Abstract: According to embodiments of the invention, the design and fabrication of a binary superimposed grating (BSG) results in better performing devices that may be fabricated using existing technology. The fabrication process includes forming grating features based upon repeating features of the desired superposition function. The design process also relaxes the processing requirement for equivalently performing devices.

Abstract: A technique of producing a control component for a reflective display device, comprising: forming an array of electronic switching devices; forming over said array of electronic switching devices an insulator region defining a controlled surface topography; and forming on the patterned surface of the insulator region by a conformal deposition technique a substantially planar array of reflective pixel conductors each independently controllable via a respective one of the array of electronic switching devices, wherein each pixel conductor exhibits specular reflection at a range of reflection angles relative to the plane of the array of pixel conductors for a given incident angle relative to the plane of the array of pixel conductors.

Abstract: Methods for replicating a nanopillared surface include applying a nanopillar-forming material to a surface of a replica substrate to form a precursor layer on the replica-substrate surface. A template surface of a nanomask may be contacted to the precursor layer. The nanomask may include a self-assembled polymer layer on a nanomask-substrate surface, the template surface being defined in the self-assembled polymer layer. The self-assembled polymer layer may have nano-sized pores with openings at the template surface. The precursor layer may be cured while the template surface remains in contact with the precursor layer. The nanomask is removed to expose a nanopillared surface having a plurality of nanopillars on the replica-substrate surface. The nanopillars on the replica-substrate surface may correspond to the pores in the template surface. Nanopillared surfaces may be replicated on one side of the replica substrate or on two opposing sides of the replica substrate.

Abstract: Some embodiments of the present disclosure relate to a method for repairing a photomask pattern, comprising receiving a photomask with a first translucent material formed on a transparent substrate, which forms an incomplete version of the photomask pattern. Missing portions of the photomask pattern are detected by comparing the incomplete version of the photomask pattern to a complete version of the photomask pattern. After detecting the missing portions, the photomask pattern is completed by using a second translucent material, which is different than the first translucent material, to form the missing portions. The second translucent exhibits the same transmissive property as the first translucent material. Consequently, both the repaired and unrepaired portions of the pattern have the same transmissive properties with respect to attenuation and phase shifting of incident radiation to enhance pattern resolution in the repaired portion of the photomask pattern.

Abstract: An optical combiner for a head-wearable display includes an eyepiece body and a plurality of diffractive optical element (“DOE”) segments. The eyepiece body has an eye-ward side and an external scene side. The DOE segments are disposed within the eyepiece body and are at least partially reflective to image light incident through the eye-ward side of the eyepiece body and at least partially transmissive to external scene light incident through the external scene side of the eyepiece body. The DOE segments are disjoint from each other and each is disposed along a different disjoint surface within the eyepiece body that is oriented at a different angle relative to the other DOE segments. The plurality of DOE segments operate to magnify and reflect the image light incident from an off-axis position to an eyebox sized area.

Abstract: A plurality of photodiodes arrayed in a one-dimensional form are divided into a plurality of groups. The structure of an antireflection coating is changed for each group so that all the surfaces of the photodiodes belonging to each group are covered with an antireflection coating having a transmittance characteristic which shows a maximum transmittance within a range of wavelengths of light to be received by those photodiodes. In particular, a SiO2 coating layer on the silicon substrate and an Al2O3 coating layer are common to all the photodiodes, while the structure of the upper layers are modified with respect to the wavelength. Within an ultraviolet wavelength region, the coating structure is more finely changed with respect to the wavelength. By such a design, the transmittance can be improved while making the best efforts to avoid a complex manufacturing process.

Abstract: A spectroscopic polarimeter and methods of manufacturing the same are provided. The spectroscopic polarimeter is described as being fabricated by etching or patterning grooves into a substrate with a centrally smooth area, laying down an opaque thin layer of metal, etching out a central cavity from the metal, laying down a thin layer of dielectric material, and then laying down metal over the cavity. Optionally, before or after the dielectric layer is laid, a thicker metal barrier at the edge of the design can be laid as well.

Abstract: An apparatus for ablating a substrate of a display apparatus, the apparatus including a stage, the stage being configured to receive thereon a carrier substrate, the carrier substrate having attached thereto the display apparatus, a light source unit, the light source unit being configured to emit light towards the stage, a measuring unit, the measuring unit being configured to measure a transmittance of the carrier substrate, and a control unit, the control unit being configured to control the light source unit to emit light sufficient to ablate the substrate of the display apparatus according to the transmittance of the carrier substrate as measured by the measuring unit.

Abstract: A simple and innovative process for manufacturing a high performance mechanical polarizing device is provided. The invention utilizes an inexpensive, high output production process where a transparent film substrate is coated with a non-transparent layer by deposition or other wet or dry method. Then a photoresist or a nano-imprint lithography process is used to overlay the non-transparent coated film with a pattern. The exposed non-transparent material is then removed by means of acid or base etching or the use of other mechanical or nano-technology removal methods. The photoresist is then removed and a protective layer may then be applied to the polarizer substrate. According to another embodiment, nano-imprinting techniques are used to prepare the polarizer substrate. The process may be automated in one or more embodiments, and lends itself to a high speed production manufacturing line, utilizing roll-to-roll, sheet fed or other methods of automated manufacturing.

Abstract: A wafer level optical lens structure is provided. A stress buffer layer is disposed between a light-transmissive substrate and a lens layer, so as to improve production yield of the wafer level optical lens.

Abstract: A method for making a LED comprises following steps. A substrate having a surface is provided. A first semiconductor layer, an active layer and a second semiconductor pre-layer is formed on the surface of the substrate. A patterned mask layer is applied on a surface of the second semiconductor pre-layer. A number of three-dimensional nano-structures is formed on the second semiconductor pre-layer and the patterned mask layer is removed. The substrate is removed and a first electrode is formed on a surface of the first semiconductor layer away from the active layer. A second electrode is formed to electrically connect with the second semiconductor pre-layer.

Abstract: The present invention relates to target acquisition and related devices, and more particularly to telescopic gunsights and associated equipment used to achieve shooting accuracy at, for example, close ranges, medium ranges and extreme ranges at stationary and moving targets.

Abstract: A scale of a photoelectric encoder includes a base member and gratings on the base member. The gratings can be formed on the surface of the base member by plating and arranged at a prescribed pitch on the base member. The surface of the base member is a roughened surface which is roughened by sandblasting or with a chemical. The gratings are light absorptive gratings or light reflective metal gratings.

Abstract: A surface forming method for electronic component includes: forming a body that has at least one waveguide, with two ends of the waveguide exposed on a front end surface and a back end surface of the body; forming a photoresist film to cover on the front end surface of the body; irradiating a light from the back end surface of the body to remove a part, of the photoresist film, that covers at least a part of an end surface of the waveguide, thereby forming an exposed area on the end surface of the waveguide; etching the exposed area of the waveguide to form a recess; and removing the photoresist film. The position and size of the pattern could be controlled accurately and efficiently, instead of inefficient complex procedures of alignment.

Abstract: Disclosed herein are an acrylate compound having a photoreactive group, a photoreactive acrylate polymer, and a photo-alignment layer including the same that not only have excellent alignment properties and alignment rate and readiness for change in the alignment direction based on the polarization direction of radiation, but also exhibit a high solubility to organic solvents and good workability.

Abstract: A refractive index measurement apparatus includes a light source, a measurement cell including a sample as an object of refractive index measurement and diffracting light incident from the light source, a detector that detects the amount of diffracted light in at least one diffraction order other than zero order of diffracted light exiting from the measurement cell, and a control unit that determines refractive index of the sample based on the measured value of the amount of diffracted light by the detector. The measurement cell includes two substrates disposed so as to be opposed to each other and a diffraction grating disposed between the two substrates, and the diffraction grating has a plurality of members whose width decreases stepwise as approaching from one of the substrates to the other of the substrates, the sample being filled in the space between the substrates not occupied by the diffraction grating.

Abstract: A method for making a LED comprises following steps. A substrate having a first surface and a second surface is provided. A patterned mask layer is applied on a first surface. A number of three-dimensional nano-structures are formed on the first surface and the patterned mask layer is removed. A first semiconductor layer, an active layer and a second semiconductor layer are formed on the second surface. A first electrode and a second electrode are formed to electrically connect with the first semiconductor layer and the second semiconductor pre-layer respectively.

Abstract: An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.

Abstract: Examples of methods and systems for creating swivel views from handheld video are described. In some examples, a method may be performed by a handheld device to receive or capture a video of a target object and the video may include a plurality of frames and content of the target object from a plurality of viewpoints. The device may determine one or more approximately corresponding frames of the video including content of the target object from a substantially matching viewpoint and may align the approximately corresponding frames of the video based on one or more feature points of the target object to generate an aligned video. The device may provide sampled frames from multiple viewpoints from the aligned video, configured for viewing the target object in a rotatable manner, such as in a swivel view format.

Abstract: Multiple patterned exposures of a single layer of image reversal resist prior to and following image reversal processing, upon development, respond to the respective exposures as either a positive or a negative resist, allowing a desired shape of a resist structure to be built up from any of a number of combinations of primitive masks. Exploiting the image reversal resist in this manner allows several types of diffraction distortion to be entirely avoided and for many sophisticated lithographic processes to he reduced in complexity by one-half or more while any desired resist structure shape can be formed form a limited number of primitive mask patterns. A regimen, which may be automated as an executable algorithm for a computer may be followed to evaluate different combinations of masks which are valid to produce a desired resist structure shape and select the optimum mask pattern combination to do so.

Abstract: A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.

Abstract: A method and system for enhanced demolding of injection molded optical devices are disclosed. In one embodiment the system includes a metal moldplate without a coat of release layer and a curing device that generates high intensity pulses of UV light. The method includes: providing a moldplate made of a predetermined moldplate material; directly injecting optical material into cavities of a moldplate without a release layer; rapidly curing the injected optical material with high intensity pulses of UV light such that a predetermined optical device is formed; and separating the thus formed optical device from the cavities of the moldplate due to a differential thermal expansion between the optical device material and the moldplate material.

Abstract: This invention relates to a method for producing a microlens with a carrier wafer, in which a lens in one opening of the carrier wafer is molded into the carrier wafer by stamping of the lens and to a corresponding device for executing the method and to a microlens which has been produced using the method. Furthermore the invention relates to a device for producing a microlens as well as a microlens.

Abstract: An embodiment of the present invention relates to a method of fabricating an optical device, the method comprising the steps of: depositing a photoresist layer on a carrier, said photoresist layer containing at least one optical component, determining the position of the at least one optical component inside the photoresist layer before exposing the photoresist layer to a first radiation, said first radiation being capable of transforming the photoresist layer from an unmodified state to a modified state, elaborating a device pattern based on the position of the at least one optical component, and fabricating the elaborated device pattern by locally exposing the photoresist layer to the first radiation and locally transforming the photoresist layer from the unmodified state to the modified state.

Abstract: A method of manufacturing a shaped polymer device comprises forming a planar polymer layer over a substrate which has a lower coefficient of thermal expansion than the polymer layer; and shaping the polymer layer using a laser ablation process. This method uses a substrate with low thermal expansion to limit the expansion of the attached polymer layer when it is being shaped by a laser ablation process. In addition there is provided a lens structure for an *autostereoscopic display device comprising a substantially planar glass substrate and a polymer layer defining a lenticular arrangement provided over the glass substrate.

Abstract: A method of tilting liquid crystal molecules is presented. The method entails providing a substrate including a photoalignment layer on top of a layer of liquid crystal molecules. The photoalignment layer is exposed to patterned light that is incident on the substrate at a substantially normal angle. The patterned light is polarized in a polarization direction that is non-parallel to an incident surface of the substrate.

Abstract: A method of making a structure having a patterned a base layer and useful in the fabrication of optical and electronic devices including bioelectronic devices includes, in one embodiment, the steps of: a) providing a layer of a radiation-sensitive resin; b) exposing the layer of radiation-sensitive resin to patterned radiation to form a base layer precursor having a first pattern of exposed radiation-sensitive resin and a second pattern of unexposed radiation-sensitive resin; c) providing a layer of fluoropolymer in a third pattern over the base layer precursor to form a first intermediate structure; d) treating the first intermediate structure to form a second intermediate structure; and e) selectively removing either the first or second pattern of resin by contacting the second intermediate structure with a resin developing agent, thereby forming the patterned base layer.

Abstract: A resin composition for forming an optical waveguide brings together excellent bending resistance, a low refractive index, and low tackiness suitable for a roll-to-roll (R-to-R) process as a material for forming an optical waveguide, in particular, a material for forming a clad layer. The resin composition for forming an optical waveguide to be used in formation of an optical waveguide includes a polyvinyl acetal compound having a structural unit represented by the following general formula (1) as a main component: in the formula (1), R represents an alkyl group having 1 to 3 carbon atoms, and k, m, and n represent ratios of respective repeating units in a main chain and each represent an integer of 1 or more.

Abstract: An enhanced self-writing method for generating in-plane (horizontally-oriented) polymer lightguides that includes disposing one or more light deflecting structures in or on the upper surface of a uncured layer that deflect incident collimated light beams in a transverse direction (i.e., parallel to the uncured layer top layer surface), whereby the deflected collimated light beam polymerizes a corresponding elongated portion of the uncured material in a self-propagating manner to form in-plane polymer lightguides. When used in the fabrication of micro-truss structures, the in-plane polymer lightguides are linked to diagonal polymer lightguides to form superior truss configurations, such as that of the ideal octet-truss structure. Non-polymerized portions of the uncured layer are removed to expose the micro-truss structure for further processing.

Abstract: Provided is a method for manufacturing a liquid crystal display device that includes a photoalignment film. The photoalignment film is formed from a liquid crystal alignment agent, and aligns liquid crystal molecules horizontally to the main face of the at least one of the substrates. The liquid crystal alignment agent contains a solvent and at least two kinds of polyamic acids or their derivatives obtained by reacting diamine and tetracarboxylic dianhydride. At least two of the diamines and at least one of the tetracarboxylic dianhydrides are compounds represented by predetermined formulas. The method includes the steps of: (1) forming the film of the liquid crystal alignment agent; (2) pre-baking the film; (3) irradiating the pre-baked film with light; and (4) post-baking the irradiated film, the step (4) including an operation of post-baking the film multiple times at temperatures ranging from low to high temperatures.

Abstract: Provided is a liquid crystal display manufacturing method that is capable of improving the aperture ratio while suppressing unevenness in the display. The present invention is a method of manufacturing a liquid crystal display provided with an array substrate including an insulating layer, a source bus line and a pixel electrode, in which the source bus line and pixel electrode are provided on the insulating layer, and the source bus line includes a lower layer and an upper layer layered onto the lower layer. This manufacturing method includes a first photolithography step for using a first photomask to pattern the first conductive film, and, after the first photolithography step, a second photolithography step for using a second photomask to pattern at least a second conductive film and forming the source bus line and the pixel electrode.

Abstract: A color filter substrate and its fabrication method as well as a LCD screen are disclosed. The color filter substrate includes a base substrate, a plurality of color filter elements, and a microlens structure. The plurality of color filter elements are disposed on the base substrate, and the microlens structure is disposed on the plurality of color filter elements.

Abstract: The invention provides a method for fabricating a liquid crystal display, including: providing a first substrate and a second substrate, wherein the first substrate and the second substrate are disposed oppositely to each other; filling a mixed solution between the first substrate and the second substrate, wherein the mixed solution comprises a plurality of liquid crystal molecules and a plurality of monomers; performing a UV light irradiation process to the mixed solution, wherein the monomers are polymerized to form a first alignment control layer on a surface of the first substrate facing the liquid crystal molecules, and form a second alignment control layer on a surface of the second substrate facing the liquid crystal molecules, and the thickness of the first alignment control layer and that of the second alignment control layer have a ratio of about 1/2-2/1.

Abstract: A liquid crystal display including a first substrate; a second substrate facing the first substrate; a thin film transistor disposed on the first substrate; an organic layer disposed on the thin film transistor; a pixel electrode disposed on the organic layer; a lower alignment layer disposed on the pixel electrode; a common electrode disposed on the second substrate; and an upper alignment layer disposed on the common electrode, wherein a first free radical included in the organic layer and a second free radical included in at least one of the lower alignment layer and the upper alignment layer are radical bonded.

Abstract: In order to provide a method of efficiently manufacturing an optical waveguide core having an endface inclined at a predetermined angle, the following method of manufacturing an optical waveguide core is employed.

Abstract: A method for manufacturing an electrode for a display apparatus includes printing and drying a conductive paste on a substrate, and printing a glass paste on the dried conductive paste, followed by patterning.

Abstract: Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).

Abstract: The present invention relates to a polymer compound including a dye, and a curable resin composition including the same. The polymer compound including the dye according to the present invention may exhibit characteristics such as excellent heat resistance, solubility, coating uniformity, chemical resistance and the like by introducing a single molecule type dye into a side chain of a polymer binder to be modified into a polymer form and applying the modified polymer to a curable composition.

Abstract: A downsized, low-power electro-optical modulator that achieves reducing both of the additional resistance in the modulation portion and the optical loss each caused by electrodes at the same time is provided. The electro-optical modulator includes a rib waveguide formed by stacking a second semiconductor layer 9 having a different conductivity type from a first semiconductor layer 8 on the first semiconductor layer 8 via a dielectric film 11, and the semiconductor layers 8 and 9 are connectable to an external terminal via highly-doped portions 4 and 10, respectively. In a region in the vicinity of contact surfaces of the semiconductor layers 8 and 9 with the dielectric film 11, a free carrier is accumulated, removed, or inverted by an electrical signal from the external terminal, and whereby a concentration of the free carrier in an electric field region of an optical signal is modulated, so that a phase of the optical signal can be modulated.

Abstract: A method and an apparatus for forming a surface relief microstructure, especially an optically variable image on a paper substrate are provided, the method comprising the steps of: A) applying a curable composition to at least a portion of the frontside of the paper substrate; B) contacting at least a portion of the curable composition with surface relief microstructure, especially optically variable image forming means; C) curing the composition by using at least one UV lamp (1, 2, 3) which is arranged on the backside of the paper substrate; D) optionally depositing a layer of a transparent high refractive index material and/or a metallic layer on at least a portion of the cured composition, wherein the lamp (1, 2, 3) having emission peak(s) in the UV-A and near VIS range and the curable composition comprises at least a photoinitiator which absorbs in the UV-A region and preferably in the near VIS range.

Abstract: Systems and methods for providing laser texturing of solid substrates are disclosed. The texturing may be used to provide grayscale images obtainable from substrates, which may include steel, aluminum, glass, and silicon. In some embodiments, images may be obtainable from the substrate by modifying the reflective, diffractive, and/or absorptive features of the substrate or the substrate surface by forming random, periodic, and/or semi-periodic micro-structure features on the substrate (or substrate surface) by an ultrafast laser pulse train. The ultrafast pulse train may be modulated in order to vary, for example, optical exposure time, pulse train intensity, laser polarization, laser wavelength, or a combination of the aforementioned. The ultrafast pulse train and the substrate may be scanned with respect to each other to provide different optical energies to different regions of the substrate (or substrate surface).

Abstract: A positive photosensitive siloxane composition comprising at least three types of following polysiloxanes (A), (B) and (C) obtained by hydrolyzing and condensing a silane compound represented by general formula (1) R1nSi (OR2)4-n, a diazonaphthoquinone derivative, and a solvent: a polysiloxane (A) such that if pre-baked the film thereof will be soluble in a 5 weight % TMAH aqueous solution and the solution rate of said film will be 1,000 ?/sec or less; a polysiloxane (B) such that if pre-baked the solution rate of the film thereof will be 4,000 ?/sec or more relative to a 2.38 weight % TMAH aqueous solution; and a polysiloxane (C) such that if pre-baked the solution rate of the film thereof will be between 200 and 3,000 ?/sec relative to a 2.38 weight % TMAH aqueous solution.

Abstract: The present invention relates to systems and methods for minimizing or eliminating diffusion effects. Diffused regions of a segmented flow of multiple, miscible fluid species may be vented off to a waste channel, and non-diffused regions of fluid may be preferentially pulled off the channel that contains the segmented flow. Multiple fluid samples that are not contaminated via diffusion may be collected for analysis and measurement in a single channel. The systems and methods for minimizing or eliminating diffusion effects may be used to minimize or eliminate diffusion effects in a microfluidic system for monitoring the amplification of DNA molecules and the dissociation behavior of the DNA molecules.

Abstract: An optical thin film can have a refractive index variation along a dimension that is perpendicular to its thickness. Two areas that have equal physical thicknesses can have different optical thicknesses. Including the thin film as a layer in a thin film optical filter can provide a corresponding variation in the filter's spectral properties. Dosing an optical thin film with ultraviolet light can cause the refractive index variation. Subjecting the film to hydrogen can increase the refractive index's response to the dose of light. Dosing a region of a thin film optical filter with ultraviolet light can change the spectral properties of the region, for example shifting an out-of-specification optical filter into specification thereby increasing manufacturing yield. An agent can promote the film's response to the dose.

Abstract: An identification film and pattern having high transparency and a reflectance spectrum with respect to a particular wavelength and including photonic crystals patterned into a particular shape and an anticounterfeiting product including the same are disclosed. A highly transparent colloidal photonic crystal film is easily manufactured using photocurable colloidal suspensions. Even though a plurality of patterns (including sub-patterns) is formed in plural films, there is no reduction in optical characteristics such as transparency, reflectance spectra, and the like. Thus, a film patterned into a desired shape is manufactured and thus usability thereof is enhanced, and a plurality of reflectance spectra with various wavelength ranges is provided and thus identification capability or security is enhanced.

Abstract: An optical filter for stereoscopic image display device and a stereoscopic image display device may be provided. In one embodiment, the optical filter for stereoscopic image display device may include a plastic substrate; an alignment layer; and a retardation layer, and the stereoscopic image display device may include the optical filter.

Abstract: A transparent component comprises a substrate (1) having an interface surface, with a pattern of electrically conductive copper (2) disposed on the interface surface with of the substrate, wherein the copper has a copper sulfide surface coating (3). It is found that copper with a suitably thin coating layer of copper sulfide has reduced visibility compared with uncoated copper, so that the metal pattern is less distracting to a viewer. The component finds application as part of a touch-sensitive display, with the substrate overlying or forming part of the display, with images on the display being visible to a user through the transparent component.

Abstract: A black curable composition for a wafer level lens includes (A) a metal-containing inorganic pigment, (B) a polymerization initiator, and (C) a polymerizable compound. The (A) metal-containing inorganic pigment is preferably titanium black.

Abstract: A manufacturing method of microlenses includes providing a substrate; forming a microlens material on the substrate; disposing a mask over the microlens material; performing an exposure process by a radiant beam emitted to the microlens material via the mask; performing a developing process on the microlens material; and forming microlenses by performing a reflow process on the microlens material.

Abstract: Oxime ester compounds of the formula I, II, III, IV or V, wherein Z is for example (formula A); Z1 for is NO2, unsubstituted or substituted C7-C20aroyl or unsubstituted or substituted C4-C20heteroaroyl; provided that at least one Z1 is other than NO2; Z2 is for example unsubstituted or substituted C7-C20aroyl; R1, R2, R3, R4, R5 and R6 for example are hydrogen, halogen, or unsubstituted or substituted C1-C20alkyl, unsubstituted or substituted C6-C20aryl, or unsubstituted or substituted C4-C20heteroaryl; R9, R10, R11, R12 and R13 for example are hydrogen, halogen, OR16, unsubstituted or substituted C1-C20alkyl; provided that R9 and R13 are neither hydrogen nor fluorine; R14 is for example unsubstituted or substituted C6-C20aryl or C3-C20heteroaryl Q is for example C6-C20arylene or C3-C20heteroarylene; Q1 is —C1-C20alkylene-CO—; Q2 is naphthoylene; Q3 is for example phenylene; L is for example O-alkylene-O—; R15 is for example hydrogen or C1-C20alkyl; R20 is for example hydrogen, or unsubstituted or substituted