Coating Process Making Radiation Sensitive Element Patents (Class 430/935)
  • Patent number: 4302522
    Abstract: A method of rendering a surface of substrate photoconduction comprising applying to the substrate a layer of N-vinyl carbazole and a prepolymer formed thereupon and completely polymerizing the monomer or prepolymer in situ on the substrate.
    Type: Grant
    Filed: April 28, 1980
    Date of Patent: November 24, 1981
    Inventors: John L. Garnett, John D. Rock
  • Patent number: 4302528
    Abstract: An improved process for producing a photo-curable composite material using a liquid photo-curable resin, which comprises holding a liquid photo-curable resin with a screen material between two films, at least one of the films having photo-transmitting properties, and passing the films holding the liquid photo-curable resin and the screen material through a gap (e.g. between two rollers). The process of the present invention can produce photo-curable composite materials useful for preparing various stencils for screen printing, textile printing, or the like at a low cost and with less production of defects.
    Type: Grant
    Filed: July 11, 1979
    Date of Patent: November 24, 1981
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Haruo Inoue, Akihiro Furuta
  • Patent number: 4301230
    Abstract: A process for producing an image which comprises the steps of:(1) applying to the surface of a substrate the surface of a photosensitive layer, the other surface of the photosensitive layer being adhered to a substantially transparent film support which is soluble or dispersible in a developer consisting essentially of a liquid capable of substantially dissolving or dispersing therein the areas of the layer other than those having a polymeric image produced by imagewise exposure in the step (2) below;(2) exposing the photosensitive layer, imagewise, to actinic radiation to form a polymeric image in the layer; and(3) washing away with the developer the film support and the areas of the layer other than those having the polymeric image to form an image of a polymeric material on the substrate.
    Type: Grant
    Filed: December 18, 1979
    Date of Patent: November 17, 1981
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Tadashi Taguchi, Noboru Fujikawa, Mitsuo Kohno, Katsumi Yoshitake, Kunio Satake
  • Patent number: 4301238
    Abstract: An improved method of producing a silver halide photographic material having a layer containing gelatin coated on a support is disclosed. The coated layer is dried so that its surface temperature during the falling rate drying period is more than 5.degree. C. over the melting point of the layer during drying and the jelly strength of the gelatin is at least 200 g according to the PAGI method.
    Type: Grant
    Filed: July 21, 1980
    Date of Patent: November 17, 1981
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Sadayuki Miyazawa, Takashi Kadowaki, Isao Yamamoto
  • Patent number: 4298680
    Abstract: Method and apparatus for manufacturing a seamless printing roll. A liquid photosensitive resin is applied to the space between a process cylinder and a rigid plate which is transparent to actinic light. Relative movement is provided between the cylinder and the plate perpendicular to the longitudinal axis of the cylinder, while the cylinder is rotated in synchronization with the relative movement of the rigid plate to evenly spread the photosensitive resin. The photosensitive resin is simultaneously exposed in the space between the cylinder and rigid plate.
    Type: Grant
    Filed: December 28, 1979
    Date of Patent: November 3, 1981
    Assignee: N.V. APR Europe S.A.
    Inventor: Vogel Bruno
  • Patent number: 4292389
    Abstract: There is provided a process for preparing a photosensitive plate for printing which comprises providing a heat-depositable fine powder having a constant directional size of 0.5-40.mu. onto the surface of a photosensitive plate for printing at a ratio of 0.005-0.5 g. of the said powder per m.sup.2 of the said plate to uniformly disperse and adhere the said powder onto the said surface, while preheating the right side (side on which powder adheres) and/or the reverse side of the said plate upon providing said powder or before or after providing, and subsequently contacting the right side of the said plate with a heating roll having a high releasing surface, whereby the said fine powder is fused and fixed on onto the surface of the said plate.
    Type: Grant
    Filed: January 24, 1980
    Date of Patent: September 29, 1981
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Hiroshi Kojima, Kunio Ito, Masami Akiyama, Takeshi Tanaka
  • Patent number: 4288521
    Abstract: There is provided a process for the production of a photosensitive plate for printing which comprises providing a given amount of a fine powder having a constant directional size of 0.5-40 .mu. from a dust supplier directly or via a distributor to a cyclone, feeding the said powder together with a small volume of air from the bottom of said cyclone, uniformly dispersing and adhering the so flowed fine powder onto the surface of a continuously running photosensitive plate for printing.
    Type: Grant
    Filed: January 24, 1980
    Date of Patent: September 8, 1981
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Hiroshi Kojima, Kunio Ito, Masami Akiyama, Takeshi Tanaka
  • Patent number: 4287240
    Abstract: Coating apparatus for carrying out a process of coating in which one or more layers of coating composition are applied to the surface of an object, such as a continuous web or discrete sections of sheet material, by advancing the object through a coating zone in which a flow of coating composition is applied thereto, for example, bead coating or curtain coating apparatus, is provided with a shield to protect the flow of coating composition against disturbance by ambient air currents. The shield is formed of a foraminous material, such as screening or perforated plate material, which functions to diffuse air currents impinging thereon so that their velocity is decreased, with a resulting decrease in their ability to disturb the flow of coating composition.
    Type: Grant
    Filed: April 11, 1980
    Date of Patent: September 1, 1981
    Assignee: Eastman Kodak Company
    Inventor: Thomas R. O'Connor
  • Patent number: 4284694
    Abstract: A layer of an aqueous solution containing polyvinyl alcohol and a zirconyl compound is applied to a clean glass surface and dried to produce a precoating thereon. A subsequently-applied phosphor-photobinder coating thereon is exposed to a light image and then developed with a turbulent aqueous liquid. The phosphor-photobinder coating exhibits improved adherence to the surface during the developing step due to the presence of the precoating.
    Type: Grant
    Filed: April 25, 1980
    Date of Patent: August 18, 1981
    Assignee: RCA Corporation
    Inventor: Stanley A. Harper
  • Patent number: 4284711
    Abstract: An improved presensitized printing plate comprises at least one metal working surface, a cobalt layer electroplated on the outer working surface of said at least one metal working surface, and a coating of light sensitive material directly deposited on said cobalt layer.A method is also described which makes use of metallic cobalt for the preparation of presensitized printing plates in order to provide layers that are in themselves adherent to light sensitive materials without the need of using adhesives, and are useful for directly depositing light sensitive coatings thereon.
    Type: Grant
    Filed: August 21, 1979
    Date of Patent: August 18, 1981
    Inventor: Armando Birlain-Noris
  • Patent number: 4281057
    Abstract: Resist is applied to a surface with a syringe, or other suitable dropper, equipped with a millipore filter to remove contaminants. The surface is completely flooded with resist. Resist is allowed to remain on the surface of the evaporated metal for a period of time prior to spin coating. Allowing resist to remain on the surface prior to coating produces a uniform film. For a 2 micron thick uniform resist coating, a minimum of 15 seconds is allowed prior to spinning while in the case of a 4 micron thick resist coating a much longer period is allowed.For the application of a 2 micron film, the resist material after partial drying for approximately 15 seconds is spun at 2000 rpm for 30 seconds. In order to apply a 5 micron thick resist film, resist is spun at 2000 rpm for 30 seconds after partial drying for approximately 10 minutes.
    Type: Grant
    Filed: February 7, 1977
    Date of Patent: July 28, 1981
    Assignee: International Business Machines Corporation
    Inventors: Eugene E. Castellani, Ian M. Croll, Aloysius T. Pfeiffer, Lubomyr T. Romankiw
  • Patent number: 4271257
    Abstract: An imaging film, and a method of making it, comprising a flexible plastic substrate having a thin, high optical density, continuous layer of bismuth, or an alloy of bismuth, deposited on a surface thereof. The bismuth layer has a roughened outer surface. To this roughened surface a layer of a photoactive material is applied which serves as a photoresist as well as a protective overlayer for the bismuth. The photoactive material may be positive or negative working. A layer of a developable photographic emulsion may be applied to the photoactive material layer to impart camera speed to the imaging film. The photoresist side of the film has a non-shiny, essentially non-reflecting black surface which resembles the appearance of developed silver halide films. The substrate side of the film, on the other hand, has a metallic appearance which is easily distinguishable from the photoresist side. This feature of the film enables an operator to readily ascertain the photoresist side of the film and speeds plate making.
    Type: Grant
    Filed: January 8, 1979
    Date of Patent: June 2, 1981
    Assignee: Energy Conversion Devices, Inc.
    Inventors: Harvey H. Wacks, Masatsugu Izu, Donald J. Sarrach
  • Patent number: 4267212
    Abstract: A process for spin coating a substrate such as a semi-conductor wafer uniformly with a coating solution such as a photographic emulsion by rotating the substrate at a first speed while simultaneously applying the coating solution at a radially moving position. Once the substrate has been initially covered, the speed of rotation of the substrate is increased and rotation continues until a uniform coating is obtained.
    Type: Grant
    Filed: September 19, 1979
    Date of Patent: May 12, 1981
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Shinichi Sakawaki
  • Patent number: 4263392
    Abstract: Presensitized lithographic plates having a diazo layer are prepared such that they exhibit a photospeed rendering them suitable for ultra high speed operations including use within laser platemaking systems. These ultra high speed plates have a diazo layer that is exceedingly thin while still being generally uniformly distributed throughout the plate area. The process includes extracting a significant quantity of diazonuim compound or diazonium resin from a diazo layer on a presensitized plate substrate. Plates thus formed are useful in laser exposures for facsimile transmissions, as projection plates, as camera back plates, for step and repeat plate work, and where low intensity light sources are used in conjuction with very large plates.
    Type: Grant
    Filed: June 1, 1979
    Date of Patent: April 21, 1981
    Assignee: Richardson Graphics Company
    Inventor: Thomas H. Jones
  • Patent number: 4258125
    Abstract: A table has a mechanically driven draw bar squeegee mounted thereon to spread ink and other substances in a uniform manner. There is an interchangeable plurality of such squeegees which may be sequentially placed in said table to enable successive layers of different types of materials to be spread, in sequence, over the surface of a paper. This succession of materials includes an isolation layer between successive colors of ink, whereby a mistake on work in progress does not necessarily lead to a final destruction of all previously done work. A feature of the invention is that the pigmented surface of dried ink is not seen through the tint of other material, such as photoresist, for example. Also, a releasable layer may be provided among the successive layers so that a hand proof copy may be transferred, as a decalcomania.
    Type: Grant
    Filed: May 8, 1978
    Date of Patent: March 24, 1981
    Inventor: Ronald D. Edhlund
  • Patent number: 4243744
    Abstract: Microwave curing of photoresist films employed in processing semiconductor wafers provides an alternative to conventional drying techniques. The time of curing may be reduced from about 20 to 25 minutes required for conventional air drying to about 5 minutes employing microwave curing. Further, the photoresist film is the only part of the semiconductor assembly that experiences elevated temperatures. The remainder of the wafer remains near ambient conditions, without experiencing possible deleterious effects as a consequence of the high temperature processing.
    Type: Grant
    Filed: December 22, 1978
    Date of Patent: January 6, 1981
    Assignee: Exxon Research & Engineering Co.
    Inventors: Harry F. Lockwood, Thomas F. McGee
  • Patent number: 4241171
    Abstract: A process for making a photographic product in which a plurality of liquid layers are coated on a base, comprising the steps of coating as the first layer adjacent the base a carrier layer containing a photographic hardener and coating as the second layer adjacent the first layer an isolation layer. The product is completed by coating a plurality of conventional photographic compositions over the first two layers and drying.
    Type: Grant
    Filed: February 21, 1979
    Date of Patent: December 23, 1980
    Assignee: Polaroid Corporation
    Inventors: Roger C. Clapp, Edward J. Choinski
  • Patent number: 4237215
    Abstract: A heat-developable light-sensitive material comprising on a support at least one layer containing (a) an organic silver salt; (b) a light-sensitive silver halide; (c) a reducing agent; and (d) a binder; wherein the light-sensitive silver halide component (b) comprises the reaction product obtained by decomposing an N-halo compound in the presence of the organic silver salt (a) for reaction with the organic silver salt (a) before applying the layer on the support and an embodiment includes a heat-developable light-sensitive material in which the N-halo compound is decomposed in the presence of an alcohol to form the light-sensitive silver halide component (b).
    Type: Grant
    Filed: April 20, 1978
    Date of Patent: December 2, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shinpei Ikenoue, Takao Masuda
  • Patent number: 4237213
    Abstract: An image forming method comprises adding a development accelerator for accelerating the developing function at the time of the heat-development to a heat-development type photosensitive raw material containing therein at least an organic silver salt, a halide, and a binder, at the time when the image formation is to be carried out by the process steps of exposure and heat-development.
    Type: Grant
    Filed: October 3, 1978
    Date of Patent: December 2, 1980
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ichiro Endo, Hajime Kobayashi, Yasuhiro Yano, Takao Muramatsu
  • Patent number: 4233346
    Abstract: Method and apparatus for applying a plurality of superposed layers to a web by curtain coating in which only some of the plurality of layers are, and in the extreme case only one layer is, in contact with the curtain guides. The width of the remaining layers is smaller than the width determined by the curtain guides, and preferably smaller than the width of the web.
    Type: Grant
    Filed: February 26, 1979
    Date of Patent: November 11, 1980
    Assignee: AGFA-GEVAERT N.V.
    Inventor: Jacques G. Kerkhofs
  • Patent number: 4230793
    Abstract: A process for producing solder masks on double sided printed circuit boards, comprising conveying the boards beneath a free falling curtain of a pohotopolymer to form a thin layer on a surface of the board, irradiating with ultra violet light areas of the surface other than those that need to be soldered and then, by subsequent development, dissolving the unirradiated areas of the layer. The viscosity of the photopolymer is between 500 to 1200 mPa's at impingement on the surface of the circuit and the height of the curtain is selected so that the rate of flow of the polymer onto the circuit is between 60 to 160 m/min. Also the rate at which the circuits are conveyed beneath the curtain is greater than a rate slightly less than the rate at which the polymer flows onto the circuit.
    Type: Grant
    Filed: November 15, 1978
    Date of Patent: October 28, 1980
    Assignee: Ciba-Geigy Corporation
    Inventors: Ewald Losert, Heinz Rembold
  • Patent number: 4226933
    Abstract: A method of manufacturing a decorative panel having an embossed surface and different degrees of glass corresponding to a pattern, thereby producing a stereoscopic aspect, i.e., the impression of relief and solidity.
    Type: Grant
    Filed: November 28, 1978
    Date of Patent: October 7, 1980
    Assignee: Toppan Printing Co., Ltd.
    Inventors: Hideo Ishizawa, Akira Niwayama, Mitsuru Shimizu, Takashi Kagami
  • Patent number: 4224403
    Abstract: A method for preventing the degradation of a hydrophilic colloid solution for a silver halide photographic light-sensitive material of which the viscosity has been or is to be increased using an anionic polymer containing an acid group, which comprises incorporating into the hydrophilic colloid solution at least one compound represented by the formula (I): ##STR1## wherein R.sub. represents a hydrogen atom or an alkyl group; and R.sub.2, R.sub.3 and R.sub.4, which may be the same or different, each represents a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group.
    Type: Grant
    Filed: August 3, 1978
    Date of Patent: September 23, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yuzo Toda, Keiichi Adachi, Shoji Ishiguro, Yasuhiro Nakayama
  • Patent number: 4218533
    Abstract: In the production of a photographic material by applying a coating composition to a continuously moving support, cold-setting the coating and drying the coating, an additive in the coating composition (e.g., a hardening agent or an antistatic agent), either partly or completely, is atomized by ultrasonic vibration, and supplied to the coating formed on the continuously moving support. Alternatively, the atomized additive is first supplied to the surface of a continuously moving support, and before the coating is completely dried, the coating composition is applied thereto.
    Type: Grant
    Filed: June 3, 1977
    Date of Patent: August 19, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shuzo Fuchigami, Toshio Miyashiro
  • Patent number: 4216289
    Abstract: A light-sensitive printing plate with a coating layer with an uneven pattern removable during development provided on the surface thereof, which can be brought into intimate contact with an original image in a short period of time by vacuum adhesion. The light-sensitive printing plate is produced by taking up a coating solution from a coating solution pan by a gravure roll, scraping away excess coating solution adhering to the gravure roll by a doctor blade, transferring the coating solution still retained on the gravure roll to a coating roll made of rubber with a fine uneven pattern on the surface thereof which is turning in the same direction and at the same speed as the gravure roll, and transferring the coating solution thus transferred to the coating roll to a support running at the same speed and in the same direction as the coating roll.
    Type: Grant
    Filed: February 16, 1978
    Date of Patent: August 5, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazutaka Oda, Yoshio Okishi
  • Patent number: 4216290
    Abstract: In an extrusion coating process of the flow-stretch type in which a ribbon of an aqueous gelatin coating composition is extruded through an elongated orifice onto a moving support and becomes stretched and attenuated in thickness between the orifice and support, at least one visco-elasticity enhancing agent is added to the coating composition in sufficient amount as to disproportionately increase the elasticity of the composition compared to its viscosity so as to render the composition stretchable at viscosities which are substantially reduced compared to what would otherwise be necessary for flow-stretch coatability.
    Type: Grant
    Filed: October 5, 1978
    Date of Patent: August 5, 1980
    Assignee: AGFA-GEVAERT N.V.
    Inventors: Victor F. De Beul, Jan H. Van Hove
  • Patent number: 4192683
    Abstract: A photographic light-sensitive material comprising a layer which contains a compound represented by the following Formula I ##STR1## wherein R.sub.1 is an alkyl group having 1 to 18 carbon atoms, R.sub.2 is a hydrogen atom or an alkyl group having 1 to 18 carbon atoms with a proviso that when R.sub.2 is a hydrogen atom, R.sub.1 is an alkyl group having 1 to 7 carbon atoms, M is a cation and n is a number of 1 to 50.
    Type: Grant
    Filed: October 18, 1977
    Date of Patent: March 11, 1980
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Eiichi Sakamoto, Masao Ishihara, Kazuo Nakazato, Hiroshi Yamada, Sadatugu Terada, Kenichi Kitahara, Naoto Abe, Mamoru Komiya, Masaru Kanbe
  • Patent number: 4179538
    Abstract: A process for eliminating cracking in a titanium dioxide-hydroxyethylcellulose layer by simultaneously coating thereover a hydrophilic colloid layer such as gelatin.
    Type: Grant
    Filed: September 6, 1977
    Date of Patent: December 18, 1979
    Assignee: Eastman Kodak Company
    Inventor: Herbert R. Sassenhausen