Coating Process Making Radiation Sensitive Element Patents (Class 430/935)
  • Publication number: 20030232131
    Abstract: In a method and an apparatus for coating an object with photosensitive material, a roller stabilizes a supply amount of the photosensitive material and is disposed between the object and a slit coater, so that the stabilized photosensitive material is supplied to the object through the slit coater. The photosensitive material includes additives for controlling amount of a solid powder, a boiling point and a surface tension thereof. Accordingly, the photosensitive material may be uniformly coated on the object.
    Type: Application
    Filed: May 1, 2003
    Publication date: December 18, 2003
    Applicant: Samsung Electronics Co., Ltd.
    Inventor: Sung-Ki Jung
  • Publication number: 20030219663
    Abstract: The present invention relates to an imaging member comprising an imaging layer and at least one stiffening layer comprising a blend of polyolefin polymer and amorphous hydrocarbon resin. The invention further describes a method for making the imaging member, comprising extruding a foam polymer sheet, orienting the foam polymer sheet, bringing a stiffening layer comprising a blend of polyolefin polymer and amorphous hydrocarbon resin into contact with the oriented foam polymer sheet, and applying an imaging layer above the stiffening layer. A second method of forming an imaging member comprises extruding a foam polymer sheet, bringing at least one stiffening layer comprising a blend of polyolefin polymer and amorphous hydrocarbon resin into contact with the foam polymer sheet, orienting said foam polymer sheet and said stiffening layer and applying an imaging layer above said stiffening layer.
    Type: Application
    Filed: May 24, 2002
    Publication date: November 27, 2003
    Applicant: Eastman Kodak Company
    Inventors: Suresh Sunderrajan, Narasimharao Dontula, Peter T. Aylward, Nicholas I. Phippen
  • Patent number: 6649320
    Abstract: A process for producing a donor sheet for a thin-film formation comprising: while transporting a sheet on which a light-to-heat conversion layer has already been formed, forming a transfer layer on the light-to-heat conversion layer and drying the transfer layer.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: November 18, 2003
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Yoshitaka Kawase
  • Publication number: 20030211756
    Abstract: There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port disposed in a nozzle, moving the nozzle and substrate with respect to each other, and holding the supplied solution onto the substrate to form a liquid film, wherein a distance h between the discharge port of the nozzle and the substrate is set to be not less than 2 mm and to be in a range less than 5×10−5 q&ggr; (mm) given with respect to a surface tension &ggr; (N/m) of the solution, discharge speed q (m/sec) of the solution continuously discharged through the discharge port, and a constant of 5×10−5 (m·sec/N).
    Type: Application
    Filed: January 29, 2003
    Publication date: November 13, 2003
    Inventors: Shinichi Ito, Tatsuhiko Ema, Kei Hayasaki, Rempei Nakata, Nobuhide Yamada, Katsuya Okumura
  • Patent number: 6645704
    Abstract: The present invention is related to a method of making a color photothermographic element such as a capture film intended to be developed to yield an image by the application of heat, preferably without the addition of processing solutions. In particular, this invention relates to the annealing of a photothermographic imaging element prior to storage and use. It has been found that the use of such an annealing process improves raw stock storage and hence, the performance of color photothermographic systems.
    Type: Grant
    Filed: November 26, 2002
    Date of Patent: November 11, 2003
    Assignee: Eastman Kodak Company
    Inventor: David H. Levy
  • Publication number: 20030180664
    Abstract: A photoimageable, aqueous acid soluble polyimide polymer comprising an anhydride, including a substituted benzophenone nucleus, a diamine reacted with the anhydride to form a photosensitive polymer intermediate, and at least 60 Mole % of solubilizing amine reacted with the photosensitive polymer intermediate to form the photoimageable, aqueous acid soluble polyimide polymer. An emulsion for electrophoretic deposition of a coating of a photoimageable, aqueous acid soluble polyimide polymer comprises a dispersed phase, including the photoimageable aqueous acid soluble polyimide polymer, dissolved in an organic solvent and a dispersion phase including a coalescence promoter and water. The emulsion may be applied, by electrophoretic deposition, to a conductive structure to provide a photoimageable coating on the conductive structure.
    Type: Application
    Filed: March 18, 2003
    Publication date: September 25, 2003
    Applicant: 3M Innovative Properties Company
    Inventors: Guoping Mao, Hany B. Eitouni, Alphonsus V. Pocius
  • Patent number: 6620576
    Abstract: A method for fabricating a structure on a substrate with a low contrast photoresist having a height greater than 15 microns is provided. A uniformly thick film of photoresist is achieved on a substrate by spinning the substrate at two different speeds, then at least partially, but not fully drying the layer of photoresist at ambient temperature. The layer of photoresist is then dried and hardened by applying heat to the bottom surface of the substrate via a hot plate. The substrate is maintained level at all times during the spinning and drying steps in order to prevent wedging of the photoresist which remains in a plastic state until fully hardened by the hot plate. A surface relief pattern is then created in the photoresist via a scanning beam of electromagnetic radiation, which is preferably a laser beam. The resulting exposed surface relief patterns are then developed to produce the desired structure, which has a height of 15 microns or greater.
    Type: Grant
    Filed: April 10, 2002
    Date of Patent: September 16, 2003
    Assignee: Corning Incorporated
    Inventor: Daniel H. Raguin
  • Patent number: 6613502
    Abstract: A silver halide color photographic light-sensitive material having at least one blue-sensitive emulsion layer, at least one green-sensitive emulsion layer, and at least one red-sensitive emulsion layer on a transparent support, wherein the transparent support is a plastic support having two surfaces undercoated with an undercoat solution containing at least one compound selected from the group consisting of a water-miscible organic solvent except for alcohols, a substituted phenol having a molecular weight of 200 or less, and a substituted acetic acid in which at least one hydrogen atom on a methyl group of acetic acid is substituted with a halogen atom, and at least one photosensitive emulsion layer contains a specific coupler.
    Type: Grant
    Filed: December 17, 2002
    Date of Patent: September 2, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Naoto Matsuda, Hisashi Mikoshiba
  • Patent number: 6610464
    Abstract: A process for patterning a non-rigid membrane in a closed gap environment including the optional step of applying a solvent to the non-rigid membrane, applying a layer of an energy-sensitive composition to the non-rigid membrane, spinning the non-rigid membrane, inverting the non-rigid membrane with the layer of an energy-sensitive composition, spinning the inverted non-rigid membrane, re-inverting the non-rigid membrane, and spinning the re-inverted, non-rigid membrane. As a result of the inverting step and the inverted spinning step, the layer of an energy-sensitive composition does not cause the non-rigid membrane to sag and the resulting layer of energy-sensitive composition is substantially uniform in thickness. The energy-sensitive composition may be a photoresist, such as a chemically amplified photoresist.
    Type: Grant
    Filed: May 24, 2001
    Date of Patent: August 26, 2003
    Assignee: Agere Systems Inc.
    Inventor: Leonidas E. Ocola
  • Publication number: 20030157445
    Abstract: In accordance with one embodiment of the invention, a photographic element is described comprising a support bearing one or more hydrophilic colloid layers including at least one photographic silver halide emulsion layer, wherein sequestered silver ions are incorporated into at least one hydrophilic colloid layer in the form of a silver ion containing material which sequesters silver ions prior to photographic processing and releases silver ions upon exposure to photographic processing solutions. Method for preparing and processing such photographic element are also described. In accordance with particular embodiments of the invention, the silver ion containing material comprises a silver ion-exchanged zeolite material or an intercalation composition comprising a layered host material having silver ions inserted as guest ions between the layers of the host material.
    Type: Application
    Filed: December 28, 2001
    Publication date: August 21, 2003
    Inventors: Joseph F. Bringley, Kenneth J. Lushington, Tiecheng A. Qiao, James S. Honan
  • Publication number: 20030157425
    Abstract: A process for producing a donor sheet for a thin-film formation comprising: while transporting a sheet on which a light-to-heat conversion layer has already been formed, forming a transfer layer on the light-to-heat conversion layer and drying the transfer layer.
    Type: Application
    Filed: February 19, 2002
    Publication date: August 21, 2003
    Inventor: Yoshitaka Kawase
  • Publication number: 20030138730
    Abstract: A printing plate for computer-to plate lithography having a laser-ablatable member supported by a substrate. At least one portion of the laser-ablatable member is formed form an acrylic polymer containing laser-sensitive particles. The laser-sensitive particles absorb imaging radiation and cause the portion of the laser-ablatable member containing the laser sensitive particles and any overlying layers to be ablated.
    Type: Application
    Filed: February 5, 2003
    Publication date: July 24, 2003
    Inventors: David S. Bennett, Sallie L. Blake, Daniel L. Serafin, Jean Ann Skiles, Robert E. Bombalski, Clinton S. Zediak, Gary A. Nitowski, Joseph D. Guthrie
  • Patent number: 6593076
    Abstract: A photothermographica material is disclosed, comprising an organic silver salt and a light sensitive silver halide, wherein the photothermographic material contains a hydrophilic binder of 0.5 to 2 g per mol of the organic silver salt and the organic silver salt having been formed in the presence of the silver halide of 7×1015 to 3×1017 grains per mol of the organic salt.
    Type: Grant
    Filed: April 18, 2001
    Date of Patent: July 15, 2003
    Assignee: Konica Corporation
    Inventors: Keiko Maeda, Tetsuo Shima, Kazuyoshi Goan
  • Patent number: 6586171
    Abstract: Since a coating film is cured to some extent by the gelation of the coating film in the chilling-zone process and the first-stage drying in the PAC drying process, then, it is fully dried by the second-stage drying in the HAC drying process, liquid scattering from the surface of the coating film during drying can be prevented, even if the binder is difficult to cure as in the coating film for a thermal-developable light-sensitive material. Thereby, good coating film surface condition and good photographic performance can be obtained.
    Type: Grant
    Filed: April 29, 2002
    Date of Patent: July 1, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Junpei Iwado
  • Publication number: 20030099898
    Abstract: The present invention provides a heat-developable photosensitive material having a substrate, an undercoat layer and a photosensitive layer containing silver behenate in this order, wherein an adhesive roll having an adhesive force of at least 35 hPa is brought into contact with one face or both faces of the photosensitive material before the photosensitive layer is formed, and a method of producing the same.
    Type: Application
    Filed: September 27, 2002
    Publication date: May 29, 2003
    Inventor: Yoshimitsu Ito
  • Patent number: 6566032
    Abstract: An in-situ method for fabricating, at least in part, an OLED device that is moisture- or oxygen-sensitive, such method comprising the steps of: providing into a controlled atmosphere coater a receiver element which will form part of the OLED device; providing into the controlled atmosphere coater a donor support element and coating such donor support element to produce a donor element with one or more layers required to produce all or part of the OLED device; controlling the atmosphere in the controlled atmosphere coater under controlled conditions; positioning the coated side of the donor element in material transferring relationship to the receiver element to be coated; and applying radiation to the donor element to selectively transfer one or more layers from the donor element to the receiver element.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: May 20, 2003
    Assignee: Eastman Kodak Company
    Inventors: Michael L. Boroson, Myron W. Culver, Lee W. Tutt
  • Publication number: 20030091942
    Abstract: A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability.
    Type: Application
    Filed: June 25, 2002
    Publication date: May 15, 2003
    Inventors: Hong-Sick Park, Jin-Ho Ju, Yu-Kyung Lee, Sung-chul Kang, Sae-Tae Oh, Doek-Man Kang
  • Publication number: 20030087170
    Abstract: A photoimageable composition comprising finely divided particles of inorganic material comprising coated silver particles that are at least partially coated with at least one surfactant and inorganic binder dispersed in organic medium comprising an aqueous developable polymer, photo-initiation system and organic solvent.
    Type: Application
    Filed: September 27, 2002
    Publication date: May 8, 2003
    Inventors: Howard David Glicksman, Haixin Yang
  • Patent number: 6558877
    Abstract: A system and method is disclosed for coating a conventional wafer or a spherical shaped semiconductor substrate with liquid material such as photoresist by utilizing a “drop on demand” piezo driven dispense nozzle, a bubble-jet dispense nozzle, or a continuous piezo jet with charging electrodes. The proposed system and method will greatly reduce, and in some cases virtually eliminate, the waste of photoresist in the process.
    Type: Grant
    Filed: May 31, 2000
    Date of Patent: May 6, 2003
    Assignee: Ball Semiconductor, Inc.
    Inventors: Akihito Ishikawa, Tomoki Tanaka, Nobuo Takeda, Masataka Yoshida
  • Patent number: 6558895
    Abstract: A process for preparing monosheet black and white photothermographic recording material, the photothermographic recording material being exclusive of a dye-providing compound and comprising a support and a photo-addressable thermally developable element, the photo-addressable thermally developable element being thermally developable under substantially water-free conditions and consisting of one or more layers, the layers together comprising photosensitive silver halide, a substantially light-insensitive organic silver salt, a reducing agent therefor in thermal working relationship therewith and a binder, comprising the steps of: (i) coating at least one of the one or more layers of the photo-addressable thermally developable from an aqueous medium; (ii) drying the layer or layers coated in step (i); and (iii) heating the photothermographic recording material at a temperature of at least 35° C. in the dark for a period of at least 3 days; and a photothermographic recording material obtainable therewith.
    Type: Grant
    Filed: August 27, 2001
    Date of Patent: May 6, 2003
    Assignee: Agfa-Gevaert
    Inventors: Herman Uytterhoeven, Luc Vissers
  • Patent number: 6555309
    Abstract: In the case where multiple slide hopper is used for simultaneous multilayer bead coating of photosensitive material, streak defect is occasionally cause, particularly in the case of coating photothermographic material, especially when the outermost layer includes materials capable of increasing optical density such as toner it more frequently happens. It is found that streak defect is restrained when meniscus curvature of upper side bead becomes less than 7.2 mm−1. This condition can be kept by selecting a proper value of clearance between the web surface and the lip of the slide hopper, that is from 0.10 mm to 0.40 mm, and a proper value of pressure in a lower side of the bead, that is from −100 Pa to −700 Pa.
    Type: Grant
    Filed: December 11, 2001
    Date of Patent: April 29, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Akifumi Kato
  • Patent number: 6551770
    Abstract: A heat developable photosensitive material comprising at least two layers is disclosed. The first layer is formed by coating a first coating composition containing the organic silver salt, the photosensitive silver halide, the reducing agent, polymer latex in an amount of at least 30 percent by weight of the first layer at dried state and a solvent, the solvent comprising water in an amount of at least 50 percent by weight of the solvent, and the second layer is formed by coating a second coating composition comprising a polymer latex in an amount of at least 50 percent of the second layer at dried state and a solvent, the solvent comprising water in an amount of at least 60 percent by weight of the solvent, and the second coating composition having a viscosity of from 50 to 1,000 cP at 25 ° C., and the viscosity at 5° C being at least 1.5 times higher than that at 25° C.
    Type: Grant
    Filed: June 25, 2001
    Date of Patent: April 22, 2003
    Assignee: Konica Corporation
    Inventor: Kazuhiko Hirabayashi
  • Publication number: 20030072886
    Abstract: A method of forming a liquid film characterized by dropping a liquid on a substrate from a dropping unit while rotating the substrate, moving the dropping unit in the radial direction from the inner periphery of the substrate to the outer periphery of the substrate so that the move pitch of the dropping unit in the radial direction occurring in every revolution of the substrate may change slightly, and forming a liquid film on the substrate by adjusting the feed speed of the liquid to the substrate from the dropping unit, while lowering the rotational frequency of the substrate gradually, so that the liquid on the substrate may not move due to centrifugal force by rotation of the substrate, along with the move of the dropping unit in the radial direction of the substrate.
    Type: Application
    Filed: July 25, 2002
    Publication date: April 17, 2003
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventor: Shinichi Ito
  • Patent number: 6544722
    Abstract: The invention is directed to a process for the preparation of polymer laminated base paper, said process comprising laminating a base paper web on at least one side thereof with at least one polymer layer by extrusion-coating at a coating speed of 300 m/min or more, wherein the said base paper web is heated prior to laminating.
    Type: Grant
    Filed: March 2, 2001
    Date of Patent: April 8, 2003
    Assignee: Fuji Photo Film B.V.
    Inventors: Jan Bastiaan Bouwstra, Ieke de Vries
  • Patent number: 6544719
    Abstract: A cost efficient method of making a lithographic printing plate precursor is disclosed, the method comprising the steps of coating a silver halide emulsion layer on a hydrophilic base which is provided with physical development nuclei; simultaneously with the preceding step, coating on the emulsion layer a solution that induces silver salt diffusion transfer reversal development of the silver halide; allowing diffusion of complexed silver ions to the physical development nuclei, thereby forming silver metal that is deposited on the hydrophilic base; a wash-off step wherein the emulsion layer is removed from the silver metal. The material thus obtained can be exposed image-wise in heat-mode, e.g. by means of an infrared laser, thereby ablating the silver metal and revealing the hydrophilic base at exposed areas. Immediately after exposure, it can be used as a lithographic printing plate without the need for a wet processing step.
    Type: Grant
    Filed: June 18, 2002
    Date of Patent: April 8, 2003
    Assignee: Agfa-Gevaert
    Inventors: Paul Coppens, Ludo Vervloet
  • Patent number: 6509136
    Abstract: A process of drying a cast film polymeric disposed upon a workpiece. In this process a cast polymeric film, which includes a volatile organic compound therein, disposed on a workpiece, is contacted with an extraction agent which may be liquid carbon dioxide or supercritical carbon dioxide.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: January 21, 2003
    Assignee: International Business Machines Corporation
    Inventors: Dario L. Goldfarb, Kenneth John McCullough, David R. Medeiros, Wayne M. Moreau, John P. Simons, Charles J. Taft
  • Patent number: 6496245
    Abstract: The present invention is a method of supplying a developing solution to an entire face of a substrate to perform a developing treatment, including the steps of: moving a developing solution supply nozzle at a predetermined speed at least from one end to another end of the substrate while the developing solution is being supplied; measuring an amplitude of a wave on a solution face of the developing solution supplied on the substrate after the supply of the developing solution; and changing the predetermined speed of the developing solution supply nozzle based on a measured value. Accordingly, it is unnecessary to measure a line width or the like which is finally formed on the substrate before correction as in the conventional art, and thus the correction can be made earlier as compared with the conventional case, resulting in a reduced number of defective items and improved yield.
    Type: Grant
    Filed: April 23, 2001
    Date of Patent: December 17, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Hitoshi Kosugi, Hideharu Kyouda
  • Publication number: 20020187433
    Abstract: A process for patterning a non-rigid membrane in a closed gap environment including the optional step of applying a solvent to the non-rigid membrane, applying a layer of an energy-sensitive composition to the non-rigid membrane, spinning the non-rigid membrane, inverting the non-rigid membrane with the layer of an energy-sensitive composition, spinning the inverted non-rigid membrane, re-inverting the non-rigid membrane, and spinning the re-inverted, non-rigid membrane. As a result of the inverting step and the inverted spinning step, the layer of an energy-sensitive composition does not cause the non-rigid membrane to sag and the resulting layer of energy-sensitive composition is substantially uniform in thickness. The energy-sensitive composition may be a photoresist, such as a chemically amplified photoresist.
    Type: Application
    Filed: May 24, 2001
    Publication date: December 12, 2002
    Inventor: Leonidas E. Ocola
  • Publication number: 20020187426
    Abstract: A laser imageable article includes an imageable layer that comprises the reaction product of a metal precursor and a reactant. The imageable article also includes a first boundary layer on a first side of the imageable layer, the first boundary layer being substantially transparent to laser radiation, and a second boundary layer on a second side of the imageable layer. The imageable layer may be imaged with a laser through the first boundary layer while maintaining the continuity of the first boundary layer. In a preferred embodiment, the imageable layer comprises the reaction product of an ion of one or more metals selected from columns 8, 9, and 10 of the periodic table of elements and a reducing agent selected from hypophosphorus acid and salts thereof, sodium borohydride, and dimethylamine borane. One preferred embodiment of the imageable layer comprises from 1 to 30 mole percent phosphorus and up to 99 mole percent nickel.
    Type: Application
    Filed: May 25, 2001
    Publication date: December 12, 2002
    Inventors: Haitao Huang, Michael N. Miller, Gary A. Shreve, Robert D. Waid
  • Publication number: 20020177064
    Abstract: An object of the present invention is to provide a method for manufacturing an aluminum printing plate which is superior in fine line reproduction and has no occurrence of spot-like defect in the silver image part. According to the present invention, a method for manufacturing a lithographic printing plate is provided, wherein an aluminum plate subjected to at least graining treatment and anodizing treatment is rinsed with water, then coated with a liquid containing physical development nuclei, and subsequently coated with a silver halide emulsion layer.
    Type: Application
    Filed: March 8, 2002
    Publication date: November 28, 2002
    Inventor: Jun Yamada
  • Publication number: 20020160319
    Abstract: A film forming method for obtaining a resist film of a uniform thickness on a substrate includes the steps of treating the surface of the substrate is treated with a HMDS (hexamethyldisilazane) process, then a pre-wetting process is conducted, and a resist liquid is applied just after the pre-wetting process is competed. In the pre-wetting process, a solvent is used which is capable of dissolving the resist liquid, and preferably the same solvent as used in the resist liquid. The application of both the resist liquid and the pre-wet liquid are conducted by rotating the substrate by means of a spinner after the liquid is dripped at the center of the substrate. It is preferable that the application of the resist liquid is contiguous to the application of the pre-wet liquid as much as possible. After the application of the resist liquid is completed, the substrate is put on a hot plate, a baking process is conducted, and a resist film is formed.
    Type: Application
    Filed: April 25, 2002
    Publication date: October 31, 2002
    Applicant: Tokyo Ohka Kogyo Co. Ltd.
    Inventor: Hiroki Endo
  • Patent number: 6472136
    Abstract: A method for forming a dispersion of an oil-soluble photographically useful compound in water or a hydrophilic colloid composition is disclosed, comprising dispersing the compound in the presence of a water-soluble anionic group containing polymeric surfactant, wherein the polymeric surfactant comprises a copolymer obtained from the copolymerization of a maleic anhydride monomer and a copolymerizable ethylenically unsaturated hydrophobic monomer and the anionic groups of the polymeric surfactant comprise primarily carboxy groups obtained upon base hydrolysis of the anhydride groups of the copolymer. The use of hydrolyzed maleic anhydride derived copolymers in place of conventional small-molecule surfactants as a dispersing agent to stabilize photographically active water-insoluble dye couplers or other organic oil-soluble photographically useful compounds enables a dramatic reduction of crystallization of such organic molecules on long-term keeping.
    Type: Grant
    Filed: September 5, 2001
    Date of Patent: October 29, 2002
    Assignee: Eastman Kodak Company
    Inventors: Julia S. Tan, Kurt M. Schroeder, Delaina A. Amos
  • Patent number: 6468715
    Abstract: A thermal mass transfer donor element is provided that includes a thermal transfer layer and a light-to-heat conversion layer, wherein the light-to-heat conversion layer has at least two regions exhibiting different absorption coefficients. The thermal transfer donor elements provided can improve imaging performance by increasing transfer sensitivity and decreasing imaging defects.
    Type: Grant
    Filed: March 28, 2001
    Date of Patent: October 22, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Thomas R. Hoffend, Jr., John S. Staral
  • Patent number: 6461794
    Abstract: A lithographic printing form precursor comprises an imagable coating on a roughened and anodized aluminum support. The precursor is prepared by a process comprising: (a) anodising an aluminum sheet; and (b) without having effected a chemical treatment step after the anodising step, applying a composition comprising a polymeric substance to the anodised surface of the aluminum sheet and drying the composition to form the imagable coating thereon, wherein the coating contains a pigment and does not contain a dye. Undesired staining of the lithographic printing form during development is avoided by using the precursor in the lithographic printing process.
    Type: Grant
    Filed: August 11, 1999
    Date of Patent: October 8, 2002
    Assignee: Kodak Polychrome Graphics LLC
    Inventor: Geoff Horne
  • Patent number: 6458525
    Abstract: A method for preparing a photothermographic material comprising an organic silver salt is disclosed, comprising a step of treating the organic silver salt under a gas atmosphere containing an inert gas having a volume fraction of not less than 85% or under a gas atmosphere containing oxygen gas having a volume fraction of not more than 15%. Packaging the photothermographic material under the inert gas atmosphere is also disclosed.
    Type: Grant
    Filed: November 3, 2000
    Date of Patent: October 1, 2002
    Assignee: Konica Corporation
    Inventors: Hideki Takiguchi, Hitoshi Adachi, Hideki Hoshino, Shu Nishiwaki
  • Patent number: 6455240
    Abstract: A method of reducing the tendency toward formation of coating non-uniformities in the coating of multilayer photographic elements is disclosed. More particularly, the present invention involves the coating of a non-gelatin coating over a topmost gelatin layer in a photographic element. In one embodiment, a processing-solution-permeable overcoat is simultaneously coated with the emulsion layers onto a photographic substrate, which overcoat becomes water and stain resistant in the photochemically processed product. In the latter embodiment, the overcoat formulation comprises at least one water-dispersible hydrophobic polymer interspersed with a water-soluble polymer.
    Type: Grant
    Filed: April 27, 2001
    Date of Patent: September 24, 2002
    Assignee: Eastman Kodak Company
    Inventors: Ryan B. Adams, Lloyd A. Lobo, Mridula Nair, David C. Boris, Kevin M. Donovan
  • Patent number: 6444320
    Abstract: New polymers and anti-reflective or fill compositions including those polymers are provided. The polymer comprises recurring monomers according to the formula wherein R comprises a light attenuating compound. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process.
    Type: Grant
    Filed: January 8, 2001
    Date of Patent: September 3, 2002
    Assignee: Brewer Science
    Inventors: Satoshi Takei, Yasuhisa Sone, Ken-Ichi Mizusawa
  • Patent number: 6444409
    Abstract: A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprises: a scrubbing unit for scrubbing the substrate; a coating unit having a plurality of resist discharge nozzles for respectively discharging a plurality of color resists on the scrubbed substrate; and a developing unit for developing the substrate coated with the color resists after exposure. Accordingly, reduction in size of apparatus and space savings can be achieved, and manufacturing cost can also be reduced.
    Type: Grant
    Filed: June 7, 2001
    Date of Patent: September 3, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Shinichiro Araki, Shinko Matsumoto, Noriyuki Anai
  • Patent number: 6432623
    Abstract: A method of processing a photographic imaging element to obtain a protective overcoat is disclosed, which overcoat provides, in the final product, resistance to fingerprints, common stains, and spills. More particularly, the present invention involves a processing-solution-permeable overcoat that becomes water and stain resistant in the photochemically processed product. The overcoat formulation comprises at least one water-dispersible hydrophobic polymer interspersed with a water-soluble polymer. During development or thereafter, before drying, the water-soluble polymer is removed to a significant extent. Subsequently, the imaged element is dried at an elevated temperature to facilitate coalescence of the overcoat to thereby provide enhanced stain resistance and water-resistance.
    Type: Grant
    Filed: April 27, 2001
    Date of Patent: August 13, 2002
    Assignee: Eastman Kodak Company
    Inventors: Kevin M. Donovan, Lloyd A. Lobo
  • Publication number: 20020106595
    Abstract: In the case where multiple slide hopper is used for simultaneous multilayer bead coating of photosensitive material, streak defect is occasionally cause, particularly in the case of coating photothermographic material, especially when the outermost layer includes materials capable of increasing optical density such as toner it more frequently happens. It is found that streak defect is restrained when meniscus curvature of upper side bead becomes less than 7.2 mm−1. This condition can be kept by selecting a proper value of clearance between the web surface and the lip of the slide hopper, that is from 0.10 mm to 0.40 mm, and a proper value of pressure in a lower side of the bead, that is from −100 Pa to −700 Pa.
    Type: Application
    Filed: December 11, 2001
    Publication date: August 8, 2002
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Akifumi Kato
  • Publication number: 20020098452
    Abstract: A photographic film comprising a base layer and at least one emulsion layer, the emulsion layer having a melting temperature that is within 4 degrees centigrade of the incubation temperature used in an accelerated core-set test.
    Type: Application
    Filed: December 6, 2000
    Publication date: July 25, 2002
    Inventors: Jehuda Greener, Yongcai Wang, Gary W. Visconte
  • Patent number: 6420102
    Abstract: Thermographic and photothermographic materials comprise a barrier layer to provide physical protection and to prevent migration of diffusible imaging components and by-products resulting from high temperature imaging and/or development. The barrier layer comprises a film-forming acrylic or methacrylic acid ester or amide polymer(s) that has a molecular weight of at least 8000 g/mole and comprises hydroxy functionality in from about 15 to 100 mole % of the acrylic or methacrylic acid ester or amide recurring units. This barrier layer is capable of retarding diffusion of mobile chemicals such as fatty carboxylic acids, developers, and toners. This barrier layer can also include at least one other film-forming polymer to provide a clear and scratch-resistant surface.
    Type: Grant
    Filed: July 27, 2001
    Date of Patent: July 16, 2002
    Assignee: Eastman Kodak Company
    Inventors: Charles L. Bauer, Michelle L. Horch, Anne M. Miller, David M. Teegarden, Bryan V. Hunt, Kumars Sakizadeh
  • Patent number: 6420081
    Abstract: The invention relates to a process for the production of a photosensitive recording material for the production of offset printing plates which comprises a dimensionally stable, two-dimensional support of a metal or metal alloy and a silver halide-containing, photosensitive layer on the front of the support and a layer which essentially consists of an organic polymeric material and is resistant to processing chemicals on the back of the support. The layer on the back of the support is applied before the photosensitive coating on the front. The invention furthermore relates to a corresponding recording material in which the layer on the back comprises at least one organic polymer having a glass transition temperature Tg of 50° C. or above. Due to the back coating, the formation of local elements between the metallic support and the silver-containing layer is reliably prevented when the recording materials are stacked.
    Type: Grant
    Filed: April 26, 2001
    Date of Patent: July 16, 2002
    Assignee: AGFA-Gevaert
    Inventors: Andreas Elsässer, Michael Dörr, Steffen Denzinger, Paul Coppens
  • Patent number: 6413706
    Abstract: There is disclosed a method for producing an aqueous dispersion of a water-insoluble photographically useful compound, by mixing a composition containing at least one water-insoluble photographically useful organic compound with an aqueous medium, and finely dividing the mixture into particulates by a super-high-pressure homogenizer at 180 MPa (1800 bar) or higher. According to the method, the aqueous dispersion of the water-insoluble photographically useful compound can be produced without using a low-boiling solvent, with excellent energy efficiency and in a simple step. Further, there is also disclosed a silver halide photographic light-sensitive material utilizing the dispersion.
    Type: Grant
    Filed: May 11, 2000
    Date of Patent: July 2, 2002
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masatoshi Nakanishi, Hirokazu Saito
  • Patent number: 6410194
    Abstract: When a resist film is formed by discharging a resist solution onto the front face of a wafer housed in a cup, a relation between the film thickness of a resist film and the line width of a circuit pattern when the resist film is exposed into a predetermined pattern and thereafter developed is obtained in advance, from that relation, a line width with less variations corresponding to the changes in film thickness of the resist film is selected from among line widths within a designated region to form a resist film to have the film thickness corresponding to the selected line width. Accordingly, the line width of the circuit pattern after development is not likely to vary regardless of the changes in film thickness of the resist film formed on the wafer.
    Type: Grant
    Filed: February 3, 2000
    Date of Patent: June 25, 2002
    Assignee: Tokyo Electron Limited
    Inventor: Kosuke Yoshihara
  • Patent number: 6395448
    Abstract: The present invention is a method of depositing a lubricating layer on an imaging element. The method includes providing a polymer or a wax selected from the group consisting of polytetrafluoroethylene (PTFE), fluorinated ethylene propylene (FEP), fluorinated ethylene copolymers, polyethylenes, high density polyethylene, natural waxes such as Carnauba wax, synthetic waxes, and silicone waxes in a deposition chamber. The chamber is evacuated to a pressure of 10−1 Torr or less. A carrier gas, preferably selected from N2, O2, Ar, is bled into the chamber while maintaining the pressure in the chamber to 100 mTorr or less. The polymer or wax is heated to a temperature sufficient to vaporize the polymer or wax, and the imaging element is continuously moved through the chamber depositing the polymer or wax on the imaging element to form the lubricating layer.
    Type: Grant
    Filed: December 1, 1999
    Date of Patent: May 28, 2002
    Inventors: Dennis R. Freeman, Christine J. Landry-Coltrain
  • Publication number: 20020061479
    Abstract: Multilayer thermographic materials have improved adhesion between a polymeric support and film-forming polymer-containing layers disposed thereon. This improved adhesion is provided by including in the adhesion-promoting layer next to the support two or more polymers having specific properties. At least one of the polymers adheres the layer to the support, and at least one other polymer is compatible or of the same class as the film-forming polymer in the upper layer, such as a thermographic imaging layer. This adhesion-promoting layer can be provided as a very thin “carrier” layer during coating operations so that desired imaging effects and functional properties are obtained.
    Type: Application
    Filed: November 1, 2001
    Publication date: May 23, 2002
    Applicant: Eastman Kodak Company
    Inventor: Thomas C. Geisler
  • Publication number: 20020061484
    Abstract: A process for producing an aqueous dispersion comprising: preparing a dispersion of photosensitive silver halide and a binder or a surfactant in an aqueous medium; and subsequently either (a) adding a first silver salt to the silver halide dispersion and then adding a second silver salt; or (b) adding the second silver salt to the silver halide dispersion and then adding the first silver salt, wherein the aqueous dispersion is substantially free of a water-soluble metal or ammonium salt of an aliphatic carboxylic acid with greater than 12 carbon atoms, the first silver salt is a substantially light-insensitive and substantially water-insoluble silver salt of an organic carboxylic acid, and the second silver salt has a water-solubility greater than 0.1 g in 1 L of water at 20° C.; an aqueous dispersion obtainable therewith; a photothermographic recording material prepared with the aqueous dispersion; and a process for preparing the photothermographic recording material.
    Type: Application
    Filed: August 13, 2001
    Publication date: May 23, 2002
    Inventors: Herman Uytterhoeven, Johan Loccufier, Yvan Gilliams
  • Patent number: 6379865
    Abstract: A photoimageable, aqueous acid soluble polyimide polymer comprising an anhydride, including a substituted benzophenone nucleus, a diamine reacted with the anhydride to form a photosensitive polymer intermediate, and at least 60 Mole % of solubilizing amine reacted with the photosensitive polymer intermediate to form the photoimageable, aqueous acid soluble polyimide polymer. An emulsion for electrophoretic deposition of a coating of a photoimageable, aqueous acid soluble polyimide polymer comprises a dispersed phase, including the photoimageable aqueous acid soluble polyimide polymer, dissolved in an organic solvent and a dispersion phase including a coalescence promoter and water. The emulsion may be applied, by electrophoretic deposition, to a conductive structure to provide a photoimageable coating on the conductive structure.
    Type: Grant
    Filed: April 11, 2000
    Date of Patent: April 30, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Guoping Mao, Hany B. Eitouni, Alphonsus V. Pocius, John B. Scheibner, Nanayakkara L. D. Somasiri, Nicholas A. Stacey, Alfred Viehbeck
  • Patent number: 6379873
    Abstract: There is disclosed a method of constructing photosensitive waveguides on silicon wafers through the utilization of a Plasma Enhanced Vapor Deposition (PECVD) system. The deposition is utilized to vary the refractive index of resulting structures when they have been subject to Ultra Violet (UV) post processing.
    Type: Grant
    Filed: December 22, 1998
    Date of Patent: April 30, 2002
    Assignee: Unisearch Limited
    Inventors: Michael V. Bazylenko, David Moss, Mark Gross, Pak Lim Chu