Abstract: The present disclosure is to provide a photopolymer composition including a polymer matrix or a precursor thereof having a specific chemical structure; a photoreactive monomer; and a photoinitiator. The present disclosure is also to provide a hologram recording medium, an optical element, and a holographic recording method using the photopolymer composition.

Abstract: A photopolymer composition comprising a polymer matrix or a precursor thereof including a reaction product between (i) a (meth)acrylate-based (co)polymer in which a silane-based functional group is located in a branched chain and an equivalent weight of the silane-based functional group is 300 g/eq to 2000 g/eq, and (ii) a linear silane crosslinking agent; a photoreactive monomer; and a photoinitiator, a hologram recording medium using the same, an optical element using the hologram recording medium, and a holographic recording method. The photopolymer composition can more easily provide a photopolymer layer having improved durability against temperature and humidity while having a large refractive index modulation value.

Abstract: The invention relates to photopolymer formulations based on a polymeric network as a matrix and at least one photopolymerizable monomer dissolved therein and to a method for the production of holographic media from such photopolymers and to the use thereof.

Abstract: Provided is a curable colored composition, transmitting the light in the magenta region and absorbing the light in the cyan region. A curable colored composition comprising a metal complex in which a compound represented by formula (I) below is coordinated to a metal atom or a metal compound.

Abstract: A lithographic printing plate precursor in a positive-type with an infrared-sensitivity, having a support and an image recording layer provided on the support, the support having a hydrophilic surface, the recording layer having a particular resin, an amphoteric surfactant and/or an anionic surfactant, and an infrared absorbing agent, wherein the particular resin being at least one of resins selected from the group consisting of a polyurethane resin, a poly (vinyl acetal) resin, and maleimide resin A.

Abstract: A lithographic printing plate precursor includes a cyanine dye, characterized in that the cyanine dye includes two different chromophoric groups, a chromophoric group that has its main absorption in the infrared region and another chromophoric group that has its main absorption in the visible light region.

Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).

Abstract: A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.

Abstract: There is provided a resist underlayer film which does not intermix with a photoresist coated and formed as the overlying layer and which dissolves in an alkaline developer and can be developed and removed at the same time as the photoresist; and a resist underlayer film-forming composition for forming such a resist underlayer film. A resist underlayer film-forming composition for use in a lithographic process for manufacturing a semiconductor device, containing: (A) a branched polyhydroxystyrene in which an ethylene repeating unit on a polyhydroxystyrene moiety is bonded to a benzene ring on a different polyhydroxystyrene moiety; (B) a compound having at least two vinyl ether groups; and (C) a photoacid generator.

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less, (A) a repeating unit containing a group capable of decomposing and forming an acid upon irradiation with an actinic ray or radiation, (B) a repeating unit containing a group capable of decomposing and forming a carboxylic acid by the action of an acid, and (C) a repeating unit containing a carbon-carbon unsaturated bond.

Abstract: Thermally imagable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline developer, wherein the first polymer is different from the second polymer and the second polymer comprises vinyl acetal repeating units and pendant acidic groups selected from COOH, —SO3H, —PO3H2, —PO4H2, aromatic OH and groups having acidic amide or imide groups.

Abstract: A negative-acting photolithographic printing plate precursor has a unique negative-acting photosensitive composition on a surface. The photosensitive composition contains an acetal polymer, an infrared absorbing dye or pigment, a crosslinking agent for the acetal resin and a photosensitive chemical acid progenitor, and the acetal polymer has within its backbone a structure comprising a particular polymeric moiety derived from a polyvinyl alcohol backbone.

Abstract: A resist composition comprising at least one kind of a nitrogen-containing compound selected from the group consisting of an amine compound having a phenoxy group, an ammonium salt compound having a phenoxy group, an amine compound having a sulfonic acid ester group and an ammonium salt compound having a sulfonic acid ester group; and a pattern forming method using the composition.

Abstract: Polymeric material, containing a latent acid which can be converted to an acid by irradiation by a laser and optionally further ingredients.

Abstract: A positive-working photosensitive composition for use in making an imageable element comprises one or more vinyl copolymers wherein said vinyl copolymer are homopolymer or copolymer containing monomers comprising at least two functional groups such as HOOC—C?C—CONH—R, and may further comprise a converter substance for converting radiation into heat. The converter substance may be selected to have an absorption spectrum that is optimized to absorb at the wavelength of imaging radiation. The composition may be coated onto a suitable substrate to create a lithographic printing precursor. The precursor may be imagewise irradiated with radiation and optionally developed with a developer liquid to produce a lithographic printing master. A positive-working lithographic printing precursor may be prepared using the composition.

Abstract: An interconnect structure with improved performance and capacitance by providing air gaps inside the dielectric layer by use of a multi-phase photoresist material. The interconnect features are embedded in a dielectric layer having a columnar air gap structure in a portion of the dielectric layer surrounding the interconnect features. The interconnect features may also be embedded in a dielectric layer having two or more phases with a different dielectric constant created. The interconnect structure is compatible with current back end of line processing.

Abstract: Polymeric material, containing a latent acid which can be converted to an acid by irradiation by a laser and optionally further ingredients.

Abstract: A lithographic printing original plate, a lithographic printing plate using the lithographic printing original plate and a process for producing the lithographic printing plate are disclosed. The lithographic printing original plate has, on a substrate, a photosensitive layer made of a crosslinked polymer comprising a hydrophilic polymer, a crosslinking agent and a light absorbing compound or comprising a hydrophilic polymer, a crosslinking agent, a light absorbing compound and a hydrophobic polymer, and has properties that the photosensitive layer is changed from ink-repellent to ink-receptive by irradiation with a light.

Abstract: The invention relates to organically modified, stable in storage, UV curable, NIR permeable silicic acid polycondensates which are photostructurable in layers having a thickness of 1 to 150 ?m. The invention also relates to the production and use thereof as negative resists. The polycondensates according to the invention are obtainable by condensation of organically modified silanediols of the formula I with organically modified silanes of the formula II. Ar2Si(OH)2 ??(I) RSi(OR?)3 ??(II) The radicals are identical or different and have the following meaning: Ar=a radical having 6 to 20 carbon atoms and at least one aromatic group, R=an organic radical having 2 to 15 carbon atoms and at least one epoxy group and/or at least one C?C double bond, R?=methyl or ethyl. Condensation occurs without the addition of water. The molar ratio of said compounds I and II is 1:1.

Abstract: The present invention relates to IR-sensitive compositions containing an initator system comprising: (a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazolium dyes, cyanine dyes, polyaniline dyes, polypyrrole dyes, polythiophene dyes and phthalocyanine pigments (b) at least one compound capable of producing radicals selected from polyhaloalkyl-substituted compounds (c) at least one polycarboxylic acid represented by the following formula I wherein Y is selected from the group consisting of O, S and NR7, each of R4, R5 and R6 is independently selected from the group consisting of hydrogen, C1-C4 alkyl, aryl which is optionally substituted, —COOH and NR8CH2COOH, R7 is selected from the group consisting of hydrogen, C1-C6 alkyl, —CH2CH2OH, and C1-C5 alkyl substituted with -COOH, R8 is selected from the group consisting of —CH2COOH, —CH2OH and —(CH2)2N(CH2COOH)2 and r is 0, 1, 2 or 3 with the proviso that at least one of R4, R5, R

Abstract: A photosensitive composition comprising a resin containing a repeating unit corresponding to a monomer having a structure represented by formula (I) defined in the specification, and a negative working lithographic printing plate having a negative working photosensitive layer comprising the above-described photosensitive composition.

Abstract: The present invention provides novel photoresist compositions that comprise a resin binder, a photoacid generator compound and an added amine component. In a first aspect, the added amine preferably is 1) non-aromatic 2) has from about 9 to about 16 carbon atoms, 3) contains no primary or secondary amine groups, and/or 4) contains no multiple tertiary amine groups where two tertiary groups are separated by a linkage of optionally substituted ethylene. In a related aspect, the added amine is a non-aromatic amine that comprises either 1) a tertiary nitrogen alicyclic ring member, and preferably is at junction position between a bicyclic or other multi-ring ring system; or 2) a tertiary nitrogen that is not a ring member, and is substituted by at least two tertiary or quaternary carbon radicals.

Abstract: The present invention relates to IR-sensitive compositions suitable for the manufacture of printing plates developable on-press. The IR-sensitive compositions comprise a first polymeric binder which does not comprise acidic groups having a pKa value?8; a second polymeric binder comprising polyether groups; an initiator system; and a free radical polymerizable system comprising at least one member selected from unsaturated free radical polymerizable monomers, free radical polymerizable oligomers and polymers containing C?C bonds in the back bone and/or in the side chain groups. The initiator system includes (i) at least one compound capable of absorbing IR radiation; (ii) at least one compound capable of producing radicals selected from polyhaloalkyl-substituted compounds; and (iii) at least one polycarboxylic acid of formula R4—(CR5R6)r—Y—CH2COOH, wherein oxi<redii+1.6 eV, where oxi=oxidation potential of component (i) in eV, and redii=reduction potential of component (ii) in eV.

Abstract: A plate-making method of a lithographic printing plate comprising exposing imagewise a photosensitive lithographic printing plate comprising an aluminum support and a photosensitive layer comprising a photosensitive composition of photopolymerization type, which contains a compound having a nitrogen atom and an ethylenically unsaturated double bond, a photopolymerization initiator and a polymer binder, and developing the exposed printing plate with a developing solution containing (1) an inorganic alkali agent and (2) a nonionic surface active agent having a polyoxyalkylene ether group.

Abstract: A photosolder resist composition of the invention is characterized by containing (A) a resin containing radical polymerization groups and carboxyl groups obtained by adding a cyclic ether group of a cyclic ether group-containing vinyl monomer to a carboxylic group of a radical copolymer containing at least isobornyl (meth) acrylate and a carboxyl group-containing vinyl monomer as monomer units; (B) an inorganic filler; and (C) a photocurable mixture of a polyfunctional acrylic monomer (c1), a cyclic ether group-containing compound (c2), and a photopolymerization initiator (c3).

Abstract: The present invention provides a photopolymerizable composition containing a polymerizable compound having an ethylenically unsaturated bond, a compound represented by the following general formula (I), and a radical generating agent capable of generating a radical by interacting with the compound represented by the following general formula (I). General Formula (I); In the general formula (I), R1, R2, and R3 each individually represent a hydrogen atom or a monovalent substituent; R4 represents at least one member selected from the group consisting of: a hydrogen atom, an aliphatic group, an aromatic group, and a heterocyclic group; Z1 represents a substituent necessary for allowing the compound represented by the general formula (I) to become a dye; and X− represents a group capable of forming an anion. The invention also provides a recording material in which a recording layer containing the photopolymerizable composition is provided on a support.

Abstract: A positive resist composition comprises: (A) a resin having an aliphatic cyclic hydrocarbon group and increasing the solubility to an alkali developer by the action of an acid; (B) a compound generating an acid upon irradiation with an actinic ray or radiation; and (C) a nitrogen-containing compound having in the molecule at least one partial structure represented by following formula (I).

Abstract: Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component.

Abstract: A photosensitive printing element comprising a support; and a photopolymerizable layer comprising a photopolymerizable composition comprising at least one elastomeric binder, at least one monomer, an initiator having sensitivity to actinic radiation, and at least one photobleachable compound having sensitivity to actinic radiation; is described. Preferred photobleachable compounds are unsubstituted or substituted naphthylvinyl pyridines; unsubstituted or substituted styrylquinolines; diphenyl maleic anhydride; isomers of any of the foregoing; derivatives of any of the foregoing; and any combination of the foregoing. Such photosensitive printing elements are used to prepare flexographic printing plates and are useful in enhancing resolution and differentiating image areas from non-image areas in images produced therefrom by reducing the deleterious effect of scattered light.

Abstract: The present invention provides novel photoresist compositions that comprise a resin binder, a photoacid generator compound and an added amine component. In a first aspect, the added amine preferably is 1) non-aromatic 2) has from about 9 to about 16 carbon atoms, 3) contains no primary or secondary amine groups, and/or 4) contains no multiple tertiary amine groups where two tertiary groups are separated by a linkage of optionally substituted ethylene. In a related aspect, the added amine is a non-aromatic amine that comprises either 1) a tertiary nitrogen alicyclic ring member, and preferably is at junction position between a bicyclic or other multi-ring ring system; or 2) a tertiary nitrogen that is not a ring member, and is substituted by at least two tertiary or quaternary carbon radicals.

Abstract: The present invention provides a photopolymerizable composition containing a polymerizable compound having an ethylenically unsaturated bond, a compound represented by the following general formula (I), and a radical generating agent capable of generating a radical by interacting with the compound represented by the following general formula (I).

Abstract: Disclosed are a photopolymerizable composition and a recording material containing the composition. The composition comprises a polymerizable compound having an ethylenic unsaturated bond, a compound of the following general formula (1), and a radical generator that interacts with the compound of formula (1) to generate a radical. In formula (1), each of R1, R2 and R4 is an aliphatic or aromatic group; R3 is a group shown below; R5 is a hydrogen atom, or an aliphatic, aromatic or heterocyclic group; Each of L1 to L4 is a substituted or unsubstituted methine group; Each of Z1 to Z3 is an atomic group which forms a 5-membered nitrogen-containing hetero ring; and X− is a group which forms an anion.

Abstract: A positive resist composition comprises: (A) a resin having an aliphatic cyclic hydrocarbon group and increasing the solubility to an alkali developer by the action of an acid; (B) a compound generating an acid upon irradiation with an actinic ray or radiation; and (C) a nitrogen-containing compound having in the molecule at least one partial structure represented by following formula (I).

Abstract: A photopolymerizable composition that is highly sensitive not only to ultraviolet light, but also light in the range from visible light to infrared light, and a recording material containing the photopolymerizable composition, which is excellent in sensitivity and decolorization property in the background part, and which is capable of forming sharp images with high contrast. The photopolymerizable composition contains a polymerizable compound having an ethylenic unsaturated bond and a radical generator capable of forming a radical by the action of the compound and the radical generator upon each other.

Abstract: A lithographic printing plate precursor comprising a hydrophilic support and an image-forming layer containing a heat radical-generating agent, a polymethine dye, and at least one component selected from fine particles containing a compound having a radical polymerizable group and microcapsules encapsulating a compound having a radical polymerizable group.

Abstract: A photo-curable resin composition suitable as a material for photo-fabricating. The composition can produce cured products with excellent mechanical strength and high heat resistance. Further disclosed is a process for fabricating a resin-based mold which provides superior molding dimensional precision and superb repetition durability. The composition comprises (A) a compound having a cyclohexene oxide structure, (B) a cationic photo-initiator, (C) an ethylenically unsaturated polymer, (D) a radical photo-initiator, and (E) spherical silica particles, and the heat distortion temperature of the cured resin produced from the photo-curable resin composition is 100° C. or higher. The process comprises preparing a resin-based mold comprising a plurality of integrally laminated layers of cured resin by repeating the step of forming a cured resin layer by selectively irradiating a photo-curable material with light, wherein the photo-curable material is the above-mentioned photo-curable resin composition.

Abstract: The invention relates to a photocurable, negative-working mixture and a recording material which is obtained therefrom and which is suitable for the production of elastic relief printing plates. The mixture contains a) an elastomeric binder, b) a free-radical-polymerizable compound which is compatible with the binder and which has at least one terminal, ethylenically unsaturated group and a boiling point at normal pressure of over about 100° C. and c) a compound or a combination of compounds which are capable of initiating the polymerization of the compound (b) on exposure to actinic light. The binder is made up of the segments A, B and C, where A is a hydrophobic soft block having a glass transition temperature Tg of below about −30° C. B is a hydrophobic hard block having a glass transition temperature Tg of over about +30° C. and C is a polar block which is made up of vinyl monomers and/or heterocyclic compounds which can be polymerized by anionic ring opening.