Abstract: A work station includes a pressure cabinet and a work surface forming the top of the pressure cabinet. The work surface is perforated along at least a portion of the work surface. A pressure inducing assembly is located within the cabinet below the work surface to draw air into the cabinet. A plenum is coupled to the pressure cabinet. An air chamber is mounted on the plenum and receives air passing from the cabinet through the air plenum to the air chamber. The air chamber then guides the air towards the work surface.

Abstract: A low-noise fan-filter unit for providing filtered airflow is disclosed. The fan-filter unit includes a housing having at least an air inlet and a coaxial air outlet; a centrifugal fan installed in the housing for drawing air into the housing and propelling it out of the air outlet; a filter installed between the fan and the air outlet for removing impurities from the air; and a noise reduction arrangement installed between the fan and the filter for reducing noise. The noise reduction arrangements includes three parting plates incorporating with the housing to form a tortuous air passageway which U-turns the airflow at least two times. The tortuous and extended air passageway, and some sound-absorbing materials furnished along the air passageway increase the contact area between the airflow and the sound-absorbing materials, and enhance the effect of noise absorption.

Abstract: A fan module for clean room applications, comprising outer, vertical restriction walls (5) with a lower edge part (6) having a planar lower surface (7) as well as an element (9) protruding from the outer edge of the planar lower surface for cooperation with a filter docking module (2) provided in a roof filter frame (4) having a substantially planar upper surface (8) with an extension corresponding to said planar lower surface, whereby said protruding element (9) is designed to overlap part of said filter docking module (2).

Abstract: A module bay requires less cleanroom airflow. A shaped gas inlet passage can allow cleanroom air into the module bay with flow velocity preferentially directed toward contaminant rich portions of a processing module in the module bay. Preferential gas flow direction can more efficiently purge contaminants from appropriate portions of the module bay, allowing a reduced cleanroom air flow rate for contaminant removal. A shelf extending from an air inlet slit in one wall of a module bay can direct air flowing therethrough toward contaminant-rich portions of the module bay, such as a junction between a lid and base of a processing module.

Abstract: A clean room filter array comprising a plurality of individual filter units arranged for delivery of filtered air to a clean room is supported by an individual suspension assembly comprising a fastener pin at outturned flanges of each filter unit that is unshared with any other filter unit so that the filter unit of a frame and fixed filter media is shiftable to and from the array independently of shifting the position or orientation of the other filter units or altering their respective suspension assemblies.

Abstract: A regulating assembly for a controlled environment room including one or more work product openings comprising a positive pressure air chamber mounted in direct fluid communication with each of the work product openings and an airsupply assembly connected to each of the air chambers so as to supply a sufficient quantity of air thereto, such that a predetermined positive air pressure is created in each of the air chambers. The predetermined positive is at least minimally greater than the air pressure on the interior of the controlled environment room. The greater air pressure in each of the air chambers, results in concurrent paths of air flow directed from each of the air chambers into the interior of the controlled room and simultaneously outward therefrom to the surrounding environment.

Abstract: Clean room ceiling in which the individual filter units are suspended solely by unshared suspension assemblies so as to be self-supporting and readily installable and removable individually and free of grids and other multiple unit supporting expedients.

Abstract: An ultra-clean environment for fabrication of semiconductor devices which includes an air transmissive conveyor for conveying semiconductor wafers thereon and a plurality of robotic elements. A clean channel encloses the conveyor. The clean channel includes a filtered air intake extending from one surface of the conveyor and an air exhaust region extending in a direction opposite the air intake. The robotic elements is disposed external to and communicating with the clean channel. Laminar flow of filtered air is provided from the air intake to the air exhaust. The conveyor preferably traverses a serpentine path. The path of the conveyor is substantially bi-directional in that it travels in a first direction in then in the opposite direction immediately adjacent the portion traveling in the first direction. Robotic elements are disposed external to the clean channel, communicate with the clean channel and are at a reduced pressure relative to the clean channel.

Abstract: An air filtration system includes a housing with a blower therein having at least one inlet in flow communication with at least one ceiling mounted filter assembly and at least one ceiling mounted return air outlet in a preselected location in a ceiling. Preferably, the at least one filter assembly is located along a center line running from one end of the ceiling to an opposed second end and the return air outlet is mounted at a preselected location along a side of the ceiling.

Abstract: A system and method are provided for controlling temperature and humidity of an environment for a process chamber for semiconductor manufacturing materials. A supply of filtered, temperature and humidity controlled gaseous working fluid is provided to a process chamber, and is controlled by cascade control based upon sensing of environmental parameters to be controlled both upstream and downstream of a chemical filter, which can be a charcoal filter. A controller determines a first control error output by comparing a desired process parameter set point for the controlled environmental parameter of the gaseous working fluid with the first sensed value, determines a second set point from the first control error, and controls the supply of the temperature and humidity controlled gaseous working fluid based upon the second set point.

Abstract: An isolation device has a movable frame and a barrier mounted on the frame. The barrier partially encloses a space to be occupied by a patient. The device also includes an air conducting unit having a primary duct attached to the barrier such that air can be conducted between the partially enclosed space and an outside location through the primary duct. Attached to the primary duct is a means for moving air between the partially enclosed space and the outside location.The present invention also includes a method of isolating a patient that begins by providing an isolating device according to the present invention. Air is conducted between the partially enclosed space and the outside location through the primary duct using the means for moving air, and a patient is positioned in the partially enclosed space.

Abstract: Materials not releasing gaseous organic materials during use are used as a dry-type sealing material such as a gasket disposed upon mounting an air filter to an opening of a ceiling or the like, a wet-type sealing material filled and used in a gap for connecting wall materials or partitionings, a vinyl chloride sheet or a vinyl chloride cloth as a facing material for walls and floors. Specifically, a carboxylic acid ester having a molecular weight of not less than 400 is used as a plasticizer, a phenolic compound having a molecular weight of not less 300 is used as an antioxidant, an aliphatic hydrocarbon having not less than 19 carbon atoms (for example, microcrystalline wax) is used as a lubricant, and an alkylamine ethylene oxide adduct having a molecular weight of not less than 350 is used as an antistatic agent.

Abstract: In an air conditioning apparatus, it includes a clean room, an air cleaning section, a cooling section and an air mixing section. The air cleaning section cleans air to supply to the clean room as cleaned air. The cooling section includes a plurality of cooling units and a plurality of non-cooling units. A plurality of cooling units cool air from the clean room to send out as cooled air. A plurality of non-cooling units sends out as non-cooled air from the clean room without cooling air. Each of the quantity of the cooled air and the non-cooled air is determined to compensate an amount of heat generated in the air conditioning apparatus and to reduce a pressure loss given to the air passing through the cooling section to a substantial minimum. The air mixing section mixes the cooled air and the non-cooled air to supply to the air cleaning section. The cleaned air is circulated through the clean room, the cooling section and the air mixing section to the air cleaning section.

Abstract: Apparatus for controlling the volume of air that is supplied and exhausted from a electronic semiconductor manufacturing wet bench is disclosed. The volume of air that is exhausted from the wet bench is increased during predetermined portions of the manufacturing process and is reduced during noncritical times as a function of predetermined conditions that may be detected or otherwise determined during the manufacturing process.

Abstract: A method and apparatus provides a resource capable of affecting the manufacture of a product to a bay and a chase. Clean resource is supplied to the bay where it is used to affect the manufacture of a product in one or more steps highly sensitive to contaminants in the resource. The resource contaminated by the manufacture of the product is then sent to a chase where it is further used to affect the manufacture of the same or a different product in steps that are less sensitive to the contamination of the resource. Because the bay is most sensitive to contaminants in the resource, the impurified resource received at the chase may not adversely affect the manufacture of products in the chase and thus, supplying a clean resource to the chase is unnecessary.

Abstract: System for treating wafers. It is proposed to place a number of furnaces in one area and wafer racks filled with wafers are introduced into each of these furnaces. The wafer racks are located in trolleys which are filled from cassettes in a central loading/removal device. The central loading/removal device serves for all furnaces.

Abstract: A modular clean room plenum includes a rectangular plenum body with an air barrier forming a top surface of the modular clean room plenum and a ceiling grid forming a bottom surface of the modular clean room plenum. The modular clean room plenums are attached to the primary support structure of a clean room building in whatever number and configuration is required by the clean room layout. By providing, in one modular component, the air barrier layer, the ceiling grid, the framework between the two layers, the fire sprinkler system, the air transfer ducts, the balancing dampers and all of the normal components of the ceiling grid, the cost and time required for construction can be significantly decreased.

Abstract: An air filtering system for a clean room has a make-up air handling unit that supplies filtered make-up air to a primary air handling unit. The make-up air that enters the make-up air handling unit is supplied from an outside source (such as the air outside of a building containing the clean room). Recirculation air from the clean room is also supplied to the primary air handling unit. A chemical filter filters both the make-up air and the recirculation air prior to the make-up air and the recirculation air entering the clean room. All recirculation air from the clean room and all make-up air passes through the chemical filter and the primary air handling unit prior to introduction to the clean room.

Abstract: The docking and purging system docks a modular isolation container for substrates used in manufacturing integrated circuits for purging and processing in a processing environment. A door portion of the docking and purging system includes a shelf for receiving the modular isolation container before insertion in a docking chamber formed in the housing connected for communication with the processing environment. A vacuum manifold with suction cups is provided for gripping and removing the modular isolation container door to allow access to the interior chamber of the modular isolation container. The docking chamber and interior chamber of the modular isolation container can also be purged of particulate contaminates by filtered air or inert gas ducted to the docking chamber.

Abstract: An air filter unit includes an air filter made up of two layers of submicron filter media (32, 34) such as HEPA or ULPA filter media, with a layer of electrostatic filter media (33) sandwiched therebetween. Preferably, a layer of electrostatic filter media (31) is also provided on the upstream side of the submicron filter media (32). A personal delivery system for filtered air includes air delivery tubes (66) supported in relation to a user's face to position end air supply openings (67) adjacent opposite sides of the user's nose and mouth. Filtered air from the air supply tubes create a curtain or area of filtered air around the user's nose and mouth so the user breathes filtered rather than ambient air. An area delivery system includes a canopy (87) over the area with filtered air supplied to the inside of the canopy.

Abstract: A filter and frame arrangement, e.g., a HEPA type filter/blower unit, has an arrangement for sealing the filter in place to prevent contaminants from leaking around the filter. A secondary seal, e.g., in the form of a gasket, both holds the filter in place in the unit and also seals the space between the primary seal (e.g., gel seal) and the clean space. An extruded gasket seats into a peripheral recess in the frame. This can be removed when the filter needs to be changed out so the filter can be taken out from below and replaced. Then a replacement seal is installed after the new HEPA filter is in position. The gasket seal is as close as possible to the bottom of the frame, i.e., as close to the clean space, so that possible contaminants are prevented from falling into the space below. Instead of an elastomeric gasket, a spring metal gasket can be used, with caulking.

Abstract: A fabric sheath (1) for the close protection of the conveyance of sensitive products by sterilized air stream diffusion, in particular in a substantially vertical direction is formed by a sealed wall (2) and a porous wall (3) extending longitudinally and axially along the sheath, the sheath defining a sterilized air supply duct (9). It comprises means (4) extending longitudinally along the sheath that ensure median sterilized air diffusion at a higher speed. The invention also features a washable or disposable laminar-flow hood, comprising a fabric sheath bounded at each end by a plane perpendicular to the axis of the fabric sheath.

Abstract: A monitoring device and a driving control system for a fan filter unit in a semiconductor clean room for monitoring the operating state of the fan filter unit. The monitoring device includes a switching section in each fan filter unit which alternately applies electrical power to one of a plurality of terminals. The switching section is responsive to a force from an air stream introduced therein via rotation of a fan in the fan filter unit. A display section in each fan filter unit is connected to the plurality of terminals which provide different signals, indicative of an on or off state of the fan, according to which of the plurality of terminals is electrically connected to the electrical power.

Abstract: A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold

Abstract: An air shower apparatus of this invention includes an air shower room, a ring member provided within the air shower room and having a plurality of air blowing outlets for blowing clean air in a direction of a chamber entrant to remove dust particles, and a vertical drive unit for moving the ring member up and down in such a manner that clean air is blown towards the chamber entrant from head to toe. The plurality of air blowing outlets are arranged at prescribed intervals along the inner periphery surface of the ring member in such a manner as to surround the chamber entrant.

Abstract: A fan drive checking system, for an air conditioning system in a clean room having a fan filter unit (FFU), includes a flow sensor for sensing air flow inside a housing of a FFU. The sensor provides a sensor signal indicative of normal and adverse flow conditions in the housing. A control portion in data communication with the sensor outputs a control signal responsive to the sensing signal. An alarm in data communication with the control portion provides a warning when the control signal indicates the adverse flow condition.

Abstract: A chemical washing system is presented including a chemical dispensing system. The chemical dispensing system includes a container for storing a liquid chemical, a dispensing unit coupled to the container for dispensing the liquid chemical, and a conduit for conveying the liquid chemical from the dispensing unit to a receptacle of a machine which uses the liquid chemical during normal operation. The container, the dispensing unit, and the receptacle may be enclosed within one or more service areas separate from a "user interface area" containing a portion of the machine with which a user interfaces during normal operation. In order to prevent airborne particulates and other contaminants within the one or more service areas from entering the user interface area, a positive air pressure differential is maintained between the user interface area and the one or more service areas. The chemical washing system includes a textile laundering appliance (e.g.

Abstract: An arrangement for supplying air to a room, preferably a clean room, which is divided into zones (A, B, C) with different climatic requirements, comprises a first air treatment unit (11) for supplying air to a pressure chamber (5) which is shared by a plurality of zones and from which air is supplied to the various zones. The arrangement also comprises at least one mixing spaced (14) communicating with the pressure chamber (5) and a second air treatment unit (17). The mixing spaced is intended for mixing of the air from the first (11) and the second (17) air treatment unit. The mixing space also communicates with at least one of the zones (B) for supplying the mixed air to this zone (B).

Abstract: A clean room filter unit mounting system including a bracket, a bracket and fastener assembly, and individually mounted filter units. The bracket and fastener assembly includes a bracket having a relatively fixed member and a relatively movable member to allow misaligned mounting of parts such as the filter units in a clean room ceiling to fixed suspension rods without perfect registration of the bracket fixed member with the suspension rods, and a fastener able to pass through both bracket members in a first arrangement and to block such passage in a second disposition.

Abstract: An improved apparatus and method are disclosed for reducing or minimizing the particulates and other contaminants which may be brought into a restricted or clean room area. The apparatus and methods include an improved gown having positioning elements for keeping portions of the gown in place to permit inflation of the gown, for example during an airwash, and the apparatus and methods may also include gown inflation apparatus to remove the particulates and contaminants. Apparatus and methods of the present inventions also inflate the gown not only to eject particulates and contaminants that may be entrained or caught in the gown fabric, but also can be used to inflate the gown while the operator is in an air shower. Methods and apparatus of the present inventions also provide for an improved glove to gown seal, in addition to a reduced possibility of contamination from particulates or moisture from the operator's hands and an enhanced comfort level in the use of latex or rubber gloves with the gown.

Abstract: A modular fan filter unit designed to supply process control air to mini-enclosure clean rooms. The modular fan filter unit is easy to remove, repair, and replace in the clean room environment. It has a readily accessible filter mounted across its bottom surface and an internal variable frequency drive fan. The fan pushes air through the filter into a clean room. Multiple numbers of modular fan filter units may be connected together as an array.

Abstract: A turbo-axial fan assembly is provided for a clean-air supply system of a substrate handling module of a vacuum processing system. The turbo-axial fan assembly has one or more turbo-axial fans for generating airflow through the substrate handling environment. The turbo-axial fans have tunable vanes for controlling the speed of the airflow and efficiently using the available power.

Abstract: An antiseptic clean system according to the invention is designed to effectively and thoroughly destruct not only drifting microbes but also germs that have fallen and are adhering to the panels and to the backsides and the gaps of the pieces of equipment installed in the room. It is adapted for use with a clean room provided with antiseptic panels and comprises one or more than one air conditioners, each having an air conditioner main body containing therein a photocatalyst so that air is fed back into the room after passing through the photocatalyst.

Abstract: A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus includes an enclosing structure having an outer wall and at least one door, a polishing section enclosed by the enclosing structure for polishing a surface of a workpiece by holding the workpiece and pressing the workpiece against a polishing surface of a turntable, a sensor for detecting an opening or closing of the door, and an exhaust system for exhausting ambient air from an interior of the enclosing structure. The polishing apparatus further includes an adjusting mechanism for adjusting an amount of air which is exhausted from the interior of the enclosing structure. The amount of air exhausted from the interior of the enclosing structure is reduced by the adjusting mechanism when the door is closed, and the amount of air exhausted from the interior of the enclosing structure is increased by the adjusting mechanism when the door is opened.

Abstract: A substrate processing apparatus and a thermal processing apparatus are capable of creating a pattern with an excellent line width uniformity. An ACU conditions air to a temperature and a humidity which are suitable to processing which uses a resist of chemical thickening type, while an ammonia removing filter removes an ammonia component from the air and the air is supplied to an air supply pipe which branches off. A pump, a flow meter and a pressure regulator are disposed to an air supply pipe, so that the air from the ACU, as it is conditioned to flow at a constant flow rate and with a pressure, is supplied to a PEB bake unit. Since the temperature and the humidity of an atmosphere within the PEB bake unit stabilize at values which are suitable to processing which uses a resist of chemical thickening type, it is possible to form a pattern with an excellent line width uniformity.

Abstract: A fan filter unit is provided for use in filtering air circulating in a clean room. The fan filter unit includes a unit casing; a ventilation fan housed in the unit casing; a dust removal filter in the bottom of the unit casing; and one or more gas absorption filters for removing gases from the circulating air. The one or more gas absorption filters are located in the unit casing such that the ventilation fan can be inspected without removing the one or more gas absorption filters and an inspector can walk on an upper face of the unit casing. In one preferred embodiment, the one or more gas absorption filters are located above the dust removal filter and below the ventilation fan. In a second preferred embodiment, a fan filter unit is provided that includes a plurality of fan filter subunits, each fan filter subunit comprising a unit casing, a ventilation fan housed in the unit casing, and a dust removal filter in the bottom of the unit casing.

Abstract: A Standard Mechanical Inter Face is described where a sensor causes a fan in a fan filter unit, attached to a Standard Mechanical Inter Face, to be turned on or off depending on the position of the door in semiconductor wafer equipment. An apparatus for realizing this and a method for its use are given. Two examples of sensors for realizing this invention are described. A preferred embodiment of the invention is the use of an infrared sensor placed within the Standard Mechanical Inter Face and containing an infrared transmitter and infrared receiver in one housing.

Abstract: An isolation work station comprising an enclosure, and an air circulation system and high efficiency air filter for generating a downwardly directed laminar air flow through the enclosure. Periodic sterilization of the enclosure may be accomplished by adding a sterilant, such as vaporized hydrogen peroxide, to the airstream, and the filter is impregnated with a catalyst for degrading the vaporized hydrogen peroxide during the purge cycle and wherein the airstream is circulated at a relatively low speed so as to increase the residence time in the filter.

Abstract: An isolation bar is provided across the center of an air filtration unit for a laminar flow clean room. When a panel for partitioning the clean room is installed across the center of a filter of the air filtration unit, the isolation bar is used for fixing the panel thereon, thereby dividing the filter into two sub-filters, instead of using two conventional half sized air filtration units that require respective fans for smooth downstream flow of air. As a result, the air filtration unit including the isolation bar according to the present invention is capable of reducing cost and power consumption without any efficiency loss.

Abstract: An apparatus for providing a clean working environment includes an isolation booth, a worker booth, and an access device arranged to enable a worker in the worker booth to handle material in an isolation chamber formed in the isolation booth. A pressure generator is positioned to communicate with the isolation chamber to generate an air pressure therein that is less than the air pressure of an air curtain passing through the worker booth so that air is drawn from the air curtain in the worker booth into the isolation chamber through any air leak opening that develops in and around the access device so as to block outflow of air in the isolation chamber to the worker booth through the air leak opening.

Abstract: A semiconductor wafer storage apparatus includes a wafer storage unit main body and a gas supply unit with a chemical filter, the gas supply unit being arranged independently of the wafer storage unit.

Abstract: An auxiliary device is used in the exchanging of a filter in a clean room having a production section, and a filter frame including a filter-supporting portion which supports the filter and an extending portion which extends from the filter-supporting portion toward the production section. The auxiliary device includes a block plate to be inserted in the extending portion of the filter frame, a support supporting the bottom of the block plate and facing an inside wall of the second portion of the filter frame, and an inflatable tube disposed along the circumference of the support. The tube is inflated to press outwardly and seal the device in the filter frame, thereby blocking the flow of any unfiltered air past the filter and into the production section. Thereafter, the filter is removed and a new filter is set in its place. Finally, the tube is deflated so as to free the device from the filter frame.

Abstract: A clean room ceiling structure includes a support structure and filter units with a filter frame and a filter secured in the filter frame. The filter frames are connected to the support structure. The filter units have sealing fluid grooves for sealing the filter units relative to the support structure.

Abstract: An apparatus for controlling air flow includes a grating having a plurality of air vents, a shutter assembly composed of a shutter fixed plate, having a plurality of first openings, attached to a lower surface of the grating, and a shutter moving plate, having a plurality of second openings corresponding to the first openings, movably disposed between the grating and the fixed plate. An opening-ratio controller moves the moving plate with respect to the fixed plate whereby an opening ratio defined by relative positions of the first openings and the second openings is controlled. The separation between the grating and the shutter fixed plate may be the thickness of the shutter moving plate. The opening-ratio controller may include an opening-ratio controlling screw having a pinion attached to the screw end.

Abstract: A method and apparatus provides a resource capable of affecting the manufacture of a product to a bay and a chase. Clean resource is supplied to the bay where it is used to affect the manufacture of a product in one or more steps highly sensitive to contaminants in the resource. The resource contaminated by the manufacture of the product is then sent to a chase where it is further used to affect the manufacture of the same or a different product in steps that are less sensitive to the contamination of the resource. Because the bay is most sensitive to contaminants in the resource, the impurified resource received at the chase may not adversely affect the manufacture of products in the chase and thus, supplying a clean resource to the chase is unnecessary.

Abstract: This patent discloses a modular environmental control system for small cleanroom enclosures ("mini-enclosures"). Small environmental control units ("ECUs") are mounted on top of individual mini-enclosures, as near as possible to the process tool within the enclosure. Each ECU has the capability of controlling temperature, humidity, and airflow rate delivered into the enclosure. Temperature is adjusted by first cooling the air inside the ECU followed by reheating it to a selected temperature. The cooling capability is not generated by individual ECUs. Instead, a remote fluid cooling unit supplies chilled fluid to each ECU, which is circulated internally to cool the air. The same remote unit services different ECUs at the same time.

Abstract: A clean room filter unit mounting system including a bracket, a bracket and fastener assembly, and individually mounted filter units. The bracket and fastener assembly includes a bracket having a relatively fixed member and a relatively movable member to allow misaligned mounting of parts such as the filter units in a clean room ceiling to fixed suspension rods without perfect registration of the bracket fixed member with the suspension rods, and a fastener able to pass through both bracket members in a first arrangement and to block such passage in a second disposition.

Abstract: A portable cleanroom cabinet (20) having a portable cabinet device (22), configured for mobile transport, which provides a cavity (23) formed for receipt of at least one electronic component (21) therein. The cabinet device (22) defines at least one air flow passage (32) having a first opening (33) in flow communication with an upstream end (29) of the cavity (23), and a second opening (35) in flow communication with an opposite downstream end (36) of the cavity (23). Collectively, these passages and cavities define a recirculating airflow pathway such that substantially all the air flowing through the cavity (23) from the upstream end (29) to the downstream end (36) thereof recirculates back through the air flow passage (32) to the upstream end (29).

Abstract: A gas filling facility and method which maintains the purity of a gas to be filled. A connection of a gas supply pipe and a gas filling pipe attached on gas containers is performed in a first clean room while the storage of the gas filling pipe occurs in a second clean room. When the gas filling pipe is stored, ultra-high purity nitrogen gas is caused to flow through the inside thereof, so that the inside of the gas filling pipe remains under an extremely clean state.

Abstract: A fan is attached directly adjacent to a clean air filter sealing an air inlet under a horizontal portion of a plenum chamber below a vertically movable loading platform which all move as a unit. A vertical portion of the plenum chamber, trapezoidal in cross-section, communicates with a wafer pod on the loading platform through an angled perforated grill sealing an air outlet from the vertical portion of the plenum chamber. Clean air flows evenly throughout the entire height of an angled perforated grill over the surfaces of the wafers. Mechanisms lift the pod cover and load and unload the wafer carrier.