Abstract: A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.

Abstract: Techniques for reducing the number of shots required by a radiation beam writing tool to write a pattern, such as fractured layout design, onto a substrate. One or more apertures are employed by a radiation beam writing tool to write a desired pattern onto a substrate using L-shaped images, T-shaped images, or some combination of both. By reducing the number of shots required to write a pattern onto a substrate, various implementations of the invention may reduce the write time and/or write complexity of the write process.

Abstract: Devices, such as chips for DNA analysis, have at least one fluid transport nanochannel with at least one intersecting (e.g., transverse) sensing nanochannel that can be monitored for change in ionic current to determine characteristics or parameters of interest, e.g., molecular identification, length determination, localized (probe) mapping and the like.

Abstract: A method of forming an alignment film is provided. A photosensitive polymer material is provided, wherein the photosensitive polymer material defines a first pixel area and a second pixel area respectively defining a first sub-pixel area and the second sub-pixel area. In a first exposure, the photosensitive polymer material is irradiate by a first exposure light and a second exposure light to form a first alignment portion and a second alignment portion with different alignment directions in the first sub-pixel of the first pixel area and the second sub-pixel of the second pixel area respectively. In a second exposure, the photosensitive polymer material is irradiated with the first exposure light and the second exposure light to form a third alignment portion and a fourth alignment portion with different alignment directions in the first sub-pixel of the second pixel area and the second sub-pixel of the first pixel area respectively.

Abstract: A display device includes a display panel and a phase retarder film disposed on the display panel. The display panel has a first pixel region, a second pixel region and a third pixel region disposed between the first pixel region and the second pixel region. The phase retarder film has a first phase region, a second phase region and a third phase region disposed between the first phase region and the second phase region. The first phase region is disposed corresponding to the first pixel region, the second phase region is disposed corresponding to the second pixel region, and the third phase region is disposed corresponding to the third pixel region. A phase retardation of the third phase region is different from phase retardations of the first phase region and the second phase region. A method for manufacturing the phase retarder film is also provided.

Abstract: A method for forming a conductive pattern on a substrate (208) includes providing an image pattern for imaging on the substrate; imaging the image pattern on the substrate creating imaged areas; spraying functional material (232) on the substrate that diffuse molecules of the functional material into the imaged areas; and applying electro-less copper coating that build conductive material traces on the imaged areas on the substrate.

Abstract: The present disclosure relates to a method of fabricating a capacitive touch pane where a plurality of groups of first conductive patterns are formed along a first direction, a plurality of groups of second conductive patterns are formed along a second direction, and a plurality of connection components are formed on a substrate. Each first conductive pattern is electrically connected to another adjacent first conductive pattern in the same group by each connection component and each group of the second conductive patterns is interlaced with and insulated from each group of the first conductive patterns. Next, a plurality of curved insulation mounds are formed to cover the first connection components. Then, a plurality of bridge components are formed to electrically connect each second conductive pattern with another adjacent second conductive pattern in the same group.

Abstract: A liquid ejection head is manufactured by forming a dent representing a substantially spherical profile so as to include a position for forming an ejection port on a surface of a photosensitive resin layer, then forming a latent image of the ejection port in the dent by an exposure treatment using a projection lens system, and developing the latent image. The center of the top surface of the latent image is shifted to the incoming side of the beam of exposure light from the lowest point of the dent.

Abstract: A process for producing a liquid ejection head by providing, in one chip, a liquid ejection head having a portion for ejection in which an ejection orifice array is arranged and a side portion having no ejection orifice array, these portions being provided with a member of a photosensitive material, arranging the chip on a common substrate in such a chip array that these two portions are alternately arranged, and separating each chip from the substrate, the process including the steps of relatively moving a reticle of an aligner along the chip array for a photosensitive material on the substrate to expose each chip, and developing the material to obtain the member. A first reticle for forming the portion for ejection and a second reticle for forming only the side portion are used. The exposure includes a first and a second exposure treatment respectively by the first and second reticles.

Abstract: Provided is a method of producing an ink ejection head including a substrate, an ink ejection energy-generating element, a flow path-forming member, and an ejection orifice-forming member having an ink ejection orifice, the ink ejection orifice having, on a side open to an outside, a portion whose sectional area is constant and a portion whose sectional area increases from the portion to an ink ejection energy-generating element side, the method including: forming, on the substrate, a first negative photosensitive resist; forming, on the first negative photosensitive resist, a second negative photosensitive resist; partially mixing the first negative photosensitive resist and the second negative photosensitive resist to form a compatible layer; and subjecting the second negative photosensitive resist and the compatible layer to collective exposure and development to form the ink ejection orifice.

Abstract: A process for producing a liquid ejection head including, on a substrate, a flow path forming member forming ejection orifices and a liquid flow path communicating therewith, including forming, on the substrate, a first layer of photosensitive resin; forming, on the first layer, a mask layer in which at least part of a side surface thereof has a light transmission distribution with a material capable of reducing transmission of light having a photosensitive wavelength of the resin; performing, for the first layer, exposure with the mask layer and development to form a flow path mold pattern having a taper angle ? satisfying 95°<?, where ? is the angle between top and side surfaces in cross section of the pattern perpendicular to substrate surface; forming a coating resin layer to cover the pattern; patterning the resin layer to form the member; and removing the pattern to form the flow path.

Abstract: The present invention relates to a method for manufacturing a stamper for injection molding, and more particularly, to a method for manufacturing a stamper for injection molding which can prevent a scratch from forming thereon and has an excellent durability owing to high hardness even after manufacturing of the metal stamper with micro patterns formed thereon is finished. The method for manufacturing a stamper for injection molding includes a pattern forming step for forming a predetermined micro pattern on a substrate, a metal plating step for making metal plating on the substrate to form a stamper having the micro pattern transcribed thereto, a stamper separating step for separating the stamper of the metal plating from the substrate, and a protective layer coating step for coating a protective layer on the stamper for maintaining a mirror surface.

Abstract: The present invention provides a polymer compound represented by the following Formula (1) and a method for production thereof, a pigment dispersant, a pigment dispersion composition, and a photocurable composition respectively using the polymer compound, and a color filter and a method for production thereof [R1: an organic linking group having a valency of (m+n); R2: a single bond or a divalent organic linking group; A1: a monovalent organic group containing at least one moiety selected from an organic dye structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group; m=1 to 8, n=2 to 9 (m+n=3 to 10); and P1: polymer skeleton].

Abstract: A method is described for the direct photochemical modification and micro-patterning of polymer surfaces, without the need to use a photoresist. For example, micropatterns of various functional chemical groups, biomolecules, and metal films have been deposited on poly(carbonate) and poly(methyl methacrylate) surfaces. These patterns may be used, for example, in integrated electronics, capture elements, or sensing elements in micro-fluidic channels.

Abstract: A process for producing an ejection orifice forming member including the steps of forming a laminate including a first negative photosensitive resin layer that contains a first photoacid generator, and a second negative photosensitive resin layer that is formed on the first negative photosensitive resin layer and contains a second photoacid generator; forming a first latent image and a second latent image on the first negative photosensitive resin layer and the second negative photosensitive resin layer, respectively, by collectively subjecting the first negative photosensitive resin layer and the second negative photosensitive resin layer to exposure; performing a heat treatment after the exposure; and forming the ejection orifice by a development treatment. The first photoacid generator in the first latent image has an acid diffusion length greater than the acid diffusion length of the second photoacid generator in the second latent image.

Abstract: A process for forming a hydrophilic coating and a hydrophilic coating, the process including the steps of: (1) forming, on a substrate, a first coating resin layer including a first cationic polymerization resin and a first photoacid generator; (2) laminating, on the first coating resin layer, a second coating resin layer including a second cationic polymerization resin which includes an acid-cleavable linkage in its main chain, and a second photoacid generator which generates methide acid by irradiation with an active energy ray including ultraviolet light; (3) forming a coating by curing the first coating resin layer and the second coating resin layer through exposure of the first coating resin layer and the second coating resin layer to the active energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the coating through heat treatment of the coating.

Abstract: The present invention relates to a method for fabricating an LCD. The method includes fabricating a MAV layer on a glass substrate. The step of fabricating the MAV layer on the glass substrate comprises the steps of: (A) coating MAV organic monomers on the glass substrate; (B) patterning the MAV organic monomers through a photomask; and (C) curing the patterned MAV organic monomers. In accordance with a photo-curing material of the MAV layer, the fabricating method of the present invention has simple processes with low technical requirements.

Abstract: A method for producing an optical orientation film is disclosed, the method being able to realize highly accurate exposure in a pattern, even if a simple device and non-parallel light are used and a long continuous resin substrate is used and fed continuously. The method for producing the optical orientation film includes the steps of: (i) preparing an irradiation target substrate and a long continuous photomask (ii) feeding the irradiation target substrate continuously; (iii) feeding the photomask continuously; (iv) producing a laminate by laminating the photomask fed in step (iii) on an orientation layer of the irradiation target substrate fed in step (ii); (v) exposing the orientation layer in the pattern by irradiating with light, while feeding the laminate obtained in step (iv) in the longitudinal direction of the laminate; and (vi) removing the photomask from the laminate irradiated in step (v).

Abstract: Provided is a method of manufacturing a liquid ejection head, including: forming a covering resin layer including a photocationic polymerization initiator and a cationically polymerizable resin on a substrate having provided thereon an energy generating element for generating energy for ejecting liquid and a solid layer which is formed of a positive resist and serves as a pattern for a liquid flow path which communicates with a liquid ejection orifice for ejecting the liquid; exposing the covering resin layer to development to form the liquid ejection orifice; and removing the solid layer to form the liquid flow path, in which the covering resin layer includes, as a cationic polymerization inhibitor, an amine compound having a perfluoroalkyl group. Also provided is a liquid ejection head obtained by the method.

Abstract: A method of casting a product includes the steps of: creating a finished photopolymer mould; introducing liquid into the mould; hardening the liquid; and removing the photopolymer mould. A casting mould and a method of making a casting mould, are also disclosed.

Abstract: A negative-working lithographic printing plate precursor is used for making lithographic printing plates from infrared radiation imaging. The precursor comprises free radical chemistry and a specific infrared radiation absorber that is a cyanine dye and defined by Formula (1a) described in the disclosure. This particular infrared radiation absorber provides both IR sensitivity and print out after imaging.

Abstract: Provided is a method of producing an ink ejection head including a substrate, an ink ejection energy-generating element, a flow path-forming member, and an ejection orifice-forming member having an ink ejection orifice, the ink ejection orifice having, on a side open to an outside, a portion whose sectional area is constant and a portion whose sectional area increases from the portion to an ink ejection energy-generating element side, the method including: forming, on the substrate, a first negative photosensitive resist; forming, on the first negative photosensitive resist, a second negative photosensitive resist; partially mixing the first negative photosensitive resist and the second negative photosensitive resist to form a compatible layer; and subjecting the second negative photosensitive resist and the compatible layer to collective exposure and development to form the ink ejection orifice.

Abstract: Embodiments according to the present invention relate generally to PAG bilayer and PAG-doped unilayer structures using sacrificial polymer layers that incorporate a photoacid generator having a concentration gradient therein. Said PAG concentration being higher in a upper portion of such structures than in a lower portion thereof. Embodiments according to the present invention also relate to a method of using such bilayers and unilayers to form microelectronic structures having a three-dimensional space, and methods of decomposition of the sacrificial polymer within the aforementioned layers.

Abstract: Methods of producing a nanostructure in a target film are provided. The method includes selectively irradiating at least one focusing element of a near-field focusing array that is in near-field focusing relationship with a target film in a manner sufficient to produce a nanostructure from the target film. Also provided are systems for practicing methods of the invention, as well as objects produced thereby.

Abstract: There is provided a method for manufacturing a liquid ejection head having a substrate and a channel-forming member having an ejection port from which a liquid is ejected, the method including forming a negative photosensitive resin layer on or above the substrate; forming a lens layer on the negative photosensitive resin layer, the lens layer having a lens; exposing the negative photosensitive resin layer through the lens to form an ejection port in the negative photosensitive resin layer; and removing the lens layer.

Abstract: A first exposure treatment for irradiating a first photosensitive layer formed on one main surface of a transparent support with a first light thereby to expose the first photosensitive layer and a second exposure treatment for irradiating a second photosensitive layer formed on the other main surface of the transparent support with a second light to expose the second photosensitive layer are performed such that the first light incident on the first photosensitive layer does not substantially reach the second photosensitive layer and the second light incident on the second photosensitive layer does not substantially reach the first photosensitive layer.

Abstract: The present invention concerns a process for realization of polymeric materials with second order nonlinear electro-optical properties comprising the following steps: mixing of a chromophore with nonlinear optical properties with two or three hydroxy groups; isolation of said pure bi- or tri-isocyanate NLO chromophores obtained according to the above step; dissolution of said bi- or tri-isocyanate NLO chromophores obtained according to the above step in one or more isocyanate group not reactive solvents containing reactive substances; coating of a thin layer of said prepolymer mixture on a substrate and evaporation of said not reactive solvents; cross-linking and poling of said thin layer on substrate, by means of heating and application of an electric field; cooling of said thin cross-linked and poled layer at ambient temperature maintaining the applied poling electric field; switching off the poling electric field.

Abstract: A method of manufacturing a touch screen panel includes a first process, a second process, and a third process. Each of a plurality of first electrode serials includes a plurality of first electrode patterns which are separated from each other, neighboring first electrode patterns are electrically connected to each other via a first connection pattern, and a first insulation pattern electrically insulates the first electrode serial from the second electrode serial at an intersection of the first electrode serial and the second electrode serial.

Abstract: An electronic device housing may have upper and lower portions that are attached with a hinge. At least one portion of the housing may have a rear planar surface and peripheral sidewalls having edges. A display module may be mounted in the housing. The display module may have glass layers such as a color filter glass layer and a thin-film transistor substrate. The color filter glass layer may serve as the outermost glass layer in the display module. The edges of the display module may be aligned with the edges of the peripheral housing sidewalls to create the appearance of a borderless display for the electronic device. The display module may be provided with an opening that allows a camera or other electronic components to receive light. Traces may be provided on the underside of the thin-film transistor substrate to serve as signal paths for the electrical components.

Abstract: The manufacturing method includes forming, on a surface of a negative photosensitive resin layer formed on a substrate, a hollow having inclinations at both sides in a cross section taken along a plane perpendicular to a row direction of the ejection orifice, and then forming a latent image in the hollow, thereby forming the ejection orifice so that an angle between a side surface portion thereof and a normal to the outer opening in a cross section of the ejection orifice taken along a plane which passes through a center of the ejection orifice and is perpendicular to the row direction is larger than an angle between the side surface portion and the normal to the outer opening in a cross section of the ejection orifice taken along a plane which includes a center line of the ejection orifice in the row direction and is perpendicular to a substrate surface.

Abstract: A method for fabricating a side shield for a magnetic transducer is described. The magnetic transducer has a nonmagnetic layer and a pole on the nonmagnetic layer. The pole has sidewalls and an air-bearing surface location (ABS location) corresponding to an air-bearing surface (ABS). A developable bottom antireflective coating (D-BARC) layer covering the pole and at least a portion of the nonmagnetic layer is provided. The D-BARC layer is photosensitive. A photosensitive mask layer is provided on the D-BARC layer. A first portion of the mask layer and a first portion of the D-BARC layer are removed to form a bi-layer mask. The bi-layer mask has an aperture in the mask layer and the D-BARC layer. At least one side shield layer is deposited. At least a portion of the at least one side shield layer resides in the aperture. The bi-layer mask is also removed.

Abstract: Exemplary embodiments provide methods for patterning large areas, beyond those accessible with the limited single-area exposure techniques, with nanometer scale features. The methods can include forming a grating pattern to make a first interferometric exposure of a first portion of a photosensitive material disposed over a substrate by interfering two or more laser beams, wherein the two or more laser beams comprise an apodized intensity profile having a continuous intensity variation. The method can further include aligning and overlapping the grating pattern to expose a second portion of the photosensitive material such that the first portion and the second portion form a continuous grating pattern.

Abstract: A method according to one embodiment includes applying a photoresist to a substrate; exposing the photoresist such that a local intensity of radiation applied to the photoresist at each pixel thereof is a function of a mathematically-generated representation of a target surface shape; developing the resist; and performing a subtractive process on the developed photoresist and the substrate for creating the target surface shape on the substrate. A method according to another embodiment includes applying a photoresist to a substrate; patterning the photoresist using a machine-readable profile; and performing a subtractive process to transfer the profile onto the substrate.

Abstract: In one embodiment, a method for removing a resist includes irradiating, with an UV light having a wavelength of less than about 240 nm, a structure having a resist on a pattern surface in an atmosphere having oxygen. The resist is used as a mask as it remains above the pattern after the pattern has been transferred to a magnetic recording medium surface having a magnetic film thereon, and the irradiating is performed during production of the magnetic recording medium. In another embodiment, a method for forming a magnetic recording medium includes applying a resist to a surface of a magnetic film above a substrate, curing the resist by irradiating the resist with first UV light to form a pattern, transferring the pattern to the magnetic film using the pattern, and removing the resist by irradiating using second UV light having a shorter wavelength in an atmosphere including oxygen.

Abstract: A device includes an array of devices formed on a first substrate. A second substrate is spaced away from the first substrate such that the array of devices are positioned between the first and second substrates. A plurality of spacers are coupled to the first substrate to maintain at least a minimum gap between the first substrate and the second substrate. The plurality of spacers include a first set of spacers and a second set of spacers. The spacers in the first set of spacers are shorter than the spacers in the second set of spacers. In some implementations, the device is a display device and the MEMS devices are modulators.

Abstract: Patterned substrates templates are provided, as well as methods comprising a combination of lithography and self-assembly techniques. The patterned substrates may comprise first and second patterns.

Abstract: A process for forming a hydrophilic coating, including (1) forming, on a substrate, coating resin layer including a cationic polymerization resin having an acid-cleavable linkage in its main chain, and a photoacid generator which generates antimonic acid or an acid having a weaker acid strength than that of antimonic acid by irradiation with active energy ray including ultraviolet light; (2) laminating, on the resin layer, a photoacid generator holding layer including a photoacid generator which generates an acid having a stronger acid strength than that of antimonic acid by irradiation with the energy ray, and a holder which holds the photoacid generator and can be removed in step (3); (3) removing the holding layer and curing the resin layer through exposure of those layers to the energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the resin layer through heat treatment thereof.

Abstract: A fluid-filled prosthetic implant having a shell comprising a matrix material and an additive distributed in the matrix material.

Abstract: A printhead assembly includes a plurality of inkjet ejector arrays having corresponding ink receptacles. Each inkjet array is formed from a plurality of inkjet stack layers that are bonded to a single aperture layer that flexes to position the inkjet arrays at a predetermined distance from a curved image receiving surface.

Abstract: A testing device uses a selectively deformable substrate to capture and retain spherical beads for genetic experimentation. A method of fabricating the device is described in which a silicon substrate can be coated with a photosensitive, bio-compatible polymer for photolithographic patterning using a single mask exposure. The polymer is patterned with a matrix of wells, each well capable of expansion to accept placement of a bead in the well, and contraction to secure the bead in the well. The polymer can exhibit piezoelectric properties that cause it to respond mechanically to a selected electrical excitation.

Abstract: Methods to fabricate reaction cartridges for biological sample preparation and analysis are disclosed. A cartridge may have a reaction chamber and openings to allow fluids to enter the chamber. The cartridge may also have handles to facilitate its use. Such cartridges may be used for polymerase chain reaction.

Abstract: A method for making a microfluidic device, the method includes providing at least one inorganic layer on a substrate; applying an alkoxysilane material containing a primary or secondary amine on the at least one inorganic layer; baking the applied alkoxysilane material at a temperature greater than 130 degrees C.; applying an epoxy material to form an epoxy layer, wherein the applied alkoxysilane material is disposed at an interface between the epoxy layer and the at least one inorganic layer; and patterning the epoxy layer to provide a wall for defining a location for a fluid in the microfluidic device.

Abstract: A substrate 20 is prepared. “A piezoelectric material layer 32a which has not been fired” and which will become a piezoelectric membrane is formed above a first principal surface 20a of the substrate 20. A first mask 131 is formed above the piezoelectric material layer 32a. “The piezoelectric material layer 32a existing within a portion where the first mask 131 does not exist” is eliminated by injecting a blast media including at least one of abrasive grains or an organic solvent onto the first principal surface 20a of the substrate 20. Thereafter, the first mask 131 is eliminated, and the piezoelectric material layer 32a is fired. The substrate has a hollow portion, however, it does not necessarily have the hollow portion.

Abstract: An organic passivation film having a high transmittance and capable of setting a taper angle of a through hole within a predetermined range in a liquid crystal display device. A pixel electrode and a source electrode of a TFT are connected by way of a through hole formed in an organic passivation film. The organic passivation film having high productivity, high transmittance, and a predetermined taper angle ? of a through hole can be formed by using a chemical amplification photosensitive resin composition comprising, as a base material, an acrylic resin having a molecular weight of 4,000 to 20,000 and containing 1 to 6 wt % of a photoacid generator as the material for the organic passivation film, performing exposure and development for forming a through hole, and then performing post exposure, prebaking, and baking under appropriate conditions.

Abstract: The cavity has first and second main walls covered by a photoresist. The photoresist is subjected to electronic or electromagnetic radiation of wavelength comprised between 12.5 nm and 15 nm. A first thickness of the photoresist is exposed to form a first area of sacrificial material and a second area of different nature defining the surface coating. The sacrificial material is removed, the surface coating is formed and has a surface against one of the main walls and a free opposite surface. The lateral dimensions of the surface coating are defined in the cavity by the radiation through the first main wall.

Abstract: Micron-size and sub-micron-size patterns on a substrate can direct the self-assembly of surface-bonded mixed polymer brushes to create nanoscale patterns in the phase-separated mixed polymer brush. The larger scale features, or patterns, can be defined by a variety of lithographic techniques, as well as other physical and chemical processes including but not limited to etching, grinding, and polishing. The polymer brushes preferably comprise vinyl polymers, such as polystyrene and poly(methyl methacrylate).

Abstract: Provided is a process for producing a liquid ejection head including an ejection orifice member having a plurality of ejection orifices for ejecting liquid provided along an arrangement direction, the process including preparing a substrate provided with a resin layer which contains a photocurable resin; carrying out a first exposure treatment and a second exposure treatment which are each of an exposure treatment of subjecting the resin layer to exposure; and forming the ejection orifices of the resin layer subjected to the first exposure treatment and the second exposure treatment. An inclination angle of a side wall of the ejection orifices formed by the first exposure treatment with respect to the substrate differs from an inclination angle of a side wall of the ejection orifices formed by the second exposure treatment with respect to the substrate.

Abstract: An optical device that has an antireflection function, the optical device including: a base; and a plurality of structural bodies, which are formed by convex portions or concave portions, arranged on a surface of the base with a fine pitch that is equal to or smaller than a wavelength of visible light, wherein the plurality of structural bodies are arranged so as to form tracks of a plurality of rows on the surface of the base and form a quasi-hexagonal lattice pattern, a tetragonal lattice pattern, or a quasi-tetragonal lattice pattern, and wherein a packing ratio of the structural bodies to the surface of the base is equal to or higher than 65%.

Abstract: A resin composition for an optical waveguide is provided, which has excellent adhesiveness to a cladding layer of the optical waveguide and excellent patternability for formation of a core portion of the optical waveguide and reduces the optical waveguide loss. An optical waveguide produced by using the resin composition is also provided. The resin composition comprises: (A) a multifunctional partially-acrylated epoxy resin, as a major component, having an epoxy group and a (meth)acrylate group in the same main chain thereof; and (B) a photopolymerization initiator as a curing component. The optical waveguide includes: a substrate; a cladding layer provided on the substrate; and a core portion provided on the cladding layer for transmission of an optical signal; wherein the core portion is formed from the resin composition.

Abstract: Micro-fluid ejection devices, methods for making a micro-fluid ejection device, and methods for reducing a size of a substrate for a micro-fluid ejection head. One such micro-fluid ejection device has a polymeric layer adjacent a substrate and at least one conductive layer embedded in the polymeric layer. The polymeric layer comprises at least two layers of polymeric material.