Using Specified Radiation-sensitive Composition Other Than A Nominal Sensitized Polyvinyl Alcohol Patents (Class 430/28)
  • Patent number: 11707436
    Abstract: Novel process and products thereby emplace NSAIDS within nanodelivery vehicles for various indications in mammals, including humans.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: July 25, 2023
    Inventor: Richard Clark Kaufman
  • Patent number: 10641910
    Abstract: A radiological image conversion panel 2 is provided with a phosphor 18 containing a fluorescent material that emits fluorescence by radiation exposure, in which the phosphor includes, a columnar section 34 formed by a group of columnar crystals which are obtained through columnar growth of crystals of the fluorescent material, and a non-columnar section 36, the columnar section and the non-columnar section are integrally formed to overlap in a crystal growth direction of the columnar crystals, and a thickness of the non-columnar section along the crystal growth direction is non-uniform in a region of at least a part of the non-columnar section.
    Type: Grant
    Filed: October 10, 2018
    Date of Patent: May 5, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Yasuhisa Kaneko, Haruyasu Nakatsugawa, Keiichirou Sato, Makoto Kitada, Kei Miura
  • Patent number: 9873821
    Abstract: An adhesive film including a compound including a urethane functional group, the adhesive film having a ratio (B/A) of 180° peel strength (B) after leaving the adhesive film at 70° C. for 2 minutes to 180° peel strength (A) at 25° C. of about 5 or more, is disclosed. A display apparatus including the adhesive film is also disclosed.
    Type: Grant
    Filed: January 21, 2014
    Date of Patent: January 23, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Sung Hyun Mun, Lee June Kim, Ik Hwan Cho, Chan Woo Kim, In Cheon Han
  • Patent number: 9176239
    Abstract: A radiological image conversion panel 2 is provided with a phosphor 18 containing a fluorescent material that emits fluorescence by radiation exposure, in which the phosphor includes, a columnar section 34 formed by a group of columnar crystals which are obtained through columnar growth of crystals of the fluorescent material, and a non-columnar section 36, the columnar section and the non-columnar section are integrally formed to overlap in a crystal growth direction of the columnar crystals, and a thickness of the non-columnar section along the crystal growth direction is non-uniform in a region of at least a part of the non-columnar section.
    Type: Grant
    Filed: June 26, 2013
    Date of Patent: November 3, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Yasuhisa Kaneko, Haruyasu Nakatsugawa, Keiichirou Sato, Makoto Kitada, Kei Miura
  • Patent number: 8758976
    Abstract: The present invention relates to a positive photosensitive polyimide composition that includes polyimide, a polyamic acid, and a photoactive compound. An organic insulating layer for organic light-emitting devices (OLED), which includes the positive photosensitive polyimide composition, may control a taper angle and outgassing, and has excellent adhesion in respects to a substrate, water repellent control ability, and storage stability and the like.
    Type: Grant
    Filed: March 6, 2009
    Date of Patent: June 24, 2014
    Assignee: LG Chem Ltd.
    Inventors: Hye-Ran Seong, Chan-Hyo Park, Dong-Hyun Oh, Hye-In Shin, Kyung-Jun Kim, Se-Jin Shin
  • Patent number: 7468228
    Abstract: A light shielding film for a display device, comprising a polymer binder, metal particles dispersed in the polymer binder, and a compound including a sulfur atom or a nitrogen atom. A substrate for a display device comprising the light shielding film. And a color filter comprising the light shielding film.
    Type: Grant
    Filed: February 4, 2005
    Date of Patent: December 23, 2008
    Assignee: FUJIFILM Corporation
    Inventor: Akira Hatakeyama
  • Patent number: 7238455
    Abstract: The invention provides a positive-working photosensitive resin composition comprising an alkali soluble resin (A), a diazoquinone compound (B) and a compound (C) which contains a —CH2OH group but not a phenolic hydroxyl group, a method for producing a pattern-formed resin film using the composition, a semiconductor device and a display device using the composition, and a method for producing the semiconductor device and the display device.
    Type: Grant
    Filed: June 23, 2004
    Date of Patent: July 3, 2007
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventors: Toshio Banba, Takuji Ikeda, Tatsuya Yano, Takashi Hirano
  • Patent number: 7026080
    Abstract: The invention provides a positive photosensitive resin composition which is free from film reduction, swelling or peeling at the time of development with an aqueous alkaline solution and which provides a dimensionally stable patterns after curing, and of which the final cured film has a low water absorption and excellent alkaline resistance. A positive photosensitive polyimide resin composition characterized by comprising an organic solvent-soluble polyimide having repeating units represented by the formula (1): (wherein m is an integer of from 3 to 10,000, R1 is a tetravalent organic group, R2 is a bivalent organic group, provided that from 5 to 100 mol % of R2 is a bivalent organic group having fluorine), a polyamic acid and a compound capable of generating an acid by irradiation with light.
    Type: Grant
    Filed: September 18, 2002
    Date of Patent: April 11, 2006
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Tomonari Nakayama, Masakazu Kato, Takayasu Nihira
  • Patent number: 6929821
    Abstract: A resin composition (A) layer, comprising an acrylic polymer (a) having a weight average molecular weight of 10000 to 300000 and an acid number of 80 to 250 mgKOH/g and a fluorescent substance (b), and a photosensitive resin composition (B) layer are formed inside the cell, and then they are exposed, developed and baked. By the process of the present invention the fluorescent substance can be effectively and uniformly formed on the side and bottom wall of the cell.
    Type: Grant
    Filed: March 18, 1999
    Date of Patent: August 16, 2005
    Assignee: The Nippon Synthetic Chemical Industry Co., Ltd.
    Inventor: Hiroaki Satoh
  • Patent number: 6908719
    Abstract: The present invention relates to a water-soluble photosensitive compound represented by the general formula (1): or by the general formula (2): in the formula, X represents a direct bond, an alkylene group containing 1 to 5 carbon atoms, —CH2O—, —OCH2—, —CH2OCH2—, —O—, —S— or —SO2—, and Z represents —SO3?.Q+, —COO?.Q+ or —SO2NR2, in which Q+ represents Li+, Na+, K+ or N+R4 and R represents a hydrogen atom and/or an alkyl group containing 1 to 5 carbon atoms, said alkyl group optionally having one hydroxy, ether, carbonyl, carbonyloxy or oxycarbonyl group, wherein a photosensitive group has an absorption maximum wavelength of not longer than 305 nm in the ultraviolet absorption spectrum thereof.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: June 21, 2005
    Assignees: Sanyo Chemical Industries, Ltd., Sony Corporation
    Inventors: Tetsuya Watanabe, Takao Mukai, Yasunori Niwa, Keiko Noda, Chiyoji Watanabe
  • Patent number: 6727034
    Abstract: The present invention is related to a photosensitive composition which comprises 70 to 99 weight % of a vinyl polymer (A) comprising recurring units derived from a monomer (a) of the following general formula (1) and 1 to 30 weight % of at least one photosensitive compound (B) selected from the group consisting of azide compounds and diazo compounds.
    Type: Grant
    Filed: May 14, 1999
    Date of Patent: April 27, 2004
    Assignee: Sanyo Chemical Industries, Ltd.
    Inventors: Naohito Ogiso, Tetsuya Watanabe, Tetsuya Yamada
  • Publication number: 20040048197
    Abstract: A spin coatable, photosensitive black matrix coating having high surface resistivity and exhibiting an optical density greater than 3 at film thicknesses of ≦1 micron has been developed for flat panel display applications where a chrome/chrome oxide black matrix is usually employed. It possesses excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic processes excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic process, thereby reducing the cost of processing in relation to chrome/chrome oxide black matrix fabrication processes.
    Type: Application
    Filed: September 8, 2003
    Publication date: March 11, 2004
    Inventors: Ram W. Sabnis, Jonathan W. Mayo, Terry L. Brewer, Michael D. Stroder, Kiyomi Ema, Yasuhisa Sone, Takayasu Nihira, Kazuhiro Aoba, Akira Yanagimoto
  • Patent number: 6673473
    Abstract: The invention relates to a display screen, in particular a color display screen, based on a display screen support with a single-layer or multi-layer coating which contains a red luminous substance and a coloring pigment. The invention is furthermore directed towards the display screen coating, means for the production thereof and a coated red luminous substance capable of being used for this purpose. A feature of the invention, is the presence of red tantalum (V) nitride by way of pigment for the purpose of increasing the contrast and decreasing the reflection of the display screen.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: January 6, 2004
    Assignee: Ferro GmbH
    Inventor: Hans-Peter Letschert
  • Publication number: 20030224251
    Abstract: A method for photo-imageable lacquer deposition for a display device. In one embodiment, a layer of photo-imageable lacquer is deposited on top of a faceplate of a display device. Portions of the lacquer layer are removed and selected portions of the lacquer layer remain deposited in the sub-pixel areas of the faceplate.
    Type: Application
    Filed: December 20, 2001
    Publication date: December 4, 2003
    Inventors: Olof M. Trollsas, Theodore S. Fahlen
  • Publication number: 20030193624
    Abstract: The invention provides a radiation-sensitive resin composition, by which a patterned insulation film whose water repellency varies is easily formed with high precision, a process for forming a patterned insulation film using this composition, a display element and an flat-panel disply device using the composition, and a process for producing the flat-panel disply device.
    Type: Application
    Filed: April 10, 2003
    Publication date: October 16, 2003
    Applicants: SHARP KABUSHIKI KAISHA, JSR CORPORATION
    Inventors: Kazuki Kobayashi, Ikuo Sakono, Shinji Shiraki, Hirofumi Sasaki, Kazuaki Niwa
  • Patent number: 6593043
    Abstract: A composition of a positive photosensitive resin precursor includes (a) a polyamic acid ester and/or a polyamic acid each having at least one selected from a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group at the end of a principal chain of the polymer, (b) a compound having a phenolic hydroxyl group, and (c) a quinonediazide sulfnate. The composition can be subjected to dissolution in an alkaline developer.
    Type: Grant
    Filed: November 1, 2001
    Date of Patent: July 15, 2003
    Assignee: Toray Industries, Inc.
    Inventors: Mitsuhito Suwa, Kazuto Miyoshi, Masao Tomikawa
  • Patent number: 6576391
    Abstract: To provide a photosensitive paste that permits pattern formation with a high aspect ratio and a high accuracy and to provide a plasma display comprising said photosensitive paste, by using a photosensitive paste that comprises, as essential components, an inorganic particles and an organic component that contains a photosensitive compound with the difference between the average refractive index of the organic component and the average refractive index of the inorganic particles being 0.1 or less.
    Type: Grant
    Filed: September 7, 1999
    Date of Patent: June 10, 2003
    Assignee: Toray Industries, Inc.
    Inventors: Yuichiro Iguchi, Takaki Masaki, Keiji Iwanaga
  • Patent number: 6558857
    Abstract: A display device comprises a color filter pattern between a phosphor pattern and a display window. For blue, the thickness (t2) of this color filter pattern is more than 2.5 micrometer, preferably 5-7 micrometer, and/or for red said thickness is 0.25-1.5 micrometer. The red and/or blue color filter patterns are provided by means of a non-linear photoresist. This enables an improved contrast (LCP) to be achieved.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: May 6, 2003
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Arie R. Van Doorn, Godefridus P. Van Melis
  • Patent number: 6531252
    Abstract: A method of manufacturing a luminescent screen assembly for a color cathode-ray tube (CRT) is disclosed. The luminescent screen assembly is formed on an interior surface of a faceplate panel of the CRT. The luminescent screen assembly includes a light-absorbing matrix having a plurality of substantially equally sized openings formed therein. The matrix is formed by applying one or more light sensitive layers on the interior surface of the faceplate panel of the CRT tube. The one or more light sensitive layers includes a photoresist material. Also, the one or more light sensitive layers includes a contrast enhancing material. The one or more light sensitive layers are selectively exposed to actinic radiation projected through openings in a shadow mask, positioned a fixed distance from the screen assembly.
    Type: Grant
    Filed: July 19, 2002
    Date of Patent: March 11, 2003
    Assignee: Thomson Licensing S.A.
    Inventors: Kangning Liang, Victoria Ann Rebar
  • Publication number: 20020182522
    Abstract: A spin coatable, photosensitive black matrix coating having high surface resistivity and exhibiting an optical density greater than 3 at film thicknesses of ≦1 micron has been developed for flat panel display applications where a chrome/chrome oxide black matrix is usually employed. It possesses excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic processes excellent thermal, light, and chemical stability and good shelf life. It is deposited and patterned by a simple photolithographic process, thereby reducing the cost of processing in relation to chrome/chrome oxide black matrix fabrication processes.
    Type: Application
    Filed: September 5, 2001
    Publication date: December 5, 2002
    Inventors: Ram W. Sabnis, Jonathan W. Mayo, Terry L. Brewer, Michael D. Stroder, Kiyomi Ema, Yasuhisa Sone, Takayasu Nihira, Kazuhiro Aoba, Akira Yanagimoto
  • Publication number: 20020142237
    Abstract: A phosphor pattern for a field emission display panel (FED) is provided. The phosphor pattern is formed by a process which comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) selectively irradiating active light to (A) the photosensitive resin composition layer containing a phosphor; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been selectively irradiated by development to form a pattern; and (IV) calcining the pattern to remove unnecessary portion to form the phosphor pattern. Also provided are this process for forming the phosphor pattern, a photosensitive element for a FED and a FED display panel.
    Type: Application
    Filed: March 28, 2002
    Publication date: October 3, 2002
    Inventors: Seiji Tai, Yoshiyuki Horibe, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou, Naoki Kimura, Mariko Shimamura
  • Patent number: 6444391
    Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
    Type: Grant
    Filed: January 2, 2001
    Date of Patent: September 3, 2002
    Assignees: Toyo Gosei Kogyo Co., Ltd., Showa Denko K.K.
    Inventors: Masaharu Watanabe, Noriaki Tochizawa
  • Publication number: 20020102501
    Abstract: A photosensitive resin composition and a method of forming a positive resist pattern by the use of the composition are disclosed. The photosensitive resin composition comprises (A) a resinous compound containing an acid-decomposing ester group, (B) a compound containing one ethylenically unsaturated bond in its molecule and possessing a group capable of forming a carboxylic acid via decomposition by the action of an acid, (C) a photo-acid generator, (D) a photo-radical polymerization initiator, and optionally (E) an epoxy resin.
    Type: Application
    Filed: January 14, 2002
    Publication date: August 1, 2002
    Inventors: Miyako Ichikawa, Masaki Sasaki, Teruo Saito
  • Publication number: 20020090560
    Abstract: The invention relates to a display screen, in particular a colour display screen, based on a display-screen support with a single-layer or multi-layer coating which contains a red luminous substance and a colouring pigment. The invention is furthermore directed towards the display-screen coating, means for the production thereof and a coated red luminous substance capable of being used for this purpose.
    Type: Application
    Filed: November 21, 2001
    Publication date: July 11, 2002
    Applicant: Ferro GmbH
    Inventor: Hans-Peter Letschert
  • Publication number: 20020090564
    Abstract: A composition of a positive photosensitive resin precursor includes (a) a polyamic acid ester and/or a polyamic acid each having at least one selected from a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group at the end of a principal chain of the polymer, (b) a compound having a phenolic hydroxyl group, and (c) a quinonediazide sulfnate. The composition can be subjected to dissolution in an alkaline developer.
    Type: Application
    Filed: November 1, 2001
    Publication date: July 11, 2002
    Inventors: Mitsuhito Suwa, Kazuto Miyoshi, Masao Tomikawa
  • Patent number: 6329111
    Abstract: Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.
    Type: Grant
    Filed: January 22, 1997
    Date of Patent: December 11, 2001
    Assignee: Hitachi Chemical Company
    Inventors: Takeshi Nojiri, Hideyasu Tsuiki, Hiroyuki Tanaka, Yumiko Wada, Seiji Tai, Seikichi Tanno, Hajime Kakumaru, Kazuya Sato, Naoki Kimura, Ikuo Mukai
  • Publication number: 20010002302
    Abstract: Disclosed are a phosphor pattern which comprises a calcination product of a phosphor pattern precursor containing
    Type: Application
    Filed: January 8, 2001
    Publication date: May 31, 2001
    Inventors: Naoki Kimura, Seiji Tai, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou, Yoshiyuki Horibe, Mariko Shimamura, Toranosuke Ashizawa, Eiji Fujita, Seikichi Tanno
  • Patent number: 6238829
    Abstract: Disclosed is a method of manufacturing a plasma addressed electro-optical display having a side surface electrode structure. In the display, a display cell is superimposed on a plasma cell. The display cell includes an intermediate substrate, an upper substrate having columns of signal electrodes, and an electro-optical material held therebetween. The plasma cell includes a lower substrate joined to the intermediate substrate, and a plurality of rows of discharge channels formed therebetween and composed of discharge electrodes and barrier ribs.
    Type: Grant
    Filed: May 19, 1998
    Date of Patent: May 29, 2001
    Assignee: Sony Corporation
    Inventor: Atsushi Seki
  • Publication number: 20010001696
    Abstract: Disclosed are a process for preparing a phosphor pattern for a field emission display panel which comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) irradiating active light to (A) the photosensitive resin composition layer containing a phosphor imagewisely; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been imagewisely irradiated by development to form a pattern; and (IV) calcining the pattern to remove unnecessary portion to form a phosphor pattern, a photosensitive element for a FED display panel, phosphor pattern for a FED display panel, and a FED display panel.
    Type: Application
    Filed: May 22, 1998
    Publication date: May 24, 2001
    Inventors: SEIJI TAI, YOSHIYUKI HORIBE, HIROYUKI TANAKA, TAKESHI NOJIRI, KAZUYA SATOU, NAOKI KIMURA, MARIKO SHIMAMURA
  • Patent number: 6232024
    Abstract: Disclosed are a phosphor pattern which comprises a calcination product of a phosphor pattern precursor containing (A) an organic material containing at least one selected from the group consisting of an alkali metal and an alkaline earth metal; and (B) a phosphor wherein an amount of the alkali metal or the alkaline earth metal is 2% by weight or less based on the amount of (B) the phosphor, a process for preparing the same, an organic alkali developing solution for forming the same, an emulsion developing solution for forming the same and a back plate for plasma display using the same.
    Type: Grant
    Filed: April 14, 1998
    Date of Patent: May 15, 2001
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Naoki Kimura, Seiji Tai, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou, Yoshiyuki Horibe, Mariko Shimamura, Toranosuke Ashizawa, Eiji Fujita, Seikichi Tanno
  • Patent number: 6197480
    Abstract: To provide a photosensitive paste that permits pattern formation with a high aspect ratio and a high accuracy and to provide a plasma display including the photosensitive paste, by using a photosensitive paste that includes, as essential components, an inorganic particles and an organic component that contains a photosensitive compound with the difference between the average refractive index of the organic component and the average refractive index of the inorganic particles being 0.1 or less.
    Type: Grant
    Filed: July 21, 1997
    Date of Patent: March 6, 2001
    Assignee: Toray Industries, Inc.
    Inventors: Yuichiro Iguchi, Takaki Masaki, Keiji Iwanaga
  • Patent number: 6180306
    Abstract: Disclosed are a solution for making a photoconductive layer in dry-electrophotographically manufacturing a screen of a cathode ray tube and a method using solution. By the solution, the photoconductive layer can be stored for long time and reveals a superior photoconductivity. The solution has tetraphenyl ethylene derivatives as an electron donor material responsive to the ultraviolet rays, which has structural formula (I), in which R is H, CH3, C2H5, C3H7, OCH3, OC2H5, OC3H7, or COCH3, on a condition of excepting a case where R1═R2═R3═R4═H.
    Type: Grant
    Filed: August 31, 1999
    Date of Patent: January 30, 2001
    Assignee: Orion Electric Co., Ltd.
    Inventors: Sang Youl Yoon, Ho Seok Shon
  • Patent number: 6159645
    Abstract: The invention relates to a black matrix in color picture tubes, a positive photoresist composition, an agent for protecting a black matrix, and a process for producing said black matrix. The invention is based on the object of providing a black matrix produced using a positive photoresist composition which permits good capability of structuring between exposed and non-exposed areas, and reducing the process for producing the black matrix to a few technological steps.
    Type: Grant
    Filed: February 9, 1998
    Date of Patent: December 12, 2000
    Assignee: Samsung Display Devices Co., Ltd.
    Inventors: Andre Wilpert, Gabi Grutzner, Kerstin Schulze-Matthai, Jurgen Bendig, Klaus Tummel
  • Patent number: 6160062
    Abstract: A PDMA polymer for a photosensitive resin composition. The PDMA polymer is obtained by polymerizing an acrylamide, N,N-dimetylacrylamide monomer, and a vinyl-type silane. The PDMA polymer having a molecular weight of 1,000,000.about.
    Type: Grant
    Filed: January 13, 1999
    Date of Patent: December 12, 2000
    Assignee: Samsung Display Devices Co., Ltd.
    Inventors: Chang-wook Kim, Eak-Cheol Eam, Seung-Jun You, Eun-Ha Hu, Gi-Wook Kang
  • Patent number: 6140007
    Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylformamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
    Type: Grant
    Filed: May 12, 1999
    Date of Patent: October 31, 2000
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Masaharu Watanabe, Noriaki Tochizawa, Yukari Imamura, Hideo Kikuchi
  • Patent number: 6127074
    Abstract: The present invention relates to photoresist solution for phosphor slurry for use in the color cathode ray tube. The photoresist solution of the present invention comprises Diazo or Bisazide photosensitizer; polymer. which is mixed with said Diazo or Bisazide photosensitizer, obtained by polymerization of hydroxy ethyl acrylate base. The photoresist solution of the present invention improves the adhesive strength by using of the Diazo or Bisazide photosensitizer and the polymer, thus the green, blue and red phosphor screen being uniformly formed and the color residue being disappeared. Further, since the photosensitizer not containing heavy metal is used, it does not cause any environmental problem. Also, it can be stored for a long time by using the initiator without hydrochloric acid at the time of polymerization.
    Type: Grant
    Filed: December 11, 1998
    Date of Patent: October 3, 2000
    Assignee: Samsung Display Devices Co., Ltd.
    Inventors: Seung-Jun You, Eak-Cheol Eam, Young-Jong Kang, Chang-Wook Kim, Gi-Wook Kang, Eun-Ha Heo
  • Patent number: 6103432
    Abstract: A method for forming a black matrix includes forming a black matrix applying a photoresist forming composition containing a compound represented by the formula (1) on the inner surface of a panel and drying the same to form a photoresist layer; exposing the photoresist layer; applying a black pigment solution for forming a black matrix on the photoresist layer and drying the same to form a black pigment layer; and developing the resultant structure; ##STR1## wherein, X is a halogen atom and l:m:n is 1.0-4.5:70.0-98.0:1.0-20.0. The method for forming a black matrix is a non-etching method, which is a simplified process and is not detrimental to environment. Also, since the black matrix material can be recovered from a developing solution for recycling, it is economical. Also, since the photoresist forming composition of the present invention has a good photosensitivity, a black matrix having an excellent landing margin can be obtained.
    Type: Grant
    Filed: April 12, 1999
    Date of Patent: August 15, 2000
    Assignee: Samsung Display Devices Co., Ltd.
    Inventors: Hyun-jin Kim, Hong-kyu Choi, Ki-jun Kim
  • Patent number: 6090509
    Abstract: Disclosed is a photoconductive solution which has excellent charge characteristics with easy control of charge amount and is completely volatilized after baking. The solution contains 0.01 to 10 wt. % of one of dialkyl(C.sub.n H.sub.2n+1.sup.-) aminobenzil methacrylate(DMABMA) of n below 5, dialkyl(C.sub.n H.sub.2n+1.sup.-) aminophenyl acryloamide(DMAPAA) of n below 5, dialkyl(C.sub.n H.sub.2n+1.sup.-) aminophenyl methacryloamide (DMAPMA) of n below 5, and the mixture of two kinds or more of them as ultraviolet-sensitive material of a donor and an acceptor. The solution is formed by dissolving said one ingredient together with 10 to 20 wt. % of at least one of polystyrene (PS), polymethyl methacrylate(PMMA), polyalphamethylstyrene(PAMS) and polystyrene-oxazoline copolymer(PS-OX) as polymeric binder, in 20 to 85 wt. % of toluene or xylene as solvent.
    Type: Grant
    Filed: July 28, 1998
    Date of Patent: July 18, 2000
    Assignee: Orion Electric Co., Ltd.
    Inventors: Ho Seok Shon, Younk Ho Park
  • Patent number: 6071657
    Abstract: In a method for manufacturing a phosphor screen of a cathode ray tube, a first photo-resist layer is coated on an inner surface of a panel of the cathode ray tube except at predetermined locations. A second photo-resist layer dispersed with pigment particles is coated on the first photo-resist layer and at the predetermined locations. The second photo-resist layer is exposed at the predetermined locations from an opposite side of the panel. The first photo-resist layer is dissolved and the second photo-resist layer is removed from the first photo-resist layer so as to form a color filter layer at the predetermined locations. A phosphor layer is formed on the color filter layer.
    Type: Grant
    Filed: January 28, 1999
    Date of Patent: June 6, 2000
    Assignee: Sony Corporation
    Inventors: Tsuneo Kusunoki, Norihiro Tateyama, Katsutoshi Ohno
  • Patent number: 6054236
    Abstract: Disclosed is a photoconductive solution which has excellent charge characteristics with easy control of charge amount and is completely volatilized after baking. The solution contains 2 to 5% by weight of tetracyanoethylene as ultraviolet-sensitive material. 0.1 to 1 wt. % diphenylpicrylhydrazine and tetracyanoquinodimethane below 0.1% by weight are desirably added to the tetracyanoethylene of 2 to 5 wt. % for better accomplishment of the purpose, and the solution contains at least one of trinitrofluorenone, ethylanthraquinone and their mixture of 0.1 to 1 wt. % as an acceptor. The solution is formed by mixing the above ingredients together with 10 to 20 wt. % of at least one of polystyrene, polymethyl methacrylate, polyalphamethylstyrene and polystyrene-oxazoline copolymer, and 20 to 85 wt. % of toluene as solvent.
    Type: Grant
    Filed: July 28, 1998
    Date of Patent: April 25, 2000
    Assignee: Orion Electric Co., Ltd.
    Inventors: Sang Youl Yoon, Ho Seok Shon
  • Patent number: 6040097
    Abstract: Disclosed is a photoconductive solution which has excellent charge characteristics with easy control of charge amount and is completely volatilized after baking. The solution contains 2 to 5% by weight of tetraphenyl ethylene as ultraviolet-sensitive material. 0.1 to 1 wt. % diphenylpicrylhydrazine or 0.1 wt. % or less of tetracyanoquino-dimethane(TCNQ) as ultraviolet-sensitive donor material is desirably added to the tetraphenyl ethylene of 2 to 5 wt. % for better accomplishment of the purpose, and the solution contains at least one of trinitrofluorenone, ethylanthraquinone and their mixture of 0.1 to 1 wt. % as an acceptor. The solution is formed by mixing the above ingredients together with 10 to 20 wt. % of polystyrene-oxazoline copolymer(PS-OX) as polymer binder, and 20 to 85 wt. % of toluene as solvent.
    Type: Grant
    Filed: July 30, 1998
    Date of Patent: March 21, 2000
    Assignee: Orion Electric Co., Ltd.
    Inventors: Sang Youl Yoon, Ho Seok Shon
  • Patent number: 6027840
    Abstract: Disclosed is a solution for forming photoconductive layer for electrophotographically manufacturing a luminescent screen on an interior surface of a faceplate panel for a CRT. The solution consists of 0.01 to 10% by weight of bis dimethyl phenyl diphenyl butatriene, 1 to 30% by weight of polystyrene, 30 to 100% by weight of 2,5-bis(4-diethyl aminophenyl)-1,3,4-oxadiazole, against 100% by weight of polystyrene and the remainder of solvent. The photoconductive layer manufactured using the solution facilitates performing all the processes in a visible light environment with safety in work operations, because the solution contains 2,5-bis(4-diethyl aminophenyl)-1,3,4-oxadiazole, instead of trinitro fluorenone(TNF) of cancer-causing material, as ultraviolet-sensitive material.
    Type: Grant
    Filed: July 28, 1998
    Date of Patent: February 22, 2000
    Assignee: Orion Electric Co., Ltd.
    Inventor: Sang Youl Yoon
  • Patent number: 6020093
    Abstract: The photosensitive compound of the present invention contains the following unit: ##STR1## and is particularly expressed by the following formula: ##STR2## Different photosensitive resin compositions can be prepared from this novel photosensitive resin compound, and the resulting photosensitive resin compositions do not raise the problem of environmental pollution, exhibit high resolution, possess a high level of sensitivity, and exhibit excellent adhesion with substrates, coating characteristics and storage stability.
    Type: Grant
    Filed: May 13, 1998
    Date of Patent: February 1, 2000
    Assignee: Toyo Gosei Kogyo, Ltd.
    Inventors: Toru Shibuya, Jian Rong Xie, Noriaki Tochizawa
  • Patent number: 5994008
    Abstract: The present invention relates to a composition for forming a fluorescent film for a display and a method of forming a fluorescent film for forming a display surface of a display unit. The composition for forming a fluorescent film for a display has an aqueous medium in which photosensitive resin having a styryl pyridium photosensitive group having an internal salt structure and a fluorescent material which easily reacts with acid are dispersed. The composition is applied to the display surface of a display unit so that a fluorescent layer is formed. Then, the fluorescent material layer is developed to form the fluorescent material layer into a predetermined pattern, and then the fluorescent material layer formed into the predetermined pattern is baked so that a fluorescent film is formed.
    Type: Grant
    Filed: April 18, 1997
    Date of Patent: November 30, 1999
    Assignee: Futaba Denshi Kogyo K.K.
    Inventors: Yukio Ogawa, Yoshihisa Yonezawa, Katsutoshi Kougo, Kazuyoshi Ishikawa, Shigeo Itoh, Tetsuaki Tochizawa, Yasuo Kuniyoshi, Toru Shibuya, Hideo Kikuchi
  • Patent number: 5942358
    Abstract: A method of forming a fluorescent screen, such as a black matrix or a color filter, on a front panel of a cathode ray tube is described. The method comprises the steps of forming a photosensitive adhesion layer on an inner surface of the front panel, exposing the photosensitive adhesion layer through a color selecting electrode having a plurality of slots for reducing adhesion level of exposed area of the photosensitive adhesion layer, bringing a pigment layer provided on a supporting sheet into intimate contact with the photosensitive adhesion layer, applying pressure to the pigment layer and the photosensitive layer, and peeling off the supporting sheet from the pigment layer. Alternatively, a pigment may be dispersed in the photosensitive adhesion pigment layer.
    Type: Grant
    Filed: August 2, 1996
    Date of Patent: August 24, 1999
    Assignee: Sony Corporation
    Inventors: Masaru Ihara, Katsutoshi Ohno, Hiroshi Uchida, Katsuhiko Kuroda
  • Patent number: 5928821
    Abstract: The present invention relates to a method of electrophotographically manufacturing a phosphor screen 22 comprising a multiplicity of color-emitting screen elements arranged in color groups on an interior surface of a faceplate panel 12 of a color CRT 10. The multiplicity of screen elements is exposed to a source 35 of UV radiation to stimulate the screen elements to emission. The emission from the screen elements is utilized to determine, on a pixel-by-pixel basis, a first emission characteristic of each color group of screen elements. Then, a subsequent manufacturing step (58, 62) is performed that affects the screen elements, and the multiplicity of screen elements is re-exposed to the source of UV radiation to stimulate the screen elements to emission. The resultant emission is utilized to determine, on a pixel-by-pixel basis, a second emission characteristic from each color group of screen elements.
    Type: Grant
    Filed: December 22, 1995
    Date of Patent: July 27, 1999
    Assignee: Thomson Consumer Electronics, Inc.
    Inventors: Edward Richard Garrity, Jr., George Milton Ehemann, Jr.
  • Patent number: 5902708
    Abstract: A method of electrophotographically manufacturing a luminescent line screen 22 within a viewing area of a faceplate panel 12 includes providing a matrix 23 having a border 123 extending beyond the viewing area. A photoreceptor 36 overlies the matrix. The photoreceptor is electrostatically charged and a color selection electrode 25, having a multiplicity of openings therethrough, is mounted therein. The panel 12 is positioned on an exposure device having a multi-position visible light source. A least one series of light exposures utilizes both first and second order illumination to form selectively discharge the photoreceptor 36 in the viewing area and on the border 123 of the matrix. Then, triboelectrically charged, color-emitting phosphor is deposited onto the illuminated areas of the photoreceptor to form phosphor lines in the viewing area and phosphor traps over the matrix border.
    Type: Grant
    Filed: May 23, 1997
    Date of Patent: May 11, 1999
    Assignee: Thomson Consumer Electronics, Inc.
    Inventors: Istvan Gorog, James Regis Matey, Robert Edward Simms
  • Patent number: 5885752
    Abstract: There is disclosed a salt of a polymer having charged anionic functionalities used as a dispersant in a dispersion solution containing a pigment and used for forming a first pigment layer. A substance which forms a salt with a polymer having charged anionic functionalities is mixed into a solution applied on the pigment layer, and/or mixed into a developing solution. The formed layers are patterned and thus a display screen is obtained.
    Type: Grant
    Filed: December 19, 1995
    Date of Patent: March 23, 1999
    Assignees: Kabushiki Kaisha Toshiba, Fuji Pigment Co., Ltd.
    Inventors: Takeo Itou, Hidemi Matsuda, Hisashi Chigusa, Kazuo Sakai, Masaru Fukuda
  • Patent number: 5885744
    Abstract: A photoresist composition containing a photo-curing polymer and a photosensitive agent, wherein the photosensitive agent comprises at least two compounds selected from the group consisting of 4,4'-diazido-2,2'-stilbenedisulfonate sodium salt, 4,4'-diazo-2,2'-dibenzalacetone disulfonate disodium salt, 2,5-bis(4-azido-2-sulfobenzylidene) cyclopentanone disodium salt and 4,4'-diazido-2,2'-dicinnamylideneacetone sulfonate salt. By performing a lithography process using the photoresist composition, the exposure time can be shortened, thereby improving the yield of products.
    Type: Grant
    Filed: July 14, 1997
    Date of Patent: March 23, 1999
    Assignee: Samsung Display Devices Co., Ltd.
    Inventors: Seung-joon Yoo, Ik-chul Lim, Chang-wook Kim, Ki-wook Kang
  • Patent number: RE47453
    Abstract: A chip-type light-emitting semiconductor device includes: a substrate 4; a blue LED 1 mounted on the substrate 4; and a luminescent layer 3 made of a mixture of yellow/yellowish phosphor particles 2 and a base material 13 (translucent resin). The yellow/yellowish phosphor particles 2 is a silicate phosphor which absorbs blue light emitted by the blue LED 1 to emit a fluorescence having a main emission peak in the wavelength range from 550 nm to 600 nm, inclusive, and which contains, as a main component, a compound expressed by the chemical formula: (Sr1-a1-b1-xBaa1Cab1Eux)2SiO4 (0?a1?0.3, 0?b1?0.8 and 0<x<1). The silicate phosphor particles disperse substantially evenly in the resin easily. As a result, excellent white light is obtained.
    Type: Grant
    Filed: July 5, 2016
    Date of Patent: June 25, 2019
    Assignee: Panasonic Corporation
    Inventors: Toshihide Maeda, Shozo Oshio, Katsuaki Iwama, Hiromi Kitahara, Tadaaki Ikeda, Kei Sakanoue, Hidenori Kamei, Yasuyuki Hanada