Abstract: There are provided a method of manufacturing a piezoelectric vibrating reed capable of improving the reliability of a product by sorting out a defective product correctly, a piezoelectric vibrating reed, a piezoelectric vibrator having a piezoelectric vibrating reed, an oscillator, an electronic apparatus, and a radio-controlled timepiece. In a resist pattern forming step, a resist pattern is formed by performing contact exposure on a photoresist film in a state where a photomask is in close contact with the photoresist film. Before the resist pattern forming step, a photomask treatment step is included in which when a defect is found in an outer shape equivalent region equivalent to the outer pattern in the photomask, a part of a light shielding film pattern is removed to change the shape of the outer shape equivalent region where damage is present.

Abstract: It is disclosed a microsieve comprising two layers, wherein the first layer is a membrane layer having a plurality of micropores contained therein and a thickness of about 10 ?m to about 100 ?m, and the second layer is a membrane support layer having a plurality of openings contained therein and a thickness of about 100 ?m to about 500 ?m, wherein the openings are larger in diameter than the micropores, and wherein at least one of the membrane layer or membrane support layer is formed of a SU-8 photoresist material.

Abstract: The present invention relates a liquid crystal display device and a method for fabricating the same. The liquid crystal display device includes two glass substrates and a liquid crystal layer which is disposed between the two glass substrates, a plurality of pixel regions formed on the glass substrates. A photoresist layer and a transparent electrode layer are sequentially disposed on a side of the at least one glass substrate adjacent to the liquid crystal layer, the photoresist layer forms at least one concave and/or at least one protrusion in each of the pixel regions. The liquid crystal display device and the method for fabricating the same are simpler.

Abstract: A method for producing finely structured surfaces, in particular in plastics, includes a) applying at least one coating compound on at least one substrate; b) forming a fine structure by a die, which has the negative of a fine structure, c) curing the resultant finely structured coating compound, obtaining a substantially cured coating; and d) separating the finely structured coating from the die, wherein steps d) and c) can also be carried out in the reverse order.

Abstract: Novel polymer monolith structures and methods for fabrication of the same are disclosed in a variety of embodiments. In an illustrative embodiment, a method includes forming a pattern of features on a wafer, thereby forming a patterned wafer; forming a polymer layer on the patterned wafer; using a first plasma to remove at least a portion of the polymer layer; and using a second plasma to etch off at least a portion of the pattern of features, thereby providing a structured polymer monolith. The pattern of features may include an array of pillars. Providing the structured polymer monolith may include providing a structured polymer monolith filter having an array of channels formed by the pillars. The structured polymer monolith may be composed of polypropylene.

Abstract: The present invention relates to a method for fabricating an LCD. The method includes fabricating a MAV layer on a glass substrate. The step of fabricating the MAV layer on the glass substrate comprises the steps of: (A) coating MAV organic monomers on the glass substrate; (B) patterning the MAV organic monomers through a photomask; and (C) curing the patterned MAV organic monomers. In accordance with a photo-curing material of the MAV layer, the fabricating method of the present invention has simple processes with low technical requirements.

Abstract: Device for producing flexographic printing sleeves starting from photopolymerizable sleeves comprising at least a clean-out unit, a drying unit, and a post-exposure unit, wherein the flexographic printing sleeves are transported within the apparatus by means of a transport device, wherein the sleeves are mounted dually translationally in the longitudinal direction in the transport device, and a method for the production of flexographic printing sleeves using said device.

Abstract: A fabricating method for controlling a hole-wall angle of a contact hole in a liquid crystal display (LCD) device is disclosed, which comprises the following steps of: A) applying a photoresist on a substrate to form a photoresist layer; B) exposing the photoresist layer by using a photo-hardening monomer of a predetermined pattern; and C) using a developer to develop the photoresist layer to obtain a hole-wall having a preset angle of the contact hole by controlling a development duration, a development temperature and a concentration of the developer. The present disclosure accurately controls the hole-wall inclination angle of the contact hole to range between 45° and 70° by means of the melting point characteristics of the photoresist comprising a photo-hardening monomer.

Abstract: It is therefore an object of the present invention to provide a forming method for a resist pattern to reduce a resist residue in forming the resist pattern on a step whose gradient angle is equal to 90 degrees or more. A forming method for a resist pattern to reduce a resist residue on a step is provided, the method comprising: forming resist film with coating resist containing photo-acid-generator on a step formed on a substrate, where gradient angle of the step is equal to 90 degrees or more, exposing said resist film and generating acid from said photo-acid-generator.

Abstract: First and second anchor features are formed on a substrate via a chromeless photolithography process. An elongated bridging feature is formed between the anchor features on the substrate via the chromeless photolithography process. A distance between the anchor features is sufficient to minimize lateral displacement at a center portion of the bridging feature without significant reduction in mechanical stability of the bridging feature.

Abstract: A method for fabricating a photo spacer and an array substrate having the photo spacer are provided. At least one exposure process, a developing process, and a baking process are performed to a photo-sensitive material layer formed a substrate to fabricate a photo spacer, wherein the at least one exposure process includes a back side exposure process. The substrate has a light transmitting region and a light shielding region so that the photo-sensitive material layer is defined into a first block and a second block after the back side exposure process. The developing process is performed to at least remove the second block. A front side exposure process is performed to the first block. The baking process is performed to cure the first block of the photo-sensitive material layer to form a photo spacer.

Abstract: A method of adhering a protective layer applied to a substrate region of an implantable medical device (IMD) to form a covered substrate region. The method includes obtaining the IMD, depositing an intermediate layer on a portion of the substrate region of the IMD such that the intermediate layer binds to the portion of the substrate region to create a modified substrate region, and depositing the protective layer after depositing the intermediate layer onto the intermediate layer and adhering the protective layer to the intermediate layer. In an embodiment of the present invention, this method enhances the sealing characteristics of the protective layer by, for example, reducing the likelihood of delamination of the protective layer from the IMD relative to IMDs prepared by certain other methods.

Abstract: The present invention discloses a dedicated mask, a production method thereof, and a production method of a liquid crystal display (LCD) panel. The production method of an LCD panel comprises the following steps: coating a sealant around display areas of the LCD panel; laying a mask used for producing the LCD panel on the LCD panel, wherein the shape of a shading film of the mask used for producing the LCD panel is consistent with the shape of the display areas formed by the sealant; arranging the shading film in the position corresponding to an upper part of the display areas; and irradiating the sealant of the LCD panel exposed outside the shading film using a light source. The present invention can reduce the production cost, enhance the cost reduction, and effectively prevents the disturbance from a light source.

Abstract: A method for manufacturing a thin-film magnetic head includes processes of forming a polishing position sensor and a recording head portion alongside on one side of a wafer. The process of forming the recording head portion has a step of performing a photolithography process after applying an alkali soluble resin film and a photoresist film in the named order. The process of forming the polishing position sensor has a step of performing a photolithography process on the photoresist film while having only the photoresist film out of the alkali soluble resin film and the photoresist film.

Abstract: A method of manufacturing a mask may include forming initial ribs and removing edge portions of the initial ribs to form final ribs, each of which has a top width smaller than that of the initial rib. A space between the initial ribs may be smaller than a width of a slit limited by the final ribs.

Abstract: A method of forming an etch mask includes: providing a substrate having thereon a material layer to be etched; forming a hard mask layer consisting of a radiation-sensitive, single-layer resist material on the material layer; exposing the hard mask layer to actinic energy to change solvent solubility of exposed regions of the hard mask layer; and subjecting the hard mask layer to water treatment to remove the exposed regions of the hard mask layer, thereby forming a masking pattern consisting of unexposed regions of the hard mask layer.

Abstract: An amount of exposure of the photosensitive resin is controlled using a photomask in an exposure treatment. The photosensitive resin subjected to the exposure treatment is developed, thereby simultaneously forming a protrusion which regulates the alignment of liquid crystal molecules comprising the liquid crystal layer, and a photo spacer.

Abstract: The present invention relates to a method of making a mask for patterning a thin film The method includes a step of forming an inorganic material, which is resolvable into alkali solution, on a substrate; a step of forming the inorganic material in a predetermined pattern; and a step of narrowing the inorganic material with the alkali solution to form the mask.

Abstract: The invention provides a master disc comprising a stack of a substrate, a phase transition material layer, a heat absorption layer provided between the substrate and the phase transition layer, and an anisotropic heat sink layer provided between the substrate and the absorption layer. Further, a method of manufacturing a master disc is provided. A stack having an upper side and a lower side is provided, wherein the stack comprises a substrate provided at the lower side of the stack, a phase transition material layer, a heat absorption layer provided between the substrate and the phase transition layer, and an anisotropic heat sink layer provided between the substrate and the absorption layer. The upper side of the stack is exposed to a laser beam and developed.

Abstract: A phase mask method to geometrically transform and to optically transfer a standard planar radial grating pattern into a cylindrical photoresist pattern at the circularly cylindrical wall of a given element. The planar radial grating pattern can be written with an integer number of lines having strictly constant period without any stitching problem. The photolithographic transfer is made by an illumination device providing a normal incident beam on the phase mask. The annular radial grating diffracts this normal incident beam, formed by plane waves, into two cylindrical waves of the first diffraction order (Tr+1 and Tr?1)) which impinge on the circularly cylindrical wall and interfere in a photoresist layer deposited on the circularly cylindrical wall to give rise to an interferogram.

Abstract: A display apparatus, includes a first display panel, a second display panel disposed opposite the first display panel, the second display panel including one surface having a first region and a second region, the second region surrounding the first region; one or more first spacers in the first region and the second region of the second display panel, the one or more first spacers being in contact with the first display panel; and one or more second spacers in at least one of the first region and the second region of the second display panel, the one or more second spacers being spaced apart from the first display panel, wherein a sum of cross sectional areas of the second spacers in the second region is smaller than a sum of cross sectional areas of second spacers in the first region or is zero.

Abstract: A device is provided for the controlled sampling of fluid into a well formed within an upper surface, in which the well may be filled under dynamic wetting conditions by contacting a droplet on the upper surface with the top of the well. Wetting is supported by the increased hydrophilicity of the upper surface relative to that of the well side wall. The relative difference in hydrophilicity may be achieved by providing an upper surface with greater roughness than the side wall, effectively amplifying the hydrophilicity of the upper surface relative to that of the side wall. Wells are preferably formed in an unpolished surface of a siliconwafer, and can achieve a stable film with micron depth and an aspect ratio in excess of 100.

Abstract: An electro-optical printed circuit board contains electrical conductor tracks on the one hand and optical waveguide structures on the other hand. The optical waveguide structures comprise a bottom layer, a core layer and a cladding layer. Visible areas are applied to the printed circuit board, and the core layer is applied later both to the bottom layer as well as the visible areas and structured both on the bottom layer as well as the visible areas. This structure is then transferred to the visible areas, e.g. by etching. Reference marks are thus produced which contain the information on the actual position of the optical waveguide structures.

Abstract: A micro-lens array and a method for fabricating a micro-lens includes forming a first lens formation material layer on and/or over a micro-lens formation area of a semiconductor substrate, and then forming a portion of the lens formation material layer as a first micro-lens using a first mask. A second lens formation material layer is formed adjacent to the first micro-lens on and/or over the micro-lens formation area. The second lens formation material layer is also formed as a second micro-lens using a second mask which is a different type from that of the first mask.

Abstract: A system for forming a plurality of polymer waveguides includes at least one collimated light source adapted to produce a plurality of collimated light beams; a channel having an exposure area for the collimated light beams to pass through and for holding a photo-monomer adapted to polymerize when exposed to the collimated light beams, the photo-monomer moving with respect to the plurality of collimated light beams; and a mask disposed between the at least one collimated light source and the photo-monomer. A method for forming a plurality of polymer waveguides includes moving a mask across an exposure area of a channel containing a photo-monomer; exposing the photo-monomer to collimated light through the exposure area of the channel; growing the plurality of polymer waveguides from the exposure area into the photo-monomer to form an interconnected ordered three-dimensional polymer micro-truss structure; and removing the ordered 3D polymer micro-truss structure from the channel.

Abstract: A photostructurable ceramic is processed using photostructuring process steps for embedding devices within a photostructurable ceramic volume, the devices may include one or more of chemical, mechanical, electrical, electromagnetic, optical, and acoustic devices, all made in part by creating device material within the ceramic or by disposing a device material through surface ports of the ceramic volume, with the devices being interconnected using internal connections and surface interfaces.

Abstract: A photopolymer plate manufacturing process utilizes a modified substrate and mask to generate pre-cut and interchangeable single and multi-part stamp dies. Using a modified substrate and mask, a conventional photopolymer plate can be manufactured with a plurality of independent pattern or stamp areas that are readily removable and replaceable on the substrate and do not require cutting. The resulting material is also securable to a plastic stamp or the like without an adhesive, thereby facilitating a stamp with exchangeable patterns. Additionally, with a further modified mask, the stamp dies can be manufactured in two or more separable pieces, which can then be selectively interchanged among multiple stamp dies.

Abstract: The present invention provides a process for producing a fine pattern including, (1) forming a first resin layer containing a photosensitive resin on a substrate; (2) forming a second resin layer containing a secondary or tertiary alkynyl alcohol, a photoacid generator, and a resin on the first resin layer; (3) subjecting the second resin layer to pattern exposure; (4)subjecting the first resin layer to exposure using the pattern-exposed portion of the second resin layer as a mask; and (5) removing the second resin layer and the first resin layer.

Abstract: A method for manufacturing a recording head including forming a flow-channel side-wall forming layer which contains a photosensitive resin, on a substrate having ejection energy generating elements and wiring thereon; exposing the flow-channel side-wall forming layer to light, and optically determining a flow channel; forming a shape stabilizing layer which contains a photosensitive resin; forming an ejection orifice forming layer which contains a photopolymerization initiator and a negative photosensitive resin; exposing the ejection orifice forming layer to light, and optically determining an ejection orifice; and developing the ejection orifice forming layer, shape stabilizing layer, and flow-channel side-wall forming layer, in the order named. The photosensitive resin in the shape stabilizing layer is a material to be cured by a component that is produced upon the exposure of the ejection orifice forming layer and derives from the photopolymerization initiator.

Abstract: Provided is a nozzle sheet manufacturing method by which highly fine manufacture and low cost are achieved. The method for manufacturing a nozzle sheet to be used for an inkjet head for an inkjet printer is provided with a step of forming a first resin sheet on a patterned liquid repellent film on a first dummy substrate, a step of forming a first nozzle which penetrates the first resin sheet, and a step of peeling the first dummy substrate.

Abstract: This invention provides a support plate which makes it possible to stably perform a step for separating from a support plate a wafer which has been processed while preventing delay in time taken for this step. The support plate of this invention is a support plate for supporting a substrate via an adhesive, including: a plate-shaped part having a surface which is in contact with the adhesive; and at least one spacer provided on the surface which is in contact with the adhesive.

Abstract: A probe element and a method of forming a probe element are provided. The probe element includes a carrier comprising biodegradable and/or bioactive material; and at least one electrode coupled to the carrier.

Abstract: Embodiments according to the present invention relate generally to PAG bilayer and PAG-doped unilayer structures using sacrificial polymer layers that incorporate a photoacid generator having a concentration gradient therein. Said PAG concentration being higher in a upper portion of such structures than in a lower portion thereof. Embodiments according to the present invention also relate to a method of using such bilayers and unilayers to form microelectronic structures having a three-dimensional space, and methods of decomposition of the sacrificial polymer within the aforementioned layers.

Abstract: A nanoporous polymeric membrane is obtained by bombing a polymer film by means of high energy focused heavy ion beams and subsequently performing chemical etching to remove the portions of the polymer film in the zones degraded by the ion bombing, in such a manner to obtain pores passing through the polymer film. The heavy ion bombing is performed after interposing between the source of ions and the polymer film, adjacent to the film, an amplitude mask having an ordered arrangement of nanopores and having sufficient thickness to prevent the passage of the heavy ions that are not directed through the pores of said amplitude mask, in such a manner to obtain in the polymer fill an ordered arrangement of nanopores having an aspect-ratio at least exceeding 10 and preferably exceeding 100.

Abstract: The present invention is to provide a “fabricating method of nano-ring structure by nano-lithography” for fabricating out a new nano-ring structure in more miniature manner than that of the current fabricating facilities by directly using the current fabricating facilities without any alteration or redesign of the precision so that the number and density of the nano-ring structure in unit area or unit volume can be significantly increased in more evenness manner.

Abstract: A method for making a microfluidic device, the method includes providing at least one inorganic layer on a substrate; applying an alkoxysilane material containing a primary or secondary amine on the at least one inorganic layer; baking the applied alkoxysilane material at a temperature greater than 130 degrees C.; applying an epoxy material to form an epoxy layer, wherein the applied alkoxysilane material is disposed at an interface between the epoxy layer and the at least one inorganic layer; and patterning the epoxy layer to provide a wall for defining a location for a fluid in the microfluidic device.

Abstract: A method for manufacturing an inkjet recording includes forming a photo-cationic polymerizable resin layer containing a photo-cationic polymerizable resin material on a substrate; performing pattern exposure of the photo-cationic polymerizable resin layer to form a latent image of a fine pattern including an ejection port; forming a water repellent layer containing a water repellent material capable of forming a bond in reaction with the photo-cationic polymerizable resin material on the photo-cationic polymerizable resin layer; developing the photo-cationic polymerizable resin layer to thereby remove a non-exposed portion of the photo-cationic polymerizable resin layer and remove a water repellent layer portion corresponding to the non-exposed portion to thereby form the fine pattern; and curing the photo-cationic polymerizable resin layer by heat treatment to form a member provided with the fine pattern and promote a reaction of the photo-cationic polymerizable resin material and the water repellent materia

Abstract: A colored curable composition is provided which has good developability, has excellent color purity, can be formed into a thin film, and has a high absorption coefficient. The colored curable composition includes at least one of specific dipyrromethene metal complex compounds and tautomers thereof. Also, a colored curable composition suitable for forming a color filter which is used in a liquid crystal display device or a solid-state imaging device, and a color filter using the colored curable composition and a method of producing the same are provided.

Abstract: A retainer ring of a chemical mechanical polishing apparatus includes a base portion having a ring shape, the base portion including a pressurizing surface and a combining surface opposite the pressurizing surface, slurry inflowing portions on the pressurizing surface of the base portion, the slurry inflowing portions having groove shapes, and minute grooves at least on a surface portion of the slurry inflowing portions.

Abstract: A printhead assembly includes a plurality of inkjet ejector arrays having corresponding ink receptacles. Each inkjet array is formed from a plurality of inkjet stack layers that are bonded to a single aperture layer, and the inkjet arrays are positioned with a predetermined alignment about a curved image receiving surface.

Abstract: Embodiments of the invention relate to methods useful in the fabrication of nanostructured devices for optics, energy generation, displays, consumer electronics, life sciences and medicine, construction and decoration. Instead of nanostructuring using colloids of particles, special vacuum deposition methods, laser interference systems (holography), and other low-throughput limited surface area techniques, we suggest to use nanotemplate created by novel nanolithography method, “Rolling mask” lithography. This method allows fast and inexpensive fabrication of nanostructures on large areas of substrate materials in conveyor-type continuous process. Such nanotemplate is then used for selective deposition of functional materials. One of embodiments explains deposition of functional materials in the exposed and developed areas of the substrate. Another embodiment uses selective deposition of the functional material on top of such template.

Abstract: This invention provides an exposure apparatus that can inhibit visual recognition of display unevenness at a joint portion even if scanning temporarily stops during scanning exposure, as well as a liquid crystal display device and a method for manufacturing the liquid crystal display device. This invention is an exposure apparatus for exposing a photoalignment film provided on a substrate. The exposure apparatus includes a light source and a photomask, and exposes the photoalignment film through the photomask while scanning the light source or the substrate. When a direction in which the light source or the substrate is scanned is taken as a scanning direction, and a direction that is orthogonal to the scanning direction is taken as a vertical direction, the photomask includes a first region and a second region that is adjacent to the first region in the vertical direction. The first region includes a plurality of first transparent portions inside a first light-shielding portion.

Abstract: A method for writing an image to a surface of an offset media (100) includes mounting the offset media on the imaging drum (204); imaging on a first part of the surface with high energy radiation to ablate the first part wherein the first part represent non-image data; and imaging a second part of the surface with low energy radiation to fixate image data on the second part.

Abstract: A process for producing an ink jet head, including forming an ink flow path pattern whose surface has been subjected to insolubilization treatment on a substrate having an energy-generating element, applying a UV curable flow path forming material on the pattern and substrate to form an ink flow path forming layer, irradiating part of the ink flow path forming layer with ultraviolet rays for development, thereby forming an ink ejection orifice, and removing the pattern, thereby forming an ink flow path. The step of forming the pattern includes applying a positive resist containing a resin having a phenolic hydroxyl group on the substrate to form a positive resist layer, patterning the positive resist layer to form an ink flow path pattern prior to insolubilization treatment, applying a coating agent containing a compound having two vinyl ether groups on the pattern, and heat-treating the pattern coated with the coating agent.

Abstract: Provided is a method of manufacturing a liquid ejection head, the liquid ejection head including: a substrate having an energy generating element that generates energy for ejecting liquid; and a flow path forming member having, on an upper side of the energy generating element, an ejection orifice for ejecting the liquid and a bubble generating chamber communicated with the ejection orifice, the method including: preparing a negative photosensitive resin as a material constituting the flow path forming member; and performing first exposure treatment for forming a first image constituting a side wall of the bubble generating chamber and second exposure treatment for forming a second image constituting a side wall of the ejection orifice so that a side wall of the first image and a side wall of the second image cross each other diagonally.

Abstract: The invention relates to a method of generating a laser marking in a security document by means of at least one laser beam, the security document having at least one laser-markable layer and also at least one reflecting layer which overlaps at least partly with the at least one laser-markable layer and has opaque regions. The at least one reflecting layer has at least one transparent region and, at least visually, is not significantly altered by the laser treatment of the laser-markable layer.

Abstract: A method for producing surface convexes or concaves disposes a mask member having light transmitting sections and non-light transmitting sections over and spaced from one side of a photosensitive film including a photosensitive resin composition, and a light diffusing member is disposed on the opposite side of the photosensitive film across the mask member. Light is irradiated from a light source disposed on the opposite side of the mask member across the light diffusing member to subject the photosensitive film to light exposure through the light diffusing member and the light transmitting sections of the mask member. Exposed portions or unexposed portions of the photosensitive film are removed by development to produce convexes or concaves on the photosensitive film in shapes determined by shapes of the exposed portions or unexposed portions. In exposure, conditions such as haze of the light diffusing member are controlled to control the shapes of the exposed portions or unexposed portions.

Abstract: The present invention relates to a method for manufacturing high-resolution microfluidic structures by means of the modification of the sealing temperature and photolithography.

Abstract: The present invention provides a liquid crystal display panel that prevents disturbances of the alignment of liquid crystal molecules by means of a liquid crystal alignment control projection, thereby providing high display quality. The liquid crystal display panel of the present invention comprises a pair of substrates; and a liquid crystal layer inserted between the substrates, wherein one of the substrates comprises a wall-shaped liquid crystal alignment control projection projecting toward the other substrate, the liquid crystal alignment control projection comprises a main projection and a sub-projection that is lower than the main projection, and the sub-projection decreases in height with the increasing distance from the main projection.

Abstract: A strain gage includes a strain sensitive element; and a temperature compensation element, wherein the strain sensitive element and temperature compensation element are monolithically formed. A method of manufacturing the strain gage includes: exposing and developing a strain sensitive element pattern and the temperature compensation element pattern; and etching the strain sensitive element pattern and the temperature compensation element pattern.