract: Provided are a polymer that can be favorably used as a positive resist having a low film reduction rate under low irradiation, a high ? value, and high sensitivity, and a positive resist composition that can efficiently form a high-resolution pattern. The polymer includes an ?-methylstyrene unit and a methyl ?-chloroacrylate unit, and has a molecular weight distribution (Mw/Mn) of less than 1.48. In the polymer, the proportion of components having a molecular weight of less than 6,000 is no greater than 0.5% and the proportion of components having a molecular weight of greater than 80,000 is no greater than 6.0%. The positive resist composition contains the aforementioned polymer and a solvent.
    Type: Grant
    Filed: February 15, 2016
    Date of Patent: March 26, 2019
    Assignee: ZEON CORPORATION
    Inventor: Manabu Hoshino
  • Patent number: 10240026
    Abstract: An object of the present invention is to provide a photocurable resin composition having excellent thick-film curability and further excellent storage stability, and a cured product of the photocurable resin composition has a high concealing effect. The present invention is a photocurable resin composition containing components (A) to (E): a component (A): a leuco dye; a component (B): a photoacid generator; a component (C): a radical polymerizable compound (except for a (meth)acrylate having a tertiary amine skeleton); a component (D): a photoradical polymerization initiator; and a component (E): a tertiary amine compound.
    Type: Grant
    Filed: July 10, 2015
    Date of Patent: March 26, 2019
    Assignee: THREE BOND CO., LTD.
    Inventors: Yuko Takeo, Naoya Otsuki
  • Patent number: 10241412
    Abstract: Provided is a resist underlayer film composition which is excellent in resistance to a basic hydrogen peroxide aqueous solution, in gap-filling and planarization characteristics, and in dry etching characteristic, wherein the resist underlayer film composition is used for a multilayer resist method, comprising: (A1) a polymer (1A) comprising one, or two or more, of a repeating unit represented by following general formula (1); (A2) one, or two or more, of a polyphenol compound having a formula weight of 2,000 or less and not having a 3,4-dihydroxy phenyl group; and (B) an organic solvent.
    Type: Grant
    Filed: March 8, 2018
    Date of Patent: March 26, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroko Nagai, Takeru Watanabe, Daisuke Kori, Tsutomu Ogihara
  • Patent number: 10234757
    Abstract: A sulfonic acid anion-containing polymer having an alkylsulfonium cation not in covalent bond thereto can be readily prepared by reacting a sulfonic acid anion-containing polymer having an ammonium or metal cation with an alkylsulfonium salt under mild conditions. A resist composition comprising the inventive polymer is effective for suppressing acid diffusion since the sulfonium salt is bound to the polymer backbone. When processed by the ArF lithography, the polymer exhibits a lower absorption at the exposure wavelength than the triarylsulfonium salt form PAGs, resulting in improved resolution, mask fidelity, and LWR.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: March 19, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki Ohashi, Tomohiro Kobayashi
  • Patent number: 10234759
    Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group).
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: March 19, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Kawabata, Hiroo Takizawa, Akinori Shibuya, Akiyoshi Goto, Masafumi Kojima, Keita Kato