Abstract: A guard for a part to be shot-blasted and having an axis of revolution, the guard including: a cover and a chamber shaped for receiving the part to be shot-blasted; the chamber having at least one planar section with a shape matching at least one planar section of the cover; two side guards mounted on the part to be shot-blasted and having one degree of freedom relative to the chamber and the cover, wherein the cover, the chamber and the two side guards form a box for sealing the shot, the box including a window for projecting the shot, the surface of which matches a portion of a surface of the chamber.

Abstract: Disclosed herein is a method for inner surface finishing of a workpiece, in which the inner surface of the workpiece defines an opening with axial symmetry around the longitudinal axis of the workpiece. The method may include the following steps. An abrasive medium may be poured inside the opening; urging the abrasive medium to rotate about the longitudinal axis, thereby imposing a centrifugal force on the abrasive medium to accelerate the abrasive medium outwards from the center of rotation towards the inner surface of the opening, where the abrasive medium impacts the inner surface of the opening; and the workpiece may be rotated about the longitudinal axis in a direction opposite the first direction, concurrently.

Abstract: A deburring device includes a barrel with a granulated polishing member filled therein. The barrel is configured by a case formed with an opening hole, and drop prevention member which is fixed to the case and prevents the polishing member from being dropped from the opening hole. A gap into which a tubular end section of a workpiece is inserted is formed between the opening hole of the case and the drop prevention member.

Abstract: A machine for the flow finishing of mechanical pieces is described. The machine has a rotary vat for containing finishing media and a unit for moving pieces having at least one mechanical arm for moving the pieces being machined, said mechanical arm being associated to means for rotating the pieces within the rotary vat, the rotary vat has at least two separate sections formed by concentric circular crowns.

Abstract: A finishing apparatus and method for surface finishing workpieces. A tub is rotatable about vertical axis and operable to hold and rotate abrasive media completely submerged in water or other liquid. One or more manipulators, each supporting a spindle operable for supporting and rotating a workpiece about a spindle axis of the spindle with the workpiece at least partially submerged in the abrasive media and operable for holding spindle axis normal to and spaced apart from the vertical axis with the spindle horizontal in the tub during the surface finishing process while the tub is rotating. Manipulators are independently operable to present one of the workpieces for loading and unloading on and off spindle while tub is rotating and continuing to process the other workpieces submerged in the media and water. A rake includes a plate and means for lifting the plate up and down vertically through the abrasive media.

Abstract: An apparatus for surface finishing workpieces has a workpiece holder, on which a chucking device for releasably fixing the workpieces to be machined is secured, and a container arranged underneath the workpiece holder in order to receive grinding and/or polishing granules, which can be moved relative to the workpiece holder. A chucking device has a chuck, which is designed for at least partially positive holding of the workpiece for conjoint rotation. The chucking device furthermore has a vacuum duct, which can be connected to a vacuum generator and which opens into the chuck in order to hold the workpiece in such a way that it is fixed axially by the application of a vacuum to the vacuum duct. The chuck of the chucking device is arranged on an adapter piece, which can be fixed releasably on a supporting part of the chucking device.

Abstract: A prescription label identity peeler includes a box-shaped housing. A lid extends over the box-shaped housing. A sanding member is adjustably carried within the box-shaped housing. A pair of linkage arms is pivotally extend between the lid and the sanding member. The motorized linkage arms will move the sanding member simultaneously and horizontally against the empty pill bottle in an inverted position, while the wheel on the swing arm assembly will contact a bottom end of the empty pill bottle via compression of the springs, thereby removing the label from the empty pill bottle when the inverted empty pill bottle rotates.

Abstract: A finishing device for finishing the exterior, flutes and tip of a drill bit is disclosed. The finishing device includes a containment vessel which houses an abrasive media which may have a visco-elastic component and an abrasive component. The drill bit is inserted into or through the abrasive media and rotated. A rotary member may be connected to the shank of the drill bit to provide rotation of the drill bit. The drill bit displaces the abrasive media thereby finishing the exterior, flutes, cutting edges and tip of the drill bit.

Abstract: A vertically oscillating working device 2 has a body to be oscillated 23 having an inner space that is formed by a cover member 21 and a vehicle wheel 22, which is a body to be worked, and receives working materials 25 in it and also has oscillating means for vertically oscillating the body to be oscillated 23. The working materials 25 are allowed to collide with the vehicle wheel 22 by the oscillation, and thereby the vehicle wheel 22 is worked. With the working device 2, a casting can be oscillated together with hardening materials, and excellent mechanical properties can be uniformly added to a predetermined portion of the casting by the oscillation without changing the position of the casting.

Abstract: A substrate having flatness of less than 230 nmPV and surface roughness at RMS of less than 0.20 nm. is obtained by a method comprising: a process of polishing an object to be polished with a polishing pad comprising at least one layer having compressibility of 5% or below in a base layer of the polishing pad.

Abstract: There is provided a surface treated product that moves relatively in a fluid, wherein a surface of the surface treated product has continuous dimples, each dimple having a diameter of 10 to 2500 ?m and a depth of 50 ?m or less. The surface treated product significantly reduces resistance of a fluid to an object in the fluid, and significantly improves a flow state of the fluid.

Abstract: The present invention is an apparatus for polishing a precision screw. The apparatus uses abrasive in a sealed container for polishing. Hence, the present invention can do precise polishing to obtain smooth surface of thread by removing tiny burrs with the abrasive.

Abstract: An apparatus for brushing a surface of a substrate is provided. The apparatus includes a brush for scrubbing the surface of the substrate, a head for holding the brush, and an arm. The arm is configured to hold the head about a connection point. The arm is connected to an oscillating mechanism configured to cause the head to oscillate at an angle of rotation about the connection point.

Abstract: An abrasive device may include first ring-shaped container filled with a liquid abrasive medium. A second container may be arranged next to the first container and filled with a second liquid abrasive medium. A pivoting arm may be arranged between and above the containers and can be pivoted along a pivoting direction. A drag device may be arranged on the pivoting arm. The drag device may lead a gas turbine blade on a carrier arm through the abrasive medium.

Abstract: A microelectronic substrate and method for removing conductive material from a microelectronic substrate. In one embodiment, the microelectronic substrate includes a conductive or semiconductive material with a recess having an initially sharp corner at the surface of the conductive material. The corner can be blunted or rounded, for example, by applying a voltage to an electrode in fluid communication with an electrolytic fluid disposed adjacent to the corner. Electrical current flowing through the corner from the electrode can oxidize the conductive material at the corner, and the oxidized material can be removed with a chemical etch process.

Abstract: In a method for the machine polishing of workpieces, the workpiece is immersed into a container filled with abrasive and is moved relative to the abrasive container. The workpiece is here moved up and down in the vertical direction, rotated about its own central axis and moved with its central axis inside the container.

Abstract: A fixture for holding tools to be processed in a rotational processing apparatus. The fixture includes at least one mounting rod with a plurality of spacers slidably disposed on the mounting rod. A plurality of tools are disposed about the rod, each tool being spaced from an adjacent tool by one of the spacers. A removable attachment is provided on at least one end of the rod for inhibiting the spacers from sliding off the rod. The fixture may also include first and second end plates mounted to the rod on either side of the products being finished. One or more springs may also me incorporated onto the rod between a spacer and the first or second end plates. A process for loading and using the fixture is also disclosed.

Abstract: In a method for the machine polishing of workpieces, the workpiece is immersed into a container filled with abrasive and is moved relative to the abrasive container. The workpiece is here moved up and down in the vertical direction, rotated about its own central axis and moved with its central axis inside the container.

Abstract: The guide apparatus in accordance with the invention for the guiding of a workpiece (2), in particular of a rotationally asymmetrical workpiece (2), having a porous surface coating (3) in a polishing container (4) has two guide members (6) spaced apart by at least one spacer (5) as well as a holder (7) for the positioning of the workpiece (2) between the two guide members (6) such that the workpiece (2) can be guided in the polishing container (4) in a non-contact manner with respect to the polishing container (4).

Abstract: A method of CMP polishing of a semiconductor wafer is described that includes using a polishing pad on a platen/table with the polishing pad including a sub-pad containing pockets of magnetorheological fluid. The stiffness of the sub-pad is controlled by selectively applying a magnetic field at selective pockets containing magnetorheological fluid to change the viscosity of the magnetorheological fluid. The changing stiffness increases the polishing rate of the pad in the areas of the magnetic field.

Abstract: A chemical mechanical planarization (CMP) apparatus includes a bath of an aqueous solution. A first holder, which is configured to support a wafer, is disposed within the bath. A first spindle is configured to rotate the first holder. A second holder, which is rotated by a second spindle, is disposed above the first holder. The second holder supports a planarization media, which is disposed within the bath. The planarization media is oriented to face the surface of the first holder on which the wafer is to be supported. The planarization media can be a pad containing polyurethane or a substrate having an overlying abrasive film. The CMP apparatus also can include a system for recirculating and reconditioning the aqueous solution. A method for performing a CMP process also is described.

Abstract: A barrel polishing apparatus which can easily hold a work having a large mass and detach therefrom. The barrel polishing apparatus includes a polishing medium receiving container having a polishing medium received therein and a work supporting arm for holding the work. The position of the work supporting arm is shifted from the center of the polishing medium receiving container. The polishing medium receiving container rotates about a vertical axis to form a continuous circumferential flow of polishing medium therein and includes an upper end opening for receiving the work attached to a distal end of the work supporting arm. The work supporting arm is oriented diagonally toward a direction of the continuous circumferential flow of polishing medium.

Abstract: There are disclosed a polishing method and a polishing device in which cleaning of a glass substrate surface can be achieved to a high level. A glass substrate (MD substrate 1) in the shape of a circular disc having a circular hole in a center portion is immersed in an abrasive liquid 50 containing free abrasive grains, and an inner peripheral end surface of the glass substrate is polished using the abrasive liquid containing the free abrasive grains by rotating a rotary brush 4 or a polishing pad in contact with the inner peripheral end surface.

Abstract: Disclosed is a device for removing burrs from a workpiece, in which a barrel having an inner and an outer barrels is located within a frame constituting a main body of the device. The inner barrel contains a plurality of media for removing the burrs from the workpiece, and the outer barrel is supplied with a coolant for cooling the media and the workpiece. The outer barrel is also provided with a coolant drain duct for discharging the used coolant. A spindle is provided at its lower end with a chuck for clamping the workpiece. When the workpiece is clamped into a chuck and is positioned within the inner barrel so as to be deburred by the media, the spindle is rotated in regular and reverse direction by a rotary motor, and is moved upward and downward by an elevating motor. In addition to this, the inner barrel reciprocates in a right and left direction by a shaker. The burrs removed from the workpiece are discharged together with the coolant.

Abstract: The present invention is based on the practice of abrasive machining with no sealed working chamber by the employment of a visco-elastic abrasive medium, behaving predominantly as an elastic solid at the applied strain of the orbital working motion, and applying orbital or other relative working motion to produce strain rates which bring the medium into a predominantly elastic deformation and often near, but not to exceed, the compressive stress limit at the strain rate employed. The preferred visco-elastic abrasive medium is a rheopectic poly(boro-siloxane) filled with viscosity increasing stiffening agents and high loadings of the abrasive of choice and relatively mono amounts of plasticizers.

Abstract: A wheel finishing apparatus for abrasively finishing the front faces of automobile wheels. The apparatus has a rotating carousel hub and multiple arms connected to the carousel hub which extend out to wheel mounting ends. A wheel is rotatably mounted to each wheel mounting end such that the front face of each wheel faces a known direction of carousel rotation and forms an impingement with an orbital path traversed by the wheel mounting end. Each wheel may be independently pivoted about a respective pivot axis at each wheel mounting end for variably adjusting the impingement angle. By adjusting the impingement angle to less than ninety degrees, partially submerging the wheels in a media bath, and rotating the carousel drive structure about a central axis of rotation, the abrasive polishing media impinges the submerged portions of the front faces and rotates the wheels about their respective wheel rotational axes to abrasively finish all areas of the front faces.

Abstract: The present invention is based on the practice of abrasive machining with no sealed working chamber by the employment of a visco-elastic abrasive medium, behaving predominantly as an elastic solid at the applied strain of the orbital working motion, and applying orbital or other relative working motion to produce strain rates which bring the medium into a predominantly elastic deformation and often near, but not to exceed, the compressive stress limit at the strain rate employed. The preferred visco-elastic abrasive medium is a rheopectic poly(boro-siloxane) filled with viscosity increasing stiffening agents and high loadings of the abrasive of choice and relatively minor amounts of plasticizers.

Abstract: The invention relates to a method and machine for so-called “ultrasonic” peening employing a mist of microbeads inside an active chamber 30c for peening parts 21 on a wheel 19, ie blades on a rotator. The periphery of the wheel 19 is brought simultaneously past the openings of at least three chambers with limited clearances E1 and E2. At least one chamber being active with a peening mist of microbeads and at least two chambers, either side of the active chamber, being passive. The wheel being rotated over the chambers and the microbeads are removed from the passive chambers and in that the active chambers are supplied with microbeads therefrom.

Abstract: The present invention is based on the practice of abrasive machining with no sealed working chamber by the employment of a visco-elastic abrasive medium, behaving predominantly as an elastic solid at the applied strain of the orbital working motion, and applying orbital or other relative working motion to produce strain rates which bring the medium into a predominantly elastic deformation and often near, but not to exceed, the compressive stress limit at the strain rate employed. The preferred visco-elastic abrasive medium is a rheopectic poly(boro-siloxane) filled with viscosity increasing stiffening agents and high loadings of the abrasive of choice and relatively minor amounts of plasticizers.

Abstract: A centrifugal dry barrel finishing machine is disclosed. The machine include a plurality of barrel pots which are rotated about their axes of rotation and revolved about an axis of revolution. A mass is put in the barrel pots to finish workpieces by dry media that flows in the barrel pots. Each barrel pot has an air-intake part and an air and dust exhaust part that prevent the workpieces and dry media of the mass from passing through the parts, and the air and dust exhaust part is connected to and in communication with a dust collector through a connector device such that each barrel pot is rotatable and revolvable relative to said dust collector.

Abstract: A method of polishing an object is disclosed. In one embodiment, the method comprises the steps of creating a polishing zone within a magnetorheological fluid; determining the characteristics of the contact between the object and the polishing zone necessary to polish the object; controlling the consistency of the fluid in the polishing zone; bringing the object into contact with the polishing zone of the fluid; and moving at least one of said object and said fluid with respect to the other. Also disclosed is a polishing device. In one embodiment, the device comprises a magnetorheological fluid, a means for inducing a magnetic field, and a means for displacing the object to be polished or the means for inducing a magnetic field relative to one another.

Abstract: A method of polishing an object is disclosed. In one embodiment, the method comprises the steps of creating a polishing zone within a magnetorheological fluid; determining the characteristics of the contact between the object and the polishing zone necessary to polish the object; controlling the consistency of the fluid in the polishing zone; bringing the object into contact with the polishing zone of the fluid; and moving at least one of said object and said fluid with respect to the other. Also disclosed is a polishing device. In one embodiment, the device comprises a magnetorheological fluid, a means for inducing a magnetic field, and a means for displacing the object to be polished or the means for inducing a magnetic field relative to one another.

Abstract: In this machining method using a multi-axis numerically-controlled machine, a workpiece holder (4) is rotated (rotation .alpha.) in step-by-step motion around an axis (Z), rectilinear movements are produced between a tool (3) and the workpiece holder (4) respectively along axes (Z and X), and in addition the tool (3) is rotated (rotation .beta.) around an axis (Y), these various movements being controlled in response to data corresponding to a required surface to be produced on a workpiece. The step-by-step rotating movement and the rectilinear movements are used for producing a spiral path of the tool on the surface of the workpiece to be machined, while the rotating movement (.beta.) is used to achieve the required thickness removed at successive points on the spiral path.

Abstract: Cleaning apparatus for a roll placed in contact with a metal strap moving longitudinally in an installation comprising a set of rotary-mounted superposed rolls between two stands of a fixed supporting cage and comprising at least one wiping tool (4) parallel to the axes of the rolls, a device (3) supporting the wiping tool mounted slidingly on straight guide rollers (24, 24') provided on a cradle (2) pivotably mounted on both stands (11) of the cage (1) around a pivot axis (20) parallel to the axes of the rolls.

Abstract: The method and apparatus for honing and treating the pad engaging surfaces of vehicle brake rotors or discs consisting of engaging the rotor surface with a plurality of moving abrasive elements mounted upon flexible resilient stems wherein a smooth finished surface is formed. The abrasive elements are rotated about an axis which may be coincident with the brake rotor axis of rotation during machining, or may be offset and parallel thereto, to produce a basket weave machining pattern. A plurality of hone holders may be used when the hone axis of rotation is offset relative to the rotor axis whereby both of the rotor's surfaces may be simultaneously finished. The practice of the invention also permits the braking surfaces of aluminum alloy rotors to be oxidized to form a hard, wear resistant finish thereon.