Abstract: A substrate for detecting samples includes; a body, and a plurality of micro lenses arranged on the body and configured for attachment to at least one sample, wherein the at least one sample emits fluorescent light, and wherein the plurality of micro lenses condense the fluorescent light emitted from the at least one sample via refraction.

Abstract: A method for fabricating an image sensor device is disclosed. The method for fabricating an image sensor device comprises forming a photosensitive layer on a substrate. The photosensitive layer is exposed through a first photomask to form an exposed portion and an unexposed portion. The unexposed portion is partially exposed through a second photomask to form a trimmed part, wherein the second photomask comprise a first segment and a second segment that has a transmittance greater than that of the first segment. The trimmed part is removed to form photosensitive structures. The photosensitive structures are reflowed to form a first microlens and a second microlens having different heights.

Abstract: A stamper production method includes: a stamper forming step of producing, by electroplating processing using a matrix in which a pit string constituted of a concave pit is formed on an inorganic resist layer based on recording information, a stamper on which a convex pit corresponding to the concave pit is formed; and an etching step of carrying out etching processing on the stamper so that a reduction ratio of a pit height of a short pit becomes larger than that of a long pit regarding the convex pit of the stamper.

Abstract: A method of manufacturing a light receiving device 1 includes: providing a resin layer 14 containing a photo curing resin on a transparent substrate 13 where a plurality of transparent substrate portions 13A are integrated so that the resin layer covers the transparent substrate 13; selectively irradiating the resin layer 14 with light, followed by a developing process, so that the resin layer 14 remains in regions of the transparent substrate 13 which surround portions corresponding to regions facing light receiving portions 11 in the transparent substrate portions 13A; dividing the transparent substrate 13 into units of transparent substrate portions 13A so that a plurality of transparent substrate portions 13A are obtained; dividing the base substrate 12 into units of base substrate portions 12A so that a plurality of base substrate portions 12A are obtained; and joining the base substrate portions 12A and the transparent substrate portions 13A via the resin layer 14.

Abstract: Disclosed is a transparent touch screen construction that includes a pattern of layer stacks disposed on a substrate. The layer stacks each include a transparent conductor layer and an intermediate layer positioned between the substrate and the transparent conductor layer. The intermediate layer has a refractive index that is lower than that of the transparent conductor layer and that of the substrate. The construction of the layer stacks reduces the difference in visible light transmission between the areas of the substrate covered by the stacks and the areas of the substrate left exposed by the stacks. Also disclosed are methods for reducing the visibility of a patterned transparent conductor in a touch screen by disposing an intermediate layer pattern between a substrate and a transparent conductor pattern, the intermediate layer pattern and transparent conductor pattern being coincident.

Abstract: At least one hollow zone is formed in a stack of at least one upper layer and one lower layer. The upper layer is patterned to form at least a first hollow region passing through said upper layer. The first hollow region is extended by a second hollow region formed in the lower layer by etching through an etching mask formed on the patterned upper layer. The etching mask is formed by a resin layer, positively photosensitive to an optic radiation of a predetermined wavelength, exposed to the said optic radiation through the stack and developed. The lower and upper layers of the stack are respectively transparent and opaque to said predetermined wavelength so that the patterned upper layer acts as exposure mask for the resin layer.

Abstract: Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems, microstructure products and microstructure masters also are disclosed.

Abstract: A radiation imageable coating includes a first thermochromic layer including a bleachable antenna dye and a second thermochromic layer including a non-bleachable antenna dye.

Abstract: Provided are a mask pattern including a silicon-containing self-assembled molecular layer, a method of forming the same, and a method of fabricating a semiconductor device. The mask pattern includes a resist pattern formed on a semiconductor substrate and the self-assembled molecular layer formed on the resist pattern. The self-assembled molecular layer has a silica network formed by a sol-gel reaction. To form the mask pattern, first, the resist pattern is formed with openings on an underlayer covering the substrate to expose the underlayer to a first width. Then, the self-assembled molecular layer is selectively formed only on a surface of the resist pattern to expose the underlayer to a second width smaller than the first width. The underlayer is etched by using the resist pattern and the self-assembled molecular layer as an etching mask to obtain a fine pattern.

Abstract: A fabrication method of a brightness enhancement film (BEF) including the following steps is provided. A light transmissive substrate is provided and has a first surface and a second surface opposite to the first surface. Then, a plurality of first rod-shaped lenses are formed on the first surface. The rod-shaped lenses extend along a first direction and are arranged along a second direction. After that, a plurality of second stripe-shaped prisms are formed on the second surface. The stripe-shaped prisms extend along the second direction and are arranged along the first direction. Next, an electromagnetic wave beam is made to pass through the rod-shaped lenses, the light transmissive substrate and the stripe-shaped prisms in sequence. A first portion of each of the stripe-shaped prisms exposes and leaves a second portion of each of the stripe-shaped prisms unexposed. Then, the second portions of the stripe-shaped prisms are removed.

Abstract: A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion.

Abstract: Disclosed herein are a self-standing parallel plate beam splitter, a method for manufacturing the same, and a laser diode package structure using the same. The self-standing parallel plate beam splitter according to the present invention is easy to manufacture and is applicable to various laser diode packages, thereby enabling easy implementation of a laser diode package that is capable of performing bidirectional communication, a laser diode package having a triplexer function, a laser diode package having a wavelength locking function, and a laser diode package having a front side monitoring function to monitor the operation state of a laser diode chip using some of laser light emitted from the front side of the laser diode chip.

Abstract: An optical medium is provided. The optical medium comprises: a diffusion-controlling matrix framework; at least one photoactive monomer attached to the diffusion-controlling matrix framework in a first state of the optical medium, wherein the at least one photoactive monomer is released from the diffusion-controlling matrix framework by photo cleavage, producing a second state of the optical medium, in which diffusion of the photoactive monomer through the optical medium is possible; and wherein the at least one photoactive monomer is then polymerized or reattached to the diffusion-controlling matrix, giving a third state of the optical medium, when exposed to photo-polymerizing light.

Abstract: Demands such as higher definition, higher opening aperture, and higher reliability on a full-color flat panel display have been increased. Such demands are big objects in advancing higher definition (increase in the number of pixels) of a light-emitting device and miniaturization of each display pixel pitch with reduction in size of the light-emitting device. An organic compound-containing layer is selectively deposited using a laser beam which passes through openings of a mask. An irradiated substrate provided with a light absorption layer and a material layer containing an organic compound and a deposition substrate provided with first electrodes are placed so as to face each other. The light absorption layer is heated by a laser beam which has passed through the openings of the mask, and the organic compound at a position overlapping with the heated region is vaporized, and accordingly the organic compound is selectively deposited over the deposition substrate.

Abstract: A method for manufacturing a planar optical waveguide device including a core of which a top face is provided with a groove section filled with a groove section filler made of a low refractive index material having a refractive index lower than that of the core, the method including; a first high refractive index material layer forming step of forming a high refractive index material layer; a low refractive index material layer forming step of forming a low refractive index material layer made of the low refractive index material on the high refractive index material layer; a groove section filler forming step of forming the groove section filler by trimming both lateral portions of the low refractive index material layer; and a second high refractive index material layer forming step of forming a high refractive index material layer so as to fill the both sides of the lateral portions of the groove section filler.

Abstract: An optical information recording medium includes a recording layer that includes a mark layer in which recording marks formed in accordance with condensed recording light are aligned and has a recording light absorption amount of 20.8% or less with respect to an innermost depth as a depth of the mark layer from a side thereof that the recording light enters to a side thereof that is most distant from the side that the recording light enters, and a change amount of a light absorption amount with respect to measurement light having a wavelength 10 nm shorter than that of the recording light at a time a light absorption amount with respect to measurement light having the same wavelength as the recording light is used as a reference, of 8.0% or more per 0.30 mm.

Abstract: A method for producing a fine structure includes: (a) forming a photosensitive film to cover a plurality of first convex portions formed in at least one surface of a substrate; (b) arranging liquid to cover the photosensitive film on the at least one surface of the substrate; (c) arranging a transparent parallel plate such that the parallel plate opposes the substrate via the liquid; (d) generating interference field by a laser beam to irradiate the interference field onto the photosensitive film via the parallel plate and the liquid; (e) removing the liquid and the parallel plate to develop the photosensitive film so as to form a photosensitive film pattern; and (f) etching the substrate using a mask of the photosensitive film pattern to form a plurality of fine convex portions smaller than the first convex portions on the at least one surface of the substrate.

Abstract: A microfabricated analysis chip with integrated waveguides for evanescent field absorption detection is provided. Fabrication of the microfluidic device may be performed by micropatterning a layer of photoresist or other suitable material using a single step photoresist process to produce a microchannel and an optical structure (e.g., a U-bend waveguide) in the microfluidic device. The microfluidic device couples a micro-channel network with a waveguide in a collinear fashion to maintain higher path length and incurring little or no scattering, dispersion, and divergence losses. A sample can be passed through the microchannel while light is transmitted through the waveguide. Any change in refractive index as well as change in optical absorbance property of fluid flowing in the microchannel can be detected by detecting changes in light output power (e.g., changes in absorbance). A change in concentration of solution in the microchannel can be determined by detecting a change in light absorbance output.

Abstract: An optical structure is provided. The optical structure includes a substrate structure. A photosensitive material layer is positioned on said substrate structure. The photosensitive material layer having uniform periodic geometry and a period length throughout associated with a 2D periodic pattern. The 2D periodic pattern includes a period length greater than the exposing light wavelength and spatial variation in the duty cycle of the features of a mask layer used in the formation of said 2D periodic pattern.

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract: A method of manufacturing an optical waveguide, includes forming a first light path core layer having a first light path length on a first cladding layer, forming a groove portion having an inclined surface in an end side of the first light path core layer, forming a second light path core layer having a second light path length which is longer than the first light path length, in a lateral area of the first light path core layer, forming a groove portion having an inclined surface, arranged to an outer side than the groove portion of the first light path core layer, in an end side of the second light path core layer, forming partially a metal layer on the respective inclined surfaces of the first and second light path core layer, and forming a second cladding layer covering the first and second light path core layer.

Abstract: A method for determining, by means of a computer, a photolithography mask for the manufacturing a microstructure by grey level etching of a resist layer, this mask including a plurality of elementary cells, each including an opaque area arranged, in top view, in a non-peripheral portion of a transparent region or, conversely, in a transparent area arranged, in top view, in a non-peripheral portion of an opaque region, comprising the steps of: a) initializing the mask pattern in a first state; b) determining, by simulation, the profile of the microstructure which would result from the use of the mask according to said pattern; c) adjusting said pattern by modifying, in certain cells, the position of the opaque or transparent area within the cell; and d) forming the mask according to said pattern.

Abstract: An organic-inorganic hybrid material comprising (a) at least one soluble organic polymer and (b) at least one mono- or polynuclear metal complex having at least one ligand which comprises at least one photochemically and/or thermally polymerizable functional group. Also disclosed is an optical component which is made by using the hybrid material.

Abstract: A micro-lens array and a method for fabricating a micro-lens includes forming a first lens formation material layer on and/or over a micro-lens formation area of a semiconductor substrate, and then forming a portion of the lens formation material layer as a first micro-lens using a first mask. A second lens formation material layer is formed adjacent to the first micro-lens on and/or over the micro-lens formation area. The second lens formation material layer is also formed as a second micro-lens using a second mask which is a different type from that of the first mask.

Abstract: Described is a process for the production of a multi-layer body having a volume hologram with at least two different items of image information, wherein a photosensitive layer (46) of the multi-layer body is directly or with the interposition of a transparent optical medium (44s, 45) brought into contact with the front side of a master (44), in which interlaced regions with different asymmetrical surface structures or kinoform structures are shaped, which embody the at least two different items of image information. The photosensitive layer (46) and the master are exposed with a coherent light beam (47) whereby a volume hologram is formed in the photosensitive layer (46). Also described are a master for the production of the multi-layer body and a security element having said multi-layer body.

Abstract: The present invention provides an optical apparatus having a multimode interference coupler configured to optically couple a strip waveguide to a slot photonic crystal waveguide. The multimode interference coupler has a coupling efficiency to the slot photonic crystal waveguide greater than or equal to 90%, a width that is approximately equal to a defect width of the slot photonic crystal waveguide, a length that is equal to or less than 1.5 ?m, and interfaces with the slot photonic crystal waveguide at an edge of a period that gives a termination parameter of approximately zero. The optical apparatus may also include an insulation gap disposed between the multimode interference coupler and the slot photonic crystal waveguide, wherein the length of the multimode interference coupler is reduced by approximately one half of a width of the insulation gap.

Abstract: An optical waveguide device is provided which is capable of reducing light propagation losses in the cores of an optical waveguide when the optical waveguide is formed on a surface of a substrate, regardless of the type of substrate. A photosensitive resin layer (4A) for over cladding layer formation is made of a photosensitive resin composition of a non-solvent type, and is heated prior to the exposure thereof to light. This causes interface portions between the cores (3) and the photosensitive resin layer (4A) to be formed into mixed layers (5). This reduces light propagation losses.

Abstract: The present disclosure relates to a method for manufacturing the patterned retarder used in the three-dimensional display device. The present disclosure suggests a method for manufacturing a patterned retarder comprising: defining a first retarder region and a second retarder region in the patterned retarder; forming a first polarization pattern at the first retarder region by a partial exposure process having a first exposure energy; and forming a second polarization pattern at the second retarder region by whole exposure process having a second exposure energy. By manufacturing the patterned retarder with lower exposure energy, it is possible to reduce the whole manufacturing takt time, so that the production yield can be enhanced and the production cost can be reduced.

Abstract: A method for fabricating a display substrate is provided. A substrate is provided first. After that, an alignment film coating and an alignment treatment are performed to the substrate, and a layer of photoreactive monomer material is coated on the surface of the substrate after the alignment treatment. Thereafter, the layer of photoreactive monomer material is selectively irradiated by UV light in an exposed region, and the layer of photoreactive monomer material in an unexposed region is removed for liquid crystal molecules to have different pretilt angles in the exposed region and the unexposed region.

Abstract: A method of manufacturing an optical waveguide device which is capable of connecting light-receiving and light-emitting elements mounted on a board and an optical waveguide to each other with high accuracy. Insulation layers are formed on a first surface of a metal substrate. A first photomask is positioned by using an alignment mark formed in the metal substrate, and exposure to light and development are performed to form conductor layers. A second photomask is positioned on a second surface of the metal substrate opposite from the first surface by similarly using the above-mentioned alignment mark, and exposure to light and development are performed to form an opening for optical coupling between a light-emitting element and an optical waveguide film. The light-emitting element is mounted on pads of the conductor layers, and the optical waveguide film is fixed to the metal substrate using the optical coupling opening.

Abstract: Disclosed are an optical display device producing uniform light distribution and a method of fabricating such devices. The optical display device has waveguides arranged in vertical and horizontal directions. The waveguide has a conical shape whose cross-section decreases towards the light-projection side thereof. At least one of the size, height, spacing, and refraction index of the waveguide is designed to be different for each section, depending on an incident angle and/or intensity of light inputted from a light source. Therefore, the intensity of projected light can be made uniform over all sections of the optical device.

Abstract: A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a dielectric, a semiconductor, and a second conductor each layer of patterned functional material corresponding to the four different color patterns of the multicolor mask. The functional material is patterned using a photopattern corresponding to each color pattern.

Abstract: A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark polymer material, and roughening a top surface of the dark polymer material. The roughening can be achieved by ashing the dark polymer material in an ash chamber. The dark polymer material, preferably a black matrix resin or a polyimide black matrix resin, when ashed in an oxygen rich atmosphere for a short period of time, forms a surface that is capable of absorbing light as well as randomly refracting light it does not absorb. A protective cap layer may be formed on top of the ashed dark polymer material to provide protection for the dark polymer material.

Abstract: A method for forming a sealed cell structure is disclosed. The sealed cell structure comprises first (10) and second (12) substrates that are spaced apart by a plurality of partition walls (14). The partition walls define a plurality of cells (18, 19) between the first and second substrates. At least one of the substrates and the partition walls have a layer (16, 22, 30) of photo-embossing material on them. A latent image is written (112) onto the photo-embossing material, and then the image is developed, thereby causing expansion of the photo-embossing material in the areas (114) according to the pattern of the latent image. The expansion of the photo-embossing material causes the cells to be sealed apart from one another.

Abstract: A production method of an optical waveguide for a connector is provided, which reduces an optical coupling loss. Cores are formed in a crossing pattern, a branched pattern or a linear pattern, and then an over-cladding layer formation photosensitive resin layer is formed over the cores. In turn, a heat treatment is performed at a temperature of 70° C. to 130° C. to properly form mixed layers in interfaces between the cores and the photosensitive resin layer. By thus forming the mixed layers, the connector optical waveguide can be produced as having a reduced optical coupling loss.

Abstract: A method of manufacturing a micro lens array, wherein the quality of an image is prevented from being deteriorated as a beam on an off-axis surface reaches a focal plane of a micro lens by forming a shading film for preventing the beam from penetrating through a space between micro lenses of the micro lens array, a micro lens having a high numerical aperture or any shape, such as an aspheric shape, is quickly manufactured at a low cost, and the micro lenses and a mask pattern are easily aligned by forming a mask pattern on a focus region formed by the micro lenses of the micro lens array.

Abstract: A method for producing an optical orientation film is disclosed, the method being able to realize highly accurate exposure in a pattern, even if a simple device and non-parallel light are used and a long continuous resin substrate is used and fed continuously. The method for producing the optical orientation film includes the steps of: (i) preparing an irradiation target substrate and a long continuous photomask (ii) feeding the irradiation target substrate continuously; (iii) feeding the photomask continuously; (iv) producing a laminate by laminating the photomask fed in step (iii) on an orientation layer of the irradiation target substrate fed in step (ii); (v) exposing the orientation layer in the pattern by irradiating with light, while feeding the laminate obtained in step (iv) in the longitudinal direction of the laminate; and (vi) removing the photomask from the laminate irradiated in step (v).

Abstract: An electrophoretic display device includes a multiplicity of individual reservoirs containing a display medium between conductive substrates, at least one of which is transparent, wherein the display medium includes one or more set of colored particles in a dielectric fluid, and wherein the multiplicity of individual reservoirs are defined by a unitary grid whose walls segregate the reservoirs. The gird may be formed via photolithography or from a master stamp derived from a mold of the grid pattern.

Abstract: A method for fabricating an image sensor is disclosed. First, a semiconductor substrate is provided, in which a photosensitive region is defined on the semiconductor substrate. At least one photosensitive material is then formed on the semiconductor substrate, and a first exposure process is performed to form a tapered pattern in the photosensitive material. A second exposure process is performed to form a straight foot pattern in the photosensitive material, and a developing process is performed to remove the tapered pattern and straight foot pattern to form the photosensitive material into a plurality of photosensitive blocks. A reflow process is conducted thereafter to form the photosensitive blocks into a plurality of microlenses.

Abstract: A component having a microring resonator and grating, coupled to a waveguide is described. By selection of the grating period, and other parameters such as the grating-waveguide coupling coefficient, an efficient filter may be designed and constructed. The component may be used in passive devices such as add-drop multiplexers or sensors, or in active devices such as lasers. Designs having essentially no response sidelobes, very narrow effective bandwidths, and fast filter roll-offs may permit compact devices to be produced, when compared with typical distributed sampled Bragg grating structures.

Abstract: A method for photo-alignment treatment in which at least the number of kinds of photo masks or the number of exposure that are necessary for domain division can be reduced. The method for forming domains 8A, 8B, which are sectioned with respect to alignment regulation directions 11A, 11B, on a surface of an alignment film material 1 that develops alignment regulation powers to align liquid crystal molecules in accordance with irradiation directions of light includes irradiating the alignment film material surface from different directions with different kinds of linear polarized light 9A, 9B that have different planes of vibration through different kinds of polarizing plates 4A, 4B, the polarizing plates having transmission axes 6A, 6B being flush with the planes of vibration, and being disposed corresponding to the domains, wherein a mask 3 comprises the polarizing plates, and a light shielding supporting frame 5 arranged to support the polarizing plates.

Abstract: An all-polymer grating microstructure device that exhibits a zero-order reflection under white light comprises a first polymer having a first refractive index and configured as a microstructure embedded within a second polymer having a second refractive index, each of the polymers of the first and second polymers at least translucent to white light with the proviso that the refractive index of the first polymer is at least 0.05 greater than the refractive index of the second polymer.

Abstract: A red organic light emitting element formed by a simple process of a thermal transfer method and a display device including the same are provided. A donor substrate 100 has a reflecting layer 120 in a planned formation region 100R1 of a red transfer layer viewed from a front face side of a base 110, and has the reflecting layer 120 in a non-transfer region 100NP viewed from the rear face side of the base 110. A red transfer layer 200R is formed on the whole area on the front face side of the base 110, laser light LB1 is irradiated from the front face side of the base 110 to form the red transfer layer 200R only in the red transfer layer planned formation region 100R1, and then a green transfer layer 200G is formed on the whole area on the front face side of the base 110.

Abstract: A resin composition includes a binder component having at least one of a monomer and an oligomer of one or more of a fluorine system and a silicone system having a polymerizable functional group in a molecule. The resin composition also includes fine metal oxide particles, and a polymerization initiator. The fine metal oxide particles include particles selected from the group of zinc oxide, indium oxide, tin oxide, antimony oxide, tin-doped indium oxide (ITO), antimony-doped tin oxide (ATO), zinc-doped indium oxide (IZO), aluminum-doped zinc oxide (AZO), and fluorine-doped tin oxide (FTO).

Abstract: A plasma display device and a method of manufacturing a plasma display panel (PDP) are provided. The method includes applying onto a substrate a black matrix paste for forming a black matrix and an electrode paste for forming an electrode; laminating a dielectric material on the substrate; and firing the black matrix paste, the electrode paste, and the dielectric material at the same time. Therefore, it is possible to simplify the manufacture of a PDP by firing electrodes, black matrices, and a dielectric material at the same time. In addition, it is possible to reduce the probability of the generation of air bubbles by appropriately reducing the amount of glass frit in a paste. Moreover, it is possible to enhance the efficiency of driving a PDP and the reliability of a plasma display device.

Abstract: A method of manufacturing a microlens array includes forming a resist film on a structure including a plurality of light-receiving portions, exposing the resist film using a photomask in which a plurality of lens patterns for forming a plurality of microlenses are arranged, forming a resist pattern by developing the exposed resist film, and forming the plurality of microlens by annealing the resist pattern, wherein the plurality of lens patterns include lens patterns having exposure light transmittance distributions different from each other.

Abstract: Instances of data-storage media having pits and lands, such as individual DVDs or CDs, are manufactured by selectively illuminating a light-curable material to form cured regions corresponding to the lands. The selective illumination of the light-curable material can be implemented using mask-based illumination or selective laser illumination or both. The mask used in mask-based illumination can have one or more extra opaque portions and/or one or more extra transparent portions corresponding to false pits and/or false lands, respectively, where selective laser illumination is used to convert one or more false pits/lands produced during mask-based illumination into true pits/lands for the competed medium.

Abstract: In an optical recording and reproducing medium having a groove 2 formed along a recording track and which is recorded and/or reproduced with irradiation of light L having a predetermined wavelength ?, a track pitch p of the groove 2 is selected in a range of from 200 nm to 350 nm and a ratio wg?/p between a width wg of the groove 2 and the track pitch p is selected in a range of from 0.24 to 0.67.

Abstract: A birefringence pattern builder used in a method of producing a patterned birefringent product including a step of patterned light exposure of an optically anisotropic layer and a step of heating the layer after the light exposure to 50° C. or higher but not higher than 400° C., which include the optically anisotropic layer, a support, and a laminate film in this order, is provided. The birefringence pattern builder prevents nonuniformity of functional layers that may generate in the production process, is useful for a production method that hardly causes nonuniformity in the patterned birefringent product even after a rolling-up step in the industrial production process, and enables a production of a thinner product.

Abstract: A colored curable composition including: at least one selected from the group consisting of a compound represented by the following Formula (1a) and a tautomer thereof; and at least one polymerizable compound, wherein R11, R12, R13, R14, R15, and R16 each independently represent a hydrogen atom or a monovalent substituent; and R11 and R12, and R15 and R16 independently may bond to each other in each pair to form a ring.