Abstract: A fan carrier defines one or more enclosures with each enclosure receiving a fan unit. A first wall of the carrier includes at least one air vent that can be covered by a fire mesh. A second wall is substantially perpendicular to the first wall. The first and second walls form two walls of an enclosure for a fan unit. The second wall extends outwardly from the enclosure to define ears with locating lugs for locating the fan unit in a housing of the computer system. A fan subassembly includes the fan carrier and at least one fan secured therein, whereby the fan assembly can be installed in the computer system much more easily that a fan without the carrier. The fan subassembly can be located adjacent a vented portion of a housing wall of the computer system in a gap in a flange of that housing wall. The ear of the fan carrier is configured to overly a portion of that flange adjacent the gap and with the lug being received in a hole in said portion of the flange.

Abstract: An installation for processing wafers that includes fabrication units, which are located in a clean room, and includes a supply system for supplying and discharging operating substances for the fabrication units. The supply system has first supply lines and first discharge lines, in which operating substances that are heavier than the surrounding atmosphere are downwardly guided. The supply system has second supply lines and second discharge lines, in which the lighter operating substances are upwardly guided.

Abstract: The present invention relates to a method and a device for providing clean air in premises, wherein impure air is received or taken in into an air treatment device (1) from lower portions of the premises and cleaned or purified therein. A first partial flow (DS1) of air received or taken in into the air treatment device (1) is cooled, while a second partial flow (DS2) of air received or taken in into said air treatment device (1) is heated. The cooled air (KL) in the first partial flow (DS1) is brought to flow, through at least one cell body member (17) in at least one air discharge unit (15), slowly downwards without substantial co-ejection of surrounding air to define at least one zone of clean air (RZ) in the premises beneath the air discharge unit (15). The heated air (VL) in the second partial flow (DS2) is discharged, through an air discharge opening (16), in an upwards direction such that said heated air (VL) rises in the premises at low speed.

Abstract: A specified gas is supplied into a chamber where masks or reticles to be exposed are arranged. Part of the air-gas mixture within the chamber is exhausted into the atmosphere. After that, when the gas within the chamber reaches a specified concentration, part of the air-gas mixture within the chamber is circulated and an appropriate concentration of gas is supplied to the chamber.

Abstract: A gas removal system that removes a halogen gas remaining inside a processing chamber after executing a specific type of processing inside the processing chamber maintained in an airtight state with plasma obtained through discharge dissociation of the halogen gas supplied from a gas supply device comprises a pressure control device that controls the pressure inside the processing chamber, an air supply device that supplies the atmospheric air into the processing chamber after the pressure inside the processing chamber is lowered by the pressure control device, a control device that controls the air supply device and an evacuation device that evacuates a gas produced through a reaction of the halogen gas and the atmospheric air having occurred inside the processing chamber.

Abstract: The present invention generally relates to mail processing and environment control. Systems for controlling a mail-processing environment to protect against contaminants may comprise a first air vent for supplying air to the mail-processing environment, a second air vent for exhausting air from the mail-processing environment, an air exchanger coupled to the first air vent and the second air vent for exchanging air in the environment, a first damper for substantially blocking air supplied to the environment through the first air vent, a second damper for substantially blocking air exhausted from the environment through the second air vent, and a control circuit for controlling the first damper and the second damper in response to a possible presence of contaminants in the mail-processing environment.

Abstract: A clean room of the down-flow type has, arranged therein an article processing apparatus A for performing a predetermined processing on articles, and an article storage apparatus B having a plurality of article storage units 5. An overlapping apparatus portion is disposed above article receiving portions 15 of the article processing apparatus A in a vertically overlapping relationship. An air guide passage 16 is formed for guiding clean air blown downward from a ceiling area of the clean room, from a rear air passage L to positions under the article storage unit 5 in the overlapping apparatus portion. An air outlet 17 is provided for blowing the air guided by the air guide passage 16 below the article storage units 5, downward toward the article processing apparatus A.

Abstract: A manufacturing apparatus for a semiconductor device comprises: a clean room for installing a plurality of semiconductor manufacturing and processing apparatuses; an external air cleaning device connected to a supply port of the clean room for supplying a cleaned-up outside air into the clean room; a common air duct section installed in the clean room; a first air cleaning and ventilating means connected to said common air duct section for cleaning and ventilating a part of the cleaned-up outside air to the common air duct section; individual air duct section branched off from the common air duct section and connected to each of said semiconductor manufacturing and processing apparatuses; and a second air cleaning and ventilating means interposed between the individual air duct section and each of the semiconductor manufacturing and processing apparatuses for cleaning and ventilating the air to be supplied to each of the semiconductor manufacturing and processing apparatuses.

Abstract: The invention relates to a compartment 10 having a space 32 segregated from air outside the compartment and capable of housing a product apparatus for assembly of, for example, semiconductor devices and integrated circuit packages in a “clean” environment. The compartment 10 includes panels 16 to segregate the air inside the compartment 10 from the surrounding environment. At the front of the compartment 10, there is a top access panel 12 and a bottom access panel 14 to access a production apparatus (not shown) which is houseable or storable within a space 32 for such apparatus defined within the compartment 10. Where it is desired to place a plurality of similar compartments 10 adjacent to one another to provide a production line, an opening 18 can be included in one or both of the side panels 16 for transfer of processed material, such as leadframes for assembling integrated circuit packages, from one production apparatus to another, housed in respective adjacent compartments 10.

Abstract: A fingerprint capture or processing apparatus incorporates a casing defining a sealable chamber, a first support in the chamber for holding a source of a chemical fingerprint fixative agent, a second support in the chamber for holding an article to be tested for fingerprints, a filtration system connected to the chamber for removing contaminants from air in the chamber, and an air circulation assembly operatively connected to the casing for circulating air from the chamber and through the filtration system. Preferably, the air circulation assembly is a closed system, ensuring that no contaminants will be spilled to the ambient atmosphere prior to complete cleansing of the air inside the casing. A humidity control device may be connected to the air circulation assembly for modifying a humidity level in the chamber to a predetermined relative humidity, thus optimizing effectiveness of the chemical fingerprint fixation agent.

Abstract: According to the invention, vacuum pumping systems are integrated in the intermediate space between a supporting slab and a clean room false floor formed from a juxtaposition of false floor tiles held by posts resting on the supporting slab. A platform, whose size is greater than the floor space requirement of the vacuum pumping system to be integrated, and substantially equal to that of a false floor tile, is held away from the supporting slab by feet resting on the supporting slab. Thus part of the space underneath the vacuum pumping systems is freed, for the free passage of cables and ducts. Simultaneously the vacuum pumping system is isolated with respect to the false floor, in order to avoid the transmission of vibrations.

Abstract: An air filtration system uses a liquid to remove impurities from the air. A specialized chamber allows the air and liquid to contact each other in close proximity, so that the liquid can pick up not only particulate matter, but fumes and toxic gasses as well. The air can be bubbled through the liquid, or the liquid can be introduced into the chamber as a gentle rain, a spray, a vapor, a waterfall, or any other configuration that allows active contact between the two mediums. The liquid can then be cleaned of contaminants, e.g., by centrifugal force, while the liquid is then reused.

Abstract: A air curtain adapted for use in a car wash. The air curtain includes a rotating diffuser allowing for multiple airflow trajectories, including airflow trajectories having vector components both into and out of the car wash tunnel. The air curtain utilizes a variable cross-section duct connected to the rotating diffuser to provide a constant velocity airflow from the numerous air outlets in the rotating diffuser with only a single motor and blower acting as a source of airflow.

Abstract: Enclosures having adjustable clean gas flow environments and methods of enclosed pressure differential distribution technology. Specifically, clean gas flow enclosures, which provide for the isolation of materials from airborne micro-particulate contamination. An embodiment of the invention utilizes a small footprint, modular, selectable, clean-gas flow environment for handling and isolating materials. The environment can be a clean room class environment by providing filtered gas from a gas flow generator (12) through a gas filter (13) to a filtered gas flow space (20). An embodiment of the invention provides a first plenum (23) and a second plenum (26) so that both a horizontal filtered gas flow and vertical filtered gas flow may be used separately or in combination within the same filtered gas flow space (20).

Abstract: In a working method of performing working of a work, a plurality of work chambers corresponding to work steps for the work are consecutively arrayed, and a cleanliness with respect to dust particles is independently controlled in each of the work chambers, the work is transferred to the respective work chambers, and working is performed in each of the work chambers in which a cleanliness is maintained below a predetermined cleanliness corresponding to the type of working of the work.

Abstract: The invention relates to a method and a device for separating at least two physical areas (1, 2) and for reducing the transmission of air-borne particles between said physical areas so as to protect persons and/or products (26) from said air-borne particles. The persons is located at least partly in the first physical area (1) and the products (26) in the second physical area (2) and at least one flat jet (13) of purified air is used to separate the two areas. The invention is characterized in that at least one low-turbulence displacement air stream (14) of purified air is generated at least in the second physical area (2) near the at least one air jet (13) and said at least one displacement air stream is directed primarily in the same direction as the at least one air jet (13).

Abstract: A modulator transportable collective protection system for the decontamination and containment of personnel in a toxic free area. A contamination containment area is provided through which personnel are decontaminated prior to entering the toxic free area. The migration of contaminants is prevented by causing a purge of clean filtered air from the toxic free area to the contamination control area and to the exterior environment. A blower and filter unit provides air to the toxic free area to maintain an over pressure therein, ensuring that all entry to the toxic free area is through a flow of clean air.

Abstract: A compact, portable, lightweight, low power consuming, convenient, versatile and sterile laminar airflow device, useful in obtaining a workspace substantially devoid of airborne particulate contaminants, said device having a body (C) divided into an upper and lower chambers; the upper chamber housing one or more pre-filtration members (B), a motor (T) driving a fan (S), and one or more filters (U) located below the motor; and the lower chamber provided with a slideable front panel (M), a removable platform (X) located at the lower portion of the chamber and a perforated plane (N) placed on the removable platform.

Abstract: The invention is an airborne contamination control system with a main device unit and a remote unit. The main airborne contamination control unit is a cabinet including a motor in communication with an air treatment path. The main unit has a variety of configurations. The main unit has the capability to be connected to any of a plurality of lightweight remote units, depending on the specific application. These remote units are highly portable and of a small dimension which permits them to be employed in areas inaccessible to the main unit. The main unit is connected to the remote unit by an elongated and flexible duct. Both the main unit and remote unit have a general cabinet structure with mounting structure designed to receive dual or single articulated suction ducts thereon. The articulated suction ducts may be placed proximal a work piece which is being coated, abraded or treated by spraying.

Abstract: The clean room of this invention includes a first clean region in which a semiconductor substrate to be set in a fabrication system is disposed and a second clean region adjacent to the first clean region in which an operator is disposed. A first air flow flowing downward is introduced into the first clean region and a second air flow flowing downward is introduced into the second clean region. The rate of the first air flow is higher than the rate of the second air flow.

Abstract: A pedestal for mounting semiconductor fabrication equipment within a clean room. The pedestal includes a base frame sitting on a waffle slab and utility connections. The equipment can readily be connected to the utility connections when positioned on the pedestal. The utility connections are located at the periphery of or across part of a face of the pedestal to thereby define a service area within the periphery.

Abstract: Materials not releasing gaseous organic materials during use are used as a dry-type sealing material such as a gasket disposed upon mounting an air filter to an opening of a ceiling or the like, a wet-type sealing material filled and used in a gap for connecting wall materials or partitionings, a vinyl chloride sheet or a vinyl chloride cloth as a facing material for walls and floors. Specifically, a carboxylic acid ester having a molecular weight of not less than 400 is used as a plasticizer, a phenolic compound having a molecular weight of not less 300 is used as an antioxidant, an aliphatic hydrocarbon having not less than 19 carbon atoms (for example, microcrystalline wax) is used as a lubricant, and an alkylamine ethylene oxide adduct having a molecular weight of not less than 350 is used as an antistatic agent.

Abstract: Information from fan filter units and differential pressure gauges provided in a ceiling of a clean room is used to control directions and volumes of air flows blown from respective fan filter units. In order to improve a wind velocity distribution in the clean room, pressure in a ceiling chamber is made uniform and control of the FFU revolution speeds of fan filter units is made easy. In order to control directions of air flows in the clean room, damper adjusting mechanisms are provided under a grating floor of the clean room. Such arrangement enables optimizing an operating condition of the clean room and achieving energy saving.

Abstract: A system which easily changes a positive pressure space to a negative pressure space or vice versa. The system includes at least one space divider which forms first and second closed spaces. A blower, and blower duct combination in the first space is connected with one end of an airflow duct in the second space to force air into the second space to create a positive pressure in the second space. For creating a negative pressure in the second space, the blower, blower duct is placed in the second space and an outlet end of the blower duct is connected to another end of the flow duct in the second space to force air from the second space to produce a negative pressure in the second space. The flow duct is provided with apertures in a bottom surface through which air is forced into the second space when a positive pressure space is created.

Abstract: In order to achieve a high cooling power while avoiding troublesome cold air flows, a chamber (2) is sealed, from the room to be cooled, by a thin cooling wall (1) of powder-coated steel with micro-holes which are arranged in a square 5 mm grid and have a diameter of 0.5 mm and whose free cross-section is consequently less than 1%. An antechamber (4) which is connected to the chamber (2) through a partition (3) by means of a distributor nozzle (17) and has air connections for connection to an air supply or an adjacent air-cooling element is arranged above the chamber (2). The cool air is introduced into the chamber (2) via the distributor nozzle (17) in such a way that it passes with high turbulence along the inside of the cooling wall (1). An air-cooling arrangement consists of rows, arranged side by side, of air-cooling elements whose antechambers (4) are connected by connecting nipples which each project into connecting orifices (10) of adjacent air-cooling elements.

Abstract: A plant for producing semiconductor products that includes at least one clean room having a floor and a plurality of production units that are configured in the clean room. The plurality of the production units define processing locations for processing semiconductor products. The processing locations are located near the floor of the clean room. The plant also includes an air supply system for directly feeding in feed air at the processing locations. The circulation of feed air and waste air caused by the force of gravity is utilized so that feed air is made available with little energy expenditure.

Abstract: A fan unit including a fan blower configured to emit air in a plurality of directions in an airflow plane. The fan unit includes first and second guide surfaces disposed on a first side of the fan blower in the airflow plane to define together with a wall part, a first airflow path leading to a first airflow channel. Third and fourth guide surfaces are disposed on a second, opposite, side of the fan blower in the airflow plane, to define with a wall means a second airflow path leading to a second airflow channel. The guide surfaces may be mounted on separate guide means which are identical to one another.

Abstract: Disclosed is an access floor made using a special transfer paper which is laid on a floor of the interior of a clean room to prevent generation of dusts or bacteria in a factory of and integrated circuit such as a semiconductor, a laboratory for optics, genetic engineering and space engineering, a clinic room and so on, in which a conductive paint is coated on an upper surface of a plate and a special transfer paper with various patterns and colors are deposited and integrated on the conductive paint.

Abstract: A vacuum airtight hard plastic room (like a room size food storage container) for portablity from hospital to hospital for a cancer free surgery, a plastic room (a giant plastic container) thats airtight, Vacuum to zero level oxygen, so when a incision is made during surgery to remove the cancer that is a spreadable cancer from oxygen, there is no oxygen to come Into contact with the cancer therefore the cancereous tissues could be remove successfully with out spreading further during surgery, the patient, doctors, nurses will be supplied with oxygen tanks, and mask, before and during surgery.

Abstract: In a process facility for producing semiconductor wafers, a third physical unit is configured between two physical units that produce mini environments. The third physical unit has a laminar flow at right angles to the laminar flows of the two physical units and is operated with a slightly higher flow velocity. According to the Bernoulli equation, the static pressure in the third physical unit is therefore lower than in the surrounding two physical units. Advantageously, therefore, no contamination from the more highly loaded one of the two physical units passes over into the lesser loaded one of the two physical units.

Abstract: A system for transporting substrates into a clean room is provided. The system has an isolation chamber located between the clean room and a staging area. A first movable closure is coupled to the staging area side of the isolation chamber and is adapted to open a substrate shipping container. A second movable closure is coupled to the clean room side of the isolation chamber and is adapted to open a substrate interprocess container. A substrate transfer robot is located within the isolation chamber and is adapted to transfer substrates from the substrate shipping container, opened by the first movable closure, to the substrate interprocess container opened by the second movable closure.

Abstract: A semiconductor manufacturing apparatus ventilating system can reduce energy consumption with respect to air-conditioning and a power spent for transporting air in a clean room by minimizing an amount of circulating air in a clean room. The clean room air, which is supplied to the clean room, is introduced into an air circulating system including the semiconductor manufacturing apparatus. The air circulating system is separated from an atmosphere in the clean room. The clean room air in the air circulating system is circulated within the air circulating system.

Abstract: An airflow shutdown system that includes an air distribution system and an air duct closure device. The air duct closure device is adapted to substantially instantaneously block airflow in the air distribution system when activated. The system also includes an integrated control system coupled to the air distribution system and adapted to activate the air duct closure device and stop an operation of other air distribution devices in the air distribution system in order to prevent migration of air through the system.

Abstract: A clean garment is provided with inherent identification data. A measuring part measures the cleanliness of the clean garment and outputs the obtained measurement data. An identification data input part reads the identification data of the clean garment and outputs it as an identification data. At least the previous measurement data is stored in a data base in association with the identification data. A signal processing part receives the measurement data and identification data. In the signal processing part, the previous measurement data of the clean garment is read from the data base based on the received identification data C, to calculate the difference (increment) between the now obtained measurement data and the previous measurement data, and the obtained difference is referenced to a predetermined criterion, to judge the cleanliness of the clean garment. The cleanliness of clean garments can be managed per clean garment by a clean garment managing system.

Abstract: A common structure, such as a home or other building, equipped with an apparatus, comprised of a positive pressure ventilator and a decontaminator device, can be immediately converted into a safe area for human inhabitants, machines, and materials, against chemical or biological attack. The apparatus takes in outside contaminated air, destroys and/or removes the biological or chemical agent, renders the air breathable, and forces the now decontaminated air into the structure. The structure is slightly pressurized with decontaminated air, causing positive and continuous outflow preventing contaminated air from entering the structure. The invention includes the apparatus, the method of positive pressure for preventing the entry of harmful agents, and kits and methods for further rendering a conventional structure into a safe area.

Abstract: In a ceiling (12) of a room (10) of a clean room device (15), fan filter units (14) are arranged at distances, and to an open grid space where no fan filter unit (14) is provided, a breathable body (40) is provided. When clean air is sent from an over-ceiling space (16) into the room (10) by the fan filter unit (14), an air pressure in the room (10) becomes higher than that in the over-ceiling space (16), and part of the air in the room (10) flows to the over-ceiling space (16) through the breathable body (40). Consequently, it is possible to prevent an occurrence of a swirling current in an area under an open grid space in the room (10), and cleanliness in the room (10) can be raised.

Abstract: A room has a door for closing a door opening in an openable manner. A thermal printer with electronic circuits is installed in the room. An air pressure managing system for the thermal printer includes a door state photo sensor for monitoring a state of the door, and outputs an open signal when the door is open. A dustproofing fan is actuated in response to outputting the open signal, for adjusting pressure of air in the thermal printer, to prevent the thermal printer from being influenced by air flowing from outside the door opening.

Abstract: An air filtration system for filtering air drawn into a substantially enclosed environment, such as a room, having an access opening includes a box having sidewalls, a flexible sheet of substantially air-impermeable material sized to cover the access opening of the environment, at least one filter having a body and a rigid rim encircling the body, and a pump having an inlet conduit through which air is drawn into the pump during pump operation. The components can be assembled to form a filter-supporting unit and, with the aid of the flexible sheet, sealed across the access opening to convert the environment into a shelter into which filtered air is pumped.

Abstract: A heat exchange section (72) is provided in the middle of a circulation water path (58, 59) connecting between a temperature-controlled water tank (71) and a semiconductor manufacturing apparatus body (4) so as to perform a heat exchange with air of a clean room (3). The heat exchange section (72) is installed near an exit of an air circulation path (32) above a fan-filter unit (34) of the clean room as a temperature stabilized area off an atmosphere of the clean room (3). Additionally, as another method, a temperature of a chemical fluid from a chemical fluid tank (6) is controlled to be a temperature of the air in the clean room by a heat exchange section (61) provided in a location the same as above without using the temperature-controlled water so as to supply the chemical fluid to the semiconductor manufacturing apparatus body (4).

Abstract: A damper for an air flow system opening, such as the air inlet of a clean room filter module, includes a number of control plates (14, 15) reciprocally mounted on holding elements (22) and a drive element (24, 36) supported from a supporting surface (20) with an airflow opening (21) therein. Gaskets (30, 31) seal around apertures (16, 18) and the airflow opening to allow more accurate and positive control and diffusion, as well as virtually complete shut off, of airflow through the opening. A tool (42) is used to rotate a threaded end (34) of the drive element rotatably held in an opening in a beam (40) by holders (38). The threaded end of the drive element cooperates with an internally threaded opening in a non-round-shaped traveler (36) passing through matching non-round openings in the control plates.

Abstract: Using a clean box 30 which includes a box body 31 having an annular groove 33 for suction surrounding a side aperture 32 and an intake/exhaust port 34 in communication therewith, a side lid 35 for closing the aperture 32 while being sucked by a pressure difference between inside and outside a space S for suction formed by the annular groove 33 for suction, and an additional lid 36 for closing the intake/exhaust port 34 by a pressure difference between inside and outside thereof, the clean box 30 is connected to a gate aperture 42 of a clean room 40, a vacuum changer 50 evacuates a hermetically closed space outside the box body including the additional lid 36 to cancel the pressure difference between inside and outside of the additional lid 36 and opens the intake/exhaust port 34 to turn the space S for suction into the atmospheric pressure, the side lid 35 is drawn into the clean room 40 to establish communication between the clean box and the inside of the clean room, and objects to be transferred are then t

Abstract: A storage and retrieval system is provided for safely and efficiently storing reticles in a clean environment. An enclosed storage unit is provided for storing the reticles, and other items such as wafers and the like, in an environment which minimizes the amount of contaminants and is suitable for use in a semiconductor fabrication clean room. A retrieval unit is provided separate from the enclosed storage unit for accessing and staging the reticles before they enter and leave the storage unit for minimizing exposure of the storage unit. The storage unit includes a movable storage matrix having a plurality of bays for storing the reticles. The movable storage matrix is selectively moved or rotated by a drive mechanism that is located external to the storage unit so that the storage unit is substantially free of contaminant generating components.

Abstract: An object of this invention is to reduce the capacity of an air pressure supply equipment in a semiconductor manufacturing factory without decreasing the productivity of a manufacturing system. To achieve this object, the manufacturing system includes a plurality of processing apparatuses (1, 2, 3), an air pressure supply apparatus (4) which supplies a gas pressure to the plurality of processing apparatuses, and a control apparatus (7) for controlling the plurality of processing apparatuses. The control apparatus creates operation schedules for the plurality of processing apparatuses on the basis of temporal change information of an air pressure consumption amount corresponding to the operation order of each of the plurality of processing apparatuses so as to prevent the sum of air pressure consumption amounts of the plurality of processing apparatuses from exceeding the air pressure supply ability of the air pressure supply apparatus.

Abstract: A glove box assembly is used for contamination-proof mail handling. Items of mail, after they are placed into the glove box cavity and the cavity is sealed, are opened and simultaneously examined for any suspiciously hazardous materials. Harmful exposure to chemicals and biological cultures can be substantially reduced if mail items, such as envelopes and small packages are opened in the mail handling cavity while it is hermetically sealed. The glove box assembly has a see-through lid which allows completely open inspection of all mail items as they are being opened. The cavity may be lighted and any type of mail processing device may be placed at ready inside the cavity.

Abstract: A semiconductor manufacturing facility is provided, which can reduce a thermal load in a clean room and reduce an amount of energy thereof. Semiconductor manufacturing equipment, which generates heat when it is used, is installed in the clean room and is covered by a housing. The housing is configured to be capable of introducing the air inside the clean room into an interior thereof. The air inside the housing is exhausted outside the clean room through a plurality of exhaust passage members. A heat insulating material is associated with the housing to reduce the release of heat from the housing to the air inside the clean room. A space between the housing and the semiconductor manufacturing equipment may be hermetically sealed, and an air introducing member may be connected to the housing to take air outside the clean room into the hermetically sealed space.

Abstract: A method for creating a reduced particle environment in a localized area of a mechanically active transport interface is provided. The augmentation of the air flow results in a sweeping air flow to remove particles in and around the desired area. The augmented air, flow will eliminate static or turbulent air flow regions and assist in removing potential particles from the vicinity of the substrate. This will prevent particles from being deposited on substrates thus fostering higher yields and improved quality.

Abstract: A clean room of the down-flow type has, arranged therein an article processing apparatus A for performing a predetermined processing on articles, and an article storage apparatus B having a plurality of article storage units 5. An overlapping apparatus portion is disposed above article receiving portions 15 of the article processing apparatus A in a vertically overlapping relationship. An air guide passage 16 is formed for guiding clean air blown downward from a ceiling area of the clean room, from a rear air passage L to positions under the article storage unit 5 in the overlapping apparatus portion. An air outlet 17 is provided for blowing the air guided by the air guide passage 16 below the article storage units 5, downward toward the article processing apparatus A.

Abstract: A device for exhaust air processing of clean rooms has a least one fresh air supply and at least one exhaust air device connected to a work room. At least one processing device is arranged in the work room. At least one supply line and at least one exhaust air line are connected to the processing device. At least one first filter is arranged in the at least one exhaust air line of the processing device, wherein the at least one exhaust air line is connected at least to one of the supply line of the processing device and the fresh air supply line of the work room.

Abstract: Information from fan filter units and differential pressure gauges provided in a ceiling of a clean room is used to control directions and volumes of air flows blown from respective fan filter units. In order to improve a wind velocity distribution in the clean room, pressure in a ceiling chamber is made uniform and control of the FFU revolution speeds of fan filter units is made easy. In order to control directions of air flows in the clean room, damper adjusting mechanisms are provided under a grating floor of the clean room. Such arrangement enables optimizing an operating condition of the clean room and achieving energy saving.

Abstract: A work station having an environmental controller for maintaining air flow in and through the work station at a user-selected level. The work station includes a pressure cabinet and a perforated work surface forming the top of the pressure cabinet. A pressure inducing assembly is located within the cabinet below the work surface to draw air into the cabinet and create a negative pressure in a work space defined above the work surface. A support coupled to two sides of the pressure cabinet provides a channel for air flow from the pressure cabinet to an air chamber located above the work surface. Air is drawn from the air chamber generally downward toward the work surface by the negative pressure created in the work space to provide an air curtain substantially surrounding the work surface.