Abstract: A color filter including a transparent substrate; a light shielding part formed on the transparent substrate and contains at least a light shielding material and a resin; and a colored layer formed in the opening part of the light shielding part on the transparent substrate to cover a part of the light shielding part. The light shielding part has the width of the thick film region, 85% or more of the maximum film thickness of the light shielding part and disposed in the central part of the light shielding part; and the width of each of the thin film regions, 50% or less of the maximum film thickness of the light shielding part and disposed on the both side parts of the light shielding part.

Abstract: The invention relates to the use of a pigment preparation comprising a) a dioxazine compound of the formula (I) as base pigment and b) a dioxazine compound of the formula (II) as pigment dispersant Q-[Y—X]M ??(II) in which Q is an m-valent radical of the base pigment of the formula (I), Y is a bridging moiety, X is in particular a heterocycle, and m indicates a numerical value between 1 and 4 as a colorant in color filters, ink-jet inks, electrophotographic toners and developers, and electronic inks.

Abstract: The present invention provides a method for producing a color filter, the method including: applying an adhesion auxiliary agent onto an inorganic material; forming a curable layer on the inorganic material to which the adhesion auxiliary agent has been applied by applying a curable pigment composition containing an organosilane compound (A) represented by Formula (I) below (wherein L is a monovalent organic group; R1 and R2 are hydrocarbon groups; and n is an integer from 1 to 3), a photopolymerization initiator (B), a compound (C) having an ethylenically unsaturated double bond, and a pigment (D); exposing the curable layer to light in a pattern using a mask; and a developing the curable layer after exposure to form a color pattern.

Abstract: A method of fabricating a color filter layer is provided. An active device array substrate having an opaque metal pattern formed thereon is provided. A planarization layer covering the opaque metal pattern is formed. A back-side exposure process is performed on the active device array substrate using the opaque metal layer as a mask to form a black matrix thereon, wherein the black matrix defines a plurality of pixel regions. A plurality of color filter patterns is formed in the pixel regions.

Abstract: The present invention provides coating compositions comprising (i) a) a compound containing a free carbonyl group and b) a nucleophile or (ii) a compound containing a free carbonyl group, which compound is substituted with one or more nucleophilic groups. The present invention also provides a process for the preparation of these compositions, substrates coated with these compositions and a process for their preparation, a process for preparing marked substrates using these compositions, and marked substrates obtainable by the latter process.

Abstract: A color filter including a transparent substrate; a light shielding part formed on the transparent substrate and contains at least a light shielding material and a resin; and a colored layer formed in the opening part of the light shielding part on the transparent substrate to cover a part of the light shielding part. The light shielding part has the width of the thick film region, 85% or more of the maximum film thickness of the light shielding part and disposed in the central part of the light shielding part; and the width of each of the thin film regions, 50% or less of the maximum film thickness of the light shielding part and disposed on the both side parts of the light shielding part.

Abstract: To provide a curable coloring composition that has good color hue, high transmittance properties, high light fastness and heat fastness, and excellent stability over time and solvent resistance after curing, a color filter that has good color hue, high transmittance properties, and excellent light fastness, heat fastness, and solvent resistance, and is compatible with high resolution, and a method for producing same. A curable coloring composition that includes at least one type of quinophthalone dye represented by Formula (1), a color filter employing the curable coloring composition, a method for producing the color filter, and a quinophthalone dye represented by Formula (2).

Abstract: A color filter substrate includes a first color filter layer on a substrate, and a second color filter layer on the substrate, the first color filter layer having a thickness different from a thickness of the second color filter layer.

Abstract: The invention relates to a process for forming a structure comprising: (a) providing a transparent support; (b) forming a color mask having a selected absorption spectral range wherein the color mask has an effectively transparent portion and a partially absorptive portion, wherein the partially absorptive portion includes at least two portions having different optical densities within the absorption spectral range; (c) coating a layer of a photopatternable material sensitive to visible light in the absorption spectral range; (d) exposing and developing the photopatternable material to form a photopattern corresponding to at least one of said two portions of the partially absorptive portion; and (e) depositing and patterning a layer of functional material such that a pattern of functional material results corresponding to the at least one of said two portions of the partially absorptive portion.

Abstract: An embodiment of the disclosed technology provides a color filter substrate with a plurality of pixel units, comprising: a base substrate, a patterned phase retarder film disposed at a first side of the base substrate, and each of phase retarders of the patterned phase retarder film respectively corresponds to each of pixel units; and a first black matrix disposed between the base substrate and the patterned phase retarder film, where each portion of the first black matrix corresponds to a border of two adjacent phase retarders.

Abstract: The present invention provides a colored composition for a light-shielding film including at least one selected from titanium atom-containing black titanium pigments and at least one organic pigment selected from the group consisting of a red organic pigment, a yellow organic pigment, a violet organic pigment, and an orange color organic pigment, which has a maximum value of the transmittance of light having a wavelength of 400 to 700 nm of 1.5% or less when a film is formed such that the light transmittance at a wavelength of 650 nm is 0.2%, has a wavelength showing the maximum transmittance at 400 to 550 nm, and has a light transmittance at a wavelength of 400 nm of 0.1% or more.

Abstract: A manufacturing method of a color filter substrate, a semi-transmissive LCD using the same, and a manufacturing method thereof are disclosed. In one embodiment, the manufacturing method of the color filter substrate includes preparing a first substrate which comprises a reflection region and a transmission region. Then, a color resist on the first substrate is formed. A mask, including a semi-transmission mask corresponding to the reflection region, is provided on the color resist. An exposure process is provided for the color resist with the mask to form a color filter layer on the first substrate. The color filter layer is formed by removing a portion of the color resist of the reflection region.

Abstract: It is an object of the present invention to provide a photosensitive composition capable of forming partition walls having an upper surface with good ink repellency and open areas which have good ink affinity within which an ink will easily spread. Further, it is an object of the present invention to provide partition walls formed by curing the photosensitive composition, and a color filter and an organic EL device having the partition walls.

Abstract: Disclosed herein is a method of curing a color filter for an electronic display using an electron beam at low temperature. A conventional method of curing the color filter by thermal-heating is not suitable for a process of fabricating next generation flexible displays. In the method of the invention, after a color resist pattern is formed on a substrate, the resist is cured by an electron beam at 100° C. or less. Hence, the method can minimize damage of the substrate while facilitating dimension control of the color pattern and achieving precision of a fine pattern. A method of fabricating a color filter for an electronic display using the method is also disclosed.

Abstract: An embodiment of the present invention provides a method of manufacturing a color filter substrate, comprising: forming a black matrix on a base substrate; and forming color filter patterns having at least two colors on the base substrate on which the black matrix is formed, wherein forming a color filter pattern having one color of the at least two colors, comprising: forming a color filter resin layer having the one color on the base substrate on which the black matrix is formed; radiating the color filter resin layer from a side of the base substrate which is opposite to a side on which the black matrix is formed by using a mask to expose the color filter resin layer so as to form the color filter pattern, wherein light transmitting regions of the mask at least correspond to the color filter pattern to be formed.

Abstract: Disclosed is a colored photosensitive resin composition for a color filter of a solid state imaging device using an ultra-short wavelength exposing device of 300 nm or less, a color filter and a solid state imaging device including the same. The colored photosensitive resin composition can fabricate a color filter having a micro-patterned colored pattern. The color filter can be advantageously applied to a solid state imaging device.

Abstract: A colored photocurable composition for a solid state image pick-up device, the composition including at least (A) a dispersion resin having an unsaturation equivalent of less than 600, (B) a pigment, (C) a photopolymerization initiator, and (D) a polyfunctional photopolymerizable compound having an acidic functional group and/or an alkyleneoxy chain.

Abstract: A method of a color filter substrate for a semitransmissive type liquid crystal display device, including: forming a photosensitive coloring composition layer containing a photo-polymerizable monomer, a resinous binder, a polymerization initiator, a coloring agent and a solvent on a surface of a transparent substrate, the surface being partitioned into a large number of pixel regions; exposing the photosensitive coloring composition layer to light; and developing the photosensitive coloring composition layer to form a transmissive portion and a reflective portion, the transmissive portion being assigned to colorize a transmitted light from a light source arranged on a rear surface side of a liquid crystal display device, the reflective portion being assigned to colorize a reflected light to be derived from reflection of an external light entering from the observer's side and having a through-hole with a diameter of 10 pm or less.

Abstract: Disclosed are an exposure mask, a photolithography method, a method of manufacturing a substrate and a display panel which can reduce the number of exposure masks required. The photolithography method uses an exposure mask 1a having a semi-transmissive pattern 12a, which blocks the light energy of the first wavelength band, and a semi-transmissive pattern 13a, which blocks the light energy of the second wavelength band. The photolithography method includes the steps of: forming a first photoresist material film 27; conducting an exposure process on the first photoresist material film 27 using the exposure mask 1a and the light energy of the first wavelength band; conducting a development process on the photoresist material film 27; forming a second photoresist film 28; conducting an exposure process on the second photoresist film 28 using the exposure mask 1a and the light energy of the second wavelength band; and conducting a development process on the second photoresist film 28.

Abstract: A fabricating method of a color filter substrate includes following steps. First, a base is provided. A patterned color filter film layer having a plurality of recesses is then formed on the base. Next, a common electrode layer is formed on the patterned color filter film layer and the base. Here, the common electrode layer conforms to surfaces of the recesses. Thereafter, a plurality of shelters are formed on the common electrode layer and correspond to the recesses.

Abstract: The present invention provides a method of manufacturing a color filter, including: forming a first color pattern in a repeating pattern on a support; forming, on the support, a second color pattern in a repeating pattern in regions where the first color pattern is not formed; removing at least one portion of one of the first color pattern and the second color pattern by dry-etching, the portion being in a region where a third color pattern is to be formed; and forming, on the support, the third color pattern in the region where the portion of one of the first color pattern and the second color pattern has been removed. The present invention also provides a color filter manufactured by the method, and a solid-state image pickup element using the color filter.

Abstract: The photosensitive resin composition for a color filter according to one embodiment of the present invention includes (A) a pigment including a repeating unit of the following Formula 1, (B) a binder resin, (C) a photopolymerization initiator, (D) a photopolymerizable monomer, and (E) a solvent: wherein in the above formula, X, m, and n are the same as in the description.

Abstract: The invention provides a negative curable composition comprising a colorant, a photopolymerization initiator, a radical polymerizable monomer, a binder, and a monofunctional thiol compound, wherein the content of the radical polymerizable monomer with respect to the total solid content of the composition is from about 10 mass % to about 50 mass %, and the content of the binder with respect to the total solid content of the composition is about 20 mass % or less; a color filter formed by using the composition; and a method of producing the color filter. The negative curable composition has excellent developability at high sensitivity and enables formation of a fine rectangular pattern even in a low-binder content formulation.

Abstract: The present invention provides a method of manufacturing a light-emitting device and an evaporation donor substrate, by which the precision of patterning of an EL layer of each color can be improved in manufacture of a full color flat panel display using emission colors of red, green, and blue. A first substrate which includes a reflective layer including an opening portion, a heat insulating layer including an opening portion in a position overlapped with the opening portion of the reflective layer over the reflective layer, a light absorption layer covering the opening portion of the reflective layer and the opening portion of the heat insulating layer over the heat insulating layer, and a material layer over the light absorption layer is used. While one surface of the first substrate is disposed close to a deposition target surface of a second substrate, the first substrate is irradiated with light from the other surface of the first substrate.

Abstract: To provide a photosensitive composition with which it is possible to form partition walls (black matrix) having excellent light shielding properties and liquid repellency. A photosensitive composition, which comprises a polymer (A) having a side chain containing a fluorine atom-containing group or a silicon atom-containing group and a side chain containing an ethylenic double bond in one molecule, a black colorant (B), a photopolymerization initiator (C) which is an O-acyloxime compound, and a photosensitive resin (D) containing an acidic group and an ethylenic double bond in one molecule, wherein the proportion of the black colorant (B) in the total solid content of the composition is from 15 to 60 mass %.

Abstract: A method for manufacturing flexible color filter substrate includes the following steps. First, a rigid substrate is provided. The rigid substrate has an upper surface and a lower surface opposite to the upper surface. The upper surface includes a first region and a second region located at a periphery of the first region. Next, a release layer is formed on the first region. Next, a flexible substrate layer is formed to cover the second region and the release layer. Next, a color photoresist layer is formed on a portion of the flexible substrate layer above the release layer. Next, the rigid substrate and the flexible substrate layer are cut along a border between the first region and the second region. Next, the flexible substrate layer is separated with the release layer. The method for manufacturing flexible color filter substrate can improve optical performance of the flexible color filter substrate.

Abstract: A method of manufacturing a color filter according to the present invention is a method of manufacturing a color filter including a plurality of translucent colored layers of different colors on a transparent substrate, including the steps of forming a black matrix layer on the transparent substrate with photolithography, forming one translucent colored layer selected from among the plurality of translucent colored layers with photolithography, and forming a remaining translucent colored layer of the plurality of translucent colored layers with ink-jetting. With this approach, a method of manufacturing a color filter that can attain excellent image quality and can be manufactured at low cost can be provided.

Abstract: The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation. In one embodiment, the mask image is formed on the carrier sheet while in another embodiment, the mask image is formed on a receptor sheet. The mask image is then transferred to a photosensitive material, such as a flexographic printing plate precursor. The resulting assembly is exposed to the curing radiation resulting in exposed and unexposed areas of the photosensitive material. The carrier sheet or the receptor sheet may be removed from the mask image either before or after exposure to the curing radiation. Finally, the photosensitive material and mask image assembly is developed with a suitable developer to form a relief image.

Abstract: The present invention relates to a method of manufacturing a color filter and a color filter manufactured by using the same. More particularly, the present invention relates to a method of manufacturing a color filter that includes a) applying a light blocking part material on a substrate; b) prebaking the light blocking part material to form a light blocking layer; c) selectively exposing and developing the light blocking layer to form a light blocking part pattern; d) precuring the light blocking part pattern; e) applying a solution on the substrate on which the light blocking part pattern is formed; f) postbaking the light blocking part and the solution; and g) filling ink in a pixel unit that is defined by the light blocking part pattern, and a color filter manufactured by using the same.

Abstract: The invention provides a colored photosensitive composition including: a coloring agent with a content of from 50% by weight to 80% by weight with respect to the total solid content of the composition; an oxime-based initiator with a content of from 5% by weight to 20% by weight with respect to the total solid content of the composition; and a resin containing at least one first structural unit represented by any one of the following formulae (1) to (3) containing an unsaturated double bond, and at least one second structural unit represented by the following formula (4) containing an acid group, wherein a ratio of the first structural unit to the second structural unit is 1.5 or more (molar ratio).

Abstract: A method of fabricating a color filter array including the removal of unwanted residual color pigments. A substrate is coated with a colored photoresist layer. The photoresist layer is patterned. The substrate is then cured. A descumming step is performed after the curing step to remove the residual pigments without causing significant damage to the remaining color filter array pattern. In another embodiment, the descumming process may be used to control or manipulate the thickness of the color filter array. In another embodiment, the descumming process may be used to modify the surface of the color filter array to be more desirable for the formation of microlenses or other layers over the color filter array.

Abstract: The invention provides a dye-containing curable composition that has the property of high sensitivity, and that even when formed into a thin film at high dye concentration, excels in patternability, and is free from dye elution and ensures high productivity; and a color filter making use of the dye-containing curable composition and a method for producing the same. The dye-containing curable composition contains an organic-solvent-soluble dye (A) and a curing agent (C), wherein a content of the organic-solvent-soluble dye (A) is 45% by mass or more based on a total solid content and a content of the curing agent (C) is 20% by mass to 55% by mass based on the total solid content.

Abstract: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) a polymerizable compound, (C) a photopolymerization initiator (D) a resin, and (E) an organic solvent, the photopolymerization initiator (C) using in combination two or more types of photopolymerization initiators including at least one type of oxime-based photopolymerization initiator. There are also provided a light-shielding color filter having a pattern formed by using the photosensitive resin composition, a process for producing a light-shielding color filter that includes a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern, and an image sensor having the light-shielding color filter.

Abstract: The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking.

Abstract: A color filter is provided which is formed by using a small mask continuous exposure method in which a portion between adjacent exposed areas is shielded from light by a blind shutter, and which has dummy photo spacers formed on a colored layer outside a display pixel area at a uniform height. Firstly, by using the small mask continuous exposure method, a colored layer is formed which extends in the X-axis direction astride the display pixel area and a frame area. At this time, the edges of the blind shutter which are parallel to the Y axis are each positioned so as to be distant by 500 ?m to 1000 ?m from a side which forms the outer circumference of the outermost opening and which is closest to the frame area extending in the Y-axis direction. Next, photo spacers are formed on the colored layer such that the central axis of each photo spacer is positioned in a range of positions that are distant by 300 ?m or less from a side which is closest to the frame area extending in the Y-axis direction.

Abstract: The present invention provides a dye-containing negative curable composition comprising at least two dyes (A), an oxime photopolymerization initiator (B) and a radical polymerizable monomer (C); or a dye-containing negative curable composition comprising at east two organic-solvent soluble dyes (A), an oxime photopolymerization initiator (B), a radical polymerizable monomer (C) and an organic solvent (D), wherein the moisture content of the composition is less than 1% by mass relative to the total amount of the composition.

Abstract: Use of pigments of the formula (I) containing melamine as guest compound and having a dispersion harshness of more than 250 as pigments for color filters for liquid-crystal displays.

Abstract: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) two or more types of polymerizable compounds, (C) a resin, (D) a photopolymerization initiator, and (E) an organic solvent. There are also provided a light-shielding color filter formed by using the photosensitive resin composition, and a process for producing a light-shielding color filter, the process including a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern. Furthermore, there is provided an image sensor that includes the light-shielding color filter.

Abstract: An azo compound represented by Formula (I), Formula (II), or Formula (III): wherein R1 and R2 each independently represent a hydrogen atom or a substituent; D1 and D2 each independently represent a coupler residue; Z1 and Z2 each independently represent —C(R3)? or —N?; and R3 represents a hydrogen atom or a substituent.

Abstract: A retardation layer that includes regions causing different retardations can be manufactured easily. A retardation substrate includes a substrate and a solidified liquid crystal layer supported by the substrate. The solidified liquid crystal layer includes first to third regions. The first to third regions re arranged on the substrate and different in degree of orientation of mesogens.

Abstract: Disclosed is a full color liquid crystal display, including a lower substrate and an upper substrate facing each other, partition spacers uniformly arranged between the lower substrate and the upper substrate to form a plurality of spaces while maintaining a cell gap between the lower substrate and the upper substrate, a lower transparent electrode and an upper transparent electrode respectively provided to the lower substrate and the upper substrate in the spaces defined by the partition spacers so as to face each other, subpixels having liquid crystals which are able to reflect or absorb respective specific light wavelengths and which are separately received in the spaces defined by the partition spacers, a plurality of such subpixels constituting a single pixel to exhibit full color.

Abstract: Disclosed is a blue resin composition for a color filter that includes a colorant including an azaporphyrin-based dye and a blue pigment, an acrylic-based binder resin, a reactive unsaturated compound, a polymerization initiator, and a solvent.

Abstract: A colored photosensitive resin composition comprising (1) an alkali-soluble binder, (2) a monomer or an oligomer, (3) a photopolymerizaton initiator or a photopolymerization initiator system, and (4) a coloring agent, wherein the coloring agent is a specific pigment in a specific quantity. Also provided is a color filter obtained by using the colored photosensitive resin compositions for formation of the respective photosensitive resin layers of R, G and B.

Abstract: Actinically modifiable composition comprising, all based on the entire composition, 10-70% by weight of a colorant or a mixture of colorants; 90-30% by weight of actinically reactive binder material consisting of components selected from the group consisting of binders, binder precursors, dispersants, photoinitiators and stabilizers, although optionally from 0% 30% by weight of the actinically reactive binder material can be non-reactive components; and 0-10% by weight of further, non-reactive constituents; characterized in that the composition has an optical density ?1.0, preferably ?1.2 and more preferably ?1.4 in the entire wavelength range 430-650 nm per 1 ?m layer thickness; and the colorant or 50-100% by weight, preferably 60-100% by weight and more preferably 70-100% by weight of the colorant mixture comprises a colorant obtainable by reaction of a compound of the formula (I) with a compound of the formula (II) in a molar ratio of 1:2, in the presence of a catalyst having a pK value ?4.

Abstract: The invention provides a polymerizable composition including an oxime ester photopolymerization initiator, an organic acid anhydride having a molecular weight of 300 or less, and a polymerizable compound.

Abstract: Provided is a pigment dispersion composition suitable for a colored curable composition which enables retaining adhesion capability of a colored pattern and inhibiting the generation of residues, even when a relatively severe development condition is employed. Furthermore, a red colored composition capable of forming a red colored thin film with excellent spectral characteristics. The pigment composition contains an azo pigment represented by the following Formula (1); at least one of acidic functional group-containing organic pigment derivative, anthraquinone derivative, and triazine derivative; and a dispersant. The red colored composition contains a red pigment; a yellow pigment; and a dispersant, in which specific spectral characteristics are satisfied when a colored transmitting film having a thickness of 0.6 ?m is formed using the red colored composition.

Abstract: A method is provided for manufacturing a film formation member having a dividing wall provided on a substrate to form a plurality of partitioned sections with a film being formed within each of the partitioned sections by discharging a predetermined amount of liquid within each of the partitioned sections. The method includes identifying a position of at least one of the partitioned section as a partitioned section with nonuniform liquid affinity among the partitioned sections, and discharging the liquid over a wider discharge range inside the partitioned section with nonuniform liquid affinity than a discharge range inside a partitioned section other than the partitioned section with nonuniform liquid affinity.

Abstract: The invention provides a dispersed composition including: (A) titanium black; (B) a polymer compound including a constituent component having a side chain structure to which an acidic group is linked via a linking group; and (C) a solvent. The (B) polymer compound is a polymer having a structure in which an acidic group is linked to a main chain part via a linking group.

Abstract: The present invention provides a dye-containing negative curable composition comprising at least two dyes (A), an oxime photopolymerization initiator (B) and a radical polymerizable monomer (C); or a dye-containing negative curable composition comprising at east two organic-solvent soluble dyes (A), an oxime photopolymerization initiator (B), a radical polymerizable monomer (C) and an organic solvent (D), wherein the moisture content of the composition is less than 1% by mass relative to the total amount of the composition.

Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.