For Use On Nonferrous Surface (e.g., Aluminum, Copper, Tin Plate, Etc.) Patents (Class 510/254)
  • Patent number: 11130690
    Abstract: The primary objective of the present invention is to provide a composition solution for livestock water and feed which eliminates harmful bacteria and encourages consumption. In certain embodiments, this composition solution may also remove bacteria from produce, treat water flows, process oilfield wastewater, destroy taste and odor contaminants in potable and drinking water, remove destructive contaminants from a wide range of industries, and eliminate hazardous pollutants.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: September 28, 2021
    Assignee: Biocide Solutions, LLC
    Inventor: Joe Nichols Skelley
  • Patent number: 11008497
    Abstract: Spacer fluid compositions comprising water, a clay, and a sulfur-containing polyether surfactant are disclosed, and such compositions often can further include a weighting additive, an antifoaming additive, and a co-solvent. These spacer fluid compositions can be used to treat metal casing and to remove drilling fluid residue for improved cement bonding in wellbore applications.
    Type: Grant
    Filed: August 20, 2020
    Date of Patent: May 18, 2021
    Assignee: Chevron Phillips Chemical Company LP
    Inventors: Marshall D. Bishop, Shawn M. Flom, Marcus D. Banks
  • Patent number: 9504292
    Abstract: A method for bonding PEBA plastic composition with dissimilar materials. Also, composite articles made in accordance with the method. The method uses only water-borne adhesive compositions.
    Type: Grant
    Filed: April 2, 2013
    Date of Patent: November 29, 2016
    Assignee: NIKE, Inc.
    Inventor: Thomas W. Wilson, III
  • Patent number: 9238588
    Abstract: Disclosed are corrosion inhibitor compounds and compositions useful in applications relating to the production, transportation, storage, and separation of crude oil and natural gas. Also disclosed are methods of using the compounds and compositions as corrosion inhibitors, particularly in applications relating to the production, transportation, storage, and separation of crude oil and natural gas.
    Type: Grant
    Filed: August 2, 2013
    Date of Patent: January 19, 2016
    Assignee: Ecolab USA, Inc.
    Inventors: Ryan Harrington, Keith Monk, Boyd Laurent, Jeremy Moloney
  • Patent number: 8987181
    Abstract: A photoresist and post etch cleaning solution for semiconductor wafers comprising: A. a polar aprotic solvent, B. an inorganic base; C. a co-solvent for said inorganic base; D. a unsaturated cycloaliphatic compound having a ring ether group and at least one substituent bearing a primary hydroxyl group; E. an organic base comprising an amine compound; and F. a nonionic surfactant bearing at least one ether group. The wafer containing photoresist residue or post etch residue can be cleaned by contacting the solution in a spray or immersion.
    Type: Grant
    Filed: October 15, 2012
    Date of Patent: March 24, 2015
    Assignee: Dynaloy, LLC
    Inventors: Kimberly Dona Pollard, Donald Pfettscher, Meagan Hatfield, Spencer Erich Hochstetler, Nichelle M. Wheeler, Michael T. Phenis
  • Publication number: 20150037606
    Abstract: An electrolytic copper foil includes a copper foil body; and a IIA-group metal adhered to a surface of the copper foil body, wherein a signal strength of the IIA group metal is greater than 0.1% based on a signal strength of copper element as 100% analyzed by a secondary ion mass spectrometer. The present invention also provides a method for cleaning copper foil and a cleaning fluid composition which is used in the cleaning method.
    Type: Application
    Filed: October 4, 2013
    Publication date: February 5, 2015
    Applicant: Chang Chun Petrochemical Co., Ltd.
    Inventors: Kuei-Sen CHENG, Yao-Sheng LAI, Tsang-Jin JUO, Jui-Chang CHOU, Hsi-Hsing LO, Yueh-Min LIU
  • Patent number: 8927474
    Abstract: An aqueous compressed gas aerosol formulation in combination with a lined steel can, which may also optionally be tin plated, to provide corrosion stability, fragrance stability and color stability. An aerosol formulation of particular advantage for use is an air and/or fabric treatment formulation. The combination provides a compatibility which allows for the ability to use a broader fragrance pallet for the air and/or fabric treatment formulation which is aqueous based in major proportion. The formulation includes, in addition to an aqueous carrier, a fragrance, nonionic surfactant(s) or a blend of nonionic surfactant(s) and cationic surfactant(s), a compressed gas propellant(s), pH adjuster(s), and corrosion inhibitor(s). The formulation has a pH of about 8 to less than 10. The corrosion inhibitor(s) is(are) mild in strength and used in a minor amount.
    Type: Grant
    Filed: March 16, 2012
    Date of Patent: January 6, 2015
    Assignee: S.C. Johnson & Son, Inc.
    Inventor: Bhaveshkumar Shah
  • Publication number: 20150005219
    Abstract: Use of a compound of Formula (I) as a metal surface corrosion activator, a formulation containing the same compound and a process by using the same compound for providing a clean metal surface. Said formulation may further comprise water, a solvent such as a dipolar aprotic solvent, a water miscible organic solvent, or an organic base.
    Type: Application
    Filed: December 20, 2011
    Publication date: January 1, 2015
    Applicants: RHODIA OPERATIONS, SOLVAY (CHINA) CO., LTD.
    Inventors: Fabien Bellenger, Cheng Shen, Claude D. Mercier
  • Patent number: 8900371
    Abstract: The present invention provides a cleaning agent for a substrate and a cleaning method thereof, which can effectively remove fine particles (particles) present on a surface of substrate or impurities derived from various kinds of metals (metallic impurities), without causing roughness surface of a substrate, in particular, a semiconductor substrate, and without causing corrosion or oxidation of metal wirings, in particular, copper wirings, provided on a surface of substrate, and can further remove at the same time a carbon defect present on a surface of substrate, without removing a metal corrosion inhibitor—Cu film, in particular, a Cu-BTA film.
    Type: Grant
    Filed: September 14, 2011
    Date of Patent: December 2, 2014
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Hironori Mizuta, Masahiko Kakizawa, Ichiro Hayashida
  • Patent number: 8883701
    Abstract: A solution for semiconductor wafer dicing is disclosed. The solution suppresses the adherence of contamination residues or particles, and reduces or eliminates the corrosion of the exposed metallization areas, during the process of dicing a wafer by sawing. The solution comprises at least one organic acid and/or salt thereof; at least a surfactant and/or at least a base; and deionized water, the composition has a pH is equal or greater than 4. The solution can further comprise, a chelating agent, a defoaming agent, or a dispersing agent.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: November 11, 2014
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Dnyanesh Chandrakant Tamboli, Rajkumar Ramamurthi, David Barry Rennie, Madhukar Bhaskara Rao, Gautam Banerjee, Gene Everad Parris
  • Patent number: 8877700
    Abstract: An aqueous detergent according to the invention contains substantially no polyalkylene glycol, but contains a salt of at least one of the following carboxylic acids A, B and C: A: an aliphatic monobasic carboxylic acid having a total carbon number of 9 or 10 and including a branched alkyl group; B: sebacic acid; and C: an aromatic monobasic carboxylic acid having a total carbon number of 11 to 13.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: November 4, 2014
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventor: Hiroshi Kawasaki
  • Patent number: 8859479
    Abstract: A stripping solution comprises a highly corrosive acid and an iron concentration of at least about 1.0 gram per liter (g/L). The stripping solution is air agitated to remove a coating from a metal article submerged therein.
    Type: Grant
    Filed: August 26, 2011
    Date of Patent: October 14, 2014
    Assignee: United Technologies Corporation
    Inventor: Eric W. Stratton
  • Publication number: 20140243249
    Abstract: The present invention provides a metal stripping additive, composition containing the same, and method for stripping metal by using the composition. The metal stripping additive comprises a phosphate, a carbonate, and a component selected from at least one of citric acid or a derivative thereof, oxalate or a derivative thereof, malate or a derivative thereof. The metal stripping additive is used with nitric acid as the metal stripping composition of the present invention. The present method has advantages of being capable of stripping various metals, low corrosion, low toxicity, and being applicable under ambient temperature.
    Type: Application
    Filed: August 2, 2013
    Publication date: August 28, 2014
    Applicant: Uwin Nanotech. Co., Ltd.
    Inventor: CHING-HSIANG HSU
  • Patent number: 8802610
    Abstract: A method of cleaning a substrate having a metal layer including copper or a copper-containing alloy, the method including cleaning the substrate using a cleaning liquid that includes a mercapto compound represented by one or both of the following formulas (1) and (2), and a solvent containing water and a water-soluble organic solvent: in which R represents a substituent group; m is an integer of 1 to 3; and n is an integer of 0 to 3, when m is 2 or 3, R may be the same or different; HS—(CH2)x—OH??(2), in which x is an integer of no less than 3.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: August 12, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tomoya Kumagai, Takuya Ohhashi, Takahiro Eto, Daijiro Mori, Takayuki Haraguchi
  • Patent number: 8791057
    Abstract: A multi-phase surface cleaning composition. A first phase comprises an acidic cleaning formulation. A second phase comprises an alkaline cleaning formulation. The second phase includes a synthetic clay component.
    Type: Grant
    Filed: June 3, 2009
    Date of Patent: July 29, 2014
    Assignee: Reckitt & Colman (Overseas) Limited
    Inventors: David Acher, Vikki Louise Binns, Mark Ward
  • Patent number: 8772216
    Abstract: The present invention relates to a low VOC hard surface cleaning composition comprising a surfactant, a glycol ether organic solvent, an aminoalcohol and fragrance, having a pH from 10.0 to 12.0. The present invention further encompasses a process to prepare a low VOC hard surface cleaning composition. Furthermore, the present invention encompasses a process of cleaning a hard surface with a low VOC hard surface cleaning composition.
    Type: Grant
    Filed: June 12, 2013
    Date of Patent: July 8, 2014
    Assignee: The Procter & Gamble Company
    Inventors: Cedric Joseph Volont, William Tucker Campbell
  • Patent number: 8729006
    Abstract: The present invention includes methods and compositions that employ sodium carboxymethyl cellulose as a scale inhibitor. According to the invention, scale inhibiting compositions are disclosed which include, sodium carboxymethyl cellulose and a polymer such as polymaleic acid, polyacrylic acid or mixtures, copolymers or terpolymers of the same and optionally may also include a phosphonate. The scale control composition may be incorporated into a detergent/cleaning composition.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: May 20, 2014
    Assignee: Ecolab USA Inc.
    Inventors: Altony Miralles, Xin Sun, Michelle Fung, John Krueger
  • Patent number: 8648026
    Abstract: A composition for dissolving and/or inhibiting deposition of scale on a surface of a system comprises an acidic component, a wetting agent, and a corrosion inhibitor. The composition may further comprise water. The acidic component comprises an alkanesulfonic acid, e.g. methanesulfonic acid (MSA). The wetting agent comprises a surfactant. The corrosion inhibitor comprises an amphoteric surfactant. The alkanesulfonic acid is present in an amount of at least about 50 weight percent (wt %), the surfactant is present in an amount of from about 0.1 to about 30 wt %, and the amphoteric surfactant is present in an amount of from about 0.025 to about 20 wt %, each based on 100 wt % of the alkanesulfonic acid, the surfactant, and the amphoteric surfactant combined. A method of dissolving and/or inhibiting deposition of scale on the surface of the system comprises the step of contacting the surface of the system with the composition.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: February 11, 2014
    Assignee: BASF SE
    Inventors: Joseph P Borst, Keith Hirsch, Stephen F Gross
  • Patent number: 8632955
    Abstract: A method of conditioning the surface of a work piece, particularly of a strip or sheet, more particularly of a lithostrip or lithosheet, including an aluminum alloy is provided. The method for conditioning the surface of a work piece and a work piece including an aluminum alloy enabling an increasing manufacturing speed in electro-chemically graining and maintaining at the same time a high quality of the grained surface, includes a conditioning method which comprises at least the two steps, degreasing the surface of the work piece with a degreasing medium and subsequently cleaning the surface of the work piece by pickling.
    Type: Grant
    Filed: June 15, 2012
    Date of Patent: January 21, 2014
    Assignee: Hydro Aluminium Deutschland GmbH
    Inventors: Bernhard Kernig, Henk Jan Brinkman
  • Patent number: 8614175
    Abstract: Disclosed herein is a cleaning solution composition for a solar cell, comprising: organic alkali compounds, water-soluble glycol ether compounds, percarbonates, organic phosphoric acids or salts thereof, and water.
    Type: Grant
    Filed: June 23, 2010
    Date of Patent: December 24, 2013
    Assignee: Dongwoo Fine-Chem Co., Ltd.
    Inventors: Hyo-Joong Yoon, Soon-Hong Bang, Sang-Tae Kim, Seung-Yong Lee
  • Patent number: 8541353
    Abstract: A novel cleaner and polish formulation that is eco friendly, that is, it is formulated without alcohols, organic solvents and without normal cleaning and polishing components, for example, amine functional materials, that are undesirable with regard to the environment.
    Type: Grant
    Filed: January 14, 2011
    Date of Patent: September 24, 2013
    Inventor: John D. Blizzard
  • Patent number: 8513179
    Abstract: A detergent resistant car polish composition includes an alkoxy aminofunctional dialkylpolysiloxane, a long chain silicone quaternary blend, a silicone fatty amino quaternary polydimethylsiloxane, a carboxylic acid, a surfactant, a cosurfactant, and water.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: August 20, 2013
    Assignee: Zep IP Holding LLC
    Inventors: Altony J. Miralles, Jerry D. Hoyt, Robert J. Ryther
  • Patent number: 8486882
    Abstract: The present invention is directed to a metal cleaner polisher and anti-tarnish solution which comprises the following ingredients per 32 fluid ounces: 5.00 to 10.00 percent mineral spirits by volume; 1.50 to 4.50 percent ethanol by volume; 0.50 to 1.50 percent ammonia by volume; 0.50 to 1.50 percent thiourea by volume; 0.25 to 1.00 percent sulfamic acid by volume; less than 0.20 percent disodium cocoampho-diproprionate by volume; and deionized water. Optionally, the following ingredients may be added individually, in any combination or all together: thickening/suspension agents; abrasive additives; and a modifying/stabilizing agent; and optionally varying amounts of fragrance and colorizing agents.
    Type: Grant
    Filed: October 6, 2011
    Date of Patent: July 16, 2013
    Inventors: Randy B. Bayless, Garen R. Bayless
  • Patent number: 8449689
    Abstract: A method of conditioning the surface of a work piece, in particular of a litho-strip or litho-sheet, consisting of an aluminum alloy enables an increase in manufacturing speed in surface roughening while maintaining a high quality of the electro-chemical grained surface of the work piece with relative low effort related to facility equipment. The method of conditioning comprises at least the step of degreasing the surface of the work piece with a degreasing medium, wherein the degreasing medium contains at least 1.5 to 3% by weight of a composite of 5-40% sodium tripolyphosphate, 3-10% sodium gluconate, 3-8% of a composite of non-ionic and anionic surfactants and optionally 0.5 to 70% soda, wherein sodium hydroxide is added to the degreasing medium such that the concentration of sodium hydroxide in the aqueous degreasing medium is 0.01 to 5% by weight.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: May 28, 2013
    Assignee: Hydro Aluminium Deutschland GmbH
    Inventors: Bernhard Kernig, Henk-Jan Brinkman
  • Patent number: 8431516
    Abstract: The compositions and methods for the removal of residues and contaminants from metal or dielectric surfaces comprises at least one alkyl diphosphonic acid, at least one second acidic substance at a mole ratio of about 1:1 to about 10:1 in water, and pH is adjusted to from about 6 to about 10 with a metal ion free base, and a surfactant. Particularly, a composition and method of cleaning residues after chemical mechanical polishing of a copper or aluminum surface of the semiconductor substrates.
    Type: Grant
    Filed: January 26, 2012
    Date of Patent: April 30, 2013
    Inventor: Wai Mun Lee
  • Patent number: 8372793
    Abstract: The present invention relates to a composition having tarnish-removing and soil-removing and preventing properties for cleaning a metal surface and methods of using the compositions.
    Type: Grant
    Filed: October 25, 2010
    Date of Patent: February 12, 2013
    Assignee: Fifield, Inc.
    Inventor: Scott M. Croce
  • Patent number: 8304376
    Abstract: The present invention generally relates to a biodegradable lubricating wipe, such as wet wipes. The wet wipes typically being fibrous sheet materials, pre-moistened with a solution for improved lubrication and/or protection of an area. In one embodiment the solution is comprised of a bio-based lubricant, a bio-based solvent and water. In one embodiment, the solution is comprised of mineral spirits and refined soybean oil. In another embodiment the solution is comprised of soy methyl ester and refined soybean oil. In yet another embodiment, the fibrous sheet material of the invention is biodegradable and the solution portion breaks down into a vaporizing component and a biodegradable carrier portion.
    Type: Grant
    Filed: October 26, 2011
    Date of Patent: November 6, 2012
    Assignee: Hoover, Inc.
    Inventor: Cathy Horton
  • Publication number: 20120260938
    Abstract: A method of dissolving and/or inhibiting the deposition of scale on a surface of a system comprises the step of bringing the surface of the system into contact with a composition. The composition can comprise from about 3 to about 15 parts by weight of a chelating component. The chelating component is selected from the group of MGDA, NTA, HEDTA, GLDA, EDTA, DTPA, and mixtures thereof. The composition can further comprise from about 3 to about 15 parts by weight of an acidic component, which is different than the chelating component. The composition can further comprise at least about 60 parts by weight of water. Each of the parts by weight ranges above are based on 100 parts by weight of the composition. The composition may further comprise a surfactant component and/or a corrosion inhibitor.
    Type: Application
    Filed: April 13, 2012
    Publication date: October 18, 2012
    Inventors: Kenneth L. Zack, Joseph P. Borst, David Durocher, David E. Przybyla, Victor Leung, Gunter Decker
  • Patent number: 8252195
    Abstract: The invention relates to compositions and methods that are useful in etching a metal surface. In particular, the invention relates to novel acid compositions and methods of using such compositions in etching a metal surface, preferably an aluminum surface prior to anodizing to dissolve impurities, imperfections, scale, and oxide. The compositions are effective in maintaining their etching capacity and in removing smut produced by the etching of a surface as well as in general cleaning.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: August 28, 2012
    Assignee: Houghton Technical Corp.
    Inventor: Mores Basaly
  • Patent number: 8227398
    Abstract: The present invention relates to corrosion inhibitor systems, in particular to cleaning and corrosion inhibiting compositions for surfaces of aluminum or colored metals and alloys thereof under alkaline conditions, especially in the food and pharmaceutical industries. The cleaning and corrosion inhibiting compositions comprise as a corrosion inhibitor at least one alkyleneoxy alkylphosphate di- or triester having the general formula where Z is either —O-M or —O-(AO)n2-Alkyl wherein M is an ammonium, alkali metal or alkaline earth metal cation, Alkyl is a C5-C22 alkyl or alkylaryl group, AO is a C2-4-alkylene oxide unit and n1, n2 and n3 each are integers from 2 to 10.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: July 24, 2012
    Assignee: Diversey, Inc.
    Inventors: Harry Kany, Holger Theyssen
  • Patent number: 8216992
    Abstract: The present invention discloses an improved cleaning composition for cleaning metal surfaces such as aluminum and aluminum-containing alloys. The cleaning composition of the present invention comprises water and an ethoxylate of an alcohol having Formula R1—OH wherein R1 is a saturated or unsaturated, straight-chain or branched aliphatic having from 12 to 80 carbon atoms; an inorganic pH adjusting component; and at least one surfactant that is different than the ethoxylate set forth above. The cleaning composition of the present invention also has an average water-break-free percent reduction of less than 50% after 7 days aging of a working composition prepared from the cleaning composition. The present invention also provides a method of cleaning a metal surface with the cleaning composition of the invention.
    Type: Grant
    Filed: January 23, 2004
    Date of Patent: July 10, 2012
    Assignee: Henkel KGaA
    Inventors: Andrew M. Hatch, Gary L. Rochfort, Richard D. Banaszak
  • Patent number: 8211622
    Abstract: A method of conditioning the surface of a work piece, particularly of a strip or sheet, more particularly of a lithostrip or lithosheet, including an aluminum alloy is provided. The method for conditioning the surface of a work piece and a work piece including an aluminum alloy enabling an increasing manufacturing speed in electro-chemically graining and maintaining at the same time a high quality of the grained surface, includes a conditioning method which comprises at least the two steps, degreasing the surface of the work piece with a degreasing medium and subsequently cleaning the surface of the work piece by pickling.
    Type: Grant
    Filed: April 5, 2006
    Date of Patent: July 3, 2012
    Assignee: Hydro Aluminium Deutschland GmbH
    Inventors: Bernhard Kernig, Henk Jan Brinkman
  • Patent number: 8148310
    Abstract: The compositions and methods herein relate to the method for the removal of residues and contaminants from metal or dielectric surfaces. Particularly, a composition and method of cleaning residues after chemical mechanical polishing of a copper or aluminum surface of the semiconductor substrates.
    Type: Grant
    Filed: September 23, 2010
    Date of Patent: April 3, 2012
    Inventor: Wai Mun Lee
  • Patent number: 8148311
    Abstract: The compositions and methods for the removal of residues and contaminants from metal or dielectric surfaces comprises at least one alkyl diphosphonic acid, at least one second acidic substance at a mole ratio of about 1:1 to about 10:1 in water, and pH is adjusted to from about 6 to about 10 with a basic compound, and optionally a surfactant. Particularly, a composition and method of cleaning residues after chemical mechanical polishing of a copper or aluminum surface of the semiconductor substrates. One of the embodiment is the method of using the compositions in dilution, wherein the solution may be diluted with DI water at dilution ratios, for example, of up to 1:10, up to 1:50, up to 1:100, up to 1:150, up to 1:250, and up to about 1:500 or any ratios therein.
    Type: Grant
    Filed: June 20, 2011
    Date of Patent: April 3, 2012
    Inventor: Wai Mun Lee
  • Patent number: 8080508
    Abstract: A chelating composition suitable for low-temperature use or storage is disclosed. The chelating compositions include 20 to 70 wt. percent of a polar solvent and 30 to 80 wt. percent of a first component of the formula: wherein R is a hydroxyalkyl group and each R? is individually selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups, carbonyl-containing alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; R? is selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups; carbonyl-substituted alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; M1 and M2 are alkali metal ions, wherein the M1 has a higher atomic weight than M2; wherein x+y=n and the mole fraction of M1 is greater than 0.70 to 1. Methods of suppressing crystallization and methods of cleaning surfaces employing the compositions described herein are also disclosed.
    Type: Grant
    Filed: July 26, 2011
    Date of Patent: December 20, 2011
    Assignee: Dow Global Technologies LLC
    Inventors: Druce K. Crump, David A. Wilson
  • Patent number: 8071523
    Abstract: The present invention relates to corrosion inhibitor systems, in particular to cleaning and corrosion inhibiting compositions for surfaces of aluminum or colored metals and alloys thereof under alkaline conditions, especially in the food and pharmaceutical industries. The cleaning and corrosion inhibiting compositions comprise as a corrosion inhibitor at least one alkyleneoxy alkylphosphate di- or triester having the general formula (I) where Z is either —O-M or —O-(AO)n2— Alkyl wherein M is an ammonium, alkali metal or alkaline earth metal cation, Alkyl is a C5-C22 alkyl or alkylaryl group, AO is a C2-4-alkylene oxide unit and n1, n2 and n3 each are integers from 2 to 10.
    Type: Grant
    Filed: February 15, 2005
    Date of Patent: December 6, 2011
    Assignee: Diversey, Inc.
    Inventors: Harry Kany, Holger Theyssen
  • Patent number: 8034756
    Abstract: A chelating composition suitable for low-temperature use or storage is disclosed. The chelating compositions include 20 to 70 wt. percent of a polar solvent and 30 to 80 wt. percent of a first component of the formula: (I) wherein R is a hydroxyalkyl group and each R? is individually selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups, carbonyl-containing alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; R? is selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups; carbonyl-substituted alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; M1 and M2 are alkali metal ions, wherein the M1 has a higher atomic weight than M2; wherein x+y=n and the mole fraction of M1 is greater than 0.70 to 1. Methods of suppressing crystallization and methods of cleaning surfaces employing the compositions described herein are also disclosed.
    Type: Grant
    Filed: April 3, 2007
    Date of Patent: October 11, 2011
    Assignee: Dow Global Technologies LLC
    Inventors: Druce K. Crump, David A. Wilson
  • Patent number: 8026201
    Abstract: The invention relates to compositions and methods of removing silicon-based anti-reflective coatings/hardmask layers.
    Type: Grant
    Filed: January 3, 2007
    Date of Patent: September 27, 2011
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Ruzhi Zhang, Ping-Hung Lu
  • Patent number: 7943563
    Abstract: A method of removing metallic copper from a steel surface defining a bore or cylinder of a gun is provided. The method involves contacting the surface with a composition comprising a polyphosphonic acid, a hydroxyl-substituted primary amine, and water.
    Type: Grant
    Filed: March 22, 2010
    Date of Patent: May 17, 2011
    Assignee: Bulk Chemicals, Inc.
    Inventor: Ted M. Schlosser
  • Patent number: 7923425
    Abstract: Low-foaming industrial cleaning compositions comprising water; (A) at least one carboxylic acid; (B) one or more aromatic, water soluble or dispersible, non-ionic surfactants; and optionally, one or more of the following: (C) one or more salts of carboxylic acids selected from the group consisting of carboxylic acids that are the same as component (A), different from component (A) and mixtures thereof; and (D) an amount of hydrotrope material sufficient to produce a stable homogeneous solution or dispersion of components (A) through (C) in water; (E) a pH adjuster; (F) one or more polyhydric alcohols; and (G) one or more preservatives.
    Type: Grant
    Filed: August 21, 2007
    Date of Patent: April 12, 2011
    Assignee: Henkel AG & Co. KGaA
    Inventor: Theodore D. Held
  • Patent number: 7887638
    Abstract: The present invention relates generally to a process and chemical composition for the removal of adherent niobium-rich second-phase particles (SPPs) from pickled niobium-containing zirconium alloys which includes applying to the alloy surface a chemical composition comprising alkaline hydrogen peroxide; an alkali metal meta-silicate; and a magnesium salt.
    Type: Grant
    Filed: October 3, 2008
    Date of Patent: February 15, 2011
    Assignee: Westinghouse Electric Co. LLC
    Inventors: David F. McLaughlin, Vanessa R. Youchum
  • Patent number: 7879787
    Abstract: An oxidizing cleaning composition comprises a low concentration of aqueous hydrogen peroxide that is environmentally friendly and has good stability in strong alkaline solutions. The aqueous hydrogen peroxide composition contains a synergistic combination of one or more hydrophilic surfactants having an HLB of 10 or greater, one or more hydrotropes, one or more UV-analyzable surfactants having an aromatic detectable functional group, and optionally a surfactant having an HLB of less than 10. The cleaning composition when mixed with an alkaline compound is very effective in removing dried or baked residues of polymers, modified or natural celluloses starches, natural gels, and the like at low concentrations and temperatures.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: February 1, 2011
    Assignee: American Sterilizer Company
    Inventors: Stavroula Maria Heintz, Shannon K. Campbell, Gurusamy Manivannan
  • Patent number: 7879784
    Abstract: A stripping agent composition for a resist, containing (A) 0.1 to 10% by weight of an amine; (B) 80 to 99% by weight of an organic solvent having a Hansen's solubility parameter of from 18 to 33 MPa1/2; (C) 0.01 to 3% by weight of a sugar; and (D) 0 to 5% by weight of water; a method for stripping a resist, including the step of stripping the resist with the stripping agent composition; and a method for manufacturing a semiconductor device, including the step of stripping a resist with the stripping agent composition. By using the stripping composition of the present invention, for example, a high-quality IC or LSI semiconductor device circuit, especially a compound semiconductor device circuit can be more economically advantageously manufactured.
    Type: Grant
    Filed: August 4, 2004
    Date of Patent: February 1, 2011
    Assignee: KAO Corporation
    Inventor: Mami Shirota
  • Patent number: 7851427
    Abstract: Resist stripping agents, useful for fabricating circuits and/or forming electrodes on semiconductor devices for semiconductor integrated circuits with reduced metal etch rates, particularly copper etch rates, are provided with methods for their use. The preferred stripping agents contain low concentrations of a copper salt with or without an added amine to improve solubility of the salt. Further provided are integrated circuit devices and electronic interconnect structures prepared according to these methods.
    Type: Grant
    Filed: February 1, 2010
    Date of Patent: December 14, 2010
    Assignee: Dynaloy, LLC
    Inventors: Kimberly Dona Pollard, Michael T. Phenis
  • Patent number: 7781388
    Abstract: An oxidizing cleaning composition comprises a low concentration of aqueous hydrogen peroxide that is environmentally friendly and has good stability in strong alkaline solutions. The aqueous hydrogen peroxide composition contains a synergistic combination of one or more hydrophilic surfactants having an HLB of 10 or greater, one or more hydrotropes, one or more UV-analyzable surfactants having an aromatic detectable functional group, and optionally a surfactant having an HLB of less than 10. The cleaning composition when mixed with an alkaline compound is very effective in removing dried or baked residues of polymers, modified or natural celluloses starches, natural gels, and the like at low concentrations and temperatures.
    Type: Grant
    Filed: May 4, 2006
    Date of Patent: August 24, 2010
    Assignee: American Sterilizer Company
    Inventors: Stavroula Maria Heintz, Shannon K. Campbell, Gurusamy Manivannan
  • Patent number: 7763577
    Abstract: An acidic post-CMP cleaning composition includes at least one polyamino-polycarboxylic acid, or salt thereof; at least one hydroxycarboxylic acid, or salt thereof; and the remainder being substantially water. The acidic cleaning composition also includes a surfactant. The acidic post-CMP cleaning composition has a pH of 1 to 5, and is useful for removing the contaminants from the wafer surface after a CMP process without making roughness worse.
    Type: Grant
    Filed: February 27, 2009
    Date of Patent: July 27, 2010
    Assignee: Uwiz Technology Co., Ltd.
    Inventors: Song-Yuan Chang, Ming-Hui Lu, Wen-Jsai Jsai, Po-Yuan Shen
  • Publication number: 20100144577
    Abstract: A method and aqueous composition are provided for removing at least a portion of a coating from the surface of a substrate. The coating comprises an insulative material, and is contacted with an aqueous composition. The aqueous composition comprises dimethyl formamide.
    Type: Application
    Filed: December 4, 2008
    Publication date: June 10, 2010
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Lawrence Bernard Kool, Brock Matthew Lape
  • Patent number: 7709435
    Abstract: There is provided an alkaline cleaning of aluminum alloy, in which the attained corrosion resistance is equal or superior to the acidic cleaning agent, and which mitigates the disadvantages of the acidic cleaning agent, such as corrosion of plant, processing of the waste liquid, and energy cost, and which attains improved productivity. The cleaning liquid from 0.5 to 40 g/L in total of one or more alkali builders selected from alkali metal hydroxide, alkali metal carbonate, inorganic alkali metal phosphate and alkali metal silicate, from 0.2 to 10 g/L of one or more of organic phosphonic acid and its salt (A), from 0.001 to 2 g/L of one or more metallic ions (B) selected from metallic ions having from 5.0 to 14.0 of stability constant with the organic phosphonic acid and its salt, and from 0.1 to 10 g/L of surfactant. Particularly, the weight ratio of (A):(B) is in a range of from 100:0.05˜20.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: May 4, 2010
    Assignees: Nihon Parkerizing Co., Ltd., Tokyo Seikan Kaisha Ltd.
    Inventors: Kazuya Hino, Yasuo Iino, Ryoji Morita, Akio Shimizu, Kazuhisa Masuda, Shozo Ichinose, Shozo Sakurama
  • Publication number: 20100068392
    Abstract: The demulsifying cleaning of metallic surfaces which may be contaminated with oil(s) with at least one further nonpolar organic compound, with fat(s), with soap(s), with particulate dirt or with at least one anionic organic compound using an aqueous, alkaline, surfactant-containing bath solutions.
    Type: Application
    Filed: March 26, 2007
    Publication date: March 18, 2010
    Inventors: Stella Bauerochse, Carola Komp, Ralph Van Den Berg, Peter Claude, Franz Dressler, Joachim Geldner, Zafer Yuksel, Eckart Schonfelder
  • Patent number: RE42128
    Abstract: Compositions containing certain organic solvents and a fluorine source are capable of removing photoresist and etching residue.
    Type: Grant
    Filed: January 22, 2009
    Date of Patent: February 8, 2011
    Assignee: Air Products and Chemicals, Inc.
    Inventor: Matthew Egbe