Abstract: Compositions and methods for cleaning metal and non-metal surfaces utilizing a nonionic surfactant and an enzyme are disclosed. A composition comprised of at least one nonionic surfactant and at least one enzyme and having a pH of between 6 and 9.5 is specifically disclosed. A method for cleaning a surface using this composition, and a method for cleaning a surface using a first composition comprising at least one nonionic surfactant and a second composition comprising at least one enzyme are also disclosed.

Abstract: The present invention relates to a cleaning solution for cleaning substrates, to which a metallic wiring has been applied, being capable of easily removing the metallic impurities of the substrate surface without corroding the metal, not putting a strain on the environment, and not causing a shelf life problem.The cleaning solution comprising at least one member selected from a group consisting of oxalic acid, ammonium oxalate and polyaminocarboxylic acids, but contains no hydrogen fluoride.

Abstract: Compositions and methods are provided for cleaning and de-oiling metal parts and then degrading the removed oils or other organic compounds in an environmentally-friendly manner. The compositions generally contain surfactants to remove the oils and enzymes to degrade the oils. Generally, both aliphatic and aromatic compounds normally present in standard oils, lubricants, cutting oils, and greases are removed from the metal parts (i.e., "solubilized") by surfactants (although the enzymes may also assist in this process) and then ultimately broken down into relatively short-chain fatty acids by enzymes, both processes being carried out in an aqueous medium. The surfactants include (a) one or more alkylphenol ethoxylates; (b) one or more alkaline metal salts of an alkane sulfonic acid; and (c) one or more alkanolamines in aqueous solution. Suitable enzymes include monomethanoxigenase, alcoholdehydrogenase, and aldehydehydrogenase.

Abstract: The present invention discloses an alkaline cleaning composition for cleaning heavily soiled metal surfaces such as food fryers, baking pans, high temperature pasteurizers, and beer kettles, ceramic surfaces such as restaurant grade ceramic china plates and platters, and plastic surfaces. The cleaning composition is noncaustic and includes a peroxygen compound, a chelate, and a metasilicate and/or sesquisilicate. A preferred cleaning composition further includes a surfactant and hydrated builder.

Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound;(ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

Abstract: A composition for rinsing a memory hard disc, which comprises water and an additive selected from the group consisting of an oxo-acid, an oxo-acid salt and a chloride.

Abstract: An aqueous liquid composition containing dihydrogen phosphate salt, surfactant(s), and a dual coordinate bonding agent for iron cleans soiled metal surfaces without damaging any plastic parts that come into contact with the composition, supporting the growth of bacteria that cause unpleasant odors, or obscuring the transparency of any transparent window that it contacts. The composition is particularly useful for cleaning unpainted aluminum sided rail transport cars that have polycarbonate housings insulating electrical contact points that provide motive electric power to the cars; many conventional aqueous alkaline and acid cleaners promote stress cracking of polycarbonate plastics.

Abstract: A composition for removal of chemical residues from metal or dielectric surfaces or for chemical mechanical polishing of a copper surface is an aqueous solution with a pH between about 3.5 and about 7. The composition contains a monofuctional, difunctional or trifunctional organic acid and a buffering amount of a quaternary amine, ammonium hydroxide, hydroxylamine, hydroxylamine salt, hydrazine or hydrazine salt base. A method in accordance with the invention for removal of chemical residues from a metal or dielectric surface comprises contacting the metal or dielectric surface with the above composition for a time sufficient to remove the chemical residues. A method in accordance with the invention for chemical mechanical polishing of a copper surface comprises applying the above composition to the copper surface, and polishing the surface in the presence of the composition.

Abstract: Aqueous cleaning compositions for removing limescale on hard surfaces comprise maleic acid, an acid which has a first pKa not exceeding 5, and an acid-stable thickener. Compositions comprising maleic acid and alkyl- or aryl-sulphonic acids in combination with thickeners such as xanthan gums are used for removing limescale, for example in large appliances such as automatic dish washers and laundry apparatus.

Abstract: There is disclosed a cleaning liquid for producing a semiconductor device which comprises (A) fluorine-containing compound; (B) water-soluble or water-miscible organic solvent; and (C) inorganic acid and/or organic acid, optionally, further comprises (D) quaternary ammonium salt or (D') a specific organic carboxylic acid ammonium salt and/or an organic carboxylic acid amine salt; as well as a process for producing a semiconductor device by forming a resist pattern on a substrate equipped on the surface with an insulating film layer or a metallic electroconductive layer, forming a via hole or electric wiring by dry etching, removing the resist pattern by ashing treatment with oxygen plasma; and effecting an cleaning treatment with the above cleaning liquid. The above cleaning liquid and production process can readily remove the deposit polymer formed in the case of dry etching without impairing metallic film and insulating film.

Abstract: Compositions useful for polishing wafers to be used in microelectronic devices comprise silicon dioxide, aluminum oxide, sodium hydroxide, and water. Cleaning compositions for removing electron wax from wafers to be used in microelectronic devices comprise from about 2 to about 6 percent by weight of ammonium hydroxide, from about 10 to about 22 percent by weight of hydrogen peroxide, and water.

Abstract: A chemical cleaning composition for silver- or copper-containing surfaces consists of a water-soluble solid or powder comprising thiourea or a derivative thereof, and is formulated in unit application form, e.g. in tablet or sachet form. A preferred composition comprises up to 60% thiourea or a derivative thereof; up to 4% surfactant; not more than 40% acidifier; less than 20% disintegrant; up to 10% binder; 0-1% lubricant; and up to 40% diluent.

Abstract: The present invention relates to a cleaning composition for cleaning airct wheel wells. The cleaning composition broadly comprises from about 0.1 to about 15% of a D-limonene composition, containing less than 0.5% of a stabilizing anti-oxidant, acting as a solvent for said greasy soils, from about 0.1% to about 5.0% of a material for increasing the flash point of said cleaning composition above 140.degree. F., such as an isoparrafinic hydrocarbon solvent, from about 10% to about 50% of a mixture of linear alcohol ethoxylates having a HLB in the range of 2 to 15 as a stabilizer, and the balance water. The cleaning composition may also contain from 0.1% to about 10% capryolamphopropionate, from about 0.1% to about 15% dipropylene glycol, from about 0.1% to about 5.0% benzotriazole, and 0.1% to about 5.0% sodium bicarbonate.

Abstract: A powder blend of 95% Sodium metasilicate anhydrous and 5% sodium lauroyl sarcosinate which is hygroscopic. The mixture is formulated for effective use when 11.25 ounces are dissolved in one gallon of water or diluted up to six gallons of water. The constituent powders are added to the drum at their mixture ratio of 95% sodium metasilicate and 5% sodium lauroyl sarcosinate which will form the blend. The drum is resealed with the processing lid trapping only low moisture air inside. The drum is relocated to the blending machine which rolls and tilts the drum for blending for 30 minutes at 16 rpm, which ensures complete and uniform blending of the 2 constituent powders. Next, the drum is removed from the blending machine, and the processing drum lid is removed in the process room ensuring low moisture exposure. A filling lid is installed which includes an auger feed, and the drum is rotated and placed in the filling stand. An air motor is attached to the auger.

Abstract: A terpene-free hard surface cleaning composition containing: (a) a nonionic surfactant; (b) an anionic surfactant; (c) a primary solvent consisting of a C.sub.6 -C.sub.14 methyl ester; (d) a short-chain cosurfactant; and (e) water, all weights being based on the total weight of the composition.

Abstract: Residue that accumulates on metallic molding surfaces during repeated molding of plastics such as PVC can be removed by cleaning with an aqueous solution of a glycol or oligo-glycol monoether, an amine, and a chelating agent. The cleaner is sufficiently effective to replace mechanical blasting that was previously required.

Abstract: The present invention relates to a liquid descaling composition containing a phosphoric acid, a phosphonic acid, a cationic surfactant, an amine oxide and water.

Abstract: The present invention relates to a cleaning composition for cleaning airct wheel wells. The cleaning composition broadly comprises from about 0.1 to about 15% of a D-limonene composition, containing less than 0.5% of a stabilizing anti-oxidant, acting as a solvent for said greasy soils, from about 0.1% to about 5.0% of a material for increasing the flash point of said cleaning composition above 140.degree. F., such as an isoparrafinic hydrocarbon solvent, from about 10% to about 50% of a mixture of linear alcohol ethoxylates having a HLB in the range of 2 to 15 as a stabilizer, and the balance water. The cleaning composition may also contain from 0.1% to about 10% capryolamphopropionate,from about 0.1% to about 15% dipropylene glycol, from about 0.1% to about 5.0% benzotriazole, and 0.1% to about 5.0% sodium bicarbonate.

Abstract: An alkaline degreasing solution containing 0.01 to 3 g/l of alkali silicate calculated as Si concentration, and 0.01 to 10 g/l of a nonionic surfactant having an HLB value (=20.times.Mw/M, where Mw represents the weight of a hydrophilic group part and M represents the molecular weight of the surfactant) of 5 to 11 and a structure being expressed in the following general formula (I), with a pH value of at least 9.5:R--O--(EO).sub.m (AO).sub.n H (I)where R represents alkyl group, EO represents ethylene oxide group, AO represents alkylene oxide group (propylene oxide group and/or butylene oxide group), m represents an addition molar number of EO which is an integer of 3 to 7, n represents an addition molar number of AO which is an integer of 1 to 6, and m and n satisfy the relation of n<m.ltoreq.3n.

Abstract: A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates containing hydroxylamine, at least one alkanolamine, at least one chelating agent, and water is described. The preferred chelating agent is 1,2-dihydroxybenzene or a derivative thereof. The chelating agent provides added stability and effectiveness to the cleaning composition.

Abstract: The present invention discloses an alkaline cleaning composition for cleaning heavily soiled metal surfaces such as food fryers, baking pans, high temperature pasteurizers, and beer kettles, ceramic surfaces such as restaurant grade ceramic china plates and platters, and plastic surfaces. The cleaning composition is noncaustic and includes a peroxygen compound, a chelate, and a metasilicate and/or sesquisilicate. A preferred cleaning composition further includes a surfactant and hydrated builder.

Abstract: A solution for cleaning metal surfaces particularly non ferrous alloys such as copper, brass and high strength aluminum alloys. The solution is prepared by mixing Ca(OH).sub.2 and KOH with equivalent sulfuric acid in water then passing the solution through a 10 micron filter. the resulting concentrate can be used full strength or diluted depending on the degree of surface oxidation of the metal to be treated.

Abstract: A technique for polishing an exposed surface of metal on a substrate to remove defects from mechanical working of metals, such as burrs and pigtails resulting from drilling, and defects from plating, such as nodules and depressions, is provided. The substrate has an exposed metal surface such as copper thereon which is to be treated to remove defects. A planarizing or polishing head, preferably a rotating roller, is provided which is continuously rotating with respect to the substrate, with the head in contact with the metal surface on the substrate. A chemical etchant, essentially free of abrasive material, is continuously supplied to the interface between the metal surface and the head. The treating and polishing continues until the defects have been removed or reduced to an acceptable value. In some instances where significant height reduction is required, thus requiring significant metal removal, several passes of the substrate may be required or a device with multiple heads may be used.

Abstract: A process for inhibiting the corrosion of silver in a dishwashing detergent solution by adding to the solution an inorganic redox-active substance.

Abstract: An alkaline aqueous cleaning composition for cleaning a substrate contaminated with industrial-type soil contaminants contains (i) an aqueous portion and (ii) an active-ingredient portion composed of (A) an alkalinity-providing agent and (B) a surfactant mixture containing (a) an active concentration of an ethoxylated C.sub.12-14 alkanol surfactant having an HLB value at 25.degree. C. of from 8 to 12 and (b) an active concentration of at least one aminocarboxylic acid surfactant of the general formula R--N(H)--R', wherein R is a straight or branched chain aliphatic organic group having from 10 to 20 carbon atoms, and R' is a straight or branched chain carboxylic acid having from 1 to 7 carbon atoms. At an active-concentration ratio of surfactant (a) to surfactant (b) of about 2.5:1, the surfactants have a synergistic effect on the cleaning composition's ability to remove certain types of industrial-soil contaminants.

Abstract: The present invention discloses an alkaline cleaning composition for cleaning heavily soiled surfaces such as food fryers, baking pans, high temperature pasteurizers, beer kettles and similar equipment that normally requires caustic soda based cleaners to clean. The present invention is also useful in cleaning ceramics such as restaurant grade ceramic china plates and platters. The present invention is particularly useful in cleaning brass and aluminum parts and equipment without causing corrosion damage. Further, since the cleaning composition of the present invention is not based on caustic soda, the composition is not considered hazardous. Further, the cleaning composition of the present invention dissolves readily in water, providing a solution that can be used in mechanical sprayers, soak-tanks and clean-in-place equipment. Also the cleaning composition may be effectively used at lower temperatures than caustic cleaning agents.

Abstract: A metal cleaning composition comprising EDDS is described. Preferably, the compositions comprise optical isomers of EDDS, such as (s,s)EDDS. The compositions are particularly well suited for cleaning iron, zinc, aluminum, and copper. De-icer compositions comprising EDDS are also described. Also disclosed are processes for using the compositions.

Abstract: Disclosed herein are hard surface cleaners and methods for creating and using them. The cleaners combine a monocarboxylic acid with an ampholytic surfactant having no carboxyl groups, in an aqueous solution. In one aspect, lactic acid, water, and sodium caprylo ampho hydroxpropyl sulphonate are present.

Abstract: Substantially nonaqueous concentrates for use in preparing stable, aqueous cleaner/degreaser compositions in the form of totally water soluble solutions comprise (a) at least one sparingly water soluble organic solvent having certain defined characteristics; (b) a solubilizing additive consisting of from approximately 0.1 to approximately 100 weight percent of a surfactant and from 0 to approximately 99.9 weight percent of a coupler, the solubilizing additive being present in an amount of approximately 3% to approximately 15% by weight excess over that minimally required to form a clear solution when the concentrate is combined with water; and (c) not more than 10.0 weight percent of water; (d) the concentrate forming a barely clear, totally water soluble solution when diluted with water to produce a solution having the desired cleaning/degreasing strength.

Abstract: An aqueous metal cleaning composition is provided which comprises an alkalinity providing agent such as alkali metal carbonate and/or bicarbonate salts and a low foaming surfactant. The aqueous cleaning solution has specific foam height and foam collapse characteristics, and provides for substantially complete phase separation of a contaminant phase from the aqueous cleaning composition such that there is substantially no aqueous phase drag out into the contaminant phase; and the contaminant phase can be removed easily, and the aqueous cleaning solution can be recovered and reused.

Abstract: A solution for cleaning metal surfaces particularly non ferrous alloys such as copper, brass and high strength aluminum alloys. The solution is prepared by mixing Ca(OH).sub.2 and KOH with equivalent sulfuric acid in water then passing the solution through a 10 micron filter. The resulting concentrate can be used full strength or diluted depending on the degree of surface oxidation of the metal to be treated.

Abstract: A liquid composition useful for selective dissolution of soft metal is disclosed. The composition comprises an organic nitrocompound and a carboxylic acid. The organic nitrocompound, upon exposure to the soft metal, oxidizes the soft metal to form a first soft metal salt. The carboxylic acid, upon exposure to the soft metal salt, react with the first soft metal salt to form a second soft metal salt that is soluble in the composition. Related methods are also disclosed.

Abstract: An aqueous based, solvent free degreaser composition, has on a weight basis:a) about 0.5-10% of at least one alcohol alkoxylate with a fatty alcohol moiety selected from the group of compounds having the formula: ##STR1## wherein R is a C.sub.8 to C.sub.18 branched or straight chain alkyl group, m is within the range of about 0 to 14, n is within the range of about 0 to 14, o is within the range of about 0-14, p is within the range of about 0-14, and R' is --CH.sub.3, --CH.sub.2 CH.sub.3, and mixtures thereof, R" is --CH.sub.3, --CH.sub.2 CH.sub.3, and mixtures thereof, and R'" is --OH, --CH.sub.3, --O--C.sub.3 -C.sub.18 hydroxyalkyl group and mixtures thereof;b) about 0.5-10% of at least one alkyl phenol alkoxylate of the following formula: ##STR2## wherein R is a C.sub.8 or C.sub.9 branched or straight chain alkyl group, m is within the range of about 3 to 12, and n is within the range of about 0 to 12, and P is a phenyl group;c) about 0.

Abstract: Aqueous alkali cleaning compositions containing an alkali metal salt, an N-alkyl pyrrolidone derivative, and specific ethylene oxide/propylene oxide block copolymers having molecular weights of from about 1500 to about 2500. Such compositions can be employed as an aqueous concentrate or solution to clean a substrate such as a circuit board, wiring board or metal surface. Specific ethylene oxide/propylene oxide block copolymers protect plastic parts from corrosion by N-alkyl pyrrolidone derivatives without compromising N-alkyl pyrrolidone derivative cleaning ability.

Abstract: Superior high water containing oil continuous microemulsions and emulsions for cleaning contain defined amounts of water, one or more ionic surfactants, and one or more organic solvents so that the compositions have a low conductivity and low viscosity.

Abstract: The present invention discloses an alkaline cleaning composition for cleaning heavily soiled metal surfaces such as food fryers, baking pans, high temperature pasteurizers, and beer kettles, ceramic surfaces such as restaurant grade ceramic china plates and platters, and plastic surfaces. The cleaning composition is noncaustic and includes a peroxygen compound, a chelate, and a metasilicate and/or sesquisilicate. A preferred cleaning composition further includes a surfactant and hydrated builder.

Abstract: A continuous method for cleaning and/or removing liquid from industrial parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.

Abstract: A method for drying parts that includes contacting the part with a liquid removing composition that contains a straight chain or cyclic polyorganosiloxane.

Abstract: Acidic aqueous cleaning compositions containing a strong acid and maleic acid are disclosed. The maleic acid provides improved surface safety.

Abstract: A method for removing liquid from parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.

Abstract: A method for cleaning an industrial object by use of an aqueous agent that includes a polyorganosiloxane. The method uses a plurality of vessels and the agent is recovered and resupplied to the method.

Abstract: An acidic cleaning aqueous solution for carrying out a low temperature acidic cleaning of aluminum and aluminum alloy and a cleaning method for the same free from harmful fluorine and chromium ions. The acidic cleaning aqueous solution includes oxidized metal ions as an etching promoter, an inorganic acid, a surfactant and a certain amount of polyhydric alcohols having at least two hydroxyl groups directly coupled with two adjacent carbon atoms of a principal chain within one molecule and further includes an oxidizing agent for oxidizing the oxidized metal ions reduced in the cleaning. Certain alcohols in the acidic cleaning aqueous solution can control the oxidative decomposition reaction of the surfactant to obtain a long life acidic cleaning aqueous solution.

Abstract: The present invention is a tetrahydrofurfuryl alcohol and limonene cleaning agent and method for formulating and/or using the cleaning agent. This cleaning agent effectively removes both polar and nonpolar contaminants from various electrical and mechanical parts and is readily used without surfactants, thereby reducing the need for additional cleaning operations. The cleaning agent is warm water rinsable without the use of surfactants. The cleaning agent can be azeotropic, enhancing ease of use in cleaning operations and ease of recycling.

Abstract: Limescale removing compositions contain a low level of surfactant, i.e., less than about 1% and maleic acid and have a pH of from about 0.1 to about 4.5. The surfactant can be anionic, nonionic, amphoteric, or cationic, but is preferably cationic. The composition can be used neat, or diluted, by applying it to the surface to be treated, leaving it to react, and then rinsing.

Abstract: A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates containing hydroxylamine, at least one alkanolamine, at least one chelating agent, and water is described. The preferred chelating agent is 1,2-dihydroxybenzene or a derivative thereof. The chelating agent provides added stability and effectiveness to the cleaning composition.

Abstract: A cleaning solution consisting essentially of dimethyl ester, water and one or more organic solvents completely miscible at 23.degree. C. with dimethyl ester and water, said water present at at least ten weight percent based on the weight of solution components.

Abstract: The present invention discloses an alkaline cleaning composition for cleaning heavily soiled surfaces such as food fryers, baking pans, high temperature pasteurizers, beer kettles and similar equipment that normally requires caustic soda based cleaners to clean. The present invention is also useful in cleaning ceramics such as restaurant grade ceramic china plates and platters. The present invention is particularly useful in cleaning brass and aluminum parts and equipment without causing corrosion damage. Further, since the cleaning composition of the present invention is not based on caustic soda, the composition is not considered hazardous. Further, the cleaning composition of the present invention dissolves readily in water, providing a solution that can be used in mechanical sprayers, soak-tanks and clean-in-place equipment. Also the cleaning composition may be effectively used at lower temperatures than caustic cleaning agents.

Abstract: A novel composition, a kit for providing that composition, and method of treatment is disclosed. The composition comprises aqueous hydroxyacid, hydroxy ether, surfactant, and alkali hydroxide. In a preferred aspect, the composition comprises aqueous hydroxyacetic acid, dipropylene glycol-methyl ether, a surfactant blend of 9M tridecyl alcohol and poly`oxy-1,2-ethanediyl`, alpha-`nonylphenyl`-omega-hydroxy-surfactant, and aqueous sodium hydroxide.

Abstract: A metal cleaning composition useful in aqueous solution comprises an alkalinity providing agent and a combination of surfactants comprising an ethoxylated thiol surfactant and a nitrogen-containing surfactant which reduces the odor of the thiol-containing surfactant. The aqueous cleaning solutions of this invention are particularly useful in metal parts washers typically placed in garages, service stations and the like in which the cleaning solution can be filtered and reused in the parts washer.

Abstract: The present invention relates to a machine dishwashing composition containingfrom 1% to 80% of a detergent builder component other than carbonatefrom 0% to 9%, preferably 0% to 5%, most preferred 0% of alkali-metal carbonate or bicarbonate saltan oxygen-releasing bleaching agent such that the level of available oxygen measured according to the method herein is from 0.3 to 1.7, preferably 0.5 to 1.2,from 0.05% to 2.5%, preferably 0.1% to 0.6% of a paraffin oil, the rate of release of oxygen being preferably also controlled; the present invention also encompasses a process for making such compositions.