Making Named Article Patents (Class 430/320)
  • Patent number: 10795255
    Abstract: A method of forming a layout definition of a semiconductor device includes the following steps. Firstly, a plurality of first patterns is established to form a material layer over a substrate, with the first patterns being regularly arranged in a plurality of columns along a first direction to form an array arrangement. Next, a plurality of second patterns is established to surround the first patterns. Then, a third pattern is established to form a blocking layer on the material layer, with the third pattern being overlapped with a portion of the second patterns and with at least one of the second patterns being partially exposed from the third pattern. Finally, the first patterns are used to form a plurality of first openings in a stacked structure on the substrate to expose a portion of the substrate respectively.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: October 6, 2020
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Wei-Lun Hsu, Gang-Yi Lin, Yu-Hsiang Hung, Ying-Chih Lin, Feng-Yi Chang, Ming-Te Wei, Shih-Fang Tzou, Fu-Che Lee, Chia-Liang Liao
  • Patent number: 10784108
    Abstract: A method for forming a functionalised assembly guide intended for the self-assembly of a block copolymer by graphoepitaxy, includes forming on the surface of a substrate a neutralisation layer made of a first material having a first neutral chemical affinity with regard to the block copolymer; forming on the neutralisation layer a first mask including at least one recess; depositing on the neutralisation layer a second material having a second preferential chemical affinity for one of the copolymer blocks, in such a way as to fill the at least one recess of the first mask; and selectively etching the first mask relative to the first and second materials, thereby forming at least one guide pattern made of the second material arranged on the neutralisation layer.
    Type: Grant
    Filed: October 20, 2017
    Date of Patent: September 22, 2020
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Guillaume Claveau, Maxime Argoud, Nicolas Posseme, Raluca Tiron
  • Patent number: 10737479
    Abstract: A method and apparatus for making a three-dimensional object by solidifying a solidifiable material are shown and described. A photohardening inhibitor is admitted into a surface of a photohardenable material to create a “dead zone” where little or no solidification occurs. The dead zone prevents the exposed surface of the photohardenable material from solidifying in contact with a container bottom or film. As the solidified object areas get larger and the build platform speed increases, the dead zone increases which can cause the formation of channels in the resulting objects and delamination. A number of techniques including continuous/discontinuous mode switching, multiple illuminations of portions of the same layer, and the use of gray scaling are disclosed for regulating the size of the dead zone.
    Type: Grant
    Filed: January 12, 2017
    Date of Patent: August 11, 2020
    Assignee: Global Filtration Systems
    Inventors: Ali El-Siblani, Mohamad Janbain
  • Patent number: 10589512
    Abstract: Methods and apparatus for additive manufacturing of three-dimensional objects from polymerizable liquids are described. The methods and apparatus are implemented in the form of a bottom up additive manufacturing apparatus, and in preferred embodiments are implemented in the form of Continuous Liquid Interface Production (or “CLIP”) methods and apparatus. Rotation of at least one of the carrier and the build plate is preferably included, for example to facilitate the filling of the build region with the polymerizable liquid.
    Type: Grant
    Filed: July 7, 2015
    Date of Patent: March 17, 2020
    Assignee: Carbon, Inc.
    Inventors: Joseph M. DeSimone, Edward T. Samulski, Jason P. Rolland
  • Patent number: 10416562
    Abstract: Non-linear metallic thermal resist structure having more than two layers of different metals and effective eutectic temperature that is lower than eutectic temperature of a reference non-linear metallic thermal resist having only two layer of same different metals. Optionally, at least one the layers of such resist structure is doped with material different from host metals and/or deposited under conditions resulting in strain or stress in a layer at hand. Method of multi-exposure-based patterning of a substrate carrying such structure with laser pulses characterized by irradiance at levels equal to or below 10 mJ/cm2. The sequence of steps producing the required pattern on the substrate may be explicitly lacking a step of removal of a portion of the resist structure between two consecutive exposures.
    Type: Grant
    Filed: June 26, 2017
    Date of Patent: September 17, 2019
    Assignee: NIKON RESEARCH CORPORATION OF AMERICA
    Inventor: Shane R. Palmer
  • Patent number: 10363746
    Abstract: A method for producing a liquid ejection head includes a step of providing a positive photosensitive resin layer on a substrate, a step of heat-treating the positive photosensitive resin layer on the substrate, and a step of forming a mold material having a pattern of the flow path by subjecting the heat-treated positive photosensitive resin layer on the substrate to exposure and development. In the method, the positive photosensitive resin layer includes a light absorbing agent that is nonvolatile at a temperature of the heat treatment of the positive photosensitive resin layer, the light absorbing agent has a light absorbance (a1) at a wavelength of 365 nm and an average light absorbance (a2) in a wavelength range of 280 nm or more to 330 nm or less, and an absorbance ratio A is 1.0 or less where the absorbance ratio A is the ratio a2/a1.
    Type: Grant
    Filed: December 5, 2017
    Date of Patent: July 30, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Kazunari Ishizuka
  • Patent number: 10288998
    Abstract: A mask blank with resist film, includes a substrate having a thin film; and a negative resist film formed on a surface of the thin film, wherein in the resist film, a photoacid generator low-concentration region is formed at a part where the resist film is in contact with the thin film; a concentration of the photoacid generator low-concentration region is lower than that of the other region of the resist film; a thickness of the photoacid generator low-concentration region is 5% to 40% of the thickness of the resist film; and a concentration of the photo acid generator at a part in contact with the thin film in the photoacid generator low-concentration region is a value obtained by decreasing the concentration of the photo acid generator in the other region of the resist film by 10% to 40%.
    Type: Grant
    Filed: July 27, 2015
    Date of Patent: May 14, 2019
    Assignee: HOYA CORPORATION
    Inventor: Toru Fukui
  • Patent number: 10071320
    Abstract: A multi-configurable toy vehicle is described. The multi-configurable toy vehicle comprises a cab and a vehicle body. The cab comprises a first set of one or more wheels and the vehicle body comprises a second set of one or more wheels. The vehicle body is slidably coupled to the cab between a collapsed and expanded configuration. The vehicle body comprises a floor and a platform pivotally coupled to the floor between an upright position and an open position. A trailer may be coupled to the multi-configurable toy vehicle.
    Type: Grant
    Filed: October 4, 2013
    Date of Patent: September 11, 2018
    Assignee: Mattel, Inc.
    Inventor: Esther Levine
  • Patent number: 9987023
    Abstract: An orthopedic surgical instrument comprising an orthopedic cutting tool includes a metallic cutting insert configured to remove portions of a patient's bone and a body molded to the cutting insert. The cutting insert includes a plurality of chemically etched holes, and the body is molded to the cutting insert such that each of the plurality of chemically etched holes is at least partially filled by a portion of the body. The cutting insert may include a plurality of cutting teeth configured to remove portions of the patient's bone. A method of manufacturing an orthopedic surgical instrument is also disclosed.
    Type: Grant
    Filed: May 26, 2016
    Date of Patent: June 5, 2018
    Assignee: DEPUY IRELAND UNLIMITED COMPANY
    Inventor: Jon M. Edwards
  • Patent number: 9939726
    Abstract: Photopolymerizable flexographic printing elements which contain cyclohexanepolycarboxylic esters as plasticizers and also their use for producing flexographic printing forms for printing with UV inks, in particular for UV narrow web printing.
    Type: Grant
    Filed: December 31, 2013
    Date of Patent: April 10, 2018
    Assignee: Flint Group Germany GmbH
    Inventors: Uwe Stebani, Stefanie Döttinger
  • Patent number: 9829798
    Abstract: A continuous flow projection lithography system to form microstructures using an optical array incorporated in a continuous coating process is provided. A mask is placed at a distance from the array. Each element of the array projects one image of the mask onto a substrate, effectively forming an array thereon. A coating process allows flows that can be used to define functional regions of particles or supporting layers that prevent adhesion of crosslinked polymers to surfaces.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: November 28, 2017
    Assignee: Palo Alto Research Center Incorporated
    Inventors: Kai Melde, Philipp H. Schmaelzle
  • Patent number: 9789690
    Abstract: A method for manufacturing a liquid ejection head includes the steps of: preparing a substrate including an energy-generating element disposed on a first surface of the substrate and a supply path for liquid; disposing a dry film on the first surface of the substrate in such a manner that the dry film partially enters the supply path; etching the dry film from a side of the dry film facing the first surface of the substrate so that the dry film has an etched surface substantially in parallel with the first surface and covers the supply path; forming a resin layer to be a flow path member on the dry film covering the supply path; and removing the dry film covering the supply path.
    Type: Grant
    Filed: May 25, 2016
    Date of Patent: October 17, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Masahisa Watanabe, Jun Yamamuro, Kazuhiro Asai, Keiji Matsumoto, Koji Sasaki, Kunihito Uohashi, Ryotaro Murakami, Tomohiko Nakano, Keiji Edamatsu, Haruka Nakada, Kenji Fujii, Seiichiro Yaginuma
  • Patent number: 9720330
    Abstract: Methods of micro- and nano-patterning substrates to form transparent conductive electrode structures or polarizers by continuous near-field optical nanolithography methods using a roll-type photomask or phase-shift mask are provided. In such methods, a near-field optical nanolithography technique uses a phase-shift or photo-mask roller that comprises a rigid patterned externally exposed surface that transfers a pattern to an underlying substrate. The roller device may have an internally disposed radiation source that generates radiation that passes through the rigid patterned surface to the substrate during the patterning process. Sub-wavelength resolution is achieved using near-field exposure of photoresist material through the cylindrical rigid phase-mask, allowing dynamic and high throughput continuous patterning.
    Type: Grant
    Filed: April 15, 2013
    Date of Patent: August 1, 2017
    Assignee: THE REGENTS OF THE UNIVERSITY OF MICHIGAN
    Inventor: Lingjie Jay Guo
  • Patent number: 9465296
    Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles.
    Type: Grant
    Filed: July 11, 2012
    Date of Patent: October 11, 2016
    Assignee: Rolith, Inc.
    Inventor: Boris Kobrin
  • Patent number: 9429839
    Abstract: A lithography method including: a preparation, during which a resist layer is deposited on a substrate, and a preliminary lithography carried out to define at least one preliminary pattern in the resist layer, and during the preliminary lithography, a formation of at least one positioning mark forming a relief in the resist layer. The method further includes at least one subsequent lithography applied to the resist layer and including: a preliminary positioning including positioning a lithography mechanism as a function of the at least one positioning mark, and at least one formation of additional patterns in the resist layer using the lithography mechanism positioned as a function of the at least one positioning mark.
    Type: Grant
    Filed: April 12, 2012
    Date of Patent: August 30, 2016
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventor: Sebastien Pauliac
  • Patent number: 9395582
    Abstract: A mask and a method of fabricating spacers (2) using the mask (1). The mask (1) comprises a light transmitting region including an array of light transmitting holes (230), a light non-transmitting region and a phase shifting layer (240) formed in one of two adjacent light transmitting holes (230) of the mask for shifting phrase of lights passing through the light transmitting holes (230). Thus, a light intensity can be reduced or lowered to zero when the lights pass through a diffractive region of the two adjacent light transmitting holes (230). Therefore, a bridging effect between two adjacent spacers (2) is alleviated and even avoided during fabricating the spacers (2).
    Type: Grant
    Filed: May 26, 2014
    Date of Patent: July 19, 2016
    Assignees: BOE Technology Group Co., Ltd., Beijing BOE Optoelectronics Technology Co., Ltd.
    Inventors: Xiaochuan Chen, Hailin Xue, Chuncheng Che, Wenbo Jiang, Yue Li
  • Patent number: 9316491
    Abstract: An instrument for measuring volume solids of a paint sample is described.
    Type: Grant
    Filed: May 25, 2010
    Date of Patent: April 19, 2016
    Assignee: Wolf Industrial Innovation
    Inventor: Udo Wolfgang Bucher
  • Patent number: 9315026
    Abstract: A method for manufacturing a liquid discharge head. The method includes a first step of forming a telecentric measurement pattern A by exposure, the telecentric measurement pattern A being part of a measurement pattern that allows determination of inclination of a principal ray caused by an off-axis telecentric degree occurring in a projection exposing device, and a second step of forming a telecentric measurement pattern B by exposure under an exposure condition defocused from an exposure condition in the first step, the telecentric measurement pattern B being another part of the measurement pattern, which allows the determination of the inclination of the principal ray caused by the off-axis telecentric degree occurring in the projection exposing device. The off-axis telecentric degree is determined from an amount of misalignment between relative forming positions of the telecentric measurement patterns A and B and an amount of defocusing.
    Type: Grant
    Filed: August 12, 2015
    Date of Patent: April 19, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takanobu Manabe, Yoshinori Tagawa, Hiroyuki Murayama, Shuhei Oya
  • Patent number: 9308721
    Abstract: A method of manufacturing a substrate for a liquid ejection head including an ejection port forming member which has formed therein ejection ports, includes the steps of: forming a first layer by using a first layer forming member; forming a second layer on the first layer by using a second layer forming member; and hardening a partial region of each of the first layer and the second layer and removing a region different from the partial region so as to form the ejection ports, resulting in that the first layer and the second layer constitute the ejection port forming member, and a member containing a solvent to dissolve the first layer forming member and a photo-acid-generating agent having an acid strength weaker than an acid strength of the photo-acid-generating agent contained in the first layer forming member is used as the second layer forming member.
    Type: Grant
    Filed: October 28, 2014
    Date of Patent: April 12, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kunihito Uohashi, Kenji Fujii, Kazuhiro Asai, Keiji Matsumoto
  • Patent number: 9289703
    Abstract: Tangential flow filtration device is provided wherein liners are provided between the filtration element and the top and bottom holders or manifolds. The liners incorporate the flow channels and inlet and outlet ports, as well as a sensor mount. The liners are made of an inexpensive material and therefore are disposable after a single use, making it more cost effective to dispose of them than to clean the conventional manifolds. The sensor mount accommodates a removable sensor, and isolates it from the fluid path.
    Type: Grant
    Filed: April 23, 2013
    Date of Patent: March 22, 2016
    Assignee: EMD Millipore Corporation
    Inventors: Martin Morrissey, Dennis Wong
  • Patent number: 9235130
    Abstract: Electrically-conductive articles are prepared to have electrically-conductive silver metal electrode grids and electrically-conductive silver connector wire patterns (BUS lines) on one or both supporting sides of a transparent substrate. The electrically-conductive silver connector wire patterns are designed with one silver main wire that comprises two or more adjacent silver micro-wires in bundled patterns. These bundled patterns and silver micro-wires are designed with specific dimensions and configurations to provide optimal fidelity (or correspondence) to the mask image used to provide such images in a silver halide emulsion layer. The electrically-conductive articles are provided by imagewise exposure, development, and fixing of corresponding silver halide-containing conductive film element precursors containing photosensitive silver halide emulsion layers. The electrically-conductive articles can be used as parts of various electronic devices including touch screen devices.
    Type: Grant
    Filed: May 20, 2014
    Date of Patent: January 12, 2016
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Kenneth James Lushington, James Edward Sutton, Ronald Steven Cok
  • Patent number: 9222959
    Abstract: The invention relates to a nanofiber fabrication method comprising nanofiber growth from a catalyst zone, furthermore comprising the following steps: producing at least one micropattern (11) on the surface of a substrate (1); producing a catalyst zone (50) on the surface of said micropattern; nanofiber growth from the catalyst zone, characterized in that the micropattern (11) comprises a base, at least partially convergent side walls and an upper face, said base being covered with a so-called “poison” layer (4) where no nanofiber growth catalysis effect can take place, the so-called “poison” layer not being present on said upper face; the base being covered with a catalyst layer (5) on the surface of the so-called “poison” layer; the thickness of the “poison” layer and the thickness of the catalyst layer being such that the nanofibers cannot grow either on the side walls or on the base of the micropatterns constructed beforehand.
    Type: Grant
    Filed: December 9, 2008
    Date of Patent: December 29, 2015
    Assignee: Commissariat A L'Engergie Atomique
    Inventors: Louis Gorintin, Jean Dijon, Hélène Le Poche, Denis Mariolle
  • Patent number: 9217086
    Abstract: A method of fabricating an anti-reflective optically transparent structure includes the steps of providing an optically transparent substrate having a first refractive index and a first surface; and forming an anti-reflective layer within the first surface of the transparent substrate. The anti-reflective layer is made by forming a nano-scale pattern within the first surface defining a subwavelength nano-structured second surface of the anti-reflective layer including a plurality of protuberances having a predetermined maximum distance between adjacent protuberances and a predetermined height for a given wavelength such that the anti-reflective layer includes a second refractive index lower than the first refractive index to minimize light diffraction and random scattering therethrough. The predetermined height is approximately equal to a quarter of the given wavelength divided by the second refractive index.
    Type: Grant
    Filed: April 8, 2013
    Date of Patent: December 22, 2015
    Assignee: Wayne State University
    Inventors: Yang Zhao, Jinsong Wang
  • Patent number: 9181618
    Abstract: Provided herein is a method including conformally depositing a first layer over a patterned resist; depositing a second, thicker layer over the first layer; etching the second layer to expose the first layer; and patterning a magnetic layer by ion implantation in accordance with the patterned resist to form a patterned magnet layer.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: November 10, 2015
    Assignee: Seagate Technology LLC
    Inventors: Michael Feldbaum, Koichi Wago, David Kuo
  • Patent number: 9168750
    Abstract: A manufacturing method of a liquid discharging head includes: preparing a substrate having an energy-generating element and a resin layer on a first face side; irradiating a laser beam on the substrate so as to pass through the resin layer to form a hole serving as a liquid supply port in the substrate; removing a portion of the resin layer including a region which the laser beam has passed through, thereby forming a portion from which the resin layer has been removed as a channel, and forming a portion in which the resin layer remains as a side wall; and forming a discharge port forming member on a far side from the substrate of the side wall, and to form the channel forming member using the side wall and the discharge port forming member.
    Type: Grant
    Filed: November 25, 2013
    Date of Patent: October 27, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Koji Sasaki, Shuji Koyama, Keiji Matsumoto, Seiichiro Yaginuma
  • Patent number: 9159925
    Abstract: The present disclosure provides a method for patterning materials that are or are on top of chemically sensitive organic semiconductors. The method employs imprint lithography and a bilayer resist structure that simultaneously protects lower layers from harmful solvents and allows for cleaner liftoff by producing an undercut geometry to the resist pattern.
    Type: Grant
    Filed: November 14, 2012
    Date of Patent: October 13, 2015
    Assignee: Orthogonal, Inc.
    Inventor: John Defranco
  • Patent number: 9108842
    Abstract: A mechanism is provided for reducing stiction in a MEMS device by forming a near-uniform silicon carbide layer on silicon surfaces using carbon from TEOS-based silicon oxide sacrificial films used during fabrication. By using the TEOS as a source of carbon to form an antistiction coating, all silicon surfaces can be coated, including those that are difficult to coat using standard self-assembled monolayer (SAM) processes (e.g., locations beneath the proof mass). Controlled processing parameters, such as temperature, length of time for annealing, and the like, provide for a near-uniform silicon carbide coating not provided by previous processes.
    Type: Grant
    Filed: July 19, 2013
    Date of Patent: August 18, 2015
    Assignee: FREESCALE SEMICONDUCTOR, INC.
    Inventors: Michael D. Turner, Ruben B. Montez
  • Patent number: 9090067
    Abstract: There is provided a method for manufacturing a liquid discharge head including a substrate in which a liquid supply port is formed, a channel forming member that forms a liquid channel communicating with the liquid supply port on the substrate. The method includes preparing a substrate on which a hole serving as the liquid supply port is open, attaching a dry film on the substrate to cover an opening of the hole with the dry film, curing a cover part of the dry film that covers the hole, patterning the dry film to form a mold for the liquid channel, of a region of the dry film that includes the cover part, forming the channel forming member such that it covers the mold, and removing the mold to form the liquid channel.
    Type: Grant
    Filed: November 11, 2014
    Date of Patent: July 28, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaki Ohsumi, Kenji Fujii, Koji Sasaki, Ryotaro Murakami
  • Patent number: 9075082
    Abstract: A gas (or fluid) is introduced around an SPM probe or Nanotool™ to control chemical activity e.g., oxygen to promote oxidation, argon to inhibit oxidation or clean dry air (CDA) to inhibit moisture to control static charging due to the action of the probe or nanotools and to provide vacuum at and around the tip and substrate area. Electrical current can be produced for use with active electronic devices on, in or near the body of the device. In addition by use of a fluid like water, certain oils, and other liquids in conjunction with specific tip structure either electric discharge machining can be used at the tip area on the tip itself (in conjunction with a form structure on the work piece) or on a work piece beneath the tip to shape, polish and remove material at very small scales (10 microns to 1 nm or less).
    Type: Grant
    Filed: May 29, 2013
    Date of Patent: July 7, 2015
    Inventor: Victor B. Kley
  • Patent number: 9040229
    Abstract: A method of tilting liquid crystal molecules is presented. The method entails providing a substrate including a photoalignment layer on top of a layer of liquid crystal molecules. The photoalignment layer is exposed to patterned light that is incident on the substrate at a substantially normal angle. The patterned light is polarized in a polarization direction that is non-parallel to an incident surface of the substrate.
    Type: Grant
    Filed: January 25, 2013
    Date of Patent: May 26, 2015
    Assignee: KENT STATE UNIVERSITY
    Inventor: Hiroshi Yokoyama
  • Patent number: 9034564
    Abstract: Disclosed are methods for making read sensors using developable bottom anti-reflective coating and amorphous carbon (a-C) layers as junction milling masks. The methods described herein provide an excellent chemical mechanical polishing or planarization (CMP) stop, and improve control in reader critical physical parameters, shield to shield spacing (SSS) and free layer track width (FLTW).
    Type: Grant
    Filed: November 12, 2013
    Date of Patent: May 19, 2015
    Assignee: Western Digital (Fremont), LLC
    Inventors: Wei Gao, Miao Wang, Hai Sun, Ming Mao, Tong Zhao
  • Patent number: 9034565
    Abstract: A substrate for an organic light-emitting device which can improve the light extraction efficiency of an organic light-emitting device while realizing an intended level of transmittance, a method of fabricating the same, and an organic light-emitting device having the same. Light emitted from the OLED is emitted outward through the substrate. The substrate includes a substrate body and a number of crystallized particles disposed inside the substrate body, the number of crystallized particles forming a pattern inside the substrate body.
    Type: Grant
    Filed: May 2, 2014
    Date of Patent: May 19, 2015
    Assignee: Samsung Corning Precision Materials Co., Ltd.
    Inventors: Kiyeon Lee, Jhee-Mann Kim, Youngseok Lee, Kyungmin Yoon, Jaeho Lee
  • Patent number: 9034736
    Abstract: The present invention provides a method of patterning an electronic or photonic material on a substrate comprising: forming a film of said electronic or photonic material on said substrate; and using a fluoropolymer to protect regions of said electronic or photonic material during a patterning process.
    Type: Grant
    Filed: July 9, 2010
    Date of Patent: May 19, 2015
    Assignee: Cambridge Enterprise Limited
    Inventors: Henning Sirringhaus, Jui-Fen Chang, Michael Gwinner
  • Patent number: 9034563
    Abstract: An enhanced self-writing method for generating in-plane (horizontally-oriented) polymer lightguides that includes disposing one or more light deflecting structures in or on the upper surface of a uncured layer that deflect incident collimated light beams in a transverse direction (i.e., parallel to the uncured layer top layer surface), whereby the deflected collimated light beam polymerizes a corresponding elongated portion of the uncured material in a self-propagating manner to form in-plane polymer lightguides. When used in the fabrication of micro-truss structures, the in-plane polymer lightguides are linked to diagonal polymer lightguides to form superior truss configurations, such as that of the ideal octet-truss structure. Non-polymerized portions of the uncured layer are removed to expose the micro-truss structure for further processing.
    Type: Grant
    Filed: October 17, 2013
    Date of Patent: May 19, 2015
    Assignee: Palo Alto Research Center Incorporated
    Inventors: Philipp H. Schmaelzle, Eugene M. Chow, Kai Melde
  • Patent number: 9023593
    Abstract: Provided is a method of manufacturing a liquid ejection head, including: forming, on a substrate, a flow path mold pattern that becomes a mold of a liquid flow path; forming a negative photosensitive resin layer on the flow path mold pattern; subjecting the negative photosensitive resin layer to exposure processing with use of a reduction projection exposing apparatus and a mask pattern having an ejection orifice mask shape for forming ejection orifices; and subjecting the negative photosensitive resin layer obtained after the exposure processing to development processing to form the ejection orifices, in which the ejection orifices are formed by correcting, by the ejection orifice mask shape, an inclination of an ejection angle due to an off-axis telecentricity caused by the reduction projection exposing apparatus so as to be close to a direction perpendicular to a surface of the substrate.
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: May 5, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Makoto Watanabe, Yoshinori Tagawa, Hiroyuki Murayama, Toshiaki Kurosu, Masataka Nagai, Takanobu Manabe
  • Publication number: 20150111158
    Abstract: An enhanced self-writing method for generating in-plane (horizontally-oriented) polymer lightguides that includes disposing one or more light deflecting structures in or on the upper surface of a uncured layer that deflect incident collimated light beams in a transverse direction (i.e., parallel to the uncured layer top layer surface), whereby the deflected collimated light beam polymerizes a corresponding elongated portion of the uncured material in a self-propagating manner to form in-plane polymer lightguides. When used in the fabrication of micro-truss structures, the in-plane polymer lightguides are linked to diagonal polymer lightguides to form superior truss configurations, such as that of the ideal octet-truss structure. Non-polymerized portions of the uncured layer are removed to expose the micro-truss structure for further processing.
    Type: Application
    Filed: October 17, 2013
    Publication date: April 23, 2015
    Applicant: Palo Alto Research Center Incorporated
    Inventors: Philipp H. Schmaelzle, Eugene M. Chow, Kai Melde
  • Patent number: 9012130
    Abstract: The present disclosure relates to a method of fabricating a capacitive touch pane where a plurality of groups of first conductive patterns are formed along a first direction, a plurality of groups of second conductive patterns are formed along a second direction, and a plurality of connection components are formed on a substrate. Each first conductive pattern is electrically connected to another adjacent first conductive pattern in the same group by each connection component and each group of the second conductive patterns is interlaced with and insulated from each group of the first conductive patterns. Next, a plurality of curved insulation mounds are formed to cover the first connection components. Then, a plurality of bridge components are formed to electrically connect each second conductive pattern with another adjacent second conductive pattern in the same group.
    Type: Grant
    Filed: June 20, 2014
    Date of Patent: April 21, 2015
    Assignees: Innocom Technology (Shenzhen) Co., Ltd, Innolux Corporation
    Inventors: Chao-Sung Li, Lien-Hsin Lee, Kai Meng
  • Patent number: 9005871
    Abstract: Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).
    Type: Grant
    Filed: October 8, 2009
    Date of Patent: April 14, 2015
    Assignee: BASF SE
    Inventors: Hitoshi Yamato, Toshikage Asakura, Yuichi Nishimae
  • Patent number: 8999629
    Abstract: Embodiments according to the present invention relate generally to PAG bilayer and PAG-doped unilayer structures using sacrificial polymer layers that incorporate a photoacid generator having a concentration gradient therein. Said PAG concentration being higher in a upper portion of such structures than in a lower portion thereof. Embodiments according to the present invention also relate to a method of using such bilayers and unilayers to form microelectronic structures having a three-dimensional space, and methods of decomposition of the sacrificial polymer within the aforementioned layers.
    Type: Grant
    Filed: April 11, 2014
    Date of Patent: April 7, 2015
    Assignee: Georgia Tech Research Corporation
    Inventors: Paul Kohl, Yu-Chun Chen
  • Patent number: 8993209
    Abstract: The present invention relates to a positive type photosensitive resin composition and an organic light emitting device black bank comprising the same, and more particularly, an organic light emitting device black bank comprising the photosensitive resin composition according to the exemplary embodiment of the present invention may further have a function of a black matrix without an additional process, such that it is possible to simplify a manufacturing process of the organic light emitting device and largely improve visibility.
    Type: Grant
    Filed: July 12, 2011
    Date of Patent: March 31, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Sang-Woo Kim, Se-Jin Shin, Kyung-Jun Kim
  • Publication number: 20150080802
    Abstract: The present disclosure relates generally to microneedle devices and methods for fabricating microneedles from a biocompatible polymer using photolithography. More particularly, aspects of the present disclosure are directed to the fabrication of microneedle devices using a biocompatible polymer (biopolymer) by way of biocompatible, essentially biocompatible, or substantially biocompatible fabrication techniques.
    Type: Application
    Filed: March 15, 2013
    Publication date: March 19, 2015
    Applicant: NATIONAL UNIVERSITY OF SINGAPORE
    Inventors: Lifeng Kang, Sui Yung Chan, Jaspreet Singh Kochhar, Wei Jiang Goh
  • Patent number: 8980540
    Abstract: A solid-state image sensor is manufactured through a plurality of photolithography processes. The plurality of photolithography processes includes at least one first lithography process including a dividing exposure step of exposing a substrate using a plurality of photomasks, and at least one second lithography process including a non-dividing exposure step of exposing the substrate using one photomask. The at least one first lithography process includes a process for forming a resist pattern to define active regions on the substrate, and a process for forming a resist pattern to define charge accumulation region.
    Type: Grant
    Filed: February 21, 2013
    Date of Patent: March 17, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hideomi Kumano
  • Patent number: 8975003
    Abstract: The invention provides a photosensitive negative resin composition containing (a) an epoxy-group-containing compound, (b) a first onium salt containing a cation portion structure represented by (b1) and an anion portion structure represented by (b2), and (c) a second onium salt containing a cation portion structure represented by (c1) and an anion portion structure represented by (c2).
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: March 10, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hyou Takahashi, Masako Shimomura, Ken Ikegame
  • Publication number: 20150064624
    Abstract: Oxime ester compounds of the formula I, II, III, IV or V, wherein Z is for example (formula A); Z1 for is NO2, unsubstituted or substituted C7-C20aroyl or unsubstituted or substituted C4-C20heteroaroyl; provided that at least one Z1 is other than NO2; Z2 is for example unsubstituted or substituted C7-C20aroyl; R1, R2, R3, R4, R5 and R6 for example are hydrogen, halogen, or unsubstituted or substituted C1-C20alkyl, unsubstituted or substituted C6-C20aryl, or unsubstituted or substituted C4-C20heteroaryl; R9, R10, R11, R12 and R13 for example are hydrogen, halogen, OR16, unsubstituted or substituted C1-C20alkyl; provided that R9 and R13 are neither hydrogen nor fluorine; R14 is for example unsubstituted or substituted C6-C20aryl or C3-C20heteroaryl Q is for example C6-C20arylene or C3-C20heteroarylene; Q1 is —C1-C20alkylene-CO—; Q2 is naphthoylene; Q3 is for example phenylene; L is for example O-alkylene-O—; R15 is for example hydrogen or C1-C20alkyl; R20 is for example hydrogen, or unsubstituted or substituted
    Type: Application
    Filed: May 6, 2013
    Publication date: March 5, 2015
    Applicant: BASF SE
    Inventors: Yuichi Nishimae, Hisatoshi Kura, Kazuhiko Kunimoto, Ryuhei Yamagami, Keita Tanaka
  • Patent number: 8968987
    Abstract: A method, system and computer program product for implementing an enhanced optical mirror coupling and alignment mechanism utilizing two-photon resist. An initial placement is provided for one or more vias on a printed circuit board. A via is filled with a resist. A series of tightly focused light beams suitably exposes the resist at varying depths in the via, the varying depths defining a sloped polymer in the via after removing resist that had not been at the focus of the light beam. The sloped polymer is coated with reflective material to reflect light into or out of the via.
    Type: Grant
    Filed: January 11, 2012
    Date of Patent: March 3, 2015
    Assignee: International Business Machines Corporation
    Inventors: Emmanuel Atta, Darcy Berger, John R. Dangler, Matthew S. Doyle, Jesse Hefner, Thomas W. Liang
  • Patent number: 8968585
    Abstract: Methods to fabricate reaction cartridges for biological sample preparation and analysis are disclosed. A cartridge may have a reaction chamber and openings to allow fluids to enter the chamber. The cartridge may also have handles to facilitate its use. Such cartridges may be used for polymerase chain reaction.
    Type: Grant
    Filed: November 1, 2013
    Date of Patent: March 3, 2015
    Assignee: California Institute of Technology
    Inventors: Imran R. Malik, Axel Scherer, Erika F. Garcia, Xiomara L. Madero
  • Publication number: 20150056097
    Abstract: An imager may include an array of pixels formed on a substrate. A chemisorption layer such as a planar chemisorption layer may be deposited over the array of pixels. The chemisorption layer may include active sites that bond with anchoring molecules. The anchoring molecules may be bonded to the planar chemisorption layer in only localized regions each covering a respective pixel of the array of pixels. The image sensor may include a photoresist layer that covers the chemisorption layer. Openings in the photoresist layer may define the boundaries of the localized regions. The anchoring molecules may be bonded only with the chemisorption layer without bonding to the photoresist layer. The anchoring molecules may serve to bond with analyte molecules. By forming the anchoring molecules within only localized regions centered over respective pixels, spatial resolution of the imager when imaging the analyte molecules may be improved.
    Type: Application
    Filed: May 29, 2014
    Publication date: February 26, 2015
    Applicant: Aptina Imaging Corporation
    Inventor: Brian Vaartstra
  • Publication number: 20150044110
    Abstract: A microfluidic device includes a support body having a first surface and a second surface opposite to one another. The first surface is hydrophilic. A surface modification layer extends over the first surface of the support body. At least one opening is formed to extend through the surface modification layer and expose a portion of the first surface. The surface modification layer is hydrophobic. In particular, the surface modification layer is made of a photodefinible material chosen from among: an epoxy resin, a polyamide, and a photocurable siloxane-based polymer. The openings are functionalized using probe molecules designed to bind with specific target molecules to be detected.
    Type: Application
    Filed: August 5, 2014
    Publication date: February 12, 2015
    Applicant: STMicroelectronics S.r.l.
    Inventors: Lorenzo Colombo, Marco Salina, Daria Doria
  • Publication number: 20150040826
    Abstract: A method for manufacturing a metal mask includes defining pattern areas exposing an upper surface, and a lower surface opposite to the upper surface, of a thin plate; and etching the upper and lower surfaces of the thin film plate exposed by the pattern areas, to reduce a thickness of the thin film plate by a predetermined thickness and form deposition openings in the metal mask. The etching the upper and lower surfaces of the thin film plate includes both a wet-etching method and a dry-etching method.
    Type: Application
    Filed: April 9, 2014
    Publication date: February 12, 2015
    Applicant: Samsung Display Co., Ltd.
    Inventors: Sung-Woo JUNG, Sang-Yun LEE, Yong-Hwan KIM
  • Publication number: 20150036117
    Abstract: A method for creating a nanoimprint lithography template includes exposing (600) a mass transport layer of material adjacent to a support substrate to electromagnetic radiation in a predetermined pattern to form a nanoimprint lithography template in the mass transport layer.
    Type: Application
    Filed: July 13, 2012
    Publication date: February 5, 2015
    Applicant: University of Utah
    Inventors: Rajesh Menon, Nicole Brimhall